12th Annual Symposium on Photomask Technology and Management
Subtitle: proceedings : 23-24 September 1992, Sunnyvale, California
By: sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
Contributors: BACUS (Technical group)
Series: SPIE proceedings series ;; v. 1809; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 1809.
Publisher: SPIE--the International Society for Optical Engineering
Published: 1992
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 286
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.
Other titles: Twelfth Annual Symposium on Photomask Technology and Management.
Notes: Includes bibliographical references and index.