Evolution of thin film morphology
Subtitle: modeling and simulations
By: Matthew Pelliccione and Toh-Ming Lu.
Contributors: Lu, T.-M. 1943-
Series: Springer series in materials science -- v. 108
Publisher: Springer
Published: 2008
Place of publication: New York; London
Language: eng
Number of pages: 204
ISBN-13: 9780387751085
Subjects: Thin film devices; Thin films -- Microstructure; Thin films -- Mathematical models; Chemical vapor deposition
Notes: Includes bibliographical references (p. [191]-200) and index.