Computational lithography
By: Xu Ma and Gonzalo R. Arce.
Contributors: Arce, Gonzalo R.
Series: Wiley series in pure and applied optics
Publisher: Wiley
Published: 2010
Place of publication: Hoboken, N.J
Language: eng
Number of pages: 226
ISBN-13: 9780470596975
Subjects: Microlithography -- Mathematics; Integrated circuits -- Design and construction -- Mathematics; Photolithography -- Mathematics; Semiconductors -- Etching -- Mathematics; Resolution (Optics)
Description: A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting.
Notes: Includes bibliographical references and index.