The chemistry of Metal CVD
By: edited by Toivo Kodas and Mark Hampden-Smith.
Contributors: Kodas, Toivo.; Hampden-Smith, Mark J.
Publisher: VCH
Published: 1994
Place of publication: Weinheim; New York
Language: eng
Number of pages: 530
Subjects: Electronic circuit design; Chemical vapor deposition; Metallic films
Notes: Includes bibliographical references (p. ).