Development and application of a model hierarchy for silicon process simulation
By: Alexander Höfler.
Edition: 1. Aufl.
Series: Series in microelectronics,; v. 69
Publisher: Hartung-Gorre
Published: 1997
Place of publication: Konstanz
Language: eng
Number of pages: 183
Subjects: Semiconductors -- Design and construction -- Computer simulation.; Semiconductor doping -- Computer simulation.; Ion implantation -- Computer simulation.
Notes: Includes bibliographical references.
Thesis (Ph. D.)--Eidgenössische Technische Hochscule Zürich, 1997.