Principles of plasma discharges and materials processing
By: Michael A. Lieberman, Allan J. Lichtenberg.
Contributors: Lichtenberg, Allan J.
Edition: 2nd ed.
Publisher: Wiley-Interscience
Published: 2005
Place of publication: Hoboken, N.J
Language: eng
Number of pages: 757
Subjects: Plasma dynamics.; Thin films -- Surfaces.; Plasma etching.; Plasma chemistry -- Industrial applications.
Notes: Includes bibliographical references (p. 735-748) and index.