11th annual Symposium on Photomask Technology
Subtitle: proceedings : September 25-27, 1991, Sunnyvale, California
By: sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
Contributors: BACUS (Technical group)
Series: SPIE proceedings series ;; v. 1604; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 1604.
Publisher: SPIE--the International Society for Optical Engineering
Published: 1992
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 348
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.
Other titles: Eleventh annual Symposium on Photomask Technology.
Notes: Includes bibliographical references and index.