Emerging lithographic technologies V
Subtitle: 27 February-1 March, 2001, Santa Clara, [California], USA
By: Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Contributors: Dobisz, Elizabeth Ann.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International; International SEMATECH.
Series: Proceedings of SPIE ;; v. 4343; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 4343.
Publisher: SPIE
Published: 2001
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 818
Subjects: Lithography, Electron beam -- Congresses.; Microlithography -- Industrial applications -- Congresses.; X-ray lithography -- Congresses.; X-rays -- Industrial applications -- Congresses.; Masks (Electronics) -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and index.