A nanoimprint lithography method comprising: disposing a pretreatment composition on a nanoimprint lithography substrate to yield a liquid pretreatment coating on the nanoimprint lithography substrate , wherein the pretreatment composition comprises a polymerizable component; disposing discrete portions of an imprint resist on the pretreatment coating, wherein the imprint resist is a polymerizable composition; forming a composite polymerizable coating on the nanoimprint lithography substrate as each discrete portion of the imprint resist spreads on the liquid pretreatment coating; contacting the composite polymerizable coating with a nanoimprint lithography template defining recesses ; polymerizing the composite polymerizable coating to yield a composite polymeric layer defining a pre-etch plurality of protrusions corresponding to the recesses of the nanoimprint lithography template , wherein at least one of the pre-etch plurality of protrusions corresponds to a boundary between two of the discrete portions of the imprint resist, and the pre-etch plurality of protrusions have a variation in pre-etch height of ±10% of a pre-etch average height; separating the nanoimprint lithography template from the composite polymeric layer ; and etching the pre-etch plurality of protrusions to yield a post-etch plurality of protrusions, wherein the post-etch plurality of protrusions have a variation in post-etch height of ±10% of a post-etch average height, and the pre-etch average height exceeds the post-etch average height, characterized in that the boundary between the two of the discrete portions of the imprint resist is formed from an inhomogeneous mixture of the imprint resist and the pretreatment composition. disposing a pretreatment composition on a nanoimprint lithography substrate to yield a liquid pretreatment coating on the nanoimprint lithography substrate , wherein the pretreatment composition comprises a polymerizable component; disposing discrete portions of an imprint resist on the pretreatment coating, wherein the imprint resist is a polymerizable composition; forming a composite polymerizable coating on the nanoimprint lithography substrate as each discrete portion of the imprint resist spreads on the liquid pretreatment coating; contacting the composite polymerizable coating with a nanoimprint lithography template defining recesses ; polymerizing the composite polymerizable coating to yield a composite polymeric layer defining a pre-etch plurality of protrusions corresponding to the recesses of the nanoimprint lithography template , wherein at least one of the pre-etch plurality of protrusions corresponds to a boundary between two of the discrete portions of the imprint resist, and the pre-etch plurality of protrusions have a variation in pre-etch height of ±10% of a pre-etch average height; separating the nanoimprint lithography template from the composite polymeric layer ; and etching the pre-etch plurality of protrusions to yield a post-etch plurality of protrusions, wherein the post-etch plurality of protrusions have a variation in post-etch height of ±10% of a post-etch average height, and the pre-etch average height exceeds the post-etch average height, characterized in that the boundary between the two of the discrete portions of the imprint resist is formed from an inhomogeneous mixture of the imprint resist and the pretreatment composition. <EOS>