Method for producing a nuclear component by the direct liquid injection metal organic chemical vapour deposition (DLI-MOCVD) method, the nuclear component being chosen from among a nuclear fuel cladding, a spacer grid, a guide tube, a plate fuel or an absorber rod, comprising: - i) a supporting base containing a substrate based on a metal chosen from among zirconium, titanium, vanadium, molybdenum or the base alloys thereof , the substrate being optionally clad with an interlayer positioned between the substrate and at least one protective layer ; - ii) said at least one protective layer cladding said supporting base and composed of a protective material comprising chromium which is an amorphous chromium carbide; the method comprising the following successive steps: a) vaporising a stock solution containing a hydrocarbon solvent devoid of oxygen atoms, a bis(arene) type precursor comprising chromium; and containing where appropriate an additional precursor; the precursors having a decomposition temperature between 300°C and 600°C; b) in a chemical vapour deposition reactor wherein said supporting base to be clad is located and of which the atmosphere is at a deposition temperature between 300°C and 500°C and under a deposition pressure between 13 Pa and 7000 Pa; introducing the stock solution vaporised in step a), which induces the deposition of said at least one protective layer on said supporting base. - i) a supporting base containing a substrate based on a metal chosen from among zirconium, titanium, vanadium, molybdenum or the base alloys thereof , the substrate being optionally clad with an interlayer positioned between the substrate and at least one protective layer ; - ii) said at least one protective layer cladding said supporting base and composed of a protective material comprising chromium which is an amorphous chromium carbide; the method comprising the following successive steps: a) vaporising a stock solution containing a hydrocarbon solvent devoid of oxygen atoms, a bis(arene) type precursor comprising chromium; and containing where appropriate an additional precursor; the precursors having a decomposition temperature between 300°C and 600°C; b) in a chemical vapour deposition reactor wherein said supporting base to be clad is located and of which the atmosphere is at a deposition temperature between 300°C and 500°C and under a deposition pressure between 13 Pa and 7000 Pa; introducing the stock solution vaporised in step a), which induces the deposition of said at least one protective layer on said supporting base. a) vaporising a stock solution containing a hydrocarbon solvent devoid of oxygen atoms, a bis(arene) type precursor comprising chromium; and containing where appropriate an additional precursor; the precursors having a decomposition temperature between 300°C and 600°C; b) in a chemical vapour deposition reactor wherein said supporting base to be clad is located and of which the atmosphere is at a deposition temperature between 300°C and 500°C and under a deposition pressure between 13 Pa and 7000 Pa; introducing the stock solution vaporised in step a), which induces the deposition of said at least one protective layer on said supporting base. <EOS>