Metrology, inspection, and process control for microlithography XXIII
Subtitle: 23-26 February 2009, San Jose, California, United States
By: John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)
Contributors: SPIE (Society); International SEMATECH
Series: Proceedings of SPIE -- v. 7272; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7272.
Publisher: SPIE
Published: 2009
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819475251
Notes: Includes bibliographical references and index.