Developments in semiconductor microlithography II
Subtitle: [seminar], April 4-5, 1977, San Jose, California
By: James W. Giffin, Bruce Ruff, editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with the International Society for Hybrid Microelectronics.
Contributors: Giffin, James W.; Ruff, Bruce.; Society of Photo-optical Instrumentation Engineers.; Northern California Microphotomask/Masking Working Group.; International Society for Hybrid Microelectronics.
Series: Proceedings of the Society of Photo-optical Instrumentation Engineers ; v. 100; Proceedings of the Society of Photo-optical Instrumentation Engineers ;; v. 100.
Publisher: SPIE
Published: 1977
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 176
Subjects: Semiconductors -- Congresses.; Microlithography -- Congresses.
Notes: Includes bibliographical references and indexes.