A hardmask composition comprising: a solvent; at least one of a two-dimensional carbon nanostructure, a zero-dimensional carbon nanostructure, or a derivative thereof; and a structure represented by Formula 1, wherein, in Formula 1, X is C(R 11 ) or N, R 1 to R 8 and R 11 each independently include one of hydrogen, a substituted or unsubstituted C 1 -C 20 alkyl group, a substituted or unsubstituted C 1 -C 20 alkoxy group, a substituted or unsubstituted C 2 -C 20 alkenyl group, a substituted or unsubstituted C 2 -C 20 alkynyl group, a substituted or unsubstituted C 6 -C 20 aryl group, a substituted or unsubstituted C 6 -C 20 aryloxy group, a substituted or unsubstituted C 2 -C 20 heteroaryl group, a substituted or unsubstituted C 2 -C 20 heteroaryloxy group, a substituted or unsubstituted C 2 -C 20 carbocyclic group, a substituted or unsubstituted C 2 -C 20 carbocyclic-oxy group, a substituted or unsubstituted C 2 -C 20 heterocyclic group, a halogen atom, a cyano group, a hydroxyl group, an imide group, a carbonyl group, an epoxy group, a functional group including an epoxy group, -C(=O)R,-C(=O)NH 2 ,-C(=O)OR, -(CH 2 ) n COOH where n is an integer from 1 to 10, or-N(R 9 )(R 10 ), or R 1 and R 2 , R 3 and R 4 , R 5 and R 6 , and R 7 and R 8 are each independently bound to form a ring, R includes one of hydrogen, a C 1 -C 20 alkyl group, a C 2 -C 20 alkenyl group, a C 2 -C 20 alkynyl group, a C 6 -C 20 aryl group, a C 2 -C 20 heteroaryl group, or a C 2 -C 20 heteroaryloxy group, R 9 and R 10 each independently include one of hydrogen, a C 1 -C 20 alkyl group, a C 2 -C 20 alkenyl group, a C 2 -C 20 alkynyl group, a C 6 -C 20 aryl group, a C 2 -C 20 heteroaryl group, or a C 2 -C 20 heteroaryloxy group, and M includes an element from one of Groups 2 to 11 and 14, or an oxide thereof. a solvent; at least one of a two-dimensional carbon nanostructure, a zero-dimensional carbon nanostructure, or a derivative thereof; and a structure represented by Formula 1, wherein, in Formula 1, X is C(R 11 ) or N, R 1 to R 8 and R 11 each independently include one of hydrogen, a substituted or unsubstituted C 1 -C 20 alkyl group, a substituted or unsubstituted C 1 -C 20 alkoxy group, a substituted or unsubstituted C 2 -C 20 alkenyl group, a substituted or unsubstituted C 2 -C 20 alkynyl group, a substituted or unsubstituted C 6 -C 20 aryl group, a substituted or unsubstituted C 6 -C 20 aryloxy group, a substituted or unsubstituted C 2 -C 20 heteroaryl group, a substituted or unsubstituted C 2 -C 20 heteroaryloxy group, a substituted or unsubstituted C 2 -C 20 carbocyclic group, a substituted or unsubstituted C 2 -C 20 carbocyclic-oxy group, a substituted or unsubstituted C 2 -C 20 heterocyclic group, a halogen atom, a cyano group, a hydroxyl group, an imide group, a carbonyl group, an epoxy group, a functional group including an epoxy group, -C(=O)R,-C(=O)NH 2 ,-C(=O)OR, -(CH 2 ) n COOH where n is an integer from 1 to 10, or-N(R 9 )(R 10 ), or R 1 and R 2 , R 3 and R 4 , R 5 and R 6 , and R 7 and R 8 are each independently bound to form a ring, R includes one of hydrogen, a C 1 -C 20 alkyl group, a C 2 -C 20 alkenyl group, a C 2 -C 20 alkynyl group, a C 6 -C 20 aryl group, a C 2 -C 20 heteroaryl group, or a C 2 -C 20 heteroaryloxy group, R 9 and R 10 each independently include one of hydrogen, a C 1 -C 20 alkyl group, a C 2 -C 20 alkenyl group, a C 2 -C 20 alkynyl group, a C 6 -C 20 aryl group, a C 2 -C 20 heteroaryl group, or a C 2 -C 20 heteroaryloxy group, and M includes an element from one of Groups 2 to 11 and 14, or an oxide thereof. <EOS>