Method for film deposition on a substrate by means of pulsed laser deposition, the method comprising: generating N pulsed laser beams by means of at least one laser , with N > 1; directing the laser beams to different target spots of a target , whereby the target is ablated and at least two plasma plumes are created, wherein the plasma plumes create a flow of target material towards the substrate and the target material is deposited onto the substrate at a deposition area , characterized in that the plasma plumes created by the laser beams overlap spatially and temporally, wherein the N laser beams are either generated by means of different lasers and are synchronized such that the plasma plumes are temporally and spatially overlapped for at least 30% of the life time of one of the plasma plumes , or that the laser beams are partial laser beams generated by means of splitting of a single laser beam , and that the target spots are separated from each other by a distance that allows a gas-dynamical interaction of the created plasma plumes , wherein deflection of ion/atom/molecular flows is suppressed, wherein the the distance between the target spots is chosen in the range of 0.01 to 0.3 of the length of one of the plasma plumes and less than 5 mm, that the material of each plasma plume is deposited at a sub-deposition area of the substrate , wherein the union of the sub-deposition areas form the deposition area , and that the sub-deposition areas of two neighboring plasma plumes overlap at a degree of 5 to 99%, and that during deposition the deposition area is moving with a linear speed of 0.2-2 m/s along a deposition window of a heating element . generating N pulsed laser beams by means of at least one laser , with N > 1; directing the laser beams to different target spots of a target , whereby the target is ablated and at least two plasma plumes are created, wherein the plasma plumes create a flow of target material towards the substrate and the target material is deposited onto the substrate at a deposition area , characterized in that the plasma plumes created by the laser beams overlap spatially and temporally, wherein the N laser beams are either generated by means of different lasers and are synchronized such that the plasma plumes are temporally and spatially overlapped for at least 30% of the life time of one of the plasma plumes , or that the laser beams are partial laser beams generated by means of splitting of a single laser beam , and that the target spots are separated from each other by a distance that allows a gas-dynamical interaction of the created plasma plumes , wherein deflection of ion/atom/molecular flows is suppressed, wherein the the distance between the target spots is chosen in the range of 0.01 to 0.3 of the length of one of the plasma plumes and less than 5 mm, that the material of each plasma plume is deposited at a sub-deposition area of the substrate , wherein the union of the sub-deposition areas form the deposition area , and that the sub-deposition areas of two neighboring plasma plumes overlap at a degree of 5 to 99%, and that during deposition the deposition area is moving with a linear speed of 0.2-2 m/s along a deposition window of a heating element . <EOS>