Microlithography and metrology in micromachining
Subtitle: 23-24 October, 1995, Austin, Texas
By: Michael T. Postek, chair/editor ; sponsored by SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology, SPIE--the International Society for Optical Engineering.
Contributors: Postek, Michael T.; Semiconductor Equipment and Materials Institute.; National Institute of Standards and Technology (U.S.); Society of Photo-optical Instrumentation Engineers.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 2640; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 2640.
Publisher: SPIE
Published: 1995
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 246
Subjects: Micromachining -- Congresses; Microlithography -- Congresses; Mensuration -- Congresses
Notes: Includes bibliographic references and author index.