X-ray lithography and applications of soft x-rays to technology
Subtitle: October 19-20, 1983, Upton, New York
By: Alan D. Wilson, chairman/editor ; cosponsors, National Synchrotron Light Source/Brookhaven National Laboratory, SPIE--the International Society for Optical Engineering.
Contributors: Wilson, Alan D.; Brookhaven National Laboratory. National Synchrotron Light Source.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE--the International Society for Optical Engineering ;; v. 448
Publisher: SPIE
Published: 1983
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 140
Subjects: X-ray lithography -- Congresses.; X-rays -- Industrial applications -- Congresses.
Notes: Includes bibliographies and index.