Metrology, inspection, and process control for microlithography X
Subtitle: 11-13 March, 1996, Santa Clara, California
By: sponsored  and published by SPIE--the International Society for Optical Engineering ; Susan K. Jones, chair/editor.
Contributors: Jones, Susan K.; Society of Photo-optical Instrumentation Engineers.; SPIE Conference on Metrology, Inspection, and Process Control for Microlithography (10th : 1996 : Santa Clara, Calif.)
Series: Proceedings / SPIE--the International Society of Optical Engineering ;; v. 2725; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 2725.
Publisher: SPIE
Published: 1996
Place of publication: Bellingham, WA
Language: eng
Number of pages: 2725
Subjects: Integrated circuits -- Inspection -- Congresses.; Integrated circuits -- Measurement -- Congresses.; Microlithography -- Congresses.
Notes: Includes bibliographical references.
"This volume contains the origianl papers presented at the tenth annual SPIE Conference on Metrology, Inspection, and Process Control for Microlithography"--Introd.