Modeling and simulation of CF₄/O₂ microwave plasma afterglows
By: by Amadou Tidiane Camara.
Published: 1997
Language: eng
Number of pages: 87
Subjects: Plasma etching -- Mathematical models.; Afterglow (Physics) -- Mathematical models.
Notes: Typescript (photocopy)

Thesis (M.S.)--Oregon State University, 1998.

Includes bibliographical references (leaves 83-84).