A vacuum treatment chamber , especially a vacuum plasma treatment chamber, for at least one plate shaped substrate, comprising: • A vacuum recipient (3; 103) with a side wall (5; 105) looping around a central axis (B; B 100 ) and comprising a pumping port (7; 142); • A screen (13; 113) within said vacuum recipient (3; 103) looping around said central axis (B; B 100 ) and along a part of said side wall (5; 105); • A stationary substrate support (11; 132) exposed to the inside of said screen (13; 113) and adapted to support a plate shaped substrate at one of its two-dimensionally extended surfaces and along a support-plane (E) perpendicular to said central axis (B; B 100 ); • At least one substrate-handling opening (25; 125) in said side wall (5; 105) with an opening central axis perpendicular to and intersecting said central axis (B, B 100 ) ; and • At least one substrate handling cut-out (17; 117) in said screen (13; 113), said substrate handling opening (25; 125) and said substrate handling cut-out (17; 117) being mutually aligned and tailored to allow handling of a plate shaped substrate towards and from said substrate support (11; 132) there through; • A drivingly movable screen-shutter (19; 119) drivingly freeing and covering said substrate-handling cut-out (17; 117), said screen having an electrically conductive surface, said screen-shutter having an electrically conductive shutter-surface being in electric contact with said electrically conductive surface of said screen at least when said cut-out is covered by said screen-shutter; said stationary substrate support comprising an electrically conductive support surface for the plate shaped substrate, electrically connected to an RF biasing source connector of said chamber; wherein said screen is electrically connected to a system ground connector of said chamber, via said side-wall; and further comprising a bottom shield looping around said central axis and complementing said screen, said bottom shield being of metal, said screen being, at its bottom rim, in electric contact with said bottom shield as well as with said side wall, characterised in that said bottom shield being otherwise electrically isolated from the other parts of said treatment chamber with the additional exception of being firmly electrically connected to said system ground connector. • A vacuum recipient (3; 103) with a side wall (5; 105) looping around a central axis (B; B 100 ) and comprising a pumping port (7; 142); • A screen (13; 113) within said vacuum recipient (3; 103) looping around said central axis (B; B 100 ) and along a part of said side wall (5; 105); • A stationary substrate support (11; 132) exposed to the inside of said screen (13; 113) and adapted to support a plate shaped substrate at one of its two-dimensionally extended surfaces and along a support-plane (E) perpendicular to said central axis (B; B 100 ); • At least one substrate-handling opening (25; 125) in said side wall (5; 105) with an opening central axis perpendicular to and intersecting said central axis (B, B 100 ) ; and • At least one substrate handling cut-out (17; 117) in said screen (13; 113), • A drivingly movable screen-shutter (19; 119) drivingly freeing and covering said substrate-handling cut-out (17; 117), <EOS>