Process, equipment, and materials control in integrated circuit manufacturing II
Subtitle: 16-17 October 1996, Austin, Texas
By: Armando Iturralde, Te-Hua Lin, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ... [et al.].
Contributors: Iturralde, Armando.; Lin, Te-Hua.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 2876; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 2876.
Publisher: SPIE
Published: 1996
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 258
Subjects: Integrated circuits -- Design and construction -- Congresses.; Plasma etching -- Congresses.; Metallizing -- Congresses.; Dielectric films -- Congresses.
Notes: Includes bibliographic references and author index.