Optical microlithography XXIII
Subtitle: 23-25 February 2010, San Jose, California, United States
By: Mircea V. Dusa, Will Conley, editors ; sponsored and published by SPIE; cooperating organization, SEMATECH Inc. (United States)
Contributors: SPIE (Society); SEMATECH (Organization)
Series: Proceedings of SPIE -- v. 7640; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7640.
Publisher: SPIE
Published: 2010
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819480545
Subjects: Integrated circuits; Congresses; Masks; X-ray lithography; Microlithography; Manufacturing processes
Other titles: Optical microlithography 23; Optical microlithography twenty-three
Notes: Includes bibliographical references and author index.