Plasma processing of semiconductors
By: edited by P.F. Williams.
Contributors: Williams, P. F.; North Atlantic Treaty Organization. Scientific Affairs Division.
Series: NATO ASI series. Series E., Applied sciences ;; vol. 336; NATO ASI series.; no. 336.
Publisher: Kluwer Academic Publishers
Published: 1997
Place of publication: Dordrecht; Boston
Language: eng
Number of pages: 613
Subjects: Plasma engineering; Semiconductors -- Etching; Plasma etching -- Industrial applications; Plasma chemistry -- Industrial applications
Notes: Includes bibliographical references and index.
"Proceedings of the NATO Advanced Study Institute on Plasma Processing of Semiconductors, Château de Bonas, France, 17-18-June, 1996"--T.p. verso.
"Published in cooperation with the NATO Scientific Affairs Division."