A method of forming a pattern, comprising: (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin when acted on by an acid decreases its solubility in a developer containing an organic solvent, wherein the group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group is represented by at least one selected from the group consisting of general formulae (II-1) to (II-4) and (II-7) to (II-9) below: in which R 3 , or each of R 3 s independently, represents a hydrogen atom or a monovalent organic group, provided that two R 3 s may be bonded to each other to thereby form a ring, R 4 , or each of R 4 s independently, represents a monovalent organic group, provided that at least two R 4 s may be bonded to each other to thereby form a ring and that R 3 and R 4 may be bonded to each other to thereby form a ring, and each of R 5 s independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkenyl group or an alkynyl group, provided that at least two R 5 s may be bonded to each other to thereby form a ring and that when one or two of three R 5 s are a hydrogen atom, at least one of the rest of R 5 s represents an aryl group, an alkenyl group or an alkynyl group, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent. (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin when acted on by an acid decreases its solubility in a developer containing an organic solvent, wherein the group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group is represented by at least one selected from the group consisting of general formulae (II-1) to (II-4) and (II-7) to (II-9) below: in which R 3 , or each of R 3 s independently, represents a hydrogen atom or a monovalent organic group, provided that two R 3 s may be bonded to each other to thereby form a ring, R 4 , or each of R 4 s independently, represents a monovalent organic group, provided that at least two R 4 s may be bonded to each other to thereby form a ring and that R 3 and R 4 may be bonded to each other to thereby form a ring, and each of R 5 s independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkenyl group or an alkynyl group, provided that at least two R 5 s may be bonded to each other to thereby form a ring and that when one or two of three R 5 s are a hydrogen atom, at least one of the rest of R 5 s represents an aryl group, an alkenyl group or an alkynyl group, R 3 , or each of R 3 s independently, represents a hydrogen atom or a monovalent organic group, provided that two R 3 s may be bonded to each other to thereby form a ring, R 4 , or each of R 4 s independently, represents a monovalent organic group, provided that at least two R 4 s may be bonded to each other to thereby form a ring and that R 3 and R 4 may be bonded to each other to thereby form a ring, and each of R 5 s independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkenyl group or an alkynyl group, provided that at least two R 5 s may be bonded to each other to thereby form a ring and that when one or two of three R 5 s are a hydrogen atom, at least one of the rest of R 5 s represents an aryl group, an alkenyl group or an alkynyl group, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent. <EOS>