Ultraviolet technology III
Subtitle: 10-11 August 1989, San Diego, California
By: Robert E. Huffman, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, Applied Optics Laboratory/New Mexico State University ... [et al.].
Contributors: Huffman, Robert E., 1931-; Society of Photo-optical Instrumentation Engineers.; New Mexico State University. Applied Optics Laboratory.; International Symposium on Optical and Optoelectronic Applied Sciences and Engineering. (33rd : 1989 : San Diego, Calif.)
Series: Proceedings of SPIE--the International Society for Optical Engineering -- v. 1158
Publisher: SPIE
Published: 1989
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 366
Subjects: Ultraviolet radiation -- Industrial applications -- Congresses.
Other titles: Ultraviolet technology 3.; Ultraviolet technology three.
Notes: Conference 1158, Ultraviolet technology III, was part of a two conference program on Infrared and Ultraviolet Imaging held at SPIE's 33rd Annual International Symposium on Optical & Optoelectronic Applied Science & Engineering 6-11 August 1989, San Diego, California.--p. vi.

Includes bibliographies and index.