Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV
Subtitle: March 14-15, 1985, Santa Clara, California
By: Phillip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
Contributors: Blais, Phillip D.; International Society for Hybrid Microelectronics.
Series: Proceedings of SPIE--the International Society for Optical Engineering ;; v. 537
Publisher: SPIE--the International Society for Optical Engineering
Published: 1985
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 219
Subjects: Lithography, Electron beam -- Congresses.; X-ray lithography -- Congresses.; Ion beam lithography -- Congresses.
Notes: Includes bibliographies and index.