24th Annual BACUS Symposium on Photomask Technology
Subtitle: 14-17 September, 2004, Monterey, California, USA
By: Wolfgang Staud, J. Tracy Weed, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.
Contributors: Staud, Wolfgang.; Weed, J., Tracy.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
Series: SPIE proceedings series,; v. 5567; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5567.
Publisher: SPIE
Published: 2004
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 1450
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.
Genres: Congresses.
Other titles: Annual BACUS Symposium on Photomask Technology; BACUS Symposium on Photomask Technology; Symposium on Photomask Technology; Photomask technology; Symposium on Photomask Technology and Management.
Notes: Includes bibliographical references and author index.
Some earlier conferences have title: Symposium on Photomask Technology and Management.