Plasma etching and reactive ion etching
By: J.W. Coburn.
Series: American Vacuum Society monograph series
Publisher: American Institute of Physics
Published: 1982
Place of publication: New York, N.Y
Language: eng
Number of pages: 87
Subjects: Semiconductors -- Etching.; Plasma etching.
Other titles: Reactive ion etching.
Notes: Includes bibliographical references.