Plasma processing XIII
Subtitle: proceedings of the International Symposium
By: editor G.S. Mathad, et.al.; [sponsored by Dielectric Science & Technology and Electronics Divisions of the Electrochemical Society].
Contributors: Mathad, G. S.; Electrochemical Society. Dielectric Science and Technology Division.; Electrochemical Society. Electronics Division.; Electrochemical Society. Meeting
Series: Proceedings -- v. 2000-6; Proceedings (Electrochemical Society) -- 2000-6.
Publisher: Electrochemical Society.
Published: 2000
Place of publication: Pennington, New Jersey
Language: eng
Number of pages: 394
Subjects: Semiconductors -- Etching -- Congresses.; Plasma etching -- Congresses.
Genres: Congresses.
Notes: "This proceedings volume contains the papers presented at the thirteenth symposium on Plasma Processing ... held as part of the 197th meeting of the Electrochemical Society, Inc. in Toronto, Canada, May 14-19, 2000."--Preface.

Includes bibliographical references and indexes.