A manufacture method of an OLED substrate , the manufacture method comprises steps of: step 1, providing a substrate , and forming a plurality of anodes which are separately located on the substrate ; depositing an inorganic film layer on the substrate and the plurality of anodes ; step 2, employing a half tone mask to implement a patterning treatment to the inorganic film layer to obtain a pixel definition layer , a plurality of spacers located on the pixel definition layer , and a plurality of openings being located on the pixel definition layer and respectively corresponding to the plurality of anodes , and each opening exposes at least a portion of the corresponding anode to manufacture a first substrate ; characterized in that the manufacture method further comprises steps of: step 3, coating a photoresist layer on the first substrate , and the photoresist layer covering the pixel definition layer , the plurality of spacers and anodes ; cutting the first substrate coated with the photoresist layer to obtain a plurality of second substrates ; step 4, stripping the photoresist layer on the second substrate to obtain a third substrate ;and step 5, sequentially forming a Hole Injection Layer , a Hole Transporting Layer , an organic light emitting layer , an Electron Transport Layer , an Electron Injection Layer and a cathode from bottom to top in the plurality of openings on the third substrate to manufacture the OLED substrate . step 1, providing a substrate , and forming a plurality of anodes which are separately located on the substrate ; depositing an inorganic film layer on the substrate and the plurality of anodes ; step 2, employing a half tone mask to implement a patterning treatment to the inorganic film layer to obtain a pixel definition layer , a plurality of spacers located on the pixel definition layer , and a plurality of openings being located on the pixel definition layer and respectively corresponding to the plurality of anodes , and each opening exposes at least a portion of the corresponding anode to manufacture a first substrate ; characterized in that the manufacture method further comprises steps of: step 3, coating a photoresist layer on the first substrate , and the photoresist layer covering the pixel definition layer , the plurality of spacers and anodes ; cutting the first substrate coated with the photoresist layer to obtain a plurality of second substrates ; step 4, stripping the photoresist layer on the second substrate to obtain a third substrate ;and step 5, sequentially forming a Hole Injection Layer , a Hole Transporting Layer , an organic light emitting layer , an Electron Transport Layer , an Electron Injection Layer and a cathode from bottom to top in the plurality of openings on the third substrate to manufacture the OLED substrate . step 3, coating a photoresist layer on the first substrate , and the photoresist layer covering the pixel definition layer , the plurality of spacers and anodes ; cutting the first substrate coated with the photoresist layer to obtain a plurality of second substrates ; step 4, stripping the photoresist layer on the second substrate to obtain a third substrate ;and step 5, sequentially forming a Hole Injection Layer , a Hole Transporting Layer , an organic light emitting layer , an Electron Transport Layer , an Electron Injection Layer and a cathode from bottom to top in the plurality of openings on the third substrate to manufacture the OLED substrate . <EOS>