Modeling of chemical vapor deposition of tungsten films
By: Chris R. Kleijn, Christoph Werner.
Contributors: Werner, Christoph, 1949-
Series: Progress in numerical simulation for microelectronics ;; vol. 2
Publisher: Birkhäuser Verlag
Published: 1993
Place of publication: Basel; Boston
Language: eng
Number of pages: 138
Subjects: Semiconductor films -- Mathematical models.; Vapor-plating -- Mathematical models.
Notes: Includes bibliographical references.