Introduction to microlithography
By: edited by Larry F. Thompson, C. Grant Willson, Murrae J. Bowden.
Contributors: Thompson, L. F., 1944-; Willson, C. G. 1939-; Bowden, M. J., 1943-
Edition: 2nd ed.
Series: ACS professional reference book
Publisher: American Chemical Society
Published: 1994
Place of publication: Washington, DC
Language: eng
Number of pages: 527
Subjects: Microlithography -- Congresses.; Photoresists -- Congresses.; Plasma etching -- Congresses.; Semiconductors -- Etching -- Congresses.
Notes: Includes bibliographical references and index.
Table of contents: title: An introduction to lithography / Larry F. Thompson; title: The lithographic process / Murrae J. Bowden; title: Organic resist materials / C. Grant Willson; title: Resist processing / Larry Thompson; title: Plasma etching / J.A. Mucha, D.W. Hess, and E.S. Aydil.