25th European Mask and Lithography Conference : 12-15 January 2009, Dresden, Germany
By: Uwe F.W. Behringer, editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS ... [et al.].
Contributors: Behringer, Uwe F. W.; VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik; BACUS (Technical group); SPIE (Society)
Series: Proceedings of SPIE -- v. 7470; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7470.
Publisher: SPIE
Published: 2009
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819477705
Other titles: Twenty-fifth European Mask and Lithography Conference; European Mask and Lithography Conference 2009; EMLC 2009
Notes: Includes bibliographical references and author index.