Epitaxial growth processes
Subtitle: 26-17 January 1994, Los Angeles, California
By: Chris J. Palmstrøm, Maria C. Tamargo, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, Center for Advanced Technology for Ultrafast Photonic Materials and Applications, City University of New York.
Contributors: Palmstrøm, Chris J.; Tamargo, Maria C.; Society of Photo-optical Instrumentation Engineers.; City University of New York. Center for Advanced Technology for Ultrafast Photonic Materials and Applications.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 2140; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 2140.
Publisher: SPIE
Published: 1994
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 190
Subjects: Epitaxy -- Congresses.; Crystal growth -- Congresses.; Molecular beam epitaxy -- Congresses.; Semiconductors -- Materials -- Congresses.
Notes: Includes bibliographies and index.