Proceedings of the Fifth International Symposium of Process Physics and Modeling in Semiconductor Technology
By: editors, C.S. Murthy, G.R. Srinivasan, S.T. Dunham ; Electronics Division [of the Electrochemical Society].
Contributors: Murthy, C. S.; Srinivasan, G. R.; Dunham, S. T.; Electrochemical Society. Electronics Division.; Electrochemical Society. Meeting
Series: Proceedings ;; v. 99-2; Proceedings (Electrochemical Society) ;; v. 99-2.
Publisher: Electrochemical Society
Published: 1999
Place of publication: Pennington, New Jersey
Language: eng
Number of pages: 229
Subjects: Semiconductors -- Mathematical models -- Congresses.; Crystals -- Defects -- Mathematical models -- Congresses.; Ion implantation -- Mathematical models -- Congresses.
Genres: Congresses.
Other titles: Process physics and modeling in semiconductor technology; Process physics and modeling in semiconductor technology
Notes: Includes bibliographic references and indexes.
"This Proceedings Volume contains papers that were presented at the Fifth International Symposium on Process Physics and Modeling in Semiconductor Technology held in Seattle, Washington, May 5-6, 1999, as part of the Spring [195th] Meeting of the Electrochemical Society."--Preface.