2003 8th International Symposium on Plasma- and Process-Induced Damage
Subtitle: April 24-25, 2003, Corbeil-Essonnes, France
By: Koji Eriguchi, S. Krishnan, and Terence Hook, editors ; [technical co-sponsors, IEEE/Electron Devices Society, Japanese Society of Applied Physics].
Contributors: Eriguchi, Koji.; Krishnan, S.; Hook, Terence.; IEEE Electron Devices Society; Ōyō Butsuri Gakkai.
Publisher: IEEE
Published: 2003
Place of publication: Pisctaway, N.J
Language: eng
Number of pages: 189
Subjects: Semiconductor wafers -- Congresses.; Semiconductors -- Effect of radiation on -- Congresses.; Plasma radiation -- Congresses.
Genres: Congresses.
Other titles: P²ID; Plasma- and process-induced damage; Plasma process induced-damage
Notes: Some previous Symposia entitled: International Symposium on Plasma Induced-Damage.

"P²ID"--Cover.

"IEEE Catalog Number 03TH8669"--T.p. verso.

Includes bibliographical references and author index.