Proceedings of the 1983 International Symposium on Electron, Ion, and Photon Beams
Subtitle: 31 May - 3 June 1983, Westin Bonaventure Hotel, Los Angeles, California
By: special editors for the proceedings: M. Hatzakis and T.H.P. Chang.
Contributors: Hatzakis, M.; Chang, T. H. P.; American Vacuum Society.; IEEE Electron Devices Society.; Electrochemical Society.
Series: Journal of vacuum science & technology -- v. 1, no. 4
Publisher: published for the American Vacuum Society by the American Institute of Physics
Published: 1983
Place of publication: New York
Language: eng
Number of pages: 1400
Subjects: Lithography, Electron beam -- Congresses.; Electron beams -- Industrial applications -- Congresses.; Ion bombardment -- Congresses.; Photoresists -- Congresses.; Photolithography -- Congresses.; Photon beams -- Industrial applications -- Congresses.
Genres: Congresses.
Notes: "The proceedings are published in both the 1983 October-December issue of the Journal of vacuum science and technology B, vol.1, no.4 and in a special casebound edition available to participants."--T.p. verso

Sponsored jointly by the American Vacuum Society, the Electron Devices Group of the IEEE, and the Electrochemical Society.

Includes bibliographical references and index.