mwirth-epo/epo-nmt-datasets huggingface dataset:
而且，目前为止，作为蚀刻金属配线或薄膜方法，最普遍使用的方法分为利用等离子处理或利用蚀刻溶液的方法，而使用蚀刻溶液时，通常由磷酸、硝酸、醋酸、盐酸、硫酸、氨、磷酸铁、硝酸铁、硫酸铁、盐酸铁、氯酸钠及水构成，因此作为蚀刻溶液使用时，不仅是银还同时蚀刻其他金属或金属合金或金属化合物，导致金属电路受损。
In the case of using the etching solution, the etching solution generally contains phosphoric acid, nitric acid, acetic acid, hydrochloric acid, sulfuric acid, ammonia, iron phosphate, iron nitrate, iron sulfate, iron hydrochloride, sodium chlorate, and water, and therefore etches not only silver but also other metals, a metal alloy or a metal compound, thereby damaging a metal circuit layer.
从而导致形成蚀刻因子(Etch factor)低的不良图案。
Thus, there has been a problem of forming a poor pattern of which an etch factor is low.
本发明是鉴于上述问题而提出的，其目的在于提供一种电路形成方法，其利用代替铜使用导电性好的银或银合金或银化合物通过溅射、化学气相沉积、无电解镀、涂布、浸渍等工序形成薄种子层的基板材料，通过SAP方法形成图案后选择性地仅蚀刻银或银合金或银化合物以实现电路。
Accordingly, the present invention is conceived to solve such conventional problems, and an aspect of the present invention is to provide a method of forming a circuit, in which a pattern is formed by a semi additive process (SAP) method using a substrate material with a thin seed layer formed through sputtering, chemical vapor deposition (CVD), electroless plating, coating, dipping, and the like process employing silver excellent in electric conductivity, a silver alloy or a silver compound instead of copper, and then only silver, the a silver alloy or the silver compound is selectively etched to form the circuit.
而且，本发明的目的在于提供一种蚀刻液组合物，其将金属电路层的去除抑制到最小，选择性地仅蚀刻银或银合金或银化合物，使得金属电路层不受损并且蚀刻因子(Etchfactor)高。
Further, an aspect of the present invention is to provide an etching solution composition, with which only silver, a silver alloy or a silver compound is selectively etched minimizing removal of a metal circuit layer, thereby having a high etch factor and preventing a metal circuit layer from damage.
为了达到所述目的，本发明提供一种利用导电性金属薄膜种子层的选择性蚀刻的电路形成方法，其特征在于包括：通过溅射、化学气相沉积、无电解镀、涂布、浸渍等工序利用银或银合金或银化合物在基板材料上形成种子层的步骤(S11)；利用光固化树脂在所述种子层上形成图案槽的步骤(S12)；通过电解镀或无电解镀在所述图案槽上镀铜以实现电路的步骤(S13)；去除所述光固化树脂露出种子层的步骤(S14)；及利用能够选择性地蚀刻银或银合金或银化合物的选择性蚀刻液去除所述露出的种子层的步骤(S15)。
The foregoing aspects of the present invention are achieved by providing a method of forming a circuit by selectively etching an electrically conductive metal thin film seed layer, the method including: a step (S 11) of forming a seed layer with silver, a silver alloy or a silver compound on a substrate material by processes including sputtering, chemical vapor deposition (CVD), electroless plating, coating, and dipping; a step (S 12) of forming a pattern groove with a photocurable resin on the seed layer; a step (S 13) of forming a circuit by plating the pattern groove with copper by electroplating or electroless plating; a step (S 14) of exposing the seed layer by removing the photocurable resin; and a step (S 15) of removing the exposed seed layer by a selective etching solution for selectively etching silver, a silver alloy or a silver compound.
而且，为了达到所述目的，本发明提供一种能够选择性地蚀刻银或银合金或银化合物的选择性蚀刻液组合物，其特征在于包括：氧化剂、胺类或铵化合物、添加剂及水。
The foregoing aspects of the present invention are achieved by providing a selective etching solution composition for selectively etching silver, a silver alloy or a silver compound, the selective etching solution composition including an oxidizing agent; amines or an ammonium compound; an additive; and water.
根据本发明提供一种利用由银或银合金或银化合物和铜形成的异种金属基板材料，选择性地仅蚀刻银或银合金或银化合物，以实现微间距并形成电路的方法。
According to the present invention, there is provided a method of forming a circuit with a fine pitch by selectively etching only silver, a silver alloy or a silver compound from a heterogeneous metal substrate material including silver, a silver alloy or a silver compound and copper.
而且，根据本发明提供一种选择性地仅蚀刻银或银合金或银化合物，以使铜电路不受损并且蚀刻因子高的蚀刻液组合物。
Further, according to the present invention, there is provided an etching solution composition having a high etch factor so that silver, a silver alloy or a silver compound can be selectively etched without damaging a copper circuit.
利用该方法及蚀刻组合物能够进行高性能、高集成电路的设计，能够以各种方式适用于需要轻薄短小的产品。
These make it possible to design a high-performance and highly-integrated circuit, and the circuit is variously applicable to a product required to be lightweight, thin, short and compact.
图1是实施例3的蚀刻试验执行结果。
FIG. 1 illustrates etching test results of an embodiment 3;
图2是图示本发明的电路形成方法的流程图。
FIG. 2 is a flowchart showing a method of forming a circuit according to the present invention;
图3是图示本发明的电路形成方法的简略图。
FIG. 3 is a schematic view showing a method of forming a circuit according to the present invention;
图4是图示利用现有的基板材料和蚀刻液组合物的电路形成方法的简略图。
FIG. 4 is a schematic view showing a method of forming a circuit based on a conventional substrate material and a conventional etching solution composition;
图5是图示利用本发明的蚀刻液组合物的电路形成方法的简略图。
FIG. 5 is a schematic view showing a method of forming a circuit based on an etching solution composition according to the present invention;
图6是利用本发明的电路形成方法填充导电性物质之后去除光固化树脂而形成电路的SEM照片。
FIG. 6 is a scanning electron microscopy (SEM) picture showing a circuit formed by removing a photocurable resin after a conductive material is filled by a method of forming a circuit according to the present invention; and
图7是利用本发明的蚀刻液组合物选择性地仅蚀刻银材质种子层而形成电路的SEM照片。
FIG. 7 is an SEM picture showing a circuit formed by selectively etching only a seed layer of silver with an etching solution composition according to the present invention.
实施发明的最佳方式
Hereinafter, embodiments of the present invention will be described in more detail.
以下，通过实施例更加详细地说明本发明，但实施例只是本发明的例示，本发明的范围并不限定于实施例。
However, the embodiments are merely examples of the present invention, and do not limit the scope of the present invention.
实施例1：选择性蚀刻液组合物的制备
Embodiment 1: Preparation of Selective Etching Solution Composition
1-1：选择性蚀刻液组合物1的制备
1-1: Preparation of Selective Etching Solution Composition 1
混合过氧化氢(hydrogen peroxide)12重量％、单乙醇胺(Monoethanolamine)40重量％、润湿剂(wetting agent)1重量％、消泡剂(antifoaming agent)1重量％及去离子水(DI water)46重量％制备了选择性蚀刻液组合物1。
Hydrogen peroxide 12 wt %, monoethanolamine 40 wt %, wetting agent 1 wt %, antifoaming agent 1 wt %, and deionized (DI) water 46 wt % were mixed to prepare a selective etching solution composition 1.
1-2：选择性蚀刻液组合物2的制备
1-2: Preparation of Selective Etching Solution Composition 2
混合过碳酸钠(Sodium percarbonate)7重量％、N-甲基二乙醇胺(N-Methyldiethnaolamine)32.5重量％、润湿剂0.5重量％、消泡剂1重量％及去离子水59重量％制备了选择性蚀刻液组合物2。
Sodium percarbonate 7 wt %, N-methyldiethnaolamine 32.5 wt %, wetting agent 0.5 wt %, antifoaming agent 1 wt %, and DI water 59 wt % were mixed to prepare a selective etching solution composition 2.
1-3：选择性蚀刻液组合物3的制备
1-3: Preparation of Selective Etching Solution Composition 3
混合过碳酸钠4重量％、N-甲基二乙醇胺(N-Methyldiethnaolamine)60重量％、润湿剂1.5重量％、消泡剂0.5重量％及去离子水34重量％制备了选择性蚀刻液组合物3。
Sodium percarbonate 4 wt %, N-methyldiethnaolamine 60 wt %, wetting agent 1.5 wt %, antifoaming agent 0.5 wt %, and DI water 34 wt % were mixed to prepare a selective etching solution composition 3.
实施例2：比较例的制备
Embodiment 2: Preparation of Comparative Examples
2-1：比较例1的制备
2-1: Preparation of Comparative Example 1
为了与实施例1中制备的选择性蚀刻液组合物1至3进行比较，参考韩国公开特许公报第10-2016-0115189号中记载的实施例1，混合三价铁10重量％、硝酸5重量％、醋酸5重量％、EDTA 1重量％、乙醇酸1重量％及去离子水78重量％制备了比较例1。
For comparison with the selective etching solution compositions 1 to 3 prepared in the embodiment 1, with reference to the embodiment 1 disclosed in Korean Patent Publication No. 10-2016-0115189, iron (III) 10 wt %, nitric acid 5 wt %, acetic acid 5 wt %, EDTA 1 wt %, glycolic acid 1 wt %, and DI water 78 wt % were mixed to prepare a comparative example 1.
2-2：比较例2的制备
2-2: Preparation of Comparative Example 2
为了与实施例1中制备的选择性蚀刻液组合物1至3进行比较，参考韩国公开特许公报第10-2010-0098409号中记载的实施例1，混合氨7重量％、过氧化氢1.5重量％及去离子水91.5重量％制备了比较例2。
For comparison with the selective etching solution compositions 1 to 3 prepared in the embodiment 1, with reference to the embodiment 1 disclosed in Korean Patent Publication No. 10-2010-0098409 , ammonia 7 wt %, hydrogen peroxide 1.5 wt %, and DI water 91.5 wt % were mixed to prepare a comparative example 2.
2-3：比较例3的制备
2-3: Preparation of Comparative Example 3
为了与实施例1中制备的选择性蚀刻液组合物1至3进行比较，参考韩国公开特许公报第10-2010-0098409号中记载的比较例2，混合磷酸50重量％、硝酸5重量％、醋酸30重量％及去离子水15重量％制备了比较例3。
For comparison with the selective etching solution compositions 1 to 3 prepared in the embodiment 1, with reference to the comparative embodiment 2 disclosed in Korean Patent Publication No. 10-2010-0098409, phosphoric acid 50 wt %, nitric acid 5 wt %, acetic acid 30 wt %, and DI water 15 wt % were mixed to prepare a comparative example 3.
实施例3：蚀刻试验结果
Embodiment 3: Etching Test Results
在ICP分析试验条件，即聚酰亚胺(PI)基板材料、试片大小2.5×2.5cm(银涂布种子层，挠性覆铜板(Cu FCCL))、蚀刻液量40g、蚀刻时间10秒、少于5ppm的N.D的ICP分析试验条件下，对实施例1中制备的选择性蚀刻液组合物及实施例2中制备的比较例进行了蚀刻试验(图1)。
Under test conditions such as a substrate material of polyimide (PI), a specimen size of 2.5×2.5 cm (Ag coating seed layer, Cu-flexible copper clad laminate (FCCL)), an etching solution of 40 g, an etching time of 10 seconds, and an inductively coupled plasma (ICP) analysis of regarding less than 5 ppm as not detected (N.D), the selective etching solution composition prepared in the embodiment 1 and the comparative example prepared in the embodiment 2 were subjected to an etching test (see FIG. 1 ).
结果，选择性蚀刻液组合物1至3用10秒蚀刻时间蚀刻银而露出聚酰亚胺基板材料的表面，Cu FCCL表面没有发生特别的变色或特殊情况，可确认并未发生基于蚀刻液的表面氧化。
As a result, with the selective etching solution compositions 1 to 3 and for the etching time of 10 seconds, silver was etched to expose the surface of the PI substrate material.
但是，可确认比较例1和2用相同的时间蚀刻时，银没有得到100％的蚀刻而存在残留物，Cu FCCL的表面被氧化而变色。
However, the surface of the Cu FCCL did not have any specific discoloration or anything significant, and therefore it was appreciated that the etching solution made no surface oxidation.
而且，比较例3用相同的时间蚀刻时，银得到了100％的蚀刻，但是可确认Cu FCCL由于蚀刻速度过快而表面氧化急剧地进行。
On the other hand, with the comparative examples 1 and 2 and for the same period of time, silver was not etched by 100% leaving a residue, and the surface of the Cu FCCL was oxidized and discolored.
通过ICP分析检测存在于蚀刻液中的银及铜成分而进行比较，可确认银没有得到100％的蚀刻的比较例1及2中检测出少于170ppm的银，在Cu FCCL表面被氧化而变色的比较例1至3中检测出铜。
Further, with the comparative example 3 and for the same period of time, silver was etched by 100%, but the surface of the Cu FCCL was quickly etched and rapidly oxidized.
尤其是，可确认银被蚀刻得多的比较例1及3中，铜也相同，蚀刻速度迅速而检测出大量的铜。
Silver and copper detected in the etching solution by the ICP analysis are as follows.
结果，不同于比较例1至3，可确认选择性蚀刻液组合物1至3，在10秒的蚀刻时间内银被100％蚀刻成170ppm以上，铜为N.D(小于5ppm)未被检测到。
In the comparative examples 1 and 2 with which silver was not etched by 100%, silver less than 170 ppm was detected.
由此可明确地确认选择性蚀刻液组合物1至3选择性地仅蚀刻银。
In the comparative examples 1 to 3 with which the surface of the Cu FCCL was oxidized and discolored, copper was detected.
本工业发明的专利申请涉及一种用于在裤子或裙子的上边缘上缝制腰带的缝纫机。
This patent application for industrial invention relates to a sewing machine used for sewing a waistband on the upper edge of trousers or skirts.
参考领域是纺织行业，尤其是裤子或裙子的腰带的实现；即，裤子的“腰带”是指形成腰带环的裤子或裙子的末端。
The field of reference is the textile sector, and particularly the realization of waistbands for trousers or skirts; namely, the term "waistband" of trousers refers to the ending portion of the trousers or the skirt where the belt loops are made.
尽管本发明被设计用于在裤子或裙子的上边缘上缝制腰带，但是本发明可以用于需要缝制具有不同厚度的织物的两个横向平行边缘的所有应用。
Although the present invention was devised for sewing a waistband on the upper edge of trousers or skirts, the same invention can be used for all applications that require sewing two lateral parallel edges of a fabric with different thickness.
换句话说，本发明可用于实现具有与裤子或裙子之一类似的构造的部件。
Otherwise said, the present invention can be used for the realization of parts that have a similar configuration to the one of trousers or skirts.
-图1B是沿着平面IV-IV截取的图1的裤子和腰带的截面图，其中示出了根据第二实施例的腰带；
In order to better understand the field of application of the present invention, Figs. 1 to 2 show a conventional pair of trousers and a conventional waistband, in particular; Fig. 1 is a diagrammatic front view of a pair of trousers with the waistband sewn on the trousers; Fig. 1A is a sectional view of the trousers and of the waistband of Fig. 1 taken along the plane IV-IV, wherein the waistband is shown according to a first embodiment; Fig. 1B is a sectional view of the trousers and of the waistband of Fig. 1 taken along the plane IV-IV, wherein the waistband is shown according to a second embodiment; Fig. 2 is a top view of the waistband.
要注意的是，裤子是根据人体的形状而制成的，对于男女是不同的。
It is noted that trousers are made according to the shape of the human body, which is different for men and women.
特别地，参考骨盆的形状，对于男女是非常不同的。
In particular, reference is made to the shape of the pelvis, which is very different for men and women.
鉴于男女臀部的形状不同，必须为裤子的腰带赋予特殊的形状，以获得解剖学设计的腰带。
In view of the different shape of the hips in men and women, a special shape must be given to the waistband of trousers in order to obtain an anatomically designed waistband.
特别地，尤其是在女性中，人体在臀部具有截头圆锥形的形状，并且在前部(胃部)和后部(背部)具有大致直线形的形状。
In particular, and especially in women, the human body has a truncated-conical shape in the hips, and a substantially rectilinear shape in the front (stomach) and in the back (back).
-两个曲线部分C21、C22，其相对于所述直线端部C11、C12设置在连续位置，适于与使用者的臀部接触；
Therefore, a waistband (C) must have a shape like the one shown in Fig. 2, which is composed of: two rectilinear ending portions (C11, C12) suitable for being in contact with the stomach of the user, which are joined with male-female fastening means, such as buttons and eyelets; two curvilinear portions (C21, C22) disposed in consecutive position relative to said rectilinear ending portions (C11, C12), which are suitable for being in contact with the hips of a user; a rectilinear portion (C3) that joins the two curvilinear portions (C21, C22) and is suitable for being in contact with the back of a user.
参考图2，腰带C包括两个纵向侧Cc、Cr。
With reference to Fig. 2, the waistband (C) comprises two longitudinal sides (Cc, Cr).
裤子的腰带C构造为分开的部分，然后缝在裤子L上。
The waistband (C) for trousers is realized in a separate piece and is then sewn on the trousers (L).
特别地，腰带C是通过提供沿其纵轴折叠的织物而制成的。
In particular, the waistband (C) is made by providing a fabric that is folded along its longitudinal axis.
可以通过两种不同的方式折叠织物，从而获得两个不同类型的腰带，如图1A和图1B所示。
The fabric can be folded in two different ways, thus obtaining two waistbands of different type, as shown in Fig. 1A and 1B.
根据图1A的实施例，腰带C具有与两个纵向侧之一相对应的两个边界B。
According to the embodiment of Fig. 1A, the waistband (C) has two borders (B) in correspondence of one of the two longitudinal sides.
根据图1B的实施例，腰带C对于每个纵向侧Cr、Cc具有与两个纵向侧Cr、Cc相对应的两个边界B。
According to the embodiment of Fig. 1B, the waistband (C) has two borders (B) for each longitudinal side (Cr, Cc) in correspondence of the two longitudinal sides (Cr, Cc).
根据两个实施例，在将腰带C缝合到裤子L之前，裤子L的上边缘L1位于腰带C的纵向侧Cc、Cr的两个边界B之间。
According to the two embodiments, before sewing the waistband (C) to the trousers (L), an upper edge (L1) of the trousers (L) is positioned between the two borders (B) of a longitudinal side (Cc, Cr) of the waistband (C).
然后，通过缝合设置了裤子L的上边缘L1的纵向侧(接合缝)并缝制相对的纵向侧(成形缝)来缝制腰带C。
Then, the waistband (C) is sewn by sewing the longitudinal side wherein the upper edge (L1) of the trousers (L) is disposed (joining seam) and by sewing the opposite longitudinal side (finishing seam).
必须注意的是，在下面的描述中，术语“接合侧”Cc是指其中设置了裤子L的上边缘L1的腰带C的纵向侧，而术语“成形侧”Cr是指与所述接合侧Cc相对的纵向侧。
It must be noted that, in the following description, the term "joining side" (Cc) refers to the longitudinal side of the waistband (C) wherein the upper edge (L1) of the trousers (L) is disposed, whereas the term "finishing side" (Cr) refers to the longitudinal side in opposite position to said joining side (Cc).
-两根针，一根用于缝制接合侧，另一根用于缝制成形侧(必须注意，缝纫机在市场上有售，其中包括另外的针，用于将腰带与所述两根针一起缝制到裤子上或在腰带上进行装饰缝制)；
According to the prior art, the sewing is made by means of an ordinary sewing machine (100) comprising: a working station, a worktop, two needles, one for sewing the joining side and one for sewing the finishing side (it must be noted that sewing machines are available on the market, which comprise additional needles that are used to sew the waistband to the trousers together with said two needles or to make decorative sewing on the waistband); a puller device that is disposed downstream the two needles and presses the fabrics (trousers and waistband) in order to frictionally pull them along the worktop.
通过将腰带和裤子放在工作台上并用拉动装置拉动，可以形成两个接缝，即在接合侧Cc上的一个接缝和在成形侧Cr上的一个接缝。
Two seams can be made by disposing the waistband and the trousers on the worktop and by pulling them with the puller device, namely one seam in the joining side (Cc) and one seam in the finishing side (Cr).
参考图1A和1B，腰带C的接合侧Cc和成形侧Cr具有不同的厚度。
With reference to Figs. 1A and 1B, the joining side (Cc) and the finishing side (Cr) of the waistband (C) have a different thickness.
更具体地，由于设置在两个边界B之间的裤子L的上边缘L1增加了接合侧Cc的厚度，所以接合侧Cc的厚度大于成形侧Cr的厚度。
More particularly, the thickness of the joining side (Cc) is higher than the thickness of the finishing side (Cr) because the upper edge (L1) of the trousers (L), which is disposed between the two borders (B), increases the thickness of the joining side (Cc).
这种厚度上的差异导致拉动装置对腰带的两侧施加压力的差异，从而导致沿工作台的一侧与另一侧不同的行进速度。
Such a difference in thickness results in a difference in the pressure exerted by the puller device against the two sides of the waistband, and consequently in a different traveling speed along the worktop of one side compared to the other side.
更精确地，拉动装置由于接合侧Cc较高的厚度而在接合侧Cc上施加较高的压力，因此，所述接合侧Cc将沿着工作台以比成形侧Cr更高的速度行进。
More precisely, the puller device exerts a higher pressure on the joining side (Cc) because of its higher thickness and therefore said joining side (Cc) will travel along the worktop with a higher speed than the finishing side (Cr).
为了缝合腰带C的曲线部分C21、C22，两侧的这种不同速度可能是有用的，因为两侧Cc、Cr具有与所述曲线部分C21、C22相对应的不同长度。
Such a different speed of the two sides can be useful in order to sew the curvilinear portion (C21, C22) of the waistband (C) because the two sides (Cc, Cr) have a different length in correspondence of said curvilinear portion (C21, C22).
相反，由于行进速度的不同，在缝制直线部分C11、C12、C3时无法进行两个平行的接缝，因为拉动装置会导致由于施加在两侧C的不同压力所导致的腰带C的两侧未对准。
On the contrary, because of the different traveling speed, it is not possible to make two parallel seams while sewing a rectilinear portion (C11, C12, C3) because the puller device creates a misalignment of the two sides of the waistband (C) due to the different pressure exerted on the two sides (C).
这种错位必须由位于针头A上方并在行进速度更快的一侧执行保持动作的操作员来进行补偿，从而使两侧在针头下的行进速度相同。
Such a misalignment must be necessarily compensated by an operator who is situated upstream the needles (A) and performs a retention action on the side that travels faster, thus providing the same traveling speed of the two sides under the needles.
必须注意的是，在利用两侧的不同行进速度缝制曲线部分C21、C22时，为了精确缝制，必须使用复杂的附加装置，并手动或自动移动这些装置，从而正确并持续地将织物引导到针的上方。
It must be noted that, while sewing the curvilinear portion (C21, C22) taking advantage of the different traveling speed of the two sides, in order for sewing to be precise, complex additional devices must be used and moved either manually or automatically in order to correctly and constantly direct the fabrics upstream the needle.
因此，缝纫精度将取决于由所述复杂的附加装置执行的动作，如果它们是自动操作的，则这些附加装置难以使用并且需要编程；此外，在这种情况下，最终结果的质量在很大程度上受到编程操作的准确性的影响。
Therefore, the sewing precision will depend on the action performed by said complex additional devices, which are difficult to use and need to be programmed, if they are automatically operated; moreover, in such a case, the quality of the final result is largely affected by the accuracy of the programming operations.
在这种情况下，操作员无法执行任何手动操作以避免可能的错误。
In such a case, the operator cannot perform any manual operation in order to avoid a possible mistake.
因此，有必要通过专门的工人执行非常准确的编程操作。
So, it will be necessary to perform very accurate programming operations by means of specialized workers.
本发明的目的是提供一种缝纫机，其能够改变织物的两侧之间的相对行进速度，而无需使用上述复杂的装置。
The purpose of the present invention is to provide a sewing machine that is capable of varying the relative traveling speed between two sides of a fabric, without the need to use the aforementioned complex devices.
本发明的另一个目的是提供一种缝纫机，其能够沿着具有直线和曲线截面的轨迹同时制作两个平行的接缝。
An additional purpose of the present invention is to provide a sewing machine that is capable of simultaneously making two parallel seams along a trajectory with rectilinear and curvilinear sections.
本发明的另一个目的是提供一种缝纫机，其能够使织物的具有不同厚度的两个相对侧沿着工作台均匀地行进。
Another purpose of the present invention is to provide a sewing machine that is capable of making two opposite sides of a fabric with different thickness travel uniformly along a worktop.
最后，本发明的另一个目的是提供一种缝纫机，其除了实现上述目的之外，鉴于其创新部件的简单性，还可以手动使用或可以通过简单的方式进行编程。
Finally, another purpose of the present invention is to provide a sewing machine that, in addition to achieving the aforementioned purposes, can be used manually or can be programmed in a simple way in view of the simplicity of its innovative parts.
根据本发明，通过所附独立权利要求1的特征实现这些目的。
These purposes are achieved according to the invention with the characteristics of the appended independent claim 1.
有利的实施方式从从属权利要求中得出。
Advantageous embodiments appear from the dependent claims.
根据本发明的缝纫机由权利要求1限定。
The sewing machine according to the invention is defined by claim 1.
根据本发明的缝纫机的优点是显而易见的。
The advantages of the sewing machine according to the invention are evident.
设置可移动顶表面和用于所述可移动顶表面的平移装置，允许调节由拉动装置施加在织物(腰带)的一侧上的压力，从而改变织物(腰带)的两侧之间的相对行进速度。
The provision of the movable top surface and of the translation means for said movable top surface permits to adjust the pressure exerted by the puller device on one side of the fabric (waistband), thus varying the relative traveling speed between the two sides of the fabric (waistband).
为了清楚起见，参照附图继续对根据本发明的缝纫机进行描述，这些附图仅具有示例性而非限制性的意义，其中：
For the sake of clarity, the description of the sewing machine according to the invention continues with reference to the appended drawings, which only have a merely illustrative, not limiting value, wherein: Fig. 1 is a diagrammatic front view of a pair of trousers with the waistband sewn on the trousers; Fig. 1A is a sectional view of the trousers of Fig. 1, taken along the plane IV-IV, wherein the waistband is shown according to a first embodiment; Fig. 1B is a sectional view of the trousers of Fig. 1, taken along the plane IV-IV, wherein the waistband is shown according to a second embodiment; Fig. 2 is a top view of a conventional waistband; Fig. 3 is a side view of the sewing machine according to the invention, wherein the puller device is in raised position and the movable top surface is in retracted position; Fig. 4 is a side view of the sewing machine according to the invention, wherein the puller device is in lowered position and the movable top surface is in retracted position; Fig. 5 is a side view of the sewing machine according to the invention, wherein the puller device is in lowered position and the movable top surface is in extracted position; Fig. 5A is an enlarged view of the detail of Fig. 5 Fig. 6 is a front view of the sewing machine according to the invention, wherein said movable top surface is in extracted position; Fig. 7 shows a rectilinear fabric that is used for realizing the waistband; Fig. 8 shows a waistband obtained with the fabric shown in Fig. 7 and sewn to a pair of trousers, wherein the waistband has curvilinear portions thanks to the sewing machine of the invention; Fig. 9 is the same as Fig. 8, except for the fact that it is provided with a central section with opposite concavity compared to the lateral curvilinear portions.
-图1是裤子的示意主视图，其中腰带缝在裤子上；
With reference to Figs. 3, 4, 5, 5A and 6, a sewing machine according to the invention is disclosed, which is generally indicated with the reference numeral (100).
-图1A是沿着平面IV-IV截取的图1的裤子的截面图，其中示出了根据第一实施例的腰带；
The sewing machine (100) of the invention was devised for sewing fabrics, in particular a waistband (C) to an upper edge of a pair of trousers (L) or of a skirt.
-图1B是沿着平面IV-IV截取的图1的裤子的截面图，其中示出了根据第二实施例的腰带；
The sewing machine (100) comprises a working station (S) and a worktop (P) in correspondence of the working station (S), whereon the fabrics are disposed.
-图2是传统腰带的俯视图；
The sewing machine (100) comprises a sewing head (1) and two needles (A) supported by said sewing head (1).
-图3是根据本发明的缝纫机的侧视图，其中，拉动装置处于升高位置而可移动顶表面处于缩回位置；
Although only two needles (A) are shown in the appended figures, the sewing machine (100) can be also provided with additional needles (A) for decorative sewing.
-图4是根据本发明的缝纫机的侧视图，其中，拉动装置处于降低位置而可移动顶表面处于缩回位置；
Additionally, the sewing machine (100) comprises supporting and moving means (Q) for said needles (A).