Measurements of stress during deposition of copper and silver thin films and multilayers
By: a thesis presented by Alison Lee Shull
Published: 1996
Language: eng
Number of pages: 164
Subjects: Thin films; Multilayered Thin films; Metallic films; Surfaces (Physics)
Notes: Thesis (Ph. D.)--Harvard University, 1996.

Includes bibliographical references (leaves [136]-144)