An array, comprising: a solid support; a first repeating pattern of features positioned along an exterior surface of the solid support and repeating in x and y dimensions; a second repeating pattern of features positioned along the exterior surface of the solid support, repeating in the x and y dimensions, and interleaved with the first pattern of features such that the features of the first repeating pattern are interspersed with features of the second repeating pattern and vice versa, when viewed from a particular perspective; wherein the first repeating pattern of features comprises posts and the second repeating pattern of features comprises wells; wherein the posts of the first repeating pattern of features have a top at a first elevation z1 and the wells of the second repeating pattern of features have a bottom at a second elevation z2 that is different from z1 and wherein features present in a particular z -plane are separated with spaces between each other, wherein the posts of the first repeating pattern of features and the wells of the second repeating pattern of features each comprise attachment points for analytes, the posts of the first repeating pattern of features being configured to attach analytes at a different elevation relative to analytes attached to the wells of the second repeating pattern of features, wherein nearest-neighbor wells of the second repeating pattern of features to each post of the first repeating pattern of features are in an interleaved pattern having a pitch that is less than 500 nm, and wherein nearest-neighbor posts in the first repeating pattern of features have a pitch that is greater than 500 nm. a solid support; a first repeating pattern of features positioned along an exterior surface of the solid support and repeating in x and y dimensions; a second repeating pattern of features positioned along the exterior surface of the solid support, repeating in the x and y dimensions, and interleaved with the first pattern of features such that the features of the first repeating pattern are interspersed with features of the second repeating pattern and vice versa, when viewed from a particular perspective; wherein the first repeating pattern of features comprises posts and the second repeating pattern of features comprises wells; wherein the posts of the first repeating pattern of features have a top at a first elevation z1 and the wells of the second repeating pattern of features have a bottom at a second elevation z2 that is different from z1 and wherein features present in a particular z -plane are separated with spaces between each other, wherein the posts of the first repeating pattern of features and the wells of the second repeating pattern of features each comprise attachment points for analytes, the posts of the first repeating pattern of features being configured to attach analytes at a different elevation relative to analytes attached to the wells of the second repeating pattern of features, wherein nearest-neighbor wells of the second repeating pattern of features to each post of the first repeating pattern of features are in an interleaved pattern having a pitch that is less than 500 nm, and wherein nearest-neighbor posts in the first repeating pattern of features have a pitch that is greater than 500 nm. <EOS>