Advanced microlithography technologies
Subtitle: 8-10 November, 2004, Beijing, China
By: Yangyuan Wang, Jun-en Yao, Christopher J. Progler, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, COS--Chinese Optical Society ; cooperating organizations, Australian Optical Society ... [et al.] ; supporting organizations, National Natural Science Foundation of China ... [et al.].
Contributors: Wang, Yangyuan.; Yao, Jun'en.; Progler, Christopher J.; Society of Photo-optical Instrumentation Engineers.; Zhongguo guang xue xue hui.; Australian Optical Society.; Guo jia zi ran ke xue ji jin wei yuan hui (China)
Series: SPIE proceedings series,; v. 5645; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5645.
Publisher: SPIE
Published: 2005
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 380
Subjects: Microlithography -- Congresses.; Integrated circuits -- Masks -- Congresses.; X-ray lithography -- Congresses.; Manufacturing processes -- Congresses.
Genres: Congresses.
Other titles: Microlithography technologies
Notes: Includes bibliographical references and author index.