mhurhangee/patent-ind-claim-en huggingface dataset:
A method performed by a computer device configured to generate a three dimensional, 3D, model, the method comprising: obtaining a plurality of two dimensional, 2D, images (I_0 - I_M), the plurality of 2D images (I_0 - I_M), each depicting a 3D object and a background of the 3D object from a different viewing direction (WD1, WD2), wherein the plurality of 2D images are obtained using a camera, and wherein the different viewing directions (WD1, WD2) are limited to upward facing viewing directions relative to ground and the depicted background comprises sky, or wherein the different viewing directions (WD1, WD2) are limited to downward facing viewing directions relative to the ground and the depicted background comprises sea, generating a total set of key points (KP_0, KP_1,... KP_M) for each of the plurality of 2D images (I_0 - I_M), discriminating each total set of key points (KP_0, KP_1,... KP_M) into a first subset of key points (KP_0', KP_1', ... KP_M') depicting the 3D object and a second subset of key points (KP_0", KP_1",... KP_M") depicting the background of the 3D object, generating a 3D model using only the subsets of key points (KP_0', KP_1',... KP_M') depicting the 3D object , wherein discriminating each set of key points (KP_0, KP_1,... KP_M) is performed by applying a trained model to the generated sets of key points (KP_0, KP_1,... KP_M). obtaining a plurality of two dimensional, 2D, images (I_0 - I_M), the plurality of 2D images (I_0 - I_M), each depicting a 3D object and a background of the 3D object from a different viewing direction (WD1, WD2), wherein the plurality of 2D images are obtained using a camera, and wherein the different viewing directions (WD1, WD2) are limited to upward facing viewing directions relative to ground and the depicted background comprises sky, or wherein the different viewing directions (WD1, WD2) are limited to downward facing viewing directions relative to the ground and the depicted background comprises sea, wherein the different viewing directions (WD1, WD2) are limited to upward facing viewing directions relative to ground and the depicted background comprises sky, or wherein the different viewing directions (WD1, WD2) are limited to downward facing viewing directions relative to the ground and the depicted background comprises sea, generating a total set of key points (KP_0, KP_1,... KP_M) for each of the plurality of 2D images (I_0 - I_M), discriminating each total set of key points (KP_0, KP_1,... KP_M) into a first subset of key points (KP_0', KP_1', ... KP_M') depicting the 3D object and a second subset of key points (KP_0", KP_1",... KP_M") depicting the background of the 3D object, generating a 3D model using only the subsets of key points (KP_0', KP_1',... KP_M') depicting the 3D object , wherein discriminating each set of key points (KP_0, KP_1,... KP_M) is performed by applying a trained model to the generated sets of key points (KP_0, KP_1,... KP_M).
A system for producing gaseous hydrogen, the system comprising an enclosure formed by a side wall , a front end wall , and a rear end wall , said enclosure containing one or more unit charges of at least one material suitable for generating gaseous hydrogen when heated, the system being characterized in that each unit charge comprises a cylindrical body including a closed rear end wall and a front end wall having an opening , at least one block of material suitable for generating gaseous hydrogen when heated being present inside the cylindrical body , each block presenting an annular shape defining a central channel leading to the opening in the front end wall of the cylindrical body and at least one initiator present in the vicinity of the rear end wall of the cylindrical body ; the opening in the front end wall of the cylindrical body facing the front end wall of the enclosure so that the hot gas coming from said at least one block of material suitable for generating gaseous hydrogen when heated is directed directly against the inside surface of the front end wall of the enclosure .
An in vitro prostate carcinoma determination method, comprising: determining a ratio of an amount of free prostate specific antigen (hereinafter, the prostate specific antigen is referred to as "PSA") having a glycan of which a terminal sialic acid residue is α -linked to a second galactose residue from a terminal of the glycan (hereinafter, referred to as "α free PSA") to an amount of free PSA in a biological sample; and determining that prostate carcinoma is developed or the probability of developing prostate carcinoma is high in the case where the ratio is 40% or higher. determining a ratio of an amount of free prostate specific antigen (hereinafter, the prostate specific antigen is referred to as "PSA") having a glycan of which a terminal sialic acid residue is α -linked to a second galactose residue from a terminal of the glycan (hereinafter, referred to as "α free PSA") to an amount of free PSA in a biological sample; and determining that prostate carcinoma is developed or the probability of developing prostate carcinoma is high in the case where the ratio is 40% or higher.
A monoclonal antibody or an antigen-binding fragment thereof, which binds human Factor XI and/or human Factor Xla comprising (a) a CDR1 of the light chain comprising the sequence KASQSVLYSGDNYLN (SEQ ID NO: 8); (b) a CDR2 of the light chain comprising the sequence AASTLES (SEQ ID NO: 9); (c) a CDR3 of the light chain comprising the sequence QQYNGDPWT (SEQ ID NO: 10); (d) a CDR1 of the heavy chain comprising the sequence TSGMGVG (SEQ ID NO: 11); (e) a CDR2 of the heavy chain comprising the sequence HIDWDDDKYYSPSLKS (SEQ ID NO: 12); and (f) a CDR3 of the heavy chain comprising the sequence IRSSVYAHYYGMDY (SEQ ID NO: 13). (a) a CDR1 of the light chain comprising the sequence KASQSVLYSGDNYLN (SEQ ID NO: 8); (b) a CDR2 of the light chain comprising the sequence AASTLES (SEQ ID NO: 9); (c) a CDR3 of the light chain comprising the sequence QQYNGDPWT (SEQ ID NO: 10); (d) a CDR1 of the heavy chain comprising the sequence TSGMGVG (SEQ ID NO: 11); (e) a CDR2 of the heavy chain comprising the sequence HIDWDDDKYYSPSLKS (SEQ ID NO: 12); and (f) a CDR3 of the heavy chain comprising the sequence IRSSVYAHYYGMDY (SEQ ID NO: 13).
Cutter system for an electric shaver and/or trimmer , comprising a pair of cooperating cutting elements with an inner cutting element and an outer, cutting element , said pair of cooperating cutting elements comprising two rows of comb-like cutting teeth at opposite edges thereof and at least one field of cutting perforations between said rows of comb-like cutting teeth , wherein said cutting elements are movably supported relative to each other by a support structure , wherein the cutting perforations are arranged in two separate elongated fields of perforations which are separated from each other by an elongated unperforated center section of an outer one of said cutting elements defining a skin contact surface, and which include each at least two rows of perforations extending along the rows of comb-like cutting teeth , wherein each of said fields of perforations includes two to five rows, characterized in that said perforations , when viewed in a longitudinal section, expand towards the skin contact/facing surface of the outer cutting element .
A pizza dough for deferred used comprising, by weight percentage of the end product: - flour: 50 - 65; - water: 20 - 35; - fats: 0 - 8; - salt: 0.7 - 2; - sugar: 0 - 2; - deactivated yeast: 0.05 - 0.15; characterized in that , by weight percentage of the end product, it comprises: - fermented flour: 0.1 - 2; - vinegar: 0.1 - 2; - raising agents: 0.5 - 2; - gums: 0.1 - 3. - flour: 50 - 65; - water: 20 - 35; - fats: 0 - 8; - salt: 0.7 - 2; - sugar: 0 - 2; - deactivated yeast: 0.05 - 0.15; - fermented flour: 0.1 - 2; - vinegar: 0.1 - 2; - raising agents: 0.5 - 2; - gums: 0.1 - 3.
A radiographic system comprising: a plurality of radiation detection apparatuses configured to detect X-rays, wherein at least two of the plurality of radiation detection apparatuses overlap with each other; a combining processor configured to generate a long-size image by controlling enlargement factors of the individual image data of the plurality of radiation images in accordance with the layout relationship between the plurality of radiation detection apparatuses ; an image correction unit configured to correct a defective region in the long-size image including an image of a structure of one of the plurality of radiation detection apparatuses using a pixel value of an image other than the defective region, and a gradation processor configured to perform a gradation process on the long-size image that has been corrected by the image correction unit . a plurality of radiation detection apparatuses configured to detect X-rays, wherein at least two of the plurality of radiation detection apparatuses overlap with each other; a combining processor configured to generate a long-size image by controlling enlargement factors of the individual image data of the plurality of radiation images in accordance with the layout relationship between the plurality of radiation detection apparatuses ; an image correction unit configured to correct a defective region in the long-size image including an image of a structure of one of the plurality of radiation detection apparatuses using a pixel value of an image other than the defective region, and a gradation processor configured to perform a gradation process on the long-size image that has been corrected by the image correction unit .
A polymer composition comprising: from 80 to 99.5 wt% ethylene-derived units; and from 0.5 to 20 wt% of alpha-olefin derived units other than ethylene-derived units; wherein the polymer composition has a total internal unsaturations (Vy1+Vy2+T1) of from 0.15 to 0.40 per 1000 carbon atoms, an MI of from 0.1 to 6 g/10 min, an HLMI of from 5.0 to 40 g/10 min, a density of from 0.890 to 0.940 g/ml, a Tw 1 -Tw 2 value of from -40 to - 28°C, an Mw 1 /Mw 2 value of from 2.2 to about 2.5, an Mw/Mn of from 7.0 to 9.5, an Mz/Mw of from 2.7 to 2.8, an Mz/Mn of from 19 to 21, and a g' (vis) greater than 0.94; wherein Vy1, Vy2 and T1 are determined by 1 H-NMR as described in the present specification, MI is determined according to ASTM D1238, 190° C, 2.16 kg load, HLMI is determined according to ASTM D1238, 190° C, 21.6 kg load, density is determined according to ASTM D 1505 using a density gradient column on a sample molded according to ASTM D 4703-10a, Procedure C, and then conditioned under ASTM D 618-08 at 23° ± 2° C and 50 ± 10% relative humidity, for 40 hours prior to testing, Mw, Mn, Mz, the content of alpha-olefin derived units other than ethylene-derived units, and g' (vis) are determined by the GPC 4D methodology as described in the present specification, and Tw 1 , Tw 2 , Mw 1 and Mw 2 are determined from data obtained by cross-fraction chromatography analysis as described in the present specification. from 80 to 99.5 wt% ethylene-derived units; and from 0.5 to 20 wt% of alpha-olefin derived units other than ethylene-derived units; wherein the polymer composition has a total internal unsaturations (Vy1+Vy2+T1) of from 0.15 to 0.40 per 1000 carbon atoms, an MI of from 0.1 to 6 g/10 min, an HLMI of from 5.0 to 40 g/10 min, a density of from 0.890 to 0.940 g/ml, a Tw 1 -Tw 2 value of from -40 to - 28°C, an Mw 1 /Mw 2 value of from 2.2 to about 2.5, an Mw/Mn of from 7.0 to 9.5, an Mz/Mw of from 2.7 to 2.8, an Mz/Mn of from 19 to 21, and a g' (vis) greater than 0.94; wherein Vy1, Vy2 and T1 are determined by 1 H-NMR as described in the present specification, MI is determined according to ASTM D1238, 190° C, 2.16 kg load, HLMI is determined according to ASTM D1238, 190° C, 21.6 kg load, density is determined according to ASTM D 1505 using a density gradient column on a sample molded according to ASTM D 4703-10a, Procedure C, and then conditioned under ASTM D 618-08 at 23° ± 2° C and 50 ± 10% relative humidity, for 40 hours prior to testing, Mw, Mn, Mz, the content of alpha-olefin derived units other than ethylene-derived units, and g' (vis) are determined by the GPC 4D methodology as described in the present specification, and Tw 1 , Tw 2 , Mw 1 and Mw 2 are determined from data obtained by cross-fraction chromatography analysis as described in the present specification.
Device for the stoichiometric analysis of samples comprising a) a sample processing device comprising a sample holder for holding the sample , means for setting the temperature, means for adding and removing fluids and at least one fluid reservoir , b) an electron microscope with a STEM detector and a light microscope, and c) a computer-controlled and automated imaging device that captures images by means of the electron microscope or light microscope, a unit that stores the captured images and an image analysis unit controlled by the computer, characterized in that, the device comprises a computer-controlled process control system for controlling the means for setting the temperature and the means for adding and removing fluids , and the light microscope comprises a photo-optical lens with a cavity . a) a sample processing device comprising a sample holder for holding the sample , means for setting the temperature, means for adding and removing fluids and at least one fluid reservoir , b) an electron microscope with a STEM detector and a light microscope, and c) a computer-controlled and automated imaging device that captures images by means of the electron microscope or light microscope, a unit that stores the captured images and an image analysis unit controlled by the computer,
An ultraviolet (UV) photodetector , comprising: a substrate ; an electrode coupled to the substrate; and a compositionally graded magnesium-zinc oxide film deposited on the substrate and connected to the electrode, wherein the film has a zinc content that increases from a portion of the film adjacent the substrate to a portion of the film opposite the substrate to red shift the peak absorption of the film, wherein the film comprises three or more layers overlaying the substrate, wherein zinc content increases stepwise from a first layer adjacent the substrate through the incident player . a substrate ; an electrode coupled to the substrate; and a compositionally graded magnesium-zinc oxide film deposited on the substrate and connected to the electrode, wherein the film has a zinc content that increases from a portion of the film adjacent the substrate to a portion of the film opposite the substrate to red shift the peak absorption of the film, wherein the film comprises three or more layers overlaying the substrate, wherein zinc content increases stepwise from a first layer adjacent the substrate through the incident player .
A method for preparing a photomask blank suitable for manufacturing a photomask used in a lithography of up to 20 nm node, the photomask blank comprising a quartz substrate and a chromium-based material film formed on the quartz substrate, the chromium-based material film being a lightshielding film and having a tensile stress or compressive stress corresponding to an amount of warp of up to 50 nm, Wherein the method comprising the step of: forming the chromium-based material film having an optical density per unit film thickness at a wavelength of 193 nm of at least 0.050/nm on the quartz substrate having 152 mm square dimensions and 6.35 mm in thickness, by sputtering with a chromium target, and an inert gas and a reactive gas, as a sputtering gas, at a flow rate ratio of the reactive gas to the inert gas of 1 to 2.
A layered structure , comprising: a monolithic substrate having a continuous portion and a porous portion ; a first epitaxial metal layer over the monolithic substrate ; and a first semiconductor layer over the first epitaxial metal layer , wherein the first epitaxial metal layer is directly over the monolithic substrate , and wherein the first epitaxial metal layer is in direct contact with the porous portion of the monolithic substrate or further comprising a first rare earth oxide layer , wherein the first rare earth oxide layer is between the monolithic substrate and the first epitaxial metal layer , and directly over the monolithic substrate , and wherein the porous portion borders the first rare earth oxide layer without any transition layer in between. a monolithic substrate having a continuous portion and a porous portion ; a first epitaxial metal layer over the monolithic substrate ; and a first semiconductor layer over the first epitaxial metal layer , wherein the first epitaxial metal layer is directly over the monolithic substrate , and wherein the first epitaxial metal layer is in direct contact with the porous portion of the monolithic substrate or further comprising a first rare earth oxide layer , wherein the first rare earth oxide layer is between the monolithic substrate and the first epitaxial metal layer , and directly over the monolithic substrate , and wherein the porous portion borders the first rare earth oxide layer without any transition layer in between.
A connecting structure of building blocks, comprising a first type building block and a fourth type building block, wherein the first type building block has a regular hexahedral structure and includes one first connecting surface and five second connecting surfaces , two opposite corners of the first connecting surface of the first type building block are provided with first type grooves ; each of the second connecting surfaces of the first type building block is uniformly distributed with four first type grooves ; and the other two opposite corners of the first connecting surface of the first type building block are provided with first type protrusions which are capable of being respectively connected to the first type grooves of another first type building block; wherein the fourth type building block has a regular hexahedral structure and includes one first connecting surface and five second connecting surfaces ; two opposite corners of the first connecting surface of the fourth type building block are provided with fourth type grooves ; each of the second connecting surfaces of the fourth type building block is uniformly distributed with four fourth type grooves ; and the other two opposite corners of the first connecting surface of the fourth type building block are provided with fourth type protrusions which are capable of being respectively connected to the fourth type grooves of another fourth type building block; characterized in that each first type groove has four corners, and first type inserting grooves which have a shape or size different from the first type grooves are respectively located at each of the four corners of each first type groove , a ratio of a side length of the regular hexahedral structure of the fourth type building block to a side length of the regular hexahedral structure of the first type building block is 1:2, and the fourth type protrusion of the fourth type building block and the first type inserting groove of the first type building block are able to be connected to each other.
A fastener comprising: a fastener body orientated about a central axis (x-x); said fastener body having a tool-engaging portion to which a driving torque may be applied and a threaded fastening portion configured and arranged to mate with a corresponding threaded element; said fastener body having a shroud-receiving body portion orientated about said central axis; a shroud concentrically mounted on said shroud-receiving body portion and having an outer surface facing an inner surface (27.127) of said shroud-receiving body portion; said shroud being supported in rotatable relationship with said shroud-receiving body portion such that said shroud will rotate relative to said fastener body under an applied external torque prior to said fastener body rotating when said fastener is engaged with an external structure at a design installation torque and characterized by said inner surface of said shroud-receiving body portion comprising an annular groove orientated transverse to said central axis; said shroud comprising an axially-buckled radially-extending annular protrusion extending outwardly transverse to said central axis and disposed in said annular groove of said shroud-receiving body portion; and said axially-buckled radially-extending annular protrusion of said shroud and said annular groove of said shroud-receiving body portion forming a shroud-retaining element restraining said shroud from movement in at least a first axial direction along said central axis. a fastener body orientated about a central axis (x-x); said fastener body having a tool-engaging portion to which a driving torque may be applied and a threaded fastening portion configured and arranged to mate with a corresponding threaded element; said fastener body having a shroud-receiving body portion orientated about said central axis; a shroud concentrically mounted on said shroud-receiving body portion and having an outer surface facing an inner surface (27.127) of said shroud-receiving body portion; said shroud being supported in rotatable relationship with said shroud-receiving body portion such that said shroud will rotate relative to said fastener body under an applied external torque prior to said fastener body rotating when said fastener is engaged with an external structure at a design installation torque and characterized by said inner surface of said shroud-receiving body portion comprising an annular groove orientated transverse to said central axis; said shroud comprising an axially-buckled radially-extending annular protrusion extending outwardly transverse to said central axis and disposed in said annular groove of said shroud-receiving body portion; and said axially-buckled radially-extending annular protrusion of said shroud and said annular groove of said shroud-receiving body portion forming a shroud-retaining element restraining said shroud from movement in at least a first axial direction along said central axis.
A method of forming a flowmeter, comprising, in the following order, the steps of: bending a flow tube; aligning the flow tube with at least one anchor block; brazing the flow tube to the at least one anchor block; attaching a manifold to each end of the flow tube; the method characterized by : allowing the flow tube, the manifolds and the at least one anchor block to cool and contract after brazing; attaching the at least one anchor block to a support block after the flow tube has been brazed to the at least one anchor block; and attaching at least one of the support block and at least one of the first and second manifolds to a flowmeter case. bending a flow tube; aligning the flow tube with at least one anchor block; brazing the flow tube to the at least one anchor block; attaching a manifold to each end of the flow tube; the method characterized by : allowing the flow tube, the manifolds and the at least one anchor block to cool and contract after brazing; attaching the at least one anchor block to a support block after the flow tube has been brazed to the at least one anchor block; and attaching at least one of the support block and at least one of the first and second manifolds to a flowmeter case. allowing the flow tube, the manifolds and the at least one anchor block to cool and contract after brazing; attaching the at least one anchor block to a support block after the flow tube has been brazed to the at least one anchor block; and attaching at least one of the support block and at least one of the first and second manifolds to a flowmeter case.