EMLC 2005
Subtitle: 21st European Mask and Lithography Conference  : 31 January-3 February, 2005, Dresden, Germany
By: Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI--the Society for Microelectronics, Micro- and Precision Engineering (Germany) [and] Institute for Microstructure Technology/Forschungszentrum Karlsruhe (Germany) ; cooperating organizations, SEMI Europe ... [et al.] ; copublished by, SPIE--the International Society for Optical Engineering and VDE Verlag GmbH (Germany).
Contributors: Behringer, Uwe F. W.; VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik.; Institut für Mikrostrukturtechnik.; Semiconductor Equipment and Materials International, Europe.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE -- v. 5835; Proceedings of SPIE--the International Society for Optical Engineering -- v. 5835.
Publisher: SPIE; VDE Verlag GmbH
Published: 2005
Place of publication: Bellingham, Wash; Berlin, Germany
Language: eng
Number of pages: 302
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.
Genres: Congresses.
Other titles: European Mask and Lithography Conference; European Conference on Mask Technology for Integrated Circuits and Microcomponents; Mask and lithography
Notes: Includes bibliographical references and author index.