Plasma etching
Subtitle: fundamentals and applications
By: M. Sugawara ; with contributions from Barry L. Stonsfield ... [et al.].
Contributors: Stansfield, Barry L.
Series: Series on semiconductor science and technology ;; 7
Publisher: Oxford University Press
Published: 1998
Place of publication: New York
Language: eng
Number of pages: 347
Subjects: Semiconductors -- Etching.; Plasma etching.
Notes: Includes bibliographical references and index.