Advances in silicon carbide chemical vapor deposition (CVD) for semiconductor device fabrication
By: J. Anthony Powell, Jeremy B. Petit, Lawrence G. Matus.
Contributors: Petit, Jeremy B.; Matus, Lawrence G.; United States. National Aeronautics and Space Administration.
Series: NASA technical memorandum -- 104410.
Publisher: National Aeronautics and Space Administration; For sale by the National Technical Information Service
Published: 1991
Place of publication: [Washington, DC]; [Springfield, Va
Language: eng
Format: Microform
Subjects: Silicon carbide.; Superconductors.
Notes: Distributed to depository libraries in microfiche.

Microfiche. [Washington, D.C.? : National Aeronautics and Space Administration], 1991. 1 microfiche.