Plasma chemical processing
By: David M. Benenson and Emil Pfender, editors ; J. D. Chase ... [et al.].
Contributors: Benenson, David M.; Pfender, Emil, 1925-
Series: AIChE symposium series ; no. 186, v. 75; AIChE symposium series ;; no. 186.
Publisher: American Institute of Chemical Engineers
Published: 1979
Place of publication: New York
Language: eng
Number of pages: 92
Subjects: Plasma chemistry -- Industrial applications -- Congresses.
Notes: Includes bibliographical references.
"Comprises the majority of the papers presented during four sessions on plasma chemical processing at the 82nd national meeting of the AIChE in Atlantic City, N.J., from August 29 to September 1, 1976."