An electrochromic device manufacturing method, comprising: providing (S620) a top electrode layer ; forming a charge storage layer (104; 704) on the top electrode layer; providing (S610) a bottom electrode layer ; forming an electrochromic layer (102; 702) on the bottom electrode layer; and forming an electrolyte layer sandwiched by the charge storage layer and the electrochromic layer, comprising the steps of: fixing (S630) the top electrode layer to the bottom electrode layer, the charge storage layer and the electrochromic layer located between the top electrode layer and the bottom electrode layer and separated by a space ; providing edge seals at edge areas of the electrochromic layer and the charge storage layer to seal the space; providing one or more spacers within the space to maintain a predetermined distance between the electrochromic layer and the charge storage layer; and thereafter, vacuuming the space and filling (S640) the vacuumed space with an electrolyte liquid by vacuum suction through an opening formed in the edge seal ; sealing (S650) the opening after the filling process; wherein the electrochromic layer, the electrolyte layer, and the charge storage layer are sandwiched by the top electrode layer and the bottom electrode layer, and wherein the electrochromic device obtained by said manufacturing method is configured to change its transmittance in response to a voltage applied between the bottom electrode layer and the top electrode layer. providing (S620) a top electrode layer ; forming a charge storage layer (104; 704) on the top electrode layer; providing (S610) a bottom electrode layer ; forming an electrochromic layer (102; 702) on the bottom electrode layer; and forming an electrolyte layer sandwiched by the charge storage layer and the electrochromic layer, comprising the steps of: fixing (S630) the top electrode layer to the bottom electrode layer, the charge storage layer and the electrochromic layer located between the top electrode layer and the bottom electrode layer and separated by a space ; providing edge seals at edge areas of the electrochromic layer and the charge storage layer to seal the space; providing one or more spacers within the space to maintain a predetermined distance between the electrochromic layer and the charge storage layer; and thereafter, vacuuming the space and filling (S640) the vacuumed space with an electrolyte liquid by vacuum suction through an opening formed in the edge seal ; sealing (S650) the opening after the filling process; wherein the electrochromic layer, the electrolyte layer, and the charge storage layer are sandwiched by the top electrode layer and the bottom electrode layer, and wherein the electrochromic device obtained by said manufacturing method is configured to change its transmittance in response to a voltage applied between the bottom electrode layer and the top electrode layer. fixing (S630) the top electrode layer to the bottom electrode layer, the charge storage layer and the electrochromic layer located between the top electrode layer and the bottom electrode layer and separated by a space ; providing edge seals at edge areas of the electrochromic layer and the charge storage layer to seal the space; providing one or more spacers within the space to maintain a predetermined distance between the electrochromic layer and the charge storage layer; and thereafter, vacuuming the space and filling (S640) the vacuumed space with an electrolyte liquid by vacuum suction through an opening formed in the edge seal ; sealing (S650) the opening after the filling process; wherein the electrochromic layer, the electrolyte layer, and the charge storage layer are sandwiched by the top electrode layer and the bottom electrode layer, and wherein the electrochromic device obtained by said manufacturing method is configured to change its transmittance in response to a voltage applied between the bottom electrode layer and the top electrode layer. <EOS>