Development of a polysilicon process based on chemical vapor deposition of dichlorosilane in an advanced Siemen's reactor
Subtitle: final report covering period October 11, 1982 to May 21, 1983
By: Arvid N. Arvidson, principal investigator ; David H. Swayer, David M. Muller.
Contributors: United States. National Aeronautics and Space Administration.
Series: NASA contractor report -- NASA CR-174445.
Publisher: Hemlock Semiconductor Corporation; National Technical Information Service
Published: 1983
Place of publication: Hemlock, Mich; [Springfield, Va
Language: eng
Format: Microform
Subjects: Silicon alloys.; Chemical vapor deposition.
Notes: Distributed to depository libraries in microfiche.

Microfiche. [Washington, D.C. : National Aeronautics and Space Administration, 1985] 1 microfiche.