Optical microlithography II
Subtitle: technology for the 1980s : March 16-17, 1983, Santa Clara, California
By: Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group.
Contributors: Stover, Harry L.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE--the International Society for Optical Engineering ;; v. 394
Publisher: SPIE--the International Society for Optical Engineering
Published: 1983
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 251
Subjects: Microlithography -- Congresses.; Integrated circuits -- Very large scale integration -- Congresses.
Other titles: Optical microlithography 2.; Optical microlithography two.
Notes: Includes bibliographical references and index.