Advances in resist technology and processing XXI
Subtitle: 23-24 February 2004, Santa Clara, California, USA
By: John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.
Contributors: Sturtevant, John L.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Series: SPIE proceedings series,; v. 5376; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5376.
Publisher: SPIE
Published: 2004
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 1288
Subjects: Photoresists -- Congresses.; Microlithography -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and index.