A method comprising: obtaining, by one or more processors, an image of a sintering area; generating, by the one or more processors, a grid of the sintering area including a plurality of sub-areas for the sintering area, each sub-area defined by a length and a width, a respective position in the sintering area; and for each particular sub-area of the plurality of sub-areas: determining a respective fractional sintering energy for the particular sub-area; indicating how to position a photosintering device relative to the particular sub-area; obtaining current positional information for the photosintering device; determining that the current positional information indicates that the photosintering device is positioned relative to the particular sub-area in accordance with the indication of how to position the photosintering device; determining an exposure sintering energy for the particular sub-area based in part on a difference between the fractional sintering energy for the particular sub-area and a cumulative amount of sintering energy previously exposed to the particular sub-area; and triggering exposure of the exposure sintering energy to the particular sub-area in accordance with the indication of how to position the photosintering device. obtaining, by one or more processors, an image of a sintering area; generating, by the one or more processors, a grid of the sintering area including a plurality of sub-areas for the sintering area, each sub-area defined by a length and a width, a respective position in the sintering area; and for each particular sub-area of the plurality of sub-areas: determining a respective fractional sintering energy for the particular sub-area; indicating how to position a photosintering device relative to the particular sub-area; obtaining current positional information for the photosintering device; determining that the current positional information indicates that the photosintering device is positioned relative to the particular sub-area in accordance with the indication of how to position the photosintering device; determining an exposure sintering energy for the particular sub-area based in part on a difference between the fractional sintering energy for the particular sub-area and a cumulative amount of sintering energy previously exposed to the particular sub-area; and triggering exposure of the exposure sintering energy to the particular sub-area in accordance with the indication of how to position the photosintering device. determining a respective fractional sintering energy for the particular sub-area; indicating how to position a photosintering device relative to the particular sub-area; obtaining current positional information for the photosintering device; determining that the current positional information indicates that the photosintering device is positioned relative to the particular sub-area in accordance with the indication of how to position the photosintering device; determining an exposure sintering energy for the particular sub-area based in part on a difference between the fractional sintering energy for the particular sub-area and a cumulative amount of sintering energy previously exposed to the particular sub-area; and triggering exposure of the exposure sintering energy to the particular sub-area in accordance with the indication of how to position the photosintering device. <EOS>