Photomask and next-generation lithography mask technology X
Subtitle: 16-18 April, 2003, Yokohama, Japan
By: Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering.
Contributors: Tanabe, Hiroyoshi.; Photomask Japan.; BACUS (Technical group); Ōyō Butsuri Gakkai.; Semiconductor Equipment and Materials International (Japan); Society of Photo-optical Instrumentation Engineers.
Series: SPIE proceedings series ;; v. 5130; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5130.
Publisher: SPIE
Published: 2003
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 1066
Subjects: Masks (Electronics) -- Congresses.; Integrated circuits -- Masks -- Congresses.; X-ray lithography -- Congresses.; Microlithography -- Congresses.; Optoelectronic devices -- Design and construction -- Congresses.
Genres: Congresses.
Other titles: Photomask and X-ray mask technology
Notes: Includes bibliographical references and author index.
Some earlier proceedings have title: Photomask and X-ray mask technology.