The results of an interlaboratory study of ellipsometric measurements of thin film silicon dioxide on silicon
By: Barbara J. Belzer and David L. Blackburn.
Contributors: Blackburn, David L.
Series: NBS special publication ;; 400-99.; Semiconductor measurement technology; NBS special publication ;; 400-99.; NBS special publication.
Publisher: U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology; For sale by the Supt. of Docs., U.S. G.P.O.
Published: 1997
Place of publication: Gaithersburg, MD; Washington, DC
Language: eng
Number of pages: 26
Subjects: Thin films -- Measurement.; Ellipsometry.; Semiconductor films -- Measurement.
Notes: Includes bibliographical references (p. 6-7).
"May 1997."