Proceedings of the Fifth Symposium on Plasma Processing
By: edited by G.S. Mathad, G.C. Schwartz, G. Smolinsky.
Contributors: Mathad, G. S.; Schwartz, G. C.; Smolinsky, G.
Series: Proceedings (Electrochemical Society) -- v. 85-1
Publisher: Dielectrics and Insulation and Electronics Divisions, Electrochemical Society
Published: 1985
Place of publication: Pennington, NJ (10 S. Main St., Pennington 08534-2896)
Language: eng
Number of pages: 619
Subjects: Plasma etching -- Congresses.; Semiconductors -- Etching -- Congresses.
Genres: Congresses.
Notes: Includes bibliographies and indexes.