Dry processing for submicrometer lithography
Subtitle: 12-13 October 1989, Santa Clara, California
By: James Bondur, Alan R. Reinberg, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering.
Contributors: Bondur, James.; Reinberg, Alan R.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 1185; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 1185.
Publisher: The Society
Published: 1990
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 307
Subjects: Semiconductors -- Etching -- Congresses.; Lithography, Electron beam -- Congresses.; Plasma etching -- Congresses.; Ion beam lithography -- Congresses.
Notes: Includes bibliographical references and index.