A system for characterization of patterns marked on a fabric, the system comprising: a light source configured to generate a light beam to impinge on a fabric located at a given distance, said light beam having a broadband spectrum; an optical arrangement configured to direct said light beam towards the fabric and to collect a scattered light component of said fabric upon said impingement; a wavelength division unit configured to separate the collected scattered light component into a plurality of spectral bands or colors, providing a plurality of signals of different wavelengths; a light detection unit configured to detect said plurality of signals of different wavelengths and convert them into electrical voltage signals; and a computing device operatively connected with said light detection unit ; characterized in that : said optical arrangement comprises a parabolic mirror with a hole and an optical device located between the parabolic mirror and the fabric , said parabolic mirror allowing the passage of the light beam towards the optical device via the hole, the collection and redirection of the scattered light component from the fabric towards said light detection unit , and the elimination of the light coming from direct reflection at the fabric through said hole; the optical device is configured to change and dynamically orient the direction of the light beam towards the fabric providing a scan of an area of the fabric , line-by-line, and further configured to redirect the scattered light component from the fabric towards the parabolic mirror , the latter further redirecting the scattered light component towards the light detection unit ; and the computing device is configured to characterize a pattern marked on the fabric by executing an algorithm that analyzes said electrical voltage signals and that computes a quality measure of said marked pattern. a light source configured to generate a light beam to impinge on a fabric located at a given distance, said light beam having a broadband spectrum; an optical arrangement configured to direct said light beam towards the fabric and to collect a scattered light component of said fabric upon said impingement; a wavelength division unit configured to separate the collected scattered light component into a plurality of spectral bands or colors, providing a plurality of signals of different wavelengths; a light detection unit configured to detect said plurality of signals of different wavelengths and convert them into electrical voltage signals; and a computing device operatively connected with said light detection unit ; said optical arrangement comprises a parabolic mirror with a hole and an optical device located between the parabolic mirror and the fabric , said parabolic mirror allowing the passage of the light beam towards the optical device via the hole, the collection and redirection of the scattered light component from the fabric towards said light detection unit , and the elimination of the light coming from direct reflection at the fabric through said hole; the optical device is configured to change and dynamically orient the direction of the light beam towards the fabric providing a scan of an area of the fabric , line-by-line, and further configured to redirect the scattered light component from the fabric towards the parabolic mirror , the latter further redirecting the scattered light component towards the light detection unit ; and the computing device is configured to characterize a pattern marked on the fabric by executing an algorithm that analyzes said electrical voltage signals and that computes a quality measure of said marked pattern. <EOS>