1998 3rd International Symposium on Plasma Process-Induced Damage
Subtitle: June 4-5, 1998, Honolulu, Hawaii, USA
By: Moritaka Nakamura, Thuy Dao, and Terence Hook, editors ; technical co-sponsors, American Vacuum Society, IEEE/Electron Devices Society, Japan Society of Applied Physics.
Contributors: Nakamura, Moritaka.; Dao, Leanne Thuy Lien, 1953-; Hook, Terence.; IEEE Electron Devices Society.; American Vacuum Society.; Ōyō Butsuri Gakkai.
Publisher: Northern California Chapter of the American Vacuum Society
Published: 1998
Place of publication: Sunnyvale, CA
Language: eng
Number of pages: 234
Subjects: Semiconductor wafers -- Defects -- Congresses.; Semiconductors -- Effect of radiation on -- Congresses.; Plasma etching -- Congresses.
Notes: Includes bibliographical references and author index.
"P²ID"--Cover.
"Plasma process-induced damage"--Cover.
"IEEE Catalog Number 98EX100"--Verso of t.p.