Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V
Subtitle: 20-21 February 1995, Santa Clara, California
By: John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Contributors: Warlaumont, John M.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 2437; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 2437.
Publisher: SPIE
Published: 1995
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 450
Subjects: Integrated circuits -- Masks -- Congresses; Lithography, Electron beam -- Congresses; X-ray lithography -- Congresses; Ion beam lithography -- Congresses
Notes: Includes bibliographical references and index.