In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II
Subtitle: 31 May-1 June 2001, Edinburgh, UK
By: Gudrun Kissinger, Larg H. Weiland, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK).
Contributors: Kissinger, Gudrun.; Weiland, Larg H.; Society of Photo-optical Instrumentation Engineers.; Scottish Enterprise.; European Optical Society.; Institution of Electrical Engineers.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 4406; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 4406.
Publisher: SPIE
Published: 2001
Place of publication: Bellingham, Washington
Language: eng
Number of pages: 242
Subjects: Integrated circuits -- Very large scale integration -- Design and construction -- Congresses.; Semiconductors -- Design and construction -- Congresses.; Manufacturing processes -- Congresses.; Microelectronics -- Materials -- Congresses.
Genres: Congresses.
Notes: Includes bibliographic references and author index.