Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V
Subtitle: 11-12 March 1986, Santa Clara, California
By: Phillip D. Blais, chairman/editor.
Contributors: Blais, Phillip D.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings of SPIE--the International Society for Optical Engineering ;; v. 632
Publisher: SPIE--the International Society for Optical Engineering
Published: 1986
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 272
Subjects: Lithography, Electron beam -- Congresses.; X-ray lithography -- Congresses.; Ion beam lithography -- Congresses.
Other titles: Electron-beam, x-ray, and ion-beam techniques for submicrometer lithographies V.
Notes: Includes bibliographies and index.