NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies
By: edited by M. Gentili, C. Giovannella, S. Selci
Contributors: Giovannella, C.; Selci, S.
Series: NATO ASI Series, Series E: Applied Sciences -- 264; NATO ASI Series, Series E: Applied Sciences -- 264
Publisher: Springer Netherlands
Published: 1994
Place of publication: Dordrecht
Language: eng
Format: [electronic resource] /
Number of pages: 215
ISBN-13: 9789048143887; 9789401582612
Subjects: Computer engineering; Physics; Surfaces (Physics)
Other titles: Proceedings of the NATO Advanced Research Workshop, Frascati, Roma, Italy, April 6--8, 1993
Description: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
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