Plasma etching in semiconductor fabrication
By: Russ A. Morgan.
Series: Plasma technology ;; 1
Publisher: Elsevier
Published: 1985
Place of publication: Amsterdam; New York
Language: eng
Number of pages: 316
Subjects: Semiconductors -- Etching.; Plasma etching.
Notes: Bibliography: p. 303-311.
Includes index.
Table of contents: pagenum: 203