Photomask and next-generation lithography mask technology XIV
Subtitle: 17-19 April 2007, Yokohama, Japan
By: Hidehiro Watanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.
Contributors: Watanabe, Hidehiro.; Photomask Japan.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE -- 6607; Proceedings of SPIE--the International Society for Optical Engineering -- v. 6607.
Publisher: SPIE
Published: 2007
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819467454
Subjects: Masks (Electronics) -- Congresses.; Integrated circuits -- Masks -- Congresses.; X-ray lithography -- Congresses.; Microlithography -- Congresses.; Optoelectronic devices -- Design and construction -- Congresses.
Genres: Congresses.
Other titles: Photomask and X-ray mask technology
Notes: Some earlier proceedings have title: Photomask and X-ray mask technology.

Includes bibliographical references and author index.