Alternative lithographic technologies II
Subtitle: 23-25 February 2010, San Jose, California, United States
By: Daniel J.C. Herr, editor ; sponsored by SPIE; cooperating organization, SEMATECH Inc
Contributors: SPIE (Society); SEMATECH (Organization)
Series: Proceedings of SPIE -- v. 7637; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7637.
Publisher: SPIE
Published: 2010
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819480514
Other titles: Alternative lithographic technologies 2; Alternative lithographic technologies two
Notes: Includes bibliographical references.