Electron-beam, X-ray, and ion-beam technology
Subtitle: submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California
By: Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
Contributors: Yanof, Arnold W.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE--the International Society for Optical Engineering ;; v. 923
Publisher: The Society
Published: 1988
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 307
Subjects: Lithography, Electron beam -- Congresses.; X-ray lithography -- Congresses.; Ion beam lithography -- Congresses.
Notes: Includes bibliographies and index.