mhurhangee/patent-ind-claim-en huggingface dataset:
A method for transmitting media data by a sending entity in a MPEG Media Transport, MMT, system, the method comprising: identifying at least one media processing unit, MPU for transmission of the media data, each of the at least one MPU including at least one media fragment unit, MFU; configuring a payload for transmission of media data, the payload including media data of one or more MFU of the at least one MFU; and transmitting a packet including the configured payload to a receiving entity, wherein the payload includes sample number information indicating a sample number of a sample to which media data of the respective MFU belongs, and offset information indicating an offset of media data of the respective MFU in the sample, wherein the respective MFU comprises, in an MFU header, at least one hint sample of an MMT hint track related to a location of the media data of the respective MFU. identifying at least one media processing unit, MPU for transmission of the media data, each of the at least one MPU including at least one media fragment unit, MFU; configuring a payload for transmission of media data, the payload including media data of one or more MFU of the at least one MFU; and transmitting a packet including the configured payload to a receiving entity, wherein the payload includes sample number information indicating a sample number of a sample to which media data of the respective MFU belongs, and offset information indicating an offset of media data of the respective MFU in the sample, wherein the respective MFU comprises, in an MFU header, at least one hint sample of an MMT hint track related to a location of the media data of the respective MFU.
A centrifugal blower system comprising: a) a series of blower units including at least a first blower unit and a second blower unit , the first blower unit in the series comprising a first casing having a first axial inlet , a first radial outlet , a first impeller disposed within the first casing for draw-ing a first gaseous medium at a first pressure into the first axial inlet and expel-ling the first gaseous medium at a second higher pressure through the first radial outlet into a duct having a gas flow passageway defined by a gas flow-confining wall and a motor for driving the first impeller; b) the second blower unit comprising a second casing and having a second axial in-let in communication with an outlet of the duct, a second radial outlet , a second impeller disposed within the second casing for drawing the first gaseous medium into the second axial inlet and expelling a second blower gaseous medium through the second radial outlet; c) a gas flow inlet in communication with the duct, for admitting a second gaseous medium to the gas flow passageway of the duct, the gas flow inlet being defined in or connected to the gas flow- confining wall of the duct, whereby the second gaseous medium mixes with the first gaseous medium in the second blower unit to form a gas mixture characterised in that the gas flow inlet includes a section extending beyond the wall of the duct and into the interior of the gas flow passageway. a) a series of blower units including at least a first blower unit and a second blower unit , the first blower unit in the series comprising a first casing having a first axial inlet , a first radial outlet , a first impeller disposed within the first casing for draw-ing a first gaseous medium at a first pressure into the first axial inlet and expel-ling the first gaseous medium at a second higher pressure through the first radial outlet into a duct having a gas flow passageway defined by a gas flow-confining wall and a motor for driving the first impeller; b) the second blower unit comprising a second casing and having a second axial in-let in communication with an outlet of the duct, a second radial outlet , a second impeller disposed within the second casing for drawing the first gaseous medium into the second axial inlet and expelling a second blower gaseous medium through the second radial outlet; c) a gas flow inlet in communication with the duct, for admitting a second gaseous medium to the gas flow passageway of the duct, the gas flow inlet being defined in or connected to the gas flow- confining wall of the duct, whereby the second gaseous medium mixes with the first gaseous medium in the second blower unit to form a gas mixture
Handling device for allowing the manipulation by a person of equipment to be inserted obliquely into a system, said device comprising a support piece intended to be suspended close to said system and to which is coupled a fastening assembly to which is intended to be temporarily fastened said equipment in a waiting position, characterized in that it comprises a curvilinear rail fixedly secured to said fastening assembly and comprising a handling handle , and in that said support piece comprises a curvilinear slide in which said curvilinear rail is slidably mounted in order, when the said person causes the latter to slide by means of the said handling handle , to move it from an initial position to a final position in which the said equipment is in a offset and inclined position suitable for its introduction into the said system.
Apparatus for cleaning a surface of a conveyor belt movable in a movement direction of residues of materials conveyed in the context of mining, in particular overburden and/or raw materials conveyed in the context of mining, comprising: a nozzle bar with a plurality of nozzles for applying fluid jets to the surface of the conveyor belt ; at least one fluid-removal element for removing at least some of the fluid from the surface , wherein the nozzles are designed and oriented such that the fluid jets come into contact with the surface , in a direction counter to the movement direction , at an angle of incidence of less than 90°, wherein the apparatus further comprises a mechanical precision wiper , over which the conveyor belt is guidable, wherein the precision wiper is formed between the nozzle bar and the fluid-removal element , characterized in that the fluid-removal element comprises an adhesion roller , which has an elastomeric coating on its circumference, and wherein the apparatus comprises a high-pressure fluid-supply for supplying a fluid to the nozzle bar at a pressure of at least 30 bar. a nozzle bar with a plurality of nozzles for applying fluid jets to the surface of the conveyor belt ; at least one fluid-removal element for removing at least some of the fluid from the surface , wherein the nozzles are designed and oriented such that the fluid jets come into contact with the surface , in a direction counter to the movement direction , at an angle of incidence of less than 90°, wherein the apparatus further comprises a mechanical precision wiper , over which the conveyor belt is guidable, wherein the precision wiper is formed between the nozzle bar and the fluid-removal element , characterized in that the fluid-removal element comprises an adhesion roller , which has an elastomeric coating on its circumference, and wherein the apparatus comprises a high-pressure fluid-supply for supplying a fluid to the nozzle bar at a pressure of at least 30 bar.
A method of wireless communication for a base station , the method comprising: communicating with a first user equipment, UE, on a plurality of channels; receiving , from the first UE, a set of channel quality indicators, CQIs, associated with a set of channels that is a subset of the plurality of channels, the set of channels being based on channel qualities associated with the plurality of channels; detecting a collision between a first set of control channel elements, CCEs, associated with the first UE and a second set of CCEs associated with a second UE, determining , based on the received set of CQIs, the first set of CCEs for a UE-specific search space specific to the first UE for receiving a physical downlink control channel, PDCCH, in at least one symbol allocated for control information; and sending , based on the determined first set of CCEs, downlink control information on the PDCCH in the UE-specific search space specific to the first UE and sending downlink control information associated with the second UE on the PDCCH in a common search space based on the detected collision. communicating with a first user equipment, UE, on a plurality of channels; receiving , from the first UE, a set of channel quality indicators, CQIs, associated with a set of channels that is a subset of the plurality of channels, the set of channels being based on channel qualities associated with the plurality of channels; detecting a collision between a first set of control channel elements, CCEs, associated with the first UE and a second set of CCEs associated with a second UE, determining , based on the received set of CQIs, the first set of CCEs for a UE-specific search space specific to the first UE for receiving a physical downlink control channel, PDCCH, in at least one symbol allocated for control information; and sending , based on the determined first set of CCEs, downlink control information on the PDCCH in the UE-specific search space specific to the first UE and sending downlink control information associated with the second UE on the PDCCH in a common search space based on the detected collision.
A sealing material for a solid polymer fuel cell separator comprising a silicone rubber composition and layered double hydroxide compounded therewith, - the silicone rubber composition being a liquid addition-curable silicone rubber composition comprising: (A) 100 parts by weight of organopolysiloxane having at least two silicon atom-bonded alkenyl groups per molecule; (B) 0.5 to 20 parts by weight of organohydrogenpolysiloxane having at least three silicon atom-bonded hydrogen atoms per molecule; (C) 5 to 30 parts by weight of fumed silica having a specific surface area as measured by the BET method of 50 to 400 m 2 /g and (D) a catalytic amount of addition reaction catalyst; - the layered double hydroxide being magnesium and aluminum-containing hydrotalcite, and - the content of the layered double hydroxide being from 0.5 to 10 wt%, relative to the silicone rubber composition excluding the layered double hydroxide as 100 wt%. - the silicone rubber composition being a liquid addition-curable silicone rubber composition comprising: (A) 100 parts by weight of organopolysiloxane having at least two silicon atom-bonded alkenyl groups per molecule; (B) 0.5 to 20 parts by weight of organohydrogenpolysiloxane having at least three silicon atom-bonded hydrogen atoms per molecule; (C) 5 to 30 parts by weight of fumed silica having a specific surface area as measured by the BET method of 50 to 400 m 2 /g and (D) a catalytic amount of addition reaction catalyst; (A) 100 parts by weight of organopolysiloxane having at least two silicon atom-bonded alkenyl groups per molecule; (B) 0.5 to 20 parts by weight of organohydrogenpolysiloxane having at least three silicon atom-bonded hydrogen atoms per molecule; (C) 5 to 30 parts by weight of fumed silica having a specific surface area as measured by the BET method of 50 to 400 m 2 /g and (D) a catalytic amount of addition reaction catalyst; - the layered double hydroxide being magnesium and aluminum-containing hydrotalcite, and - the content of the layered double hydroxide being from 0.5 to 10 wt%, relative to the silicone rubber composition excluding the layered double hydroxide as 100 wt%.
A steel plate having a chemical composition comprising, by mass%: C: 0.08% to 0.15%; Mn: 0.80% to 1.60%; Ni: 3.00% to 4.50%; Cr: 0.50% to 1.00%; Mo: 0.50% to 1.00%; Al: 0.020% to 0.085%; N: 0.0020% to 0.0070%; B: 0.0005% to 0.0020%; P: 0.000% to 0.010%; S: 0.000% to 0.003%; Si: 0.00% to 0.30%; Cu: 0.00% to 0.50%; V: 0.000% to 0.050%; Nb: 0.000% to 0.050%; Ti: 0.000% to 0.020%; Ca: 0.0000% to 0.0030%; Mg: 0.0000% to 0.0030%; REM: 0.0000% to 0.0030%; and a remainder including Fe and impurities, wherein a plate thickness t mm is more than 200 mm and not more than 300 mm, in the chemical composition, Ts defined by Equation 1 is 380 to 430, Ceq defined by Equation 2 is 0.80 to 1.05, Ac1 defined by Equation 3 is 580 to 647, and x defined by Equation 4 is 46 to 90, a total amount of martensite and bainite is 99% to 100% by area%, a tensile strength is 780 MPa to 930 MPa, and an absorbed energy of a thickness middle portion obtained by a charpy impact test vE -60°C at -60°C is 69 J or more, wherein the tensile strength is measured by a tensile test specified in JIS Z 2241 and the absorbed energy is measured by the charpy impact test specified in JIS Z 2242. Ts = 750 − 4240 × t / 2 − 1.4 × 80 × C + 10 × Mn + 7 × Ni + 13 × Cr + 13 × Mo − 40 × Si Ceq = C + Mn / 6 + Cu + Ni / 15 + Cr + Mo + V / 5 Ac 1 = 720 − 25 × C + 22 × Si − 40 × Mn − 30 × Ni + 20 × Cr + 25 × Mo x = C 1 / 2 × 1 + 0.64 × Si × 1 + 4.10 × Mn × 1 + 0.27 × Cu × 1 + 0.52 × Ni × 1 + 2.33 × Cr × 1 + 3.14 × Mo C: 0.08% to 0.15%; Mn: 0.80% to 1.60%; Ni: 3.00% to 4.50%; Cr: 0.50% to 1.00%; Mo: 0.50% to 1.00%; Al: 0.020% to 0.085%; N: 0.0020% to 0.0070%; B: 0.0005% to 0.0020%; P: 0.000% to 0.010%; S: 0.000% to 0.003%; Si: 0.00% to 0.30%; Cu: 0.00% to 0.50%; V: 0.000% to 0.050%; Nb: 0.000% to 0.050%; Ti: 0.000% to 0.020%; Ca: 0.0000% to 0.0030%; Mg: 0.0000% to 0.0030%; REM: 0.0000% to 0.0030%; and a remainder including Fe and impurities, wherein a plate thickness t mm is more than 200 mm and not more than 300 mm, in the chemical composition, Ts defined by Equation 1 is 380 to 430, Ceq defined by Equation 2 is 0.80 to 1.05, Ac1 defined by Equation 3 is 580 to 647, and x defined by Equation 4 is 46 to 90, a total amount of martensite and bainite is 99% to 100% by area%, a tensile strength is 780 MPa to 930 MPa, and an absorbed energy of a thickness middle portion obtained by a charpy impact test vE -60°C at -60°C is 69 J or more, wherein the tensile strength is measured by a tensile test specified in JIS Z 2241 and the absorbed energy is measured by the charpy impact test specified in JIS Z 2242. Ts = 750 − 4240 × t / 2 − 1.4 × 80 × C + 10 × Mn + 7 × Ni + 13 × Cr + 13 × Mo − 40 × Si Ceq = C + Mn / 6 + Cu + Ni / 15 + Cr + Mo + V / 5 Ac 1 = 720 − 25 × C + 22 × Si − 40 × Mn − 30 × Ni + 20 × Cr + 25 × Mo x = C 1 / 2 × 1 + 0.64 × Si × 1 + 4.10 × Mn × 1 + 0.27 × Cu × 1 + 0.52 × Ni × 1 + 2.33 × Cr × 1 + 3.14 × Mo
A method of selectively making a hexafluoropropylene trimer, the method comprising: reacting hexafluoropropylene monomer with a catalyst, in the presence of a solvent, to form a crude fluorochemical reaction product comprising hexafluoropropylene trimer having Structural Formula and; isolating the crude fluorochemical reaction product from the catalyst and solvent; wherein the step of reacting hexafluoropropylene monomer with a catalyst comprises continuously feeding the hexafluoropropylene monomer to a reaction mixture at a feed rate of less than 30% by weight per hour, based on the total weight of hexafluoropropylene monomer fed to the reaction mixture; wherein the step of reacting hexafluoropropylene monomer with a catalyst is carried out at a reaction temperature of at least 60°C; wherein the catalyst essentially consists of cesium fluoride; wherein the hexafluoropropylene trimer having Structural Formula is present in an amount of at least 70% by weight, based on the total weight of the isolated crude fluorochemical reaction product; and wherein the hexafluoropropylene trimer having Structural Formula is present in an amount of at least at least 85 % by weight, based on the total weight of the hexafluoropropylene trimer present in the isolated crude fluorochemical reaction product. reacting hexafluoropropylene monomer with a catalyst, in the presence of a solvent, to form a crude fluorochemical reaction product comprising hexafluoropropylene trimer having Structural Formula and; isolating the crude fluorochemical reaction product from the catalyst and solvent; wherein the step of reacting hexafluoropropylene monomer with a catalyst comprises continuously feeding the hexafluoropropylene monomer to a reaction mixture at a feed rate of less than 30% by weight per hour, based on the total weight of hexafluoropropylene monomer fed to the reaction mixture; wherein the step of reacting hexafluoropropylene monomer with a catalyst is carried out at a reaction temperature of at least 60°C; wherein the catalyst essentially consists of cesium fluoride; wherein the hexafluoropropylene trimer having Structural Formula is present in an amount of at least 70% by weight, based on the total weight of the isolated crude fluorochemical reaction product; and wherein the hexafluoropropylene trimer having Structural Formula is present in an amount of at least at least 85 % by weight, based on the total weight of the hexafluoropropylene trimer present in the isolated crude fluorochemical reaction product.
Support substrate for a radiofrequency application, the support substrate comprising: - a base substrate made of monocrystalline silicon comprising P-type dopants and having a resistivity that is greater than or equal to 250 ohm.cm and strictly less than 500 ohm.cm, and an interstitial oxygen content between 13 ppma and 19 ppma according to the ASTM'79 standard, - an epitaxial layer made of monocrystalline silicon comprising P-type dopants, arranged on the base substrate and having a thickness between 2 microns and 30 microns, at least one upper portion of the epitaxial layer having a resistivity greater than or equal to 3000 ohm.cm, - a charge-trapping layer made of polycrystalline silicon, arranged on the epitaxial layer , having a resistivity greater than or equal to 1000 ohm.cm and a thickness between 1 micron and 10 microns. - a base substrate made of monocrystalline silicon comprising P-type dopants and having a resistivity that is greater than or equal to 250 ohm.cm and strictly less than 500 ohm.cm, and an interstitial oxygen content between 13 ppma and 19 ppma according to the ASTM'79 standard, - an epitaxial layer made of monocrystalline silicon comprising P-type dopants, arranged on the base substrate and having a thickness between 2 microns and 30 microns, at least one upper portion of the epitaxial layer having a resistivity greater than or equal to 3000 ohm.cm, - a charge-trapping layer made of polycrystalline silicon, arranged on the epitaxial layer , having a resistivity greater than or equal to 1000 ohm.cm and a thickness between 1 micron and 10 microns.
Image sensor for a position sensor apparatus for ascertaining a position of at least one mirror (M1-M6) of a lithography apparatus , comprising: a plurality N1 of integrated optical waveguides , a plurality N2 of incoupling areas , with N2 ≥ N1, each of the N2 incoupling areas being assigned to one of the N1 integrated optical waveguides and configured to couple incident light into the assigned integrated optical waveguide in such a way that a light signal is generated in the assigned integrated optical waveguide , a multiplexer apparatus , coupled to the N1 integrated optical waveguides , for multiplexing the light signals generated in the N1 integrated optical waveguides to a number N3 of secondary optical waveguides , with N1 ≥ N3, and an image reconstruction apparatus , coupled to the N3 secondary optical waveguides , for reconstructing an image on the basis of the light signals of the N3 secondary optical waveguides , wherein the plurality N2 of incoupling areas , the plurality N1 of integrated optical waveguides and the multiplexer apparatus are integrated on a substrate , in particular on an integral substrate . a plurality N1 of integrated optical waveguides , a plurality N2 of incoupling areas , with N2 ≥ N1, each of the N2 incoupling areas being assigned to one of the N1 integrated optical waveguides and configured to couple incident light into the assigned integrated optical waveguide in such a way that a light signal is generated in the assigned integrated optical waveguide , a multiplexer apparatus , coupled to the N1 integrated optical waveguides , for multiplexing the light signals generated in the N1 integrated optical waveguides to a number N3 of secondary optical waveguides , with N1 ≥ N3, and an image reconstruction apparatus , coupled to the N3 secondary optical waveguides , for reconstructing an image on the basis of the light signals of the N3 secondary optical waveguides , wherein
An ionic silicone hydrogel polymer formed from polymerization of a reactive mixture comprising a mixture of reactive components comprising 0.1 to 0.9 weight % of at least one anionic component including a reactive carboxylic acid and at least one silicone component selected from the group consisting of reactive polydialkylsiloxane selected from compounds of Formula I: where b = 2 to 20; terminal R 1 are independently selected from monovalent groups comprising at least one ethylenically unsaturated moiety, monovalent alkyl group having 2 to 16 carbon atoms, provided that one terminal R 1 comprises an ethylenically unsaturated moiety, and the remaining R 1 are selected from monovalent alkyl groups having 1 to 16 carbon atoms, wherein all silicone components are free of trimethylsilyl groups. where b = 2 to 20; terminal R 1 are independently selected from monovalent groups comprising at least one ethylenically unsaturated moiety, monovalent alkyl group having 2 to 16 carbon atoms, provided that one terminal R 1 comprises an ethylenically unsaturated moiety, and the remaining R 1 are selected from monovalent alkyl groups having 1 to 16 carbon atoms, wherein all silicone components are free of trimethylsilyl groups.
Formed pipe end-section of a pipeline for connecting the pipeline at an end to an adapter , comprising an annular bead with a first abutment face facing away from the end of the pipeline and a second abutment face facing towards the end of the pipeline, a chamfer reducing a diameter of the pipe end- section from the annular bead towards the end of the pipeline, and a radial recess accommodating a sealing ring , wherein the chamfer and the sealing ring are respectively provided to engage an inner cone of the adapter , wherein the chamfer extends between the annular bead and the radial recess, wherein the annular bead , the chamfer and the radial recess are formed by press-forming the end-section of the pipeline , particularly without machining, characterized in that the recess extends to the end of the pipeline and that the sealing ring extends, at least when the sealing ring engages the inner cone of the adapter when the pipe end-section is connected to the adapter , to the end of the pipeline .