mhurhangee/patent-ind-claim-en huggingface dataset:
A method of transmitting three-dimensional,3D, video content, the method comprising: defining reference coordinates of a six degrees of freedom space represented by a volumetric cuboid; defining placement information where a bounding box representing a 6DoF object is placed in the 6DoF space, the placement information comprising reference coordinates of the bounding box, scaling information of the bounding box, and rotation information of the bounding box, wherein the rotation information of the bounding box is defined based on an orientation of the bounding box referring to the 6D0F space; placing the bounding box in the 6DoF space by matching the reference coordinate of the bounding box and the reference coordinate of the 6DoF space, according to the placement information; dividing the bounding box into at least two sub-blocks based on division information; compressing 3D video content, comprising the at least two sub-blocks of the bounding box, into a two-dimensional, 2D, video frame ; obtaining , from the 2D video frame, location information about compressed data corresponding to the at least two sub-blocks of the bounding box; encoding the 2D video frame ; encapsulating the compressed data into tracks for each component of the bounding box to generate a media file comprising the encoded 2D video frame and the location information; and transmitting the media file, wherein each of the tracks is divided into at least two regions corresponding to the sub-blocks of the bounding box, where the at least two regions are independently decodable of each other. defining reference coordinates of a six degrees of freedom space represented by a volumetric cuboid; defining placement information where a bounding box representing a 6DoF object is placed in the 6DoF space, the placement information comprising reference coordinates of the bounding box, scaling information of the bounding box, and rotation information of the bounding box, wherein the rotation information of the bounding box is defined based on an orientation of the bounding box referring to the 6D0F space; placing the bounding box in the 6DoF space by matching the reference coordinate of the bounding box and the reference coordinate of the 6DoF space, according to the placement information; dividing the bounding box into at least two sub-blocks based on division information; compressing 3D video content, comprising the at least two sub-blocks of the bounding box, into a two-dimensional, 2D, video frame ; obtaining , from the 2D video frame, location information about compressed data corresponding to the at least two sub-blocks of the bounding box; encoding the 2D video frame ; encapsulating the compressed data into tracks for each component of the bounding box to generate a media file comprising the encoded 2D video frame and the location information; and transmitting the media file, wherein each of the tracks is divided into at least two regions corresponding to the sub-blocks of the bounding box, where the at least two regions are independently decodable of each other.
A height-adjustable holding device for animal food, in particular for holding containers for animal food, comprising - a carrier , - a carriage vertically adjustable on the carrier with at least one holder for animal food in a bowl, a bottle or the like, - mechanical adjusting means for moving the carriage along the carrier , characterised in that actuation of the mechanical adjusting means along an adjustment path causes the carriage to move in a first direction along a travel path on the carrier , transmission means acting between the adjusting means and the carriage thereby extending the travel path of the carriage relative to the adjustment path of the adjusting means , and the holding device has counterforce means for moving the carriage along the carrier , by means of which the carriage can be moved in a second direction opposite to the first direction as a result of the actuation of the adjusting means . - a carrier , - a carriage vertically adjustable on the carrier with at least one holder for animal food in a bowl, a bottle or the like, - mechanical adjusting means for moving the carriage along the carrier , actuation of the mechanical adjusting means along an adjustment path causes the carriage to move in a first direction along a travel path on the carrier , transmission means acting between the adjusting means and the carriage thereby extending the travel path of the carriage relative to the adjustment path of the adjusting means , and the holding device has counterforce means for moving the carriage along the carrier , by means of which the carriage can be moved in a second direction opposite to the first direction as a result of the actuation of the adjusting means .
A cleaning solution which removes a photoresist on a surface of a semiconductor element having a low dielectric constant film (a low-k film) and a material that contains 10 atomic % or more of tungsten, wherein the cleaning solution contains 0.001 to 5% by mass of an alkaline earth metal compound, 0.1 to 30% by mass of an inorganic alkali and/or an organic alkali, and water, wherein the pH value of the cleaning solution is 10 to 14, wherein the alkaline earth metal compound is at least one substance selected from the group consisting of a calcium compound, a strontium compound and a barium compound, and wherein the inorganic alkali is at least one substance selected from the group consisting of lithium hydroxide, lithium carbonate, lithium hydrogen carbonate, lithium acetate, sodium hydroxide, sodium carbonate, sodium hydrogen carbonate, sodium acetate, potassium hydroxide, potassium carbonate, potassium hydrogen carbonate, potassium acetate, cesium hydroxide, cesium carbonate, cesium hydrogen carbonate, cesium acetate and ammonia.
A computer-implemented method for modelling the formation of a sedimentary basin using a stratigraphic forward modelling program, wherein the stratigraphic forward modelling program is configured to simulate the superposition of successive layers of sediments, each layer of sediments corresponding to a determined period of time, from input parameters comprising: - the determined time period corresponding to a layer of sediments, - the overall time period simulated by the superposition of the layers of sediment, - at least one sediment supply process, and - at least one environmental parameter, the method comprising steps of: a. Receiving a facies log corresponding to an initial state of at least one well belonging to the sedimentary basin to be modelled, wherein the facies log comprises a succession of layers of different facies wherein each layer extends from a respective depth with a respective thickness, b. determining environmental conditions associated to at least some of the facies of the facies log to infer, for at least one environmental factor, an environmental factor log associated to the facies log, c. determining , from the facies log, a number of layer of sediments and a thickness of each layer of sediments to be simulated by the stratigraphic forward modelling program for modelling the facies log, and d. determining , from the environmental factor log associated to the facies log, environmental parameters to be used as input environmental parameters of the simulation. - the determined time period corresponding to a layer of sediments, - the overall time period simulated by the superposition of the layers of sediment, - at least one sediment supply process, and - at least one environmental parameter, a. Receiving a facies log corresponding to an initial state of at least one well belonging to the sedimentary basin to be modelled, wherein the facies log comprises a succession of layers of different facies wherein each layer extends from a respective depth with a respective thickness, b. determining environmental conditions associated to at least some of the facies of the facies log to infer, for at least one environmental factor, an environmental factor log associated to the facies log, c. determining , from the facies log, a number of layer of sediments and a thickness of each layer of sediments to be simulated by the stratigraphic forward modelling program for modelling the facies log, and d. determining , from the environmental factor log associated to the facies log, environmental parameters to be used as input environmental parameters of the simulation.
A dosing dispenser for retail and catering, comprising - a housing , - at least one containing space formed in the housing for containing at least one bag of viscous product, - for each containing space , a plunger arranged in the containing space for pressing out the at least one bag , - for each plunger , an operating device guided in the housing and/or supported at the housing for linearly movable operation of the plunger , and - at least one outlet opening , preferably exactly one outlet opening per containing space, for the product, which is formed in the region of a first end of the containing space , - wherein the respective containing space is formed by a cylindrical containing space inner wall and at the first end through a bag support bottom , characterized in that - a free space is formed between the containing space inner wall and an outer wall, preferably a side outer wall , of the housing . - a housing , - at least one containing space formed in the housing for containing at least one bag of viscous product, - for each containing space , a plunger arranged in the containing space for pressing out the at least one bag , - for each plunger , an operating device guided in the housing and/or supported at the housing for linearly movable operation of the plunger , and - at least one outlet opening , preferably exactly one outlet opening per containing space, for the product, which is formed in the region of a first end of the containing space , - wherein the respective containing space is formed by a cylindrical containing space inner wall and at the first end through a bag support bottom , characterized in that - a free space is formed between the containing space inner wall and an outer wall, preferably a side outer wall , of the housing .
A method (Q10, S20) for processing a pressure sensing signal, comprising the steps: providing a pressure sensitive module; acquiring a resistance of the pressure sensitive module and recording a resistance-time curve (Q11; S104); first-order differentiating the resistance-time curve and acquiring the corresponding slope value (Q12; S105); matching the slope value with at least one predetermined database to acquire a pressing force gradient corresponding to the slope value (Q13; S108); and calculating and acquiring a pressing force based on the pressing force gradient (Q14;S109). providing a pressure sensitive module; acquiring a resistance of the pressure sensitive module and recording a resistance-time curve (Q11; S104); first-order differentiating the resistance-time curve and acquiring the corresponding slope value (Q12; S105); matching the slope value with at least one predetermined database to acquire a pressing force gradient corresponding to the slope value (Q13; S108); and calculating and acquiring a pressing force based on the pressing force gradient (Q14;S109).
A method for testing an optical assembly , comprising - providing a substrate with an optical microstructure integrated with the substrate , the optical microstructure comprising one or more integrated optical components which are fully or partially embedded, integrated or patterned in the substrate and which are positioned to form an optical interaction area above a part of a surface of the substrate , - sealing a cover cap to at least a part of a surface of the substrate adjacent to the optical microstructure , thereby obtaining a sealed cavity , - providing a physical parameter sensor arrangement for measuring a physical parameter inside the sealed cavity which is a measure of hermeticity of the sealed cavity , - providing an optical feedthrough integrated in the substrate between the physical parameter sensor arrangement and the optical microstructure , the optical feedthrough forming a communication path from within the sealed cavity to an area outside the sealed cavity and provided for communicating the measured physical parameter value, - measuring said physical parameter value inside the sealed cavity by means of the physical parameter sensor arrangement inside the sealed cavity , and - communicating the measured physical parameter value via the optical feedthrough to the area outside the sealed cavity . - providing a substrate with an optical microstructure integrated with the substrate , the optical microstructure comprising one or more integrated optical components which are fully or partially embedded, integrated or patterned in the substrate and which are positioned to form an optical interaction area above a part of a surface of the substrate , - sealing a cover cap to at least a part of a surface of the substrate adjacent to the optical microstructure , thereby obtaining a sealed cavity , - providing a physical parameter sensor arrangement for measuring a physical parameter inside the sealed cavity which is a measure of hermeticity of the sealed cavity , - providing an optical feedthrough integrated in the substrate between the physical parameter sensor arrangement and the optical microstructure , the optical feedthrough forming a communication path from within the sealed cavity to an area outside the sealed cavity and provided for communicating the measured physical parameter value, - measuring said physical parameter value inside the sealed cavity by means of the physical parameter sensor arrangement inside the sealed cavity , and - communicating the measured physical parameter value via the optical feedthrough to the area outside the sealed cavity .
A photomask manufacturing method, comprising: providing (S202) a substrate structure, wherein the substrate structure comprises: an etch material layer ; a first sacrificial layer on a portion of the etch material layer ; and a photomask layer on an upper surface of the etch material layer , an upper surface of the first sacrificial layer , and a side surface of the first sacrificial layer ; forming (S204) a second sacrificial layer covering the photomask layer on the etch material layer and the photomask layer on the side surface of the first sacrificial layer ; wherein forming the second sacrificial layer comprises: depositing a sacrificial material layer on the substrate structure; and conducting a planarization process on the sacrificial material layer so that an upper surface of the remaining sacrificial material layer is on a substantially same horizontal level with an upper surface of the photomask layer on the first sacrificial layer , the remaining sacrificial material layer being the second sacrificial layer ; wherein the photomask manufacturing method further comprises: etching the photomask layer not covered by the second sacrificial layer to expose the first sacrificial layer ; removing the first sacrificial layer and the second sacrificial layer ; and removing the photomask layer on the etch material layer . providing (S202) a substrate structure, wherein the substrate structure comprises: an etch material layer ; a first sacrificial layer on a portion of the etch material layer ; and a photomask layer on an upper surface of the etch material layer , an upper surface of the first sacrificial layer , and a side surface of the first sacrificial layer ; an etch material layer ; a first sacrificial layer on a portion of the etch material layer ; and a photomask layer on an upper surface of the etch material layer , an upper surface of the first sacrificial layer , and a side surface of the first sacrificial layer ; forming (S204) a second sacrificial layer covering the photomask layer on the etch material layer and the photomask layer on the side surface of the first sacrificial layer ; wherein forming the second sacrificial layer comprises: depositing a sacrificial material layer on the substrate structure; and conducting a planarization process on the sacrificial material layer so that an upper surface of the remaining sacrificial material layer is on a substantially same horizontal level with an upper surface of the photomask layer on the first sacrificial layer , the remaining sacrificial material layer being the second sacrificial layer ; wherein the photomask manufacturing method further comprises: etching the photomask layer not covered by the second sacrificial layer to expose the first sacrificial layer ; removing the first sacrificial layer and the second sacrificial layer ; and removing the photomask layer on the etch material layer . etching the photomask layer not covered by the second sacrificial layer to expose the first sacrificial layer ; removing the first sacrificial layer and the second sacrificial layer ; and removing the photomask layer on the etch material layer .
A liquid ejection head comprising: an actuator configured to expand or contract a pressure chamber communicating with a nozzle configured to eject ink; a control unit configured to apply an expansion pulse for expanding the pressure chamber to the actuator, and then apply a first contraction pulse for contracting the pressure chamber to a first volume to the actuator, and then apply a second contraction pulse for contracting a volume of the pressure chamber to a second volume smaller than the first volume to the actuator, wherein a width of the second contraction pulse includes a first time point when, after changing from the first contraction pulse to the second contraction pulse, a meniscus formed in the nozzle changes from a state of progressing inside the pressure chamber to a state of progressing outside the pressure chamber, characterized in that a period between the first time point and an end time point of the second contraction pulse is equal to or less than a quarter of a natural vibration period of pressure in the pressure chamber. an actuator configured to expand or contract a pressure chamber communicating with a nozzle configured to eject ink; a control unit configured to apply an expansion pulse for expanding the pressure chamber to the actuator, and then apply a first contraction pulse for contracting the pressure chamber to a first volume to the actuator, and then apply a second contraction pulse for contracting a volume of the pressure chamber to a second volume smaller than the first volume to the actuator, wherein a width of the second contraction pulse includes a first time point when, after changing from the first contraction pulse to the second contraction pulse, a meniscus formed in the nozzle changes from a state of progressing inside the pressure chamber to a state of progressing outside the pressure chamber, characterized in that a period between the first time point and an end time point of the second contraction pulse is equal to or less than a quarter of a natural vibration period of pressure in the pressure chamber.
A composition comprising: (a) from 30% by weight to 97% by weight of polymer, wherein the polymer comprises polyetherimide, polyetheretherketone, polyamide, polyoxyalkylene, or polyalkylene terephthalate, or a mixture thereof; and (b) from 3% by weight to 30% by weight ultra-high molecular weight polyethylene modified with one or more surface modifiers, wherein the ultra-high molecular weight polyethylene comprises above 0% by weight to 10% by weight of the surface modifier. (a) from 30% by weight to 97% by weight of polymer, wherein the polymer comprises polyetherimide, polyetheretherketone, polyamide, polyoxyalkylene, or polyalkylene terephthalate, or a mixture thereof; and (b) from 3% by weight to 30% by weight ultra-high molecular weight polyethylene modified with one or more surface modifiers, wherein the ultra-high molecular weight polyethylene comprises above 0% by weight to 10% by weight of the surface modifier.
Modular plug connector comprising a plug connector housing , a retaining frame , a bus system and at least one plug connector module , wherein the retaining frame comprises at least one module plug-in site in which the at least one plug connector module is arranged, wherein an electronic evaluating unit and at least one sensor are provided in the plug connector module , wherein an electronic control unit for a bus system is integrated into the electronic evaluating unit and is connected in an electrical manner by way of the bus system to the at least one sensor , wherein the at least one plug connector module comprises an electronic addressing system that is suitable for communication by way of a bus system, and wherein the at least one plug connector module comprises at least one electrical connection for a bus system, characterized in that the bus system is integrated into the retaining frame , wherein the bus system is expanded by an individual line that extends in series through the plug connector modules .
A tool for mounting a roller-band hinge on a frame profile and an associated wing profile , comprising means for fixing the frame profile and the wing profile in a position in which the longitudinal axes of the frame profile and of the wing profile are aligned in parallel, and the frame profile and the wing profile have a preset distance to one another; and means for positioning and fixing, on the frame profile and the wing profile , a drilling template of the roller-band hinge to be mounted, wherein the means for fixing the frame profile and the wing profile comprise a U-shaped clamping apparatus , with which the frame profile and the wing profile can be fixed at the same time, wherein the U-shaped clamping apparatus is composed of two halves , which are connected to one another by a guide , and can be pulled together via a spindle that is operated using a hand wheel , and wherein the U-shaped clamping apparatus comprises at least one support for seating the frame profile and the wing profile , wherein the at least one support has at least one first structure , which is configured for seating a projection of the frame profile , and/or has at least one second structure , which is configured for engaging in a recess of the frame profile such that a displacement of the frame profile transverse to the longitudinal axis of the frame profile is blocked; and has at least one third structure , which is configured for seating a projection of the wing profile , and/or has at least one fourth structure , which is configured for engaging in a recess of the wing profile such that a displacement of the wing profile transverse to the longitudinal axis of the wing profile is blocked; and wherein the at least one support is configured for fixing the frame profile and the wing profile on the at least one support such that the frame profile and the wing profile are aligned parallel to one another and have a preset distance to one another, and wherein the means for positioning and fixing, on the frame profile and the wing profile a drilling template of the roller-band hinge to be mounted comprise at least one drilling jig with openings that correspond to the drilling template of the roller-band hinge to be mounted, said drilling jig being configured for being set upon the frame profile and the wing profile , wherein a bottom side of the at least one drilling jig has a spacing element configured for engaging in the intermediate space between the frame profile and the wing profile , and wherein the at least one drilling jig has at least one stop rod that runs parallel to the longitudinal axis of the frame profile arranged on the at least one support and has at least one stop at one end.