Materials for microlithography
Subtitle: radiation-sensitive polymers
By: L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor ; based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984.
Contributors: Thompson, L. F., 1944-; Willson, C. G. 1939-; Fréchet, Jean M. J.; American Chemical Society. Division of Polymeric Materials: Science and Engineering.; American Chemical Society. Division of Polymer Chemistry.; American Chemical Society. Meeting
Series: ACS symposium series,; 266
Publisher: The Society
Published: 1984
Place of publication: Washington, D.C
Language: eng
Number of pages: 494
Subjects: Polymers -- Congresses.; Photoresists -- Congresses.; Microlithography -- Materials -- Congresses.; Microelectronics -- Materials -- Congresses.
Other titles: Radiation-sensitive polymers.
Notes: Includes bibliographies and indexes.