Interferometric metrology of photomask blanks
Subtitle: approaches using 633 nm wavelength
By: C.J. Evans ... [et al.]
Contributors: Evans, C. J; National Institute of Standards and Technology (U.S.)
Series: NISTIR -- 6701
Publisher: U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology
Published: 2000
Place of publication: Gaithersburg, MD
Language: eng
Format: Microform
Number of pages: 11
Subjects: Interferometry; Photolithography; Optical measurements; Optical instruments -- Testing
Description: "The purpose of this report is to describe interferometric measurements of photomask blanks that could be made at the National Institute of Standards and Technology (NIST) using existing equipment without the use of coatings which must subsequently be removed"--P. 2
Notes: "December 21, 2000."

Shipping list no.: 2003-0057-M

Includes bibliographical references (p. 10-11)

Microfiche. [Washington, D.C.] : Supt. of Docs., U.S. G.P.O., 2002. 1 microfiche : negative.