Metrology, inspection, and process control for microlithography XIII
Subtitle: 15-18 March, 1999, Santa Clara, California
By: Bhanwar Singh, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Contributors: Singh, Bhanwar.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.
Series: SPIE proceedings series ;; v. 3677; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3677.
Publisher: SPIE
Published: 1999
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 1052
Subjects: Integrated circuits -- Inspection -- Congresses.; Integrated circuits -- Measurement -- Congresses.; Microlithography -- Congresses.; Process control -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and author index.