Optical microlithography XV
Subtitle: 5-8 March, 2002, Santa Clara, [California], USA
By: Anthon Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Contributors: Yen, Anthony.; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH (Organization)
Series: SPIE proceedings series -- v. 4691; Proceedings of SPIE--the International Society for Optical Engineering -- v. 4691.
Published: 2002
Place of publication: Bellingham, Washington SPIE
Language: eng
Subjects: Integrated circuits -- Masks -- Congresses; Microlithography -- Congresses; X-ray lithography -- Congresses; Manufacturing processes -- Congresses
Genres: Congresses
Notes: Includes bibliographic references and author index.