Photomask and X-ray mask technology V
Subtitle: 9-10 April, 1998, Kawasaki, Japan
By: Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--The International Society for Optical Engineering ; supporting societies, The Japan Society of Applied Physics ... [et al.] ; published by SPIE--The International Society for Optical Engineering.
Contributors: Aizaki, Naoaki.; Photomask Japan.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
Series: Proceedings / SPIE--the International Society for Optical Engineering ;; v. 3412; Proceedings of SPIE--the International Society for Optical Engineering ;; v. 3412.
Publisher: SPIE
Published: 1998
Place of publication: Bellingham, Washington
Language: eng
Number of pages: 616
Subjects: Masks (Electronics) -- Congresses.; Integrated circuits -- Masks -- Congresses.; X-ray lithography -- Congresses.; Microlithography -- Congresses.
Notes: Includes bibliographical references and index.