Advances in resist materials and processing technology XXVI
Subtitle: 23-25 February 2009, San Jose, California, United States
By: Clifford L. Henderson, editor ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)
Contributors: SPIE (Society); International SEMATECH
Series: Proceedings of SPIE -- v. 7273; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7273.
Publisher: SPIE
Published: 2009
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819475268
Subjects: Photoresists; Congresses; Microlithography
Other titles: Advances in resist materials and processing technology 26; Advances in resist materials and processing technology twenty six
Notes: Includes bibliographical references and index.