Optical microlithography XIV
Subtitle: 27 February-2 March, 2001, Santa Clara, [California], USA
By: Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Contributors: Progler, Christopher J.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Series: SPIE proceedings series, 0277-786X ;; v. 4346; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 4346.
Publisher: SPIE
Published: 2001
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 1652
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.; X-ray lithography -- Congresses.; Manufacturing processes -- Congresses.
Genres: Congresses.
Other titles: Optical microlithography fourteen
Notes: Includes bibliographical references and index.