Chemical vapor deposition of thin films for diffusion barrier applications
Publisher: Gainesville, FL
Published: 2004
Language: eng
Number of pages: 427
Description: <a href="http://uf.catalog.fcla.edu/uf.jsp?st=UF003100349&ix=nu&I=0&V=D" rel="nofollow">http://uf.catalog.fcla.edu/uf.jsp?st=UF003100349&ix=nu&I=0&V=D</a>