Fundamental Electron Interactions with Plasma Processing Gases
By: by Loucas G. Christophorou, James K. Olthoff
Contributors: Olthoff, James K.
Series: Physics of Atoms and Molecules; Physics of atoms and molecules
Publisher: Springer US
Published: 2004
Place of publication: Boston, MA
Language: eng
Format: [electronic resource] /
Number of pages: 781
ISBN-13: 9781461347415; 9781441989710
Subjects: Physical organic chemistry; Nuclear physics; Physics; Optical materials
Description: This volume deals with the basic knowledge and understanding of the fundamental interactions of low-energy electrons with molecules. Recent advances in electron-molecule interaction processes are discussed and a unique up-to-date and comprehensive account of the fundamental interactions of low-energy electrons with molecules of current interest in modern technology, specially the semiconductor industry, is presented. The material provided in this volume will aid scientists and engineers working in many fields of basic and applied science and engineering. The unique and authoritative knowledge, information, and understanding it provides generically underpins advances in plasma, laser, lighting, discharge, environmental, radiation, and other technologies.
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