Intel Tri-Gate Chip Mask
notes: label: Description
content: This chip mask was used in the manufacture Intel’s 22 nanometer tri-gate transistor microprocessors. The silicon wafer is chemically treated to make it sensitive to ultraviolet light. A focused beam of extreme ultraviolet light shines through the chip mask, creating a microscopic pattern on the silicon. The patterns are then ionized to create positive and negative semiconductors. The process is repeated with a variety of masks to create all the necessary circuits and turn the semiconductors into transistors that make up an integrated circuit. The silicon wafer is then cut into chips, packaged, and sold to consumers.
label: Location
content: Currently not on view
setName: label: See more items in
content: Work and Industry: Production and Manufacturing
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content: Computers & Business Machines
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content: Industry & Manufacturing
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content: American Enterprise
creditLine: label: Credit Line
content: Gift of Intel Corporation
dataSource: label: Data Source
content: National Museum of American History
identifier: label: ID Number
content: 2014.0098.02
label: catalog number
content: 2014.0098.02
label: accession number
content: 2014.0098
objectType: label: Object Name
content: mask
physicalDescription: label: Physical Description
content: glass (mask material)
label: Measurements
content: mask: 6 in x 6 in x 1/4 in; 15.24 cm x 15.24 cm x .635 cm
label: Measurements
content: box: 9 7/8 in x 8 7/8 in x 1 7/8 in; 25.0825 cm x 22.5425 cm x 4.7625 cm