Alternative lithographic technologies III
Subtitle: 1-3 March 2011, San Jose, California, United States
By: Daniel J.C. Herr, editor ; sponsored and published by SPIE
Contributors: SPIE (Society)
Series: Proceedings of SPIE -- v. 7970; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7970.
Publisher: SPIE
Published: 2011
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819485298
Subjects: Electron beam Lithography; Congresses; Microlithography; Masks (Electronics); Industrial applications; Extreme ultraviolet lithography
Other titles: Alternative lithographic technologies 3; Alternative lithographic technologies three
Notes: "SPIE Advanced Lithography" --cover.

Includes bibliographical references and author index.