A method for the alignment and contacting of a first a contact surface of a first substrate with a second contact surface of a second substrate with the following steps, in particular the following sequence: - Fixing of a first supporting surface of the first substrate on a first substrate holder and a second supporting surface of the second substrate on a second substrate holder , which can be arranged lying opposite the first substrate holder , - detection of a first X-Y position related in particular to a focal plane of a first detection unit and/or first alignment position of a first alignment marking arranged in particular in a peripheral region of the first substrate , - detection of a second X-Y position related in particular to a focal plane of a second detection unit and/or second alignment position of a second alignment marking arranged in particular in a peripheral region of the second substrate , - alignment of the first substrate with respect to the second substrate , and - contacting of the first substrate aligned with respect to the second substrate with the second substrate , characterised in that before the alignment, in addition, a detection of a third X-Y position and/or third alignment position of the first substrate holder and/or of the first substrate by third detection unit , by means of which the alignment is controlled, wherein, for the alignment of the substrates , a correlation of the third X-Y position and/or the third alignment position with at least one of a) the first X-Y position and/or the first alignment position and b) the second X-Y position and/or the second alignment position takes place and a real time measurement and control is carried out during the alignment. - Fixing of a first supporting surface of the first substrate on a first substrate holder and a second supporting surface of the second substrate on a second substrate holder , which can be arranged lying opposite the first substrate holder , - detection of a first X-Y position related in particular to a focal plane of a first detection unit and/or first alignment position of a first alignment marking arranged in particular in a peripheral region of the first substrate , - detection of a second X-Y position related in particular to a focal plane of a second detection unit and/or second alignment position of a second alignment marking arranged in particular in a peripheral region of the second substrate , - alignment of the first substrate with respect to the second substrate , and - contacting of the first substrate aligned with respect to the second substrate with the second substrate , before the alignment, in addition, a detection of a third X-Y position and/or third alignment position of the first substrate holder and/or of the first substrate by third detection unit , by means of which the alignment is controlled, wherein, for the alignment of the substrates , a correlation of the third X-Y position and/or the third alignment position with at least one of a) the first X-Y position and/or the first alignment position and b) the second X-Y position and/or the second alignment position takes place and a real time measurement and control is carried out during the alignment. <EOS>