Dry etch technology, 9-10 September 1991, San Jose, Calif.
By: Deepak Ranadive, chair.
Contributors: Ranadive, Deepak
Series: Proceedings / SPIE--The International Society for Optical Engineering -- v. 1593; Proceedings of SPIE--the International Society for Optical Engineering. : -- v. 1593
Publisher: SPIE--The International Societyfor Optical Engineering
Published: 1991
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 222
Subjects: Semiconductors -- Etching -- Congresses; Integrated circuits -- Design and construction -- Congresses; Microlithography -- Congresses
Notes: "Sponsored by SPIE--The International Society for Optical Engineering".

Includes bibliographical references.