Metrology, inspection, and process control for microlithography XVII
Subtitle: 24-27 February, 2003, Santa Clara, California, USA
By: Daniel J. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.
Contributors: Herr, Daniel J.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Series: SPIE proceedings series ;; v. 5038; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5038.
Publisher: SPIE
Published: 2003
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 1248
Subjects: Integrated circuits -- Inspection -- Congresses.; Integrated circuits -- Measurement -- Congresses.; Microlithography -- Congresses.; Process control -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and author index.