Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV
Subtitle: 28 February-1 March 1994, San Jose, California
By: David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Contributors: Patterson, David O.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 2194; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 2194.
Publisher: SPIE
Published: 1994
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 420
Subjects: Lithography, Electron beam -- Congresses.; X-ray lithography -- Congresses.; Ion beam lithography -- Congresses.; Semiconductors -- Etching -- Congresses.; Masks (Electronics) -- Congresses.
Notes: Includes bibliographical references and index.