An electrodeposition coating composition comprising: at least one compound (A) selected from the group consisting of a zinc compound (A-1) and a bismuth compound (A-2); an aminated resin (B); and a curing agent (C), wherein the composition comprises an emulsion obtained by neutralizing a resin emulsion containing the aminated resin (B) and the curing agent (C) with one or more acids selected from the group consisting of methanesulfonic acid, sulfamic acid, and dimethylolpropionic acid; a total milligram equivalent (MEQ (A)) of acid per 100 g of a resin solid content in the composition is 27 or more; a coulombic efficiency of a 15-μm-thick cured electrodeposition coating film formed using the composition is 30 mg/C or less; a film resistance of a 15-μm-thick uncured electrodeposition coating film formed using the composition is 400 kΩ•cm 2 or more; and a coating film viscosity of an electrodeposition coating film obtained from the composition is 3000 Pa•s or less at 50°C according to a viscoelasticity measuring device; wherein; the total milligram equivalent (MEQ (A)) of acid per 100 g of a resin solid content in the composition is measured by precisely weighing 10g of the electrodeposition coating composition, dissolving the composition in about 50 ml of a solvent (tetrahydrofuran) and then performing potentiometric titration using a 1/10 NaOH solution; coloumbic efficiency is calculated as the ratio of the amount (mg) of the precipitated coating material to the charge amount (coloumb) consumed by flowing a current; and film resistance is calculated as the coating area (cm 2 ) × voltage (V)/residual current (mA). at least one compound (A) selected from the group consisting of a zinc compound (A-1) and a bismuth compound (A-2); an aminated resin (B); and a curing agent (C), the composition comprises an emulsion obtained by neutralizing a resin emulsion containing the aminated resin (B) and the curing agent (C) with one or more acids selected from the group consisting of methanesulfonic acid, sulfamic acid, and dimethylolpropionic acid; a total milligram equivalent (MEQ (A)) of acid per 100 g of a resin solid content in the composition is 27 or more; a coulombic efficiency of a 15-μm-thick cured electrodeposition coating film formed using the composition is 30 mg/C or less; a film resistance of a 15-μm-thick uncured electrodeposition coating film formed using the composition is 400 kΩ•cm 2 or more; and a coating film viscosity of an electrodeposition coating film obtained from the composition is 3000 Pa•s or less at 50°C according to a viscoelasticity measuring device; wherein; the total milligram equivalent (MEQ (A)) of acid per 100 g of a resin solid content in the composition is measured by precisely weighing 10g of the electrodeposition coating composition, dissolving the composition in about 50 ml of a solvent (tetrahydrofuran) and then performing potentiometric titration using a 1/10 NaOH solution; coloumbic efficiency is calculated as the ratio of the amount (mg) of the precipitated coating material to the charge amount (coloumb) consumed by flowing a current; and film resistance is calculated as the coating area (cm 2 ) × voltage (V)/residual current (mA). <EOS>