A method for determining critical locations for measurement of critical dimensions comprising: receiving, at a processor, an ordered location list, wherein each ordered location in the ordered location list includes a data block; and obtaining critical dimension measurements, comprising: (a) selecting, using the processor, one ordered location from the ordered location list to obtain a selected location; (b) measuring a first critical dimension at the selected location to obtain a first critical dimension measurement; (c) adding, using the processor, the first critical dimension measurement to the data block of the selected location; and (d) repeating steps (a) to (c) for each of the ordered locations remaining in the ordered location list; training a critical dimension location prediction model using the data block with the first critical dimension; and creating a synthetic location list, comprising: determining one or more synthetic locations using the critical dimension location prediction model; and creating the synthetic location list including the one or more synthetic locations, each of the synthetic locations having a synthetic location data block, wherein the synthetic location data block is configured to contain synthetic location data. receiving, at a processor, an ordered location list, wherein each ordered location in the ordered location list includes a data block; and obtaining critical dimension measurements, comprising: (a) selecting, using the processor, one ordered location from the ordered location list to obtain a selected location; (b) measuring a first critical dimension at the selected location to obtain a first critical dimension measurement; (c) adding, using the processor, the first critical dimension measurement to the data block of the selected location; and (d) repeating steps (a) to (c) for each of the ordered locations remaining in the ordered location list; (a) selecting, using the processor, one ordered location from the ordered location list to obtain a selected location; (b) measuring a first critical dimension at the selected location to obtain a first critical dimension measurement; (c) adding, using the processor, the first critical dimension measurement to the data block of the selected location; and (d) repeating steps (a) to (c) for each of the ordered locations remaining in the ordered location list; training a critical dimension location prediction model using the data block with the first critical dimension; and creating a synthetic location list, comprising: determining one or more synthetic locations using the critical dimension location prediction model; and creating the synthetic location list including the one or more synthetic locations, each of the synthetic locations having a synthetic location data block, wherein the synthetic location data block is configured to contain synthetic location data. determining one or more synthetic locations using the critical dimension location prediction model; and creating the synthetic location list including the one or more synthetic locations, each of the synthetic locations having a synthetic location data block, wherein the synthetic location data block is configured to contain synthetic location data. <EOS>