Emerging lithographic technologies VII
Subtitle: 25-27 February, 2003, Santa Clara, California, USA
By: Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Contributors: Engelstad, Roxann L.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Series: Proceedings of SPIE ;; v. 5037; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5037.
Publisher: SPIE
Published: 2003
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 1142
Subjects: Lithography, Electron beam -- Congresses.; Microlithography -- Industrial applications -- Congresses.; X-ray lithography -- Congresses.; X-rays -- Industrial applications -- Congresses.; Masks (Electronics) -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and author index.