Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II
Subtitle: March 14-15, 1983, Santa Clara, California
By: Phillip D. Blais, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group.
Contributors: Blais, Phillip D.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE--the International Society for Optical Engineering ;; v. 393
Publisher: SPIE
Published: 1983
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 242
Subjects: Lithography, Electron beam.; X-ray lithography.; Ion beam lithography.
Notes: Includes bibliographical references and index.