An image sensor comprising: a substrate including, a first region (APS), a second region (OB), a first surface and a second surface opposite each other, the substrate including a plurality of unit pixel regions (PX) in the substrate , each of the plurality of unit pixel regions (PX) including a photoelectric conversion layer (PD1); a pixel defining pattern extending through the substrate in a first direction, the pixel defining pattern defining each of the plurality of unit pixel regions (PX), the pixel defining pattern includes a first conductive layer and a second conductive layer spaced apart from the first conductive layer ; a micro lens on the second surface of the substrate in the first region of the substrate, and the micro lens corresponding to the plurality of unit pixel regions (PX); wherein the pixel defining pattern includes a first defining pattern and a second defining pattern aligned with each other in the first direction and including the first and second conductive layers respectively; a first pad pattern on the second surface of the substrate in the second region of the substrate , the first pad pattern being electrically connected to the first defining pattern ; and a second pad pattern on the second surface of the substrate in the second region (OB) of the substrate , the second pad pattern being electrically connected to the second defining pattern , wherein the second defining pattern is in contact with the substrate , wherein the first defining pattern includes a liner film and a first conductive layer on the liner film, the liner film is disposed along and on a sidewall of the first trench (t1) and a bottom surface of the first trench (t1). a substrate including, a first region (APS), a second region (OB), a first surface and a second surface opposite each other, the substrate including a plurality of unit pixel regions (PX) in the substrate , each of the plurality of unit pixel regions (PX) including a photoelectric conversion layer (PD1); a pixel defining pattern extending through the substrate in a first direction, the pixel defining pattern defining each of the plurality of unit pixel regions (PX), the pixel defining pattern includes a first conductive layer and a second conductive layer spaced apart from the first conductive layer ; a micro lens on the second surface of the substrate in the first region of the substrate, and the micro lens corresponding to the plurality of unit pixel regions (PX); wherein the pixel defining pattern includes a first defining pattern and a second defining pattern aligned with each other in the first direction and including the first and second conductive layers respectively; a first pad pattern on the second surface of the substrate in the second region of the substrate , the first pad pattern being electrically connected to the first defining pattern ; and a second pad pattern on the second surface of the substrate in the second region (OB) of the substrate , the second pad pattern being electrically connected to the second defining pattern , wherein the second defining pattern is in contact with the substrate , wherein the first defining pattern includes a liner film and a first conductive layer on the liner film, the liner film is disposed along and on a sidewall of the first trench (t1) and a bottom surface of the first trench (t1). <EOS>