Query: Magnetron sputtering coating\PVD review

title: Resistance of PVD Coatings to Erosive and Wear Processes: A Review
abstract: Due to the increasing maintenance costs of hydraulic machines related to the damages caused by cavitation erosion and/or erosion of solid particles, as well as in tribological connections, surface protection of these components is very important. Up to now, numerous investigations of resistance of coatings, mainly nitride coatings, such as CrN, TiN, TiCN, (Ti,Cr)N coatings and multilayer TiN/Ti, ZrN/CrN and TN/(Ti,Al)N coatings, produced by physical vapor deposition (PVD) method using different techniques of deposition, such as magnetron sputtering, arc evaporation or ion plating, to cavitation erosion, solid particle erosion and wear have been made. The results of these investigations, degradation processes and main test devices used are presented in this paper. An effect of deposition of mono and multi layer PVD coatings on duration of incubation period, cumulative weight loss and erosion rate, as well as on wear rate and coefficient of friction in tribological tests is discussed. It is shown that PVD coating does not always provide extended incubation time and/or improved resistance to mentioned types of damage. The influence of structure, hardness, residence to plastic deformation and stresses in the coatings on erosion and wear resistance is discussed. In the case of cavitation erosion and solid particle erosion, a limit value of the ratio of hardness (H) to Young's modulus (E) exists at which the best resistance is gained. In the case of tribological tests, the higher the H/E ratio and the lower the coefficient of friction, the lower the wear rate, but there are also many exceptions.

title: Physical vapor deposition technology for coated cutting tools: A review
abstract: Due to various difficult to machine materials and increasingly severe machining conditions, more and more attention has been paid to the physical vapor deposition (PVD) technology in recent decades to deposit hard coatings on cutting tools. Combined with the status of industrial application of PVD technology, this paper reviews the main PVD techniques for coated cutting tools from the perspective of the overall PVD coating equipment, including cathodic arc evaporation and magnetron sputtering as well as their hybrid techniques, and the plasma etching which is critical for coating adhesion strength is also involved. With regard to hard coating deposition on cutting tools, the basic principle, cathode configuration, magnetron and power supply are outlined. Issues related to target ionization ratio, coating deposition rate, coating properties and industrial application of numerous PVD techniques are also highlighted. On plasma etching, inert gas ion etching and metal ions etching are discussed. Finally, this paper summarizes and prospects the PVD technology used for coated cutting tools.

title: A Review on the Pathways of the Improved Structural Characteristics and Photocatalytic Performance of Titanium Dioxide (TiO2) Thin Films Fabricated by the Magnetron Sputtering Technique
abstract: Titanium dioxide (TiO2) thin films are used for a broad range of applications such as wastewater treatment, photocatalytic degradation activity, water splitting, antibacterial and also in biomedical applications. There is a wide range of synthesis techniques for the deposition of TiO2 thin films, such as chemical vapor deposition (CVD) and physical vapor deposition (PVD) both of which are well known deposition methods. Layer by layer deposition with good homogeneity, even thickness and good adhesive nature is possible by using the PVD technique, with the products being used for photocatalytic applications. This review studies the effects of magnetron sputtering conditions on TiO2 films. This innovative technique can enhance the photocatalytic activity by increasing the thickness of the film higher than any other methods. The main purpose of this article is to review the effects of DC and RF magnetron sputtering conditions on the preparation of TiO2 thin films for photocatalysis. The characteristics of TiO2 films (i.e. structure, composition, and crystallinity) are affected significantly by the substrate type, the sputtering power, the distance between substrate and target, working pressure, argon/oxygen ratio, deposition time, substrate temperature, dopant types, and finally the annealing treatment. The photocatalytic activity and optical properties, including the degree of crystallinity, band gap (Eg) refractive index (n) transmittance (T) and extinction coefficient (k) of TiO2 films are dependent on the abovementioned film characteristics. Optimal TiO2 films should have a small particle size, a strong degree of crystallinity, a low band gap, a low contact angle, a high refractive index, transmittance, and extinction coefficient. Finally, metallic and nonmetallic dopants can be added to enhance the photocatalytic activity of TiO2 films by narrowing the band gap.

title: High performance silver coating with PACA2M magnetron sputtering
abstract: The performances that are required today for optical components are increasingly demanding, both in terms of the spectral response and the conditions to which the components are subjected. So called dense deposition techniques for thin film coating currently make it possible to respond in many cases to this ever increasing requirement. Indeed, conventional evaporation techniques that can address a large number of applications such as metallic coatings, antireflection coatings, mirrors, are no longer sufficient and we currently rely on the dense deposition techniques such as, for instance, magnetron sputtering which allow implementing layers stable and low ageing behavior. In this paper, we will review the recent achievements at CILAS by magnetron sputtering technique on high performance silver coatings for space applications. In our premises in Aubagne, CILAS has implemented a large dimension in line magnetron sputtering coating machine with which such silver coatings are realized. This equipment with oversized dimensions involving a 6 meters by 3 meters vacuum chamber, 12 turbomolecular pumps and 7 planar magnetrons over 2.50m long will be presented in detail. In particular, the wide range of configurations will also be illustrated with complex coatings achievements with respect to the capability of the machine which is equipped with magnetrons, that may be powered in Radio Frequency, Mid Frequency, Direct Current or pulsed Direct Current modes. For several years, CILAS has improved its coating processes to produce high quality silver coatings, taking into account spectral performances, environmental conditions and also coating uniformity over 2meter by 2 meter dimensions. Further developments have been led by CILAS with the support of the French Space Agency as part of Research and Development activities to improve environmental performance; we present here characterization results on samples before and after environmental qualification (temperature, humidity, vacuum heat and on components with dimensions up to 600mm. A multi year test campaign including stress measurements and adhesion tests on samples and mirror demonstrator will also be presented.

title: Antimicrobial Nanostructured Coatings: A Gas Phase Deposition and Magnetron Sputtering Perspective
abstract: Counteracting the spreading of multi drug resistant pathogens, taking place through surface mediated cross contamination, is amongst the higher priorities in public health policies. For these reason an appropriate design of antimicrobial nanostructured coatings may allow to exploit different antimicrobial mechanisms pathways, to be specifically activated by tailoring the coatings composition and morphology. Furthermore, their mechanical properties are of the utmost importance in view of the antimicrobial surface durability. Indeed, the coating properties might be tuned differently according to the specific synthesis method. The present review focuses on nanoparticle based bactericidal coatings obtained via magneton spattering and supersonic cluster beam deposition. The bacteria NP interaction mechanisms are first reviewed, thus making clear the requirements that a nanoparticle based film should meet in order to serve as a bactericidal coating. Paradigmatic examples of coatings, obtained by magnetron sputtering and supersonic cluster beam deposition, are discussed. The emphasis is on widening the bactericidal spectrum so as to be effective both against gram positive and gram negative bacteria, while ensuring a good adhesion to a variety of substrates and mechanical durability. It is discussed how this goal may be achieved combining different elements into the coating.

title: Introduction to magnetron sputtering
abstract: Plasma based physical vapor deposition (PVD) methods have found widespread use in various industrial applications. In plasma based PVD processes, the deposition species are either vaporized by thermal evaporation or by sputtering from a source (the cathode target) by ion bombardment. Initially, the dc glow discharge or the dc diode sputtering discharge was used as a sputter source followed by the magnetron sputtering technique, which was developed during the 1960s and 1970s. With the introduction of magnetron sputtering, the disadvantages of diode sputtering, such as poor deposition rate, were overcome as the operating pressure could be reduced while maintaining the energy of the sputtered species, often resulting in improved film properties. In this chapter we discuss the basics of the sputtering process, give an overview of the dc glow discharge, and review the basic physics relevant to the maintenance of the discharge and the sputter processes. Then we discuss the dc glow discharge and its role as a sputter source and how it evolves into the magnetron sputtering discharge. We also discuss various magnetron sputtering configurations in use for a wide range of applications both under laboratory and industrial arrangements. Finally, we introduce pulsed magnetron discharges including high power impulse magnetron sputtering (HiPIMS) discharges.

title: Ion substituted calcium phosphate coatings by physical vapor deposition magnetron sputtering for biomedical applications: A review.
abstract: Coatings based on ion substituted calcium phosphate (Ca P) have attracted great attention in the scientific community over the past decade for the development of biomedical applications. Among such Ca P based structures, hydroxyapatite (HA) has shown significant influence on cell behaviors including cell proliferation, adhesion, and differentiation. These cell behaviors determine the osseointegration between the implant and host bone and the biocompatibility of implants. This review presents a critical analysis on the physical vapor deposition magnetron sputtering (PVDMS) technique that has been used for ion substituted Ca P based coatings on implants materials. The effect of PVDMS processing parameters such as discharge power, bias voltage, deposition time, substrate temperature, and post heat treatment on the surface properties of ion substituted Ca P coatings is elucidated. Moreover, the advantages, short comings and future research directions of Ca P coatings by PVDMS have been comprehensively analyzed. It is revealed that the topography and surface chemistry of amorphous HA coatings influence the cell behavior, and ion substituted HA coatings significantly increase cell attachment but may result in a cytotoxic effect that reduces the growth of the cells attached to the coating surface areas. Meanwhile, low crystalline HA coatings exhibit lower rates of osteogenic cell proliferation as compared to highly crystalline HA coatings developed on Ti based surfaces. PVDMS allows a close reproduction of bioapatite characteristics with high adhesion strength and substitution of therapeutic ions. It can also be used for processing nanostructured Ca P coatings on polymeric biomaterials and biodegradable metals and alloys with enhanced corrosion resistance and biocompatibility.  Recent studies have utilized the physical vapor deposition magnetron sputtering (PVDMS) for the deposition of Ca P and ion substituted Ca P thin film coatings on orthopedic and dental implants. This review explains the effect of PVDMS processing parameters, such as discharge power, bias voltage, deposition time, substrate temperature, and post heat treatment, on the surface morphology and crystal structure of ion substituted Ca P and ion substituted Ca P thin coatings. It is revealed that coating thickness, surface morphology and crystal structure of ion substituted Ca P coatings via PVDMS directly affect the biocompatibility and cell responses of such structures. The cell responses determine the osseointegration between the implant and host bone and eventually the success of the implants.

title: A systematic review of magnetron sputtering of AlN thin films for extreme condition sensing
abstract: In this article, a systematic overview of the published works on magnetron sputtering of AlN thin films for harsh condition applications is presented. Harsh environments may be defined as the operating conditions exhibiting extreme shock loads, high temperature, high pressure/forces and corrosive media. Some of the harsh environments include petrochemical plants, automobile/engine, marine, aerospace, in situ health monitoring, prosthetics, etc. In these applications, sensors are necessary to monitor and control process parameters such as pressure, temperature, fluid flow, chemical contents, PH and among others. As such, the sensor materials should be able to withstand the high and cyclic conditions within such operations. Aluminum nitride (AlN) is a ceramic material, which finds application in micro electromechanical systems (MEMS) such as acoustic sensors, energy harvesters, transducers and resonators. These applications are motivated by its (AlN) high piezoelectric effect, high surface acoustic wave velocity, excellent dielectric permittivity, high thermal stability, wide band gap, chemical inertness, and so forth. As such, AlN films have been deposited on various non metallic substrates such as Si, sapphire and polymers and on metallic substrates such as Ti6Al4V, diamond, Al, Cr and 304L stainless steel for different sensing applications. It is deduced that studies involving characterization of RF magnetron sputtered AlN thin films in harsh conditions are still scarce. The review serves as a resource for researchers and industry for development of sensors and transducers for harsh condition applications.

title: Pathways to Tailor Photocatalytic Performance of TiO2 Thin Films Deposited by Reactive Magnetron Sputtering
abstract: TiO2 thin films are used extensively for a broad range of applications including environmental remediation, self cleaning technologies (windows, building exteriors, and textiles) water splitting, antibacterial, and biomedical surfaces. While a broad range of methods such as wet chemical synthesis techniques, chemical vapor deposition (CVD) and physical vapor deposition (PVD) have been developed for preparation of TiO2 thin films, PVD techniques allow a good control of the homogeneity and thickness as well as provide a good film adhesion. On the other hand, the choice of the PVD technique enormously influences the photocatalytic performance of the TiO2 layer to be deposited. Three important parameters play an important role on the photocatalytic performance of TiO2 thin films: first, the different pathways in crystallization (nucleation and growth) second, anatase/rutile formation; and third, surface area at the interface to the reactants. This study aims to provide a review regarding some strategies developed by our research group in recent years to improve the photocatalytic performance of TiO2 thin films. An innovative approach, which uses thermally induced nanocrack networks as an effective tool to enhance the photocatalytic performance of sputter deposited TiO2 thin films, is presented. Plasmonic and non plasmonic enhancement of photocatalytic performance by decorating TiO2 thin films with metallic nanostructures are also briefly discussed by case studies. In addition to remediation applications, a new approach, which utilizes highly active photocatalytic TiO2 thin film for micro and nanostructuring, is also presented.

title: Recent progress on high power impulse magnetron sputtering (HiPIMS) The challenges and applications in fabricating VO2 thin film
abstract: High power impulse magnetron sputtering (HiPIMS) is well known in modern physical vapor deposition (PVD) owing to its high peak power density, high degree of ionization, high plasma density and hence high ion flux towards the substrate that allows ones to deposit high quality thin films in comparison with conventional magnetron sputtering technology. The present short review on HiPIMS intends to provide readers with a summary of the current status of this emerging PVD technique: the developmental history, the plasma characterization, and the applications in hardness and functional thin film fabrications. Several items on the distinctive feature of HiPIMS, including self sputtering mechanism, low deposition rate, arcing phenomenon and key factors of deposition process are reviewed in detail. To limit the scope, the emphasis is put on thermo chromic VO2 thin film deposited by HiPIMS. Based on this typical issue, some classical ideas and approaches on fabrication of the functional thin films through HiPIMS technique are demonstrated.High power impulse magnetron sputtering (HiPIMS) is well known in modern physical vapor deposition (PVD) owing to its high peak power density, high degree of ionization, high plasma density and hence high ion flux towards the substrate that allows ones to deposit high quality thin films in comparison with conventional magnetron sputtering technology. The present short review on HiPIMS intends to provide readers with a summary of the current status of this emerging PVD technique: the developmental history, the plasma characterization, and the applications in hardness and functional thin film fabrications. Several items on the distinctive feature of HiPIMS, including self sputtering mechanism, low deposition rate, arcing phenomenon and key factors of deposition process are reviewed in detail. To limit the scope, the emphasis is put on thermo chromic VO2 thin film deposited by HiPIMS. Based on this typical issue, some classical ideas and approaches on fabrication of the functional thin films through HiPIMS t.