Advances in resist technology and processing XVII
Subtitle: 28 February-1 March, 2000, Santa Clara, USA
By: Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Contributors: Houlihan, Francis M.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Series: SPIE proceedings series -- v. 3999.; Proceedings of SPIE--the International Society for Optical Engineering -- v. 3999.
Publisher: SPIE
Published: 2000
Place of publication: Bellingham, Washington
Language: eng
Number of pages: 1252
ISBN-13: 9780819436177
Subjects: Photoresists -- Congresses; Microlithography -- Congresses
Genres: Congresses.
Notes: Includes bibliographical references and author index.