Alternative lithographic technologies IV
Subtitle: 13-16 February 2012, San Jose, California, United States
By: William M. Tong, Douglas J. Resnick, editors ; sponsored and published by SPIE
Contributors: SPIE (Society)
Series: Proceedings of SPIE -- volume 8323
Publisher: SPIE
Published: 2012
Place of publication: Bellingham, Washington
Language: eng
ISBN-13: 9780819489791
Subjects: Extreme ultraviolet lithography; Congresses; Electron beam Lithography; Microlithography; Industrial applications; Masks (Electronics)
Other titles: Alternative lithographic technologies 4; Alternative lithographic technologies four
Notes: Includes bibliographical references and author index.