Photomask technology 2008
Subtitle: 7-10 October 2008, Monterey, California, USA
By: Hiroichi Kawahira, Larry S. Zurbrick, editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE
Contributors: Kawahira, Hiroichi; Zurbrick, Larry S.; BACUS (Technical group); SPIE (Society)
Series: Proceedings of SPIE -- v. 7122; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7122.
Publisher: SPIE
Published: 2008
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819473554
Subjects: Congresses; Integrated circuits; Masks; Microlithography
Other titles: Symposium on Photomask Technology.; Annual BACUS Symposium on Photomask Technology.; BACUS Symposium on Photomask Technology.
Notes: Some earlier conferences have the title: Symposium on Photomask Technology, or the title: Annual BACUS Symposium on Photomask Technology, or the title: BACUS Symposium on Photomask Technology.

Includes bibliographical references and author index.