A wavefront measurement device comprising: a light source system configured to illuminate an optical system to be inspected and make light fluxes of a plurality of wavefront measurement visual fields be emitted from the optical system to be inspected ; a single wavefront sensor configured to calculate a wavefront aberration on a basis of measurement of the light fluxes of the plurality of wavefront measurement visual fields emitted from the optical system to be inspected ; and an optical path optical system configured to selectively make the light fluxes of the plurality of wavefront measurement visual fields emitted from the optical system to be inspected be incident on the wavefront sensor , wherein the light fluxes of the plurality of wavefront measurement visual fields being made by the light source system be emitted from the optical system to be inspected include a first light flux emitted coaxially with an optical axis of the optical system to be inspected and a second light flux emitted at a wide angle from the optical system to be inspected , and the optical path optical system includes: a first folding plane mirror reflecting the second light flux; and a first wedge prism refracting the second light flux reflected by the first folding plane mirror such that the second light flux is parallel to the first light flux and does not overlap with the first light flux, wherein the light fluxes are selectively incident on different areas on the wavefront sensor by making the first light flux be incident on a first area on the wavefront sensor and making the second light flux refracted by the first wedge prism be incident on a second area different from the first area on the wavefront sensor . a light source system configured to illuminate an optical system to be inspected and make light fluxes of a plurality of wavefront measurement visual fields be emitted from the optical system to be inspected ; a single wavefront sensor configured to calculate a wavefront aberration on a basis of measurement of the light fluxes of the plurality of wavefront measurement visual fields emitted from the optical system to be inspected ; and an optical path optical system configured to selectively make the light fluxes of the plurality of wavefront measurement visual fields emitted from the optical system to be inspected be incident on the wavefront sensor , wherein the light fluxes of the plurality of wavefront measurement visual fields being made by the light source system be emitted from the optical system to be inspected include a first light flux emitted coaxially with an optical axis of the optical system to be inspected and a second light flux emitted at a wide angle from the optical system to be inspected , and the optical path optical system includes: a first folding plane mirror reflecting the second light flux; and a first wedge prism refracting the second light flux reflected by the first folding plane mirror such that the second light flux is parallel to the first light flux and does not overlap with the first light flux, wherein the light fluxes are selectively incident on different areas on the wavefront sensor by making the first light flux be incident on a first area on the wavefront sensor and making the second light flux refracted by the first wedge prism be incident on a second area different from the first area on the wavefront sensor . <EOS>