Method for obtaining an image (I R , I' R ) of a sample with the aid of an imaging system comprising at least one light source , a sample support which is configured to receive the sample , and a photodetector array , the sample support being arranged between each light source and the photodetector array , the method comprising the following steps: - a) emission , from different emission positions (P 1 , P 2 , ..., P N ) relative to the sample support , of a light beam for illuminating the sample in an illumination direction (Z) with the aid of a light source , the different emission positions (P 1 , P 2 , ..., P N ) being offset relative to one another in a direction perpendicular to the illumination direction (Z), wherein the emission positions (P 1 , P 2 ) are offset in (a) pair(s), and the two positions (P 1 , P 2 ) of each respective pair are offset relative to an axis (M) which passes substantially through the middle of the sample and is parallel to the illumination direction (Z), - b) acquisition of multiple successive images (I 1 , I 2 , ..., I N ) of the sample with the aid of the photodetector array , each image (I 1 , I 2 , ..., I N ) being formed by a ray transmitted by the illuminated sample and having at least one elementary diffraction pattern, each elementary diffraction pattern corresponding to waves diffracted on illumination of the sample , each acquired image (I 1 , I 2 , ..., I N ) corresponding to a respective emission position (P 1 , P 2 , ..., P N ) of the light beam relative to said sample support , - c) calculation of a resulting image (I R , I' R ) of the sample from the different acquired images (I 1 , I 2 , ..., I N ), characterised in that step c) comprises: - detection of a zone of an acquired image (I 1 ) that comprises a light artefact , the light artefact having an intensity greater than a predefined threshold, and - replacement, in the resulting image (I R , I' R ), of said detected zone that comprises the light artefact by a corresponding zone of a different acquired image (I 2 ), said corresponding zone not having a light artefact. - a) emission , from different emission positions (P 1 , P 2 , ..., P N ) relative to the sample support , of a light beam for illuminating the sample in an illumination direction (Z) with the aid of a light source , the different emission positions (P 1 , P 2 , ..., P N ) being offset relative to one another in a direction perpendicular to the illumination direction (Z), wherein the emission positions (P 1 , P 2 ) are offset in (a) pair(s), and the two positions (P 1 , P 2 ) of each respective pair are offset relative to an axis (M) which passes substantially through the middle of the sample and is parallel to the illumination direction (Z), - b) acquisition of multiple successive images (I 1 , I 2 , ..., I N ) of the sample with the aid of the photodetector array , each image (I 1 , I 2 , ..., I N ) being formed by a ray transmitted by the illuminated sample and having at least one elementary diffraction pattern, each elementary diffraction pattern corresponding to waves diffracted on illumination of the sample , each acquired image (I 1 , I 2 , ..., I N ) corresponding to a respective emission position (P 1 , P 2 , ..., P N ) of the light beam relative to said sample support , - c) calculation of a resulting image (I R , I' R ) of the sample from the different acquired images (I 1 , I 2 , ..., I N ), - detection of a zone of an acquired image (I 1 ) that comprises a light artefact , the light artefact having an intensity greater than a predefined threshold, and - replacement, in the resulting image (I R , I' R ), of said detected zone that comprises the light artefact by a corresponding zone of a different acquired image (I 2 ), said corresponding zone not having a light artefact. <EOS>