Technologies for microlithography manufacturing
Subtitle: 11 July 1995, San Francisco, California
By: Willard Conley ... [et al.], instructors/authors ; sponsored by SEMI, Semiconductor Equipment and Materials International, SPIE, the International Society for Optical Engineering.
Contributors: Conley, Willard.; Semiconductor Equipment and Materials International.; Society of Photo-Optical Instrumentation Engineers.
Series: Technology tutorial series ;; v. 4
Publisher: Semiconductor Equipment and Materials International; The Society
Published: 1995
Place of publication: Mountain View, Calif., USA; Bellingham, Wash
Language: eng
Number of pages: 224
Subjects: Semiconductors -- Design and construction -- Congresses.; Microlithography -- Congresses.; Manufacturing processes -- Congresses.; Masks (Electronics) -- Congresses.
Notes: Includes bibliographical references.