Characterization of plasma-enhanced CVD processes
Subtitle: symposium held Novermber 27-28, 1989, Boston, Massachusetts, U.S.A.
By: editors, Gerald Lucovsky, Dale E. Ibbotson, Dennis W. Hess.
Contributors: Lucovsky, G.; Ibbotson, Dale E.; Hess, Dennis W.
Series: Materials Research Society symposium proceedings ;; v. 165; Materials Research Society symposia proceedings ;; v. 165.
Publisher: Materials Research Society
Published: 1990
Place of publication: Pittsburgh, Pa
Language: eng
Number of pages: 250
Subjects: Plasma-enhanced chemical vapor deposition -- Congresses.; Integrated circuits -- Design and construction -- Congresses.
Notes: Includes bibliographical references and indexes.