Modelling Fluid Flow
Subtitle: The State of the Art
By: edited by János Vad, Tamás Lajos, Rudolf Schilling
Contributors: Lajos, Tamás; Schilling, Rudolf
Publisher: Springer Berlin Heidelberg
Published: 2004
Place of publication: Berlin, Heidelberg
Language: eng
Format: [electronic resource] :
Number of pages: 434
ISBN-13: 9783642060342; 9783662087978
Subjects: Engineering; Computer science; Hydraulic engineering
Description: Modelling Fluid Flow presents invited lectures, workshop summaries and a selection of papers from a recent international conference CMFF '03 on fluid technology. The lectures follow the current evolution and the newest challenges of the computational methods and measuring techniques related to fluid flow. The workshop summaries reflect the recent trends, open questions and unsolved problems in the mutually inspiring fields of experimental and computational fluid mechanics. The papers cover a wide range of fluids engineering, including reactive flow, chemical and process engineering, environmental fluid dynamics, turbulence modelling, numerical methods, and fluid machinery.
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Table of contents: title: From the contents: Application of CFD-Techniqes in Fluid Machinery; title: Modelling Separation from Curved Surfaces with Anisotropy-Resolving Turbulance Closures and Related Supplementary Observations on LES; title: Development of Fluid Mechanics Methods in the 20th Century and the Application to Laminar and Turbulent Flow Investigations; title: Theodor Von Kármán: A Global Life; title: Workshop Summaries; title: Workshop on Complex Flows with Chemical Reactions; title: Numerical Modelling of Turbomachinery Fluid Dynamics; title: Challenges in Optimisation of Axial Flow Turbomachinery Blades for 3D Flow, Including Sweep and Dihedral Effects; title: Flows with Chemical Reactions; Chemical and Process Engineering; Environment; External Fluid Dynamics; title: Flame Stabilization of Highly Diffusive Gas Mixtures in Porous Inert Media; title: A Hybrid Approach to Model Combustion Instabilities; title: Modelling of Reaction and Transport in Chemical Vapor Deposition: Predictions of Growth and Uniformity of Tin Oxide Films.