Dry etch technology
Subtitle: 9-10-September 1991, San Jose, California
By: Deepak Ranadive, chair ; sponsored and published by SPIE--the International Society for Optical Engineering.
Contributors: Ranadive, Deepak.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 1593; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 1593.
Publisher: SPIE
Published: 1992
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 222
Subjects: Semiconductors -- Etching -- Congresses.; Plasma etching -- Congresses.; Microelectronics -- Materials -- Congresses.
Notes: Includes bibliographical references and index.