EMLC 2007
Subtitle: 23rd European Mask and Lithography Conference : 22-25 January 2007, Grenoble, France
By: Uwe F.W. Behringer, chair/editor ; Wilhelm Maurer, Jacques Waelpoel, program chairs ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, CEA-LETI (France) ... [et al.] ; published by SPIE--the International Society for Optical Engineering.
Contributors: Behringer, Uwe F. W.; Maurer, Wilhelm.; Waelpoel, Jacques.; VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik.; CEA-LETI.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE -- v. 6533; Proceedings of SPIE--the International Society for Optical Engineering -- v. 6533.
Publisher: SPIE
Published: 2007
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819466556
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.
Genres: Congresses.
Other titles: European Mask and Lithography Conference; European Conference on Mask Technology for Integrated Circuits and Microcomponents; 23rd European Mask and Lithography Conference
Notes: Includes bibliographical references and author index.