A curved pattern marker comprising: a first lens unit including at least one lens having an incident surface and configured such that incident light being incident on the incident surface passes through an emitting surface of the first lens unit within a target range (Tr), the first lens unit being formed such that a light parallel to an optical axis among the incident light is perpendicularly incident on the incident surface; a pattern unit having a curved pattern that is formed therein, and includes an opaque portion and a transparent portion; and a second lens unit disposed between the first lens unit and the pattern unit , and configured to adjust the light passing through the first lens unit such that the light passing through the first lens unit is focused on the curved pattern, characterized in that : the first lens unit includes a first lens , a second lens , and a third lens sequentially coupled to each other in a direction toward the second lens unit , the second lens unit includes a fourth lens coupled to a curved lens in a direction toward the first lens unit , the first lens unit has a structure in which an incident surface of the second lens is coupled to the emitting surface of the first lens and an incident surface of the third lens is coupled to an emitting surface of the second lens , and the second lens unit has a structure in which an incident surface of the curved lens is coupled to an emitting surface of the fourth lens , and the fourth lens is disposed apart from the third lens . a first lens unit including at least one lens having an incident surface and configured such that incident light being incident on the incident surface passes through an emitting surface of the first lens unit within a target range (Tr), the first lens unit being formed such that a light parallel to an optical axis among the incident light is perpendicularly incident on the incident surface; a pattern unit having a curved pattern that is formed therein, and includes an opaque portion and a transparent portion; and a second lens unit disposed between the first lens unit and the pattern unit , and configured to adjust the light passing through the first lens unit such that the light passing through the first lens unit is focused on the curved pattern, characterized in that : the first lens unit includes a first lens , a second lens , and a third lens sequentially coupled to each other in a direction toward the second lens unit , the second lens unit includes a fourth lens coupled to a curved lens in a direction toward the first lens unit , the first lens unit has a structure in which an incident surface of the second lens is coupled to the emitting surface of the first lens and an incident surface of the third lens is coupled to an emitting surface of the second lens , and the second lens unit has a structure in which an incident surface of the curved lens is coupled to an emitting surface of the fourth lens , and the fourth lens is disposed apart from the third lens . the first lens unit includes a first lens , a second lens , and a third lens sequentially coupled to each other in a direction toward the second lens unit , the second lens unit includes a fourth lens coupled to a curved lens in a direction toward the first lens unit , the first lens unit has a structure in which an incident surface of the second lens is coupled to the emitting surface of the first lens and an incident surface of the third lens is coupled to an emitting surface of the second lens , and the second lens unit has a structure in which an incident surface of the curved lens is coupled to an emitting surface of the fourth lens , and the fourth lens is disposed apart from the third lens . <EOS>