Metrology, inspection, and process control for microlithography XI
Subtitle: 10-12 March, 1997, Santa Clara, California
By: Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Contributors: Jones, Susan K.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipmant and Materials International.; SEMATECH (Organization)
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 3050; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3050.
Publisher: SPIE
Published: 1997
Place of publication: Bellingham, Washington
Language: eng
Number of pages: 636
Subjects: Integrated circuits -- Inspection -- Congresses.; Integrated circuits -- Measurement -- Congresses.; Microlithography -- Congresses.; Process control -- Congresses.
Notes: Includes bibliographic references and author index.