Thermal annealing of Mo/Si multilayers to assess the stability relevant to soft x-ray projection lithography
By: by Michael A. Viliardos.
Published: 1992
Language: eng
Number of pages: 44
Subjects: X-ray lithography.; Thin films, Multilayered.; Optical coatings.; Reflectance.; X-ray optics.
Notes: Typescript (photocopy)

Thesis (M.S.)--Oregon State University, 1993.

Includes bibliographical references (leaves 43-44)