Process, equipment, and materials control in integrated circuit manufacturing V
Subtitle: 22-23 September, 1999, Santa Clara, California
By: Anthony J. Toprac, Kim Dang, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, the Electrochemical Society ... [et al.].
Contributors: Toprac, Anthony J. 1955-; Dang, Kim.; Society of Photo-optical Instrumentation Engineers.; Electrochemical Society.
Series: SPIE proceedings series ;; v. 3882; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3882.
Publisher: SPIE
Published: 1999
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 310
Subjects: Integrated circuits -- Design and construction -- Congresses.; Plasma etching -- Congresses.; Metallizing -- Congresses.; Dielectric films -- Congresses.; Process control -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and index.