mhurhangee/patent-ind-claim-en huggingface dataset:
A medical device (1, 1', 1"), comprising: a shaft ; a handle including a proximal portion and a distal portion , wherein the distal portion is fixed to a proximal portion of the shaft ; and a working channel for receiving a tool, the working channel extending from the handle into the shaft , wherein the working channel includes a proximal working channel and a distal working channel , the proximal working channel being rotatable relative to the distal working channel and aligned with the distal working channel throughout rotation of the proximal working channel , wherein the proximal working portion includes the proximal working channel and the distal portion includes the distal working channel , wherein the distal portion is rotatable relative to the proximal portion of the handle , and the shaft is configured to rotate with the distal portion of the handle . a shaft ; a handle including a proximal portion and a distal portion , wherein the distal portion is fixed to a proximal portion of the shaft ; and a working channel for receiving a tool, the working channel extending from the handle into the shaft , wherein the working channel includes a proximal working channel and a distal working channel , the proximal working channel being rotatable relative to the distal working channel and aligned with the distal working channel throughout rotation of the proximal working channel , wherein the proximal working portion includes the proximal working channel and the distal portion includes the distal working channel , wherein the distal portion is rotatable relative to the proximal portion of the handle , and the shaft is configured to rotate with the distal portion of the handle .
A stylus comprising: a housing; one or more electrodes disposed at a first end of the housing; wireless communication circuitry ; a haptic module ; and characterised in that the stylus further comprises: an acoustic resonator disposed at a second end of the housing opposite the first end and coupled to the haptic module; wherein the haptic module is configured to generate a drive signal in response to a request received by the wireless communication circuitry that causes the acoustic resonator to generate an acoustic signal, and the acoustic resonator is configured to generate the acoustic signal in response to the request received by the wireless communication circuitry. a housing; one or more electrodes disposed at a first end of the housing; wireless communication circuitry ; a haptic module ; and characterised in that the stylus further comprises: an acoustic resonator disposed at a second end of the housing opposite the first end and coupled to the haptic module; wherein the haptic module is configured to generate a drive signal in response to a request received by the wireless communication circuitry that causes the acoustic resonator to generate an acoustic signal, and the acoustic resonator is configured to generate the acoustic signal in response to the request received by the wireless communication circuitry. an acoustic resonator disposed at a second end of the housing opposite the first end and coupled to the haptic module; wherein the haptic module is configured to generate a drive signal in response to a request received by the wireless communication circuitry that causes the acoustic resonator to generate an acoustic signal, and the acoustic resonator is configured to generate the acoustic signal in response to the request received by the wireless communication circuitry.
An anti-microbial agent for use in a method of prophylactically treating a subject determined to be at risk for CMV infection, wherein said risk of infection is evaluated according to a method comprising: (a) stimulating a sample containing T cells from the subject with a viral antigen in vitro ; (b) determining expression levels of at least three markers selected from CD107, IFN-γ, IL-2, and TNF-α in response to the viral antigen stimulation of the T cells; (c) evaluating the risk of infection in the subject by calculating the risk of CMV infection as follows: log(hazard ratio) = - 0.396 X 1 - 0.324 X 2 + 0.307 X 3 where X 1 , refers to the polyfunctional CD107-/IFN-γ+/IL2+/TNFα+ CD4+ T cells, X 2 to the polyfunctional CD107-/IFN-γ+/IL2+/TNFα +CD8+ T cells, and X 3 to the bifunctional CD107+/IFN-γ+/IL2-/TNFα-CD8+ T cells; and wherein the subject for treatment is one having a risk of CMV infection with a log risk score greater than -1.2 or greater than -1.4. (a) stimulating a sample containing T cells from the subject with a viral antigen in vitro ; (b) determining expression levels of at least three markers selected from CD107, IFN-γ, IL-2, and TNF-α in response to the viral antigen stimulation of the T cells; (c) evaluating the risk of infection in the subject by calculating the risk of CMV infection as follows: log(hazard ratio) = - 0.396 X 1 - 0.324 X 2 + 0.307 X 3 where X 1 , refers to the polyfunctional CD107-/IFN-γ+/IL2+/TNFα+ CD4+ T cells, X 2 to the polyfunctional CD107-/IFN-γ+/IL2+/TNFα +CD8+ T cells, and X 3 to the bifunctional CD107+/IFN-γ+/IL2-/TNFα-CD8+ T cells; and wherein the subject for treatment is one having a risk of CMV infection with a log risk score greater than -1.2 or greater than -1.4.
A method of preparing a compound of formula (IIA): comprising reacting a compound of formula (IA): with 0.6 to 1.0 molar equivalent of cyanuric chloride to form the compound of formula (IIA).
A bicycle tool, comprising a valve connection means , and a tool element being connecting with the valve connection means in its longitudinal direction and comprising a tool holder at an end facing away from the valve connection means , wherein the tool holder is suitable for receiving a bit , characterized in that a longitudinal axis of a bit received in the tool holder is arranged perpendicular to a longitudinal axis of the valve connection means , and that the toolholder is formed as a ratchet. a valve connection means , and a tool element being connecting with the valve connection means in its longitudinal direction and comprising a tool holder at an end facing away from the valve connection means , wherein the tool holder is suitable for receiving a bit , characterized in that a longitudinal axis of a bit received in the tool holder is arranged perpendicular to a longitudinal axis of the valve connection means , and that the toolholder is formed as a ratchet.
A variable resistance memory device comprising a variable resistance layer including a first layer and a second layer , the second layer on the first layer , the first layer including a first material, the second layer including a second material having a valence different from a valence of the first material; a first conductive element (E1) and a second conductive element (E2) on the variable resistance layer and separated from each other so that an electric current path is formed in the variable resistance layer in a direction perpendicular to a direction in which the first layer and the second layer are stacked: a support layer including an insulating material and supporting the first layer ; a channel layer on the second layer ; a gate insulating layer on the channel layer ; and a plurality of gate electrodes on the gate insulating layer , the plurality of gate electrodes being separated from one another, wherein the first conductive element (E1) and the second conductive element (E2) are connected to opposite ends of the channel layer . a variable resistance layer including a first layer and a second layer , the second layer on the first layer , the first layer including a first material, the second layer including a second material having a valence different from a valence of the first material; a first conductive element (E1) and a second conductive element (E2) on the variable resistance layer and separated from each other so that an electric current path is formed in the variable resistance layer in a direction perpendicular to a direction in which the first layer and the second layer are stacked: a support layer including an insulating material and supporting the first layer ; a channel layer on the second layer ; a gate insulating layer on the channel layer ; and a plurality of gate electrodes on the gate insulating layer , the plurality of gate electrodes being separated from one another, wherein the first conductive element (E1) and the second conductive element (E2) are connected to opposite ends of the channel layer .
An integrated access backhaul, IAB, link control method, comprising: acquiring (S301), by an IAB, that a link failure occurs between an upstream IAB of the IAB and a donor centralized unit, CU, or an upstream IAB of the IAB is executing a link migration/adjustment; and sending (S302), by the IAB, link state indication information to the donor CU, or a child IAB, wherein the link state indication information comprises at least one of: a link identifier or a route identifier, an identifier of an IAB to which the link failure or the link migration occurs, a link failure cause or a link state type; wherein the link failure cause comprises a parent IAB link failure; and wherein the link state type comprises the link failure and the link migration. acquiring (S301), by an IAB, that a link failure occurs between an upstream IAB of the IAB and a donor centralized unit, CU, or an upstream IAB of the IAB is executing a link migration/adjustment; and sending (S302), by the IAB, link state indication information to the donor CU, or a child IAB, wherein the link state indication information comprises at least one of: a link identifier or a route identifier, an identifier of an IAB to which the link failure or the link migration occurs, a link failure cause or a link state type; wherein the link failure cause comprises a parent IAB link failure; and wherein the link state type comprises the link failure and the link migration.
A taste-modifying kit suitable for facilitating cleansing the gastrointestinal tract of a subject comprising: a gastrointestinal tract preparation composition, a premeasured amount of at least one pH-modifying agent and at least one taste-modifying substance, wherein the taste-modifying substance is selected from the group consisting of miraculin, thaumatin, monellin, mabinlin, brazzein, pentadin, curculin, neuculin, and mixtures thereof, wherein the gastrointestinal tract preparation composition comprises polyethylene glycol (PEG) and wherein the gastrointestinal tract is the intestine, such as the colon, and the gastrointestinal tract preparation composition is a bowel preparation solution, wherein the premeasured amount of pH-modifying agent is sufficient to adjust the pH of a gastrointestinal tract preparation solution to a pH ranging from about 4 to about 6.4.
Refrigeration and/or freezer device , comprising at least one body and at least one closure element closing an opening of the body , as well as at least one profile assembly , arranged in a gap formed between the closure element and the body , comprising a base , at least one fastening assembly , at least one sealing assembly and at least one profile element , wherein at least one free end of the profile element is arranged on the sealing assembly , wherein at least one further free end of the profile element is connected to the base via at least one movement assembly projecting at least partially into the sealing assembly and comprising at least two movement portions arranged approximately opposite one another, wherein the sealing assembly comprises at least one insulating element arranged spaced apart from the profile element via at least one hollow chamber , integrally connected thereto and formed as a web, characterised in that the insulating element formed as a web is arranged on the sealing assembly in parallel to the profile element , in that the insulating element formed as a web has a heat transmission resistance R in accordance with EN ISO 6946 of approximately 30 to 450 (m 2 ·K) / W, preferably approximately 40 to 400 (m 2 ·K) / W, particularly preferably approximately 50 to 350 (m 2 ·K) / W, for a wall thickness of approximately 1.5 to 10 mm.
Process for producing superacid-acidified, in particular trifluoromethanesulfonic acid-acidified, end-equilibrated acetoxy-bearing siloxanes, characterized in that it comprises reacting cyclic siloxanes, in particular comprising D 4 and/or D 5 , and/or mixtures of cyclic branched siloxanes of the D/T type, optionally in admixture with hydroxy-bearing siloxanes and/or acetoxy- and/or alkoxy-bearing silanes and/or siloxanes, with acetic anhydride and with addition of acetic acid, using superacid, in particular trifluoromethanesulfonic acid, as catalyst, wherein the cyclic branched siloxanes of the D/T type are mixtures of cyclic branched siloxanes of the D/T type which contain not only siloxanes comprising D and T units but also siloxanes comprising Q units with the proviso that in these mixtures the proportion of Si atoms derived from Q units is ≤ 10% by mass to ≥ 0% by mass, preferably ≤ 5% by mass to ≥ 0% by mass, based on the entirety of all Si atoms. it comprises reacting cyclic siloxanes, in particular comprising D 4 and/or D 5 , and/or mixtures of cyclic branched siloxanes of the D/T type, optionally in admixture with hydroxy-bearing siloxanes and/or acetoxy- and/or alkoxy-bearing silanes and/or siloxanes, with acetic anhydride and with addition of acetic acid, using superacid, in particular trifluoromethanesulfonic acid, as catalyst, wherein the cyclic branched siloxanes of the D/T type are mixtures of cyclic branched siloxanes of the D/T type which contain not only siloxanes comprising D and T units but also siloxanes comprising Q units with the proviso that in these mixtures the proportion of Si atoms derived from Q units is ≤ 10% by mass to ≥ 0% by mass, preferably ≤ 5% by mass to ≥ 0% by mass, based on the entirety of all Si atoms.
A method for producing a printed wiring board having a circuit pattern on an electrically insulating substrate, the method comprising: step 1, forming an electrically conductive metal layer (M1) on an electrically insulating substrate (A), the electrically conductive metal layer (M1) containing silver particles; step 2, forming a patterned resist on the electrically conductive metal layer (M1), the patterned resist being a resist patterned by removing a portion thereof in an area in which a circuit is to be formed; step 3, forming a conductor-circuit layer (M2) by electrolytic copper plating; and step 4, peeling away the patterned resist and removing, using an etchant, the electrically conductive metal layer (M1) in an area in which no circuit has been formed, wherein the etchant contains a carboxylic acid and hydrogen peroxide as active ingredients. step 1, forming an electrically conductive metal layer (M1) on an electrically insulating substrate (A), the electrically conductive metal layer (M1) containing silver particles; step 2, forming a patterned resist on the electrically conductive metal layer (M1), the patterned resist being a resist patterned by removing a portion thereof in an area in which a circuit is to be formed; step 3, forming a conductor-circuit layer (M2) by electrolytic copper plating; and step 4, peeling away the patterned resist and removing, using an etchant, the electrically conductive metal layer (M1) in an area in which no circuit has been formed, wherein the etchant contains a carboxylic acid and hydrogen peroxide as active ingredients.
A thin film transistor (TFT) comprising a substrate with a gate electrode layer deposited and patterned thereon and a gate insulator layer deposited on the gate electrode layer and the substrate, further comprising (i) a carrier injection layer essentially consisting of ITO arranged above the gate insulator layer, (ii) a source/drain (S/D) electrode layer essentially consisting of Al deposited on the carrier injection layer, and (iii) a semiconductor layer essentially consisting of IGZO, ITZO, ITO, IZO, IGO, HIZO, or indium oxide (In 2 O 3 ), wherein the TFT is patterned such that the semiconductor layer directly contacts the gate insulator layer, the carrier injection layer and the S/D electrode layer, and wherein the TFT comprises a protection layer , essentially consisting of ITO, wherein the protection layer is arranged above S/D electrode layer and wherein the semiconductor layer reaches from the gate insulator layer to above the protection layer , wherein the semiconductor layer is not located underneath the S/D electrode layer or the injection layer , the semiconductor layer is in contact with the substrate averted surface of the protection layer , and wherein the semiconductor layer directly contacts a) the gate insulator layer , b) a side surface of the carrier injection layer , and c) a side surface of the S/D electrode layer , the contact of the semiconductor layer with the side surface of the S/D electrode layer occurs above the contact of the semiconductor layer with the side surface of the carrier injection layer .
A tire tread composition comprising the reaction product of components, by weight of the composition, within the range from: 5 to 75 wt% of a diene elastomer; 20 to 80 wt% of filler; a curative agent; and 5 to 30 wt% of an aminoalkylsilyl-functionalized polyolefin (PO-aminoalkyl-Si), an alkylsilane-functionalized polyolefin or an alkoxysilane-functionalized polyolefin, or a blend thereof, each having a polyolefin portion and a functional group attached thereto. 5 to 75 wt% of a diene elastomer; 20 to 80 wt% of filler; a curative agent; and 5 to 30 wt% of an aminoalkylsilyl-functionalized polyolefin (PO-aminoalkyl-Si), an alkylsilane-functionalized polyolefin or an alkoxysilane-functionalized polyolefin, or a blend thereof, each having a polyolefin portion and a functional group attached thereto.
A bandage comprising: - a base substrate having a central region , a first side region and a second side region , the base substrate comprising an elastic material; - a wound covering portion positioned over the central region; - a first side coupling member extending over the first side region, and a second side coupling member extending over the second region; - a first side adhesive portion positioned on the first side region, and a second side adhesive portion positioned on the second side region, wherein at least one of the first side coupling member and the second side coupling member further comprises: - a base having a lower surface and an upper surface , and defining an outer perimeter , the outer perimeter having a leading edge and a trailing edge ; and - a plurality of gripping structures extending outwardly from the base, and spaced apart from each other, each of the gripping structures being curved toward the leading edge, and wherein the gripping structures each include a leading surface and a trailing surface , and opposing first side surface and second side surface , together defining a base perimeter at the base and an upper tip distally therefrom, the opposing first side surface and second side surface inwardly angled to meet at the upper tip, with the leading surface and the trailing surfaces being curved toward the leading edge, wherein the upper tip lies outside of a footprint defined by the base perimeter. - a base substrate having a central region , a first side region and a second side region , the base substrate comprising an elastic material; - a wound covering portion positioned over the central region; - a first side coupling member extending over the first side region, and a second side coupling member extending over the second region; - a first side adhesive portion positioned on the first side region, and a second side adhesive portion positioned on the second side region, - a base having a lower surface and an upper surface , and defining an outer perimeter , the outer perimeter having a leading edge and a trailing edge ; and - a plurality of gripping structures extending outwardly from the base, and spaced apart from each other, each of the gripping structures being curved toward the leading edge, and
A front loading wafer probe station having a chamber , comprising: a chuck movable between a test position and a loading position, wherein the test position and the loading position are within the chamber ; a pivoting arm ; and two wafer supporting segments , wherein each wafer supporting segment is rotatably mounted on an end of the pivoting arm , wherein the wafer supporting segments are movable between a position inside the chamber and a position at least partially outside the chamber, and wherein the wafer supporting segments are rotatable away from one another and out of the way of the chuck when at the position inside the chamber. a chuck movable between a test position and a loading position, wherein the test position and the loading position are within the chamber ; a pivoting arm ; and two wafer supporting segments , wherein each wafer supporting segment is rotatably mounted on an end of the pivoting arm , wherein the wafer supporting segments are movable between a position inside the chamber and a position at least partially outside the chamber, and wherein the wafer supporting segments are rotatable away from one another and out of the way of the chuck when at the position inside the chamber.
A method for producing a positive electrode active material for a non-aqueous electrolyte secondary battery, comprising: a first step of adding and mixing an alkali solution in which a tungsten compound is dissolved, to and with a lithium metal composite oxide powder made of primary particles represented by general formula Li z Ni 1-x-y Co x M y O 2 , wherein 0 ≤ x ≤ 0.1, 0 ≤ y ≤ 0.1 and 0.97 ≤ z ≤ 1.20, and M is at least one element selected from the group consisting of Mn, W, Mg, Mo, Nb, Ti, Si and Al, and secondary particles formed by aggregation of the primary particles, and a second step of thermally treating the alkali solution and the lithium metal composite oxide powder mixed, at a temperature of 100 to 600°C, wherein an amount of the alkali solution to be added in the first step is 0.1 to 10% by mass relative to the lithium metal composite oxide powder. a first step of adding and mixing an alkali solution in which a tungsten compound is dissolved, to and with a lithium metal composite oxide powder made of primary particles represented by general formula Li z Ni 1-x-y Co x M y O 2 , wherein 0 ≤ x ≤ 0.1, 0 ≤ y ≤ 0.1 and 0.97 ≤ z ≤ 1.20, and M is at least one element selected from the group consisting of Mn, W, Mg, Mo, Nb, Ti, Si and Al, and secondary particles formed by aggregation of the primary particles, and a second step of thermally treating the alkali solution and the lithium metal composite oxide powder mixed, at a temperature of 100 to 600°C, wherein an amount of the alkali solution to be added in the first step is 0.1 to 10% by mass relative to the lithium metal composite oxide powder.