Method of fabricating a layer assembly comprising the steps of: - arranging a first layer on top of a carrier ; - arranging a second layer on top of the first layer, to provide the first layer as a buried first layer; - removing a portion of the second layer and a portion of the first layer below the portion of the second layer to expose an outer section of the buried first layer with side facets to provide a mesa structure that includes the buried first layer and the second layer, the mesa structure having an outer surface formed by the side facets; further characterized by - locally modifying a material of the buried first layer to provide at least one modified outer section in the first layer, wherein the modified material changes and induces mechanical strain in a portion of the second layer which is arranged above the at least one modified outer section; - after locally modifying the material of the buried first layer, depositing a third material for forming at least one a nanostructure on top of the second layer, at least one characteristic of the third material being sensitive to the local mechanical strain in the second layer; wherein the at least modified outer section is provided by applying at least one chemical to the exposed outer section of the buried first layer, prior to depositing the strain-sensitive third material; wherein the at least one nanostructure is formed on top of the second layer in an area, which is located above an unmodified section of the first layer, by depositing the strain-sensitive third material on the locally strained second layer; wherein said chemical modifies the material of the buried first layer in the exposed outer section adjacent to the outer surface of the mesa structure, said modified outer section having, in top view, an inner contour and and outer contour, said modified outer section embracing an inner section of the mesa structure, whereas the material of the buried first layer in the inner section of the mesa structure remains unchanged; wherein the inner contour of the outer section, viewed from the top, has a cornered shape having at least one corner , wherein the at least one nanostructure is formed by a local self-aligning deposition on top of the second layer above said least one corner and in an area, which is located above the inner unmodified section of the first layer, whereby the local deposition results from the local mechanical strain in the at least one corner. - arranging a first layer on top of a carrier ; - arranging a second layer on top of the first layer, to provide the first layer as a buried first layer; - removing a portion of the second layer and a portion of the first layer below the portion of the second layer to expose an outer section of the buried first layer with side facets to provide a mesa structure that includes the buried first layer and the second layer, the mesa structure having an outer surface formed by the side facets; further characterized by - locally modifying a material of the buried first layer to provide at least one modified outer section in the first layer, wherein the modified material changes and induces mechanical strain in a portion of the second layer which is arranged above the at least one modified outer section; - after locally modifying the material of the buried first layer, depositing a third material for forming at least one a nanostructure on top of the second layer, at least one characteristic of the third material being sensitive to the local mechanical strain in the second layer; <EOS>