Statistical methods for industrial process control
By: David Drain.
Series: Chapman & Hall solid state science and engineering series
Publisher: Chapman & Hall
Published: 1997
Place of publication: New York
Language: eng
Number of pages: 456
Subjects: Engineering -- Statistical methods.
Description: Emphasizing the practical application of statistical tools, this outstanding volume gives engineers and students a solid introduction to the sophisticated techniques used in semiconductor manufacture and fabrication. Throughout the book, examples are taken from the semiconductor industry, but the techniques covered can be readily applied to many other industrial processes.

Statistical Methods for Industrial Process Control begins with coverage of essential statistical concepts, including causal relationships and application of knowledge about patterns or variation to designing sample schemes. This material provides the basis for understanding the material on ensuring that measuring equipment is capable of measuring important parameters with the requisite precision, accuracy and stability.

With this foundation, the book teaches readers the statistical process control methods needed to stabilize the process.

Although written with a specific focus on the semiconductor industry, Statistical Methods for Industrial Process Control will have much wider appeal. The statistical concepts can be readily applied by engineers in other process industries, including chemistry, manufacturing, and pharmaceuticals. In addition, the clear presentation, wide use of examples, review problems and abundant references make this valuable for advanced statistics and engineering students.
Notes: Includes bibliographical references (p. 413-416) and index.