Etch products dynamics of polyphenylene oxide laminates using a CF₄/O₂/Ar downstream microwave plasma
By: by Chia-Chang Hui.
Published: 1999
Language: eng
Number of pages: 214
Subjects: Plasma etching.; Microwave plasmas.
Notes: Typescript (photocopy).

Thesis (Ph. D.)--Oregon State University, 1999.

Includes bibliographical references (leaves 166-170).