Method for increasing the corrosion resistance of a chrome-plated substrate, the method comprising the following steps: a) Dipping at least one part of a chrome-plated surface of a chrome-plated substrate into an electrolyte, the electrolyte comprising trivalent chromium ions, wherein the concentration of the trivalent chromium ions in the electrolyte is in the range of 0.001 to 0.1 M, at least one conducting salt, wherein the concentration of the at least one conducting salt in the electrolyte is in the range of 2 to 50 g/L, and at least one reducing agent selected from the group consisting of sulfites, metabisulfites, thiosulfates, hydrosulfites, hydrazine, hydroxylamine, hydroxylammonium salts, ascorbic acid and its Na and K salts, formic acid and its Na and K salts, glyoxylic acid and its Na and K salts, glyoxal, glucose, sorbitol, and mixtures thereof, wherein the concentration of the at least one reducing agent in the electrolyte is in the range of 0.1 to 50 g/L, wherein the electrolyte does not contain hexavalent chromium ions, b) Forming a trivalent chromium oxide film on the at least one part of the chrome-plated surface by applying a pulse reverse current between the chrome-plated surface and a counter electrode electrically connected with the chrome-plated surface through the electrolyte, wherein the applied pulse reverse current has a current density j cat , j ano in the range of 0.01 to 10 A/dm 2 . a) Dipping at least one part of a chrome-plated surface of a chrome-plated substrate into an electrolyte, the electrolyte comprising trivalent chromium ions, wherein the concentration of the trivalent chromium ions in the electrolyte is in the range of 0.001 to 0.1 M, at least one conducting salt, wherein the concentration of the at least one conducting salt in the electrolyte is in the range of 2 to 50 g/L, and at least one reducing agent selected from the group consisting of sulfites, metabisulfites, thiosulfates, hydrosulfites, hydrazine, hydroxylamine, hydroxylammonium salts, ascorbic acid and its Na and K salts, formic acid and its Na and K salts, glyoxylic acid and its Na and K salts, glyoxal, glucose, sorbitol, and mixtures thereof, wherein the concentration of the at least one reducing agent in the electrolyte is in the range of 0.1 to 50 g/L, wherein the electrolyte does not contain hexavalent chromium ions, trivalent chromium ions, wherein the concentration of the trivalent chromium ions in the electrolyte is in the range of 0.001 to 0.1 M, at least one conducting salt, wherein the concentration of the at least one conducting salt in the electrolyte is in the range of 2 to 50 g/L, and at least one reducing agent selected from the group consisting of sulfites, metabisulfites, thiosulfates, hydrosulfites, hydrazine, hydroxylamine, hydroxylammonium salts, ascorbic acid and its Na and K salts, formic acid and its Na and K salts, glyoxylic acid and its Na and K salts, glyoxal, glucose, sorbitol, and mixtures thereof, wherein the concentration of the at least one reducing agent in the electrolyte is in the range of 0.1 to 50 g/L, wherein the electrolyte does not contain hexavalent chromium ions, b) Forming a trivalent chromium oxide film on the at least one part of the chrome-plated surface by applying a pulse reverse current between the chrome-plated surface and a counter electrode electrically connected with the chrome-plated surface through the electrolyte, wherein the applied pulse reverse current has a current density j cat , j ano in the range of 0.01 to 10 A/dm 2 . <EOS>