Automatic pipetting device with a rinsing station for rinsing the pipetting needle of the pipetting device , wherein in the rinsing station a drip tray is provided, in or above which at least one rinsing bowl , open at the top, is arranged, wherein a) the at least one rinsing bowl has a height (H) that corresponds to at least a specified maximum depth of immersion (T) of the pipetting needle in a sample or reagent liquid during an automatic pipetting operation, b) the at least one rinsing bowl has an inner circumference (UW) that is larger than the outer circumference (UP) of the pipetting needle , c) at its bottom end the at least one rinsing bowl has a rinsing bowl bottom and a rinsing bowl drain opening arranged in the bottom of the rinsing bowl, d) the at least one rinsing bowl has a hollow cylindrical section and a drain chamber , e) the drain chamber is arranged between the bottom of the rinsing bowl and the hollow cylindrical section of the rinsing bowl , f) towards the hollow cylindrical section of the rinsing bowl, the drain chamber has a drain chamber inlet , g) the rinsing bowl drain opening arranged in the bottom of the rinsing bowl is arranged offset relative to the drain chamber inlet such that, during expulsion of the rinsing liquid from the pipetting needle, the stream of rinsing liquid is not forced directly into the rinsing bowl drain opening , h) at a given feed rate (volume in unit time) of a specified rinsing liquid through the pipetting needle into the rinsing bowl , the hydraulic discharge resistance of the rinsing bowl drain is selected so that the feed rate of the rinsing liquid is greater than the discharge rate (volume in unit time) of the rinsing liquid through the rinsing bowl drain opening , and i) the drip tray is provided with a drain for the rinsing liquid that flows out of the rinsing bowl drain opening of the at least one rinsing bowl or over the upper edge of the rinsing bowl. a) the at least one rinsing bowl has a height (H) that corresponds to at least a specified maximum depth of immersion (T) of the pipetting needle in a sample or reagent liquid during an automatic pipetting operation, b) the at least one rinsing bowl has an inner circumference (UW) that is larger than the outer circumference (UP) of the pipetting needle , c) at its bottom end the at least one rinsing bowl has a rinsing bowl bottom and a rinsing bowl drain opening arranged in the bottom of the rinsing bowl, d) the at least one rinsing bowl has a hollow cylindrical section and a drain chamber , e) the drain chamber is arranged between the bottom of the rinsing bowl and the hollow cylindrical section of the rinsing bowl , f) towards the hollow cylindrical section of the rinsing bowl, the drain chamber has a drain chamber inlet , g) the rinsing bowl drain opening arranged in the bottom of the rinsing bowl is arranged offset relative to the drain chamber inlet such that, during expulsion of the rinsing liquid from the pipetting needle, the stream of rinsing liquid is not forced directly into the rinsing bowl drain opening , h) at a given feed rate (volume in unit time) of a specified rinsing liquid through the pipetting needle into the rinsing bowl , the hydraulic discharge resistance of the rinsing bowl drain is selected so that the feed rate of the rinsing liquid is greater than the discharge rate (volume in unit time) of the rinsing liquid through the rinsing bowl drain opening , and i) the drip tray is provided with a drain for the rinsing liquid that flows out of the rinsing bowl drain opening of the at least one rinsing bowl or over the upper edge of the rinsing bowl. <EOS>