PACVD of TiN
By: B. Bliznakovska, H.-R. Kötter, and Ch. Meixner.
Contributors: Kötter, H.; Meixner, Christoph.
Series: Scientific series of the International Bureau ,; v. 29
Publisher: Forschungszentrum Jülich
Published: 1995
Place of publication: Jülich
Language: eng
Number of pages: 51
Subjects: Plasma-enhanced chemical vapor deposition.; Titanium nitride.; Thin films.
Notes: Includes bibliographical references (p. 49-51).
"German cooperation in scientific research and technological development with the University of Skopje."