A semiconductor processing apparatus, comprising: a body portion comprising at least one semiconductor processing unit , each of the at least one semiconductor processing unit comprising: a recess formed on an upper surface of the body portion, a bottom surface of the recess having at least one central location and a peripheral ; a first channel connecting to the recess at the at least one central location; and at least one second channel connecting to the recess at the peripheral, wherein: the bottom surface ascends from the at least one central location toward the peripheral against a direction of gravity or descends from the at least one central location toward the peripheral following the direction of gravity, and each of the first channel and the at least one second channel serves as an inlet or an outlet via which a fluid enters or exits the recess, wherein: the body portion further comprises: a first groove disposed on an outer side of the at least one semiconductor processing unit, the first groove capable of collecting the fluid overflowing from the recess; and a third channel connecting the groove and an external environment, the third channel capable of sending out the fluid collected by the groove. a recess formed on an upper surface of the body portion, a bottom surface of the recess having at least one central location and a peripheral ; a first channel connecting to the recess at the at least one central location; and at least one second channel connecting to the recess at the peripheral, wherein: the bottom surface ascends from the at least one central location toward the peripheral against a direction of gravity or descends from the at least one central location toward the peripheral following the direction of gravity, and each of the first channel and the at least one second channel serves as an inlet or an outlet via which a fluid enters or exits the recess, wherein: the body portion further comprises: a first groove disposed on an outer side of the at least one semiconductor processing unit, the first groove capable of collecting the fluid overflowing from the recess; and a third channel connecting the groove and an external environment, the third channel capable of sending out the fluid collected by the groove. the bottom surface ascends from the at least one central location toward the peripheral against a direction of gravity or descends from the at least one central location toward the peripheral following the direction of gravity, and each of the first channel and the at least one second channel serves as an inlet or an outlet via which a fluid enters or exits the recess, wherein: the body portion further comprises: a first groove disposed on an outer side of the at least one semiconductor processing unit, the first groove capable of collecting the fluid overflowing from the recess; and a third channel connecting the groove and an external environment, the third channel capable of sending out the fluid collected by the groove. a first groove disposed on an outer side of the at least one semiconductor processing unit, the first groove capable of collecting the fluid overflowing from the recess; and a third channel connecting the groove and an external environment, the third channel capable of sending out the fluid collected by the groove. <EOS>