mhurhangee/patent-ind-claim-en huggingface dataset:
Method for producing a product wafer , which proceeds as follows: - processing of a first side of the product wafer - bonding of the product wafer with its first side on a first rigid carrier wafer with a first intermediate layer (18, 18") consisting of a first adhesion layer applied on the edge side, which extends inwards from the lateral wafer periphery of the product wafer with a first annular width R 1 smaller than a tenth of diameter D of the product wafer as an annular body, - processing of a second side of the product wafer lying opposite the first side by providing the second side with chips and - bonding of the product wafer with its second side on a second rigid carrier wafer with a second intermediate layer (17, 17") consisting of a second adhesion layer applied on the edge side, which extends inwards from the lateral wafer periphery of the product wafer with a second annular width R 2 smaller than a tenth of diameter D of the product wafer as an annular body, wherein the second annular width R 2 is greater than the first annular width R 1 of the first adhesion layer , as a result of which the first intermediate layer (18, 18") and the second intermediate layer (17, 17") are made different with a from the start greater bonding force of the second intermediate layer (17, 17"), such that the first carrier wafer can be separated selectively before the second carrier wafer from the product wafer . - processing of a first side of the product wafer - bonding of the product wafer with its first side on a first rigid carrier wafer with a first intermediate layer (18, 18") consisting of a first adhesion layer applied on the edge side, which extends inwards from the lateral wafer periphery of the product wafer with a first annular width R 1 smaller than a tenth of diameter D of the product wafer as an annular body, - processing of a second side of the product wafer lying opposite the first side by providing the second side with chips and - bonding of the product wafer with its second side on a second rigid carrier wafer with a second intermediate layer (17, 17") consisting of a second adhesion layer applied on the edge side, which extends inwards from the lateral wafer periphery of the product wafer with a second annular width R 2 smaller than a tenth of diameter D of the product wafer as an annular body, wherein the second annular width R 2 is greater than the first annular width R 1 of the first adhesion layer , as a result of which the first intermediate layer (18, 18") and the second intermediate layer (17, 17") are made different with a from the start greater bonding force of the second intermediate layer (17, 17"), such that the first carrier wafer can be separated selectively before the second carrier wafer from the product wafer .
Brush system of an electric motor with a commutator , with at least one brush guided in a brush shaft and having a connecting line , and with a spring element , which, in its operative connection with the brush , exerts a spring force on the latter for its contact with the commutator , - wherein the brush shaft has a longitudinal shaft slot guiding the connecting line , - wherein the longitudinal shaft slot of the brush shaft has a bottleneck , which retains the connecting line from a joining space of the commutator , and - wherein the connecting line is pressed through the bottleneck by the spring force of the spring element when the operative connection of the spring element with the brush is established. - wherein the brush shaft has a longitudinal shaft slot guiding the connecting line , - wherein the longitudinal shaft slot of the brush shaft has a bottleneck , which retains the connecting line from a joining space of the commutator , and - wherein the connecting line is pressed through the bottleneck by the spring force of the spring element when the operative connection of the spring element with the brush is established.
An optical termination box , comprising a base body and a cover removably attached to the base body , wherein the base body comprises: - a bottom tray ; - a connection area comprising connector supporting frames configured to house adapters for connecting input pre-connectorized optical fibers of an optical cable entering into the optical termination box to output pre-connectorized optical fibers exiting from the optical termination box ; - a storage area for parking extra-length portions of the input pre-connectorized optical fibers and extra-length portions of the output pre-connectorized optical fibers; - wherein the connection area and the storage area are defined on separate, overlapped opposite surfaces of a first panel hinged to the bottom tray ; characterised in that the width of the first panel is substantially equal to the width of the connection area , wherein the width of the connection area is substantially equal to the sum of the widths of each adapter and of each connector supporting frame . - a bottom tray ; - a connection area comprising connector supporting frames configured to house adapters for connecting input pre-connectorized optical fibers of an optical cable entering into the optical termination box to output pre-connectorized optical fibers exiting from the optical termination box ; - a storage area for parking extra-length portions of the input pre-connectorized optical fibers and extra-length portions of the output pre-connectorized optical fibers; - wherein the connection area and the storage area are defined on separate, overlapped opposite surfaces of a first panel hinged to the bottom tray ;
A woven fabric suitable for use in arc protection, the fabric having a first face and a second face, the fabric having a warp yarn dissimilar to a fill yarn, wherein either: a) a majority of the first face of the fabric is a first yarn that is the warp yarn in the fabric and a majority of the second face of the fabric is a second yarn that is the fill yarn in the fabric; or b) a majority of the first face of the fabric is a first yarn that is a fill yarn in the fabric and a majority of the second face of the fabric is a second yarn that is the warp yarn in the fabric; and wherein the second yarn forming the majority of the second face of the fabric comprises: i) 25 to 100 parts aramid fiber containing 0.5 to 20 weight percent discrete carbon particles, based on the amount of carbon particles in an individual fiber, the carbon particles being homogeneously dispersed in that fiber, and ii) 0 to 75 parts aramid fiber free of discrete carbon particles; based on the total amount of i) and ii) in the second yarn; and wherein the first yarn forming the majority of the first face of the fabric comprises aramid fiber being free of discrete carbon particles; the fabric having a total content of 0.5 to 3 weight percent discrete carbon particles. a) a majority of the first face of the fabric is a first yarn that is the warp yarn in the fabric and a majority of the second face of the fabric is a second yarn that is the fill yarn in the fabric; or b) a majority of the first face of the fabric is a first yarn that is a fill yarn in the fabric and a majority of the second face of the fabric is a second yarn that is the warp yarn in the fabric; and i) 25 to 100 parts aramid fiber containing 0.5 to 20 weight percent discrete carbon particles, based on the amount of carbon particles in an individual fiber, the carbon particles being homogeneously dispersed in that fiber, and ii) 0 to 75 parts aramid fiber free of discrete carbon particles; based on the total amount of i) and ii) in the second yarn; and
A hot melt adhesive composition comprising: a first polymer that is propylene-based and has a Mw of no greater than about 75,000 and a polydispersity index of less than about 5 and; a second polymer that is a hydrogenated styrene block copolymer with a styrene content of no greater than about 20%, and a Melt Flow when tested according to ASTM 1238 (230°C, 5kg) of no greater than about 25 g/10 min; wherein the adhesive composition contains between 10% by weight and 18% by weight plasticizer. a first polymer that is propylene-based and has a Mw of no greater than about 75,000 and a polydispersity index of less than about 5 and; a second polymer that is a hydrogenated styrene block copolymer with a styrene content of no greater than about 20%, and a Melt Flow when tested according to ASTM 1238 (230°C, 5kg) of no greater than about 25 g/10 min;
A method for use in connection with installing a fibre into a conduit having a first end and a second end , the method being suitable to detect when the fibre introduced into the first end arrives at the second end, and comprising the steps of: - introducing the fibre into the conduit from the first end and installing it towards the second end; - introducing light with a light source into the fibre at the first end; - detecting reflected light caused by reflection of the light from a cleaved end of the fibre, with a light detector at the first end; and - detecting a change in the reflected light, whereby an operator may determine that the fibre has arrived at the second end, the detected change in the reflected light being a drop in the amount of reflected light, wherein the change in the reflected light is caused by immersion of the cleaved end of the fibre into an index matching fluid . - introducing the fibre into the conduit from the first end and installing it towards the second end; - introducing light with a light source into the fibre at the first end; - detecting reflected light caused by reflection of the light from a cleaved end of the fibre, with a light detector at the first end; and - detecting a change in the reflected light, whereby an operator may determine that the fibre has arrived at the second end, the detected change in the reflected light being a drop in the amount of reflected light, wherein the change in the reflected light is caused by immersion of the cleaved end of the fibre into an index matching fluid .
Extension foot sleeve consisting of an L-shaped foot-receiving shell having an adapter block located on the outside close to the heel, for arrangement on an operating table, and having quick-release clasps and latching tabs for securing a patient's foot, characterized in that quick-release clasps are arranged in pairs, right and left, on both sides of side edges of the foot-receiving shell in an edge region of the corner of the L close to the heel and in an edge region of the upper end of the foot-receiving shell close to the calf, and the extension foot sleeve is assigned tensioning straps with latching tabs on both sides, which latching tabs are designed such as to be able to be inserted in parallel into the quick-release clasps and latched therein.
A system for active grating position tracking in X-ray differential phase contrast imaging and dark-field imaging, the system comprising: (a) a grating arrangement to be positioned between an X-ray source and an X-ray detector of an X-ray imaging device ; wherein the grating arrangement comprises (a-i) a phase grating and (a-ii) an analyzer grating , wherein the phase grating is arranged between the X-ray source and the analyzer grating , and the analyzer grating is arranged between the phase grating and the X-ray detector ; (b) a measurement system for determining an alignment of at least one of the gratings of the grating arrangement ; wherein the measurement system comprises: (b-i) a light source configured for generating a light beam; (b-ii) a reflection area located on at least one of the gratings of the grating arrangement , and configured for reflecting the light beam; and (b-iii) a detection device configured for detecting a reflection pattern of the reflected light beam; and (c) a processing unit configured for comparing the reflection pattern with a reference pattern, and to control the X-ray imaging device upon the comparison of the reflection pattern and the reference pattern. (a) a grating arrangement to be positioned between an X-ray source and an X-ray detector of an X-ray imaging device ; wherein the grating arrangement comprises (a-i) a phase grating and (a-ii) an analyzer grating , wherein the phase grating is arranged between the X-ray source and the analyzer grating , and the analyzer grating is arranged between the phase grating and the X-ray detector ; (a-i) a phase grating and (a-ii) an analyzer grating , (b) a measurement system for determining an alignment of at least one of the gratings of the grating arrangement ; wherein the measurement system comprises: (b-i) a light source configured for generating a light beam; (b-ii) a reflection area located on at least one of the gratings of the grating arrangement , and configured for reflecting the light beam; and (b-iii) a detection device configured for detecting a reflection pattern of the reflected light beam; and (b-i) a light source configured for generating a light beam; (b-ii) a reflection area located on at least one of the gratings of the grating arrangement , and configured for reflecting the light beam; and (b-iii) a detection device configured for detecting a reflection pattern of the reflected light beam; and (c) a processing unit configured for comparing the reflection pattern with a reference pattern, and to control the X-ray imaging device upon the comparison of the reflection pattern and the reference pattern.
A method for controlling a fiber fractionation system for fractionating an input material into a long fraction (LF) stream comprising LF fibers and a short fraction (SF) stream comprising SF fibers, the method comprising: measuring an average LF fiber length at one or more locations post-fractionation; and maintaining the average LF fiber length within a target variability range by automatically altering a rotational speed of a rotor of the fiber fractionation system in response to the measured average LF fiber length. measuring an average LF fiber length at one or more locations post-fractionation; and maintaining the average LF fiber length within a target variability range by automatically altering a rotational speed of a rotor of the fiber fractionation system in response to the measured average LF fiber length.
A user equipment, UE, comprising: • a processor configured to obtain sensor information of the UE; • a transmitter configured to send a first message to a network device, wherein the first message comprises the sensor information of the UE and current service experience data indicating a current communication quality, wherein the current service experience data are based on a preconfigured user experience indicator preconfigured in the UE, wherein the user experience indicator is one of: ∘ a mean opinion score, MOS, of streaming media, ∘ a stalling frequency of the streaming media, or ∘ a stalling duration of the streaming media, wherein the first message is used by the network device to perform service optimization processing based on the sensor information and the current service experience data of the UE; • a receiver configured to receive a second message from the network device, wherein the second message comprises service optimization indication information that is generated by the network device based on the sensor information and the current service experience data of the UE, and the service optimization indication information is used to indicate a service optimization policy that needs to be executed by the UE; • wherein the processor is further configured to execute, based on the service optimization indication information, the service optimization policy. • a processor configured to obtain sensor information of the UE; • a transmitter configured to send a first message to a network device, wherein the first message comprises the sensor information of the UE and current service experience data indicating a current communication quality, wherein the current service experience data are based on a preconfigured user experience indicator preconfigured in the UE, wherein the user experience indicator is one of: ∘ a mean opinion score, MOS, of streaming media, ∘ a stalling frequency of the streaming media, or ∘ a stalling duration of the streaming media, wherein the first message is used by the network device to perform service optimization processing based on the sensor information and the current service experience data of the UE; ∘ a mean opinion score, MOS, of streaming media, ∘ a stalling frequency of the streaming media, or ∘ a stalling duration of the streaming media, • a receiver configured to receive a second message from the network device, wherein the second message comprises service optimization indication information that is generated by the network device based on the sensor information and the current service experience data of the UE, and the service optimization indication information is used to indicate a service optimization policy that needs to be executed by the UE; • wherein the processor is further configured to execute, based on the service optimization indication information, the service optimization policy.
A transparent substrate with a multilayer anti-glare coating, the transparent substrate comprising: a transparent substrate ; a first coating layer formed on the transparent substrate and being formed of a first dielectric layer having a refractive index of n1; a second coating layer formed on the first coating layer and being formed of a metal oxide layer having a refractive index of n2; a third coating layer formed on the second coating layer and being formed of a second dielectric layer having a refractive index of n3; and a fourth coating layer formed on the third coating layer and being formed of a third dielectric layer having a refractive index of n4, characterized in that n1 = n3 > n2 > n4; wherein n1 and n3 are within the range 1.9 to 2.5, n2 is within the range 1.8 to 2.5, and n4 is within the range 1.3 to 1.6; and wherein the second coating layer has an extinction coefficient within the range 0.01 to 0.30. a transparent substrate ; a first coating layer formed on the transparent substrate and being formed of a first dielectric layer having a refractive index of n1; a second coating layer formed on the first coating layer and being formed of a metal oxide layer having a refractive index of n2; a third coating layer formed on the second coating layer and being formed of a second dielectric layer having a refractive index of n3; and a fourth coating layer formed on the third coating layer and being formed of a third dielectric layer having a refractive index of n4, characterized in that n1 = n3 > n2 > n4; wherein n1 and n3 are within the range 1.9 to 2.5, n2 is within the range 1.8 to 2.5, and n4 is within the range 1.3 to 1.6; and wherein the second coating layer has an extinction coefficient within the range 0.01 to 0.30.
A method for producing a stainless steel component containing the steps of; - providing a stainless steel powder having the following composition by weight; Cr 15-30 weight% Ni 5-25 weight% Si 0.5-3.5 weight% Mn 0-2 weight% S 0-0.6 weight% C 0.001-0.8 weight% N ≤03 weight% O ≤0.5 weight% optionally up to 3 weight% of each of the elements Mo, Cu, Nb, V, Ti and inevitable impurities up to 1 weight%, Fe balance, - agglomerating the stainless steel powder or transforming the stainless steel powder, optionally mixed with lubricants, hard-phase materials, machinability enhancing agents and graphite, into a suitable paste or feedstock, - optionally mixing the agglomerated stainless steel powder with lubricants, hard-phase materials, machinability enhancing agents and graphite, - consolidating the obtained paste, feedstock or granulated powder into a green component, - heating the obtained green component in vacuum or in an atmosphere of hydrogen gas to a temperature of at least 1100°C. - sintering the green component at a temperature between 1150-1350°C in an atmosphere of at least 20% nitrogen gas. - cooling the sintered component at a cooling rate of at most 30C/min from the sintering temperature to a temperature of ≥1100°C in an atmosphere of at least 20% nitrogen gas to form sufficient amount of M2(C, N) carbonitrides, - cooling the sintered component from 1100°C to ambient temperature at a cooling rate of at least 30 C/min and sufficiently high enough to avoid excessive formation of M(C,N) carbo nitrides yielding a component having at least 12% by weight of Cr in the matrix. - providing a stainless steel powder having the following composition by weight; Cr 15-30 weight% Ni 5-25 weight% Si 0.5-3.5 weight% Mn 0-2 weight% S 0-0.6 weight% C 0.001-0.8 weight% N ≤03 weight% O ≤0.5 weight% optionally up to 3 weight% of each of the elements Mo, Cu, Nb, V, Ti and inevitable impurities up to 1 weight%, Fe balance, - agglomerating the stainless steel powder or transforming the stainless steel powder, optionally mixed with lubricants, hard-phase materials, machinability enhancing agents and graphite, into a suitable paste or feedstock, - optionally mixing the agglomerated stainless steel powder with lubricants, hard-phase materials, machinability enhancing agents and graphite, - consolidating the obtained paste, feedstock or granulated powder into a green component, - heating the obtained green component in vacuum or in an atmosphere of hydrogen gas to a temperature of at least 1100°C. - sintering the green component at a temperature between 1150-1350°C in an atmosphere of at least 20% nitrogen gas. - cooling the sintered component at a cooling rate of at most 30C/min from the sintering temperature to a temperature of ≥1100°C in an atmosphere of at least 20% nitrogen gas to form sufficient amount of M2(C, N) carbonitrides, - cooling the sintered component from 1100°C to ambient temperature at a cooling rate of at least 30 C/min and sufficiently high enough to avoid excessive formation of M(C,N) carbo nitrides yielding a component having at least 12% by weight of Cr in the matrix.
A water absorbing agent comprising a polyacrylic acid (salt)-based water absorbent resin as a main component, said water absorbing agent having a Hausner ratio of less than 1.18 and a water absorbing speed (FSR) of 0.25 g/g/s or more, wherein the water absorbing agent has a bulk specific gravity of 0.61 g/ml to 0.80 g/ml.
A linear evaporation source, characterized by : comprising: only one heating chamber for containing a vapor deposition material, a mixing chamber located above the heating chamber and used to mix the vapor deposition material vapor, and a channel used to communicate the heating chamber and the mixing chamber, wherein one end of the mixing chamber communicates with the heating chamber through the channel, and the other end is provided with a plurality of nozzles for spraying the vapor deposition material vapor; and heaters are provided at peripheries of the heating chamber , the mixing chamber , the channel and the nozzles , characterized in that a middle plate that the vapor deposition material vapor can permeate, is provided within the channel, the middle plate is clamped at an inner wall of the channel and is spaced apart from the interface of the heating chamber and the interface of the mixing chamber , the position of middle plate is closer to the mixing chamber than the heating chamber , and the shape of the edge of the middle plate is zigzag-shaped.