mhurhangee/patent-ind-claim-en huggingface dataset:
A topical composition for treating, inhibiting or ameliorating excessive sweating, said composition comprising the following ingredients: (a) a compound having the formula: said compound having the R stereoisomeric configuration at the 2 position and the R, S or RS stereoisomeric configuration at the 1' and 3' positions, or being a mixture thereof; (b) anhydrous ethanol, present in an amount of at least 70% w/w of the composition, as a non-aqueous solvent for the compound of formula ; (c) optionally, at least one gelling or viscosity-controlling ingredient; (d) isopropyl myristate; and (e) optionally, at least one additional carrier or excipient provided that said topical composition is anhydrous and comprises from about 1 % to about 25 % w/w of the compound of formula , wherein the recitation of the term "about" in relation to a stated numerical value modifies the value of the stated amount by a variance of ±20% of said stated numerical value. (a) a compound having the formula: said compound having the R stereoisomeric configuration at the 2 position and the R, S or RS stereoisomeric configuration at the 1' and 3' positions, or being a mixture thereof; (b) anhydrous ethanol, present in an amount of at least 70% w/w of the composition, as a non-aqueous solvent for the compound of formula ; (c) optionally, at least one gelling or viscosity-controlling ingredient; (d) isopropyl myristate; and (e) optionally, at least one additional carrier or excipient
An additive manufacturing method comprising: detecting a defect in a powder containment wall formed using an additive manufacturing process, the powder containment wall including a first surface that faces a powder containing region and a second surface that faces a substantially powder free region ; generating a supplemental scan path that covers at least a portion of the powder containment wall based on a location of the detected defect ; and controlling a consolidation device , based on the supplemental scan path, to remedy the defect . detecting a defect in a powder containment wall formed using an additive manufacturing process, the powder containment wall including a first surface that faces a powder containing region and a second surface that faces a substantially powder free region ; generating a supplemental scan path that covers at least a portion of the powder containment wall based on a location of the detected defect ; and controlling a consolidation device , based on the supplemental scan path, to remedy the defect .
A process to improve water flux of a thin film composite (TFC) membrane containing a polyamide discrimination layer, the method comprising: a) treating the TFC membrane with an oxidizing aqueous solution containing an oxidizing agent in an amount of from 7 ppm to 35 ppm at a pH of 10 to 10.5 for a time period of least 5 minutes to react with the polyamide discrimination layer to form a treated membrane; and b) contacting the treated membrane with a reducing solution containing a reducing agent at a pH from 4 to 8 for a time period of at least 1 minute, where there is a close temporal connection between steps a) and b), wherein the amount of time between the end of the time period of treating the membrane with the oxidizing agent and contacting the oxidized membrane with the reducing agent is 60 minutes or less, the oxidizing solution comprises free chlorine in an amount from 7 ppm to 35 ppm; and the reducing solution comprises an alkali-metal meta-bisulfite in an amount from 0.1 wt% to 5 wt%. a) treating the TFC membrane with an oxidizing aqueous solution containing an oxidizing agent in an amount of from 7 ppm to 35 ppm at a pH of 10 to 10.5 for a time period of least 5 minutes to react with the polyamide discrimination layer to form a treated membrane; and b) contacting the treated membrane with a reducing solution containing a reducing agent at a pH from 4 to 8 for a time period of at least 1 minute, where there is a close temporal connection between steps a) and b),
Method for manufacturing an aluminum alloy in a continuous in-line sequence, comprising: i) providing a continuously-cast thin aluminum alloy strip; ii) in-line hot rolling the continuously-cast strip; and iii) annealing of the hot rolled continuously cast strip to O-temper having a yield point elongation less than 0.6%, wherein the aluminum alloy is used in the manufacturing of an automobile, characterized in that the continuously cast strip is cast in a horizontal twin roll casting apparatus, the horizontal twin roll casting apparatus having a nip formed between two casting rolls, and wherein during casting a point of complete solidification of the Al-Mg alloy is formed at the nip, such that the component is free of stretch strain marks, wherein the aluminum alloy is an Al-Mg alloy and more precisely an AA5182 alloy having an increased Cu content of 0.2%, wherein the continuously-cast strip has a thickness ranging from 0.1524 to 0.635 cm before hot rolling, wherein during in-line hot rolling the thickness of the continuously-cast strip is reduced by 40, 50% or 60%, and wherein the annealing of the hot rolled continuously-cast strip is performed between 315.56 and 454.44°C for 2 hours. i) providing a continuously-cast thin aluminum alloy strip; ii) in-line hot rolling the continuously-cast strip; and iii) annealing of the hot rolled continuously cast strip to O-temper having a yield point elongation less than 0.6%,
A control system for a vehicle, the control system comprising one or more controllers, the control system configured to: receive route data indicative of a route ahead of the vehicle; determine, in dependence on the route data, a prediction of a first acceleration of the vehicle at a first location; determine, in dependence on the route data, a prediction of a second acceleration of the vehicle at a second location, wherein the second location is further distal to a current location of the vehicle than the first location; determine a suspension calibration in dependence on the second acceleration; receive measured acceleration data when the vehicle reaches the first location; compare the measured acceleration data and the first acceleration; and output a suspension control signal in dependence on the determined suspension calibration and the comparison. receive route data indicative of a route ahead of the vehicle; determine, in dependence on the route data, a prediction of a first acceleration of the vehicle at a first location; determine, in dependence on the route data, a prediction of a second acceleration of the vehicle at a second location, wherein the second location is further distal to a current location of the vehicle than the first location; determine a suspension calibration in dependence on the second acceleration; receive measured acceleration data when the vehicle reaches the first location; compare the measured acceleration data and the first acceleration; and output a suspension control signal in dependence on the determined suspension calibration and the comparison.
A cutting assembly for forward cutting occlusive material from within a body lumen, said cutting assembly comprising: a rotatable housing having a distal end with a distal opening open in distal moving direction of the cutting assembly, an opposing proximal end and a lumen extending along the length of the cutting assembly between the distal end and the proximal end, defining a longitudinal central axis, said housing being configured to rotate about the longitudinal central axis in a first direction, wherein said distal end of said housing comprises a forward cutting surface configured for engaging occlusive material upon contact therewith; a rotatable cutter positioned in the distal opening , within at least a portion of the lumen of said housing , said cutter being configured to rotate about said longitudinal central axis characterized by said cutter being configured to rotate about said longitudinal axis in a second direction opposite the first direction; and a gearing configured to drive the rotation of the housing in opposite direction to the rotation of the cutter . a rotatable housing having a distal end with a distal opening open in distal moving direction of the cutting assembly, an opposing proximal end and a lumen extending along the length of the cutting assembly between the distal end and the proximal end, defining a longitudinal central axis, said housing being configured to rotate about the longitudinal central axis in a first direction, wherein said distal end of said housing comprises a forward cutting surface configured for engaging occlusive material upon contact therewith; a rotatable cutter positioned in the distal opening , within at least a portion of the lumen of said housing , said cutter being configured to rotate about said longitudinal central axis characterized by said cutter being configured to rotate about said longitudinal axis in a second direction opposite the first direction; and a gearing configured to drive the rotation of the housing in opposite direction to the rotation of the cutter .
Node connection with two connecting beams which butt against one another at a right angle, and in particular have a flat profile, comprising a connecting clip which consists of a first part and a second part, wherein the first part of the connecting clip is connected in a force-fitting manner to the abutting connecting beam of the two connecting beams and is connected in an interlocking manner to the second part of the connecting clip, wherein the force-fitting connection between the first part and the abutting connecting beam has one connecting element which is designed as a screw and one connecting element which is designed as an associated threaded piece which can be inserted in a releasable manner into the said connecting beam, characterized in that the first part of the connecting clip has an attachment which plugs in an interlocking manner into the front end of the abutting connecting beam.
A device comprising an electrostatic discharge protection structure , an ion sensitive field effect transistor having a floating gate including at least one metal layer and a sensing layer located above the floating gate, characterised by the device having a planar, layered structure and the electrostatic discharge protection structure being located in a plane between the sensing layer and the floating gate such that the electrical impedance from said sensing layer to the electrostatic discharge protection structure is less than the electrical impedance from said sensing layer to the floating gate, wherein the electrostatic discharge protection structure includes a metal layer and is coupled to an electrical ground and / or to an electrical power supply rail of the device.
A device for measuring a particle beam comprising a front face (F) and a rear face (B) as well as: - a first part, referred to as the central part (PC), including means for forming a space charge zone (ZCE) for a particle beam (FS) to be measured to pass therethrough, charge carriers of a first type and of a second type being generated by said beam (FS) when the same passes through the space charge zone (ZCE); - a second part, referred to as the peripheral part (PP), including means for collecting at least one type of charge carrier among the first type or the second type of charge carriers generated at the space charge zone (ZCE); the central part (PC) having a thickness less than or equal to the thickness of the peripheral part (PP), the peripheral part (PP) surrounding the central part (PC) so that a particle beam (FS) can pass through the central part (PC) without passing through the peripheral part (PP), the device being characterised in that it includes, in a region of the central part and opening onto the rear face (B), a layer of a porous material forming a porous region (PO) so that the effective thickness perceived by the beam when it passes through the device at the central part (PC) by passing through the porous region along an axis normal to the front face (F) is less than the thickness of the central part (PC), the space charge zone (ZCE) being situated outside the porous region. - a first part, referred to as the central part (PC), including means for forming a space charge zone (ZCE) for a particle beam (FS) to be measured to pass therethrough, charge carriers of a first type and of a second type being generated by said beam (FS) when the same passes through the space charge zone (ZCE); - a second part, referred to as the peripheral part (PP), including means for collecting at least one type of charge carrier among the first type or the second type of charge carriers generated at the space charge zone (ZCE);
Outer shell for a dispenser, the outer shell comprising: a first injection moulded plastic component part (17; 41a) and a second injection moulded plastic component part (18; 42a) ; wherein the first and second component parts each comprise an outer surface and an inner surface , wherein the first component part has a first mating surface directed to the outer surface of the first component part and the second component part has a second mating surface directed to an inner surface of the second component part, wherein the first and second component parts are joined to each other along a seam by mating said first mating surface and said second mating surface during injection moulding, characterized in that a plurality of recesses (49; 50) is formed in the inner surface of the first component part along at least a part of the seam and/or on a gate protrusion extending away from a free end of the first mating surface of the first component part, wherein the recesses (49; 50) are provided with an undercut. a first injection moulded plastic component part (17; 41a) and a second injection moulded plastic component part (18; 42a) ; wherein the first and second component parts each comprise an outer surface and an inner surface , wherein the first component part has a first mating surface directed to the outer surface of the first component part and the second component part has a second mating surface directed to an inner surface of the second component part, wherein the first and second component parts are joined to each other along a seam by mating said first mating surface and said second mating surface during injection moulding, characterized in that a plurality of recesses (49; 50) is formed in the inner surface of the first component part along at least a part of the seam and/or on a gate protrusion extending away from a free end of the first mating surface of the first component part, wherein the recesses (49; 50) are provided with an undercut.
A bar for an obstacle used in hippic or equestrian activity, comprising at least two modules , each of said modules including a cylindrical main body , a sleeve at one end of said main body, made integrally with said main body and having a reduced diameter compared to said main body, and a housing at the other end, the sleeve of a first module being able to fit into the housing of a second module to form said bar, said bar being made of a polymeric material, and each sleeve is tubular and includes a proximal portion defining a shoulder at the main body, a distal portion and a groove separating said portions, including when the modules are completely fitted.
Soil preparation tool , in particular a share, comprising a main body , on which optional cassettes are arranged, and at least first cutting elements , which are attached to the main body or to the cassettes for cutting into a soil along a working direction , characterized in that the first cutting elements are arranged in separate mounts , wherein the first cutting elements are arranged spaced apart from each other and wherein first cutting elements are angled in relation to a working edge , such that cutting edges of the cutting elements are partially arranged one behind the other in the working direction .
A method comprising: forming a plurality of first interconnects and a plurality of second interconnects on opposite sides of an integrated circuit device layer comprising a plurality of circuit devices, wherein the plurality of second interconnects include interconnects of different thickness dimensions; and forming contact points to the second plurality of interconnects , the contact points operable for connection to an external source, wherein a first of the plurality of second interconnects has thickness dimensions selected for accessing devices in the device layer and a second of the plurality of second interconnects comprises a thickness dimension greater than the first of the plurality of second interconnects wherein such thickness dimension is selected to contain global clock distribution; and wherein a third of the plurality of second interconnects has thickness dimensions selected for distributing power. forming a plurality of first interconnects and a plurality of second interconnects on opposite sides of an integrated circuit device layer comprising a plurality of circuit devices, wherein the plurality of second interconnects include interconnects of different thickness dimensions; and forming contact points to the second plurality of interconnects , the contact points operable for connection to an external source, wherein a first of the plurality of second interconnects has thickness dimensions selected for accessing devices in the device layer and a second of the plurality of second interconnects comprises a thickness dimension greater than the first of the plurality of second interconnects wherein such thickness dimension is selected to contain global clock distribution; and wherein a third of the plurality of second interconnects has thickness dimensions selected for distributing power.
An image processing apparatus comprising: an acquisition unit that acquires a first radiographic image captured by irradiating a subject (W), in a state in which a contrast agent is administered, with radiation (R) of a first energy and a second radiographic image captured by irradiating the subject (W) with radiation (R) of a second energy different from the first energy; characterized in that the image processing apparatus further comprises: a correction unit that performs a correction on each of the first radiographic image and the second radiographic image to remove as an artifact component, which generates an artifact predetermined as an appearance similar to that of an image of a contrast agent component, an oblique incident component caused by an oblique incidence of the radiation (R2) onto the subject (W) and a scattered ray component caused by a scattered ray of radiation (R); and a generation unit that, after the correction by the correction unit , generates a difference image between the corrected first radiographic image and the corrected second radiographic image. an acquisition unit that acquires a first radiographic image captured by irradiating a subject (W), in a state in which a contrast agent is administered, with radiation (R) of a first energy and a second radiographic image captured by irradiating the subject (W) with radiation (R) of a second energy different from the first energy; characterized in that the image processing apparatus further comprises: a correction unit that performs a correction on each of the first radiographic image and the second radiographic image to remove as an artifact component, which generates an artifact predetermined as an appearance similar to that of an image of a contrast agent component, an oblique incident component caused by an oblique incidence of the radiation (R2) onto the subject (W) and a scattered ray component caused by a scattered ray of radiation (R); and a generation unit that, after the correction by the correction unit , generates a difference image between the corrected first radiographic image and the corrected second radiographic image. a correction unit that performs a correction on each of the first radiographic image and the second radiographic image to remove as an artifact component, which generates an artifact predetermined as an appearance similar to that of an image of a contrast agent component, an oblique incident component caused by an oblique incidence of the radiation (R2) onto the subject (W) and a scattered ray component caused by a scattered ray of radiation (R); and a generation unit that, after the correction by the correction unit , generates a difference image between the corrected first radiographic image and the corrected second radiographic image.
A method of aligning optical wafers having formed thereon at least one lens element and at least three reflectors in determined positions, the method comprising: providing a first wafer having at least three reflectors and one lens formed thereon in fixed and determined relative positions, wherein the at least three reflectors and one lens of the first wafer are formed from a first mould; providing a second wafer having at least three reflectors and one lens formed thereon in fixed and determined relative positions, wherein the at least three reflectors and one lens of the second wafer are formed from a second mould; using a first interferometer to align a first wafer by optical interaction between the interferometer and the reflectors on the first wafer ; using a second interferometer to align a second wafer by optical interaction between the interferometer and the reflectors on the second wafer , wherein the reflectors on the first and second wafers are lenses used exclusively for alignment of the wafers; whereby the relative position of the lenses on each of the first and second wafer is thereby determined. providing a first wafer having at least three reflectors and one lens formed thereon in fixed and determined relative positions, wherein the at least three reflectors and one lens of the first wafer are formed from a first mould; providing a second wafer having at least three reflectors and one lens formed thereon in fixed and determined relative positions, wherein the at least three reflectors and one lens of the second wafer are formed from a second mould; using a first interferometer to align a first wafer by optical interaction between the interferometer and the reflectors on the first wafer ; using a second interferometer to align a second wafer by optical interaction between the interferometer and the reflectors on the second wafer , wherein the reflectors on the first and second wafers are lenses used exclusively for alignment of the wafers; whereby the relative position of the lenses on each of the first and second wafer is thereby determined.
An article , said article being moveable between a first position and a second position and biased to the second position, said article being retained in the first position by retaining means until a predetermined condition is met, wherein when said predetermined condition is met biasing means exert a biasing force to move the article from the first position to the second position, said predetermined condition being met when at least one formation , located on at least one face of the article , is moved from a first position to a second position, thereby releasing said retaining means and permitting movement of the article from the first position to the second position, and characterized in that said at least one formation is one of a plurality of formations which are movable from first to second positions, by being urged inwardly of the article .