mhurhangee/patent-ind-claim-en huggingface dataset:
A deposition system for depositing silica particles onto a workpiece comprising: - a first set of chemical deposition burners for depositing silica particles onto a first portion of the workpiece , the first set of chemical deposition burners having a first chemical deposition burner and second chemical deposition burner ; - a second set of chemical deposition burners for depositing silica particles onto a second portion of the workpiece , the second set of chemical deposition burners having a third chemical deposition burner and a fourth chemical deposition burner ; and - a lathe for holding the workpiece and for rotating the workpiece relative to the first set of chemical deposition burners and second set of chemical deposition burners ; wherein the first and second portions of the workpiece overlap each other at an overlap segment onto which one chemical deposition burner from each set deposits silica particles, and wherein the longest distance between chemical deposition burners within any set is less than the shortest distance between chemical deposition burners in different sets, and wherein in the deposition process the chemical deposition burners remain at fixed distances from each other while traversing the workpiece between a left-end portion and a right end portion, characterized in that in the deposition process when the chemical deposition burners traverse the workpiece between the left end portion and the right-end portion, at any point of the workpiece two burners deposit silica soot on the workpiece , except at the ends of the workpiece, where at the left end-portion only the leftmost burner will deposit silica soot and at the right end-portion only the rightmost burner will deposit silica soot. - a first set of chemical deposition burners for depositing silica particles onto a first portion of the workpiece , the first set of chemical deposition burners having a first chemical deposition burner and second chemical deposition burner ; - a second set of chemical deposition burners for depositing silica particles onto a second portion of the workpiece , the second set of chemical deposition burners having a third chemical deposition burner and a fourth chemical deposition burner ; and - a lathe for holding the workpiece and for rotating the workpiece relative to the first set of chemical deposition burners and second set of chemical deposition burners ;
A sliding member , comprising: a base material ; and a surface layer which is provided on the base material , contains a fluororesin and has a sliding surface, the sliding member further comprising, between the surface layer and the base material , an intermediate layer containing a fiber sheet , characterised in that the intermediate layer contains a fluororesin in gaps between fibers of the fiber sheet on the surface layer side, and contains a thermoplastic resin other than a fluororesin in gaps between fibers of the fiber sheet on the base material side. a base material ; and a surface layer which is provided on the base material , contains a fluororesin and has a sliding surface, the sliding member further comprising, between the surface layer and the base material , an intermediate layer containing a fiber sheet , characterised in that the intermediate layer contains a fluororesin in gaps between fibers of the fiber sheet on the surface layer side, and contains a thermoplastic resin other than a fluororesin in gaps between fibers of the fiber sheet on the base material side.
An ophthalmic surgical microscope , comprising: a movable optical element positioned in an optical pathway of light reflected from a surgical field, the movable optical element being configured to oscillate in a direction along the optical pathway; an actuator coupled to the movable optical element and configured to move the movable optical element in response to a control signal; and a computing device in communication with the actuator and configured to generate the control signal to move the movable optical element an image sensor positioned in the optical pathway such that the movable optical element is disposed between the surgical field and the image sensor and configured to receive the light reflected from the surgical field, characterized in that the surgical microscope further comprises a sensor configured to sense a z-axis position of the optical element; and the computing device further configured to process image data generated from the received reflected light by selecting in-focus image data associated with plurality of focal planes, wherein selecting in-focus image data includes associating the image data with positions of the movable optical element during oscillation, selecting in-focus positions of the image data based on the positions of the movable optical element and overlaying the in-focus image data to generate the processed image data. a movable optical element positioned in an optical pathway of light reflected from a surgical field, the movable optical element being configured to oscillate in a direction along the optical pathway; an actuator coupled to the movable optical element and configured to move the movable optical element in response to a control signal; and a computing device in communication with the actuator and configured to generate the control signal to move the movable optical element an image sensor positioned in the optical pathway such that the movable optical element is disposed between the surgical field and the image sensor and configured to receive the light reflected from the surgical field, characterized in that the surgical microscope further comprises a sensor configured to sense a z-axis position of the optical element; and the computing device further configured to process image data generated from the received reflected light by selecting in-focus image data associated with plurality of focal planes, wherein selecting in-focus image data includes associating the image data with positions of the movable optical element during oscillation, selecting in-focus positions of the image data based on the positions of the movable optical element and overlaying the in-focus image data to generate the processed image data.
An elevator car destination dispatching system , comprising: a user interface configured to permit a plurality of users to enter a desired destination in a building; a presence detector disposed in the vicinity of the user interface and configured to detect the presence of a first user of the plurality of users at the user interface , the presence detector operably coupled to at least one of a controller or the user interface ; and the controller operably coupled to the user interface, the controller configured to dispatch an elevator car based on a first desired destination entered by the first user and the detected presence of the first user, wherein the controller is configured to detect a second desired destination entered by a second user of the plurality of users, determine if the second desired destination is identical to the first desired destination, and, using the presence detector , determine whether the second user and first user are the same user, characterised in that the controller is configured to ignore the second desired destination if the second desired destination is identical to the first desired destination and the second user and first user are the same user, and / or wherein the controller is configured to inquire of the second user if they would like to change their destination request if the second user and the first user are the same user and the second desired destination is different from the first desired destination. a user interface configured to permit a plurality of users to enter a desired destination in a building; a presence detector disposed in the vicinity of the user interface and configured to detect the presence of a first user of the plurality of users at the user interface , the presence detector operably coupled to at least one of a controller or the user interface ; and the controller operably coupled to the user interface, the controller configured to dispatch an elevator car based on a first desired destination entered by the first user and the detected presence of the first user, wherein the controller is configured to detect a second desired destination entered by a second user of the plurality of users, determine if the second desired destination is identical to the first desired destination, and, using the presence detector , determine whether the second user and first user are the same user, characterised in that the controller is configured to ignore the second desired destination if the second desired destination is identical to the first desired destination and the second user and first user are the same user, and / or wherein the controller is configured to inquire of the second user if they would like to change their destination request if the second user and the first user are the same user and the second desired destination is different from the first desired destination.
A product package comprising a receiving space , a covering film , an inner lining and a body part created by folding out of a single blank, the body part comprising walls , a bottom and a rim portion as well as a plurality of slots for shaping the receiving space , wherein the rim portion of the body part is a continuous, seamless and planar portion interconnecting the walls of the body part characterised in that the rim portion is created out of the single blank the outer edges of which constitute the outer edges of the rim portion of the product package and in that the body part of the product package does not have sections with superimposed material.
A process for preparing a primary sludge, to be used in the manufacture of cellulosic ethanol or to be used in the manufacture of recycled linerboard, from industrial water effluent from a pulp mill or pulp and paper mill, including the step of treating the effluent with a chemical composition comprising benzalkonium chloride; sodium hypochlorite; and oxitetracycline.
A method for manufacturing a nonwoven sheet , comprising: (a) providing a precursor sheet; and (b) concurrently activating and bonding the precursor sheet to obtain the nonwoven sheet, wherein the activating comprises passing the precursor sheet between a pair of activation rollers having a plurality of meshing ribs and grooves arranged in parallel on their collaborating surfaces, thereby stretching the precursor sheet in a direction perpendicular to the orientation of the ribs and grooves , and wherein the bonding comprises an embossing of bonding points into the precursor sheet while it is stretched, the embossing being effected by embossing projections that are arranged along the crests of the ribs and/or grooves on the activation roller surfaces. (a) providing a precursor sheet; and (b) concurrently activating and bonding the precursor sheet to obtain the nonwoven sheet, wherein the activating comprises passing the precursor sheet between a pair of activation rollers having a plurality of meshing ribs and grooves arranged in parallel on their collaborating surfaces, thereby stretching the precursor sheet in a direction perpendicular to the orientation of the ribs and grooves , and wherein the bonding comprises an embossing of bonding points into the precursor sheet while it is stretched, the embossing being effected by embossing projections that are arranged along the crests of the ribs and/or grooves on the activation roller surfaces. wherein the activating comprises passing the precursor sheet between a pair of activation rollers having a plurality of meshing ribs and grooves arranged in parallel on their collaborating surfaces, thereby stretching the precursor sheet in a direction perpendicular to the orientation of the ribs and grooves , and wherein the bonding comprises an embossing of bonding points into the precursor sheet while it is stretched, the embossing being effected by embossing projections that are arranged along the crests of the ribs and/or grooves on the activation roller surfaces.
Process of obtaining a nanostructured complex (CFl-1), CHARACTERIZED in that it is by chemical synthesis, comprising the following steps: (a) Preparing ammonium phosphate dibasic [(NH 4 ) 2 HPO 4 ] in situ in the presence of ammonia and orthophosphoric acid, in a mechanical homogenizer with minimum power of 500 W, at a temperature range between 25 and 55 °C up to neutralization; (b) Mixing two salts: magnesium chloride, at 1-3% by mass and ammonium phosphate dibasic obtained in step (a) at concentration of 1-4% by mass between 22 and 30 °C and pH 5-7 in a mechanical homogenizer with minimum power of 500 W in a variable rotation range between 7000 and 15000 rpm; (c) Applying a pressure level to the mixture obtained in step (b) in a high pressure homogenizer with the homogenization valve with variable pressure between 400 and 700 bar and in the second stage, the homogenizing valve with variable pressure between 50 and 70 bar for up to 1 to 3 cycles; (d) Cooling the suspension obtained at step (c) at a temperature range comprised between 0 and 20 °C; (e) Precipitating; and (f) Washing the crystals with distilled and sterile water and drying at a temperature range between 30 and 40 °C in a time interval between 24 and 72 hours. (a) Preparing ammonium phosphate dibasic [(NH 4 ) 2 HPO 4 ] in situ in the presence of ammonia and orthophosphoric acid, in a mechanical homogenizer with minimum power of 500 W, at a temperature range between 25 and 55 °C up to neutralization; (b) Mixing two salts: magnesium chloride, at 1-3% by mass and ammonium phosphate dibasic obtained in step (a) at concentration of 1-4% by mass between 22 and 30 °C and pH 5-7 in a mechanical homogenizer with minimum power of 500 W in a variable rotation range between 7000 and 15000 rpm; (c) Applying a pressure level to the mixture obtained in step (b) in a high pressure homogenizer with the homogenization valve with variable pressure between 400 and 700 bar and in the second stage, the homogenizing valve with variable pressure between 50 and 70 bar for up to 1 to 3 cycles; (d) Cooling the suspension obtained at step (c) at a temperature range comprised between 0 and 20 °C; (e) Precipitating; and (f) Washing the crystals with distilled and sterile water and drying at a temperature range between 30 and 40 °C in a time interval between 24 and 72 hours.
Light shaft assembly , in particular for arrangement in front of a cellar window on a house wall of a building, having a light shaft , which has a shaft wall element having a U-shaped or arcuate cross section, and a base element which closes off the shaft wall element downwards, a heat insulation element , which is applied to end faces of the shaft wall element and base element , a sealing element , which is arranged on that side of the heat insulation element which faces away from the shaft wall element and the base element , and a capillary blocking element , which is composed of a waterproof and deformable material and which has a light-shaft-side portion which is connected to the heat insulation element , characterized in that the light-shaft-side portion of the capillary blocking element extends in the shaft wall element and base element , and the capillary blocking element is formed continuously along the connecting region between the shaft wall element and base element to the heat insulation element . a light shaft , which has a shaft wall element having a U-shaped or arcuate cross section, and a base element which closes off the shaft wall element downwards, a heat insulation element , which is applied to end faces of the shaft wall element and base element , a sealing element , which is arranged on that side of the heat insulation element which faces away from the shaft wall element and the base element , and a capillary blocking element , which is composed of a waterproof and deformable material and which has a light-shaft-side portion which is connected to the heat insulation element , characterized in that the light-shaft-side portion of the capillary blocking element extends in the shaft wall element and base element , and the capillary blocking element is formed continuously along the connecting region between the shaft wall element and base element to the heat insulation element .
A method, by a processor, for testing networked systems in an Internet of Things, loT, environment, comprising: receiving one or more control parameters and information relating to a simulation environment ; testing, as a Testing as a Service, TaaS, in the simulation environment, one or more real entities associated with a network system and one or more simulated entities associated with the network system according to the one or more control parameters , wherein the number of simulated entities under test is adjusted in real-time according to real-time information received from the one or more real entities; and estimating one or more properties of the one or more entities, the network system, or combination thereof based on the testing of the one or more simulated entities , wherein real-time data from a real entity affects the behaviour of a simulated entity. receiving one or more control parameters and information relating to a simulation environment ; testing, as a Testing as a Service, TaaS, in the simulation environment, one or more real entities associated with a network system and one or more simulated entities associated with the network system according to the one or more control parameters , wherein the number of simulated entities under test is adjusted in real-time according to real-time information received from the one or more real entities; and estimating one or more properties of the one or more entities, the network system, or combination thereof based on the testing of the one or more simulated entities , wherein real-time data from a real entity affects the behaviour of a simulated entity.
A compound for an organic optoelectronic device represented by Chemical Formula 1: wherein, in Chemical Formula 1, Ar 1 is a substituted or unsubstituted C6 to C18 aryl group, L 1 is a substituted or unsubstituted C6 to C20 arylene group, a substituted or unsubstituted C2 to C20 heteroarylene group, or a combination thereof, and L 2 is a single bond or a substituted or unsubstituted phenylene group. Ar 1 is a substituted or unsubstituted C6 to C18 aryl group, L 1 is a substituted or unsubstituted C6 to C20 arylene group, a substituted or unsubstituted C2 to C20 heteroarylene group, or a combination thereof, and L 2 is a single bond or a substituted or unsubstituted phenylene group.
An orthopedic support comprising: a flexible main brace body comprising first and second opposing sides, a proximal edge , a distal edge , and two lateral edges , the brace body consisting essentially of a unitary sheet of elastomeric thermoset material, the unitary sheet thermoformed to at least partially encircle and generally conform to a joint of a wearer, wherein the brace body includes an inner surface and an exterior surface , wherein the brace body includes a plurality of engineered apertures extending through the sheet from the exterior surface to the inner surface , and wherein the unitary sheet comprises a recessed area disposed proximate to each of the lateral edges , the recessed areas disposed on an inner surface of the body extending along the longitudinal axis of the brace body between the proximal and distal edges , wherein the recessed areas further comprise undercut regions. a flexible main brace body comprising first and second opposing sides, a proximal edge , a distal edge , and two lateral edges , the brace body consisting essentially of a unitary sheet of elastomeric thermoset material, the unitary sheet thermoformed to at least partially encircle and generally conform to a joint of a wearer, wherein the brace body includes an inner surface and an exterior surface , wherein the brace body includes a plurality of engineered apertures extending through the sheet from the exterior surface to the inner surface , and wherein the unitary sheet comprises a recessed area disposed proximate to each of the lateral edges , the recessed areas disposed on an inner surface of the body extending along the longitudinal axis of the brace body between the proximal and distal edges , wherein the recessed areas further comprise undercut regions.
Resin line with circumferential-side openings and an enveloping made of flow aid material , in which the flow aid material is placed around the resin line such that the tabs of the flow aid material projecting over the resin line form a double-layer web in the region of which the tabs are connected to one another and adjoining the web at the end facing away from the resin line is a section angled for such purpose, characterised in that one or both tabs in a section adjoining the web are placed in one or two loops which form the angled section/s .
A method of forming a semiconductor structure comprising: forming a device layer on an initial substrate ; attaching an exposed surface of the device layer to a temporary substrate ; forming a high resistivity layer , wherein forming the high resistivity layer comprises removing a portion of the initial substrate by thinning, thus leaving a remaining portion of the initial substrate , forming a plurality of vias extending through the remaining portion , and forming a high resistivity material over the plurality of vias for filling those vias , wherein the high resistivity material has an electrical resistivity greater than 10,000 Ohm.cm ; attaching a final substrate to the high resistivity layer ; and removing the temporary substrate . forming a device layer on an initial substrate ; attaching an exposed surface of the device layer to a temporary substrate ; forming a high resistivity layer , wherein forming the high resistivity layer comprises removing a portion of the initial substrate by thinning, thus leaving a remaining portion of the initial substrate , forming a plurality of vias extending through the remaining portion , and forming a high resistivity material over the plurality of vias for filling those vias , wherein the high resistivity material has an electrical resistivity greater than 10,000 Ohm.cm ; attaching a final substrate to the high resistivity layer ; and removing the temporary substrate .