Photomask and next-generation lithography mask technology VII
Subtitle: 12-13 April 2000, Yokohama, Japan
By: Hiroaki [i.e. Hiraoki] Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan.
Contributors: Morimoto, Hiraoki.; Photomask Japan.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.; Ōyō Butsuri Gakkai.; Seimitsu Kōgakkai.; Denki Gakkai (1888); Semiconductor Equipment and Materials International (Japan)
Series: SPIE proceedings series ;; v. 4066; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 4066.
Publisher: SPIE
Published: 2000
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 750
Subjects: Masks (Electronics) -- Congresses; Integrated circuits -- Masks -- Congresses; X-ray lithography -- Congresses; Microlithography -- Congresses; Optoelectronic devices -- Design and construction -- Congresses
Genres: Congresses.
Other titles: Photomask and next generation lithography mask technology VII; Photomask and x-ray mask technology.
Notes: Includes bibliographical references and index.
Earlier proceedings have title:  Photomask and X-ray mask technology.