Lithography for semiconductor manufacturing II
Subtitle: 30 May-1 June, 2001, Edinburgh, UK
By: Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK)
Contributors: Mack, Chris A.; Stevenson, Tom, Dr.; Society of Photo-optical Instrumentation Engineers.; Scottish Enterprise.; European Optical Society.; Institution of Electrical Engineers.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 4404; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 4404.
Publisher: SPIE
Published: 2001
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 422
Subjects: Integrated circuits -- Design and construction -- Congresses.; Semiconductors -- Etching -- Congresses.; Microlithography -- Congresses.; Integrated circuits -- Very large scale integration -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and index.