Introduction to microlithography
Subtitle: theory, materials, and processing
By: L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983.
Contributors: Thompson, L. F., 1944-; Willson, C. G. 1939-; Bowden, M. J., 1943-; American Chemical Society. Division of Organic Coatings and Plastics Chemistry.; American Chemical Society. Meeting
Series: ACS symposium series,; 219
Publisher: The Society
Published: 1983
Place of publication: Washington, D.C
Language: eng
Number of pages: 363
Subjects: Microlithography -- Congresses.; Photoresists -- Congresses.; Plasma etching -- Congresses.; Semiconductors -- Etching -- Congresses.
Notes: Includes bibliographical references and index.
Table of contents: title: An introduction to lithography / L.F. Thompson; title: The lithographic process; title: the physics / L.F. Thompson and M.J. Bowden; title: Organic resist materials; title: theory and chemistry / C. Grant Willson; title: Resist processing / L.F. Thompson and M.J. Bowden; title: Plasma etching / J.A. Mucha and D.W. Hess; title: Multi-layer resist systems / B.J. Lin.