Ion-solid interactions
Subtitle: fundamentals and applications
By: Michael Nastasi, James W. Mayer, and James K. Hirvonen.
Contributors: Mayer, James W., 1930-; Hirvonen, J. K. 1943-
Series: Cambridge solid state science series
Publisher: Cambridge University Press
Published: 1996
Place of publication: Cambridge; New York
Language: eng
Number of pages: 540
Subjects: Solids -- Effect of radiation on.; Ion bombardment.; Ion implantation -- Industrial applications.
Description: Modern technology depends on materials with precisely controlled properties. Ion beams are a favored method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition, in integrated circuit technology, ion beams are used to modify the mechanical, tribological, and chemical properties of metal, intermetallic, and ceramic materials without altering their bulk properties.

Ion-solid interactions are the foundation that underlies the broad application of ion beams to the modification of materials. This text is designed to cover the fundamentals and applications of ion-solid interactions and is aimed at graduate students and researchers interested in electronic devices, surface engineering, reactor and nuclear engineering, and materials science issues associated with metastable phase synthesis.
Notes: Includes bibliographical references and index.