Chemical vapour deposition
Subtitle: precursors, processes and applications
By: edited by Anthony C. Jones, Michael L. Hitchman.
Contributors: Jones, Anthony C.; Hitchman, Michael L.
Publisher: Royal Society of Chemistry
Published: 2009
Place of publication: Cambridge, UK
Language: eng
Number of pages: 582
ISBN-13: 9780854044658
Subjects: Chemical vapor deposition
Other titles: Chemical vapor deposition
Notes: Includes bibliographical references and index.