Plasma etching processes for sub-quarter micron devices
Subtitle: proceedings of the International Symposium
By: editor, G.S. Mathad ... [et al.] ; Dielectric Science and Technology and Electronics Divisions [of the Electrochemical Society].
Contributors: Mathad, G. S.; Electrochemical Society. Dielectric Science and Technology Division.; Electrochemical Society. Electronics Division.; International Symposium on Plasma Etching Processes for Sub-Quarter Micron Devices (1999 : Honolulu, Hawaii)
Series: Proceedings -- v. 99-30; Proceedings (Electrochemical Society) -- 99-30.
Publisher: Electrochemical Society.
Published: 2000
Place of publication: Pennington, New Jersey
Language: eng
Number of pages: 378
Subjects: Semiconductors -- Etching -- Congresses.; Plasma etching -- Congresses.; Sputtering (Physics) -- Congresses.
Genres: Congresses.
Notes: "This proceedings volume contains the papers presented at the symposium on Plasma Etching Processes for Sub-Quarter Micron Devices. The symposium ... was held in Honolulu, HI, October 17-22, 1999 ..."--Preface.

Includes bibliographic references and indexes.