19th Annual Symposium on Photomask Technology
Subtitle: 15-17 September 1999, Monterey, California
By: Frank E. Abboud, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
Contributors: Abboud, Frank E.; Grenon, Brian J.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
Series: SPIE proceedings series ;; v. 3873; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3873.
Publisher: SPIE
Published: 1999
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 1022
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.
Genres: Congresses.
Other titles: Nineteenth Annual Symposium on Photomask Technology; Symposium on Photomask Technology; Photomask technology
Notes: Includes bibliographical references and index.
Eighteenth conference called: Symposium on Photomask Technology and Management.