Development of a polysilicon process based on chemical vapor deposition (phase 1 & phase 2)
By: prepared by F. Plahutnik, principal investigator and A. Arvidson, D. Sawyer, and K. Sharp.
Contributors: Hemlock Semiconductor Corporation.; United States. National Aeronautics and Space Administration.
Series: NASA-CR -- 173957.; NASA contractor report -- NASA CR-173957.
Publisher: Hemlock Semiconductor Corporation
Published: 1982
Place of publication: Hemlock, Mich
Language: eng
Format: Microform
Subjects: Silicon alloys.
Notes: At head of title: Final report, 6 October 1979 to 25 June 1982.

"August 1982."

"JPL contract 955533."

"N84-34015"--Microfiche header.

"DOE/JPL 955533-83/7."

"DRL No 125."

"DRD SE-2."

Bibliography: p. 136-138.

Microfiche. [Washington, D.C.? : National Aeronautics and Space Administration, 1984]. 2 microfiches ; 11 x 15 cm.