Hard surface photomasks with micron and submicron linewidths
By: D. R. Ciarlo, W. C. Herrmann, Lawrence Livermore Laboratory
Contributors: Herrmann, W. C., joint author; United States. Dept. of Energy; Lawrence Livermore Laboratory
Series: UCID ; 18491
Publisher: Dept. of Energy, Lawrence Livermore Laboratory; for sale by the National Technical Information Service]
Published: 1979
Place of publication: [Livermore, Calif.]; [Springfield, Va
Language: eng
Number of pages: 18
Subjects: Photography -- Masking
Notes: Prepared for U.S. Department of Energy under contract W-7405-Eng-48

Dec. 18, 1979