EMLC 2008
Subtitle: 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany
By: Uwe F.W. Behringer, chair/editor ; Wilhelm Maurer, Jacques Waelpoel, program chairs ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS ... [et al.].
Contributors: Behringer, Uwe F. W.; Maurer, Wilhelm; Waelpoel, Jacques; VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers
Series: Proceedings of SPIE -- v. 6792; Proceedings of SPIE--the International Society for Optical Engineering -- v. 6792.
Publisher: SPIE
Published: 2008
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819469564
Other titles: European Mask and Lithography Conference 2008; 24th European Mask and Lithography Conference
Notes: Includes bibliographical references and author index.