A negative working, aqueous base developable, photosensitive photoresist composition comprising: a) a polymer containing the four repeat units of structures , , , and , but no other types of repeat units wherein, v, x, y and z, respectively, represent the mole % of each repeat unit of structures , , and in the polymer, and further wherein, v ranges from 20 to 40 mole %, x ranges from 20 to 60 mole %, y ranges from 5 to 20 mole %, z ranges from 3 to 20 mole % and, further wherein, R 1 , R 2 , R 3 , and R 4 , are independently selected from the group consisting of H and CH 3 , and R 5 is a C 1 to C 4 alkyl moiety, and further still, wherein the summation of the mole % v, x, y and z, must add up to 100 mole %; b) a radical photo-initiator component, which is comprised of at least one radical photo initiator which is activated by a broad absorption of radiation from 360 nm to 440 nm, and further wherein, the wt. ratio of total wt. of said crosslinker component c) as defined below over total wt. of said radical photo-initiator component b) is from 9 to 40; c) a crosslinker component selected either from, a mixture of crosslinkers structure , and , or a single crosslinker of structure , wherein, R 6 , R 7 , R 8 , R 10 are independently selected from H or methyl, and R 9 is selected from methyl or ethyl, and further wherein, the wt. ratio of total wt. of said crosslinker component c) to total wt. of said polymer a), ranges from 0.71 up to 1.2; d) a radical inhibitor component containing at least one radical inhibitor; e) an optional surfactant component containing at least one surfactant material; f) an optional dissolution promoter component; and g) a solvent; and further wherein, the composition is free of colorants, pigments, lake pigments, organic particles, inorganic particles, metal oxide particles, metal particles, composite oxide particles, metal sulfide particles, metal nitride particles, metal acid nitride particles, inorganic salt particles, organic salt particles, colloidal particles, fibers, oxiranes, oxiranes based crosslinkers, polysiloxane polymers. a) a polymer containing the four repeat units of structures , , , and , but no other types of repeat units wherein, v, x, y and z, respectively, represent the mole % of each repeat unit of structures , , and in the polymer, and further wherein, v ranges from 20 to 40 mole %, x ranges from 20 to 60 mole %, y ranges from 5 to 20 mole %, z ranges from 3 to 20 mole % and, further wherein, R 1 , R 2 , R 3 , and R 4 , are independently selected from the group consisting of H and CH 3 , and R 5 is a C 1 to C 4 alkyl moiety, and further still, wherein the summation of the mole % v, x, y and z, must add up to 100 mole %; b) a radical photo-initiator component, which is comprised of at least one radical photo initiator which is activated by a broad absorption of radiation from 360 nm to 440 nm, and further wherein, the wt. ratio of total wt. of said crosslinker component c) as defined below over total wt. of said radical photo-initiator component b) is from 9 to 40; c) a crosslinker component selected either from, a mixture of crosslinkers structure , and , or a single crosslinker of structure , wherein, R 6 , R 7 , R 8 , R 10 are independently selected from H or methyl, and R 9 is selected from methyl or ethyl, and further wherein, the wt. ratio of total wt. of said crosslinker component c) to total wt. of said polymer a), ranges from 0.71 up to 1.2; d) a radical inhibitor component containing at least one radical inhibitor; e) an optional surfactant component containing at least one surfactant material; f) an optional dissolution promoter component; and g) a solvent; and <EOS>