Photomask and X-ray mask technology VI
Subtitle: 13-14 April, 1999, Yokohama, Japan
By: Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, Japan Society of Applied Physics ... [et al.].
Contributors: Morimoto, Hiraoki.; Photomask Japan.; BACUS (Technical group); Ōyō Butsuri Gakkai.
Series: SPIE proceedings series ;; v. 3748; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3748.
Publisher: SPIE
Published: 1999
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 628
Subjects: Masks (Electronics) -- Congresses.; Integrated circuits -- Masks -- Congresses.; X-ray lithography -- Congresses.; Microlithography -- Congresses.; Optoelectronic devices -- Design and construction -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and index.