Advances in resist technology and processing XI
Subtitle: 28 February-1 March, 1994, San Jose, California
By: Omkaram Nalamasu, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
Contributors: Nalamasu, Omkaram.; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings / SPIE--the International Society for Optical Engineering -- v. 2195; Proceedings of SPIE--the International Society for Optical Engineering -- v. 2195
Publisher: International Society for Optical Engineering
Published: 1994
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 880
Subjects: Photoresists -- Congresses.
Other titles: Advances in resist technology and processing 11.; Advances in resist technology and processing eleven.
Notes: Includes bibliographies and index.