Numerical modeling tools for chemical vapor deposition
By: Thomas J. Jasinski and Edward P. Childs.
Contributors: United States. National Aeronautics and Space Administration. Scientific and Technical Information Program.
Series: NASA contractor report -- 4480.; NASA contractor report -- NASA CR-4480.
Publisher: National Aeronautics and Space Administration, Office of Management, Scientific and Technical Information Program; National Technical Information Service, distributor]
Published: 1992
Place of publication: [Washington, D.C.]; [Springfield, Va
Language: eng
Format: Microform
Number of pages: 97
Subjects: Plasma-enhanced chemical vapor deposition.; Fluid dynamics.
Notes: Distributed to depository libaries in microfiche.

Shipping list no.: 93-0425-M.

Includes bibliographical references (p. 79-80).

Microfiche. [Washington, D.C.] : National Aeronautics and Space Administration, [1993]. 2 microfiches ; 11 x 15 cm.