Optical microlithography XIX
Subtitle: 21-24 February, 2006, San Jose, California, USA
By: Donis G. Flagello, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc. (USA).
Contributors: Flagello, Donis G.; Society of Photo-optical Instrumentation Engineers.; International SEMATECH.
Series: Proceedings of SPIE -- v. 6154; Proceedings of SPIE--the International Society for Optical Engineering -- v. 6154.
Publisher: SPIE
Published: 2006
Place of publication: Bellingham, Wash
Language: eng
ISBN-13: 9780819461971
Subjects: Integrated circuits -- Masks -- Congresses; Microlithography -- Congresses; X-ray lithography -- Congresses; Manufacturing processes -- Congresses
Genres: Congresses.
Other titles: Optical microlithography 19; Optical microlithography nineteen
Notes: Includes bibliographical references and author index.