Simulation of deposition processes with PECVD apparatus
By: editors, Juergen Geiser and Meraa Arab
Publisher: Nova Science Publishers
Published: 2011
Place of publication: Hauppauge, N.Y
Language: eng
ISBN-13: 9781621003656
Subjects: Mathematical models; Computer simulation; Plasma-enhanced chemical vapor deposition
Notes: Includes bibliographical references and index.