A measurement device for measuring a magnetic field (B) and/or an electric field (E), comprising: - a measurement cell containing a gas sensitive to the Zeeman effect and/or to the Stark effect, in particular an alkaline gas, and intended to be arranged in a magnetic field (B) and/or electric field (E), - a polarized light source whose wavelength is tuned to an absorption line of the gas sensitive to the Zeeman effect and/or to the Stark effect and that emits a light beam passing through said measurement cell , - at least one polarimetry system configured so as to measure a first parameter corresponding to the rotation of a polarization angle due to the beam passing into the measurement cell containing a gas sensitive to the Zeeman effect and/or to the Stark effect, the first parameter being dependent on the temperature in the measurement cell , characterized in that it further comprises: - an absorption measurement system configured so as to measure a second parameter corresponding to the absorption rate of the beam by the gas sensitive to the Zeeman effect and/or the Stark effect in the measurement cell , this second parameter being dependent on the temperature in the measurement cell , and - a processing unit configured so as to combine the measurement of the first parameter corresponding to the rotation of the polarization angle and the second parameter corresponding to an absorption rate measured by the absorption measurement system in order to extract therefrom a third and/or fourth parameter independent of the temperature in the measurement cell corresponding to an electric field E and/or magnetic field B to be measured, respectively. - a measurement cell containing a gas sensitive to the Zeeman effect and/or to the Stark effect, in particular an alkaline gas, and intended to be arranged in a magnetic field (B) and/or electric field (E), - a polarized light source whose wavelength is tuned to an absorption line of the gas sensitive to the Zeeman effect and/or to the Stark effect and that emits a light beam passing through said measurement cell , - at least one polarimetry system configured so as to measure a first parameter corresponding to the rotation of a polarization angle due to the beam passing into the measurement cell containing a gas sensitive to the Zeeman effect and/or to the Stark effect, the first parameter being dependent on the temperature in the measurement cell , - an absorption measurement system configured so as to measure a second parameter corresponding to the absorption rate of the beam by the gas sensitive to the Zeeman effect and/or the Stark effect in the measurement cell , this second parameter being dependent on the temperature in the measurement cell , and - a processing unit configured so as to combine the measurement of the first parameter corresponding to the rotation of the polarization angle and the second parameter corresponding to an absorption rate measured by the absorption measurement system in order to extract therefrom a third and/or fourth parameter independent of the temperature in the measurement cell corresponding to an electric field E and/or magnetic field B to be measured, respectively. <EOS>