Photomask technology 2011
Subtitle: 19-22 September 2011, Monterey, California, United States
By: Wilhelm Maurer, Frank E. Abboud, editors ; sponsored by BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology [and] SPIE
Contributors: BACUS (Technical group); SPIE (Society)
Series: Proceedings of SPIE -- v. 8166; Proceedings of SPIE--the International Society for Optical Engineering -- v. 8166.
Publisher: SPIE
Published: 2011
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819487919
Subjects: Masks (Electronics); Congresses; Integrated circuits; Masks; Microlithography
Notes: Includes bibliographical references and index.