An electrostatic chuck comprising: an electrode in a ceramic base ; ; and a surface layer of the electrostatic chuck activated by a voltage in the electrode to form an electric charge that electrostatically clamps a substrate to the electrostatic chuck; wherein the surface layer of the electrostatic chuck comprises a plurality of protrusions , , the protrusions comprising a composition whose morphology is columnar or granular, and whose microstructure is crystalline or amorphous, the protrusions extending to an average height H above the surface layer surrounding the protrusions, the protrusions supporting the substrate upon the protrusions during electrostatic clamping of the substrate; a cross section of the protrusions has a structure with a non-arcuate plateau shaped top surface , an edge surface , and a side surface ; wherein the non-arcuate plateau shaped top surface of the protrusions has a surface roughness R a of 1 micrometer or less and has a length L in micrometers that is characterized by a flatness parameter Δ in micrometers such that a value of (Δ ∗ 100)/L is less than 0.01; the edge surface of the protrusion is between the top surface and the side surface of the protrusion and has an edge surface profile that lies on or within a quadrant or portion thereof of an ellipse, the minor axis Y of the ellipse intersecting a portion of the top surface of the protrusion wherein the value of (Δ ∗ 100)/L is equal to or greater than 0.01, and the minor axis apex of the ellipse lying along the top surface of the protrusion, the value of Y/2 is 0.5 micrometer or less; the major axis X of the ellipse is substantially parallel to the top surface or surface layer of the protrusion and the value of X/2 is between 25 micrometers and 250 micrometers; and the side surface of the protrusions connects the edge surface and the surface layer of the electrostatic chuck. an electrode in a ceramic base ; ; and a surface layer of the electrostatic chuck activated by a voltage in the electrode to form an electric charge that electrostatically clamps a substrate to the electrostatic chuck; wherein the surface layer of the electrostatic chuck comprises a plurality of protrusions , , the protrusions comprising a composition whose morphology is columnar or granular, and whose microstructure is crystalline or amorphous, the protrusions extending to an average height H above the surface layer surrounding the protrusions, the protrusions supporting the substrate upon the protrusions during electrostatic clamping of the substrate; a cross section of the protrusions has a structure with a non-arcuate plateau shaped top surface , an edge surface , and a side surface ; wherein the non-arcuate plateau shaped top surface of the protrusions has a surface roughness R a of 1 micrometer or less and has a length L in micrometers that is characterized by a flatness parameter Δ in micrometers such that a value of (Δ ∗ 100)/L is less than 0.01; the edge surface of the protrusion is between the top surface and the side surface of the protrusion and has an edge surface profile that lies on or within a quadrant or portion thereof of an ellipse, the minor axis Y of the ellipse intersecting a portion of the top surface of the protrusion wherein the value of (Δ ∗ 100)/L is equal to or greater than 0.01, and the minor axis apex of the ellipse lying along the top surface of the protrusion, the value of Y/2 is 0.5 micrometer or less; the major axis X of the ellipse is substantially parallel to the top surface or surface layer of the protrusion and the value of X/2 is between 25 micrometers and 250 micrometers; and the side surface of the protrusions connects the edge surface and the surface layer of the electrostatic chuck. <EOS>