Stress induced phenomena in metallization
Subtitle: fourth international workshop, Tokyo, Japan, June, 1997
By: editors, Hidekazu Okabayashi, Shoso Shingubara, Paul S. Ho.
Contributors: Okabayashi, Hidekazu.; Shingubara, Shoso.; Ho, P. S.; International Workshop on Stress-Induced Phenomena in Metallization (4th : 1997 : Tokyo, Japan)
Series: AIP conference proceedings ;; 418; AIP conference proceedings ;; no. 418.
Publisher: American Institute of Physics
Published: 1998
Place of publication: Woodbury, N.Y
Language: eng
Number of pages: 519
Subjects: Integrated circuits -- Defects -- Congresses.; Thin film devices -- Defects -- Congresses.; Electrodiffusion -- Congresses.; Metallic films -- Congresses.; Electrochemical metallizing -- Congresses.; Aluminum films -- Congresses.; Semiconductors -- Defects -- Congresses.; Liquid crystal devices -- Defects -- Congresses.; Acoustic surface wave devices -- Defects -- Congresses.
Notes: Includes bibliographical references and index.
"DOE CONF-976190"--T.p. verso.