Photomask technology 2007
Subtitle: 18-21 September, 2007, Monterey, California, USA
By: Robert J. Naber, Hiroichi Kawahira, editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE
Contributors: BACUS (Technical group); Society of Photo-optical Instrumentation Engineers
Series: Proceedings of SPIE -- v. 6730; Proceedings of SPIE--the International Society for Optical Engineering -- v. 6730.
Publisher: SPIE
Published: 2007
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819468871
Subjects: Congresses; Integrated circuits; Masks; Microlithography
Other titles: Symposium on Photomask Technology
Notes: Some earlier conferences have title: Symposium on Photomask Technology.

Includes bibliographical references and author index.