mhurhangee/patent-ind-claim-en huggingface dataset:
A method of assembling a drive train for an electric machine , the drive train comprising a shaft having a front end and a rear end and is supported in a housing via a front bearing and a rear bearing , the front bearing comprising a front bearing outer ring and a front bearing inner ring , and the rear bearing comprising a rear bearing outer ring and a rear bearing inner ring , the method comprising the following steps: a) providing the shaft ; b) mounting the front bearing to the shaft by temporarily heating the front bearing and shifting the same to a front position at the shaft ; c) arranging a first cover and a second cover at the shaft from a rear end of the shaft , the first cover is configured to seal a rear side of the front bearing and the second cover is configured to seal a front side of the rear bearing ; d) mounting the rear bearing to the shaft by temporarily heating the rear bearing and shifting the same from the rear end of the shaft to a rear position at the shaft ; e) mounting the second cover to the rear bearing outer ring ; f) mounting the housing to the shaft by temporarily heating the housing and relatively moving the same over the shaft from the rear end of the shaft till a housing abutment abuts to the second cover ; g) mounting the second cover to the housing ; h) dismounting the second cover from the rear bearing outer ring ; and i) mounting a third cover to the housing such that the rear bearing outer ring is secured by the second and third covers , wherein the third cover is configured to seal a rear side of the rear bearing . a) providing the shaft ; b) mounting the front bearing to the shaft by temporarily heating the front bearing and shifting the same to a front position at the shaft ; c) arranging a first cover and a second cover at the shaft from a rear end of the shaft , the first cover is configured to seal a rear side of the front bearing and the second cover is configured to seal a front side of the rear bearing ; d) mounting the rear bearing to the shaft by temporarily heating the rear bearing and shifting the same from the rear end of the shaft to a rear position at the shaft ; e) mounting the second cover to the rear bearing outer ring ; f) mounting the housing to the shaft by temporarily heating the housing and relatively moving the same over the shaft from the rear end of the shaft till a housing abutment abuts to the second cover ; g) mounting the second cover to the housing ; h) dismounting the second cover from the rear bearing outer ring ; and i) mounting a third cover to the housing such that the rear bearing outer ring is secured by the second and third covers , wherein the third cover is configured to seal a rear side of the rear bearing .
A method for preparing superabsorbent polymer comprising the steps of: performing thermal polymerization or photopolymerization of a monomer composition comprising water-soluble ethylenically unsaturated monomers and a polymerization initiator to form hydrogel polymer; drying the hydrogel polymer; grinding the dried polymer; and mixing the ground polymer with a surface crosslinking agent comprising hydrophobic alcohol to conduct a surface crosslinking reaction, wherein the hydrophobic alcohol is 2,2-dimethyl-1,3-propanediol, wherein porous silica is further included when conducting a surface crosslinking reaction, and wherein the centrifuge retention capacity (CRC) of the superabsorbent polymer is 30 g/g to 40 g/g, and the absorbency under pressure (AUP) is 15 g/g to 30 g/g. performing thermal polymerization or photopolymerization of a monomer composition comprising water-soluble ethylenically unsaturated monomers and a polymerization initiator to form hydrogel polymer; drying the hydrogel polymer; grinding the dried polymer; and mixing the ground polymer with a surface crosslinking agent comprising hydrophobic alcohol to conduct a surface crosslinking reaction, wherein the hydrophobic alcohol is 2,2-dimethyl-1,3-propanediol, wherein porous silica is further included when conducting a surface crosslinking reaction, and wherein the centrifuge retention capacity (CRC) of the superabsorbent polymer is 30 g/g to 40 g/g, and the absorbency under pressure (AUP) is 15 g/g to 30 g/g.
Arc-quenching device for an electric switching apparatus with at least one switching point, whereby the arc-quenching device comprises at least one quenching element and at least two permanent magnets for influencing an arc that emerges during the switching process, whereby the arc is blown into the quenching element by a magnetic field that is created by the permanent magnets , whereby the permanent magnets form at the same time the quenching element and are arranged and polarized in a way that the arc is attracted by the permanent magnets and thereby sucked onto the permanent magnets and quenched by said permanent magnets, characterized in that the permanent magnets are each used as a quenching element and are polarized in the same direction and arranged in a way that the arc is attracted by the at least two permanent magnets that form quenching elements at the same time, and wherein the permanent magnets are designed as rod magnets and are enclosed, at least in the area that is exposed to the arc, each by a protection sleeve made of ceramic.
An information processing apparatus , said information processing apparatus being one of one or more information processing apparatuses and comprising: a display screen; and a control unit configured to perform a control for switching a display state of the display screen related to an imaging operation of an imaging apparatus based on a determination of a first connection number of one or more imaging apparatuses connected to said one of said one or more information processing apparatuses by using wireless communication and a determination of a second connection number of said one or more information processing apparatuses connected to said one of said one or more information processing apparatuses by using wireless communication; wherein the control unit is configured to perform a control, in the case where only said one of said one or more information processing apparatuses is connected to said one or more imaging apparatuses, for causing the display screen for operating the one or more imaging apparatuses to be displayed, and in the case where another information processing apparatus in addition to said one of said one or more information processing apparatuses is connected to the imaging apparatus, for causing the display screen corresponding to a presence or absence of a live view right to be displayed, wherein the live view right is a right which displays, as a live view image, an image generated by the imaging apparatus connected by using wireless communication. a display screen; and a control unit configured to perform a control for switching a display state of the display screen related to an imaging operation of an imaging apparatus based on a determination of a first connection number of one or more imaging apparatuses connected to said one of said one or more information processing apparatuses by using wireless communication and a determination of a second connection number of said one or more information processing apparatuses connected to said one of said one or more information processing apparatuses by using wireless communication; wherein the control unit is configured to perform a control, in the case where only said one of said one or more information processing apparatuses is connected to said one or more imaging apparatuses, for causing the display screen for operating the one or more imaging apparatuses to be displayed, and in the case where another information processing apparatus in addition to said one of said one or more information processing apparatuses is connected to the imaging apparatus, for causing the display screen corresponding to a presence or absence of a live view right to be displayed, wherein the live view right is a right which displays, as a live view image, an image generated by the imaging apparatus connected by using wireless communication.
A terminal device , characterized in comprising a first processor and a second processor , and the first processor having a first communication interface and a second communication interface , wherein the first processor has firmware stored therein and is configured to read a control instruction stored in the firmware when the terminal device is connected to an adapter configured to charge the terminal device via a fast charging mode, to control the adapter to charge terminal device ; wherein the first communication interface is in a turned-off state when the first processor has the firmware stored therein, and the second communication interface remains in a turned-on state; the first processor is further configured to receive trigger information via the second communication interface when the first communication interface is in the turned-off state, and configured to turn on the first communication interface according to the trigger information, and receive a firmware update file of the stored firmware transmitted by the second processor via the first communication interface , wherein the trigger information is generated by an insertion of the adapter configured to charge the terminal device via the fast charging mode and the firmware update file is configured to update the stored firmware in the first processor only; the second processor is configured to acquire the firmware update file of the firmware stored in the first processor and transmit the firmware update file to the first processor via the first communication interface .
A system for additively manufacturing a structure , comprising: an additive manufacturing machine ; a memory having computer-executable instructions stored thereon; and a processor configured to execute the computer-executable instructions to: cause the additive manufacturing machine to discharge a path of composite material; characterized in that the processor is configured to execute the computer-executable instructions to: make a determination regarding existence of support located at a side of the path of composite material; and selectively cause the additive manufacturing machine to compact the path of composite material after discharge with a variable pressure that is based on the determination. an additive manufacturing machine ; a memory having computer-executable instructions stored thereon; and a processor configured to execute the computer-executable instructions to: cause the additive manufacturing machine to discharge a path of composite material; characterized in that the processor is configured to execute the computer-executable instructions to: make a determination regarding existence of support located at a side of the path of composite material; and selectively cause the additive manufacturing machine to compact the path of composite material after discharge with a variable pressure that is based on the determination. make a determination regarding existence of support located at a side of the path of composite material; and selectively cause the additive manufacturing machine to compact the path of composite material after discharge with a variable pressure that is based on the determination.
Rotating electrical machine comprising a stator provided with stator windings and a rotor , said rotor comprising a plurality of alternated north poles and south poles which are formed from permanent magnets (PM) positioned according to a substantially radial, socalled flux concentration, configuration, said permanent magnets (PM) being housed in first respective recesses (E1) formed in the magnetic mass of said rotor , characterized in that each of said first recesses (E1) emerges on an air gap of the machine at the outer circumference of said rotor via a notch (E10) separating one magnetic pole from a consecutive neighbouring magnetic pole and forms first and second tips (B1, B2) which are opposite and intended to retain said permanent magnet (PM) concerned in its first recess (E1) in opposing the effect of the centrifugal force on said permanent magnet (PM), a bottom face of said tips (B1, B2) exhibiting an angle of inclination α with respect to a top face of the permanent magnet (PM) which is between α = 0.1° and α = 15°, a mechanical reinforcement being provided by means of a rounding of radius R between said bottom face of said tips (B1, B2) and a substantially radial adjoining face forming an internal wall of said first recess (E1), said radius R being between R = 0.5 mm and R = 1.5 mm. a bottom face of said tips (B1, B2) exhibiting an angle of inclination α with respect to a top face of the permanent magnet (PM) which is between α = 0.1° and α = 15°, a mechanical reinforcement being provided by means of a rounding of radius R between said bottom face of said tips (B1, B2) and a substantially radial adjoining face forming an internal wall of said first recess (E1), said radius R being between R = 0.5 mm and R = 1.5 mm.
A method for manufacturing an array substrate, comprising: step S1, forming a pattern comprising a pixel electrode on a substrate ; step S2, forming a pattern comprising a gate of a thin film transistor on the substrate after the step S1; step S3, forming a gate insulating layer on the substrate after the step S2; step S4, forming a pattern comprising an active layer and a source and a drain , which are provided on the active layer , of the thin film transistor on the substrate by a patterning process after the step S3; step S5, forming a passivation layer on the substrate after the step S4; step S6, forming, on the substrate , a pattern comprising a main via penetrating through the gate insulating layer and the passivation layer and a main-via extension portion under a portion of the drain by a patterning process after the step S5, wherein the main via is connected to the main-via extension portion ; step S7, removing a portion of the drain which protrudes above the main-via extension portion after the step S6, so as to form a pattern comprising a final via; and step S8, forming a pattern comprising a connection electrode and a common electrode on the substrate after the step S7, wherein the connection electrode electrically connects the drain to the pixel electrode through the final via; characterised in that , the portion of the drain which protrudes above the main-via extension portion is caused due to forming the main via and the main-via extension portion by a dry etching process in the step S6, and is removed by a wet etching process in the step S7. step S1, forming a pattern comprising a pixel electrode on a substrate ; step S2, forming a pattern comprising a gate of a thin film transistor on the substrate after the step S1; step S3, forming a gate insulating layer on the substrate after the step S2; step S4, forming a pattern comprising an active layer and a source and a drain , which are provided on the active layer , of the thin film transistor on the substrate by a patterning process after the step S3; step S5, forming a passivation layer on the substrate after the step S4; step S6, forming, on the substrate , a pattern comprising a main via penetrating through the gate insulating layer and the passivation layer and a main-via extension portion under a portion of the drain by a patterning process after the step S5, wherein the main via is connected to the main-via extension portion ; step S7, removing a portion of the drain which protrudes above the main-via extension portion after the step S6, so as to form a pattern comprising a final via; and step S8, forming a pattern comprising a connection electrode and a common electrode on the substrate after the step S7, wherein the connection electrode electrically connects the drain to the pixel electrode through the final via; characterised in that , the portion of the drain which protrudes above the main-via extension portion is caused due to forming the main via and the main-via extension portion by a dry etching process in the step S6, and is removed by a wet etching process in the step S7.
An elevator system comprising: a first guide rail and a second guide rail ; an overtravel feature on at least one of the first or second guide rails , the overtravel feature located a first distance from a top surface of the respective guide rail; an elevator car moveable along the first and second guide rails , the elevator car including a car guidance element ; and a control unit configured to perform an overtravel distance test, the control unit configured to: measure a second distance being a distance of travel of the elevator car between a landing position relative to a top landing and a location of the overtravel feature ; add the first distance and the second distance to calculate a measured overtravel distance; and compare the measured overtravel distance with a predetermined overtravel setpoint which is a predetermined minimum distance that the elevator car can travel beyond a terminal landing within an elevator shaft. a first guide rail and a second guide rail ; an overtravel feature on at least one of the first or second guide rails , the overtravel feature located a first distance from a top surface of the respective guide rail; an elevator car moveable along the first and second guide rails , the elevator car including a car guidance element ; and a control unit configured to perform an overtravel distance test, the control unit configured to: measure a second distance being a distance of travel of the elevator car between a landing position relative to a top landing and a location of the overtravel feature ; add the first distance and the second distance to calculate a measured overtravel distance; and compare the measured overtravel distance with a predetermined overtravel setpoint which is a predetermined minimum distance that the elevator car can travel beyond a terminal landing within an elevator shaft. measure a second distance being a distance of travel of the elevator car between a landing position relative to a top landing and a location of the overtravel feature ; add the first distance and the second distance to calculate a measured overtravel distance; and compare the measured overtravel distance with a predetermined overtravel setpoint which is a predetermined minimum distance that the elevator car can travel beyond a terminal landing within an elevator shaft.
A suture comprising: a ferrule having a small opening at an end of a tapered region , and having a large opening at an end of a straight region , wherein the small opening is at an opposite end of the ferrule than the large opening and a portion of the tapered region has an inner diameter that is tapered toward the small opening , and an inner diameter of the small opening is substantially equal to an outer diameter of the suture ; and a suture extending from the small opening ; characterized in that the suture is a magnetic suture and further comprises a magnet at least partially within the straight region , wherein at the end of the straight region and opposite the large opening , the ferrule has a shoulder where the inner diameter of the ferrule begins to decrease in the tapered region and the shoulder prevents the magnet from being inserted into the tapered region . a ferrule having a small opening at an end of a tapered region , and having a large opening at an end of a straight region , wherein the small opening is at an opposite end of the ferrule than the large opening and a portion of the tapered region has an inner diameter that is tapered toward the small opening , and an inner diameter of the small opening is substantially equal to an outer diameter of the suture ; and a suture extending from the small opening ; characterized in that the suture is a magnetic suture and further comprises a magnet at least partially within the straight region , wherein at the end of the straight region and opposite the large opening , the ferrule has a shoulder where the inner diameter of the ferrule begins to decrease in the tapered region and the shoulder prevents the magnet from being inserted into the tapered region . a magnet at least partially within the straight region , wherein at the end of the straight region and opposite the large opening , the ferrule has a shoulder where the inner diameter of the ferrule begins to decrease in the tapered region and the shoulder prevents the magnet from being inserted into the tapered region .
A seed meter , comprising: a seed disc having a surface with a plurality of seed apertures , said plurality of seed apertures defining a circular path, each said seed aperture having a central axis, said seed disc entraining seeds from a seed source onto each of said plurality of seed apertures ; a singulator including: a plurality of outer lobes disposed to partially pass over the seed apertures such that one or more of said entrained seeds on a seed aperture are contacted and moved radially inwardly as the seed aperture passes each of the plurality of outer lobes ; and a plurality of inner lobes disposed to partially pass over the seed apertures such that one or more of said entrained seeds on a seed aperture are contacted and moved radially outwardly as the seed aperture passes each of the plurality of inner lobes , characterized by the seed meter further comprising: outer and inner seed orienting guides arranged to change the orientation of an entrained seed about an axis tangential to the circular path. a seed disc having a surface with a plurality of seed apertures , said plurality of seed apertures defining a circular path, each said seed aperture having a central axis, said seed disc entraining seeds from a seed source onto each of said plurality of seed apertures ; a singulator including: a plurality of outer lobes disposed to partially pass over the seed apertures such that one or more of said entrained seeds on a seed aperture are contacted and moved radially inwardly as the seed aperture passes each of the plurality of outer lobes ; and a plurality of inner lobes disposed to partially pass over the seed apertures such that one or more of said entrained seeds on a seed aperture are contacted and moved radially outwardly as the seed aperture passes each of the plurality of inner lobes , characterized by the seed meter further comprising: outer and inner seed orienting guides arranged to change the orientation of an entrained seed about an axis tangential to the circular path. a plurality of outer lobes disposed to partially pass over the seed apertures such that one or more of said entrained seeds on a seed aperture are contacted and moved radially inwardly as the seed aperture passes each of the plurality of outer lobes ; and a plurality of inner lobes disposed to partially pass over the seed apertures such that one or more of said entrained seeds on a seed aperture are contacted and moved radially outwardly as the seed aperture passes each of the plurality of inner lobes , characterized by the seed meter further comprising: outer and inner seed orienting guides arranged to change the orientation of an entrained seed about an axis tangential to the circular path.
A method of producing a vinylidene fluoride-based multi-layered resin film including two layers composed of a front surface layer laminated on a rear surface layer, wherein the front surface layer contains 80% by mass or more of a vinylidene fluoride-based resin and 20% by mass or less of a methacrylic acid ester-based resin, the degree of crystallization of the front surface layer is 45% or higher, the ratio occupied by α-crystals in the entire crystal component of the vinylidene fluoride-based resin is 60% or higher, the thickness of the front surface layer is 15 μm or more, and the rear surface layer contains 90% by mass or more of a methacrylic acid ester-based resin, the method comprising a melt extrusion molding of resin composition using a T-type die, wherein the amount of conversive heat per unit time at the time of cooling the molten resin is 70 to 180 KW per kg of the molten resin according to a calculation formula represented by the following formula: amount of conversive heat = specific heat J / kg ⋅ ° C of resin composition × Δ T /cooling time sec , where ΔT = temperature of molten resin - temperature after cooling.