Composition comprising a)at least one epoxy resin, b)at least one cyclic amine of the formula (I) in which (I) - R 1 to R 4 is H or an organic radical, - with the proviso that at least one of the R 1 , R 2 , R 3 and R 4 radicals = H, and - X = -(Y 1 ) m -(A 1 ) n -(Y 2 ) o -(A 2 ) p -(Y 3 ) q -(A 3 ) r -(Y 4 ) s - (II) where, independently of one another, - m, n, o, p, q, r and s = 0 or 1, - A 1 , A 2 , A 3 = alkylene or alkenylene radical and - Y 1 , Y 2 , Y 3 , Y 4 = NR 5 , PR 5 , O or S, where R 5 independently = organic radical, - where any two organic radicals selected from R 1 to R 5 and any radicals present in the alkylene and/or alkenylene radicals A 1 , A 2 , A 3 may also form one or more further rings, - with the proviso that at least one of the radicals selected from R 1 to R 5 present and any radicals present in the alkylene and/or alkenylene radicals A 1 , A 2 , A 3 is substituted by at least one -NHR 6 or -NH 2 group, where R 6 = organic radical, and c)at least one salt of a strong Brønsted acid having a pK a of not more than 2 with a counterion selected from metal ions, metal-containing ions, phosphonium ions and unsubstituted ammonium ions, where the ratio of the epoxy groups in the epoxy resin to the sum total of all NH groups in all amines is 0.5:1 to 1.5:1. a)at least one epoxy resin, b)at least one cyclic amine of the formula (I) in which (I) - R 1 to R 4 is H or an organic radical, - with the proviso that at least one of the R 1 , R 2 , R 3 and R 4 radicals = H, and - X = -(Y 1 ) m -(A 1 ) n -(Y 2 ) o -(A 2 ) p -(Y 3 ) q -(A 3 ) r -(Y 4 ) s - (II) where, independently of one another, - m, n, o, p, q, r and s = 0 or 1, - A 1 , A 2 , A 3 = alkylene or alkenylene radical and - Y 1 , Y 2 , Y 3 , Y 4 = NR 5 , PR 5 , O or S, where R 5 independently = organic radical, - where any two organic radicals selected from R 1 to R 5 and any radicals present in the alkylene and/or alkenylene radicals A 1 , A 2 , A 3 may also form one or more further rings, - with the proviso that at least one of the radicals selected from R 1 to R 5 present and any radicals present in the alkylene and/or alkenylene radicals A 1 , A 2 , A 3 is substituted by at least one -NHR 6 or -NH 2 group, where R 6 = organic radical, and - R 1 to R 4 is H or an organic radical, - with the proviso that at least one of the R 1 , R 2 , R 3 and R 4 radicals = H, and - X = -(Y 1 ) m -(A 1 ) n -(Y 2 ) o -(A 2 ) p -(Y 3 ) q -(A 3 ) r -(Y 4 ) s - (II) where, independently of one another, - m, n, o, p, q, r and s = 0 or 1, - A 1 , A 2 , A 3 = alkylene or alkenylene radical and - Y 1 , Y 2 , Y 3 , Y 4 = NR 5 , PR 5 , O or S, where R 5 independently = organic radical, - where any two organic radicals selected from R 1 to R 5 and any radicals present in the alkylene and/or alkenylene radicals A 1 , A 2 , A 3 may also form one or more further rings, - with the proviso that at least one of the radicals selected from R 1 to R 5 present and any radicals present in the alkylene and/or alkenylene radicals A 1 , A 2 , A 3 is substituted by at least one -NHR 6 or -NH 2 group, where R 6 = organic radical, and c)at least one salt of a strong Brønsted acid having a pK a of not more than 2 with a counterion selected from metal ions, metal-containing ions, phosphonium ions and unsubstituted ammonium ions, <EOS>