Advances in resist materials and processing technology XXIV
Subtitle: 26-28 February, 2007, San Jose, California, USA
By: Qinghuang Lin, editor ; sponsored and published by SPIE--the International Society for Optical Engineering  ; cooperating organization,  SEMATECH.
Contributors: Lin, Qinghuang, 1963-; Society of Photo-optical Instrumentation Engineers.; SEMATECH (Organization)
Series: Proceedings of SPIE -- v. 6519; Proceedings of SPIE--the International Society for Optical Engineering -- v. 6519.
Publisher: SPIE
Published: 2007
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819466389
Subjects: Photoresists -- Congresses; Microlithography -- Congresses
Genres: Congresses
Notes: Previous conference proceedings entitled: Advances in resist technology and processing.

Includes bibliographical references and author index.