Photomask technology 2006
Subtitle: 19-22 September, 2006, Monterey, California, USA
By: Patrick M. Martin, Robert J. Naber, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.
Contributors: Martin, Patrick M.; Naber, Robert J.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
Series: SPIE proceedings series -- v. 6349; Proceedings of SPIE--the International Society for Optical Engineering -- v. 6349.
Publisher: SPIE
Published: 2005
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819464446
Subjects: Integrated circuits -- Masks -- Congresses; Microlithography -- Congresses
Genres: Congresses.
Other titles: Annual BACUS Symposium on Photomask Technology; BACUS Symposium on Photomask Technology; Symposium on Photomask Technology; Photomask technology; Symposium on Photomask Technology and Management.
Notes: "This proceedings volume contains accepted papers from the SPIE conference on Photomask Technology. The conference was arranged through the Bay Area Chrome Users Society (BACUS) and held as part of the 26th International Symposium on Photomask Technology 19-22 September 2006 in Monterey, California, U.S.A.--Intro.

Some earlier conferences have title: Symposium on Photomask Technology and Management.

Includes bibliographical references and author index.