Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York
By: special editor for the proceedings, J. Kelly.
Contributors: Kelly, J.; American Vacuum Society.; American Institute of Physics.
Publisher: Published for the American Vacuum Society by the American Institute of Physics
Published: 1985
Place of publication: New York
Language: eng
Number of pages: 463
Subjects: Photolithography -- Congresses.; Ion beam lithography -- Congresses.; Lithography, Electron beam -- Congresses.; Semiconductors -- Etching -- Congresses.
Genres: Congresses.
Notes: Published also in the Jan./Feb. 1985 issue of the Journal of vacuum science and technolgy B, v. 3, no. 1.

Includes bibliographies and index.