Rapid isothermal processing
Subtitle: 12-13 October 1989, Santa Clara, California
By: Rajendra Singh, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison, SEMATECH.
Contributors: Singh, Rajendra, 1946-; Society of Photo-optical Instrumentation Engineers.; North Carolina State University. Center for Advanced Electronic Materials Processing.; University of Wisconsin--Madison. Engineering Research Center for Plasma-Aided Manufacturing.; SEMATECH (Organization)
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 1189; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 1189.
Publisher: SPIE
Published: 1989
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 204
Subjects: Semiconductors -- Heat treatment -- Congresses.; Semiconductor doping -- Congresses.; Vapor plating -- Congresses.
Notes: Includes bibliographical references and index.