Photomask and next-generation lithography mask technology XVI
Subtitle: 8-10 April 2009, Yokohama, Japan
By: Kunihiro Hosono, editor ; sponsored by PMJ Photomask Japan, BACUS [and] SPIE
Contributors: Photomask Japan; BACUS (Technical group); SPIE (Society)
Series: Proceedings of SPIE -- v. 7379; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7379.
Publisher: SPIE
Published: 2009
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819476562
Subjects: Masks (Electronics); Congresses; Integrated circuits; Masks; X-ray lithography; Microlithography; Optoelectronic devices; Design and construction
Notes: Includes bibliographical references and author index.