Advances in resist technology and processing XVIII
Subtitle: 26-28 February, 2001, Santa Clara, [California] USA
By: Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Contributors: Houlihan, Francis M.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Series: SPIE proceedings series ;; v. 4345; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 4345.
Publisher: SPIE
Published: 2001
Place of publication: Bellingham, Washington
Language: eng
Number of pages: 1084
Subjects: Photoresists -- Congresses.; Microlithography -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and author index.