Process and materials characterization and diagnostics in IC manufacturing
Subtitle: 27-28 February 2003, Santa Clara, California, USA
By: Kenneth W. Tobin, Jr., Iraj Emami, chairs/editors ; sponsored ... by SPIE--the International Society for Optical Engineering.
Contributors: Tobin, Kenneth W.; Emami, Iraj.; Society of Photo-optical Instrumentation Engineers.
Series: SPIE proceedings series,; v. 5041; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5041.
Publisher: SPIE
Published: 2003
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 222
Subjects: Integrated circuits -- Design and construction -- Congresses.; Integrated circuits -- Defects -- Analysis -- Congresses.; Semiconductors -- Design and construction -- Congresses.; Semiconductor wafers -- Defects -- Analysis -- Congresses.; Integrated circuits industry -- Quality control -- Congresses.; Quality control -- Congresses.
Genres: Congresses.
Other titles: Design, process integration, and characterization for microelectronics.
Notes: Includes bibliographical references and index.
Earlier conference called: Design, process integration, and characterization for microelectronics.