Optical microlithography XX
Subtitle: 27 February - 2 March 2007, San Jose, California, USA
By: Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc..
Contributors: Society of Photo-optical Instrumentation Engineers; SEMATECH, Inc
Series: Proceedings of SPIE -- v. 6520; Proceedings of SPIE--the International Society for Optical Engineering -- v. 6520.
Publisher: SPIE
Published: 2007
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819466396
Notes: Includes bibliographical references and author index.