Modelling of Microfabrication Systems
By: by Raja Nassar, Weizhong Dai
Contributors: Dai, Weizhong
Series: Microtechnology and MEMS; Microtechnology and MEMS
Publisher: Springer Berlin Heidelberg
Published: 2003
Place of publication: Berlin, Heidelberg
Language: eng
Format: [electronic resource] /
Number of pages: 269
ISBN-13: 9783642055362; 9783662087923
Subjects: Engineering; Numerical analysis; Electronics; Nanotechnology
Description: This book addresses modeling of systems that are important to the fabrication of three-dimensional microstructures. Selected topics are ion beam micromachining, x-ray lithography, laser chemical vapor deposition, photopolymerization, laser ablation, and thin films. Models simulating the behavior of these systems are presented, graphically illusratted, and discussed in the light of experimental results. Knowledge gained from such models is essential for system operation and optimization. This book is unique in that it focuses on high aspect ratio microtechnology. It will be invaluable to scientists, engineers, graduate students, and manufacturers engaged in research and development for enhancing the accuracy and precision of microfabrication systems for commercial applications.
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Mode of access: World Wide Web.
Table of contents: title: Ion Beam; title: X-ray Lithography; title: Laser Chemical Vapor Deposition; title: Laser Photopolymerization; title: Laser Photoablation; title: Thin Films.