Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films
By: Pierre A. Steinmann and Talivaldis Spalvins.
Contributors: Spalvins, Talivaldis.; Lewis Research Center.; United States. National Aeronautics and Space Administration. Scientific and Technical Information Division.
Series: NASA technical paper -- 2994.
Publisher: National Aeronautics and Space Administration, Office of Management, Scientific and Technical Information Division; For sale by the National Technical Information Service
Published: 1990
Place of publication: [Washington, D.C.]; Springfield, Va
Language: eng
Format: Microform
Subjects: Coatings.; Lubrication and lubricants.; Molybdenum compounds.; Sputtering (Physics); Deposition.; Lubricants.; Magnetron sputtering.; Morphology.; Radio frequencies.; Stoichiometry.; Thin films.
Notes: Shipping list no.: 1990-0871-M.

Distributed to depository libraries in microfiche.

Prepared at Lewis Research Center.

"April 1990."

Bibliography: p. 3.

Also available via Internet from the NTRS web site. Address as of 3/23/06: http://ntrs.nasa.gov/archive/nasa/casi.ntrs.nasa.gov/19900011894%5F1990011894.pdf; current access is available via PURL.

Microfiche. [Washington, D.C. : National Aeronautics and Space Administration,] 1990. 1 microfiche.