Interlaboratory study on linewidth measurements for antireflective chromium photomasks
By: John M. Jerke, M. Carroll Croarkin, Ruth N. Varner ; sponsored jointly by NBS and the Defense Advanced Research Projects Agency.
Contributors: Croarkin, Carroll.; Varner, Ruth N.; National Engineering Laboratory (U.S.); United States. Defense Advanced Research Agency.
Series: Semiconductor measurement technology; NBS special publication ;; 400-74
Publisher: U.S. Dept. of Commerce, National Bureau of Standards; For sale by the Supt. of Docs., U.S. G.P.O.
Published: 1982
Place of publication: Washington, D.C
Language: eng
Number of pages: 183
Subjects: Integrated circuits -- Masks.; Optical measurements.
Notes: Includes bibliographical references.
"National Engineering Laboratory, National Bureau of Standards."
"Issued November 1982."
S/N 003-003-02458-9
Item 247 (microfiche)