In-line characterization techniques for performance and yield enhancement in microelectronic manufacturing
Subtitle: 1-2 October 1997, Austin, Texas
By: Damon K. DeBusk, Sergio Ajuria, chairs/editors ; sponsored and published by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, Solid State Technology, the Electrochemical Society.
Contributors: DeBusk, Damon.; Ajuria, Sergio.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; Solid State Technology (Organization); Electrochemical Society.
Series: SPIE proceedings series,; v. 3215; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3215.
Publisher: SPIE
Published: 1997
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 186
Subjects: Integrated circuits -- Design and construction -- Congresses.; Semiconductors -- Design and construction -- Congresses.; Optical pattern recognition -- Congresses.; Manufacturing processes -- Congresses.
Notes: Includes bibliographical references and author index.