Chemical vapor deposition
Subtitle: principles and applications
By: edited by Michael L. Hitchman and Klavs F. Jensen.
Contributors: Hitchman, Michael L.; Jensen, Klavs F., 1952-
Publisher: Academic Press
Published: 1993
Place of publication: London; San Diego
Language: eng
Number of pages: 677
Subjects: Chemical vapor deposition.
Notes: Includes bibliographical references and index.