Chemical vapor deposition modeling for high temperature materials
Subtitle: prepared for 1991 Hall meeting of the Materials Research Society, Boston, Massachusetts, December 2-6, 1991
By: Süleyman A. Gökoǧlu.
Contributors: United States. National Aeronautics and Space Administration.
Series: NASA TM -- 105386.; NASA technical memorandum -- 105386.
Publisher: National Aeronautics and Space Administration; National Technical Information Service, distributor
Published: 1997
Place of publication: [Washington, DC; Springfield, Va
Language: eng
Format: Microform
Subjects: Coating.; Reaction kinetics.; Refractory materials.; Thermochemistry.; Vapor deposition.
Notes: Shipping list no.: 92-1415-M.

Microfiche. [Washington, D.C. : National Aeronautics and Space Administration, 1997] 1 microfiche.