An overview of CVD processes
By: S. Okamoto.
Contributors: United States. National Aeronautics and Space Administration.
Series: NASA technical memorandum -- NASA TM-88450.; NASA technical memorandum -- 88450.
Publisher: National Aeronautics and Space Administration
Published: 1986
Place of publication: Washington DC
Language: eng
Format: Microform
Subjects: Plasma-enhanced chemical vapor deposition.
Notes: Distributed to depository libraries in microfiche.

Microfiche. [Washington, D.C.? : National Aeronautics and Space Administration], 1987. 1 microfiche.