Microlithography and metrology in micromachining II
Subtitle: 14-15 October, 1996, Austin, Texas
By: Michael T. Postek, Craig Friedrich, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology.
Contributors: Postek, Michael T.; Friedrich, Craig.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; National Institute of Standards and Technology (U.S.)
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 2880; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 2880.
Publisher: SPIE
Published: 1996
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 296
Subjects: Micromachining -- Congresses; Microlithography -- Congresses; Mensuration -- Congresses
Notes: Includes bibliographic references and index.