Microlithography and metrology in micromachining III
Subtitle: 29-30 September, 1997, Austin, Texas
By: Craig R. Friedrich, Akira Umeda, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology ; cooperating organization Solid State Technology ; published by SPIE--the International Society for Optical Engineering.
Contributors: Friedrich, Craig.; Umeda, Akira.; Semiconductor Equipment and Materials Institute.; National Institute of Standards and Technology (U.S.); Society of Photo-optical Instrumentation Engineers.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 3225; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3225.
Publisher: SPIE
Published: 1997
Place of publication: Bellingham, Washington
Language: eng
Number of pages: 134
Subjects: Micromachining -- Congresses; Microlithography -- Congresses; Mensuration -- Congresses
Notes: Includes bibliographic references and author index.