Photomask and next-generation lithography mask technology XIII
Subtitle: 18-20 April, 2006, Yokohama, Japan
By: Morihisa Hoga, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan).
Contributors: Hoga, Morihisa.; Photomask Japan.; BACUS (Technical group); Ōyō Butsuri Gakkai.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE -- 6283; Proceedings of SPIE--the International Society for Optical Engineering -- v. 6283.
Publisher: SPIE
Published: 2006
Place of publication: Bellingham, Wash
Language: eng
Subjects: Masks (Electronics) -- Congresses.; Integrated circuits -- Masks -- Congresses.; X-ray lithography -- Congresses.; Microlithography -- Congresses.; Optoelectronic devices -- Design and construction -- Congresses.
Genres: Congresses.
Other titles: Photomask and X-ray mask technology
Notes: Some earlier proceedings have title: Photomask and X-ray mask technology.

Includes bibliographical references and author index.