Integrated circuit metrology, inspection, and process control VIII
Subtitle: 28 February-2 March, San Jose, California
By: Marylyn Hoy Bennett, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Contributors: Bennett, Marylyn Hoy.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; SPIE Symposium on Microlithography (1994 : San Jose, Calif.)
Series: Proceedings / SPIE--the International Society for Optical Engineering -- v. 2196; Proceedings of SPIE--the International Society for Optical Engineering -- v. 2196.
Publisher: SPIE
Published: 1994
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 553
Subjects: Integrated circuits -- Inspection -- Congresses.; Integrated circuits -- Measurement -- Congresses.; Process control -- Congresses.; Optical measurements -- Congresses.
Notes: "Papers in this conference ... were presented at the SPIE Microlithography Symposium"--P. ix.

Includes bibliographical references and index.