LPCVD Silicon Nitride and Oxynitride Films
Subtitle: Material and Applications in Integrated Circuit Technology
Publisher: Springer
Published: May 28, 1991
Format: paperback
Number of pages: 169
ISBN-13: 9783540539544
Notes: Source title: LPCVD Silicon Nitride and Oxynitride Films: Material and Applications in Integrated Circuit Technology (Research Reports Esprit (1))