Metrology, inspection, and process control for microlithography XII
Subtitle: 23-25 February 1998, Santa Clara, California
By: Bhanwar Singh, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH.
Contributors: Singh, Bhanwar.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; SEMATECH (Organization)
Series: SPIE proceedings series ;; v. 3332; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3332.
Publisher: SPIE
Published: 1998
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 744
Subjects: Integrated circuits -- Inspection -- Congresses.; Integrated circuits -- Measurement -- Congresses.; Microlithography -- Congresses.; Process control -- Congresses.
Notes: Includes bibliographical references and index.