Resists in microlithography and printing
By: Bohumil Bednář, Jaroslav Králíček, and Jaromír Zachoval ; with contributions by Andrey V. Yelcov and Tatyana A. Yurre.
Contributors: Králíček, Jaroslav.; Zachoval, Jaromír.
Edition: 2nd rev. ed.
Series: Materials science monographs ;; 76
Publisher: Elsevier
Published: 1993
Place of publication: Amsterdam; New York
Language: eng
Number of pages: 376
Subjects: Semiconductors -- Design and construction.; Integrated circuits -- Very large scale integration -- Design and construction.; Microlithography.; X-ray lithography.; Lithography, Electron beam.
Notes: Includes bibliographical references and index.
Translation of: Litografické techniky.