Metrology, inspection, and process control for microlithography XIV
Subtitle: 28 February-2 March, 2000, Santa Clara, California
By: Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ;  International SEMATECH.
Contributors: Sullivan, Neal T.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Series: SPIE proceedings series,; v. 3998; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3998.
Publisher: SPIE
Published: 2000
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 938
Subjects: Integrated circuits -- Inspection -- Congresses.; Integrated circuits -- Measurement -- Congresses.; Microlithography -- Congresses.; Process control -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and author index.