Extreme ultraviolet lithography
Subtitle: from the topical meeting, May 1-3, 1996, Boston, Massachusetts
By: edited by Glenn D. Kubiak and Don R. Kania ; sponsored by Optical Society of America.
Contributors: Kubiak, Glenn D.; Kania, Don R.; Optical Society of America.
Series: OSA trends in optics and photonics ;; v. 4
Publisher: The Society
Published: 1996
Place of publication: Washington, DC
Language: eng
Number of pages: 235
Subjects: Optical coatings -- Congresses.; Photolithography -- Congresses.; Ultraviolet radiation -- Industrial applications -- Congresses.; Interferometry -- Congresses.; Lasers -- Industrial applications -- Congresses.
Notes: Includes bibliographical references (p. 222-232) and indexes.