A method for producing a probe tip suitable for scanning probe microscopy (SPM), comprising the steps of : - Producing a probe tip body comprising at least an outer layer of a probe material, the tip body comprising an apex area, - During the production process of the probe tip body and/or after said production process, forming a mask layer on said outer layer of probe material, - subjecting the probe tip body to a plasma etch procedure, wherein the mask layer acts as an etch mask for the etching of the probe material, and wherein the etch procedure and the etch mask are configured to produce one or more tip portions formed of the probe material, the one or more tip portions being considerably smaller and having a higher aspect ratio than the apex area of the tip body prior to the etch procedure, and wherein : - the mask layer comprises a layer of irregular thickness formed prior to the etch procedure, wherein said layer of irregular thickness acts as an etch mask for the etching of the probe material, - the tip body is produced by producing a mold in a substrate and by depositing the probe material in the mold, wherein : ∘ seed particles are deposited in the mold prior to depositing the probe material therein, wherein the layer of irregular thickness comprises the seed particles , and wherein the seed particles are etched at a slower rate than the probe material, and/or ∘ the layer of irregular thickness comprises compounds formed spontaneously, e.g. by oxidation, on the surface of the tip body after the production process of the tip body and prior to the etch procedure. - Producing a probe tip body comprising at least an outer layer of a probe material, the tip body comprising an apex area, - During the production process of the probe tip body and/or after said production process, forming a mask layer on said outer layer of probe material, - subjecting the probe tip body to a plasma etch procedure, wherein the mask layer acts as an etch mask for the etching of the probe material, and wherein the etch procedure and the etch mask are configured to produce one or more tip portions formed of the probe material, the one or more tip portions being considerably smaller and having a higher aspect ratio than the apex area of the tip body prior to the etch procedure, - the mask layer comprises a layer of irregular thickness formed prior to the etch procedure, wherein said layer of irregular thickness acts as an etch mask for the etching of the probe material, - the tip body is produced by producing a mold in a substrate and by depositing the probe material in the mold, wherein : ∘ seed particles are deposited in the mold prior to depositing the probe material therein, wherein the layer of irregular thickness comprises the seed particles , and wherein the seed particles are etched at a slower rate than the probe material, and/or ∘ the layer of irregular thickness comprises compounds formed spontaneously, e.g. by oxidation, on the surface of the tip body after the production process of the tip body and prior to the etch procedure. ∘ seed particles are deposited in the mold prior to depositing the probe material therein, wherein the layer of irregular thickness comprises the seed particles , and wherein the seed particles are etched at a slower rate than the probe material, and/or ∘ the layer of irregular thickness comprises compounds formed spontaneously, e.g. by oxidation, on the surface of the tip body after the production process of the tip body and prior to the etch procedure. <EOS>