An EUV radiation production apparatus , comprising: a driver laser arrangement , comprising: a beam source for producing pulsed laser radiation with at least one laser frequency (f L ), being embodied to produce a first pulse and, following the first pulse in time, a second pulse of the pulsed laser radiation , and an amplifier arrangement with at least one optical amplifier (4a-c) for amplifying the pulsed laser radiation , wherein the first pulse has a lower power than the second pulse after the amplification, a beam guiding device for guiding the pulsed laser radiation from the driver laser arrangement toward a target position (T), and a vacuum chamber in which a target material is arrangeable at the target position (T), characterized in that the driver laser arrangement comprises at least one frequency shifting device (13a-c, 13') for producing a frequency shift (Δf) of the laser frequency (f L ) of the laser radiation relative to a maximum frequency (f M ) of a frequency-dependent gain of the at least one optical amplifier (4a-c), and a control device embodied to set the frequency shift (Δf) in such a way that the gain (V RED ) of the optical amplifier (4a-c) for the laser radiation is reduced to less than 90%, preferably to less than 70%, particularly preferably to less than 50%, of a maximum gain (V MAX ) of the optical amplifier (4a-c), wherein the control device is embodied to reduce the gain (V RED ) of the optical amplifier (4a-c) for the first pulse to less than 90%, preferably to less than 70%, particularly preferably to less than 50%, of the maximum gain (V MAX ) of the optical amplifier (13a-c) for the first pulse , and wherein the second pulse passes through the at least one optical amplifier (4a-c) only after a back-reflection of the first pulse which is reflected back at the target material , and wherein the second pulse is amplified with the maximum gain (V MAX ) in the at least one optical amplifier (4a-c). a beam source for producing pulsed laser radiation with at least one laser frequency (f L ), being embodied to produce a first pulse and, following the first pulse in time, a second pulse of the pulsed laser radiation , and an amplifier arrangement with at least one optical amplifier (4a-c) for amplifying the pulsed laser radiation , wherein the first pulse has a lower power than the second pulse after the amplification, a beam guiding device for guiding the pulsed laser radiation from the driver laser arrangement toward a target position (T), and a vacuum chamber in which a target material is arrangeable at the target position (T), characterized in that the driver laser arrangement comprises at least one frequency shifting device (13a-c, 13') for producing a frequency shift (Δf) of the laser frequency (f L ) of the laser radiation relative to a maximum frequency (f M ) of a frequency-dependent gain of the at least one optical amplifier (4a-c), and a control device embodied to set the frequency shift (Δf) in such a way that the gain (V RED ) of the optical amplifier (4a-c) for the laser radiation is reduced to less than 90%, preferably to less than 70%, particularly preferably to less than 50%, of a maximum gain (V MAX ) of the optical amplifier (4a-c), wherein the control device is embodied to reduce the gain (V RED ) of the optical amplifier (4a-c) for the first pulse to less than 90%, preferably to less than 70%, particularly preferably to less than 50%, of the maximum gain (V MAX ) of the optical amplifier (13a-c) for the first pulse , and wherein the second pulse passes through the at least one optical amplifier (4a-c) only after a back-reflection of the first pulse which is reflected back at the target material , and wherein the second pulse is amplified with the maximum gain (V MAX ) in the at least one optical amplifier (4a-c). <EOS>