mwirth-epo/epo-nmt-datasets huggingface dataset:
若所述距离D太大，也就是所述沟槽112过深，所述沟槽112的底面位于所述第一掺杂区109的下方，所述接触孔插塞的底面和部分侧壁直接与源漏掺杂区103接触，所述接触电阻较大，不利于提高半导体结构的电学性能。
If the distance D is too great, that is, the groove 112 is too deep, the bottom surface of the groove 112 is located below the first doped region 109, and the bottom surface and part of the sidewall of the contact hole plug are n direct contact with the source-drain doped region 103, and the contact resistance is large, which is not beneficial to improving the electrical performance of the semiconductor structure.
本实施例中，所述沟槽112的底面与所述开口108的底面距离为2纳米至15纳米。
In some implementations, a distance between the bottom surface of the groove 112 and the bottom surface of the opening 108 is 2 nanometers to 15 nanometers.
参考图10和图11，在所述开口108和沟槽112中形成接触孔插塞113(如图11所示)。
Referring to FIG. 10 and FIG. 11, a contact hole plug 113 is formed in the opening 108 and the groove 112 (as illustrated in FIG. 11 ).
所述接触孔插塞113用于实现半导体结构内的电连接，还用于实现半导体结构与半导体结构之间的电连接。
The contact hole plug 113 is used for realizing the electrical connection in the semiconductor structure, and is also used for realizing the electrical connection between the semiconductor structure and the semiconductor structure.
所述接触孔插塞113与第一掺杂区109和第二掺杂区110连接，减小了所述接触孔插塞113与源漏掺杂区103的接触电阻。
The contact hole plug 113 is connected with the first doped region 109 and the second doped region 110, thereby reducing the contact resistance between the contact hole plug 113 and the source-drain doped region 103.
在其他实施例中，所述接触孔插塞113的材料还可以是Al、Cu、Ag或Au等。
In some implementations, the material of the contact hole plug 113 is W. In other implementations, the material of the contact hole plug 113 may be Al, Cu, Ag, Au or the like.
形成接触孔插塞113的步骤包括：向所述开口108和沟槽112内填充导电材料，去除高于所述开口108中的导电材料，位于所述开口108和沟槽112内的导电材料作为接触孔插塞113。
The step of forming the contact hole plug 113 includes filling the opening 108 and the groove 112 with a conducting material, removing the conducting material higher than the opening 108, and using the conducting material in the opening 108 and the groove 112 as the contact hole plug 113.
需要说明的是，在形成所述沟槽112后，形成接触孔插塞113前还包括：在所述沟槽112的侧壁和底面形成金属硅化物层(图中未示出)。
It should be noted that, after forming the groove 112 and before forming the contact hole plug 113, a metal silicide layer (not shown) is formed on the sidewall and bottom surface of the groove 112.
金属硅化物层用于减小接触孔插塞113与源漏掺杂区103的接触电阻。
The metal silicide layer is used for reducing the contact resistance between the contact hole plug 113 and the source-drain doped region 103.
结合参考图10，本实施例中，形成所述沟槽112后，形成接触孔插塞前，还包括：对所述沟槽112的底部进行离子掺杂，形成第三掺杂区114，所述第三掺杂区114与源漏掺杂区103的掺杂离子类型相同，且第三掺杂区114的离子掺杂浓度高于源漏掺杂区103的离子掺杂浓度；第三掺杂区114位于第一掺杂区109和源漏掺杂区103之间，且与第一掺杂区109接触；第三掺杂区114在基底上的投影覆盖所述第二掺杂区110在所述基底上的投影。
Referring to FIG. 10, in some implementations, after forming the groove 112 and before forming the contact hole plug, the method further includes performing ion doping on the bottom of the groove 112 to form a third doped region 114, the doping ion type of the third doped region 114 is the same as the ion doping type of the source-drain doped region 103, and the ion doping concentration of the third doped region 114 is higher than the ion doping concentration of the source-drain doped region 103; the third doped region 114 is located between the first doped region 109 and the source-drain doped region 103, and is in contact with the first doped region 109; and the projection of the third doped region 114 on the base covers the projection of the second doped region 110 on the base.
所述第三掺杂区114进一步的加大了高浓度的掺杂区域，使得形成的接触孔插塞底部不易直接与源漏掺杂区103接触。
The third doped region 114 further enlarges the high-concentration doped region, making it difficult for the bottom of the formed contact hole plug to be in direct contact with the source-drain doped region 103.
所述第三掺杂区114不宜过厚也不宜过薄。
It should be noted that the third doped region 114 should not be too thick or too thin.
若第三掺杂区114过厚，也就是说所述第三掺杂区114的区域较大，且因为第三掺杂区114中的掺杂离子浓度高于所述源漏掺杂区103中的掺杂离子浓度，所述第三掺杂区114中的掺杂离子易扩散至所述鳍部101中的沟道区中，在半导体结构工作时，源漏掺杂区103源极和漏极的耗尽层扩展，导致短沟道效应较严重。
If the third doped region 114 is too thick, that is to say, the area of the third doped region 114 is larger, because the ion doping concentration of the third doped region 114 is higher than the ion doping concentration of the source-drain doped region 103, the doping ions in the third doped region 114 can easily diffuse into the channel region in the fin 101, and when the semiconductor structure works, the source and drain depletion layers of the source-drain doped region 103 are expanded, resulting in serious short-channel effects.
若第三掺杂区114过薄，不易起到加大高浓度掺杂区域的目的，沟槽112中接触孔插塞顶部侧壁易直接与源漏掺杂区103接触，导致接触孔插塞与源漏掺杂区103的接触电阻较大。
If the third doped region 114 is too thin, it is not easy to achieve the purpose of enlarging the high-concentration doped region, and the top sidewall of the contact hole plug in the groove is easily in direct contact with the source-drain doped region 103, resulting in large contact resistance between the contact hole plug and the source-drain doped region 103.
本实施例中，所述第三掺杂区114的厚度为3纳米至10纳米。
In some implementations, the thickness of the third doped region 114 is 3 nanometers to 10 nanometers.
本实施例中，采用离子注入的方式形成第三掺杂区114。
In some implementations, the third doped region 114 is formed by adopting ion implantation.
所述影像装置包括相对设置的射线发射器和探测器，所述射线发射器和/或所述探测器设置在所述固定机架上，所述射线发射器发出的射线经过患者患部后由所述探测器接收，用于采集患者患部图像。
1: A radiotherapy device, comprising a fixed machine frame, a rotary machine frame, an imaging device and a treatment couch disposed on a side of the fixed machine frame, the treatment couch being capable of performing one of moving away from and moving close to the fixed machine frame along a first direction; wherein the rotary machine frame is rotatably connected to the fixed machine frame, and the rotary machine frame is provided with a treatment source; and the imaging device comprises a ray emitter and a detector which are disposed oppositely, at least one of the ray emitter and the detector is disposed on the fixed machine frame, and rays emitted by the ray emitter are received by the detector after passing an affected part of a patient, so as to capture images of the affected part of the patient.
2.根据权利要求1所述的设备，其特征在于，所述射线发射器和/或所述探测器能够相对于所述固定机架运动，以靠近或远离所述治疗床。
2: The device according to claim 1, wherein at least one of the ray emitter and the detector is capable of moving relative to the fixed machine frame, to perform one of moving close to and moving away from the treatment couch.
3.根据权利要求2所述的设备，其特征在于，所述设备还包括：支撑臂，所述支撑臂上连接有所述射线发射器和/或所述探测器，所述支撑臂带动与其连接的射线发射器和/或探测器相对于所述固定机架运动，以靠近或远离所述治疗床；
3: The device according to claim 2, further comprising a support arm, wherein the support arm is connected with at least one of the ray emitter and the detector, the support arm drives at least one of the ray emitter and the detector connected thereto to move relative to the fixed machine frame, to perform one of moving close to away from the treatment couch; wherein the fixed machine frame comprises a machine frame main body and a base; and the support arm is disposed on one of the machine frame main body and the base.
所述固定机架包括机架主体和底座；
4: The device according to claim 3, wherein in a case of the support arm being disposed on the machine frame main body, the support arm drives at least one of the ray emitter and the detector connected thereto to move relative to the fixed machine frame via a slide rail.
所述支撑臂设置在所述机架主体上，或者，所述支撑臂设置在所述底座上。
5: The device according to claim 3, wherein in a case of the support arm being disposed on the base, the support arm drives at least one of the ray emitter and the detector connected thereto to move relative to the fixed machine frame via a slide rail.
4.根据权利要求3所述的设备，其特征在于，在所述支撑臂设置在所述机架主体上的情况下；
6: The device according to claim 5, wherein the radiotherapy device comprises two groups of imaging devices and two support arms, and the two imaging devices are disposed on the two support arms respectively; and the two support arms are oppositely disposed on two sides of the fixed machine frame in a second direction, and the second direction is perpendicular to the first direction.
所述支撑臂通过滑轨带动与其连接的射线发射器和/或探测器相对于所述固定机架运动；或者，
7: The device according to claim 6, wherein an included angle of the rays emitted by the ray emitters in the two groups of imaging devices ranges from 60 degrees to 120 degrees.
所述支撑臂通过转轴带动与其连接的射线发射器和/或探测器相对于所述固定机架运动；或者，
8: A radiotherapy system, comprising a radiotherapy device comprising a fixed machine frame, a rotary machine frame, an imaging device and a treatment couch disposed on a side of the fixed machine frame, the treatment couch being capable of performing one of moving away from and moving close to the fixed machine frame along a first direction; wherein the rotary machine frame is rotatably connected to the fixed machine frame, and the rotary machine frame is provided with a treatment source; and the imaging device comprises a ray emitter and a detector which are disposed oppositely, at least one of the ray emitter and the detector is disposed on the fixed machine frame, and rays emitted by the ray emitter are received by the detector after passing an affected part of a patient, so as to capture images of the affected part of the patient.
5.根据权利要求3所述的设备，其特征在于，在所述支撑臂设置在所述底座上的情况下；
9: The system according to claim 8, further comprising a registration device establishing a communication connection with the radiotherapy device; wherein the radiotherapy device is configured to send the images of an affected part captured during positioning verification to the registration device; and the registration device is configured to determine positioning errors according to the images of the affected part and pre-stored diagnostic scan images of the affected part.
所述支撑臂通过滑轨带动与其连接的射线发射器和/或探测器相对于所述固定机架运动；或者，
10: The system according to claim 9, further comprising: a positioning control device establishing a communication connection with the radiotherapy device and the registration device respectively; wherein the registration device is further configured to send the positioning errors to the positioning control device; and the positioning control device is configured to adjust the position of the treatment couch in the radiotherapy device according to the positioning errors.
所述支撑臂通过转轴带动与其连接的射线发射器和/或探测器相对于所述固定机架运动。
11: The device according to claim 3, wherein in a case of the support arm being disposed on the machine frame main body, the support arm drives at least one of the ray emitter and the detector connected thereto to move relative to the fixed machine frame via a rotary shaft.
6.根据权利要求5所述的设备，其特征在于，所述设备包括两组影像装置以及两个支撑臂，所述两组影像装置设置在所述两个支撑臂上；
12: The device according to claim 3, wherein in a case of the support arm being disposed on the machine frame main body, the support arm is a telescopic arm.
所述两个支撑臂在第二方向上相对设置在所述固定机架两侧，所述第二方向与所述第一方向垂直。
13: The device according to claim 3, wherein in a case of the support arm being disposed on the base, the support arm drives at least one of the ray emitter and the detector connected thereto to move relative to the fixed machine frame via a rotary shaft.
8.一种放射治疗系统，其特征在于，所述系统包括：如权利要求1至7任一所述的放射治疗设备。
14: The system according to claim 8, wherein at least one of the ray emitter and the detector is capable of moving relative to the fixed machine frame, to perform one of moving close to and moving away from the treatment couch.
9.根据权利要求8所述的系统，其特征在于，所述系统还包括：与所述放射治疗设备建立有通信连接的配准模块；
15: The system according to claim 14, further comprising a support arm, wherein the support arm is connected with at least one of the ray emitter and the detector, the support arm drives at least one of the ray emitter and the detector connected thereto to move relative to the fixed machine frame, to perform one of moving close to and moving away from the treatment couch; wherein the fixed machine frame comprises a machine frame main body and a base; and the support arm is disposed on one of the machine frame main body and the base.
所述放射治疗设备用于向所述配准模块发送摆位验证时采集的患部图像；
16: The system according to claim 15, wherein in a case of the support arm being disposed on the machine frame main body, the support arm drives at least one of the ray emitter and the detector connected thereto to move relative to the fixed machine frame via a slide rail.
10.根据权利要求9所述的系统，其特征在于，所述系统还包括：分别与所述放射治疗设备和所述配准模块建立有通信连接的摆位控制模块；
17: The system according to claim 15, wherein in a case of the support arm being disposed on the base, the support arm drives at least one of the ray emitter and the detector connected thereto to move relative to the fixed machine frame via a slide rail.
所述配准模块还用于向所述摆位控制模块发送所述摆位误差；
18: The system according to claim 17, wherein the radiotherapy device comprises two groups of imaging devices and two support arms, and the two imaging devices are disposed on the two support arms respectively; and the two support arms are oppositely disposed on two sides of the fixed machine frame in a second direction, and the second direction is perpendicular to the first direction.
所述摆位控制模块用于根据所述摆位误差，调整所述放射治疗设备中治疗床的位置。
19: The system according to claim 18, wherein an included angle of the rays emitted by the ray emitters in the two groups of imaging devices ranges from 60 degrees to 120 degrees.
参考图1，示出了车辆座椅总成10。
With reference to FIG. 1, a vehicle seating assembly 10 is shown.
车辆座椅总成10可包括座椅54和座椅靠背14。
The vehicle seating assembly 10 may include a seat 54 and a seatback 14.
座椅54可安装到可被固定到车辆的地板62的导轨58。
The seat 54 may be mounted to rails 58 that may be secured to a floor 62 of a vehicle.
座椅靠背14可包括基座18和倾斜部分22。
The seatback 14 may include a base 18 and a reclining portion 22.
基座18可包括第一基座构件66和第二基座构件70。
The base 18 may include a first base member 66 and a second base member 70.
倾斜部分22可以联接到基座18。
The reclining portion 22 may be coupled to the base 18.
第一纵向构件34可包括第一上部部分74和第一下部部分78。
The first longitudinal member 34 may include a first upper portion 74 and a first lower portion 78.
第二纵向构件38可包括第二上部部分82和第二下部部分86。
The second longitudinal member 38 may include a second upper portion 82 and a second lower portion 86.
第一纵向构件34的第一下部部分78可以联接到第一基座构件66。
A first lower portion 78 of the first longitudinal member 34 may be coupled to the first base member 66.
第二纵向构件38的第二下部部分86可以联接到第二基座构件70。
A second lower portion 86 of the second longitudinal member 38 may be coupled to the second base member 70.
倾斜部分22可以在第一枢转点90和第二枢转点94处旋转地联接到基座18。
The reclining portion 22 may be rotationally coupled to the base 18 at first and second pivot points 90, 94.
横向构件46可以在第一枢转点90和第二枢转点94之间延伸。
A cross member 46 may extend between the first pivot point 90 and the second pivot point 94.
横向构件46可以是有用的，因为横向构件46可以连接第一附接点26和第二附接点30。
The cross member 46 may be useful because the cross member 46 may connect the first and second attachment points 26, 30.
横向构件46的第一端98可以联接到第一附接点26。
A first end 98 of the cross member 46 may be coupled to the first attachment point 26.
横向构件46的第二端102可以联接到第二附接点30。
A second end 102 of the cross member 46 may be coupled to a second attachment point 30.
第一附接点26和第二附接点30可各自包括相应的第一旋转锁定机构106、第二旋转锁定机构110或另一定位机构。
The first and second attachment points 26, 30 may each include a respective first rotary locking mechanism 106, a second locking mechanism 110, or another positioning mechanism.
横向构件46可以用作用于将第一旋转锁定机构106固定到第二旋转锁定机构110的连接构件。
The cross member 46 may act as a connecting member for securing the first rotary locking mechanism 106 to the second rotary locking mechanism 110.
在所示的示例中，致动器114可以联接到第一旋转锁定机构106。
In the example shown, an actuator 114 may be coupled to the first rotary locking mechanism 106.
致动器114可以脱离和接合第一旋转锁定机构106。
The actuator 114 may disengage and engage the first rotary locking mechanism 106.
第一旋转锁定机构106的脱离可允许横向构件46和第二旋转锁定机构110响应于第一旋转锁定机构106的旋转而旋转。
The disengagement of the first rotary locking mechanism 106 may allow the cross member 46 and the second rotary locking mechanism 110 to rotate in response to the rotation of the first rotary locking mechanism 106.
第二旋转锁定机构110可以类似于第一旋转锁定机构106的方式脱离。
The second rotary locking mechanism 110 may disengage in a similar manner to the first rotary locking mechanism 106.
致动器114与第一旋转锁定机构106的接合可以以特定角度固定座椅靠背14。
The engagement of the actuator 114 with the first rotary locking mechanism 106 may secure the seatback 14 at a particular angle.
当致动器114在特定位置与第一旋转锁定机构106接合时，则横向构件46可旋转以使第二旋转锁定机构110以类似于第一旋转锁定机构106的方式接合。
When the actuator 114 engages with the first rotary locking mechanism 106 in a particular position, then the cross member 46 may rotate to cause the second rotary locking mechanism 110 to engage in a similar manner to the first rotary locking mechanism 106.
因此，当乘员52操纵致动器114以调节座椅靠背14的相对角度时，可以同步第一旋转锁定结构106和第二旋转锁定机构110。
As such, when the occupant 52 manipulates the actuator 114 to adjust a relative angle of the seatback 14, the first and second rotary locking mechanisms 106, 110 may be synchronized.
由于可同步第一旋转锁定机构106和第二旋转锁定机构110，因此第一旋转锁定机构106和第二旋转锁定机构110可以同时接合和脱离。
Because the first and second rotary locking mechanisms 106, 110 may be synchronized, the first and second rotary locking mechanisms 106, 110 may engage and disengage simultaneously.
在一些示例中，横向构件46可以被称为倾角调节同步横杆。
In some examples, the cross member 46 may be referred to as a recliner synchronization crosstalk rod.
继续参考图1，横向构件46可以是横杆。
With continued reference to FIG. 1, the cross member 46 may be a cross rod.
在各种示例中，横杆可以是实心的。
In various examples, the cross rod may be solid.
在各种示例中，横杆可以是中空的或管状的。
In various examples, the cross rod may be hollow or tubular.
横杆可限定在第一枢转点90和第二枢转点94之间延伸的轴线118。
The cross rod may define an axis 118 extending between the first pivot point 90 and the second pivot point 94.
座椅靠背14的倾斜部分22可以包括布置在第一纵向构件34和第二纵向构件38之间的面板42。
The reclining portion 22 of the seatback 14 may include a panel 42 disposed between the first longitudinal member 34 and the second longitudinal member 38.
支架50可以布置在面板42上。
A bracket 50 may be disposed on the panel 42.
支架50可以包括用于将支架50固定到面板42的安装部分122。
The bracket 50 may include a mounting portion 122 for securing the bracket 50 to the panel 42.
支架50可包括用于接纳横向构件46的通道126。
The bracket 50 may include a channel 126 for receiving the cross member 46.
通道126可以是细长的，并且通道126可以沿着支架50的距离D延伸(图4)。
The channel 126 may be elongated, and the channel 126 may extend along the distance D of the bracket 50 (FIG. 4 ).
现在参考图2至图3A，座椅靠背14可以在直立位置A(图2)和倾斜位置B(图3)之间移动。
Referring now to FIGS. 2-3A, the seatback 14 may be movable between an upright position A (FIG. 2 ) and a reclined position B (FIG. 3 ).
类似地，座椅靠背14可以在倾斜位置B(图3)和直立位置A(图2)之间移动。
Similarly, the seatback 14 may be movable between a reclined position B (FIG. 3 ) and an upright position A (FIG. 2 ).
随着座椅靠背14从直立位置A(图2)移动到倾斜位置B(图3)，支架50与座椅靠背14一起从直立位置A(图2)移动到倾斜位置B(图3)。
As the seatback 14 moves from the upright position A (FIG. 2 ) to the reclined position B (FIG. 3 ), the bracket 50 moves with the seatback 14 from the upright position A (FIG. 2 ) to the reclined position B (FIG. 3 ).
支架50可以固定地联接到面板42。
The bracket 50 may be fixedly coupled to the panel 42.
座椅靠背14可定位在直立位置A和倾斜位置B之间的一个或多个间歇位置C(图3A)。
The seatback 14 may be positionable in one or more intermittent positions C between the upright position A and the reclined position B (FIG. 3A ).
座椅靠背14的倾斜部分22可围绕在第一枢转点90和第二枢转点94之间延伸的轴线118旋转。
The reclining portion 22 of the seatback 14 may be rotatable around the axis 118 extending between the first pivot point 90 and the second pivot point 94.
座椅靠背14的倾斜部分22可围绕在第一枢转点90和第二枢转点94之间延伸的轴线118在至少直立位置A(图2)和倾斜位置B(图3)之间枢转。
The reclining portion 22 of the seatback 14 may be pivotable about the axis 118 extending between the first pivot point 90 and the second pivot point 94 between at least an upright position A (FIG. 2 ) and a reclined position B (FIG. 3 ).
座椅靠背14的倾斜部分22可围绕在第一枢转点90和第二枢转点94之间延伸的轴线118在至少倾斜位置B(图3)和直立位置A(图2)之间旋转。
The reclining portion 22 of the seatback 14 may be rotatable around the axis 118 extending between the first pivot point 90 and the second pivot point 94 between at least a reclined position B (FIG. 3 ) and an upright position A (FIG. 2 ).
继续参考图2至图3A，如先前所讨论的，第一附接点26和第二附接点30(参见图1)中的至少一个可以包括相应的第一旋转锁定机构106或第二旋转锁定机构110，所述第一旋转锁定机构或第二旋转锁定机构被配置成将倾斜部分22保持在至少直立位置A、倾斜位置B以及在直立位置A和倾斜位置B之间的一个或多个间歇位置C。
With continuing reference to FIGS. 2-3A, as previously discussed, at least one of the first and second attachment points 26, 30 (see FIG. 1 ) may include a respective first rotary locking mechanism 106 or a second rotary locking mechanism 110 configured to retain the reclining portion 22 in at least the upright position A, the reclined position B, and one or more intermittent positions C between the upright position A and the reclined position B. An actuator 114 for disengaging and engaging the first or second rotary locking mechanism 106, 110 may be disposed at one of the first or second attachment points 26, 30 (FIG. 1 ).
致动器114可被致动以接合第一旋转锁定机构106或第二旋转锁定机构110，以将座椅靠背14固定在直立位置A、倾斜位置B、直立位置A和倾斜位置B之间的一个或多个间歇位置C以及其他位置。
The actuator 114 may be activated to disengage the first or second rotary locking mechanism 106, 110 to position the reclining portion 22 between at least upright and reclined positions A, B and in one or more intermittent positions C between upright and reclined positions A, B. The actuator 114 may be activated to engage the first or second rotary locking mechanisms 106, 110 to secure the seatback 14 in the upright position A, the reclined position B, one or more intermittent positions C between the upright position A and the reclined position B, and other positions.
另外，炉框体12在炉框体12的下端部具有出口。
Further, the furnace body 12 has an outlet at the lower end of the furnace body 12.
玻璃纤维3从炉框体12的出口向炉框体12的外部引出。
The glass fiber 3 is led out to the outside of the furnace body 12 from the outlet of the furnace body 12.
向炉框体12的内部导入氦气、氩等惰性气体。
An inert gas such as helium or argon is supplied into the furnace body 12.
刚拉丝出的玻璃纤维3为高温，因此无法直接涂敷保护用的树脂。
Because the temperature of the glass fiber 3 immediately after drawing is high, a protective resin cannot be applied to the glass fiber 3 as it is.
因此，刚拉丝出的玻璃纤维3在涂敷树脂前，由冷却装置20进行冷却。
For this reason, immediately after the glass fiber 3 is drawn, the glass fiber 3 is cooled by the cooling device 20 before the resin is applied.
冷却装置20配置于拉丝炉10的铅垂方向下方。
The cooling device 20 is disposed vertically below the drawing furnace 10.
冷却装置20具有：冷却筒21，其由冷媒进行冷却；以及光纤通路22，其是将冷却筒21贯通而形成的。
The cooling device 20 includes cooling tubes 21 cooled by a coolant, and a fiber path 22 formed through each of the cooling tubes 21.
光纤通路22是将冷却筒21沿铅垂方向贯通而形成的。
The fiber path 22 extends through each of the cooling tubes 21 in the vertical direction.
光纤通路22的入口22a形成于冷却筒21的上表面。
An inlet 22 aof the fiber path 22 is formed on the upper surface of each of the cooling tubes 21.
光纤通路22的出口22b形成于冷却筒21的下表面。
An outlet 22 bof the fiber path 22 is formed on the lower surface of each of the cooling tubes 21.
光纤通路22是供玻璃纤维3经过的通路。
The fiber path 22 is a path through which the glass fiber 3 passes.
玻璃纤维3从光纤通路22的入口22a朝向光纤通路22的出口22b行进。
The glass fiber 3 travels from the inlet 22 aof the fiber path 22 toward the outlet 22 bof the fiber path 22.
沿铅垂方向将多个冷却筒21配置为一列。
The plurality of cooling tubes 21 are arranged in a line in the vertical direction.
通过分为多个短尺寸的冷却筒21而配置，从而能够减少设备成本。
By arranging the plurality of short cooling tubes 21, manufacturing costs can be reduced.
其原因在于，与一体地制造长条的部件相比，单独地制造短尺寸的部件而连接的方式能够减少成本。
Manufacturing costs can be reduced by separately manufacturing short members and connecting the members together, rather than manufacturing a single long member.
另外，也能够针对每个冷却筒21而改变冷却筒21的温度。
In addition, the temperature may be changed for each of the cooling tubes 21.
冷却筒21的温度与冷媒的温度成为相同程度。
The temperature(s) of the cooling tubes 21 are the approximately same as the temperature of the coolant.
冷却装置20具有对冷却筒21进行收容的壳体23。
The cooling device 20 includes a casing 23 that houses the cooling tubes 21.
在壳体23和冷却筒21之间形成干燥空间24。
A dry space 24 is defined by the casing 23 and the cooling tubes 21.
干燥空间24形成于壳体23的内部且冷却筒21的外部。
The dry space 24 is formed inside the casing 23 and also outside the cooling tubes 21.
向干燥空间24导入露点比冷却筒21的温度低的干燥气体。
A dry gas having a dew point lower than the temperature(s) of the cooling tubes 21 is supplied into the dry space 24.
露点是指在对包含水蒸气的气体进行了冷却时，开始从水蒸气向水冷凝的温度。
The dew point is the temperature at which water vapor starts to condensate into water when a gas containing water vapor is cooled.
在露点小于或等于0℃的情况下，如果将包含水蒸气的气体冷却至露点，则开始从水蒸气向水的冷凝和从水向冰的凝固。
When the dew point is below 0° C., water vapor starts to condensate into water and the water starts to freeze into ice when a gas containing water vapor is cooled to the dew point.