Ion implantation
Subtitle: basics to device fabrication
By: by Emanuele Rimini.
Series: The Kluwer international series in engineering and computer science ;; SECS 293.; Electronic materials, science and technology; Kluwer international series in engineering and computer science ;; SECS 293.; Kluwer international series in engineering and computer science.
Publisher: Kluwer Academic Publishers
Published: 1995
Place of publication: Boston
Language: eng
Number of pages: 393
Subjects: Ion implantation; Semiconductor doping; Semiconductors -- Design and construction
Notes: Includes bibliographical references (p. [359]-378) and index.