I CAD--can you?
Subtitle: AutoCAD for apparel design and pattern development
By: Nancy H. Steinhaus, Isabelle M. Lott.
Contributors: Lott, Isabelle M.
Edition: 1st ed.
Publisher: PW Publications
Published: 1991
Place of publication: Grand Rapids, Mich
Language: eng
Number of pages: 276
Subjects: AutoCAD.; Dressmaking -- Pattern design -- Computer programs.
Notes: Includes bibliographical references and index.