Ion bombardment and ion-assisted etching in rf discharges
By: Albert Manenschijn
Contributors: Technische Universiteit Delft
Publisher: Technische Universiteit Delft
Published: 1991
Place of publication: Delft, Netherlands
Language: eng
Number of pages: 147
Subjects: Etching; Ion bombardment; Plasma etching
Notes: Summary also in Dutch; epilogue and vita in Dutch.

Thesis (doctoral)--Technische Universiteit Delft, 1991.

Includes bibliographical references.