Optical microlithography XIII
Subtitle: 1-3 March, 2000, Santa Clara, [California], USA
By: Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Contributors: Progler, Christopher J.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; SEMATECH (Organization)
Series: SPIE proceedings series ;; v. 4000; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 4000.
Publisher: SPIE
Published: 2000
Place of publication: Bellingham, Washington
Language: eng
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.; X-ray lithography -- Congresses.; Manufacturing processes -- Congresses.
Genres: Congresses.
Notes: Includes bibliographic references and author index.