Developments in semiconductor microlithography IV
Subtitle: April 23-24, 1979, San Jose, California
By: Jim Dey, editor ; cooperating organization, Northern California Microphotomask/Masking Working Group.
Contributors: Dey, Jim.; Northern California Microphotomask/Masking Working Group.
Series: Proceedings of the Society of Photo-optical Instrumentation Engineers ; v. 174; Proceedings of the Society of Photo-optical Instrumentation Engineers ;; v. 174.
Publisher: Society of Photo-optical Instrumentation Engineers
Published: 1979
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 194
Subjects: Semiconductors -- Congresses.; Microlithography -- Congresses.; Thin film circuits -- Congresses.; Microelectronics -- Congresses.
Notes: Includes bibliographical references and indexes.
Proceedings of a seminar.