Photomask technology 2010
Subtitle: 13-16 September 2010, Monterey, California, United States
By: M. Warren Montgomery, Wilhelm Maurer, editors ; sponsored by BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology
Contributors: BACUS (Technical group); Society of Photo-optical Instrumentation Engineers
Series: SPIE proceedings series -- v. 7823; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7823.
Publisher: Society of Photo-optical Instrumentation Engineers
Published: 2010
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819483379
Subjects: Masks (Electronics); Congresses; Integrated circuits; Masks; Microlithography
Notes: Includes bibliographical references.