Modeling, simulation and experimental studies of plasma processing
By: by Christer Hedlund
Contributors: Uppsala universitet
Series: Acta Universitatis Upsaliensis -- 258
Publisher: Acta Universitatis Upsaliensis
Published: 1997
Place of publication: Uppsala
Language: eng
Number of pages: 48
Subjects: Plasma etching; Semiconductors; Etching
Notes: Thesis (doctoral)--Uppsala University, 1997.

Includes bibliographical references (p. 48)