Damage to VUV, EUV, and X-Ray Optics IV ; and, EUV and X-ray Optics: Synergy Between Laboratory and Space III
Subtitle: 15-18 April 2013, Prague, Czech Republic
By: Libor Juha, Saša Bajt, Richard London, René Hudec, Ladislav Pina, editors ; sponsored by SPIE ; cooperating organizations, HiPER Project (United Kingdom), ELI Beamlines (Czech Republic), International Commission For Optics
Contributors: Juha, Libor, editor; Bajt, Saša, editor; London, Richard A., editor; Hudec, R., editor; Pina, Ladislav, editor; SPIE (Society); HiPER (Project); ELI Beamlines (Project); International Commission for Optics; EUV and X-Ray Optics: Synergy Between Laboratory and Space (Conference) (3rd : 2013 : Prague, Czech Republic); SPIE Optics + Optoelectronics (Conference) (2013 : Prague, Czech Republic)
Series: Proceedings of SPIE -- volume 8777; Proceedings of SPIE--the International Society for Optical Engineering -- v. 8777.
Publisher: SPIE
Published: 2013
Place of publication: Bellingham, Washington
Language: eng
ISBN-13: 9780819495792
Subjects: X-Rays; Congresses; Biocompatible Materials; Radiation effects; Electron Probe Microanalysis; Methods; Ultraviolet Microscopy; Ultraviolet Rays
Other titles: EUV and X-ray Optics: Synergy Between Laboratory and Space III; Damage to VUV, EUV, and X-Ray Optics Four; Damage to VUV, EUV, and X-Ray Optics 4
Notes: "SPIE Optics + Optoelectronics"--Cover.

Includes bibliographical references and index.