Optical microlithography XII
Subtitle: 17-19 March, 1999, Santa Clara, California
By: Luc Van den Hove, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization SEMI--Semiconductor Equipment and Materials International.
Contributors: Van den Hove, Luc.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.
Series: SPIE proceedings series ;; v. 3679; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3334.
Publisher: SPIE
Published: 1999
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 1182
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.; X-ray lithography -- Congresses.; Manufacturing processes -- Congresses.
Genres: Congresses.
Other titles: Optical microlithography twelve
Notes: Includes bibliographical references and author index.