Hard surface photomasks with micron and submicron linewidths
By: D. R. Ciarlo, W. C. Herrmann, Lawrence Livermore Laboratory.
Contributors: Herrmann, W. C.; United States. Dept. of Energy.; Lawrence Livermore Laboratory.
Series: UCID ; 18491; UCID -- 18491.
Publisher: Dept. of Energy, Lawrence Livermore Laboratory; for sale by the National Technical Information Service]
Published: 1979
Place of publication: [Livermore, Calif.]; [Springfield, Va
Language: eng
Number of pages: 18
Subjects: Photography -- Masking.
Notes: Prepared for U.S. Department of Energy under contract W-7405-Eng-48.

Dec. 18, 1979.