Plasma processing
Subtitle: proceedings of the Symposium on Plasma Etching and Deposition
By: edited by R.G. Frieser, C.J. Mogab ; [sponsored by] Dielectrics and Insulation and Electronics Divisions.
Contributors: Frieser, R. G.; Mogab, C. J.; Electrochemical Society.; Electrochemical Society. Electronics Division.
Series: Proceedings / Electrochemical Society ;; v. 81-1; Proceedings (Electrochemical Society) ;; v. 81-1.
Publisher: Electrochemical Society
Published: 1981
Place of publication: Pennington, NJ (10 South Main St., Pennington 08534)
Language: eng
Number of pages: 336
Subjects: Semiconductors -- Etching -- Congresses.; Plasma etching -- Congresses.
Notes: Includes bibliographical references and indexes.