Electron-beam, X-ray, and ion-beam technology
Subtitle: submicrometer lithographies VIII : 1-3 March 1989, San Jose, California
By: Arnold W. Yanof, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
Contributors: Yanof, Arnold W.; Society of Photo-optical Instrumentation Engineers.; SPIE Symposium on Microlithography (1989 : San Jose, Calif.)
Series: Proceedings / SPIE--the international society for optical engineering ; ;v. 1089; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 1089.
Publisher: SPIE
Published: 1989
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 388
Subjects: Lithography, Electron beam -- Congresses.; X-ray lithography -- Congresses.; Ion beam lithography -- Congresses.
Notes: Includes bibliographical references.
Proceedings of the SPIE Symposium on Microlithography.