Mechanism of inhibition processes in polymers: oxidative and photochemical degradation.
By: Edited by B. Sedláček.
Contributors: Sedláček, B. ed.; International Union of Pure and Applied Chemistry.; Československá akademie věd.; Československá společnost chemická.
Series: Journal of polymer science; Polymer symposia,; no. 40; Journal of polymer science (New York,; 1972-   ); Journal of polymer science.; no. 40.
Publisher: Wiley
Published: 1973
Place of publication: [New York]
Language: eng
Number of pages: 327
Subjects: Polymers -- Deterioration -- Congresses.; Chemical inhibitors -- Congresses.; Oxidation -- Congresses.
Notes: Includes bibliographical references.
"Held under the auspices of the International Union of Pure and Applied Chemistry, Czechoslovak Academy of Sciences, and the Czechoslovak Chemical Society."
English or German.