Advances in resist technology and processing II
Subtitle: March 11-12, 1985, Santa Clara, California
By: Larry F. Thompson, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
Contributors: Thompson, L. F., 1944-; International Society for Hybrid Microelectronics.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE--the International Society for Optical Engineering -- v. 539.
Publisher: SPIE--the International Society for Optical Engineering
Published: 1985
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 350
Subjects: Photoresists -- Congresses.; Lithography -- Congresses.; Photolithography -- Congresses.
Notes: Includes bibliographies and index.