Advances in Low Temperature RF Plasmas. Basis for Process Design
Edition: 1st edition
Publisher: Elsevier Publishing Company
Published: May 1, 2002
Language: eng
Format: Hardcover
Number of pages: 328
ISBN-13: 9780444510952
Subjects: Low temperature physics; Plasma physics; Science; Science/Mathematics; Applied Sciences; Physics; Electromagnetism; Solid State Physics; Industrial applications; Low temperature plasmas