A plasma generator for the pulsed provision of electrical power having a frequency of at least 40 kHz to at least two process chambers, the plasma generator comprising: a control unit configured to obtain and evaluate process data about processes in the at least two process chambers; a controllable power supply having an output, the controllable power supply configured to output a direct current having a predetermined voltage and/or intensity at its output in response to a control signal from the control unit ; and a switching unit having a first input connected to the output of the power supply , and having at least two switching unit outputs for respective connection to one of the at least two process chambers; wherein the switching unit is configured to form from a direct current at the input an alternating current having a predetermined frequency of at least 40 kHz as an output signal and to selectively output the output signal as a pulse for a predetermined pulse duration to one of the switching unit outputs in response to a control signal from the control unit ; wherein the control unit is configured to coordinate power requirements of the at least two process chambers and to drive the power supply and the switching unit such that at the respective switching unit outputs communicating with the process chambers, substantially the power corresponding to the respective power requirements is provided as pulses over a period of time, wherein the pulses of the respective process chambers are temporally offset from each other such that the process chambers can be operated simultaneously; and wherein the switching unit has at least one switching unit output configured for connection to an absorber , and wherein the switching unit is configured to, in response to an incoming control signal, selectively apply the output signal as a pulse to the switching unit output for the absorber for a predetermined pulse duration. a control unit configured to obtain and evaluate process data about processes in the at least two process chambers; a controllable power supply having an output, the controllable power supply configured to output a direct current having a predetermined voltage and/or intensity at its output in response to a control signal from the control unit ; and a switching unit having a first input connected to the output of the power supply , and having at least two switching unit outputs for respective connection to one of the at least two process chambers; wherein the switching unit is configured to form from a direct current at the input an alternating current having a predetermined frequency of at least 40 kHz as an output signal and to selectively output the output signal as a pulse for a predetermined pulse duration to one of the switching unit outputs in response to a control signal from the control unit ; wherein the control unit is configured to coordinate power requirements of the at least two process chambers and to drive the power supply and the switching unit such that at the respective switching unit outputs communicating with the process chambers, substantially the power corresponding to the respective power requirements is provided as pulses over a period of time, wherein the pulses of the respective process chambers are temporally offset from each other such that the process chambers can be operated simultaneously; and wherein the switching unit has at least one switching unit output configured for connection to an absorber , and wherein the switching unit is configured to, in response to an incoming control signal, selectively apply the output signal as a pulse to the switching unit output for the absorber for a predetermined pulse duration. <EOS>