Semi-annual progress report on a study of reactive plasma deposited thin films
By: by Jason Gilchrist (P.I.) ; Elvira Williams (C.I.).
Contributors: Williams, Elvira.; United States. National Aeronautics and Space Administration.
Series: NASA contractor report -- NASA CR-179834.
Publisher: North Carolina Agricultural and Technical State University, Dept. of Physics; National Aeronautics and Space Administration; National Technical Information Service, distributor
Published: 1986
Place of publication: Greensboro, N.C; [Washington, DC; Springfield, Va
Language: eng
Format: Microform
Subjects: Nitrides.; Semiconductor devices.; Thin films.; Vapor deposition.
Other titles: Study of reactive plasma deposited thin films.
Notes: Distributed to depository libraries in microfiche.

Microfiche. [Washington, D.C. : National Aeronautics and Space Administration, 1987] 1 microfiche.