20th Annual BACUS Symposium on Photomask Technology
Subtitle: 13-15 September, 2000, Monterey, [California] USA
By: Brian J. Grenon, Giang T. Dao,chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Sociey for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.
Contributors: Grenon, Brian J.; Dao, Giang T.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
Series: SPIE proceedings series ;; v. 4186; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 4186.
Publisher: SPIE
Published: 2001
Place of publication: Bellingham, Washington
Language: eng
Number of pages: 938
Subjects: Integrated circuits -- Masks -- Congresses.; Microlithography -- Congresses.
Genres: Congresses.
Other titles: BACUS Symposium on Photomask Technology; Symposium on Photomask Technology and Management; Photomask technology
Notes: Includes bibliographic references and author index.
Eighteenth conference entitled: Symposium on Photomask Technology and Management.