Thin Films. Modeling of Film Deposition for Microelectronic Applications, Volume 22
Contributors: Ronald Powell (Series Editor); Abraham Ulman (Series Editor); John L. Vossen (Series Editor); Maurice H. Francombe (Series Editor)
Publisher: Academic Press
Published: October 22, 1996
Language: eng
Format: Hardcover
Number of pages: 290
ISBN-13: 9780125330220
Subjects: Computer modelling & simulation; Condensed matter physics (liquids & solids); Materials science; Microelectronics; Thin Films Physics; Science; Technology & Industrial Arts; Science/Mathematics; Chemistry - Industrial & Technical; Optics; Physics; Technology / Optics