Optical microlithography XVIII
Subtitle: 1-4 March, 2005, San Jose, California, USA
By: Bruce W. Smith, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH.
Contributors: Smith, Bruce W., 1959-; Society of Photo-optical Instrumentation Engineers.; International SEMATECH.
Series: Proceedings of SPIE,; v. 5754; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5754.
Publisher: SPIE
Published: 2005
Place of publication: Bellingham, Wash
Language: eng
Subjects: Microlithography -- Congresses; Integrated circuits -- Masks -- Congresses; X-ray lithography -- Congresses; Manufacturing processes -- Congresses
Genres: Congresses.
Notes: Includes bibliographical references and author index.