Advances in resist technology and processing XIV
Subtitle: 10-12 March, 1997, Santa Clara, California
By: Rʹegine G. Tarascon-Auriol, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Contributors: Tarascon-Auriol, Régine G.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; SEMATECH (Organization)
Series: Proceedings SPIE--the International Society for Optical Engineering -- v. 3049.; Proceedings of SPIE--the International Society for Optical Engineering -- v. 3049.
Publisher: SPIE--the International Society for Optical Engineering
Published: 1997
Place of publication: Bellingham, Washington
Language: eng
Number of pages: 1028
ISBN-13: 9780819424631
Subjects: Photoresists -- Congresses
Genres: Congresses.
Notes: Includes bibliographical references and author index.