Photomask and X-ray mask technology II
Subtitle: 20-21 April 1995, Kawasaki City, Kanagawa, Japan
By: Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE ... [et al.].
Contributors: Yoshihara, Hideo.; Photomask Japan.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 2512; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 2512.
Publisher: SPIE
Published: 1995
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 554
Subjects: Integrated circuits -- Masks -- Congresses.; X-ray lithography -- Congresses.; Microlithography -- Congresses.
Notes: Includes bibliographic references and author index.