Papers from the First International Workshop on Plasma-Based Ion Implantation
Subtitle: 4-6 August 1993, University of Wisconsin--Madison, Madison, Wisconsin
By: sponsored by Applied Science and Technology (ASTeX), Inc. ... [et al.] ; editors for the workshop, John R. Conrad, Kumar Sridharan.
Contributors: Conrad, John R.; Sridharan, Kumar.; Applied Science and Technology (ASTeX), Inc.
Publisher: Published for the American Vacuum Society by the American Institute of Physics
Published: 1994
Place of publication: New York
Language: eng
Number of pages: 998
Subjects: Ion implantation -- Congresses.
Notes: Includes bibliographical references and index.
"Published in both 1994 March/April issue of the Journal of vacuum science and technology B, vol. 12, no. 2"--T.p. verso.