Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
By: edited by Jerzy Ruzyllo, Richard E. Novak ; assistant editors, A. Bowling ... [et al.] ; [sponsored by the] Electronics and Dielectric Science and Technology Divisions.
Contributors: Rużyłło, Jerzy.; Novak, Richard E.; Electrochemical Society. Electronics Division.; Electrochemical Society. Dielectric Science and Technology Division.
Series: Proceedings ;; v. 94-7; Proceedings (Electrochemical Society) ;; v. 94-7.
Publisher: Electrochemical Society
Published: 1994
Place of publication: Pennington, NJ
Language: eng
Number of pages: 604
Subjects: Semiconductor wafers -- Cleaning -- Congresses.
Other titles: Cleaning technology in semiconductor device manufacturing.
Notes: Includes bibliographical references and indexes.
Spine title: Cleaning technology in semiconductor device manufacturing.