Applications of plasma processes to VLSI technology
By: edited by Takuo Sugano ; translated by Hyo-gun Kim.
Contributors: Sugano, Takuo, 1931-
Publisher: Wiley
Published: 1985
Place of publication: New York
Language: eng
Number of pages: 394
Subjects: Semiconductors -- Etching.; Integrated circuits -- Very large scale integration -- Design and construction.; Plasma etching.; Vapor-plating.
Notes: Bibliography: p. 369-389.
Translation of: Handōtai purazuma purosesu gijutsu.
"A Wiley-Interscience publication."
Includes index.