A stainless steel exhibiting an excellent brazeability, comprising, in mass%: C: from 0.001% to 0.1%; Si: from more than 1.5% to 4.0%; Mn: from 0.05% to 4.0%; Cr: from 10.5% to 30%; Ni: 35% or less; N: from 0.001% to 0.4%; one or both of Ti: 0.002% to 0.030% and Al: 0.002% to 0.10%; optionally in mass%: at least one of: a first group that is at least one of Sn: from 0.001% to 0.5%, Co: 0.01% to 0.5%, Bi: 0.001% to 0.01%, and B: 0.0002% to 0.005%; a second group that is at least one of Mo: 0.3% to 8%, W: 0.3% to 4%, V: 0.05% to 0.5%, Nb: 0.01% to 1%, Cu: 0.1% to 6%, Sb: 0.001% to 0.5%, Zr: 0.001% to 0.3%, Ga: 0.0001 % to 0.01%, and Ta: 0.0001% to 0.01%; and a third group that is at least one of Ca: 0.0002% to 0.005%, Mg: 0.0002% to 0.005%, and REM: 0.005% to 0.1%; and a balance being Fe and inevitable impurities, wherein an Si content, a Ti content and an Al content satisfy Formula 1, wherein the stainless steel is an austenitic stainless steel, a ferritic stainless steel or a dual phase (ferrite + austenite) stainless steel; and an oxide film with a composition satisfying Formula 2 is formed on a surface of the stainless steel, Si m / Ti m + Al m ≥ 40 1.2 × Si m / Fe m ≤ Si f / Fe f ≤ 5 × Si m / Fe m where: in Formula 1 and Formula 2, an element with a suffix "f" expresses a content of the element in the oxide film, the content being indicated by a unit of atom%, and an element with a suffix "m" expresses a content of the element in the stainless steel that is a base material, the content being indicated by a unit of mass%, and wherein the elements in the oxide film are measured by XPS. C: from 0.001% to 0.1%; Si: from more than 1.5% to 4.0%; Mn: from 0.05% to 4.0%; Cr: from 10.5% to 30%; Ni: 35% or less; N: from 0.001% to 0.4%; one or both of Ti: 0.002% to 0.030% and Al: 0.002% to 0.10%; optionally in mass%: at least one of: a first group that is at least one of Sn: from 0.001% to 0.5%, Co: 0.01% to 0.5%, Bi: 0.001% to 0.01%, and B: 0.0002% to 0.005%; a second group that is at least one of Mo: 0.3% to 8%, W: 0.3% to 4%, V: 0.05% to 0.5%, Nb: 0.01% to 1%, Cu: 0.1% to 6%, Sb: 0.001% to 0.5%, Zr: 0.001% to 0.3%, Ga: 0.0001 % to 0.01%, and Ta: 0.0001% to 0.01%; and a third group that is at least one of Ca: 0.0002% to 0.005%, Mg: 0.0002% to 0.005%, and REM: 0.005% to 0.1%; and a balance being Fe and inevitable impurities, wherein an Si content, a Ti content and an Al content satisfy Formula 1, wherein the stainless steel is an austenitic stainless steel, a ferritic stainless steel or a dual phase (ferrite + austenite) stainless steel; and an oxide film with a composition satisfying Formula 2 is formed on a surface of the stainless steel, Si m / Ti m + Al m ≥ 40 1.2 × Si m / Fe m ≤ Si f / Fe f ≤ 5 × Si m / Fe m a first group that is at least one of Sn: from 0.001% to 0.5%, Co: 0.01% to 0.5%, Bi: 0.001% to 0.01%, and B: 0.0002% to 0.005%; a second group that is at least one of Mo: 0.3% to 8%, W: 0.3% to 4%, V: 0.05% to 0.5%, Nb: 0.01% to 1%, Cu: 0.1% to 6%, Sb: 0.001% to 0.5%, Zr: 0.001% to 0.3%, Ga: 0.0001 % to 0.01%, and Ta: 0.0001% to 0.01%; and a third group that is at least one of Ca: 0.0002% to 0.005%, Mg: 0.0002% to 0.005%, and REM: 0.005% to 0.1%; and a balance being Fe and inevitable impurities, wherein an Si content, a Ti content and an Al content satisfy Formula 1, wherein the stainless steel is an austenitic stainless steel, a ferritic stainless steel or a dual phase (ferrite + austenite) stainless steel; and an oxide film with a composition satisfying Formula 2 is formed on a surface of the stainless steel, Si m / Ti m + Al m ≥ 40 1.2 × Si m / Fe m ≤ Si f / Fe f ≤ 5 × Si m / Fe m <EOS>