Gate stack and silicide issues in silicon processing II
Subtitle: symposium held April 17-19, 2001, San Francisco, California, U.S.A.
By: editors: S.A. Campbell ... [et al.].
Contributors: Campbell, S. A.
Series: Materials Research Society symposium proceedings -- v. 670; Materials Research Society symposia proceedings -- v. 670.
Publisher: Materials Research Society
Published: 2002
Place of publication: Warrendale, PA
Language: eng
Subjects: Integrated circuits, Ultra large scale integration -- Materials -- Congresses.; Silicides -- Congresses.; Gate array circuits -- Congresses.; Electric leakage -- Congresses.
Genres: Congresses.
Other titles: Gate stack and silicide issues in silicon processing 2; Gate stack and silicide issues in silicon processing two
Notes: Includes bibliographical references and indexes.