A spectral characteristic measuring apparatus comprising: a first light source unit configured to apply first light to a measurement region (M) of a planar measured object , wherein the first light is rotationally symmetrical about a perpendicular of the measurement region (M); a second light source unit configured to apply second light with different plural wavelengths in a direction oblique to the measurement region, wherein the second light source unit is configured so that the wavelength changes according to an emission direction, in the direction oblique to the measurement region, a wavelength range of emission by the second light source unit does not overlap with a wavelength range of emission by the first light source unit; a spectroscope configured to measure a first spectral distribution of first light applied from the first light source and then reflected by the measurement region and a second spectral distribution of second light applied from the second light source and then reflected by the measurement region, the second spectral distribution corresponding to the displacement of the planar measured object ; a feature amount extracting module configured to extract a feature amount of the second spectral distribution of the second light related to the second light source unit; a spectral characteristic calculating module configured to calculate spectral characteristics based on the first spectral distribution of the first light related to the first light source unit; and a spectral characteristic correcting module configured to correct the spectral characteristics according to the displacement of the planar measured object based on the extracted feature amount and a relation between spectral characteristics and a feature amount acquired previously. a first light source unit configured to apply first light to a measurement region (M) of a planar measured object , wherein the first light is rotationally symmetrical about a perpendicular of the measurement region (M); a second light source unit configured to apply second light with different plural wavelengths in a direction oblique to the measurement region, wherein the second light source unit is configured so that the wavelength changes according to an emission direction, in the direction oblique to the measurement region, a wavelength range of emission by the second light source unit does not overlap with a wavelength range of emission by the first light source unit; a spectroscope configured to measure a first spectral distribution of first light applied from the first light source and then reflected by the measurement region and a second spectral distribution of second light applied from the second light source and then reflected by the measurement region, the second spectral distribution corresponding to the displacement of the planar measured object ; a feature amount extracting module configured to extract a feature amount of the second spectral distribution of the second light related to the second light source unit; a spectral characteristic calculating module configured to calculate spectral characteristics based on the first spectral distribution of the first light related to the first light source unit; and a spectral characteristic correcting module configured to correct the spectral characteristics according to the displacement of the planar measured object based on the extracted feature amount and a relation between spectral characteristics and a feature amount acquired previously. <EOS>