mhurhangee/patent-ind-claim-en huggingface dataset:
A positive electrode active material for nonaqueous electrolyte secondary batteries represented by the general formula : Li a Ni 1-x-y Co x M y W 2 O 2+α (where 0 ≤ x ≤ 0.35, 0 ≤ y <_ 0.35, 0.0008 ≤ z ≤ 0.030, 0.97 ≤ a ≤ 1.25, and 0 ≤ α ≤ 0.20 are satisfied, and M is at least one element selected from Mn, V, Mg, Mo, Nb, Ti, and Al), the positive electrode active material being constituted by a lithium-metal composite oxide and a compound containing lithium and tungsten, the lithium-metal composite oxide being represented by the general formula : Li b Ni 1-x-y Co x M y O 2 (where 0 ≤ x ≤ 0.35, 0 ≤ y ≤ 0.35, and 0.95 ≤ b ≤ 1.20 are satisfied, and M is at least one element selected from Mn, V, Mg, Mo, Nb, Ti, and Al) and composed of primary particles and secondary particles formed by aggregation of the primary particles, the compound containing lithium and tungsten being formed on a surface of the primary particles of the lithium-metal composite oxide, wherein an amount of tungsten contained in the compound containing lithium and tungsten is such that the number of atoms of W is 0.08 to 0.30 at% with respect to the total number of atoms of Ni, Co, and M contained in the positive electrode active material, and a porosity measured in cross-sectional observation of the secondary particles is 0.15 - 0.5%. the lithium-metal composite oxide being represented by the general formula : Li b Ni 1-x-y Co x M y O 2 (where 0 ≤ x ≤ 0.35, 0 ≤ y ≤ 0.35, and 0.95 ≤ b ≤ 1.20 are satisfied, and M is at least one element selected from Mn, V, Mg, Mo, Nb, Ti, and Al) and composed of primary particles and secondary particles formed by aggregation of the primary particles, the compound containing lithium and tungsten being formed on a surface of the primary particles of the lithium-metal composite oxide, wherein an amount of tungsten contained in the compound containing lithium and tungsten is such that the number of atoms of W is 0.08 to 0.30 at% with respect to the total number of atoms of Ni, Co, and M contained in the positive electrode active material, and a porosity measured in cross-sectional observation of the secondary particles is 0.15 - 0.5%.
A composition for subcutaneous injection comprising medroxyprogesterone acetate at a concentration of 360 mg/ml to 440 mg/ml, docusate sodium at a concentration of 1.35 mg/ml to 1.65 mg/ml, polyethylene glycol, and water.
An atomizer comprising a casing , wherein the atomizer further comprising: a cap detachably coupled to the casing , wherein a chamber and an airflow passage are separately defined in the casing and arranged separately, an end of the chamber is an open end and another end of the chamber is a closed end, a sensor is positioned in the chamber , a heating member is positioned in the airflow passage , an air suction port is defined on the cap , the air suction port communicates with both of the open end of the chamber and the airflow passage . a cap detachably coupled to the casing , wherein a chamber and an airflow passage are separately defined in the casing and arranged separately, an end of the chamber is an open end and another end of the chamber is a closed end, a sensor is positioned in the chamber , a heating member is positioned in the airflow passage , an air suction port is defined on the cap , the air suction port communicates with both of the open end of the chamber and the airflow passage .
A semiaromatic copolyamide PA) comprising, in copolymerized form: a) 36 to 50 mol% of terephthalic acid, b) 0 to 14 mol% of isophthalic acid, c) 35 to 42.5 mol% of hexamethylenediamine, d) 7.5 to 15 mol% of at least one cyclic diamine, where the cyclic diamine d) comprises isophoronediamine or consists of isophoronediamine, where components a) to d) together add up to 100 mol%. a) 36 to 50 mol% of terephthalic acid, b) 0 to 14 mol% of isophthalic acid, c) 35 to 42.5 mol% of hexamethylenediamine, d) 7.5 to 15 mol% of at least one cyclic diamine, where the cyclic diamine d) comprises isophoronediamine or consists of isophoronediamine,
A temperature curing method of curing ink on an object, comprising: capturing thermal image data with at least one thermal-imaging sensor comprising an infrared sensor directing at an object that is configured to image thermal image of the object within a field of view ; applying radiant heat with at least one heating element that is configured to generate heat energy with at least one heating element to heat the object; and controlling the at least one heating element in response to said at least one thermal imaging sensor as a function of the thermal radiation of the object detected by the imaging sensor while the object is being heated and controlling said at least one heating element to heat the surface of the object to a particular radiation level, characterized in that said at least one heating element comprises a plurality of heating elements said heating elements are within the field of view of the imaging sensor between the imaging sensor and the object shielding said heating elements from said at least one thermal imaging sensor with a plurality of shields between said at least one thermal imaging sensor and said heating elements. capturing thermal image data with at least one thermal-imaging sensor comprising an infrared sensor directing at an object that is configured to image thermal image of the object within a field of view ; applying radiant heat with at least one heating element that is configured to generate heat energy with at least one heating element to heat the object; and controlling the at least one heating element in response to said at least one thermal imaging sensor as a function of the thermal radiation of the object detected by the imaging sensor while the object is being heated and controlling said at least one heating element to heat the surface of the object to a particular radiation level, characterized in that said at least one heating element comprises a plurality of heating elements said heating elements are within the field of view of the imaging sensor between the imaging sensor and the object shielding said heating elements from said at least one thermal imaging sensor with a plurality of shields between said at least one thermal imaging sensor and said heating elements.
Amorphous or microcrystalline copolyamide (A) comprising at least the following monomers: (a) at least one cycloaliphatic diamine; (b) 0.25 to 4.4 mol% of at least one dimeric fatty acid; and (c) 12 to 49.75 mol% of aromatic dicarboxylic acids selected from the group consisting of isophthalic acid, terephthalic acid and naphthalenedicarboxylic acid, wherein the proportion of isophthalic acid is 7 to 44 mol%,and (d) 0 to 37.75 mol% of at least one aliphatic dicarboxylic acid; wherein the molar proportion of isophthalic acid is at least equal to the molar proportion of terephthalic acid, and wherein the monomers (b), (c) and optionally (d) add up to 50 mol% and the molar proportions of all the monomers present in the copolyamide (A) add up to 100 mol%. (a) at least one cycloaliphatic diamine; (b) 0.25 to 4.4 mol% of at least one dimeric fatty acid; and (c) 12 to 49.75 mol% of aromatic dicarboxylic acids selected from the group consisting of isophthalic acid, terephthalic acid and naphthalenedicarboxylic acid, wherein the proportion of isophthalic acid is 7 to 44 mol%,and (d) 0 to 37.75 mol% of at least one aliphatic dicarboxylic acid;
A thruster system for use in a spacecraft, the thruster system comprising: a microwave source; a resonant cavity coupled to the microwave source, wherein the microwave source is configured to generate a standing wave field in the resonant cavity; a nozzle provided at one end of the resonant cavity; at least one injector configured to inject propellant into the resonant cavity so as to create a rotating circumferential flow; and an annular structure extending into the resonant cavity to support the at least one injector, wherein the annular structure determines a location of an outlet of each said at least one injector in terms of a distance along a thrust axis and in terms of a radial distance along a perpendicular to the thrust axis; and wherein the standing wave field raises a temperature of the injected propellant to provide thrust by way of a hot gas exiting the resonant cavity via the nozzle. a microwave source; a resonant cavity coupled to the microwave source, wherein the microwave source is configured to generate a standing wave field in the resonant cavity; a nozzle provided at one end of the resonant cavity; at least one injector configured to inject propellant into the resonant cavity so as to create a rotating circumferential flow; and an annular structure extending into the resonant cavity to support the at least one injector, wherein the annular structure determines a location of an outlet of each said at least one injector in terms of a distance along a thrust axis and in terms of a radial distance along a perpendicular to the thrust axis; and wherein the standing wave field raises a temperature of the injected propellant to provide thrust by way of a hot gas exiting the resonant cavity via the nozzle.
A wake-word recognition method comprising: receiving, at a processing device, an audio input recognized as a wake-word candidate based on a wake-word recognition model, wherein the audio input is detected at a listening device comprising the wake-word recognition model; applying, to the audio input, ensemble classification utilizing the wake-word recognition model of the listening device and a filtering model resident on the processing device; returning a second score of the audio input based on applying the ensemble classification to the audio input; and determining, based on the second score, that the audio input comprises the wake-word. receiving, at a processing device, an audio input recognized as a wake-word candidate based on a wake-word recognition model, wherein the audio input is detected at a listening device comprising the wake-word recognition model; applying, to the audio input, ensemble classification utilizing the wake-word recognition model of the listening device and a filtering model resident on the processing device; returning a second score of the audio input based on applying the ensemble classification to the audio input; and determining, based on the second score, that the audio input comprises the wake-word.
Hand-held power tool comprising a housing with a handle , a drive motor , which is arranged in the housing , and a first interface , wherein the interface is designed to receive information from at least a second, external interface and/or to transmit information to at least a second, external interface , wherein the housing has a receiving opening , wherein the interface is arranged in the receiving opening in a removable manner; wherein the receiving opening can be closed by a cover in a releasable manner; and wherein the cover closes off the housing towards the outside, characterized in that the receiving opening is arranged in the region of the rear end of the housing of the hand-held power tool downstream of the drive motor .
A method of electrostatically clamping a dielectric wafer to a processing table during plasma processing, the table having interdigitated electrodes embedded therein, comprising applying respective voltages of opposite first and second polarities to the adjacent electrodes wherein polarisation charges are induced in the wafer with opposite polarity to the respective underlying electrodes thereby electrostatically clamping the wafer to the table ; and, after a predetermined time (t on ), reversing the polarities of the voltages so that the induction of the polarisation charges and electrostatic clamping continues characterized in that : i) the on time (t on ) of each of the first and second polarities is preselected to be a) greater than a time (T 1 ), the time (T 1 ) being defined as that required to generate sufficient polarisation charges in the wafer such that the wafer is held with a required pressure for at least 2 seconds after withdrawing of clamping voltages, b) less than a time (T 2 ), the time (T 2 ) being defined as that required for the wafer to separate from the table by a first predetermined amount while in the presence of a steady voltage and a plasma, and c) less than a time (T 3 ), the time (T 3 ) being defined as that required for the wafer to separate from the table by a second predetermined amount in the absence of a plasma, after an applied voltage has been applied; and in that ii) a time (t s ) for switching between the first and second polarities is less than the time (T 1 ) and less than 2 seconds. i) the on time (t on ) of each of the first and second polarities is preselected to be a) greater than a time (T 1 ), the time (T 1 ) being defined as that required to generate sufficient polarisation charges in the wafer such that the wafer is held with a required pressure for at least 2 seconds after withdrawing of clamping voltages, b) less than a time (T 2 ), the time (T 2 ) being defined as that required for the wafer to separate from the table by a first predetermined amount while in the presence of a steady voltage and a plasma, and c) less than a time (T 3 ), the time (T 3 ) being defined as that required for the wafer to separate from the table by a second predetermined amount in the absence of a plasma, after an applied voltage has been applied; and in that a) greater than a time (T 1 ), the time (T 1 ) being defined as that required to generate sufficient polarisation charges in the wafer such that the wafer is held with a required pressure for at least 2 seconds after withdrawing of clamping voltages, b) less than a time (T 2 ), the time (T 2 ) being defined as that required for the wafer to separate from the table by a first predetermined amount while in the presence of a steady voltage and a plasma, and c) less than a time (T 3 ), the time (T 3 ) being defined as that required for the wafer to separate from the table by a second predetermined amount in the absence of a plasma, after an applied voltage has been applied; and in that ii) a time (t s ) for switching between the first and second polarities is less than the time (T 1 ) and less than 2 seconds.
A bracket assembly for mounting a display monitor to a support structure , comprising: a back plate configured to mount to the support structure ; a back plate extension disposed along one side of said back plate ; a front plate configured to mount to the display monitor ; a front plate extension disposed along one side of said front plate ; a contact surface formed by said front plate extension overlapping said back plate extension , the contact surface transferring a weight of the monitor to the support structure , wherein the back plate extension is angled in an upward direction as the back plate extension projects from the back plate and the front plate extension is angled in a downward direction as the front plate extension projects from the front plate ; and a volume at least partially enclosed by said front and back plates and extensions for housing an electronic device between the display monitor and the support structure , characterized in that the bracket assembly further comprises another back plate extension , wherein the contact surface is formed between an edge surface of each back plate extension and an under surface of the front plate extension , and wherein the two back plate extensions are on opposing sides of the back plate . a back plate configured to mount to the support structure ; a back plate extension disposed along one side of said back plate ; a front plate configured to mount to the display monitor ; a front plate extension disposed along one side of said front plate ; a contact surface formed by said front plate extension overlapping said back plate extension , the contact surface transferring a weight of the monitor to the support structure , wherein the back plate extension is angled in an upward direction as the back plate extension projects from the back plate and the front plate extension is angled in a downward direction as the front plate extension projects from the front plate ; and a volume at least partially enclosed by said front and back plates and extensions for housing an electronic device between the display monitor and the support structure , characterized in that the bracket assembly further comprises another back plate extension , wherein the contact surface is formed between an edge surface of each back plate extension and an under surface of the front plate extension , and wherein the two back plate extensions are on opposing sides of the back plate .
Pair of gloves, consisting of two gloves, in particular work gloves, examination gloves or surgical gloves, each having a uniform glove body made of fluid-tight, resilient material, for example rubber, the glove body comprising an actual hand part and an adjoining cuff , a gripping aid being provided on each glove of the pair of gloves on the outer surface of the cuff and so as to be spaced apart from the rear edge of the cuff in a peripheral portion, the gripping aid of each glove being formed on the outside as a hollow protrusion of the glove that is open towards the inside of the glove, and the gripping aid of one glove of the pair of gloves and the gripping aid of the other glove of the pair of gloves being provided on adjacent peripheral portions of the cuff and having an angular spacing of at least 135°, the gripping aid of one glove being arranged on the palm side, characterised in that the gripping aid of the other glove of the pair of gloves is arranged so as to be on the side on the back of the hand, and therefore, when the arms and hands are held in the parallel and mirror-inverted position, the gripping aids of each glove are gripped by the other hand in each case and simultaneously removed in a mirror-inverted manner and simultaneously automatically flipped, without the soiled or contaminated outside of the gloves coming into contact with the skin of the wearer, and in that the gloves of the pair of gloves are joined together by pulling said gloves further into one another.
A system for producing value and security documents from pieces of primary material in at least two processing steps of a processing scheme, said system being formed by: (a) system modules configured to execute the at least two processing steps; (b) at least one transport unit , connecting the system modules (3x00), for the pieces of primary material intended for producing the value and security documents ; and (c) a system control unit configured to control the at least one transport unit (4x00), wherein at least two system modules (3x00) are provided for executing each of the at least two processing steps; wherein all system modules (3x00) configured to execute a second processing step are connected by means of the at least one transport unit (4x00) to system modules (3x00) configured to execute a preceding first processing step; and wherein the at least one transport unit (4x00) is controllable using the system control unit , so that the pieces of primary material are each feedable to one of a plurality of system modules (3x00) configured to execute a processing step, and wherein at least two system modules (3x00) configured to execute one of the at least two processing steps are each configured to execute a processing step variant to produce one of a plurality of variants of the value or security documents . (a) system modules configured to execute the at least two processing steps; (b) at least one transport unit , connecting the system modules (3x00), for the pieces of primary material intended for producing the value and security documents ; and (c) a system control unit configured to control the at least one transport unit (4x00), wherein at least two system modules (3x00) are provided for executing each of the at least two processing steps; wherein all system modules (3x00) configured to execute a second processing step are connected by means of the at least one transport unit (4x00) to system modules (3x00) configured to execute a preceding first processing step; and wherein the at least one transport unit (4x00) is controllable using the system control unit , so that the pieces of primary material are each feedable to one of a plurality of system modules (3x00) configured to execute a processing step, and wherein at least two system modules (3x00) configured to execute one of the at least two processing steps are each configured to execute a processing step variant to produce one of a plurality of variants of the value or security documents .
A process to polymerize an ethylene/alpha-olefin interpolymer, said process comprising polymerizing ethylene, in solution, in at least one reactor, in the presence of at least one catalyst; wherein the reactor ethylene concentration is greater than, or equal to 14.0 kg/m 3 ; wherein the Reynolds Number of the reactor is greater than, or equal to 2000; wherein the efficiency of the catalyst is greater than, or equal to, 2,500,000 kg polymer per kg catalyst metal; wherein the residence time of the interpolymer in the reactor is greater than or equal to 20 minutes; and wherein the reactor has a reactor loop recycle ratio (vol/vol) (RR) defined as loop flow rate / reactor outlet flow rate greater than 15.0; wherein the reactor alpha-olefin concentration is greater than or equal to 60.0 kg/m 3 ; and wherein the alpha-olefin is a C3-C20 alpha-olefin.
A method comprising: welding an unhardened stud body comprising a first composition to an unhardened stud subunit comprising a second composition, to form a stud having an unhardened subunit portion; and characterised by heat treating the stud ; and in that the second composition is not capable of hardening by heat treatment.
A tungsten powder for an anode body of an electrolytic capacitor, the tungsten powder having tungsten silicide on the surface of the particles and having a silicon content of 0.05 to 7 mass%.