Design for manufacturability through design-process integration
Subtitle: 28 February-2 March 2007, San Jose, California, USA
By: Alfred K.K. Wong, Vivek, K. Singh, editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH (USA).
Contributors: Wong, Alfred Kwok-Kit.; Singh, Vivek K.; Society of Photo-optical Instrumentation Engineers.; International SEMATECH.
Series: Proceedings of SPIE -- v. 6521; Proceedings of SPIE--the International Society for Optical Engineering -- v. 6521.
Publisher: SPIE
Published: 2007
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819466402
Subjects: Integrated circuits -- Design and construction -- Congresses; Integrated circuits -- Defects -- Analysis -- Congresses; Semiconductors -- Design and construction -- Congresses; Semiconductor wafers -- Defects -- Analysis -- Congresses; Microelectronics industry -- Quality control -- Congresses; Quality control -- Congresses
Genres: Congresses.
Notes: Previous conference proceedings entitled: Design and process integration for microelectronic manufacturing

Includes bibliographical references and author index.