Process for the preparation of an IZM-2 zeolite, comprising at least the following steps: i) mixing, in an aqueous medium, at least one zeolite with structure type FAU having a molar ratio SiO 2 (FAU) /Al 2 O 3 (FAU) of greater than or equal to 30, eventually at least one additional source of an oxide XO 2 in a manner such that the molar ratio XO 2 /SiO 2 (FAU) is in the range 0 to 4, at least one nitrogen-containing organic compound R, R being 1,6-bis(methylpiperidinium)hexane dihydroxide, and at least one source of at least one fluoride anion, the mixture having the following molar composition: (XO 2 + SiO 2 (FAU) )/Al 2 O 3 (FAU) in the range 30 to 600, H 2 O/(XO 2 + SiO 2 (FAU) ) in the range 1 to 100, R/(XO 2 + SiO 2 (FAU) ) in the range 0.01 to 0.6, BF/(XO 2 + SiO 2 (FAU) ) in the range 0.005 to 0.75, in which X is one or more tetravalent element(s) selected from the group formed by the following elements: silicon, germanium, and titanium, preferably silicon, SiO 2 (FAU) being the quantity of SiO 2 supplied by the FAU zeolite, and Al 2 O 3 (FAU) being the quantity of Al 2 O 3 supplied by the FAU zeolite, and in which BF is selected from fluorine salts in which B is a cation selected from the cations NH4 + , Na + , K + and Li + , and hydrofluoric acid in aqueous solution, ii) hydrothermal treatment of said mixture obtained from step i) at a temperature in the range 120°C to 200°C for a period in the range 1 day to 10 days, until said IZM-2 zeolite has been formed. i) mixing, in an aqueous medium, at least one zeolite with structure type FAU having a molar ratio SiO 2 (FAU) /Al 2 O 3 (FAU) of greater than or equal to 30, eventually at least one additional source of an oxide XO 2 in a manner such that the molar ratio XO 2 /SiO 2 (FAU) is in the range 0 to 4, at least one nitrogen-containing organic compound R, R being 1,6-bis(methylpiperidinium)hexane dihydroxide, and at least one source of at least one fluoride anion, the mixture having the following molar composition: (XO 2 + SiO 2 (FAU) )/Al 2 O 3 (FAU) in the range 30 to 600, H 2 O/(XO 2 + SiO 2 (FAU) ) in the range 1 to 100, R/(XO 2 + SiO 2 (FAU) ) in the range 0.01 to 0.6, BF/(XO 2 + SiO 2 (FAU) ) in the range 0.005 to 0.75, in which X is one or more tetravalent element(s) selected from the group formed by the following elements: silicon, germanium, and titanium, preferably silicon, SiO 2 (FAU) being the quantity of SiO 2 supplied by the FAU zeolite, and Al 2 O 3 (FAU) being the quantity of Al 2 O 3 supplied by the FAU zeolite, and in which BF is selected from fluorine salts in which B is a cation selected from the cations NH4 + , Na + , K + and Li + , and hydrofluoric acid in aqueous solution, in which X is one or more tetravalent element(s) selected from the group formed by the following elements: silicon, germanium, and titanium, preferably silicon, SiO 2 (FAU) being the quantity of SiO 2 supplied by the FAU zeolite, and Al 2 O 3 (FAU) being the quantity of Al 2 O 3 supplied by the FAU zeolite, and in which BF is selected from fluorine salts in which B is a cation selected from the cations NH4 + , Na + , K + and Li + , and hydrofluoric acid in aqueous solution, ii) hydrothermal treatment of said mixture obtained from step i) at a temperature in the range 120°C to 200°C for a period in the range 1 day to 10 days, until said IZM-2 zeolite has been formed. <EOS>