Optical microlithography XXII
Subtitle: 24-27 February 2009, San Jose, California, United States
By: Harry J. Levinson, Mircea V. Dusa, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)
Contributors: SPIE (Society); International SEMATECH
Series: Proceedings of SPIE -- v. 7274; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7274.
Publisher: SPIE
Published: 2009
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819475275
Subjects: Integrated circuits; Congresses; Masks; X-ray lithography; Microlithography; Manufacturing processes
Notes: Includes bibliographical references and author index.