Ultrathin Sio2 and High-K Materials for Ulsi Gate Dielectrics
Subtitle: Symposium Held April 5-8, 1999 San Francisco, California, U.S.A. (Materials Research Society Symposium Proceedings)
Contributors: H. R. Huff (Editor); C. A. Richter (Editor); M. L. Green (Editor); G. Lucovsky (Editor); T. Hattori (Editor)
Publisher: Materials Research Society
Published: September 1999
Language: eng
Format: Hardcover
Number of pages: 615
ISBN-13: 9781558994744
Subjects: Integrated Circuits; Technology; Technology & Industrial Arts; Science/Mathematics; Material Science; Electronics - Circuits - Integrated