Electron-beam, X-ray, and ion-beam technology
Subtitle: submicrometer lithographies IX : 7-8 March 1990, San Jose, California
By: Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
Contributors: Resnick, Douglas J.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings / SPIE--the International Society for Optical Engineering -- v. 1089; Proceedings of SPIE--the International Society for Optical Engineering -- v. 1263.
Publisher: SPIE--the International Society for Optical Engineering
Published: 1990
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 344
Subjects: Lithography, Electron beam -- Congresses.; X-ray lithography -- Congresses.; Ion beam lithography -- Congresses.
Other titles: Submicrometer lithographies nine.
Notes: Includes bibliographical references and index.