A resin surface etching method, characterized in that , in etching a resin surface, the method consists of step (a), step (b) and step (c), as well as optional steps (d), (e) and (f), wherein in step (c) the set of steps (a) and (b) is repeated one or more times: (a) a step of treating the resin surface with a solution containing an oxidizing agent and adsorbing the oxidizing agent on the resin surface, wherein the oxidizing agent used is permanganic acid or a salt thereof; and (b) a step of activating the oxidizing agent adsorbed on the resin surface in the step (a), wherein the activation of the oxidizing agent is performed by a treatment with a solution containing one type or two or more types of activating agents selected from the group consisting of sulfuric acid, phosphoric acid, hydrochloric acid, nitric acid, methanesulfonic acid, hydrogen peroxide, peroxodisulfate, periodic acid, perchloric acid, and perbromic acid, wherein the content of the activating agent in the solution is 0.05 mol/L or more, wherein after step (a) water washing step (d) may be performed, and after step (b) a neutralization and reduction treatment step (e) or a conditioner treatment step (f) may be performed and, wherein the resin is selected from the group consisting of acrylonitrile-butadiene-styrene (ABS), polycarbonate/acrylonitrile-butadiene-styrene (PC/ABS), acrylonitrile-styrene-acrylate (ASA), silicon-based composite rubber-acrylonitrile-styrene (SAS), polypropylene, polycarbonate (PC), acrylonitrile-styrene polyacetate, polystyrene, polyethylene, polyether ketone, polyethylene terephthalate, polybutylene terephthalate, polysulfone, polyether ether sulfone, polyether imide, modified polyphenylene ether, polyphenylene sulfide, polyimide, liquid crystal polymers, and copolymers of these polymers. (a) a step of treating the resin surface with a solution containing an oxidizing agent and adsorbing the oxidizing agent on the resin surface, wherein the oxidizing agent used is permanganic acid or a salt thereof; and (b) a step of activating the oxidizing agent adsorbed on the resin surface in the step (a), wherein the activation of the oxidizing agent is performed by a treatment with a solution containing one type or two or more types of activating agents selected from the group consisting of sulfuric acid, phosphoric acid, hydrochloric acid, nitric acid, methanesulfonic acid, hydrogen peroxide, peroxodisulfate, periodic acid, perchloric acid, and perbromic acid, wherein the content of the activating agent in the solution is 0.05 mol/L or more, wherein after step (a) water washing step (d) may be performed, and after step (b) a neutralization and reduction treatment step (e) or a conditioner treatment step (f) may be performed and, wherein the resin is selected from the group consisting of acrylonitrile-butadiene-styrene (ABS), polycarbonate/acrylonitrile-butadiene-styrene (PC/ABS), acrylonitrile-styrene-acrylate (ASA), silicon-based composite rubber-acrylonitrile-styrene (SAS), polypropylene, polycarbonate (PC), acrylonitrile-styrene polyacetate, polystyrene, polyethylene, polyether ketone, polyethylene terephthalate, polybutylene terephthalate, polysulfone, polyether ether sulfone, polyether imide, modified polyphenylene ether, polyphenylene sulfide, polyimide, liquid crystal polymers, and copolymers of these polymers. <EOS>