Dry etching for microelectronics
By: edited by Ronald A. Powell.
Contributors: Powell, Ronald A.
Series: Materials processing--theory and practices ;; v. 4; Materials processing, theory and practices ;; v. 4.
Publisher: North-Holland Physics Pub.; Distributors for the USA and Canada, Elsevier Science Pub. Co.
Published: 1984
Place of publication: Amsterdam; New York; New York, N.Y
Language: eng
Number of pages: 299
Subjects: Semiconductors -- Etching.; Plasma etching.
Notes: Bibliography: p. 223-294.
Includes index.