mhurhangee/patent-ind-claim-en huggingface dataset:
A noise-cancelling headphone comprising: an ear piece comprising: a housing unit having an interior and an exterior; a driver unit attached to the housing unit, the driver unit configured to output sound waves; and a microphone collecting external sounds at the exterior of the housing unit, wherein the housing unit comprises: an accommodating portion accommodating the microphone; and a sound collecting hole establishing communication between the accommodating portion and the exterior of the housing unit, wherein the sound collecting hole is disposed orthogonally to a direction toward which the driver unit outputs the sound waves and above the driver unit when worn by a user, and the sound collecting hole is open toward a direction of a side proximate to a top of a head of the user when worn by the user, wherein a penetrating direction of the sound collecting hole corresponds to a vibration direction of a diaphragm of the microphone . an ear piece comprising: a housing unit having an interior and an exterior; a driver unit attached to the housing unit, the driver unit configured to output sound waves; and a microphone collecting external sounds at the exterior of the housing unit, wherein a housing unit having an interior and an exterior; a driver unit attached to the housing unit, the driver unit configured to output sound waves; and a microphone collecting external sounds at the exterior of the housing unit, wherein the housing unit comprises: an accommodating portion accommodating the microphone; and a sound collecting hole establishing communication between the accommodating portion and the exterior of the housing unit, wherein the sound collecting hole is disposed orthogonally to a direction toward which the driver unit outputs the sound waves and above the driver unit when worn by a user, and the sound collecting hole is open toward a direction of a side proximate to a top of a head of the user when worn by the user, wherein a penetrating direction of the sound collecting hole corresponds to a vibration direction of a diaphragm of the microphone . an accommodating portion accommodating the microphone; and a sound collecting hole establishing communication between the accommodating portion and the exterior of the housing unit, wherein the sound collecting hole is disposed orthogonally to a direction toward which the driver unit outputs the sound waves and above the driver unit when worn by a user, and the sound collecting hole is open toward a direction of a side proximate to a top of a head of the user when worn by the user, wherein a penetrating direction of the sound collecting hole corresponds to a vibration direction of a diaphragm of the microphone .
Method for verifying the calibration of a system for non-destructively testing at least one part , said non-destructive testing system comprising at least one ultrasound probe , characterized in that it comprises successive steps E1 to E3 consisting: E1/ in performing measurements, with the help of the non-destructive testing system , on at least one so-called perfect reflector , said perfect reflector comprising at least one reference defect, in recording the measurements thus performed, and in creating and analysing an ultrasound map of an entry surface of the perfect reflector ; E2/ in defining a virtual ultrasound probe, on the basis of physical data from the ultrasound probe , and associating it with a passband representative of measurements performed in the step E1; and E3/ in modelling a virtual gauge block, representing a part in the material of the part to be tested comprising the reference defects of the perfect reflector , and in creating a virtual map in amplitude and in flight time of a bottom surface of the virtual gauge block, with the help of modelling using as input data characteristics of the part , the virtual probe defined in the step E2 and measurements performed in the step E1, and in analysing said virtual map to deduce characteristics of the calibration of said non-destructive testing system . E1/ in performing measurements, with the help of the non-destructive testing system , on at least one so-called perfect reflector , said perfect reflector comprising at least one reference defect, in recording the measurements thus performed, and in creating and analysing an ultrasound map of an entry surface of the perfect reflector ; E2/ in defining a virtual ultrasound probe, on the basis of physical data from the ultrasound probe , and associating it with a passband representative of measurements performed in the step E1; and E3/ in modelling a virtual gauge block, representing a part in the material of the part to be tested comprising the reference defects of the perfect reflector , and in creating a virtual map in amplitude and in flight time of a bottom surface of the virtual gauge block, with the help of modelling using as input data
Method for manufacturing a spiral spring having a desired stiffness (Ks) and a desired thermal coefficient (βs), designed to equip a mechanical balance-spring resonator of a watch movement or other precision instrument, comprising the steps of: producing a core made of a ceramic material containing the element silicon, measuring a first stiffness (k AM ) of the core and comparing the first measured stiffness (k AM ), relative to a predetermined value (K A ) of the stiffness of the core adapted to the desired stiffness (Ks) of the spiral spring, the core having a first thermoelastic coefficient (β A ); adjusting the section of the core so as to obtain said predetermined value (K A ) of the first stiffness; forming a coating of silicon dioxide on at least one portion of the core , said coating having a thickness (t R ), a second stiffness (k R ) and a second thermoelastic coefficient (β R ) of sign opposite to the first thermoelastic coefficient (β A ); the first stiffness (k A ) of the core and the thickness (t R ) of the coating being defined so that the spring has the desired stiffness (Ks), and the first thermoelastic coefficient (β A ) of the core and the second thermoelastic coefficient (β R ) of the coating being determined so that the spring presents the desired thermal coefficient (βs). producing a core made of a ceramic material containing the element silicon, measuring a first stiffness (k AM ) of the core and comparing the first measured stiffness (k AM ), relative to a predetermined value (K A ) of the stiffness of the core adapted to the desired stiffness (Ks) of the spiral spring, the core having a first thermoelastic coefficient (β A ); adjusting the section of the core so as to obtain said predetermined value (K A ) of the first stiffness; forming a coating of silicon dioxide on at least one portion of the core , said coating having a thickness (t R ), a second stiffness (k R ) and a second thermoelastic coefficient (β R ) of sign opposite to the first thermoelastic coefficient (β A ); the first stiffness (k A ) of the core and the thickness (t R ) of the coating being defined so that the spring has the desired stiffness (Ks), and the first thermoelastic coefficient (β A ) of the core and the second thermoelastic coefficient (β R ) of the coating being determined so that the spring presents the desired thermal coefficient (βs).
A semiconductor device comprising: a substrate ; a first integrated circuit package mounted on the substrate , the first integrated circuit package comprising a first antenna sub-array , wherein the first antenna sub-array has a uniform pitch; a second integrated circuit package mounted on the substrate , the second integrated circuit package comprising a second antenna sub-array , wherein the second antenna sub-array has a uniform pitch; wherein the second integrated circuit package is mounted adjacent to the first integrated circuit package to form a multi-package module having an antenna array formed of the first antenna sub-array and the second antenna sub-array , wherein the antenna array has a uniform pitch that is the same as the pitch of the first antenna sub-array and the second antenna sub-array ; and wherein the first integrated circuit package is connected to the second integrated circuit package on the substrate by a joint, wherein the joint is configured to provide grounding or an electrical connection between the first integrated circuit package and the second integrated circuit package ; wherein the joint comprises an upper portion and a lower portion , wherein: the upper portion is disposed between the first antenna sub-array and the second antenna sub-array and comprises an electrically conductive material ; and the lower portion is disposed adjacent to the substrate and comprises an electrically insulating material . a substrate ; a first integrated circuit package mounted on the substrate , the first integrated circuit package comprising a first antenna sub-array , wherein the first antenna sub-array has a uniform pitch; a second integrated circuit package mounted on the substrate , the second integrated circuit package comprising a second antenna sub-array , wherein the second antenna sub-array has a uniform pitch; wherein the second integrated circuit package is mounted adjacent to the first integrated circuit package to form a multi-package module having an antenna array formed of the first antenna sub-array and the second antenna sub-array , wherein the antenna array has a uniform pitch that is the same as the pitch of the first antenna sub-array and the second antenna sub-array ; and wherein the first integrated circuit package is connected to the second integrated circuit package on the substrate by a joint, wherein the joint is configured to provide grounding or an electrical connection between the first integrated circuit package and the second integrated circuit package ; wherein the joint comprises an upper portion and a lower portion , wherein: the upper portion is disposed between the first antenna sub-array and the second antenna sub-array and comprises an electrically conductive material ; and the lower portion is disposed adjacent to the substrate and comprises an electrically insulating material . the upper portion is disposed between the first antenna sub-array and the second antenna sub-array and comprises an electrically conductive material ; and the lower portion is disposed adjacent to the substrate and comprises an electrically insulating material .
A machine vision system comprising: a processor configured to run a computer program stored in memory that is configured to cause the processor to: receive a distorted image and a homography matrix associated with the distorted image; determine, using a homography decomposition module , a first transform and a second transform that collectively represent the homography matrix, wherein the first transform relates the distorted image to an intermediate image, and the second transform relates the intermediate image to a rectified image, wherein the first transform is constrained to map pixels along a first dimension of the intermediate image to locations along a first dimension of the distorted image, and wherein the first transform is further constrained to map pixels along the first dimension of the intermediate image to equi-distant locations along the first dimension of the distorted image generate, using a homography removal module , the intermediate image by removing the first transform from the distorted image; and generate, using the homography removal module , the rectified image by removing the second transform from the intermediate image. receive a distorted image and a homography matrix associated with the distorted image; determine, using a homography decomposition module , a first transform and a second transform that collectively represent the homography matrix, wherein the first transform relates the distorted image to an intermediate image, and the second transform relates the intermediate image to a rectified image, wherein the first transform is constrained to map pixels along a first dimension of the intermediate image to locations along a first dimension of the distorted image, and wherein the first transform is further constrained to map pixels along the first dimension of the intermediate image to equi-distant locations along the first dimension of the distorted image wherein the first transform relates the distorted image to an intermediate image, and the second transform relates the intermediate image to a rectified image, wherein the first transform is constrained to map pixels along a first dimension of the intermediate image to locations along a first dimension of the distorted image, and wherein the first transform is further constrained to map pixels along the first dimension of the intermediate image to equi-distant locations along the first dimension of the distorted image generate, using a homography removal module , the intermediate image by removing the first transform from the distorted image; and generate, using the homography removal module , the rectified image by removing the second transform from the intermediate image.
A process for separating an alkylation product, which is characterized in that a liquid phase alkylation product from an alkylation reaction unit is introduced into a first heat-exchanger directly or after being pressurized with a pressure pump and heat-exchanged with a vapor phase stream from the column top of a high-pressure fractionating column, then introduced into a second heat-exchanger and further heated to 100°C-180°C, then introduced into the high-pressure fractionating column and subjected to fractionation under a condition of 2.0MPa-6.0MPa, the vapor phase stream from the column top of the high-pressure fractionating column is heat-exchanged with the liquid phase alkylation product to be separated, a liquid phase stream from the column bottom of the high-pressure fractionating column is introduced into a low-pressure fractionating column and subjected to fractionation under a condition of 0.2MPa-1.0MPa, a low-carbon alkane is obtained from the column top of the low-pressure fractionating colum, and a liquid phase stream obtained from the column bottom of the low-pressure fractionating colum is an alkylation oil product; wherein an inter-reboiler is provided to the low-pressure fractionating column, and the vapor phase stream from the column top of the high-pressure fractionating column is heat-exchanged in the first heat-exchanger and then used as the heating source for the inter-reboiler.
A mass spectrometer comprising a sampling interface , the sampling interface being arranged so as to enable the sampling of ions in the mass spectrometer for subsequent spectrometric analysis, the sampling interface comprising an inlet for receiving a quantity of ions from an ion source; a skimmer positioned downstream of the inlet wherein the skimmer comprises an aperture through which the ions pass; and a downstream region downstream of the skimmer for accommodating a gas through which the ions pass; wherein the gas is selected based on its suitability for removing unwanted particles from the ions; and a processing unit; characterized in that a bias voltage potential is provided to the skimmer , such that a corresponding field is provided in at least a portion of the downstream region through which the ions pass, and a pressure sensor is provided in the downstream region , the pressure sensor being arranged to transmit pressure data to the processing unit suitably programmed to process the pressure data and automatically adjust the bias voltage potential, wherein the bias voltage potential provided to the skimmer is selected in accordance with a correlation with the pressure of the gas in the downstream region so as to reduce collisional scatter, and wherein the bias voltage potential is increased with increasing pressure. an inlet for receiving a quantity of ions from an ion source; a skimmer positioned downstream of the inlet wherein the skimmer comprises an aperture through which the ions pass; and a downstream region downstream of the skimmer for accommodating a gas through which the ions pass; wherein the gas is selected based on its suitability for removing unwanted particles from the ions; a bias voltage potential is provided to the skimmer , such that a corresponding field is provided in at least a portion of the downstream region through which the ions pass, and a pressure sensor is provided in the downstream region , the pressure sensor being arranged to transmit pressure data to the processing unit suitably programmed to process the pressure data and automatically adjust the bias voltage potential, wherein the bias voltage potential provided to the skimmer is selected in accordance with a correlation with the pressure of the gas in the downstream region so as to reduce collisional scatter, and wherein the bias voltage potential is increased with increasing pressure.
Base for a modular lamp, comprising: a body provided with at least one support wall , and with at least one first seat for the placement of an element of functional components, wherein said support wall comprises a first surface (3A, 3'A) on which said first seat is provided, and on which said element of functional components is fixed, and a second flat surface (3B, 3'B); characterized in that it comprises a plurality of second seats suitable to house a removable connection member for removably connecting a decorative element ; in that the body comprises at least one lateral wall extending transversally from the support wall from the side on which the first and second seats are provided; the lateral wall surrounding both the first seat and second seats ; and in that said second seats are provided on the first surface (3A, 3'A) of the support wall . a body provided with at least one support wall , and with at least one first seat for the placement of an element of functional components, wherein said support wall comprises a first surface (3A, 3'A) on which said first seat is provided, and on which said element of functional components is fixed, and a second flat surface (3B, 3'B); characterized in that it comprises a plurality of second seats suitable to house a removable connection member for removably connecting a decorative element ; in that the body comprises at least one lateral wall extending transversally from the support wall from the side on which the first and second seats are provided; the lateral wall surrounding both the first seat and second seats ; and in that said second seats are provided on the first surface (3A, 3'A) of the support wall .
A compound of Formula (I): wherein: R 1 and R 2 are independently hydrogen, alkyl, alkoxy, haloalkyl, or halo; X is -O-; Ar is phenyl optionally substituted with one, two, or three substituents independently selected from alkyl, halo, haloalkyl, alkoxy, and hydroxy; A is -CR 3 -, wherein R 3 is hydrogen, alkyl, cyclopropyl, halo, haloalkyl, haloalkoxy, alkoxy, or cyano; Y is bond or alkylene; ring Z is heterocycloamino optionally substituted with one or two substituents independently selected from alkyl, hydroxy, alkoxy, and fluoro; R 5 is a group of formula (i) or (iv): wherein: R a is hydrogen or fluoro; each R b independently is hydrogen or alkyl; and R c is hydrogen; and/or a pharmaceutically acceptable salt thereof. R 1 and R 2 are independently hydrogen, alkyl, alkoxy, haloalkyl, or halo; X is -O-; Ar is phenyl optionally substituted with one, two, or three substituents independently selected from alkyl, halo, haloalkyl, alkoxy, and hydroxy; A is -CR 3 -, wherein R 3 is hydrogen, alkyl, cyclopropyl, halo, haloalkyl, haloalkoxy, alkoxy, or cyano; Y is bond or alkylene; ring Z is heterocycloamino optionally substituted with one or two substituents independently selected from alkyl, hydroxy, alkoxy, and fluoro; R 5 is a group of formula (i) or (iv): R a is hydrogen or fluoro; each R b independently is hydrogen or alkyl; and R c is hydrogen; and/or a pharmaceutically acceptable salt thereof.
A polymerizable composition for a plastic lens, which comprises: a bi- or higher functional isocyanate compound; a bi- or higher functional thiol compound having at least one sulfide bond or at least one ester bond; a catalyst; and a diketone-based low-temperature reaction rate controlling agent, wherein the catalyst comprises a nonhalogenated tin-based catalyst. a bi- or higher functional isocyanate compound; a bi- or higher functional thiol compound having at least one sulfide bond or at least one ester bond; a catalyst; and a diketone-based low-temperature reaction rate controlling agent, wherein the catalyst comprises a nonhalogenated tin-based catalyst.
A method for performing laser marking, comprising: capturing, by a laser marking system , a first image of a region to be laser marked; comparing, by the laser marking system , the first image with a predefined image of a predefined pattern to be laser marked on the region , to compute a first score , wherein the first score indicates amount of marking already present in the region to be laser marked, in relation to the predefined image ; characterized by further comprising: determining, by the laser marking system , a portion that has been missed out of the region to be laser marked based on the first score and co-ordinate data of the predefined pattern, wherein the co-ordinate data of the predefined pattern is stored in a configuration file and used as reference for performing the laser marking; and wherein the portion that has been missed out indicates a part of the predefined pattern that is missed out on the region 102; and modifying, by the laser marking system , the co-ordinate data of the configuration file , relating to the predefined pattern, in the laser marking system based on the portion that has been missed out that is missed out on the region , for performing the laser marking on the region . capturing, by a laser marking system , a first image of a region to be laser marked; comparing, by the laser marking system , the first image with a predefined image of a predefined pattern to be laser marked on the region , to compute a first score , wherein the first score indicates amount of marking already present in the region to be laser marked, in relation to the predefined image ; characterized by further comprising: determining, by the laser marking system , a portion that has been missed out of the region to be laser marked based on the first score and co-ordinate data of the predefined pattern, wherein the co-ordinate data of the predefined pattern is stored in a configuration file and used as reference for performing the laser marking; and wherein the portion that has been missed out indicates a part of the predefined pattern that is missed out on the region 102; and modifying, by the laser marking system , the co-ordinate data of the configuration file , relating to the predefined pattern, in the laser marking system based on the portion that has been missed out that is missed out on the region , for performing the laser marking on the region . determining, by the laser marking system , a portion that has been missed out of the region to be laser marked based on the first score and co-ordinate data of the predefined pattern, wherein the co-ordinate data of the predefined pattern is stored in a configuration file and used as reference for performing the laser marking; and wherein the portion that has been missed out indicates a part of the predefined pattern that is missed out on the region 102; and modifying, by the laser marking system , the co-ordinate data of the configuration file , relating to the predefined pattern, in the laser marking system based on the portion that has been missed out that is missed out on the region , for performing the laser marking on the region .