Data analysis and modeling for process control
Subtitle: 26-27 February 2004, Santa Clara, California, USA
By: Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.
Contributors: Tobin, Kenneth W.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Series: SPIE proceedings series,; v. 5378; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 5378.
Publisher: SPIE
Published: 2004
Place of publication: Bellingham, Wash., USA
Language: eng
Number of pages: 248
Subjects: Manufacturing processes -- Mathematical models -- Congresses.; Manufacturing processes -- Automatic control -- Congresses.; Intelligent control systems -- Mathematical models -- Congresses.; Process control -- Mathematical models -- Congresses.
Genres: Congresses.
Notes: Includes bibliographical references and index.