Silicon technologies
Subtitle: ion implantation and thermal treatment
By: edited by Annie Baudrant
Publisher: ISTE; Wiley
Published: 2011
Place of publication: London; Hoboken, NJ
Language: eng
Number of pages: 337
ISBN-13: 9781848212312
Subjects: Semiconductor doping; Semiconductors; Heat treatment; Ion implantation
Description: The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Notes: Includes bibliographical references and index.