Query: Anti-reflection film

Candidate papers:

abstract: Complementary metal oxide semiconductor (CMOS) image sensors (CIS) are being widely used in digital video cameras, web cameras, digital single lens reflex camera (DSLR) smart phones and so on, owing to their high level of integration, random accessibility, and low power operation. It needs to be installed with the cover glass in practical applications to protect the sensor from damage, mechanical issues, and environmental conditions, which, however, limits the accuracy and usability of the sensor due to the reflection in the optical path from air to cover glass to air. In this work, the flexible 3D nanocone anti reflection (AR) film with controlled aspect ratio was firstly employed to reduce the light reflection at air/cover glass/air interfaces by directly attaching onto the front and rear sides of the CIS cover glass. As both the front and rear sides of cover glass were coated by the AR film, the output image quality was found to be improved with external quantum efficiency increased by 7% compared with that without AR film. The mean digital data value, root mean square contrast, and dynamic range are increased by 45.14% 38.61% and 57, respectively, for the output image with AR films. These results provide a novel and facile pathway to improve the CIS performance and also could be extended to rational design of other image sensors and optoelectronic devices.
author_names: Li Tian

Luo Xiaolei

Min Yin

Dongdong Li

Xinzhong Xue

Hui Wang
title: Enhanced CMOS image sensor by flexible 3D nanocone anti reflection film
year: 2017

abstract: The present invention relates to: an anti reflection film comprising a hard coating layer, and a low refractive index layer including a binder resin, and hollow inorganic nano particles and solid inorganic nano particles dispersed in the binder resin, wherein a particle size ratio of the hollow particles to the solid particles is 0.26 to 0.55; and an anti reflection film comprising a hard coating layer including a binder resin, and fine organic or inorganic particles dispersed in the binder resin, and a low refractive index layer including a binder resin, and hollow inorganic nano particles and solid inorganic nano particles dispersed in the binder resin, wherein an average particle size ratio of the hollow particles to the solid particles is 0.15 to 0.55, and wherein 70 vol% or more of the solid inorganic nano particles are within 50% of the thickness of the low refractive index layer from the interface between the hard coating layer and the low refractive index layer.
title: Anti reflection film
year: 2017

abstract: We report a photosensitive, double layered anti reflection film, which is composed of a UV cured acrylate film containing a photoluminescent europium(III) complex as a high refractive index layer and a film of a colloidal nano silica as a low refractive index layer. The refractive index of the high refractive index layer can be tuned from 1. 53 to 1.69 as the composition of the europium(III) complex increases. The reflectance of the anti reflection film on the glass substrate is as low as 0.48% when the refractive indices and thicknesses of the two layers are controlled. The anti reflection film is applied as the top layer of a liquid crystal display (LCD) Since the absorption and excitation spectra of the europium(III) complex barely overlap with the backlight spectrum of the LCD, the europium(III) complex in the anti reflection film does not disturb the display images. The images are visible even under irradiation using an indoor fluorescent lamp. It is also possible to highlight a specific point on the display screen using laser light. When a 405 nm laser pointer is aimed at a specific area, the area appeared as a bright red spot.
author_names: Geo San Lim

Hyungwoo Kim

Ji Young Chang
title: Laser highlighting on a flat panel display coated with a double layered anti reflection film containing a europium(III) complex
year: 2014

abstract: [Problem] To provide an anti reflection film that suppresses light scattering, exhibits sufficient anti reflection properties, and is highly durable, and to provide an optical member. [Solution] An anti reflection film (3) configured from: a relief structure layer (10) that has a hydrate of alumina as a main constituent and has a relief structure in which the distance between protrusions is shorter than the wavelength of the light for which reflection is to be suppressed; and an intermediate layer (5) that is disposed between the relief structure layer (10) and a substrate (2) The relief structure layer (10) is configured so that the relief structure has a spatial frequency peak value of 6.5 mm 1 or higher and a film thickness of 250 nm or greater. The intermediate layer (5) is configured from a plurality of layers including, in order from the relief structure layer (10) side to the substrate (2) side, at least a first layer (51) a second layer (52) a third layer (53) a fourth layer (54) a fifth layer (55) a sixth layer (56) a seventh layer (57) and an eighth layer (58)
author_names: Yuan Tian Shen Yi Lang

Ji Hong Da Shi
title: Anti reflection film and optical member
year: 2016

abstract: A systematic series of silicon (Si) wafer with microstructured anti reflection film is prepared by femtosecond laser pulse. The dependence of the morphology and optical properties of the microstructured Si on the experimental parameters is thoroughly investigated. With the laser pulse duration of 40 fs, central wavelength of 800 nm, repetition rate of 250 kHz, laser pulse power of 300 mW, 250 mm/s scanning speed, and 2 mm of displacement between the parallel scans in the air, the quasiordered arrays of grain microstructures on the Si wafer up to 800 nm tall and 800 nm diameter at the bottom offered near unity transmission in the mid infrared wavelength. An anti reflection film of approximately 3 x 3 (mm) is developed on the (211) Si substrate with the optimized parameters, Moreover, up to 30% improvement of the response performance is demonstrated.
title: Microstructuring of anti reflection film for HgCdTe/Si IRFPA with femtosecond laser pulse
year: 2013

abstract: The invention discloses a design and preparation method for a multilayer optical anti reflection film with a single lens spherical aberration compensation function. The design and preparation method comprises the following steps: 1) a wavefront aberration a generated by a spherical aberration on an exit pupil surface after linearly polarized light passes a single lens is calculated, a functional relation between the wavefront aberration a and an angle of incidence is established, the wavefront aberration a is negated, a value is divided by 2 pi, and a remainder which is a wavefront aberration b is obtained; 2) values in multiple intervals of the wavefront aberration b are averaged respectively, and a discretely distributed wavefront aberration c is obtained; 3) corresponding film systems are optimally designed aiming at the multiple intervals, the wavefront aberration c at each angle of incidence is taken as the optimization target for the design of the optical anti reflection film at the corresponding interval, and optimal design of the optical anti reflection film is performed; 4) multiple multilayer optical anti reflection films obtained from design are spliced according to the angles of incidence from small to large, and the optical anti reflection film with compressed single lens spherical aberration is obtained.
title: Design and preparation method for multilayer optical anti reflection film with single lens spherical aberration compensation function
year: 2015

abstract: A method for producing an anti reflection film is provided which is capable of achieving an increase in size in comparison to cases when a vacuum container is used for production. This method for producing an anti reflection film includes a first uneven structure formation step, and a second uneven structure formation step. In the first uneven structure formation step, a first uneven structure is formed on the surface of a base material sheet. In the second uneven structure formation step, a second uneven structure is directly formed on the first uneven structure. The second uneven structure formation step involves plating processing using nickel as a main component. As a result of performing this plating processing, the second uneven structure can be formed with an average arrangement period which is shorter than that of the first uneven structure, said arrangement period being equal to or less than a wavelength to be prevented from being reflected.
author_names: Mei Ze Peng Yi

Zao Gu Xiong Yi
title: Method for producing anti reflection film
year: 2015

abstract: The recently developed practice of spraying solutions onto a substrate to fabricate thin films via layer by layer (LBL) method has been further investigated and extended. We successfully fabricated double layer anti reflection (AR) thin films with high and low refractive index layers by the spray layer by layer (spray LBL) method. For the deposition of a high refractive index layer, layers of poly(diallyldimethylammonium chloride) (PDDA) and titanium(IV) bis(ammoniumlactato) dihydroxide (TALH) were alternatively assembled. The average thickness of (PDDA/TALH) was determined to be 7 nm and the refractive index was n=1.76 at 550 nm. Poly(allylamine hydrochloride) (PAH) and poly(acrylic acid) (PAA) layers were assembled on the high refractive index layer for the deposition of the low refractive index layer. The average thickness of (PAH/PAA) was determined to be 14 nm and the refractive index was n=1.48 at 550 nm. This AR thin film showed the maximum transmittance (94.5% and the minimum reflection (0.5% at approximately 550 nm in wavelength.
author_names: Kyu Hong Kyung

Kouji Fujimoto

Seimei Shiratori
title: Control of Structure and Film Thickness Using Spray Layer by Layer Method: Application to Double Layer Anti Reflection Film
year: 2011

abstract: One kind of anti reflection and anti reflection film structure, comprising two layers of upper and lower outer dielectric layer, the conductive metal layer in the middle and are sandwiched between two layers of anti oxidizing metal layer between the conductive metal layer and two dielectric layers, wherein said anti oxidation metal layer is a zinc or titanium. The actual physical thickness of the antireflection structure in the range of several tens of nanometers, by using the anti reflection structure, the flexible substrate selection, volume by volume magnetron sputtering method, and only achieved dozens thickness having excellent optical properties mass production of antireflection film nm, to overcome the shortcomings of conventional anti reflection film is reduced large area industrial production indicate a new way.
title: It is an anti anti reflection film structure and Save
year: 2014

abstract: This optical member is provided with: a resin substrate; and an anti reflection film which is formed upon the resin substrate, and which includes alternate layers of a high refractive index layer comprising TiO2, and a low refractive index layer comprising SiO2 and Al2O3. The film thickness of the low refractive index layers accounts for at least 60% but not more than 72.5% of the total film thickness of the anti reflection film. The anti reflection film has an average reflectance at an angle of incidence of 5@ for wavelengths in the range of 420 900 nm of not more than 1.5%
author_names: Neng Shi Zheng Zhang

Chuan Lu Zong Ju

Zhong Cun Kong Er
title: Optical member provided with wide band anti reflection film
year: 2014