Photoelasticity
Subtitle: proceedings of the international symposium held at Illinois Institute of Technology, Chicago, October 1961
By: edited by M. M. Frocht.
Contributors: Frocht, Max Mark.
Publisher: Pergamon
Published: 1963
Place of publication: Oxford
Language: eng
Number of pages: 294
Notes: Sponsored by U.S. Army ResearchOffice (Durham), National Science Foundation and Illinois Institute of Technology.

Includes index.

Cover title: Symposium on photoelasticity.