mwirth-epo/epo-nmt-datasets huggingface dataset:
而且，由于凸部4的旋入方向W1的凸部端面4d成为从螺纹顶部侧的端缘d1朝向凸部顶部4a，朝螺纹高度沿螺纹5的旋入方向的相反方向W2而逐渐立起的倾斜面，因此不是挂到底孔101上，而是以顺畅地塑性变形出底孔的方式来加工出内螺纹。
Then, the convex portion end face 4d in the screw driving direction W1 of each convex portion 4 forms an inclined plane in which the height of the screw thread thereof gradually rises from the end edge d1 thereof at the side of the screw thread crest toward the convex crest 4a in the opposite direction W2 to the screw driving direction of the screw thread 5.
因此，所产生的切屑少且切屑能够滞留在凸部4与凸部4之间的无凸部的螺纹5之间的宽广的空间内，从而能够抑制旋入扭矩上升并且能够顺畅地排出。
Accordingly, chips generated at that time are small, and besides, the chips can be made to stay in wide spaces around the screw thread 5 between adjacent convex portions 4 in which no convex portion exists, so that an increase in the torque required for screw driving can be suppressed, and the chips can also be discharged in a smooth manner.
而且，由于内螺纹由凸部4形成，因此如图3的(C)所示，对于所成形的内螺纹，平行螺钉部31的平行螺纹51之间存在间隙，与通常的螺帽相比间距(clearance)较小，因此外螺纹与内螺纹的空隙小，对松动有效。
Further, because the internal screw is formed by the convex portions 4, as illustrated in Fig. 3C, the parallel screw thread 51 of the parallel threaded portion 31 has gaps with respect to the internal screw thus formed, and a clearance become smaller than in the case of a normal nut, and hence, a backlash between the external screw and the internal screw is small, which is effective to prevent loosening.
(作为螺栓而使用在附着有异物的内螺纹的情况)
(Use of the External Screw Member as a Bolt for an Internal Screw Member with Foreign Matter Adhered Thereto)
另一方面，在旋入附着有异物的内螺纹部件200的情况下，如图4的(A)、(B)所示，锥形螺钉部32对于内螺纹部件200而作为引导使用来发挥作用，从而调节内螺纹部件200的内螺纹201的螺距并且从锥形螺钉部32起平行螺钉部31逐步卡合到内螺纹上。
On the other hand, in cases where the external screw member 1 is screw driven into an internal screw member 200 with foreign matter adhered thereto, as illustrated in Figs. 4A and 4B, the tapered threaded portion 32 functions as a guide for the internal screw member 200, so that the tapered threaded portion 32 first comes into engagement with an internal screw 201 of the internal screw member 200, and then, the parallel threaded portion 31 engages the internal screw 201, while adjusting the pitch of the internal screw 201 with the external screw.
而且，在凸部4进入内螺纹201内的阶段中，通过凸部4，使附着在内螺纹201的涂膜、飞溅物等异物从内螺纹的内直径侧至牙底侧逐渐被去除，最终使设置在平行螺钉部31的凸部4的旋入方向的凸部端面4d的轮廓与内螺纹201的截面形状大致匹配，从而使所附着的异物完全刮落而被去除。
Then, in a stage or process in which the convex portions 4 advance into the internal screw 201, foreign matter such as paint films or coating films, sputter, etc., adhered to the internal screw 201 are gradually removed from an inside diameter side to a root bottom side of the internal screw 201 by means of the convex portions 4, and finally, the contour or outline of the convex portion end face 4d in the screw driving direction of each convex portion 4 formed in the parallel threaded portion 31 substantially comes into match with the cross sectional shape of the internal screw 201, and the adhered foreign matter is substantially completely scraped to be removed.
即使内螺纹201的形状稍微有些歪斜，也仍具有自攻作用，因此可校正内螺纹201的形状，接着使平行螺钉部顺畅地嵌合，从而不必担心外螺纹部件会因异物而卡住。
The external screw member 1 has a self-tapping function, and so, even if the shape of the internal screw 201 has more or less distortion, the shape of the internal screw 201 is corrected in an appropriate manner by the self-tapping function of the tapered threaded portion 32, so that the parallel threaded portion 31 following the tapered threaded portion 32 comes into fitting engagement with the internal screw 201 in a smooth manner, and there is no fear that foreign matter is bitten into and stuck to the external screw member 1.
此外，凸部4从锥形螺钉部32至平行螺钉部31依次成为大直径，因此能够从内螺纹201的内直径侧至外径侧一律将涂装、飞溅物等异物逐渐剥离，从而不会导致扭矩急剧上升。
In addition, the convex portions 4 increases in diameter successively from the tapered threaded portion 32 to the parallel threaded portion 31, so that foreign matter such as paint application, sputter, etc., can be gradually exfoliated or scraped in a uniform manner from the inside diameter side to the outside diameter side of the internal screw 201, thus making it possible to avoid a rapid torque rise.
[凸部的变形例]
[Modifications of the Convex Portion]
接下来，对凸部的变形例进行说明。
Next, reference will be made to modifications of the convex portion.
在以下说明中，主要仅对不同于上述实施方式的点进行说明，并针对同一结构部分标注同一符号且省大致说明。
In the following explanation, the differences of the modifications from the above-mentioned embodiment will be mainly described, and the same components will be denoted by the same symbols, and the explanation thereof will be omitted.
图5及图7的(A)图示出凸部的变形例1。
Figs. 5A through 5D and Fig. 7A illustrate a first modification of the convex portion.
图5的(A)、(B)示意性地表示作为异物去除用螺栓来使用的情况下的螺纹的嵌合状态，图5的(C)、(D)示意性地表示作为自攻螺钉来使用的情况下的螺纹的嵌合状态。
Figs. 5A and 5B, respectively, schematically illustrate the fitting engagement states of screw threads in the case of using the external screw member as a bolt for removing foreign matter, and Figs. 5C and 5D, respectively, schematically illustrate the fitting engagement states of screw threads in the case of using the external screw member as a self-tapping screw.
首先，参照图5(A)对凸部的结构进行说明。
Here, the structure of a convex portion will be explained by referring to Fig. 5A.
图5的(A)图示出设置在平行螺纹51的凸部14与其相连的平行螺纹51的一牙峰。
Fig. 5A illustrates a convex portion 14 formed in a parallel screw thread 51, and one screw thread or ridge of the parallel screw thread 51 following the convex portion 14.
对于本说明书以及/或者权利要求书所记载的全部技术特征而言，独立于实施例以及/或者权利要求所记载的技术特征的结构，可以理解为作为对申请最初的公开以及权利要求所记载的特定事项的限定，意在个别并且彼此独立地进行公开。
All features disclosed in the description and/or the claims are intended to be disclosed separately and independently from each other for the purpose of original written disclosure, as well as for the purpose of restricting the claimed subject matter, independent of the compositions of the features in the embodiments and/or the claims.
并且，关于所有的数值范围和组或者群的记载，可以理解为作为对申请最初的公开以及权利要求所记载的特定事项的限定，意在公开这些中间的结构。
In addition, all value ranges or indications of groups of entities are intended to disclose every possible intermediate value or intermediate entity for the purpose of original written disclosure, as well as for the purpose of restricting the claimed subject matter.
参照附图对本实施例的检查方法进行说明。
A method of inspection according to an embodiment will be described with reference to the drawings.
在该检查方法中，对被照射了激光的镍膜12进行检查。
In this inspection method, a laser-irradiated nickel film 12 is inspected.
要被激光照射的镍膜12设置在导体部件10上，例如能够通过溅射法等来形成。
The nickel film 12 to be irradiated with laser is provided on a conductor member 10, and may be formed by sputtering, for example.
导体部件10具有大致板形状或者立方体形状，例如能够由铜、铝或者其他金属之类的导体材料构成。
The conductor member 10 has a substantially plate-like shape or a rectangular shape, and may be constituted of a conductive material such as copper, aluminum, or other metal.
虽然是一个例子，但导体部件10能够作为半导体装置的部件来使用，并通过密封体(例如树脂)与半导体元件一体封装。
Although this is merely an example, the conductor member 10 may be used as a component in a semiconductor device, and may be integrally packaged with a semiconductor element by a sealing body (such as resin).
这里，在检查方法的说明之前，先参照图1、图2对向镍膜12进行激光照射的激光照射工序进行说明。
Here, prior to the description of the inspection method, a laser irradiation step of irradiating the nickel film 12 with laser will be described with reference to FIGS. 1 and 2.
如图1所示，在激光照射工序中，对镍膜12的一部分或者整体照射激光(图1中的箭头X方向)。
As shown in FIG. 1, in the laser irradiation step, a part of or an entirety of the nickel film 12 is irradiated with laser (in a direction along an arrow X in FIG. 1 ).
虽为一个例子，但在激光照射工序中，也可以使用脉冲激光装置边在镍膜12上进行扫描边间断地照射斑点状的激光。
Although this is merely an example, in the laser irradiation step, a pulse laser device may be used to intermittently irradiate the nickel film 12 with spot-type laser while scanning over the nickel film 12.
图1中的箭头Y表示激光的扫描方向。
An arrow Y in FIG. 1 shows a laser scanning direction.
通过这样的激光照射，从而在镍膜12上形成微小的凹凸形状。
Fine concave-convex patterns are formed on the nickel film 12 by such laser irradiation.
该微小的凹凸形状例如能够提高导体部件10与密封体的紧贴性。
The fine concave-convex patterns can, for example, improve adhesion between the conductor member 10 and the sealing body.
如图2所示，若对激光照射工序后的镍膜12进行观察，则在被照射了激光的镍膜12上形成有多个的激光痕14。
As shown in FIG. 2, when the nickel film 12 after the laser irradiation step is observed, a large number of laser marks 14 is formed on the laser-irradiated nickel film 12.
虽为一个例子，但在本实施例的激光照射工序中，形成圆形状的激光痕14，其直径尺寸约70微米左右。
Although this is merely an example, circular laser marks 14 are formed in the laser irradiation step of the present embodiment, and a diameter size thereof is about 70 micrometers.
在该激光照射工序中，若激光功率、照射时间之类的加工参数不适当，则无法在镍膜12上正确地形成微小的凹凸形状。
In this laser irradiation step, the fine concave-convex patterns are not formed appropriately on the nickel film 12 if processing parameters, such as power and irradiation time of the laser, are not suitable.
为了正确地设定加工参数，需要对被照射激光后的镍膜12进行检查，从而判断所使用的加工参数的优劣。
In order to set the suitable processing parameters, suitability of the used processing parameters needs to be assessed by inspecting the laser-irradiated nickel film 12.
关于这一点，根据本实施例的检查方法，能够客观地评价被照射了激光的镍膜12的状态。
In regards to this point, the inspection method according to the present embodiment enables a condition of the laser-irradiated nickel film 12 to be evaluated objectively.
以下，对本实施例的检查方法进行详细的说明。
Hereinbelow, the inspection method according to the present embodiment will be described in detail.
(实施例1)参照图3-图9对实施例1的被照射了激光的镍膜12的检查方法进行说明。
(First Embodiment) The inspection method of the laser-irradiated nickel film 12 according to the first embodiment will be described with reference to FIGS. 3 to 9.
这里，在图6、图8中，描绘了重复进行30次的镍膜12的颜色测量而得到的平均值。
Here, FIGS. 6 and 8 have average values plotted therein, which were obtained by repeating color measurement of the nickel film 12 for 30 times.
如图9所示，检查方法具备还原工序S12。
As shown in FIG. 9, the inspection method includes a reducing step S 12.
在还原工序S12中，将镍膜12的表面12a在还原性气体氛围下进行还原。
In the reducing step S 12, a surface 12 aof the nickel film 12 is reduced under a reducing gas atmosphere.
由此，将先前的激光照射工序中生成的镍膜12上的氧化物除去。
By doing so, oxides on the nickel film 12 that were generated in the previously-executed laser irradiation step are removed.
还原工序S12的具体的方式没有特别的限定。
Specific aspects of the reducing step S 12 are not particularly limited.
如图3所示，在本实施例中，将形成有镍膜12的导体部件10配置在腔室16内，向该腔室16内导入还原性气体。
As shown in FIG. 3, in this embodiment, the conductor member 10 provided with the nickel film 12 is disposed in a chamber 16, and reducing gas is introduced into the chamber 16.
还原性气体例如能够采用氢(H2)。
For example, hydrogen (H2) may be employed as the reducing gas.
但是，还原性气体并不限定于氢，也可以采用一氧化碳(CO)、硫化氢(H2S)、二氧化硫(SO2)、二氧化氮(NO2)等。
However, the reducing gas is not limited to hydrogen, and carbon monoxide (CO), hydrogen sulfide (H2S), sulfur dioxide (SO2), nitrogen dioxide (NO2) and the like may be employed.
虽为一个例子，但在还原工序S12中，也可以根据需要对镍膜12进行加热。
Although this is merely an example, the nickel film 12 may be heated in the reducing step S 12, as needed.
如图9所示，检查方法还具备加热工序S14。
As shown in FIG. 9, the inspection method further includes a heating step S 14.
加热工序S14是在还原工序S12之后实施的。
The heating step S 14 is executed after the reducing step S 12.
在加热工序S14中，将镍膜12的表面12a在氮气氛下进行加热。
In the heating step S 14, the surface 12 aof the nickel film 12 is heated under a nitrogen atmosphere.
此时，若在镍膜12的表面12a形成微小的凹凸形状，则在镍膜12的表面12a产生氮化反应，从而在镍膜12上生成氮化镍。
In doing so, if the fine concave-convex patterns are formed on the surface 12 aof the nickel film 12, nitriding reaction occurs on the surface 12 aof the nickel film 12 and nickel nitride is thereby formed on the nickel film 12.
若在镍膜12上生成氮化镍，则如图5(A)所示，镍膜12的表面12a的颜色产生变化。
When the nickel nitride is formed on the nickel film 12, the color of the surface 12 aof the nickel film 12 is thereby changed as shown in FIG. 5A.
与此相对地，如图5(B)所示，若在镍膜12的表面12a未形成微小的凹凸形状，则不能充分进行氮化反应，难以引起镍膜12的变色。
Contrary to this, if the fine concave-convex patterns are not formed on the surface 12 aof the nickel film 12, the nitriding reaction does not progress sufficiently and the color of the nickel film 12 is less likely to be changed as shown in FIG. 5B.
即，若激光照射工序中的加工参数不适当，则在加热工序S14中不会产生镍膜12的变色或者微微产生变色。
That is, if the processing parameters in the laser irradiation step are not suitable, the color of the nickel film 12 does not change or changes only subtly in the heating step S 14.
加热工序S14的具体的方式没有特别的限定。
Specific aspects of the heating step S 14 are not particularly limited.
在本实施例中，如图4所示，向配置有导体部件10的腔室16内导入氮，将该腔室16内的气氛置换为氮。
In the present embodiment, as shown in FIG. 4, nitrogen is introduced to the chamber 16 in which the conductor member 10 is disposed to replace the atmosphere in the chamber 16 with the nitrogen.
在充分置换为氮气氛后，将导体部件10的镍膜12加热至规定的加热温度。
After the atmosphere in the chamber 16 has been sufficiently replaced with the nitrogen, the nickel film 12 of the conductor member 10 is heated to a predetermined heating temperature.
在加热工序S14中，能够使用与还原工序S12相同的腔室16，由此能够一连实施还原工序S12与加热工序S14。
In the heating step S 14, the same chamber 16 as that used in the reducing step S 12 can be used, by which the reducing step S 12 and the heating step S 14 can be executed in sequence.
但是，在加热工序S14中，也可以使用与在还原工序S12中使用的腔室16不同的腔室。
However, a chamber that is different from the chamber 16 used in the reducing step S 12 may be used in the heating step S 14.
加热工序S14中的镍膜12的加热温度只要在250℃以上即可。
The heating temperature for the nickel film 12 in the heating step S 14 may be 250° C. or higher.
更优选为镍膜12的加热温度也可以在285℃以上。
Preferably, the heating temperature for the nickel film 12 may be 285° C. or higher.
进一步优选为镍膜12的加热温度也可以在300℃以上。
More preferably, the heating temperature for the nickel film 12 may be 300° C. or higher.
在本实施例中，将镍膜12的加热温度设为300℃，并以该温度维持数分钟。
In the present embodiment, the heating temperature for the nickel film 12 is set to 300° C., and the heating is executed for several minutes at this temperature.
这里，参照图6对加热工序S14中的镍膜12的加热温度与在镍膜12产生的变色的关系进行说明。
Here, a relationship between the heating temperature for the nickel film 12 in the heating step S 14 and the color change that occurs in the nickel film 12 will be described with reference to FIG. 6.
图6的横轴表示加热工序S14中的加热温度，纵轴表示加热工序S14后的镍膜12的R值。
A horizontal axis of FIG. 6 shows the heating temperature in the heating step S 14, and a vertical axis shows an R value of the nickel film 12 after the heating step S 14.
R值是在RGB颜色测量系统中表示红色成分的亮度的指标。
The R value is an index indicating a luminance of a red component in an RGB color measurement system.
如图6中的实线所示，在加热温度不足250℃的范围内，未看到镍膜12的R值发生有意义的变化。
As shown by a solid line in FIG. 6, no significant change is observed in the R value of the nickel film 12 in a range where the heating temperature is less than 250° C. On the other hand, the R value of the nickel film 12 increases as the heating temperature rises in a range where the heating temperature is 250° C. or higher.
另一方面，在加热温度为250℃以上的范围内，加热温度越高，则镍膜12的R值越增大。
Especially in a range where the heating temperature is from 250° C. to 285° C., a proportion of increase in the R value relative to increase in the heating temperature is large.
特别是，在加热温度从250℃到285℃的范围内，R值相对于加热温度的上升而增大的比例较大。
In a range where the heating temperature is higher than 285° C., the proportion of increase in the R value is moderate.
而且，在加热温度超过285℃的范围内，R值增大的比例变缓，在超过300℃的范围内，R值的增大变得非常小。
Then, the increase in the R value is extremely small in a range where the heating temperature is higher than 300° C.
如上所述，若在镍膜12的表面12a存在微小的凹凸形状，则在加热工序S14中在镍膜12的表面12a生成氮化镍，镍膜12的表面12a的颜色产生变化。
As aforementioned, if the fine concave-convex patterns are present on the surface 12 aof the nickel film 12, the nickel nitride is generated on the surface 12 aof the nickel film 12 in the heating step S 14 and the color of the surface 12 aof the nickel film 12 is thereby changed.
关于这一点，根据图6所示的图表，若加热温度在250℃以上，则在镍膜12的表面12a生成氮化镍，这表现为镍膜12的表面12a的颜色的变化。
In regard to this point, according to the graph shown in FIG. 6, the nickel nitride is generated on the surface 12 aof the nickel film 12 when the heating temperature is 250° C. or higher, which is exhibited in the color change of the surface 12 aof the nickel film 12.
因此，加热工序S14中的加热温度只要在250℃以上即可。
As such, the heating temperature in the heating step S 14 may be 250° C. or higher.
特别是，若使加热温度在285℃以上或者在300℃以上，则在加热工序S14中镍膜12的表面12a的颜色产生较大变化。
Especially when the heating temperature is set to 285° C. or higher, or 300° C. or higher, the color of the surface 12 aof the nickel film 12 changes significantly in the heating step S 14.
进一步地，在本发明的一个实施例中，可以使用永久性(即，非易失性)存储装置来实现客户端存储阵列(114)。
Further, in one embodiment of the invention, the client storage array ( 114) may be implemented using persistent (i.e., non-volatile) storage.
永久性存储装置的示例可以包括但不限于光存储装置、磁存储装置、NAND闪存存储器、NOR闪存存储器、磁性随机存取存储器(M-RAM)、自旋扭矩磁性RAM(ST-MRAM)、相变存储器(PCM)或定义为非易失性存储装置类存储器(SCM)的任何其他存储装置。
Examples of persistent storage may include, but are not limited to, optical storage, magnetic storage, NAND Flash Memory, NOR Flash Memory, Magnetic Random Access Memory (M-RAM), Spin Torque Magnetic RAM (ST-MRAM), Phase Change Memory (PCM), or any other storage defined as non-volatile Storage Class Memory (SCM).
在本发明的一个实施例中，数据源(102)可以表示大数据的存储库(如上所述)。
In one embodiment of the invention, a data source ( 102) may represent a repository of big data (described above).
数据源(102)可以使用一个或多个服务器(未示出)来实现。
A data source ( 102) may be implemented using one or more servers (not shown).
每个服务器可以是可以驻留在数据中心中的物理服务器，或者是可以驻留在云计算环境中的虚拟服务器。
Each server may be a physical server, which may reside in a datacenter, or a virtual server, which may reside in a cloud computing environment.
进一步地，在本发明的一个实施例中，数据源(102)可以使用与图5所示的示例性计算系统类似的一个或多个计算系统来实现。
Further, in one embodiment of the invention, a data source ( 102) may be implemented using one or more computing systems similar to the exemplary computing system shown in FIG. 5.
而且，数据源(102)可以包括巨大的数据存储容量，其中可以合并大数据。
Moreover, a data source ( 102) may include vast data storage capacity, wherein big data may be consolidated.
上述数据存储装置可以使用永久性(即，非易失性)存储装置来实现，其示例包括但不限于光存储装置、磁存储装置、NAND闪存存储器、NOR闪存存储器、磁性随机存取存储器(M-RAM)、自旋扭矩磁性RAM(ST-MRAM)、相变存储器(PCM)或定义为非易失性存储装置类存储器(SCM)的任何其他存储装置。
The aforementioned data storage may be implemented using persistent (i.e., non-volatile) storage, examples of which include, but are not limited to, optical storage, magnetic storage, NAND Flash Memory, NOR Flash Memory, Magnetic Random Access Memory (M-RAM), Spin Torque Magnetic RAM (ST-MRAM), Phase Change Memory (PCM), or any other storage defined as non-volatile Storage Class Memory (SCM).
此外，数据源(102)的示例可以包括但不限于社交媒体和交互式平台、云计算平台、万维网、物联网(IOT)网络和数据库。
Furthermore, examples of a data source ( 102) may include, but are not limited to, social media and interactive platforms, cloud computing platforms, the world wide web, Internet-of-things (IOT) networks, and databases.
在本发明的一个实施例中，DPS(116)可以表示数据备份、归档和/或灾难恢复存储系统。
In one embodiment of the invention, the DPS ( 116) may represent a data backup, archiving, and/or disaster recovery storage system.
DPS(116)可以使用一个或多个服务器(未示出)来实现。
The DPS ( 116) may be implemented using one or more servers (not shown).
进一步地，在本发明的一个实施例中，DPS(116)可以使用与图5所示的示例性计算系统类似的一个或多个计算系统来实现。
Further, in one embodiment of the invention, the DPS ( 116) may be implemented using one or more computing systems similar to the exemplary computing system shown in FIG. 5.
而且，DPS(116)可以包括备份接口(118)、阵列管理器(120)和备份存储阵列(122)。
Moreover, the DPS ( 116) may include a backup interface ( 118), an array manager ( 120), and a backup storage array ( 122).
以下对这些DPS(116)子组件中的每一个进行描述。
Each of these DPS ( 116) subcomponents is described below.
在本发明的一个实施例中，备份接口(118)可以是指用于实现DPS(116)与其他外部实体(例如，客户端设备(106))之间的通信的一组子例程定义、协议和/或工具。
In one embodiment of the invention, the backup interface ( 118) may refer to a set of subroutine definitions, protocols, and/or tools for enabling communications between the DPS ( 116) and other external entities (e.g., client device ( 106)).
备份接口(118)可以使用DPS(118)硬件、在其上执行的软件或其组合来实现。
The backup interface ( 118) may be implemented using DPS ( 118) hardware, software executing thereon, or a combination thereof.
进一步地，备份接口(118)可以包括以下功能：从一个或多个外部实体接收备份数据(未示出)、对其解码并提供给阵列管理器(120)；以及，相反地，从阵列管理器(120)获取备份数据、对其编码并将其发送给一个或多个外部实体。
Further, the backup interface ( 118) may include functionality to: receive, decode, and provide backup data (not shown) from one or more external entities, to the array manager ( 120); and, conversely, obtain, encode, and transmit backup data from the array manager ( 120), to one or more external entities.
普通技术人员将理解，在不脱离本发明的范围的情况下，备份接口(118)可以执行其他功能。
One of ordinary skill will appreciate that the backup interface ( 118) may perform other functionalities without departing from the scope of the invention.
举例来说，备份接口(118)可以被实现为网络应用程序编程接口(API)，其可以通过分配的网址(例如，统一资源定位符(URL))和WAN(例如，互联网)连接来访问。
By way of an example, the backup interface ( 118) may be implemented as a web application programming interface (API), which may be accessed through an assigned web address (e.g., a uniform resource locator (URL)) and a WAN (e.g., Internet) connection.
在本发明的一个实施例中，阵列管理器(120)可以是指是指可以在DPS(116)的底层硬件上执行并且可以被设计和配置为管理备份存储阵列(122)的计算机程序。
In one embodiment of the invention, the array manager ( 120) may refer to refer to a computer program, which may execute on the underlying hardware of the DPS ( 116), and may be designed and configured to manage the backup storage array ( 122).
就此而言，阵列管理器(120)可以包括以下功能：在备份存储阵列(122)中存储备份数据；通过任何存储机制(例如表、记录、文件系统等)在备份存储阵列(122)中组织备份数据的合并；以及从备份存储阵列(122)中检索备份数据。
To that extent, the array manager ( 120) may include functionality to: store backup data in the backup storage array ( 122); organize the consolidation of backup data, in the backup storage array ( 122), by way of any storage mechanism (e.g., tables, records, filesystems, etc.); and retrieve backup data from the backup storage array ( 122).
普通技术人员将理解，在不脱离本发明的范围的情况下，阵列管理器(120)可以执行其他功能。
One of ordinary skill will appreciate that the array manager ( 120) may perform other functionalities without departing from the scope of the invention.
在本发明的一个实施例中，备份存储阵列(122)可以是指可以在其上合并(或由其他方式存储)各种形式的信息的一个或多个物理存储设备(未示出)的集合。
In one embodiment of the invention, the backup storage array ( 122) may refer to a collection of one or more physical storage devices (not shown) on which various forms of information may be consolidated (or otherwise stored).
举例来说，每个物理存储设备可以代表硬盘驱动器(HDD)、固态驱动器(SSD)、磁带存储系统或网络附加存储装置(NAS)。
By way of examples, each physical storage device may be representative of a hard disk drive (HDD), a solid state drive (SSD), a magnetic tape storage system, or network attached storage (NAS).
进一步地，在本发明的一个实施例中，可以使用永久性(即，非易失性)存储装置来实现备份存储阵列(122)。
Further, in one embodiment of the invention, the backup storage array ( 122) may be implemented using persistent (i.e., non-volatile) storage.
尽管图1示出了组件的配置，但是在不脱离本发明的范围的情况下，可以使用其他系统(100)配置。
While FIG. 1 shows a configuration of components, other system ( 100) configurations may be used without departing from the scope of the invention.
挖掘流水线(200)可以是指用于处理(以上所述)大数据(210)的可编程框架。
The mining pipeline ( 200) may refer to a programmable framework for processing big data ( 210) (described above).
进一步地，通过挖掘流水线(200)处理大数据(210)可以导致获取知识(212)(如上所述)，尽管通常是通过应用各种复杂、费时且资源密集的过程。
Further, processing of big data ( 210), through the mining pipeline ( 200), may result in the acquisition of knowledge ( 212) (described above)—often albeit through the application of various complex, time-consuming, and resource-intensive processes.
在本发明的一个实施例中，挖掘流水线(200)可以使用硬件和/或软件元件来实现)，这些硬件和/或软件元件可以共同采取一系列数据处理级(202A-202N)(本文中也称为挖掘流水线级)的形式。
In one embodiment of the invention, the mining pipeline ( 200) may be implemented using hardware and/or software elements, which may collectively take form as a chain of data processing stages (also referred herein as mining pipeline stages) ( 202A- 202N).
因此，每个级(202A-202N)可以基于它们的设计和配置来处理数据。
Accordingly, each stage ( 202A- 202N) may process data based on their design and configuration.
具体地，每个级(202A-202N)可以包括以下功能：接收级输入(204)，其表示级(202A-202N)所负责处理的数据；使用(以下所述)一个或多个函数(208A-208N)处理级输入(204)；以及，作为处理级输入(204)的结果，产生表示已处理(或精炼)数据的级输出(206)。
Specifically, each stage ( 202A- 202N) may include functionality to: receive a stage input ( 204), representing the data for which the stage ( 202A- 202N) is responsible for processing; processing the stage input ( 204) using one or more functions ( 208A- 208N) (described below); and, as a result of processing the stage input ( 204), produce a stage output ( 206), representing processed (or refined) data.