Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing
Subtitle: 6-7 March 1991, San Jose, California
By: Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
Contributors: Peckerar, Martin Charles, 1946-; Society of Photo-optical Instrumentation Engineers.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 1465; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 1465.
Publisher: SPIE
Published: 1991
Place of publication: Bellingham, Wash
Language: eng
Number of pages: 340
Subjects: Lithography, Electron beam -- Congresses.; X-ray lithography -- Congresses.; Ion beam lithography -- Congresses.
Notes: Includes bibliographical references and index.
"Part of a two-conference program ... held at the SPIE Symposium on Microlithography, 3-8 March 1991"--P. viii.