1997 2nd International Symposium on Plasma Process-Induced Damage
Subtitle: 13-14 May 1997, Monterey, California, USA
By: editors, Kim P. Cheung, Moritaka Nakamura, and Calvin T. Gabriel ; technical co-sponsors, IEEE/Electron Devices Society, American Vacuum Society, Japanese Society of Applied Physics.
Contributors: Cheung, Kin P.; Nakamura, Moritaka.; Gabriel, Calvin T.; IEEE Electron Devices Society.; American Vacuum Society.; Ōyō Butsuri Gakkai.
Publisher: Northern California Chapter of the American Vacuum Society
Published: 1997
Place of publication: Sunnyvale, Calif
Language: eng
Number of pages: 259
Subjects: Semiconductor wafers -- Defects -- Congresses.; Semiconductors -- Effect of radiation on -- Congresses.; Plasma etching -- Congresses.
Other titles: P2ID; 2nd International Symposium on Plasma Process-Induced Damage
Notes: Includes bibliographical references and index.
"IEEE catalog no. 97TH8265"--T.p. verso.