Dry etching for VLSI
By: A.J. van Roosmalen, J.A.G. Baggerman, S.J.H. Brader.
Contributors: Baggerman, J. A. G.; Brader, S. J. H.
Series: Updates in applied physics and electrical technology
Publisher: Plenum Press
Published: 1991
Place of publication: New York
Language: eng
Number of pages: 237
Subjects: Semiconductors -- Etching.; Integrated circuits -- Very large scale integration -- Design and construction.; Plasma etching.
Notes: Includes bibliographical references (p. 157-175) and index.