Handbook of Thin Film Deposition Processes and Techniques
Subtitle: Principles, Methods, Equipment and Applications
Contributors: Seshan, Krishna
Publisher: Elsevier
Published: 2001
Place of publication: Burlington
Language: eng
Format: [electronic resource] :
Number of pages: 659
ISBN-13: 9780815517788
Subjects: Handbooks, manuals, etc. Chemical vapor deposition; Thin film devices; Design and construction; Handbooks, manuals; Handbooks, manuals, etc. Thin films
Description: Traces the technology behind the spectacular growth in the silicon semiconductor industry and continued trend in miniaturization over the last 20 years.
Notes: Description based on print version record.
Table of contents: title: Front Cover; Handbook of Thin-Film Deposition: Processes and Techniques; Copyright Page; Contents; Chapter 0. Recent Changes in the Semiconductor Industry; Chapter 1. Deposition Technologies and Applications: Introduction and Overview; Chapter 2. Silicon Epitaxy by Chemical Vapor Deposition; Chapter 3. Chemical Vapor Deposition of Silicon Dioxide Films; Chapter 4. Metal Organic Chemical Vapor Deposition: Technology and Equipment; Chapter 5. Feature Scale Modeling; Chapter 6. The Role Of Metrology And Inspection In Semiconductor Processing.; title: Chapter 7. Contamination Control, Defect Detection, and Yield Enhancement in Gigabit ManufacturingChapter 8. Sputtering and Sputter Deposition; Chapter 9. Laser and Electron Beam Assisted Processing; Chapter 10. Molecular Beam Epitaxy: Equipment and Practice; Chapter 11. Ion Beam Deposition; Chapter 12. Chemical Mechanical Polishing; Chapter 13. Organic Dielectrics in Multilevel Metallization of Integrated Circuits; Chapter 14. Performance, Processing, and Lithogra.