Plasma Etching: An Introduction (Plasma : Materials Interactions)
Contributors: Dennis M. Manos (Editor); Daniel L. Flamm (Editor)
Publisher: Academic Press
Published: July 28, 1989
Language: eng
Format: Hardcover
Number of pages: 476
ISBN-13: 9780124693708
Subjects: Technology: General Issues; Science/Mathematics; Electronic Circuits; Technology & Industrial Arts; Engineering - General; Chemistry - Physical & Theoretical; Industrial Technology; Science / Chemistry / Technical & Industrial; Science-Chemistry - Physical & Theoretical; Technology / Industrial Technology; Technology-Engineering - General; Plasma etching
First sentence: The rapid development of plasma etching technology was stimulated by its application to the manufacture of microelectronic devices.