Design technology co-optimization in the era of sub-resolution IC scaling
By: Lars Liebmann, Kaushik Vaidyanathan, and Lawrence Pileggi
Contributors: Vaidyanathan, Kaushik, author; Pileggi, Lawrence, 1962- author
Series: Tutorial texts in optical engineering -- volume TT104; Tutorial texts in optical engineering -- v. TT 104.
Publisher: SPIE
Published: 2016
Place of publication: Bellingham, Washington
Language: eng
ISBN-13: 9781628419054
Copyright date: 2016
Subjects: Electron beam Lithography; Integrated circuits; Design and construction
Description: "Tackle the challenges facing the most advanced technology nodes in the microelectronics industry with the help of design technology co-optimization (DTCO). This mediation process aims to ensure competitive technology architecture definition while avoiding schedule or yield risks caused by unrealistically aggressive process assumptions. Find the answers in this Tutorial Text, which reviews the fundamental design objectives as well as the resulting topological constraints of a standard cell logic design flow; cell design, placement, and routing are examined against the backdrop of ever-increasing design constraints in advanced technology nodes"--
Notes: Includes bibliographical references and index.
Table of contents: title: The escalating design complexity of sub-resolution scaling; title: Multiple exposure patterning enhanced digital logic design; title: Design for manufacturability; title: Design technology co-optimization (DTCO).