Metrology, inspection, and process control for microlithography XVIII
Subtitle: 23-26 February, 2004, Santa Clara, California, USA
By: Richard M. Silver, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.
Contributors: Silver, Richard M.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Series: SPIE proceedings series ;; v. 5375; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5375.
Publisher: SPIE
Published: 2004
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 1398
Subjects: Integrated circuits -- Inspection -- Congresses.; Integrated circuits -- Measurement -- Congresses.; Microlithography -- Congresses.; Process control -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and author index.