Device comprising: illumination means configured to emit a first illumination signal having a first illumination intensity (E 1 ) and a second illumination signal having a second illumination intensity (E 2 ) in the direction of a surface region of an object to be measured , the second illumination intensity (E 2 ) being smaller than the first illumination intensity (E 1 ); sensing means configured to provide a first measurement signal based on a first reflection of the first illumination signal on the surface region , and to provide a second measurement signal based on a second reflection of the second illumination signal on the surface region ; evaluation means configured to combine the first measurement signal and the second measurement signal with each other so as to obtain a combination result from which a position (x 0 /y 0 ) of the first illumination signal on the surface region may be derived, wherein an influence of a reflectance (R) of the surface region within the combination result is reduced as compared to the influence on the first and second measurement signals ; the evaluation means being configured to form a first logarithmized value on the basis of the first measurement signal and to form a second logarithmized value on the basis of the second measurement signal , wherein in the first logarithmized value and in the second logarithmized value, the influence of the reflectance is an addend, so that by subtracting the second logarithmized value from the first logarithmized value in order to obtain the combination result , the influence of the reflectance will be reduced; the first illumination signal and the second illumination signal having an identical wavelength range, so that both signals are equally influenced by the reflectance or reflectivity of the surface region at an identical point in the surface region . illumination means configured to emit a first illumination signal having a first illumination intensity (E 1 ) and a second illumination signal having a second illumination intensity (E 2 ) in the direction of a surface region of an object to be measured , the second illumination intensity (E 2 ) being smaller than the first illumination intensity (E 1 ); sensing means configured to provide a first measurement signal based on a first reflection of the first illumination signal on the surface region , and to provide a second measurement signal based on a second reflection of the second illumination signal on the surface region ; evaluation means configured to combine the first measurement signal and the second measurement signal with each other so as to obtain a combination result from which a position (x 0 /y 0 ) of the first illumination signal on the surface region may be derived, wherein an influence of a reflectance (R) of the surface region within the combination result is reduced as compared to the influence on the first and second measurement signals ; the evaluation means being configured to form a first logarithmized value on the basis of the first measurement signal and to form a second logarithmized value on the basis of the second measurement signal , wherein in the first logarithmized value and in the second logarithmized value, the influence of the reflectance is an addend, so that by subtracting the second logarithmized value from the first logarithmized value in order to obtain the combination result , the influence of the reflectance will be reduced; the first illumination signal and the second illumination signal having an identical wavelength range, so that both signals are equally influenced by the reflectance or reflectivity of the surface region at an identical point in the surface region . <EOS>