64- to 256-megabit reticle generation
Subtitle: technology requirements and approaches
By: Gregory K. Hearn, editor.
Contributors: Hearn, Gregory K.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
Series: Critical reviews of optical science and technology ;; v. CR51
Publisher: SPIE Optical Engineering Press
Published: 1994
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 273
Subjects: Integrated circuits -- Masks -- Congresses.; Reticles -- Congresses.; Microlithography -- Congresses.; Semiconductor storage devices -- Design and construction -- Congresses.
Other titles: Sixty-four to two hundred fifty-six-megabit reticle generation.
Notes: Includes bibliographical references and index.
"Proceedings of a conference held 24 September 1993, Santa Clara, California, sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology."