Advances in resist technology and processing XII
Subtitle: 20-22 February 1995, Santa Clara, California
By: Robert D. Allen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Contributors: Allen, Robert D.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.
Series: Proceedings / SPIE--the International Society for Optical Engineering -- v. 2438.; Proceedings of SPIE--the International Society for Optical Engineering -- v. 2438.
Publisher: SPIE
Published: 1995
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 904
ISBN-13: 9780819417862
Subjects: Photoresistors -- Congresses; Photoresists -- Congresses
Genres: Congresses.
Notes: Includes bibliographical references and author index.