mhurhangee/patent-ind-claim-en huggingface dataset:
A photonic integrated circuit PIC substrate , comprising: a waveguide configured to receive an optical signal produced by a semiconductor device, wherein the waveguide includes an angled front edge, said front edge being inclined at a non-zero angle to the plane perpendicular to the optical axis of the waveguide; a recessed landing area configured for placement of at least a portion of the semiconductor device, wherein the recessed landing area comprises: a first tapered substrate mating surface on one side of the waveguide having a shape corresponding to a shape of a first tapered mating surface of the semiconductor device configured to align the semiconductor device with the waveguide; and a second tapered substrate mating surface on another side of the waveguide having a shape corresponding to a shape of a second tapered mating surface of the semiconductor device configured to align the semiconductor device with the waveguide; and a contact pad formed between the first tapered substrate mating surface and the second tapered substrate mating surface within the recessed landing area and being configured to form an electrical connection with the semiconductor device. a waveguide configured to receive an optical signal produced by a semiconductor device, wherein the waveguide includes an angled front edge, said front edge being inclined at a non-zero angle to the plane perpendicular to the optical axis of the waveguide; a recessed landing area configured for placement of at least a portion of the semiconductor device, wherein the recessed landing area comprises: a first tapered substrate mating surface on one side of the waveguide having a shape corresponding to a shape of a first tapered mating surface of the semiconductor device configured to align the semiconductor device with the waveguide; and a second tapered substrate mating surface on another side of the waveguide having a shape corresponding to a shape of a second tapered mating surface of the semiconductor device configured to align the semiconductor device with the waveguide; and a contact pad formed between the first tapered substrate mating surface and the second tapered substrate mating surface within the recessed landing area and being configured to form an electrical connection with the semiconductor device. a first tapered substrate mating surface on one side of the waveguide having a shape corresponding to a shape of a first tapered mating surface of the semiconductor device configured to align the semiconductor device with the waveguide; and a second tapered substrate mating surface on another side of the waveguide having a shape corresponding to a shape of a second tapered mating surface of the semiconductor device configured to align the semiconductor device with the waveguide; and a contact pad formed between the first tapered substrate mating surface and the second tapered substrate mating surface within the recessed landing area and being configured to form an electrical connection with the semiconductor device.
A rotating electrical machine comprising: - a rotor core in which a slot axially passing therethrough is provided in plural numbers in a circumferential direction; - a rotor winding which is placed in the slot provided in the rotor core , and whose coil end portion is extended more on the axially outer side than the core end face of the rotor core ; - a plurality of U-shaped channels - wherein each U-shaped channel is arranged on a slot bottom portion of the slot of the rotor core , is in contact with a bottom portion of the rotor winding , and is axially extended to be projecting more on the axially outer side than the core end face of the rotor core ; and - a slot cell which is placed in the slot of the rotor core , and insulates the rotor winding and the U-shaped channel in the slot of the rotor core from the rotor core , characterized by further comprising - an interposed piece arranged between the rotor windings at a portion axially more projecting than the core end face of the rotor core , - wherein the projecting end face of the U-shaped channel is arranged more on the axially inner side than the projecting end face of the interposed piece , and wherein the interposed piece is arranged to be extended between two circumferentially adjacent U-shaped channels . - a rotor core in which a slot axially passing therethrough is provided in plural numbers in a circumferential direction; - a rotor winding which is placed in the slot provided in the rotor core , and whose coil end portion is extended more on the axially outer side than the core end face of the rotor core ; - a plurality of U-shaped channels - wherein each U-shaped channel is arranged on a slot bottom portion of the slot of the rotor core , is in contact with a bottom portion of the rotor winding , and is axially extended to be projecting more on the axially outer side than the core end face of the rotor core ; and - a slot cell which is placed in the slot of the rotor core , and insulates the rotor winding and the U-shaped channel in the slot of the rotor core from the rotor core , characterized by further comprising - an interposed piece arranged between the rotor windings at a portion axially more projecting than the core end face of the rotor core , - wherein the projecting end face of the U-shaped channel is arranged more on the axially inner side than the projecting end face of the interposed piece , and wherein the interposed piece is arranged to be extended between two circumferentially adjacent U-shaped channels .
A travel control device (M9, 17), provided on a vehicle side, the travel control device comprising: a target vehicle-speed calculation unit (R2) that includes a target vehicle-speed pattern adjustment processing unit (R14) generating a target vehicle speed-pattern based on a route passing speed pattern which is a passing vehicle-speed pattern within a certain distance received from a server and which minimizes the consumption of energy for all of a plurality of vehicles in consideration of prospective traffic congestion information, wherein the target vehicle-speed pattern calculation unit further comprises an evaluation value calculation unit calculating an evaluation value based on a horizon length and the target vehicle speed-pattern, the horizon length representing the time taken until a vehicle arrives at an ultimate point in information on prospective traffic congestion, and wherein the evaluation value calculation unit maximizes one or more of an energy consumption value, a riding comfort evaluation value, and a safety evaluation value, so as to calculate an optimal target vehicle-speed pattern; and a target control volume computation unit (R1) that is configured to 1) calculate based on the evaluation value a first control volume for an engine, and a second control volume for a brake, and to 2) output the first control volume to an engine control unit (M11), and the second control volume to a brake control unit (M10). a target vehicle-speed calculation unit (R2) that includes a target vehicle-speed pattern adjustment processing unit (R14) generating a target vehicle speed-pattern based on a route passing speed pattern which is a passing vehicle-speed pattern within a certain distance received from a server and which minimizes the consumption of energy for all of a plurality of vehicles in consideration of prospective traffic congestion information, wherein the target vehicle-speed pattern calculation unit further comprises an evaluation value calculation unit calculating an evaluation value based on a horizon length and the target vehicle speed-pattern, the horizon length representing the time taken until a vehicle arrives at an ultimate point in information on prospective traffic congestion, and wherein the evaluation value calculation unit maximizes one or more of an energy consumption value, a riding comfort evaluation value, and a safety evaluation value, so as to calculate an optimal target vehicle-speed pattern; and a target control volume computation unit (R1) that is configured to 1) calculate based on the evaluation value a first control volume for an engine, and a second control volume for a brake, and to 2) output the first control volume to an engine control unit (M11), and the second control volume to a brake control unit (M10).
Length-adjustable steering shaft , comprising a hollow shaft made of metallic material with an opening , in which an inner shaft made of metallic material is accommodated fixedly in terms of torque and in an axially movable manner, and which comprises a pull-out retention means with stop elements which comprise at least one outer stop which protrudes into the opening of the hollow shaft , and an inner stop which protrudes outwards from the inner shaft , wherein the outer stop is formed from the metallic material of the hollow shaft and the inner stop is formed from the metallic material of the inner shaft , wherein the stop elements comprise stop surfaces which are directed towards each other in the axial direction, wherein a layer of non-metallic material is applied to at least one of the stop elements at least partially in the region of the stop surface , wherein the hollow shaft and the inner shaft comprise form-fitting elements which intermesh in a form-fitting manner with respect to a rotation about the longitudinal axis (L), which are in the form of intermeshing outer and inner toothings with grooves extending in an axially parallel manner in the longitudinal direction and teeth engaging in said grooves, and which are at least partially covered with the layer , characterized in that the layer also encloses at least one stop element on its axial stop surface , which stop element is arranged in a circumferential region of the inner shaft between adjacent teeth and is plastically caulked into the inner shaft in the form of a pinch through a notch caulked into the outer surface obliquely with respect to the longitudinal axis (L), at the edge of which notch the metallic material of the inner shaft is plastically displaced and accumulated radially outwards.
A purified extract, obtainable from mulberry leaf, characterised in that it is a. water soluble; b. preferentially and selectively inhibits rice α-D-glucosidase to that of yeast or bacillus; c. comprises greater than 5% (w/w) N-acids of imino sugars comprising C1-C9 alkyloic acids of one or more of DAB, DNJ, fagomine or calystegine B2 by weight of the extract; and d. comprise less than 5% (w/w) DNJ of the imino sugar content. a. water soluble; b. preferentially and selectively inhibits rice α-D-glucosidase to that of yeast or bacillus; c. comprises greater than 5% (w/w) N-acids of imino sugars comprising C1-C9 alkyloic acids of one or more of DAB, DNJ, fagomine or calystegine B2 by weight of the extract; and d. comprise less than 5% (w/w) DNJ of the imino sugar content.
Device for joining a lens (L) with a housing (G) of an illumination device of a motor vehicle with an accommodating device for accommodating and fastening the housing (G) and a pre-centring device for positioning the lens (L) on the housing (G), where the pre-centring device features a frame element and several positioning elements mounted to the frame element for accommodating the lens (L), where the frame element of the pre-centring device can be moved, during a pre-centring process, together with the lens (L) being accommodated, relative to the accommodating device in such a way that the lens (L) can be aligned to the housing (G) accommodated in the accommodating device .
An underwater acoustic projector system (20; 100; 200; 300; 400; 410) comprising: four or more acoustic projectors , each being of the same size, each having a diameter and configured to be driven by the same voltage; and a framing that is configured to hold the acoustic projectors in a linear array and in close proximity such that the acoustic projectors interact with one another when they produce acoustic pressures, wherein each acoustic projector in the linear array is spaced apart from an adjacent acoustic projector by a respective distance between facing surfaces of the adjacent projectors, wherein the respective distance is small compared to the diameter and the diameter is less than a wavelength of an acoustic resonant frequency of the underwater acoustic projector system, the system being characterized in that the respective distance between two acoustic projectors proximate the center of the linear array is greater than the respective distance between two acoustic projectors proximate the end of the linear array, for minimizing cavitation depth by equalizing the dynamic pressure distribution between the acoustic projectors. four or more acoustic projectors , each being of the same size, each having a diameter and configured to be driven by the same voltage; and a framing that is configured to hold the acoustic projectors in a linear array and in close proximity such that the acoustic projectors interact with one another when they produce acoustic pressures, wherein each acoustic projector in the linear array is spaced apart from an adjacent acoustic projector by a respective distance between facing surfaces of the adjacent projectors, wherein the respective distance is small compared to the diameter and the diameter is less than a wavelength of an acoustic resonant frequency of the underwater acoustic projector system, the system being characterized in that the respective distance between two acoustic projectors proximate the center of the linear array is greater than the respective distance between two acoustic projectors proximate the end of the linear array, for minimizing cavitation depth by equalizing the dynamic pressure distribution between the acoustic projectors.
A magnetic field sensor comprising a plurality of magnetoresistance elements , each having a respective length and width selected to provide a respective, different response to an applied magnetic field, wherein: the length of each of the plurality of magnetoresistance elements corresponds to a dimension across a major axis of a major surface of each of the plurality of magnetoresistance elements; the width of each of the plurality of magnetoresistance elements corresponds to a dimension across a minor axis of the major surface of each of the plurality of magnetoresistance elements; the magnetic field sensor comprises first , second , third , and fourth pluralities of parallel coupled magnetoresistance elements, wherein the first, second, third and fourth pluralities of parallel coupled magnetoresistance elements are coupled in a bridge configuration ; and wherein, in each of the first, second, third and fourth pluralities, a width of a first one of the parallel coupled magnetoresistance elements (242; 1242; 2242; 3242) is different to the width of a second one of the parallel coupled magnetoresistance elements (242'; 1242'; 2242'; 3242'). the length of each of the plurality of magnetoresistance elements corresponds to a dimension across a major axis of a major surface of each of the plurality of magnetoresistance elements; the width of each of the plurality of magnetoresistance elements corresponds to a dimension across a minor axis of the major surface of each of the plurality of magnetoresistance elements; the magnetic field sensor comprises first , second , third , and fourth pluralities of parallel coupled magnetoresistance elements, wherein the first, second, third and fourth pluralities of parallel coupled magnetoresistance elements are coupled in a bridge configuration ; and wherein, in each of the first, second, third and fourth pluralities, a width of a first one of the parallel coupled magnetoresistance elements (242; 1242; 2242; 3242) is different to the width of a second one of the parallel coupled magnetoresistance elements (242'; 1242'; 2242'; 3242').
A laser processing machine comprising: a laser oscillator which emits laser light (L); a scanning unit which is configured to scan a flat processing target surface of a work (B) by deflecting the laser light (L) emitted from the laser oscillator ; and a focusing unit which is disposed between the laser oscillator and the scanning unit and which focuses the laser light (L) emitted from the laser oscillator , characterized in that : the focusing unit includes a setting unit configured to set a focusing angle (θa) of the focusing unit so as to focus the laser light (L) at a second position (P) on the same plane as said flat processing target surface but outside said processing target surface and that is more distant from a first position on said flat processing target surface where the laser light (L) is incident vertically than a third position on said flat processing target surface that is farthest from the first position on the processing target surface of the work (B). a laser oscillator which emits laser light (L); a scanning unit which is configured to scan a flat processing target surface of a work (B) by deflecting the laser light (L) emitted from the laser oscillator ; and a focusing unit which is disposed between the laser oscillator and the scanning unit and which focuses the laser light (L) emitted from the laser oscillator , characterized in that : the focusing unit includes a setting unit configured to set a focusing angle (θa) of the focusing unit so as to focus the laser light (L) at a second position (P) on the same plane as said flat processing target surface but outside said processing target surface and that is more distant from a first position on said flat processing target surface where the laser light (L) is incident vertically than a third position on said flat processing target surface that is farthest from the first position on the processing target surface of the work (B).
A channel quality indicator, CQI, measurement method, comprising: receiving (S103), by user equipment, UE, resource indication information from a base station, wherein the resource indication information is used to indicate a downlink CQI measurement resource, wherein the downlink CQI measurement resource is a resource in a system resource other than an uplink resource for an other UE, both the UE and the other UE are served by the base station, and the UE and the other UE belong to different UE groups; and the downlink CQI measurement resource comprises a frequency domain resource, and a bandwidth of the frequency domain resource is less than a system bandwidth; and performing (SI04), by the UE, downlink CQI measurement on the downlink CQI measurement resource. receiving (S103), by user equipment, UE, resource indication information from a base station, wherein the resource indication information is used to indicate a downlink CQI measurement resource, wherein the downlink CQI measurement resource is a resource in a system resource other than an uplink resource for an other UE, both the UE and the other UE are served by the base station, and the UE and the other UE belong to different UE groups; and the downlink CQI measurement resource comprises a frequency domain resource, and a bandwidth of the frequency domain resource is less than a system bandwidth; and the downlink CQI measurement resource is a resource in a system resource other than an uplink resource for an other UE, both the UE and the other UE are served by the base station, and the UE and the other UE belong to different UE groups; and the downlink CQI measurement resource comprises a frequency domain resource, and a bandwidth of the frequency domain resource is less than a system bandwidth; and performing (SI04), by the UE, downlink CQI measurement on the downlink CQI measurement resource.
A heat radiation device configured to radiate radiant energy in a specific wavelength range, the heat radiation device comprising: a laminated structure in which a plurality of layers is laminated, wherein the laminated structure comprises: a first support substrate ; a heat source ; and a meta-material structure layer arranged on a front surface side of the heat source , arranged on a front surface of the first support substrate and configured to radiate the radiant energy in the specific wavelength range by converting heat energy inputted from the heat source into the radiant energy in the specific wavelength range; characterised in that the laminated structure comprises: a second support substrate ; and a rear-surface metal layer arranged on a rear surface side of the heat source and arranged on a rear surface of the second support substrate ; wherein an average emissivity of the rear-surface metal layer is smaller than an average emissivity of the meta-material structure layer , the heat source is arranged between the first support substrate and the second support substrate , and a heat conductivity of the second support substrate is smaller than a heat conductivity of the first support substrate . a laminated structure in which a plurality of layers is laminated, wherein the laminated structure comprises: a first support substrate ; a heat source ; and a meta-material structure layer arranged on a front surface side of the heat source , arranged on a front surface of the first support substrate and configured to radiate the radiant energy in the specific wavelength range by converting heat energy inputted from the heat source into the radiant energy in the specific wavelength range; characterised in that the laminated structure comprises: a second support substrate ; and a rear-surface metal layer arranged on a rear surface side of the heat source and arranged on a rear surface of the second support substrate ; a first support substrate ; a heat source ; and a meta-material structure layer arranged on a front surface side of the heat source , arranged on a front surface of the first support substrate and configured to radiate the radiant energy in the specific wavelength range by converting heat energy inputted from the heat source into the radiant energy in the specific wavelength range; characterised in that the laminated structure comprises: a second support substrate ; and a rear-surface metal layer arranged on a rear surface side of the heat source and arranged on a rear surface of the second support substrate ; wherein an average emissivity of the rear-surface metal layer is smaller than an average emissivity of the meta-material structure layer , the heat source is arranged between the first support substrate and the second support substrate , and a heat conductivity of the second support substrate is smaller than a heat conductivity of the first support substrate .