Optical microlithography XI
Subtitle: 25-27 February, 1998, Santa Clara, California
By: Luc Van den Hove, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Contributors: Van den Hove, Luc.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; SEMATECH (Organization)
Series: SPIE proceedings series ;; v. 3334; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3334.
Publisher: SPIE
Published: 1998
Place of publication: Bellingham, Washington
Language: eng
Number of pages: 1090
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.; X-ray lithography -- Congresses.; Manufacturing processes -- Congresses.
Other titles: Optical microlithography 11; Opticl microlithography eleven
Notes: Includes bibliographical references and author index.