Sub-Half-Micron Lithography for ULSIs (Cambridge Studies in Semiconductor Physics & Microelectronic Engineering)
Contributors: Katsumi Suzuki (Editor); Shinji Matsui (Editor); Yukinori Ochiai (Editor)
Publisher: Cambridge University Press
Published: June 26, 2000
Language: eng
Format: Hardcover
Number of pages: 342
ISBN-13: 9780521570800
Subjects: Semi-conductors & super-conductors; Science/Mathematics; Integrated circuits; Electronics - Circuits - Printed; Technology & Industrial Arts; Technology; Printed circuits; Optics; Logic Design; Electronics - Microelectronics; Engineering - Electrical & Electronic; Integrated circuits--Ultra large scale integration--Design and construction; Technology / Engineering / Electrical; Design and construction; Ultra large scale integration; Microlithography
First sentence: The first commercial 0.25- m technology was distributed to users in 1997, and is now widely used in advanced ULSIs (e.g. 64-Mb and 256-Mb DRAMs, high-end microprocessors, and ASICs).