Optical and dimensional-measurement problems with photomasking in microelectronics
By: John M. Jerke.
Series: Semiconductor measurement technology; NBS special publication ; 400-20; NBS special publication ;; 400-20.
Publisher: U.S. Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off.
Published: 1975
Place of publication: Washington
Language: eng
Number of pages: 36
Subjects: Integrated circuits -- Masks.; Photolithography.; Optical measurements.
Notes: Bibliography: p. 31-36.