Accurate linewidth measurement on integrated-circuit photomasks
By: John M. Jerke, editor, Electron Devices Division, Center for Electronics and Electrical Engineering, National Engineering Laboratory, National Bureau of Standards.
Contributors: Jerke, John M.; National Engineering Laboratory (United States.) Electron Devices Division.; United States. Defense Advanced Research Projects Agency.; United States. National Bureau fo Standards.
Series: Semiconductor measurement technology; NBS special publication ; 400-43; NBS special publication ;; 400-43.
Publisher: U.S. Dept. of Commerce, National Bureau of Standards : U.S. Govt. Print. Off. : for sale by the Supt. of Docs., U.S. Govt. Print. Off.
Published: 1980
Place of publication: Washington, D.C
Language: eng
Number of pages: 154
Subjects: Integrated circuits -- Masks -- Measurement.
Notes: Includes bibliographical references.
"Issued February 1980."
"Supported by the Defense Advanced Research Projects Agency ... and the National Bureau of Standards."