Emerging lithographic technologies VIII
Subtitle: 24-26 February, 2004, Santa Clara, California, USA
By: R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH.
Contributors: Mackay, R. Scott.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Series: Proceedings of SPIE,; v. 5374; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5374.
Publisher: SPIE
Published: 2004
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 1110
Subjects: Lithography, Electron beam -- Congresses.; Microlithography -- Industrial applications -- Congresses.; X-ray lithography -- Congresses.; X-rays -- Industrial applications -- Congresses.; Masks (Electronics) -- Congresses.
Genres: Congresses.
Other titles: Emerging lithographic technologies 8; Emerging lithographic technologies eight
Notes: Includes bibliographical references and index.