Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V
Subtitle: 11-12 March, 1986, Santa Clara, California
By: Phillip D. Blais, chairman/editor.
Contributors: Blais, Phillip D.; International Society for Hybrid Microelectronics.
Series: Proceedings of SPIE--the International Society for Optical Engineering -- v. 632
Publisher: SPIE--the International Society for Optical Engineering
Published: 1986
Place of publication: Bellinham, Wash., USA
Language: eng
Number of pages: 272
Subjects: Lithography, Electron beam -- Congresses; X-ray lithography -- Congresses; Ion beam lithography -- Congresses
Notes: Includes bibliographical references and index.