A lithographic apparatus comprising: a support (MT) constructed to support a patterning device (MA), the patterning device (MA) being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate (W) on a central area of the substrate table ; a projection system (PS) configured to project the patterned radiation beam onto a target portion of the substrate in a first direction; and a positioning device configured to position the substrate table, the positioning device comprising a plurality of actuators (520.1, 520.2, 520.3, 520.4) arranged to exert forces to position the substrate table, wherein the forces are substantially directed in a plane substantially perpendicular to the first direction, wherein the plane comprises a center of gravity of the substrate table, and wherein the plurality of actuators (520.1, 520.2, 520.3, 520.4) are arranged outside a central volume of the substrate table, the central volume being obtained by projecting the central area along the first direction, wherein the central area substantially corresponds to an area, in use, covered by the substrate, wherein the plurality of actuators (520.1, 520.2, 520.3, 520.4) comprises four electromagnetic actuators arranged along four sides of the substrate table , wherein the four electromagnetic actuators comprise two actuators (520.1, 520.2) arranged on opposite sides of the substrate table and configured to exert a force in a second direction onto the substrate table , the second direction being substantially perpendicular to the first direction and passing through the center of gravity, and two further actuators (520.3, 520.4) arranged on another opposite sides of the substrate table and configured to exert forces along two different directions substantially perpendicular to the first and the second direction and that do not pass through the center of gravity. a support (MT) constructed to support a patterning device (MA), the patterning device (MA) being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate (W) on a central area of the substrate table ; a projection system (PS) configured to project the patterned radiation beam onto a target portion of the substrate in a first direction; and a positioning device configured to position the substrate table, the positioning device comprising a plurality of actuators (520.1, 520.2, 520.3, 520.4) arranged to exert forces to position the substrate table, wherein the forces are substantially directed in a plane substantially perpendicular to the first direction, wherein the plane comprises a center of gravity of the substrate table, and wherein the plurality of actuators (520.1, 520.2, 520.3, 520.4) are arranged outside a central volume of the substrate table, the central volume being obtained by projecting the central area along the first direction, wherein the central area substantially corresponds to an area, in use, covered by the substrate, wherein the plurality of actuators (520.1, 520.2, 520.3, 520.4) comprises four electromagnetic actuators arranged along four sides of the substrate table , wherein the four electromagnetic actuators comprise two actuators (520.1, 520.2) arranged on opposite sides of the substrate table and configured to exert a force in a second direction onto the substrate table , the second direction being substantially perpendicular to the first direction and passing through the center of gravity, and two further actuators (520.3, 520.4) arranged on another opposite sides of the substrate table and configured to exert forces along two different directions substantially perpendicular to the first and the second direction and that do not pass through the center of gravity. <EOS>