Use of photostress to analyze behavior of an aft skirt test specimen
By: prepared by S.C. Gambrell, Jr.
Contributors: United States. National Aeronautics and Space Administration.
Series: BER report -- no. 607-97.; [NASA contractor report] -- NASA CR-195850.
Publisher: The University of Alabama, College of Engineering, Bureau of Engineering Research; National Aeronautics and Space Administration; National Technical Information Center, distributor
Published: 1994
Place of publication: Tuscaloosa, Ala; [Washington, DC; Springfield, Va
Language: eng
Format: Microform
Subjects: Photoelastic analysis.; Photostresses.; Skirts.; Space shuttle boosters.; Strain distribution.; Stress analysis.; Welded joints.
Notes: Distributed to depository libraries in microfiche.

Shipping list no.: 94-0865-M.

Microfiche. [Washington, D.C. : National Aeronautics and Space Administration, 1994] 3 microfiches.