Pulsed rf plasma source for materials processing
By: by Abutaher Mohammad Nasiruddin.
Published: 1991
Language: eng
Number of pages: 118
Subjects: Plasma engineering.; Plasma etching.
Notes: Typescript.

Thesis (Ph. D.)--Washington State University, 1991.

Includes bibliographical references (leaves 111-118).

WSU:Another copy on microfilm, no. 6987.

WSU:"School of Electrical Engineering and Computer Science."