Photomask and next-generation lithography mask technology VIII
Subtitle: 25-27 April 2001, Yokohama, Japan
By: Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; supported by Yokohama City.
Contributors: Kawahira, Hiroichi.; Photomask Japan.; BACUS (Technical group); Ōyō Butsuri Gakkai.; Society of Photo-optical Instrumentation Engineers.
Series: SPIE proceedings series ;; v. 4409; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 4409.
Publisher: SPIE
Published: 2001
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 738
Subjects: Masks (Electronics) -- Congresses.; Integrated circuits -- Masks -- Congresses.; X-ray lithography -- Congresses.; Microlithography -- Congresses.; Optoelectronic devices -- Design and construction -- Congresses.
Genres: Congresses.
Other titles: Photomask and X-ray mask technology.
Notes: Includes bibliographical references and index.
Some earlier proceedings have title: Photomask and X-ray mask technology.