Extreme ultraviolet (EUV) lithography
Subtitle: 22-25 February 2010, San Jose, California, United States
By: Bruno M. La Fontaine, editor ; sponsored by SPIE ; cooperating organization SEMATECH Inc. (United States)
Contributors: SEMATECH (Organization); SPIE (Society)
Series: Proceedings of SPIE -- v. 7636; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7636.
Publisher: SPIE
Published: 2010
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819480507
Notes: "SPIE advanced lithography"--Cover.

Includes bibliographical references and author index.