Electromigration behavior of a multi-layer metallization
By: Edgar Arthur Schönbächler
Contributors: Eidgenössische Technische Hochschule Zürich
Published: 1998
Language: eng
Subjects: Semiconductors; Design and construction; Thin films; Electric properties; Electrodiffusion; Microstructure; Metallizing
Notes: Thesis (doctoral)--Swiss Federal Institute of Technology Zurich, 1998.