Metrology, inspection, and process control for microlithography XIX
Subtitle: 28 February-3 March,  2005, San Jose, California, USA
By: Richard M. Silver, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH.
Contributors: Silver, Richard M.; Society of Photo-optical Instrumentation Engineers.; International SEMATECH.
Series: SPIE proceedings series ;; v. 5752; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5752.
Publisher: SPIE
Published: 2005
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 1474
Subjects: Integrated circuits -- Inspection -- Congresses.; Integrated circuits -- Measurement -- Congresses.; Microlithography -- Congresses.; Process control -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and author index.