X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography
Subtitle: 9-13 July 1990, San Diego, California
By: Richard B. Hoover, Arthur B.C. Walker, Jr. chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering.
Contributors: Hoover, Richard B.; Walker, A. B. C.; Society of Photo-optical Instrumentation Engineers.; International Symposium on Optical and Optoelectronic Applied Sciences and Engineering (1990 : San Diego, Calif.)
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 1343; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 1343.
Publisher: SPIE
Published: 1991
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 579
Subjects: X-ray optics -- Instruments -- Congresses; Coatings -- Congresses; Polarimetry -- Instruments -- Congresses; X-ray lithography -- Congresses
Notes: Includes bibliographical references and index.
"Part of a three-conference program on X-Ray and EUV Technologies held at SPIE's International Symposium on Optical and Optoelectronic Applied Science and Engineering, 8-13 July 1990, in San Diego, California"--P. x.