Surface and interface analysis of microelectronic materials processing and growth
Subtitle: 12-13 October 1989, Santa Clara, California
By: Leonard J. Brillson, Fred H. Pollak, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations: Center for Advanced Electronic Materials Processing/North Carolina State Univrsity, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison, SEMATECH.
Contributors: Brillson, L. J.; Pollak, Fred H.; Society of Photo-optical Instrumentation Engineers.; North Carolina State University. Center for Advanced Electronic Materials Processing.; University of Wisconson-Madison. Engineering Research Center for Plasma-Aided Manufacturing.; SEMATECH (Organization)
Series: SPIE proceedings series -- vol. 1186; Proceedings of SPIE--the International Society for Optical Engineering -- v. 1186.
Publisher: SPIE--the International Society for Optical Engineering
Published: 1990
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 201
Subjects: Microelectronics -- Materials -- Congresses.; Surfaces (Technology) -- Analysis -- Congresses.; Semiconductors -- Materials -- Congresses.
Notes: Includes bibliographical references and index.