mhurhangee/patent-ind-claim-en huggingface dataset:
A message processing method of an optical network termination, ONT, wherein the ONT is configured with a virtual local area network, VLAN, tagging operation configuration data management entity, ME, with a VLAN Tagging operation table, wherein each entry of the VLAN Tagging operation table comprise a group of operation value field and a group of filter value field, wherein the method comprises: receiving, by the ONT, an uplink frame, the uplink frame comprises filter value, the filter value is a value of a VLAN Tag field in the received uplink frame; filtering or categorizing, by the ONT, filter values in the received uplink frame with values of filter value field in the VLAN Tagging operation table; based on the matching result, identifying, by the ONT, operation values of the operation value field in the VLAN Tagging operation table; updating, by the ONT, the value of the VLAN Tag field in the received uplink frame by use of the identified operation values of the operation value field; sending, by the ONT, the uplink frame with the new VLAN tag; wherein the filter value field comprises an outer layer VLAN priority filter value, an outer layer VID filter value, an inner layer VLAN priority value, an inner layer VID filter value. receiving, by the ONT, an uplink frame, the uplink frame comprises filter value, the filter value is a value of a VLAN Tag field in the received uplink frame; filtering or categorizing, by the ONT, filter values in the received uplink frame with values of filter value field in the VLAN Tagging operation table; based on the matching result, identifying, by the ONT, operation values of the operation value field in the VLAN Tagging operation table; updating, by the ONT, the value of the VLAN Tag field in the received uplink frame by use of the identified operation values of the operation value field; sending, by the ONT, the uplink frame with the new VLAN tag; wherein the filter value field comprises an outer layer VLAN priority filter value, an outer layer VID filter value, an inner layer VLAN priority value, an inner layer VID filter value.
A sintering paste comprising: a sintering powder comprising: (a) a first type of metal particles having a mean longest dimension of from 100 nm to 50 μm measured with a particle size analyser using either a dynamic light scattering method or laser scattering method; and/or (b) a second type of metal particles having a mean longest dimension of less than 100 nm measured with a particle size analyser using either a dynamic light scattering method or laser scattering method, wherein at least some of the second type of metal particles are at least partially coated with a capping agent; an organosilver compound; and a solvent; wherein the sintering paste further comprises a wetting agent, the wetting agent being one or more of short or long chain amines wherein C = 2 to 30; wherein the first type of metal particles and/or second type of metal particles comprises silver, a silver alloy, and/or core-shell structures of silver coated particles; and wherein the paste is substantially resin free. a sintering powder comprising: (a) a first type of metal particles having a mean longest dimension of from 100 nm to 50 μm measured with a particle size analyser using either a dynamic light scattering method or laser scattering method; and/or (b) a second type of metal particles having a mean longest dimension of less than 100 nm measured with a particle size analyser using either a dynamic light scattering method or laser scattering method, wherein at least some of the second type of metal particles are at least partially coated with a capping agent; (a) a first type of metal particles having a mean longest dimension of from 100 nm to 50 μm measured with a particle size analyser using either a dynamic light scattering method or laser scattering method; and/or (b) a second type of metal particles having a mean longest dimension of less than 100 nm measured with a particle size analyser using either a dynamic light scattering method or laser scattering method, wherein at least some of the second type of metal particles are at least partially coated with a capping agent; an organosilver compound; and a solvent; wherein the sintering paste further comprises a wetting agent, the wetting agent being one or more of short or long chain amines wherein C = 2 to 30; wherein the first type of metal particles and/or second type of metal particles comprises silver, a silver alloy, and/or core-shell structures of silver coated particles; and wherein the paste is substantially resin free.
An alignment device comprising: a suction ring configured to be applied to a patient's eye; a conical holding device comprising a mechanism that releasably engages the suction ring ; a semi-circular light source comprising multiple light emitters that are arranged in a pattern with respect to each other, so that the light emitters apply light in the pattern to an eye of a patient; and a viewing device that detects light reflected from said eye when the pattern of light is applied to the eye by the light emitters ; whereby the viewing device and the light source are configured to indicate whether said suction ring is centered on said eye based on the orientation and position of the detected light. a suction ring configured to be applied to a patient's eye; a conical holding device comprising a mechanism that releasably engages the suction ring ; a semi-circular light source comprising multiple light emitters that are arranged in a pattern with respect to each other, so that the light emitters apply light in the pattern to an eye of a patient; and a viewing device that detects light reflected from said eye when the pattern of light is applied to the eye by the light emitters ; whereby the viewing device and the light source are configured to indicate whether said suction ring is centered on said eye based on the orientation and position of the detected light.
A lens assembly applied for a mobile phone, comprising a lens barrel and a lens , wherein the lens barrel is hollow and comprises an interior surface , the lens is disposed inside the lens barrel , and the lens comprises a side surface in interference fit with the interior surface , wherein the interior surface has a hollow area , the side surface comprises a micro-convex structure , and the hollow area fits the micro-convex structure , wherein a fit quantity between the micro-convex structure and the hollow area is changed through relative rotation of the lens and the lens barrel , to adjust assembly interference between the lens barrel and the lens .
A wound treatment device , comprising: an elastic sheet , comprising: a first edge and a second edge opposite the first edge; a first applicator attachment structure , comprising a first structure protruding from the elastic sheet ; and a second applicator attachment structure , comprising a second structure protruding from the elastic sheet ; and an inner skin adhesive region positioned with the first edge and first applicator attachment structure on one side, and the second edge and second applicator attachment structure on the other side; wherein the first and second applicator attachment structures are configured to form a mechanical or frictional interfit with an applicator and are configured to releasably attach to the applicator. an elastic sheet , comprising: a first edge and a second edge opposite the first edge; a first applicator attachment structure , comprising a first structure protruding from the elastic sheet ; and a second applicator attachment structure , comprising a second structure protruding from the elastic sheet ; and an inner skin adhesive region positioned with the first edge and first applicator attachment structure on one side, and the second edge and second applicator attachment structure on the other side; wherein the first and second applicator attachment structures are configured to form a mechanical or frictional interfit with an applicator and are configured to releasably attach to the applicator.
A building surface product comprising: a substantially planar gypsum panel having a first edge , a second edge , and two ends , wherein the gypsum panel includes: a body comprising a front face , a rear face , and a thickness between the front face and the rear face , and a first lapping projection extending outward from the body at the second edge , the first lapping projection being configured to overlap a portion of a neighboring gypsum panel so as to form a building surface; and a first press-on connector disposed on and attached to the rear face of the body toward the first edge of the gypsum panel , the press-on connector being configured to engage a corresponding second press-on connector. a substantially planar gypsum panel having a first edge , a second edge , and two ends , wherein the gypsum panel includes: a body comprising a front face , a rear face , and a thickness between the front face and the rear face , and a first lapping projection extending outward from the body at the second edge , the first lapping projection being configured to overlap a portion of a neighboring gypsum panel so as to form a building surface; and a body comprising a front face , a rear face , and a thickness between the front face and the rear face , and a first lapping projection extending outward from the body at the second edge , the first lapping projection being configured to overlap a portion of a neighboring gypsum panel so as to form a building surface; and a first press-on connector disposed on and attached to the rear face of the body toward the first edge of the gypsum panel , the press-on connector being configured to engage a corresponding second press-on connector.
A sniffer leak detector for sucking in and analyzing gas, comprising a sniffer probe , a gas-conveying pump connected to the sniffer probe for sucking in the gas through the sniffer probe with atmospheric pressure, a vacuum pump having a gas inlet , the gas inlet having a gas-permeable membrane , and comprising a mass spectrometer connected to the vacuum pump for analyzing the sucked-in gas in a high vacuum, wherein the gas flow sucked in by the gas-conveying pump through the sniffer probe is conducted along the membrane such that the membrane allows part of the gas to flow into the prevacuum of the vacuum pump for the mass-spectrometric analysis of the gas in the high vacuum, characterized in that the membrane is a porous membrane having gas-permeable pores , wherein each pore penetrates the membrane completely and the diameters (D) of the pores are less than or equal to the free path length (I) of air at atmospheric pressure and room temperature, and that the surface ratio of all pores is at least about 20% of the total membrane surface area.
A control station (20; 120; 220) for a work platform of an aerial work platform, comprising: - a control console whereon control members are arranged; - a cover (40; 140; 240) for protecting the control console moveably mounted between: ∘ a first position in which the cover is closed to cover the control console, and ∘ a second position in which the cover is open to make it possible to manipulate the control members from the front side of the console; characterized in that the control console further comprises: - a longitudinal member (42; 142; 242) linked to the cover to simultaneously move between the first position and the second position, which longitudinal member extends at a distance along the front side of the console and protrudes with respect to the front side of the console when the cover is in the second position; and - means for detecting an external action (F 4 ) pushing the longitudinal member toward the console when the cover is in the second position. - a control console whereon control members are arranged; - a cover (40; 140; 240) for protecting the control console moveably mounted between: ∘ a first position in which the cover is closed to cover the control console, and ∘ a second position in which the cover is open to make it possible to manipulate the control members from the front side of the console; ∘ a first position in which the cover is closed to cover the control console, and ∘ a second position in which the cover is open to make it possible to manipulate the control members from the front side of the console; - a longitudinal member (42; 142; 242) linked to the cover to simultaneously move between the first position and the second position, which longitudinal member extends at a distance along the front side of the console and protrudes with respect to the front side of the console when the cover is in the second position; and - means for detecting an external action (F 4 ) pushing the longitudinal member toward the console when the cover is in the second position.
A wheel cover system comprising: a bracket assembly configured to couple to a wheel ; a disk assembly comprising an inner portion; a base assembly coupled to the bracket assembly and compatible with the inner portion of the disk assembly , wherein the disk assembly is removably coupled to the wheel by the base assembly and the base assembly is shaped to receive the inner portion of the disk assembly and, when the inner portion of the disk assembly is aligned to the base assembly and the inner portion of the disk assembly is depressed axially from a first position to a second position, to allow the disk assembly to rotate a fraction of a single rotation to a secured position. a bracket assembly configured to couple to a wheel ; a disk assembly comprising an inner portion; a base assembly coupled to the bracket assembly and compatible with the inner portion of the disk assembly , wherein the disk assembly is removably coupled to the wheel by the base assembly and the base assembly is shaped to receive the inner portion of the disk assembly and, when the inner portion of the disk assembly is aligned to the base assembly and the inner portion of the disk assembly is depressed axially from a first position to a second position, to allow the disk assembly to rotate a fraction of a single rotation to a secured position.
A bonded substrate including a copper plate bonded to one or both main surface(s) of a nitride ceramic substrate , wherein a bonding layer containing TiN as a major component intervenes between said nitride ceramic substrate and said copper plate and is adjacent at least to said copper plate and is in direct contact with said copper plate, an Ag distribution region in which Ag atoms are distributed is present in said copper plate , and characterised in that the abundance ratio of the Ag atoms in the Ag distribution region is at most 15 at%.
An ultrasonic surgical instrument connectable to a generator , the ultrasonic surgical instrument comprising: an end effector comprising an ultrasonic blade ; an ultrasonic transducer acoustically coupled to the ultrasonic blade, the ultrasonic transducer configured to ultrasonically oscillate the ultrasonic blade in response to a drive signal from the generator; and a control circuit coupled to the ultrasonic transducer, the control circuit configured to: determine whether tissue is present within the end effector; and permit activation of the ultrasonic transducer at a power level according to whether tissue is present within the end effector; characterized by: a bipolar electrode array positioned along a jaw of the end effector and coupled to the control circuit, the bipolar electrode array configured to detect presence of tissue thereagainst; wherein the control circuit is configured to determine whether the tissue is present by detecting electrical continuity between adjacent electrodes of the bipolar electrode array. an end effector comprising an ultrasonic blade ; an ultrasonic transducer acoustically coupled to the ultrasonic blade, the ultrasonic transducer configured to ultrasonically oscillate the ultrasonic blade in response to a drive signal from the generator; and a control circuit coupled to the ultrasonic transducer, the control circuit configured to: determine whether tissue is present within the end effector; and permit activation of the ultrasonic transducer at a power level according to whether tissue is present within the end effector; determine whether tissue is present within the end effector; and permit activation of the ultrasonic transducer at a power level according to whether tissue is present within the end effector; characterized by: a bipolar electrode array positioned along a jaw of the end effector and coupled to the control circuit, the bipolar electrode array configured to detect presence of tissue thereagainst; wherein the control circuit is configured to determine whether the tissue is present by detecting electrical continuity between adjacent electrodes of the bipolar electrode array. a bipolar electrode array positioned along a jaw of the end effector and coupled to the control circuit, the bipolar electrode array configured to detect presence of tissue thereagainst; wherein the control circuit is configured to determine whether the tissue is present by detecting electrical continuity between adjacent electrodes of the bipolar electrode array.
A catalyst for preparing chlorine gas by hydrogen chloride oxidation, wherein the catalyst comprises a copper element, a manganese element, a boron element, a chromium element, a rare earth element, a potassium element, a titanium element, a phosphorus element, an iron element and a carrier; wherein based on the total mass of the catalyst, the content of each element in the catalyst is: copper, 0.5-20 wt%; manganese, 2-10 wt%, boron, 0.05-2 wt%; chromium, 0.01-3.0 wt%; rare earth element, 0.1-10 wt%; potassium, 0.1-10 wt%; titanium, 3-15 wt%; phosphorus, 0.02-1.1 wt%; iron, 0.03-1.9 wt%; and the content of the carrier is 55-90 wt%; and wherein the carrier is selected from the group consisting of molecular sieves, kaolin, diatomite, silica, alumina, zirconia, activated carbon, silicon carbide, carbon black, carbon fibers and carbon nanotubes, and a mixture thereof. wherein based on the total mass of the catalyst, the content of each element in the catalyst is: copper, 0.5-20 wt%; manganese, 2-10 wt%, boron, 0.05-2 wt%; chromium, 0.01-3.0 wt%; rare earth element, 0.1-10 wt%; potassium, 0.1-10 wt%; titanium, 3-15 wt%; phosphorus, 0.02-1.1 wt%; iron, 0.03-1.9 wt%; and the content of the carrier is 55-90 wt%; and wherein the carrier is selected from the group consisting of molecular sieves, kaolin, diatomite, silica, alumina, zirconia, activated carbon, silicon carbide, carbon black, carbon fibers and carbon nanotubes, and a mixture thereof.
A method for polishing a conductive metal surface comprising the steps of a) providing an electrolyte comprising ammonium nitrate and ammonium chloride, wherein the electrolyte is an aqueous solution comprising 1 to 20 weight percent (wt%) of a mixture of ammonium nitrate and ammonium chloride, b) connecting a first electrode to said conductive metal surface and connecting a second electrode to said electrolyte, wherein said conductive metal surface is the anode, then c) applying a first electrical voltage to said first electrode and said second electrode in a first voltage step, then d) contacting said conductive metal surface with said electrolyte, in an immersion step, then e) applying without interruption a second electrical voltage, wherein the first voltage is essentially the same as the second voltage, wherein said second electrical voltage is below the threshold for generating a plasma and between 80 V and 350 V, and f) maintaining said second electrical voltage for a period of at least 1 second. a) providing an electrolyte comprising ammonium nitrate and ammonium chloride, wherein the electrolyte is an aqueous solution comprising 1 to 20 weight percent (wt%) of a mixture of ammonium nitrate and ammonium chloride, b) connecting a first electrode to said conductive metal surface and connecting a second electrode to said electrolyte, wherein said conductive metal surface is the anode, then c) applying a first electrical voltage to said first electrode and said second electrode in a first voltage step, then d) contacting said conductive metal surface with said electrolyte, in an immersion step, then e) applying without interruption a second electrical voltage, wherein the first voltage is essentially the same as the second voltage, wherein said second electrical voltage is below the threshold for generating a plasma and between 80 V and 350 V, and f) maintaining said second electrical voltage for a period of at least 1 second.
A dispersion-hardened platinum composition comprising at least 70 wt.% platinum, the platinum composition containing up to 29.95 wt.% of one of the metals rhodium, gold, iridium and palladium or of a mixture of at least two of the metals rhodium, gold, iridium and palladium, the platinum composition containing between 0.05 wt.% and 1 wt.% oxides of the non-precious metals zirconium, yttrium and scandium, and the platinum composition containing, as the remainder, the platinum including impurities, wherein between 8.0 mol.% and 10.0 mol.% of the oxides of the non-precious metals is yttrium oxide, between 0.1 mol.% and 5.0 mol.% of the oxides is scandium oxide, and the remainder of the oxides is zirconia, including oxide impurities.
A displacement sensor comprising: a light source unit configured to apply light with different plural wavelengths in a direction oblique to a measurement region (M) of a planar measured object , the light sources unit being configured to emit light whose wavelength changes according to an emission direction; a spectroscope configured to measure spectral distribution of light reflected by the measurement region; a feature amount extracting module configured to extract a feature amount of the spectral distribution; and a displacement calculating module configured to calculate displacement of the measurement region based on the extracted feature amount and a relation between displacement and a feature amount acquired previously; characterized in that the light source unit includes a light source configured to emit light, and an optical filter using a dielectric multilayer film configured such that a transmission wavelength or a reflection wavelength changes according to an incidence angle, based on interference of reflection occurring at an interface of each layer, wherein the light source unit is constructed so that light emitted from the light source obliquely enters the optical filter . a light source unit configured to apply light with different plural wavelengths in a direction oblique to a measurement region (M) of a planar measured object , the light sources unit being configured to emit light whose wavelength changes according to an emission direction; a spectroscope configured to measure spectral distribution of light reflected by the measurement region; a feature amount extracting module configured to extract a feature amount of the spectral distribution; and a displacement calculating module configured to calculate displacement of the measurement region based on the extracted feature amount and a relation between displacement and a feature amount acquired previously; characterized in that the light source unit includes a light source configured to emit light, and an optical filter using a dielectric multilayer film configured such that a transmission wavelength or a reflection wavelength changes according to an incidence angle, based on interference of reflection occurring at an interface of each layer, wherein the light source unit is constructed so that light emitted from the light source obliquely enters the optical filter .