Photomask and next-generation lithography mask technology XVII
Subtitle: 13-15 April 2010, Yokohama, Japan
By: Kunihiro Hosono, editor ; sponsored by PMJ Photomask Japan ... [et al.].
Contributors: SPIE (Society); Photomask Japan
Series: Proceedings of SPIE -- v. 7748; Proceedings of SPIE--the International Society for Optical Engineering -- v. 7748.
Publisher: SPIE
Published: 2010
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819482389
Subjects: X-ray lithography; Masks (Electronics); Masks; Optoelectronic devices; Congresses; Design and construction; Microlithography; Integrated circuits
Notes: Includes bibliographical references and author index.