Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond
Publisher: Springer
Published: Oct 02, 2019
Format: hardcover
Number of pages: 131
ISBN-13: 9789811500459
Notes: Source title: Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond (Springer Theses)