A glitter pigment, comprising: a flaky substrate; and a silicon oxide layer and a titanium oxide layer formed in this order on the flaky substrate, wherein the silicon oxide layer and the titanium oxide layer are formed on both a first principal surface and a second principal surface of the flaky substrate, the first principal surface and the second principal surface being opposite to each other, the flaky substrate is a glass flake or an alumina flake, a) in the case where the flaky substrate is the glass flake, the glass flake has a thickness of 284 nm or more and 322 nm or less, the silicon oxide layer has a thickness of 89 nm or more and 109 nm or less, and the titanium oxide layer has a thickness of 51 nm or more and 86 nm or less, b) in the case where the flaky substrate is the alumina flake, the alumina flake has a thickness of 260 nm or more and 280 nm or less, the silicon oxide layer has a thickness of 79 nm or more and 102 nm or less, and the titanium oxide layer has a thickness of 47 nm or more and 87 nm or less, and whitish reflected light is produced by a five-layer optical interference system composed of the titanium oxide layer, the silicon oxide layer, the flaky substrate, the silicon oxide layer, and the titanium oxide layer which are arranged in this order along a thickness direction of the flaky substrate. a flaky substrate; and a silicon oxide layer and a titanium oxide layer formed in this order on the flaky substrate, wherein the silicon oxide layer and the titanium oxide layer are formed on both a first principal surface and a second principal surface of the flaky substrate, the first principal surface and the second principal surface being opposite to each other, the flaky substrate is a glass flake or an alumina flake, a) in the case where the flaky substrate is the glass flake, the glass flake has a thickness of 284 nm or more and 322 nm or less, the silicon oxide layer has a thickness of 89 nm or more and 109 nm or less, and the titanium oxide layer has a thickness of 51 nm or more and 86 nm or less, b) in the case where the flaky substrate is the alumina flake, the alumina flake has a thickness of 260 nm or more and 280 nm or less, the silicon oxide layer has a thickness of 79 nm or more and 102 nm or less, and the titanium oxide layer has a thickness of 47 nm or more and 87 nm or less, and whitish reflected light is produced by a five-layer optical interference system composed of the titanium oxide layer, the silicon oxide layer, the flaky substrate, the silicon oxide layer, and the titanium oxide layer which are arranged in this order along a thickness direction of the flaky substrate. a) in the case where the flaky substrate is the glass flake, the glass flake has a thickness of 284 nm or more and 322 nm or less, the silicon oxide layer has a thickness of 89 nm or more and 109 nm or less, and the titanium oxide layer has a thickness of 51 nm or more and 86 nm or less, b) in the case where the flaky substrate is the alumina flake, the alumina flake has a thickness of 260 nm or more and 280 nm or less, the silicon oxide layer has a thickness of 79 nm or more and 102 nm or less, and the titanium oxide layer has a thickness of 47 nm or more and 87 nm or less, and whitish reflected light is produced by a five-layer optical interference system composed of the titanium oxide layer, the silicon oxide layer, the flaky substrate, the silicon oxide layer, and the titanium oxide layer which are arranged in this order along a thickness direction of the flaky substrate. <EOS>