Query: review of electrochemical deposition films

title: Electrochemical deposition of metal organic framework films and their applications
abstract: Metal organic framework (MOF) thin films have received increasing attention for many applications, such as chemical sensors and membranes. Several techniques have been developed for the deposition of MOF films. In particular, the processing of electrochemical deposition of MOFs has only recently been initiated but stands out from other methods due to the mild preparation conditions, monitoring of continuous processes, precisely controllable synthesis parameters and potential for large scale production. Recently, interest in the electrochemical deposition of MOF films has started to expand from their preparation to applications. In this review, we summarize and critically assess the state of the mechanism, the influence of parameters on electrochemical deposition of MOFs and their corresponding applications in different areas. Moreover, the strengths and shortcomings of different electrochemical deposition methods and their suitable scopes are discussed. Finally, the urgent challenges and future opportunities of electrochemical deposition of MOFs are highlighted.

title: Using nanomaterials as building blocks for electrochemical deposition: A mini review
abstract: Electrochemical deposition (ED) dates back to Faraday and is a well established approach for producing coatings. This review summarizes unconventional ED approaches, where nanostructured films are deposited, starting with nanomaterials as building blocks, instead of molecular or ionic species. This "nano to nano" deposition concept has a significant advantage of directly transferring nano objects from the dispersion to the coating, which maintains their unique nanostructures. It is achieved via destabilizing the nano objects in the dispersions by applying electrochemical potential or current, which diminishes the interparticle repulsion through two different mechanisms: (a) Direct redox induced deposition; (b) Indirect pH and ionic strength induced deposition. With electrochemical reactions as a driving force, the deposition process is selective to conductive and electrochemically active substrates and can be manipulated by potential/current and time, yielding films with thickness from nanometers to a few microns. Notably, electrochemically inactive and even non conductive nanomaterials may also be electrochemically deposited via the "nano to nano" approach using an indirect mechanism. Challenges and prospects are also discussed.

title: Electrochemical deposition of cadmium selenide films and their properties: a review
abstract: This review gives brief information of experimental conditions employed by different researchers for deposition of cadmium selenide (CdSe) thin films. For the films synthesized at room temperature, films should be annealed and etched to increase the solar cell efficiency. A photoelectrochemical study revealed that values of fill factor and efficiency of CdSe thin films deposited on fluorine doped tin oxide coated glass substrates exhibited maximum value compared to the film deposited on titanium and stainless steel substrates. This review will be helpful to researchers entering in field to understand basics about the electrodeposition of CdSe and its development towards next generation photovoltaics.

title: Electrochemical fabrication of metal organic frameworks membranes and films: A review
abstract: Electrochemical fabrication is an important method for the preparation of metal organic frameworks (MOFs) membranes and films. The method can be further divided into five categories: anodic deposition, cathodic deposition, conversion of electrosynthesized MOFs precursors, electrophoretic deposition, and galvanic displacement. In this article, the electrochemical fabrication methods and the applications of MOFs membranes and films were reviewed, and the existing challenges and outlook in this field were analyzed.

title: Electrochemical deposition of CZTS thin films on flexible substrate
abstract: In this work, we report some preliminary results concerning the fabrication of quaternary semiconductor Cu2ZnSnS4 (CZTS) thin films on a flexible substrate through the simultaneous electrodeposition of elements having different standard electrochemical potentials. CZTS thin films were obtained by potentiostatic deposition from aqueous baths at room temperature and under N2 atmosphere, varying bath composition. Chemical composition and structure of the electrodeposited films were evaluated by EDS, SEM, RAMAN and XRD. Preliminary results on the photoelectrochemical behaviour of the films will be also presented.  Selection and peer review under responsibility of The European Materials Research Society (E MRS)

title: Flame spray pyrolysis for the one step fabrication of transition metal oxide films: Recent progress in electrochemical and photoelectrochemical water splitting
abstract: Developing large scale deposition techniques to fabricate thin porous films with suitable opto electronic properties for water catalysis is a necessity to mitigate climate change and have a sustainable environment. In this review, flame spray pyrolysis (FSP) technique, a rapid and scalable methodology to synthesize nanostructured transitional metal oxide films with designed functionalities, is firstly introduced. Furthermore, applications in electrochemical (EC) and photoelectrochemical (PEC) water splitting for the production of hydrogen fuel is also presented. The high combustion temperature and the aggregation of flame aerosol ensure that the FSP made films possess high crystallinity, tunable porosity and high surface areas, making this method suitable either as catalysts for EC water splitting or as efficient semiconductor materials for PEC water splitting. Finally, a perspective on the next generation FSP engineered films with potential applications in energy storage and conversion is described.

title: Recent Development of Advanced Electrode Materials by Atomic Layer Deposition for Electrochemical Energy Storage
abstract: Electrode materials play a decisive role in almost all electrochemical energy storage devices, determining their overall performance. Proper selection, design and fabrication of electrode materials have thus been regarded as one of the most critical steps in achieving high electrochemical energy storage performance. As an advanced nanotechnology for thin films and surfaces with conformal interfacial features and well controllable deposition thickness, atomic layer deposition (ALD) has been successfully developed for deposition and surface modification of electrode materials, where there are considerable issues of interfacial and surface chemistry at atomic and nanometer scale. In addition, ALD has shown great potential in construction of novel nanostructured active materials that otherwise can be hardly obtained by other processing techniques, such as those solution based processing and chemical vapor deposition (CVD) techniques. This review focuses on the recent development of ALD for the design and delivery of advanced electrode materials in electrochemical energy storage devices, where typical examples will be highlighted and analyzed, and the merits and challenges of ALD for applications in energy storage will also be discussed.

title: Chemically Deposited CuInSe2 Thin Films and their Photovoltaic Properties: A Review
abstract: Copper Indium di Selenium, CuInSe2 (CISe) is the most promising absorber material for thin film solar cells. CISe based solar cells have shown long term stability and the highest conversion efficiency of all thin film solar cells, above 19% Moreover, CISe based solar cells are very stable and thus their operational lifetimes are long. The deposition method generally has a large impact on the resulting film properties as well as on the production costs. CISe can be prepared by a variety of methods like physical and chemical methods. The present review discusses first the liquid phase synthesis method like chemical bath deposition (CBD) electro deposition (ED) spray pyrolysis (SP) and successive ionic layer adsorption and reaction method (SILAR) etc. Next, the structural, optical, electrical, and photo electrochemical properties of CISe, as well as the features of solar cells made thereof are reviewed. The last part of the text deals with the application of CISe thin film absorbers in solar cells. The photo response properties of the CISe are discussed how they can improve the efficiency and reduce the cost in potential applications.

title: Atomic layer deposition of vanadium oxides: process and application review
abstract: Atomic layer deposition (ALD) is a method of choice for the growth of highly conformal thin films with accurately controlled thickness on planar and nanostructured surfaces. These advantages make it pivotal for emerging nanotechnology applications. This review sheds light on the current developments on the ALD of vanadium oxide, which, with proper postdeposition treatment yields a variety of functional and smart oxide phases. The application of vanadium oxide coatings in electrochemical energy storage, microelectronics and smart windows are emphasized.

title: Recent progress in atomic layer deposition of molybdenum disulfide: a mini review
abstract: As a kind of specially modified chemical vapor deposition (CVD) atomic layer deposition (ALD) has long been used to fabricate thin films. The self limiting reaction of ALD endows the films with excellent uniformity and precise controllability. The thickness of the films obtained by ALD can be controlled in an atomic scale (0.1 nm) on a large area substrate even with complex structures. Therefore, it has recently been employed to produce the two dimensional (2D) materials like MoS2. In this mini review, the research progress in ALD MoS2 is firstly summarized. Then the influences of precursors, substrates, temperature, and post annealing treatment on the quality of ALD MoS2 are presented. Moreover, the applications of the obtained MoS2 as an electrochemical catalysator are also described. Besides the perspective on the research of ALD of MoS2, the remaining challenges and promising potentials are also pointed out.