Method of preparing a tufting process, comprising the steps of: a) providing a pattern representation (PR) representative of a fabric to be tufted, b) providing at least one group (G T ) of tufting aspect instruction layers (TL 1 , TL 2 ) comprising tufting aspect instruction layers (TL 1 , TL 2 ), each one of the tufting aspect instruction layers (TL 1 , TL 2 ) being associated with one particular tufting aspect instruction (I 1 , I 2 ) referring to a tufting aspect (A 1 , A 2 ) and constituting an entity of information representing those areas of the pattern representation at which the one particular tufting aspect instruction is intended to occur, c) assigning at least one tufting aspect instruction (I 1 , I 2 ) to at least one of the tufting aspect instruction layers (TL 1 , TL 2 ), wherein a first tufting aspect (A 1 ) is the pile height (H, h) and wherein a first tufting aspect instruction (I 1 ) referring to the first tufting aspect (A 1 ) indicates the height (H, h) of a pile to be tufted as being one of at least two different pile heights (H, h), each tufting aspect instruction layer (TL 1 , TL 2 ) of a first group (G T ) of tufting aspect instruction layers (TL 1 , TL 2 ) representing areas of the pattern representation (PR) having the same first tufting aspect instruction (I 1 ) indicating one of the at least two different pile heights (H, h) associated therewith, and/or wherein a second tufting aspect (A 2 ) is the pile type (L) and wherein a second tufting aspect instruction (I 2 ) referring to the second tufting aspect (A 2 ) indicates the type (L) of a pile to be tufted as being a loop or a cut pile, each tufting aspect instruction layer of a second group of tufting aspect instruction layers representing areas of the pattern representation (PR) having the same second tufting aspect instruction (I 2 ) indicating a loop or a cut pile associated therewith. a) providing a pattern representation (PR) representative of a fabric to be tufted, b) providing at least one group (G T ) of tufting aspect instruction layers (TL 1 , TL 2 ) comprising tufting aspect instruction layers (TL 1 , TL 2 ), each one of the tufting aspect instruction layers (TL 1 , TL 2 ) being associated with one particular tufting aspect instruction (I 1 , I 2 ) referring to a tufting aspect (A 1 , A 2 ) and constituting an entity of information representing those areas of the pattern representation at which the one particular tufting aspect instruction is intended to occur, c) assigning at least one tufting aspect instruction (I 1 , I 2 ) to at least one of the tufting aspect instruction layers (TL 1 , TL 2 ), wherein a first tufting aspect (A 1 ) is the pile height (H, h) and wherein a first tufting aspect instruction (I 1 ) referring to the first tufting aspect (A 1 ) indicates the height (H, h) of a pile to be tufted as being one of at least two different pile heights (H, h), each tufting aspect instruction layer (TL 1 , TL 2 ) of a first group (G T ) of tufting aspect instruction layers (TL 1 , TL 2 ) representing areas of the pattern representation (PR) having the same first tufting aspect instruction (I 1 ) indicating one of the at least two different pile heights (H, h) associated therewith, and/or wherein a second tufting aspect (A 2 ) is the pile type (L) and wherein a second tufting aspect instruction (I 2 ) referring to the second tufting aspect (A 2 ) indicates the type (L) of a pile to be tufted as being a loop or a cut pile, each tufting aspect instruction layer of a second group of tufting aspect instruction layers representing areas of the pattern representation (PR) having the same second tufting aspect instruction (I 2 ) indicating a loop or a cut pile associated therewith. <EOS>