Metrology, inspection, and process control for microlithography XXI
Subtitle: 26 February- 1 March 2007, San Jose, California, USA
By: Chas N. Archie, editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH (USA)
Contributors: Society of Photo-optical Instrumentation Engineers; International SEMATECH
Series: Proceedings of SPIE -- v. 6518
Publisher: SPIE
Published: 2007
Place of publication: Bellingham, Wash
Language: eng
Format: Electronic resource
ISBN-13: 9780819466372
Other titles: SPIE digital library.
Notes: Includes bibliographical references and author index.

Also available in print.

Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2007. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.