mhurhangee/patent-ind-claim-en huggingface dataset:
Telecontrol (TEL) for locking/unlocking and starting a motor vehicle comprising: - an electronic circuit (ELEC) including at least one path comprising an input pin (BE) and an output pin (BS), - a first radio frequency antenna (ANT1) including a first loop arranged in the plane of the electronic circuit (ELEC) operating at high frequencies, - a second radio frequency antenna (ANT2) including a second loop arranged in the plane of the electronic circuit (ELEC), said second antenna (ANT2) operating at low frequencies and being equivalent to a complex impedance Z with an imaginary portion X, said second antenna (ANT2) comprising: ∘ an input connector (CE) connected to the input pin (BE), ∘ an output connector (CS) connected to the output pin (BS), - a tuning capacitor (C) connected to the electronic circuit (CIRC), for tuning the second antenna (ANT2) on a tuning frequency, the second antenna (ANT2) comprising an inductive input component (COMP_E) and/or an inductive output component (COMP_S), said components being designed so that the imaginary portion X of the complex impedance Z is always positive, said inductive input component (COMP_E) being, to that end, placed between the input connector (CE) and the input pin (BE), and said inductive output component (COMP_S) being, to that end, placed between the output connector (CS) and the output pin (BS). - an electronic circuit (ELEC) including at least one path comprising an input pin (BE) and an output pin (BS), - a first radio frequency antenna (ANT1) including a first loop arranged in the plane of the electronic circuit (ELEC) operating at high frequencies, - a second radio frequency antenna (ANT2) including a second loop arranged in the plane of the electronic circuit (ELEC), said second antenna (ANT2) operating at low frequencies and being equivalent to a complex impedance Z with an imaginary portion X, said second antenna (ANT2) comprising: ∘ an input connector (CE) connected to the input pin (BE), ∘ an output connector (CS) connected to the output pin (BS), ∘ an input connector (CE) connected to the input pin (BE), ∘ an output connector (CS) connected to the output pin (BS), - a tuning capacitor (C) connected to the electronic circuit (CIRC), for tuning the second antenna (ANT2) on a tuning frequency,
Process for producing semiconductor wafers with epitaxial layer deposited from the gas phase in a deposition chamber, comprising the removal from the deposition chamber of material which has deposited in the deposition chamber in the course of preceding coating operations, by etching of the deposition chamber; coating operations carried out in succession in the etched deposition chamber , in each case comprising the placement of a substrate wafer on a susceptor with circular perimeter by a robot, where the robot moves the substrate wafer into a placement position and places it on the susceptor , with a corrective precept causing the center of the substrate wafer not to lie above the center of the susceptor in the placement position; and the deposition of an epitaxial layer on the substrate wafer, substrate wafer , to form a semiconductor wafer with epitaxial layer, characterized in that for each first substrate wafer moved into the placement position by the robot after the etching of the deposition chamber, the amount of the corrective precept corresponds to an average of positional deviations of a number of previously coated substrate wafers themselves each the first to be coated after a preceding chamber etch. the removal from the deposition chamber of material which has deposited in the deposition chamber in the course of preceding coating operations, by etching of the deposition chamber; coating operations carried out in succession in the etched deposition chamber , in each case comprising the placement of a substrate wafer on a susceptor with circular perimeter by a robot, where the robot moves the substrate wafer into a placement position and places it on the susceptor , with a corrective precept causing the center of the substrate wafer not to lie above the center of the susceptor in the placement position; and the deposition of an epitaxial layer on the substrate wafer, substrate wafer , to form a semiconductor wafer with epitaxial layer, characterized in that for each first substrate wafer moved into the placement position by the robot after the etching of the deposition chamber, the amount of the corrective precept corresponds to an average of positional deviations of a number of previously coated substrate wafers themselves each the first to be coated after a preceding chamber etch.
A magnetic integration double-ended converter, comprising: an inverter circuit with double ends symmetrically working, acting on a primary winding (N p ) ; an integrated magnetic member having a magnetic core with three magnetic columns, comprising at least three windings and at least one energy storage air gap, wherein the primary winding (N p ) and a first secondary winding (N s1 ) are both wound around a first magnetic column, a second secondary winding (N s2 ) is wound around a second magnetic column, and a total output current flows through the second secondary winding; characterized in that the second magnetic column and a third magnetic column each define the at least one energy storage air gap therein; and wherein there is no air gap in the first magnetic column, wherein the third magnetic column is positioned in between the first magnetic column and the second magnetic column; and a group of synchronous rectifiers (SR 1 , SR 2 ), gate electrode driving signals of which and gate electrode driving signals of a group of power switch diodes of the inverter circuit (S 1 , S 2 ) with the double ends symmetrically working complement each other. an inverter circuit with double ends symmetrically working, acting on a primary winding (N p ) ; an integrated magnetic member having a magnetic core with three magnetic columns, comprising at least three windings and at least one energy storage air gap, wherein the primary winding (N p ) and a first secondary winding (N s1 ) are both wound around a first magnetic column, a second secondary winding (N s2 ) is wound around a second magnetic column, and a total output current flows through the second secondary winding; characterized in that the second magnetic column and a third magnetic column each define the at least one energy storage air gap therein; and wherein there is no air gap in the first magnetic column, wherein the third magnetic column is positioned in between the first magnetic column and the second magnetic column; and a group of synchronous rectifiers (SR 1 , SR 2 ), gate electrode driving signals of which and gate electrode driving signals of a group of power switch diodes of the inverter circuit (S 1 , S 2 ) with the double ends symmetrically working complement each other.
Extendable garment, especially extendable baby or toddler garment, having at least one fabric fold which is formed and/or arranged on a fabric piece of the garment, is sewn with at least one sewing thread and is connected to the fabric piece , wherein the at least one sewing thread is separatable and the fabric fold is unfoldable in order to extend the garment, wherein the at least one fabric fold (3, 3'; 4, 4'; 24, 24') has two fabric fold elements which are laid on one side and are worked in opposite directions, wherein on the garment in the manufacturing state in a basic size as the smallest, first size , the fabric fold is sewn on both sides over the fold length with in each case at least one, preferably exactly one, chain stitch seam (7-1) and connected to the fabric piece, wherein in a second size of the garment , which is larger than the first size, one of the chain stitch seams (7-1) on both sides is separated and the associated one fabric fold element is unfolded, the other fabric fold element remaining sewn off, and wherein in an extended third size as the largest size of the garment , both chain stitch seams (7-1) on both sides are separated and both fabric fold elements are unfolded, characterised in that the at least one fabric fold (3, 3'; 4, 4'; 24, 24') is a box pleat or inverted pleat. having at least one fabric fold which is formed and/or arranged on a fabric piece of the garment, is sewn with at least one sewing thread and is connected to the fabric piece , wherein the at least one sewing thread is separatable and the fabric fold is unfoldable in order to extend the garment, wherein the at least one fabric fold (3, 3'; 4, 4'; 24, 24') has two fabric fold elements which are laid on one side and are worked in opposite directions, wherein on the garment in the manufacturing state in a basic size as the smallest, first size , the fabric fold is sewn on both sides over the fold length with in each case at least one, preferably exactly one, chain stitch seam (7-1) and connected to the fabric piece, wherein in a second size of the garment , which is larger than the first size, one of the chain stitch seams (7-1) on both sides is separated and the associated one fabric fold element is unfolded, the other fabric fold element remaining sewn off, and wherein in an extended third size as the largest size of the garment , both chain stitch seams (7-1) on both sides are separated and both fabric fold elements are unfolded, characterised in that the at least one fabric fold (3, 3'; 4, 4'; 24, 24') is a box pleat or inverted pleat.
Container treatment plant for treating containers, such as bottles, comprising at least one container treatment machine and a mobile, collaborating robot configured for robot-robot interaction and/or for robot-man interaction, wherein the collaborating robot is configured to cooperate in exchanging a component of the container treatment machine, characterized in that the collaborating robot comprises a safety system, which is configured to continuously determine a risk of collision with a human being in a surrounding of the collaborating robot and to control the movement of the collaborating robot such that the risk of collision will be minimized.
A nozzle bar for treating fibres with water jets, including an elongately extending upper part , in which an elongately configured pressure chamber is placed, wherein the pressure chamber includes an end side with an opening for supplying water and an opposite closed end side, and wherein a pressure distribution chamber , which extends parallel to the pressure chamber , is placed in the upper part , and wherein several throughflow bores are placed distributed along the length of the upper part in the intermediate walling between the pressure chamber and the pressure distribution chamber , through which bores water is guidable from the pressure chamber into the pressure distribution chamber , and wherein an impact body is disposed in the pressure distribution chamber , which body is configured rod-shaped and extends centred in the pressure distribution chamber longitudinally through the latter, an elongately extending lower part , which is disposed in a liquid-tight manner at the upper part , and wherein a nozzle strip with bores for the water discharge is accommodated in or at the lower part , and wherein a slot , which extends between the pressure distribution chamber and the nozzle strip for charging the nozzle strip with water, is placed in the upper part, characterized in that a surrounding annular gap (S) with a gap width of 5 mm to 8 mm is formed between the outside of the impact body and the inside of the pressure distribution chamber , wherein the impact body has a diameter (D2) of 20 mm to 30 mm.
Combination suction system, comprising a hand unit having a suction fan , an energy store and a dust filter , and comprising a floor unit having a floor nozzle , the floor unit having a receiving shaft , into which the hand unit can be inserted, characterised in that the floor unit has a further suction fan and a further energy store , the suction fan and the further suction fan being arranged one behind the other in a suction air flow when the hand unit is inserted.
A continuous ink jet print head, compri sing: a droplet generator configured to generate ink droplets ; a charging electrode downstream of the droplet generator and comprising a passageway through which the ink droplets travel to receive a charge; a deflection electrode for deflecting charged ink droplets; a gutter comprising a gutter entrance through which uncharged droplets enter and which is aligned with the droplet generator ; and a mounting deck configured to secure the gutter entrance into a fixed, nonadjustable gutter entrance position relative to the mounting deck , and the mounting deck being configured to secure the charging electrode into a fixed, nonadjustable charging electrode position relative to the mounting deck ; and wherein the mounting deck defines therethrough at least a portion of a vent path terminating at a portion of the gutter . a droplet generator configured to generate ink droplets ; a charging electrode downstream of the droplet generator and comprising a passageway through which the ink droplets travel to receive a charge; a deflection electrode for deflecting charged ink droplets; a gutter comprising a gutter entrance through which uncharged droplets enter and which is aligned with the droplet generator ; and a mounting deck configured to secure the gutter entrance into a fixed, nonadjustable gutter entrance position relative to the mounting deck , and the mounting deck being configured to secure the charging electrode into a fixed, nonadjustable charging electrode position relative to the mounting deck ; and wherein the mounting deck defines therethrough at least a portion of a vent path terminating at a portion of the gutter .
Eccentric hinge for a lid system for a toilet , the lid system being of the type comprising a toilet lid , an articulated shaft about which the eccentric hinge can be articulated and a cover covering at least said articulated shaft , wherein the cover is of the type comprising a through hole through which a portion of the eccentric hinge can pass when rotated about the articulated shaft , the eccentric hinge comprising: - a distal portion capable of being attached to the toilet lid , - a proximal portion configured to be coupled to the articulated shaft , and - an intermediate portion extending between the proximal portion and the distal portion and comprising at least one section configured to be arranged non-concentrically with respect to the articulated shaft , said intermediate portion being the one that can pass through the through hole of the cover when the eccentric hinge is rotated when a user lowers or lifts the lid , the eccentric hinge being characterized in that it comprises at least one tab arranged so as to protrude from the surface of the intermediate portion and configured to close the through hole of the cover in at least one rotational position of the eccentric hinge with respect to the articulated shaft . - a distal portion capable of being attached to the toilet lid , - a proximal portion configured to be coupled to the articulated shaft , and - an intermediate portion extending between the proximal portion and the distal portion and comprising at least one section configured to be arranged non-concentrically with respect to the articulated shaft , said intermediate portion being the one that can pass through the through hole of the cover when the eccentric hinge is rotated when a user lowers or lifts the lid ,
A measurement device (410; 510) for measuring a change in one or more of a circumference or a perimeter of at least a portion of an object having a surface, the device including: a first part (412; 512) for attachment to the object; a second part (414; 514) having a first portion (416; 516) moveable relative to a first portion (418; 518) of the first part (412; 512); a determining device for determining a displacement of the first portion (416; 516) of the second part (414; 514) relative to the first portion (418; 518) of the first part (412; 512) caused by the change in one or more of a circumference or perimeter of the object; and a biasing device (426; 526) for biasing the first part (412; 512) and the second part (414; 514) towards engagement, the biasing device (426; 526) overlapping each of the first portions (418, 416; 518, 516) and being secured on a surface of the first portion (418; 518) of the first part (412; 512) and the first portion (416; 516) of the second part (414; 514) and wrapped around at least one low friction element (422; 542a, 542b) allowing the biasing device (426; 526) to double back, wherein the displacement is for use in measuring the change in one or more of a circumference or perimeter of the object. a first part (412; 512) for attachment to the object; a second part (414; 514) having a first portion (416; 516) moveable relative to a first portion (418; 518) of the first part (412; 512); a determining device for determining a displacement of the first portion (416; 516) of the second part (414; 514) relative to the first portion (418; 518) of the first part (412; 512) caused by the change in one or more of a circumference or perimeter of the object; and a biasing device (426; 526) for biasing the first part (412; 512) and the second part (414; 514) towards engagement, the biasing device (426; 526) overlapping each of the first portions (418, 416; 518, 516) and being secured on a surface of the first portion (418; 518) of the first part (412; 512) and the first portion (416; 516) of the second part (414; 514) and wrapped around at least one low friction element (422; 542a, 542b) allowing the biasing device (426; 526) to double back, wherein the displacement is for use in measuring the change in one or more of a circumference or perimeter of the object.
A method comprising: a) providing a substrate with a plurality of through-holes, wherein a diameter of the through-holes is from 75 μm to 125 μm and a depth of the through-holes is from 200 μm to 300 μm; b) electroless plating copper 0.25 μm to 6 μm thick adjacent to a surface of the substrate and adjacent to walls of the plurality of through-holes; and c) immersing the substrate comprising the copper 0.25 μm to 6 μm thick adjacent to the surface of the substrate and adjacent to the walls of the through-holes in a copper electroplating bath; and d) filling the through-holes with copper by a direct current cycle comprising applying a current density for a first predetermined period of time followed by applying a lower current density for a second predetermined period of time, wherein, optionally, the direct current cycle can be repeated. a) providing a substrate with a plurality of through-holes, wherein a diameter of the through-holes is from 75 μm to 125 μm and a depth of the through-holes is from 200 μm to 300 μm; b) electroless plating copper 0.25 μm to 6 μm thick adjacent to a surface of the substrate and adjacent to walls of the plurality of through-holes; and c) immersing the substrate comprising the copper 0.25 μm to 6 μm thick adjacent to the surface of the substrate and adjacent to the walls of the through-holes in a copper electroplating bath; and d) filling the through-holes with copper by a direct current cycle comprising applying a current density for a first predetermined period of time followed by applying a lower current density for a second predetermined period of time, wherein, optionally, the direct current cycle can be repeated.
Method for charging a DC-link capacitor for a welding device , wherein the method comprises the following steps: feeding a voltage from a first portion of a half-cycle of an AC voltage into the DC-link capacitor , wherein the first portion starts at a first ignition angle; and feeding a voltage from a second portion of a half-cycle of the AC voltage that follows the half-cycle into the DC-link capacitor , wherein the second portion starts at a second ignition angle smaller than the first ignition angle, characterized in that first in the chronological sequence of the method , one of the following four operating states of a system comprising the DC-link capacitor is determined as being present by means of a superordinate controller: - charging procedure - generating a reduced voltage - normal operation at a reduced ignition angle - switching off and wherein, depending on the operating state, a different amount of charge is introduced into the DC-link capacitor . first in the chronological sequence of the method , one of the following four operating states of a system comprising the DC-link capacitor is determined as being present by means of a superordinate controller: - charging procedure - generating a reduced voltage - normal operation at a reduced ignition angle - switching off - charging procedure - generating a reduced voltage - normal operation at a reduced ignition angle - switching off and wherein, depending on the operating state, a different amount of charge is introduced into the DC-link capacitor .
A composition, comprising a polypeptide wherein the polypeptide consists of the amino acid sequence: SMLLLFFLGTISLSLCQDDQERC (SEQ ID NO: 1); SMLLLFFLGTISLSLCQ (SEQ ID NO:56); PMLLLFFLGTISLSLCQ (SEQ ID NO:57); or LLFFLGTISLSLCQDDQERC (SEQ ID NO: 65), and a pharmaceutically acceptable carrier. SMLLLFFLGTISLSLCQDDQERC (SEQ ID NO: 1); SMLLLFFLGTISLSLCQ (SEQ ID NO:56); PMLLLFFLGTISLSLCQ (SEQ ID NO:57); or LLFFLGTISLSLCQDDQERC (SEQ ID NO: 65),
A system comprising: a first array of radiating elements; a second array of radiating elements; a beamforming module coupled to the first array of radiating elements and to the second array of radiating elements, the first array of radiating elements being configured to provide wireless coverage on a first frequency carrier in a first coverage area, and the second array of radiating elements being configured to provide wireless coverage on a second frequency carrier in a second coverage area, where the first frequency carrier does not overlap the second frequency carrier, the beamforming module configured to: receive one or more indicators associated with one or more user equipments, UEs, in at least one of the first coverage area or the second coverage area; analyze the one or more indicators in a radio frequency, RF, domain or an intermediate frequency, IF, domain; and based on said analysis of the one or more indicators, dynamically adjusting in the RF domain at least one of a location of the first or second coverage area, or a size of the first or second coverage area. a first array of radiating elements; a second array of radiating elements; a beamforming module coupled to the first array of radiating elements and to the second array of radiating elements, the first array of radiating elements being configured to provide wireless coverage on a first frequency carrier in a first coverage area, and the second array of radiating elements being configured to provide wireless coverage on a second frequency carrier in a second coverage area, where the first frequency carrier does not overlap the second frequency carrier, the beamforming module configured to: receive one or more indicators associated with one or more user equipments, UEs, in at least one of the first coverage area or the second coverage area; analyze the one or more indicators in a radio frequency, RF, domain or an intermediate frequency, IF, domain; and based on said analysis of the one or more indicators, dynamically adjusting in the RF domain at least one of a location of the first or second coverage area, or a size of the first or second coverage area. receive one or more indicators associated with one or more user equipments, UEs, in at least one of the first coverage area or the second coverage area; analyze the one or more indicators in a radio frequency, RF, domain or an intermediate frequency, IF, domain; and based on said analysis of the one or more indicators, dynamically adjusting in the RF domain at least one of a location of the first or second coverage area, or a size of the first or second coverage area.