A chemical mechanical polishing composition useful for processing a tungsten-containing surface, comprising: liquid carrier, and abrasive particles dispersed in the liquid carrier, characterized in that the composition additionally comprises cyclodextrin selected from alpha-, beta-, gamma-cyclodextrin, or a combination thereof, and cationic surfactant having a cation and a hydrophobic tail that extends from the cation and that includes a chain comprising at least 7 carbon atoms, the cationic surfactant being capable of forming a complex with the cyclodextrin in the slurry, the cationic surfactant having the formula II: wherein X is P + or N + R 1 is an alkyl group having from 8 to 20 carbon atoms, each R 3 , R 4 , R 5 , R 6 , and R 7 is independently an alkyl group having from 1 to 5 carbon atoms, and Z is a divalent linking group having from 1 to 5 carbon atoms; or the formula III: wherein n is at least 1, X is P + , R 1 is a straight or branched alkyl group that contains at least 7 carbon atoms, and R 8 , R 9 , R 10 , R 11 , and R 12 can be independently selected from: hydrogen, a saturated or unsaturated cyclic group that may be substituted or unsubstituted, and a linear or branched alkyl group that may optionally include one or more of unsaturation, a heteroatom, or charged group; or being selected from N,N'-dioctyl 4,4'-bipyridinium (DOBPB), C16-N-alkyl pyridinium (N-hexadecyl pyridinium), and 1-Heptyl-4-(4-pyridyl)pyridinium bromide (HPPB); and wherein the abrasive particles are silica abrasive particles having a positive charge of at least 6 millivolts (mV) in the slurry at a pH of from 1 to 6. liquid carrier, and abrasive particles dispersed in the liquid carrier, cyclodextrin selected from alpha-, beta-, gamma-cyclodextrin, or a combination thereof, and cationic surfactant having a cation and a hydrophobic tail that extends from the cation and that includes a chain comprising at least 7 carbon atoms, the cationic surfactant being capable of forming a complex with the cyclodextrin in the slurry, the cationic surfactant having the formula II: wherein X is P + or N + R 1 is an alkyl group having from 8 to 20 carbon atoms, each R 3 , R 4 , R 5 , R 6 , and R 7 is independently an alkyl group having from 1 to 5 carbon atoms, and Z is a divalent linking group having from 1 to 5 carbon atoms; or the formula III: wherein n is at least 1, X is P + , R 1 is a straight or branched alkyl group that contains at least 7 carbon atoms, and R 8 , R 9 , R 10 , R 11 , and R 12 can be independently selected from: hydrogen, a saturated or unsaturated cyclic group that may be substituted or unsubstituted, and a linear or branched alkyl group that may optionally include one or more of unsaturation, a heteroatom, or charged group; or being selected from N,N'-dioctyl 4,4'-bipyridinium (DOBPB), C16-N-alkyl pyridinium (N-hexadecyl pyridinium), and 1-Heptyl-4-(4-pyridyl)pyridinium bromide (HPPB); and wherein the abrasive particles are silica abrasive particles having a positive charge of at least 6 millivolts (mV) in the slurry at a pH of from 1 to 6. hydrogen, a saturated or unsaturated cyclic group that may be substituted or unsubstituted, and a linear or branched alkyl group that may optionally include one or more of unsaturation, a heteroatom, or charged group; or being selected from N,N'-dioctyl 4,4'-bipyridinium (DOBPB), C16-N-alkyl pyridinium (N-hexadecyl pyridinium), and 1-Heptyl-4-(4-pyridyl)pyridinium bromide (HPPB); and wherein the abrasive particles are silica abrasive particles having a positive charge of at least 6 millivolts (mV) in the slurry at a pH of from 1 to 6. <EOS>