Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI
Subtitle: 11-13 March 1996, Santa Clara, California
By: David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Contributors: Seeger, David E.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; SEMATECH (Organization)
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 2723; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 2723.
Publisher: SPIE
Published: 1996
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 412
Subjects: Integrated circuits -- Masks -- Congresses; Lithography, Electron beam -- Congresses; X-ray lithography -- Congresses; Ion beam lithography -- Congresses
Notes: Includes bibliographic references and index.