LPCVD silicon nitride and oxynitride films
Subtitle: material and applications in integrated circuit technology
By: F.H.P.M. Habraken (ed.).
Contributors: Habraken, F. H. P. M.
Series: Research reports ESPRIT.; vol. 1
Publisher: Springer-Verlag
Published: 1991
Place of publication: Berlin; New York
Language: eng
Number of pages: 159
Subjects: Thin film devices.; Silicon nitride.; Integrated circuits -- Very large scale integration -- Materials.; Metal oxide semiconductors, Complementary.
Notes: Includes bibliographical references.