EMLC 2006
Subtitle: 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany
By: Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology ... [et al.] ; published by SPIE--the International Society for Optical Engineering.
Contributors: Behringer, Uwe F. W.; VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE -- v. 6281; Proceedings of SPIE--the International Society for Optical Engineering -- v. 6281.
Publisher: SPIE
Published: 2006
Place of publication: Bellingham, Wash
Language: eng
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.
Genres: Congresses.
Other titles: European Mask and Lithography Conference; European Conference on Mask Technology for Integrated Circuits and Microcomponents; 22nd European Mask and Lithography Conference
Notes: Includes bibliographical references and author index.