A coated glass pane comprising at least the following layers in sequence: - a glass substrate; - a lower anti-reflection layer; wherein the lower anti-reflection layer comprises, in sequence from the glass substrate, a base layer based on an (oxi)nitride of silicon, an (oxi)nitride of aluminium and/or alloys thereof, an oxide of Ti, and/or an oxide of Zr; and a layer based on an oxide of Zn and Sn and/or an oxide of Sn, and a separation layer based on a metal oxide; and a top layer based on an oxide of Zn; - a silver-based functional layer; - a barrier layer, consisting of the following three partial barrier layers in direct sequence from the silver-based functional layer, ∘ a lower partial barrier layer based on an oxide of Zn, Ti, ZnSn, InSn, Zr, Al, Sn and/or Si, and/or an (oxi)nitride of Si and/or of Al, having a thickness of at most 5 nm and in direct contact with the silver-based functional layer, ∘ a central partial barrier layer based on an oxide of Zn, Ti, ZnSn, InSn, Zr, Al, Sn and/or Si, and/or an (oxi)nitride of Si and/or of Al, having a thickness of at most 5 nm, and ∘ an upper partial barrier layer based on an oxide of Zn, Ti, ZnSn, InSn, Zr, Al, Sn and/or Si, and/or an (oxi)nitride of Si and/or of Al, having a thickness of at most 10 nm; and - an upper anti-reflection layer; wherein the central partial barrier layer has a different composition to both the lower partial barrier layer and the upper partial barrier layer. - a glass substrate; - a lower anti-reflection layer; wherein the lower anti-reflection layer comprises, in sequence from the glass substrate, a base layer based on an (oxi)nitride of silicon, an (oxi)nitride of aluminium and/or alloys thereof, an oxide of Ti, and/or an oxide of Zr; and a layer based on an oxide of Zn and Sn and/or an oxide of Sn, and a separation layer based on a metal oxide; and a top layer based on an oxide of Zn; a base layer based on an (oxi)nitride of silicon, an (oxi)nitride of aluminium and/or alloys thereof, an oxide of Ti, and/or an oxide of Zr; and a layer based on an oxide of Zn and Sn and/or an oxide of Sn, and a separation layer based on a metal oxide; and a top layer based on an oxide of Zn; - a silver-based functional layer; - a barrier layer, consisting of the following three partial barrier layers in direct sequence from the silver-based functional layer, ∘ a lower partial barrier layer based on an oxide of Zn, Ti, ZnSn, InSn, Zr, Al, Sn and/or Si, and/or an (oxi)nitride of Si and/or of Al, having a thickness of at most 5 nm and in direct contact with the silver-based functional layer, ∘ a central partial barrier layer based on an oxide of Zn, Ti, ZnSn, InSn, Zr, Al, Sn and/or Si, and/or an (oxi)nitride of Si and/or of Al, having a thickness of at most 5 nm, and ∘ an upper partial barrier layer based on an oxide of Zn, Ti, ZnSn, InSn, Zr, Al, Sn and/or Si, and/or an (oxi)nitride of Si and/or of Al, having a thickness of at most 10 nm; and ∘ a lower partial barrier layer based on an oxide of Zn, Ti, ZnSn, InSn, Zr, Al, Sn and/or Si, and/or an (oxi)nitride of Si and/or of Al, having a thickness of at most 5 nm and in direct contact with the silver-based functional layer, ∘ a central partial barrier layer based on an oxide of Zn, Ti, ZnSn, InSn, Zr, Al, Sn and/or Si, and/or an (oxi)nitride of Si and/or of Al, having a thickness of at most 5 nm, and ∘ an upper partial barrier layer based on an oxide of Zn, Ti, ZnSn, InSn, Zr, Al, Sn and/or Si, and/or an (oxi)nitride of Si and/or of Al, having a thickness of at most 10 nm; and - an upper anti-reflection layer; <EOS>