Design and process integration for microelectronic manufacturing II [sic]
Subtitle: 26-27 February 2004, Santa Clara, California, USA
By: Lars W. Liebmann, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.
Contributors: Liebmann, Lars W.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Series: SPIE proceedings series,; v. 5379; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5379.
Publisher: SPIE
Published: 2004
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 302
Subjects: Integrated circuits -- Design and construction -- Congresses.; Integrated circuits -- Defects -- Analysis -- Congresses.; Semiconductors -- Design and construction -- Congresses.; Semiconductor wafers -- Defects -- Analysis -- Congresses.; Microelectronics industry -- Quality control -- Congresses.; Quality control -- Congresses.
Genres: Congresses.
Other titles: Design and process integration for microelectronic manufacturing III
Notes: Includes bibliographical references and index.
2004 conference is the third conference in the series.