Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment 2005
Subtitle: Proceedings Of The International Symposium
Contributors: Evgeni P. Gusev (Editor); Lih-Juann Chen (Editor); Hiroshi Iwai (Editor); Dim-Lee Kwong (Editor); Mehmet C. Ozturk (Editor); Fred Roozeboom (Editor); Paul J. Timans (Editor)
Publisher: Electrochemical Society
Published: June 2005
Language: eng
Format: Hardcover
Number of pages: 634
ISBN-13: 9781566774635
Subjects: Engineering - Electrical & Electronic; Technology; Congresses; Gate array circuits; Materials; Metal oxide semiconductors; Metal oxide semiconductors, Complementary; Science/Mathematics