A method for additive manufacturing of a 3D-structured form, comprising these steps in the following sequence: i) providing a liquid photoresist, comprising at least one monomer and at least one photoinitiator system, ii) irradiating the liquid photoresist with a first light source at a first wavelength λ 1 and with a second light source at a second wavelength λ 2 , wherein λ 1 ≠ λ 2 and the direction of irradiation of the first light source is different from the direction of irradiation of the second light source, wherein hardening of the liquid photoresist to form the 3D-structured form takes place only at the position which is irradiated by the first light source and the second light source with a time interval of less than 1 ms, characterized in that the photoinitiator system comprises a compound which, after the absorption of a first photon with the first wavelength λ 1 of the first light source, passes into a dormant intermediate state which has no curing property, and as a result of the absorption of a second photon with the second wavelength λ 2 ≠ λ 1 of the second light source forms a radical that can cure the at least one monomer, the dormant intermediate state returning to the ground state if no second photon of the second wavelength λ 2 is absorbed by the photoinitiator system. i) providing a liquid photoresist, comprising at least one monomer and at least one photoinitiator system, ii) irradiating the liquid photoresist with a first light source at a first wavelength λ 1 and with a second light source at a second wavelength λ 2 , wherein λ 1 ≠ λ 2 and the direction of irradiation of the first light source is different from the direction of irradiation of the second light source, wherein hardening of the liquid photoresist to form the 3D-structured form takes place only at the position which is irradiated by the first light source and the second light source with a time interval of less than 1 ms, characterized in that the photoinitiator system comprises a compound which, after the absorption of a first photon with the first wavelength λ 1 of the first light source, passes into a dormant intermediate state which has no curing property, and as a result of the absorption of a second photon with the second wavelength λ 2 ≠ λ 1 of the second light source forms a radical that can cure the at least one monomer, the dormant intermediate state returning to the ground state if no second photon of the second wavelength λ 2 is absorbed by the photoinitiator system. wavelength λ 1 and with a second light source at a second wavelength λ 2 , wherein λ 1 ≠ λ 2 and the direction of irradiation of the first light source is different from the direction of irradiation of the second light source, wherein hardening of the liquid photoresist to form the 3D-structured form takes place only at the position which is irradiated by the first light source and the second light source with a time interval of less than 1 ms, characterized in that the photoinitiator system comprises a compound which, after the absorption of a first photon with the first wavelength λ 1 of the first light source, passes into a dormant intermediate state which has no curing property, and as a result of the absorption of a second photon with the second wavelength λ 2 ≠ λ 1 of the second light source forms a radical that can cure the at least one monomer, the dormant intermediate state returning to the ground state if no second photon of the second wavelength λ 2 is absorbed by the photoinitiator system. <EOS>