Advanced etch technology for nanopatterning
Subtitle: 13-14 February 2012, San Jose, California, United States
By: Ying Zhang, Gottlieb Oehrlein, Qinghuang Lin, editors ; sponsored ... by SPIE
Contributors: SPIE (Society)
Series: Proceedings of SPIE -- v. 8328; Proceedings of SPIE--the International Society for Optical Engineering -- v. 8328.
Publisher: SPIE
Published: 2012
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819489845
Subjects: Lithography; Congresses; Plasma etching
Other titles: Advanced Etch Technology for Nanopatterning Conference (AETNC); AETNC
Notes: "SPIE Advanced Lithography"--Cover.

"Advanced Etch Technology for Nano[p]atterning Conference (AETNC)"--Intro.

Includes bibliographical references and index.