2000 5th International Symposium on Plasma Process-Induced Damage
Subtitle: May 22-24, 2000, Santa Clara, California, USA
By: Mitsumasa Koyanagi, Manfred Englehardt, and Calvin T. Gabriel (editors)
Publisher: Northern California Chapter of the American Vacuum Society
Published: 2000
Place of publication: Santa Clara, California
Language: eng
Number of pages: 172
Subjects: Semiconductor wafers -- Congresses.; Semiconductors -- Effect of radiation on -- Congresses.; Plasma radiation -- Congresses.
Genres: Congresses.
Other titles: P²ID; Plasma Process-Induced Damage, 2000 5th International Symposium on.
Description: International Symposium on Plasma Process-Induced Damage (5th 2000 Santa Clara, Calif.)
Notes: Includes bibliographical references and author index.
"P²ID"--Cover.
"IEEE Catalog Number 00TH8479"--T.p. verso.