Developments in semiconductor microlithography
Subtitle: [seminar] : June 1-3, 1976, San Jose, California
By: Donald E. Routh ... [et al.] editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with National Aeronautics and Space Administration, International Society for Hybrid Microelectronics.
Contributors: Routh, Donald E.; Society of Photo-optical Instrumentation Engineers.; Northern California Microphotomask/Masking Working Group.
Series: Proceedings of the Society of Photo-optical Instrumentation Engineers ; v. 80; Proceedings of the Society of Photo-optical Instrumentation Engineers ;; v. 80.
Publisher: SPIE
Published: 1976
Place of publication: Palos Verdes Estates, Calif
Language: eng
Number of pages: 146
Subjects: Semiconductors -- Congresses.; Microlithography -- Congresses.
Notes: Includes bibliographical references and indexes.