A cutting tool comprising a substrate and a coating layer provided on the substrate, the coating layer including a multilayer structure layer composed of a first unit layer and a second unit layer , and a lone layer , the first unit layer and the second unit layer being alternately stacked, the multilayer structure layer and the lone layer being stacked such that more than one multilayer structure layer and more than one lone layer are alternately stacked, the first unit layer including cubic Al x Ti 1-x N crystal grains, the second unit layer including cubic Al y Ti 1-y N crystal grains, the lone layer including cubic Ti z Al 1-z N crystal grains, an atomic ratio x of A1 in the Al x Ti 1-x N being 0.8 or more and 0.95 or less, an atomic ratio y of A1 in the Al y Ti 1-y N being 0.7 or more and less than 0.8, an atomic ratio z of Ti in the Ti z Al 1-z N being 0.4 or more and less than 0.55, wherein the atomic ratios and cubic crystal grains are measured by the methods described in the description, the first unit layer having a thickness with an average value of 2.5 nm or more and 5 nm or less, the second unit layer having a thickness with an average value of 2.5 nm or more and 5 nm or less, the multilayer structure layer having a thickness with an average value of 40 nm or more and 95 nm or less, the lone layer having a thickness with an average value of 2.5 nm or more and 10 nm or less, one multilayer structure layer and one lone layer forming a repetitive unit having a thickness with an average value of 50 nm or more and 100 nm or less, a maximum value of 90 nm or more and 110 nm or less, and a minimum value of 40 nm or more and 60 nm or less, wherein the coating layer has a thickness with an average value of 2 μm or more and 10 μm or less, and wherein the thicknesses are measured by the method described in the description. the coating layer including a multilayer structure layer composed of a first unit layer and a second unit layer , and a lone layer , the first unit layer and the second unit layer being alternately stacked, the multilayer structure layer and the lone layer being stacked such that more than one multilayer structure layer and more than one lone layer are alternately stacked, the first unit layer including cubic Al x Ti 1-x N crystal grains, the second unit layer including cubic Al y Ti 1-y N crystal grains, the lone layer including cubic Ti z Al 1-z N crystal grains, an atomic ratio x of A1 in the Al x Ti 1-x N being 0.8 or more and 0.95 or less, an atomic ratio y of A1 in the Al y Ti 1-y N being 0.7 or more and less than 0.8, an atomic ratio z of Ti in the Ti z Al 1-z N being 0.4 or more and less than 0.55, wherein the atomic ratios and cubic crystal grains are measured by the methods described in the description, the first unit layer having a thickness with an average value of 2.5 nm or more and 5 nm or less, the second unit layer having a thickness with an average value of 2.5 nm or more and 5 nm or less, the multilayer structure layer having a thickness with an average value of 40 nm or more and 95 nm or less, the lone layer having a thickness with an average value of 2.5 nm or more and 10 nm or less, one multilayer structure layer and one lone layer forming a repetitive unit having a thickness with an average value of 50 nm or more and 100 nm or less, a maximum value of 90 nm or more and 110 nm or less, and a minimum value of 40 nm or more and 60 nm or less, wherein the coating layer has a thickness with an average value of 2 μm or more and 10 μm or less, and wherein the thicknesses are measured by the method described in the description. <EOS>