Angular sensitivity of controlled implanted doping profiles
By: Robert G. Wilson ... [et al.].
Contributors: Wilson, Robert G.; United States. National Bureau of Standards.; United States. Defense Advanced Research Projects Agency.
Series: Semiconductor measurement technology; NBS special publication ; 400-49; NBS special publication -- 400-49.
Publisher: Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off.
Published: 1978
Place of publication: Washington
Language: eng
Number of pages: 54
Subjects: Semiconductor doping.; Ion implantation.
Notes: Issued Nov. 1978.

CODEN: XNBSAV.

Sponsored by the Defense Advanced Research Projects Agency and the National Bureau of Standards.

Includes bibliographical references.