Effect of argon and hydrogen on deposition of silicon from tetrachlorosilane in cold plasmas
By: R.R. Manory, R. Avni and A. Grill.
Contributors: Avni, Reuven.; Grill, Alfred.; United States. National Aeronautics and Space Administration.
Series: NASA technical memorandum -- 87219.
Publisher: National Aeronautics and Space Administration; For sale by the National Technical Information Service
Published: 1986
Place of publication: [Washington, D.C.]; [Springfield, Va
Language: eng
Format: Microform
Subjects: Low temperature plasmas.; Silicon.
Notes: Distributed to depository libraries in microfiche.

Microfiche. [Washington, D.C.? : National Aeronautics and Space Administration], 1986. 1 microfiche.