Conference proceedings
Subtitle: 4th International Symposium on Plasma Chemistry : Topical Meeting on Interactions of Low Pressure Plasmas with Solid Surfaces, Round Table on Thermal Plasma Processing : August 27 through September 1, 1979, University of Zurich, Zurich, Switzerland
By: edited by S. Vepřek and J. Hertz.
Contributors: Vepřek, S.; Hertz, J.; International Union of Pure and Applied Chemistry.; Topical Meeting on Interactions of Low Pressure Plasmas with Solid Surfaces, Zurich, Switzerland, 1979.; Round Table on Thermal Plasma Processing, Zurich, Switzerland, 1979.
Publisher: [s.n.
Published: 1979
Place of publication: Zurich
Subjects: Plasma chemistry -- Industrial applications -- Congresses.
Other titles: Plasma chemistry.; Interactions of low pressure plasmas with solid surfaces.; Thermal plasma processing.; ISPC-4.
Notes: At head of title: ISPC-4, International Union of Pure and Applied Chemistry.

English or French.

Includes bibliographical references.