Advances in resist technology and processing VI
Subtitle: 27 February-1 March, 1989, San Jose, California
By: Elsa Reichmanis, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
Contributors: Reichmanis, Elsa, 1953-; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings / SPIE--the International Society for Optical Engineering -- v. 1086; Proceedings of SPIE--the International Society for Optical Engineering -- v. 1086
Publisher: International Society for Optical Engineering
Published: 1989
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 620
Subjects: Photoresists -- Congresses.
Notes: Includes bibliographies and index.