Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III
Subtitle: March 15-16, 1984, Santa Clara, California
By: Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
Contributors: Wagner, Alfred, 1950-; International Society for Hybrid Microelectronics.
Series: Proceedings of SPIE--the International Society for Optical Engineering ;; v. 471
Publisher: SPIE--the International Society for Optical Engineering
Published: 1984
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 136
Subjects: X-ray lithography -- Congresses.; Lithography, Electron beam -- Congresses.; Ion beam lithography -- Congresses.