A method for manufacturing a membrane assembly for lithography, the method comprising: providing a stack comprising a membrane layer between a supporting substrate and an attachment substrate , wherein the supporting substrate comprises a first inner region and a first border region and wherein the attachment substrate comprises a second inner region and a second border region ; processing the stack , including selectively removing the first inner region of the supporting substrate and selectively removing the second inner region of the attachment substrate , to form a membrane assembly comprising: a membrane formed from at least the membrane layer , and a support holding the membrane, the support being formed partially from the first border region of the supporting substrate and partially from the second border region of the attachment substrate ; characterized, in that the membrane assembly formed is a pellicle for EUV lithography; in that the supporting substrate further comprises a first edge region around the first border region ; in that the attachment substrate further comprises a second edge region around the second border region , and in that the step of processing the stack further includes: - separating the first edge region , and layers formed on the first edge region , from the stack before selectively removing the first inner region of the supporting substrate , and - separating the second edge region , and layers formed on the second edge region , from the stack before removing the second inner region of the attachment substrate . providing a stack comprising a membrane layer between a supporting substrate and an attachment substrate , wherein the supporting substrate comprises a first inner region and a first border region and wherein the attachment substrate comprises a second inner region and a second border region ; processing the stack , including selectively removing the first inner region of the supporting substrate and selectively removing the second inner region of the attachment substrate , to form a membrane assembly comprising: a membrane formed from at least the membrane layer , and a support holding the membrane, the support being formed partially from the first border region of the supporting substrate and partially from the second border region of the attachment substrate ; a membrane formed from at least the membrane layer , and a support holding the membrane, the support being formed partially from the first border region of the supporting substrate and partially from the second border region of the attachment substrate ; in that the membrane assembly formed is a pellicle for EUV lithography; in that the supporting substrate further comprises a first edge region around the first border region ; in that the attachment substrate further comprises a second edge region around the second border region , and in that the step of processing the stack further includes: - separating the first edge region , and layers formed on the first edge region , from the stack before selectively removing the first inner region of the supporting substrate , and - separating the second edge region , and layers formed on the second edge region , from the stack before removing the second inner region of the attachment substrate . - separating the first edge region , and layers formed on the first edge region , from the stack before selectively removing the first inner region of the supporting substrate , and - separating the second edge region , and layers formed on the second edge region , from the stack before removing the second inner region of the attachment substrate . <EOS>