The physics and chemistry of SiO₂ and the Si-SiO₂ interface--5
By: editors, H. Z. Massoud ... [et al.] ; sponsoring divisions, Electronics and Photonics, Dielectrics Science and Technology
Contributors: Massoud, Hisham Z.; Electrochemical Society. Electronics and Photonics Division; Electrochemical Society. Dielectric Science and Technology Division
Series: ECS transactions -- v. 1, no.1
Publisher: Electrochemical Society
Published: 2005
Place of publication: Pennington, NJ
Language: eng
Number of pages: 304
Subjects: Silica; Congresses; Surfaces; Dielectrics; Silicon dioxide films; Surface chemistry; Surfaces (Technology)
Notes: "Proceedings of the Fifth International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface ... held in Los Angeles, CA, October 16-20, 2005"--P. iii.

Includes bibliographical references and indexes.