Handbook of cleaning for semiconductor manufacturing
Subtitle: fundamentals and applications
By: [edited by] Karen A. Reinhardt, Richard F. Reidy
Publisher: John Wiley & Sons, Inc.
Published: 2011
Place of publication: Salem, Mass; Scrivener; Hoboken, N.J
Language: eng
Number of pages: 590
ISBN-13: 9780470625958; 9781118071748
Subjects: Surfaces; Semiconductors; Cleaning
Notes: Includes bibliographical references and index.
Table of contents: title: Fundamentals. Surface and Colloidal Chemical Aspects of Wet Cleaning / Srini Raghavan, Manish Keswani, Nandini Venkataraman; title: The Chemistry of Wet Cleaning / D. Martin Knotter; title: The Chemistry of Wet Etching / D. Martin Knotter; title: Surface Phenomena: Rinsing and Drying / Karen A. Reinhardt, Richard F. Reidy, John A. Marsella; title: Fundamental Design of Chemical Formulations / Robert J. Rovito, Michael B. Korzenski, Ping Jiang, Karen A. Reinhardt; title: Filtering, Recirculating, Reuse, and Recycling of Chemicals / Barry Gotlinsky, Kevin T. Pate, Donald C. Grant; title: Applications. Cleaning Challenges of High-k/Metal Gate Structures / Muhammad M. Hussain, Denis Shamiryan, Vasile Paraschiv, Kenichi Sano, Karen A. Reinhardt; title: High Dose Implant Stripping / Karen A. Reinhardt, Michael B. Korzenski; title: Aluminum Interconnect Cleaning and Drying / David J. Maloney; title: Low-k/Cu Cleaning and Drying / Karen A. Reinhardt, Richard F. Reidy, Jerome Daviot; title: Corrosion and Passivation of Copper / Darryl W. Peters; title: Germanium Surface Conditioning and Passivation / Sonja Sioncke, Yves J. Chabal, Martin M. Frank; title: Wafer Reclaim / Michael B. Korzenski, Ping Jiang; title: Direct Wafer Bonding Surface Conditioning / Hubert Moriceau, Yannick C. Le Tiec, Frank Fournel, Ludovic F. L. Ecarnot, Sebastien L. E. Kerdil̈s, Daniel Delprat, Christophe Maleville; title: New Directions. Novel Analytical Methods for Cleaning Evaluation / Chris M. Sparks, Alain C. Diebold; title: Stripping and Cleaning for Advanced Photolithography Applications / John A. Marsella, Dana L. Durham, Leslie D. Molnar.