1996 1st International Symposium on Plasma Process-Induced Damage
Subtitle: 13-14 May 1996, Santa Clara, California, USA
By: Kim P. Cheung, Moritaka Nakamura, and Calvin T. Gabriel, editors ; technical co-sponsors, IEEE/Electron Devices Society, American Vacuum Society, Japanese Society of Applied Physics.
Contributors: Cheung, Kin P.; Nakamura, Moritaka.; Gabriel, Calvin T.; IEEE Electron Devices Society.; American Vacuum Society.; Ōyō Butsuri Gakkai.
Publisher: Northern California Chapter of the American Vacuum Society
Published: 1996
Place of publication: Sunnyvale, CA
Language: eng
Number of pages: 237
Subjects: Semiconductor wafers -- Congresses.; Semiconductors -- Effect of radiation on -- Congresses.; Plasma radiation -- Congresses.
Notes: Includes bibliographical references and index.
"IEEE catalog no. 96TH8142"--T.p. verso.