Ion implantation technology
Subtitle: 16th International Conference on Ion Implantation Technology, IIT 2006, Marseille, France, 11-16 June 2006
By: editors, Karen J. Kirkby ... [et al.].
Contributors: Kirkby, Karen J.
Series: AIP conference proceedings -- v. 866; AIP conference proceedings -- no. 866.
Publisher: American Institute of Physics
Published: 2006
Place of publication: Melville, N.Y
Language: eng
Number of pages: 664
ISBN-13: 9780735403659
Subjects: Semiconductors -- Congresses.; Semiconductor doping -- Congresses.
Genres: Congresses.
Other titles: IIT 2006
Notes: Includes bibliographical references and index.
Table of contents: title: Doping processes in semiconductors; title: Cluster implantation in doping; title: PIII and plasma doping; title: Materials : novel techniques and applications; title: Implant technology; title: Implant technology (materials); title: Process control & yield; title: Process control & yield (metrology); title: Materials.