Interlaboratory study on linewidth measurements for antireflective chromium photomasks
By: John M. Jerke, M. Carroll Croarkin, Ruth N. Varner.
Contributors: Croarkin, Carroll.; Varner, Ruth N.
Series: NBS special publication -- 400-74; Semiconductor measurement technology
Publisher: National Bureau of Standards
Published: 1982
Place of publication: Washington, D.C
Language: eng
Notes: Sponsored jointly by NBS and the Defense Advanced Research Projects Agency, Arlington, VA.