A sterilization and deodorization apparatus, comprising: a frame that defines an outer appearance of the sterilization and deodorization apparatus; a plasma device disposed at a first side of the frame , adapted to form a plasma region to generate a plurality of ions; a filter disposed at a second side of the frame and spaced apart from the plasma device , wherein the filter includes: a filter frame having a plurality of through-holes adapted to pass air therethrough; and a photocatalyst applied to the filter configured to perform a photocatalytic reaction; and characterized in that the apparatus comprises a light source assembly rotatably coupled to the filter frame , configured to irradiate light onto at least a portion of the filter , wherein the plasma unit comprises first and second substrates , and wherein a predetermined space is provided between the first and second substrates , wherein the first substrate comprises: a first substrate body having a plate shape; at least one first flow hole adapted to pass through the first substrate body to guide a flow of air; and at least one pattern frame disposed to surround at least a portion of the first flow hole , and wherein the second substrate comprises: a second substrate body having a plate shape; and at least one second flow hole adapted to pass through the second substrate body to guide a flow of the air. a frame that defines an outer appearance of the sterilization and deodorization apparatus; a plasma device disposed at a first side of the frame , adapted to form a plasma region to generate a plurality of ions; a filter disposed at a second side of the frame and spaced apart from the plasma device , wherein the filter includes: a filter frame having a plurality of through-holes adapted to pass air therethrough; and a photocatalyst applied to the filter configured to perform a photocatalytic reaction; and characterized in that the apparatus comprises a light source assembly rotatably coupled to the filter frame , configured to irradiate light onto at least a portion of the filter , a filter frame having a plurality of through-holes adapted to pass air therethrough; and a photocatalyst applied to the filter configured to perform a photocatalytic reaction; and characterized in that the apparatus comprises a light source assembly rotatably coupled to the filter frame , configured to irradiate light onto at least a portion of the filter , wherein the plasma unit comprises first and second substrates , and wherein a predetermined space is provided between the first and second substrates , wherein the first substrate comprises: a first substrate body having a plate shape; at least one first flow hole adapted to pass through the first substrate body to guide a flow of air; and at least one pattern frame disposed to surround at least a portion of the first flow hole , and wherein the second substrate comprises: a second substrate body having a plate shape; and at least one second flow hole adapted to pass through the second substrate body to guide a flow of the air. a first substrate body having a plate shape; at least one first flow hole adapted to pass through the first substrate body to guide a flow of air; and at least one pattern frame disposed to surround at least a portion of the first flow hole , and wherein the second substrate comprises: a second substrate body having a plate shape; and at least one second flow hole adapted to pass through the second substrate body to guide a flow of the air. a second substrate body having a plate shape; and at least one second flow hole adapted to pass through the second substrate body to guide a flow of the air. <EOS>