1999 4th International Symposium on Plasma Process-Induced Damage
Subtitle: May 9-11, 1999, Monterey, California, USA
By: Thuy Dao, Mitsumasa Koyanagi, and Terence Hook, editors ; technical co-sponsors, IEEE/Electron Devices Society, American Vacuum Society, Japanese Society of Applied Physics.
Contributors: Dao, Leanne Thuy Lien, 1958-; Koyanagi, Mitsumasa.; Hook, Terence.; IEEE Electron Devices Society.; American Vacuum Society.; Ōyō Butsuri Gakkai.
Publisher: Northern California Chapter of the American Vacuum Society
Published: 1999
Place of publication: Sunnyvale, CA
Language: eng
Number of pages: 211
Subjects: Semiconductor wafers -- Congresses.; Semiconductors -- Effect of radiation on -- Congresses.; Plasma radiation -- Congresses.
Genres: Congresses.
Other titles: 4th International Symposium on Plasma Process-Induced Damage; Fourth International Symposium on Plasma Process-Induced Damage
Notes: Includes bibliographical references and index.
"IEEE catalog no. 99TH8395"--T.p. verso.