Optical microlithography X
Subtitle: 12-14 March, 1997, Santa Clara, California
By: Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Contributors: Fuller, Gene E.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; SEMATECH (Organization)
Series: SPIE proceedings series ;; v. 3051; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3051.
Publisher: SPIE
Published: 1997
Place of publication: Bellingham, Washington
Language: eng
Number of pages: 982
Subjects: Microlithography -- Congresses.; Integrated circuits -- Masks -- Congresses.; X-ray lithography -- Congresses.; Manufacturing processes -- Congresses.
Other titles: Optical microlithography 10; Optical microlithography ten
Notes: Includes bibliographic references and author index.