Characterization of silicon-gate CMOS/SOS integrated circuits processed with ion implantation
By: D.S. Woo ; prepared for George C. Marshall Flight Center
Contributors: George C. Marshall Space Flight Center; Solid State Technology Center (RCA Corporation)
Series: NASA-CR -- 161988; NASA contractor report -- 161988
Publisher: The Center
Published: 1982
Place of publication: Marshall Space Flight Center, AL
Language: eng
Format: Microform
Subjects: Integrated circuits -- Masks
Other titles: Characterization of silicon-gate CMOS/S.O.S. integrated circuits processed with ion implantation
Notes: "Final report for the period 1 September 1979 to 1 September 1980."

"RCA Corporation, Solid State Technology Center."

"January 1982."

"Contract no. NAS8-31986."

"N84-29087"--Microfiche header

Microfiche. [Washington, D.C.? : National Aeronautics and Space Administration, 1984]. 1 microfiche ; 11 x 15 cm