Advances in resist technology and processing XVI
Subtitle: Microlithography 1999 : 15-17 March, 1999, Santa Clara, California
By: Will Conley, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Contributors: Conley, Willard.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.
Series: SPIE proceedings series -- v. 3678.; Proceedings of SPIE--the International Society for Optical Engineering -- v. 3678.
Publisher: SPIE
Published: 1999
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 1402
ISBN-13: 9780819431523
Subjects: Photoresists -- Congresses; Microlithography -- Congresses
Genres: Congresses.
Other titles: Microlithography 1999.
Notes: Includes bibliographical references and author index.