A support table for a lithographic apparatus, the support table configured to support a substrate (W), wherein the support table comprises: a base surface , the base surface facing a bottom surface of the substrate (W) when the substrate (W) is supported by the support table ; a plurality of gas cushion members protruding above the base surface , each of the gas cushion members comprising a recess defined by a wall that forms a closed loop when viewed in a direction perpendicular to the base surface , the recess being shaped and configured such that a lowering of the substrate (W) into a position on the support table at which the substrate (W) is supported by the support table causes a localised build-up of pressure within the recess , the localised build-up of pressure providing a localised gas cushioning effect during the lowering of the substrate (W); a plurality of burls protruding above the base surface , each of the plurality of burls having a respective distal end , the plurality of burls being arranged such that, when the substrate (W) is supported by the support table , the substrate (W) is supported by the respective distal ends of the plurality of burls ; and a plurality of protrusions protruding above the base surface , each of the plurality of protrusions having a respective distal end , the respective distal end being configured such that, when the substrate (W) is supported by the respective distal ends of the plurality of burls , the respective distal end of each protrusion is spaced apart from the substrate (W), characterized in that the recess of each of at least one of the gas cushion members is formed in a respective one of the protrusions . a base surface , the base surface facing a bottom surface of the substrate (W) when the substrate (W) is supported by the support table ; a plurality of gas cushion members protruding above the base surface , each of the gas cushion members comprising a recess defined by a wall that forms a closed loop when viewed in a direction perpendicular to the base surface , the recess being shaped and configured such that a lowering of the substrate (W) into a position on the support table at which the substrate (W) is supported by the support table causes a localised build-up of pressure within the recess , the localised build-up of pressure providing a localised gas cushioning effect during the lowering of the substrate (W); a plurality of burls protruding above the base surface , each of the plurality of burls having a respective distal end , the plurality of burls being arranged such that, when the substrate (W) is supported by the support table , the substrate (W) is supported by the respective distal ends of the plurality of burls ; and a plurality of protrusions protruding above the base surface , each of the plurality of protrusions having a respective distal end , the respective distal end being configured such that, when the substrate (W) is supported by the respective distal ends of the plurality of burls , the respective distal end of each protrusion is spaced apart from the substrate (W), characterized in that the recess of each of at least one of the gas cushion members is formed in a respective one of the protrusions . <EOS>