A supply control system for a plurality of tanks, comprising: a plurality of tanks (110a-110d) for storing a large amount of process material (G) used to manufacture a semiconductor; a main-supply pipe configured to communicate with sub-supply pipes respectively coupled to the plurality of tanks (110a-110d) and to supply process material (G) to a semiconductor manufacturing device ; and a plurality of flow control devices (130a-130d) respectively included in the sub-supply pipes and configured to control a process material (G) flow rate discharged from each of the plurality of tanks (110a-110d); characterized in that the supply control system for a plurality of tanks further comprises: a sensor included in the main-supply pipe and configured to measure in real time the process material (G) flow rate and a process material supply pressure supplied from each of the plurality of tanks (110a-110d) to the semiconductor manufacturing device ; a back-up portion coupled to the main-supply pipe and configured to supplementally discharge the stored process material (G), such that process material (G) is stably supplied to the semiconductor manufacturing device ; and a controller configured to control the plurality of flow control devices (130a-130d) and the back-up portion based on information on the process material flow rate (GF) or information on the process material supply pressure measured by the sensor , such that a set process material flow rate (GF) is supplied to the semiconductor manufacturing device through the main-supply pipe . a plurality of tanks (110a-110d) for storing a large amount of process material (G) used to manufacture a semiconductor; a main-supply pipe configured to communicate with sub-supply pipes respectively coupled to the plurality of tanks (110a-110d) and to supply process material (G) to a semiconductor manufacturing device ; and a plurality of flow control devices (130a-130d) respectively included in the sub-supply pipes and configured to control a process material (G) flow rate discharged from each of the plurality of tanks (110a-110d); characterized in that the supply control system for a plurality of tanks further comprises: a sensor included in the main-supply pipe and configured to measure in real time the process material (G) flow rate and a process material supply pressure supplied from each of the plurality of tanks (110a-110d) to the semiconductor manufacturing device ; a back-up portion coupled to the main-supply pipe and configured to supplementally discharge the stored process material (G), such that process material (G) is stably supplied to the semiconductor manufacturing device ; and a controller configured to control the plurality of flow control devices (130a-130d) and the back-up portion based on information on the process material flow rate (GF) or information on the process material supply pressure measured by the sensor , such that a set process material flow rate (GF) is supplied to the semiconductor manufacturing device through the main-supply pipe . a sensor included in the main-supply pipe and configured to measure in real time the process material (G) flow rate and a process material supply pressure supplied from each of the plurality of tanks (110a-110d) to the semiconductor manufacturing device ; a back-up portion coupled to the main-supply pipe and configured to supplementally discharge the stored process material (G), such that process material (G) is stably supplied to the semiconductor manufacturing device ; and a controller configured to control the plurality of flow control devices (130a-130d) and the back-up portion based on information on the process material flow rate (GF) or information on the process material supply pressure measured by the sensor , such that a set process material flow rate (GF) is supplied to the semiconductor manufacturing device through the main-supply pipe . <EOS>