A production-compatible microelectronic test pattern for evaluating photomask misalignment
By: T. J. Russell, D. A. Maxwell ; sponsored by the National Bureau of Standards and Advanced Research Projects Agency.
Contributors: Maxwell, Dwight A., joint author.; United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
Series: Semiconductor measurement technology; NBS special publication ; 400-51; NBS special publication ;; 400-51.
Publisher: U.S. Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off.
Published: 1979
Place of publication: Washington
Language: eng
Number of pages: 28
Subjects: Integrated circuits -- Masks -- Testing.
Notes: Includes bibliographical references.