Method for coating a substrate with a layer with structured surface, wherein the layer is produced by deposition by means of spark evaporation with the following steps: - selection of a first target as material source for the coating, - provision of a coating chamber with a spark evaporation source comprising at least the first target, - loading the coating chamber with the substrate to be coated, - pumping the coating chamber to a process pressure suitable for the spark evaporation - igniting and operating of the spark so that material is evaporated from the first target which, if necessary after reaction with a reactive gas introduced into the coating chamber, deposits on the substrate as a layer, wherein the first target comprises at least one refractory matrix component consisting of at least one matrix element and at least one low-melting doping component that consists of at least one doping element, and the doping component has a melting point at least 600°C lower than the matrix component, and a melted drop of the doping component does not wet a solid surface of the matrix component, characterized in that - the doping component in the first target is present in a higher concentration than it could form a solid solution with the matrix component according to phase diagram, - wherein the matrix component consists of at least one of the elements of a first group formed by Ir, Mo, Nb, Os, Re, Rh, Ta, Ti, V, W, Zr or alloys thereof, and - the doping component consists of at least one element of a second group formed by Ag, Ca, Ce, Cu, Dy, Er, Eu, Gd, La, Mg, Nd, Pb, Sb, Sm, Sr, Ti, Y, Yb, Zn or alloys thereof, - wherein the material combination of matrix component and doping component comprises neither the material system Zr-Cu nor the material system Ti-Cu whereby splashers are only loosely incorporated into the layer during the layer deposition and are either independently squeezed out of the layer or can retrospectively be removed by a simple post-treatment by which concave structures are introduced into the layer surface. - selection of a first target as material source for the coating, - provision of a coating chamber with a spark evaporation source comprising at least the first target, - loading the coating chamber with the substrate to be coated, - pumping the coating chamber to a process pressure suitable for the spark evaporation - igniting and operating of the spark so that material is evaporated from the first target which, if necessary after reaction with a reactive gas introduced into the coating chamber, deposits on the substrate as a layer, - the doping component in the first target is present in a higher concentration than it could form a solid solution with the matrix component according to phase diagram, - wherein the matrix component consists of at least one of the elements of a first group formed by Ir, Mo, Nb, Os, Re, Rh, Ta, Ti, V, W, Zr or alloys thereof, and - the doping component consists of at least one element of a second group formed by Ag, Ca, Ce, Cu, Dy, Er, Eu, Gd, La, Mg, Nd, Pb, Sb, Sm, Sr, Ti, Y, Yb, Zn or alloys thereof, - wherein the material combination of matrix component and doping component comprises neither the material system Zr-Cu nor the material system Ti-Cu <EOS>