Characterization of the interactions of hydrogen, nitrogen and oxygen with silicon and III-V semiconductor surfaces
Publisher: Gainesville, FL
Published: 1987
Language: eng
Number of pages: 103
Subjects: Electron-stimulated desorption; Thermal desorption; Silicon; Gases.
Description: <a href="http://uf.catalog.fcla.edu/uf.jsp?st=UF001046277&ix=nu&I=0&V=D" rel="nofollow">http://uf.catalog.fcla.edu/uf.jsp?st=UF001046277&ix=nu&I=0&V=D</a>