Emerging lithographic technologies X
Subtitle: 21-23 February, 2006, San Jose, California, USA
By: Michael J. Lercel, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc (USA).
Contributors: Lercel, Michael J. 1969-; Society of Photo-optical Instrumentation Engineers.; International SEMATECH.
Series: Proceedings of SPIE -- v. 6151; Proceedings of SPIE--the International Society for Optical Engineering -- v. 6151.
Publisher: SPIE
Published: 2006
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819461940
Subjects: Lithography, Electron beam -- Congresses.; Microlithography -- Industrial applications -- Congresses.; X-ray lithography -- Congresses.; X-rays -- Industrial applications -- Congresses.; Masks (Electronics) -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and author index.