A low-e coating applied onto a glass for providing neutrality when viewed from inside and from outside in automotive and architectural glasses, wherein the visible region transmittance value after thermal process is between 60-75% and the solar transmittance value is between 23-35%, and the following is provided outwardly from the glass : - a first dielectric structure comprising at least one of Si x N y , SiAlN x , SiAlO x N y , SiO x N y , ZnSnO x , TiO x , TiN x , ZrN x , NiCr, NiCrO x , TiO x , ZnSnO x , ZnAlO x , ZnO x ; - the first functional layer positioned on said first dielectric structure ; - a first barrier layer comprising at least one of NiCr, NiCrO x , TiO x , ZnAlO x and positioned on said first functional layer ; - the second dielectric structure comprising at least one of Si x N y , SiAlN x , SiAlO x N y , SiO x N y , ZnSnO x , TiO x , TiN x , ZrN x , NiCr, NiCrO x , TiO x , ZnSnO x , ZnAlO x , ZnO x and positioned on said first barrier layer ; - the second functional layer positioned on said second dielectric structure ; - the second barrier layer comprising at least one of NiCr, NiCrO x , TiO x , ZnAlO x and positioned on said second functional layer ; - the third dielectric structure comprising at least one of Si x N y , SiAlN x , SiAlO x N y , SiO x N y , ZnSnO x , TiO x , TiN x , ZrN x , NiCr, NiCrO x , TiO x , ZnSnO x , ZnAlO x , ZnO x and positioned on said second barrier layer ; - the third functional layer positioned on said third dielectric structure ; - the third barrier layer comprising at least one of NiCr, NiCrO x , TiO x , ZnAlO x and positioned on said third functional layer ; - the upper dielectric structure comprising at least one of or a number of layers of Si x N y , SiAlN x , SiAlO x N y , SiO x , SiO x N y , ZnSnO x , ZnAlO x , TiO x , TiN x , ZrN x and positioned on said third barrier layer , - wherein said third functional layer thickness is more than the second functional layer thickness and the first functional layer thickness. - a first dielectric structure comprising at least one of Si x N y , SiAlN x , SiAlO x N y , SiO x N y , ZnSnO x , TiO x , TiN x , ZrN x , NiCr, NiCrO x , TiO x , ZnSnO x , ZnAlO x , ZnO x ; - the first functional layer positioned on said first dielectric structure ; - a first barrier layer comprising at least one of NiCr, NiCrO x , TiO x , ZnAlO x and positioned on said first functional layer ; - the second dielectric structure comprising at least one of Si x N y , SiAlN x , SiAlO x N y , SiO x N y , ZnSnO x , TiO x , TiN x , ZrN x , NiCr, NiCrO x , TiO x , ZnSnO x , ZnAlO x , ZnO x and positioned on said first barrier layer ; - the second functional layer positioned on said second dielectric structure ; - the second barrier layer comprising at least one of NiCr, NiCrO x , TiO x , ZnAlO x and positioned on said second functional layer ; - the third dielectric structure comprising at least one of Si x N y , SiAlN x , SiAlO x N y , SiO x N y , ZnSnO x , TiO x , TiN x , ZrN x , NiCr, NiCrO x , TiO x , ZnSnO x , ZnAlO x , ZnO x and positioned on said second barrier layer ; - the third functional layer positioned on said third dielectric structure ; - the third barrier layer comprising at least one of NiCr, NiCrO x , TiO x , ZnAlO x and positioned on said third functional layer ; - the upper dielectric structure comprising at least one of or a number of layers of Si x N y , SiAlN x , SiAlO x N y , SiO x , SiO x N y , ZnSnO x , ZnAlO x , TiO x , TiN x , ZrN x and positioned on said third barrier layer , - wherein said third functional layer thickness is more than the second functional layer thickness and the first functional layer thickness. <EOS>