Optical/laser microlithography VIII
Subtitle: 22-24 February 1995, Santa Clara, California
By: Timothy A. Brunner, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Contributors: Brunner, Timothy A.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.
Series: Proceedings / SPIE--the International Society for Optical Engineering -- v. 2440; Proceedings of SPIE--the International Society for Optical Engineering -- v. 2440.
Publisher: SPIE
Published: 1995
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 948
Subjects: Microlithography -- Congresses; Masks (Electronics) -- Congresses; Photoresists -- Congresses; Microlithography -- Computer simulation -- Congresses; Lenses -- Design and construction -- Congresses
Other titles: Optical laser microlithography VIII; Optical/laser microlithography 8; Optical/laser microlithography eight
Notes: Includes bibliographical references and index.