An aqueous electrolytic composition useful in filling submicron features of a semiconductor integrated circuit device or through silicon vias, the composition comprising: an acid; copper ions; and a leveler that comprises an oligomer and/or polymer compound selected from the group consisting of salts comprising a cation having the structure: wherein: G is selected from the group consisting of -O-, O-((A) r -O) s - and -((A) r -O) s - A has the structure, B has the structure, D has the structure, each of p, q, r, t, u, w and y is an integer between 1 and 6 inclusive, each of v, x, k, and z is independently an integer between 0 and 6 inclusive, s is an integer between 1 and 10 inclusive, k is at least one when v or x is other than 0, each of R 1 to R 6 , R 9 to R 19 , R 23 , R 25 and R 34 is independently selected from the group consisting of hydrogen or lower alkyl comprising 1 to 4 carbon atoms, each of R 7 , R 8 , R 20 , R 21 , R 22 , R 24 and R 33 is independently selected from the group consisting of substituted or unsubstituted aliphatic hydrocarbyl having 1 to 4 carbon atoms, and n is greater than 1 and up to 30; provided that, when prepared by reaction of an alkylating agent of structure (I) with an amine compound of structure (II) in which R 13 is hydrogen said leveler may comprise or consist of polymer or oligomer chains that correspond to structure (III) except that R 13 is displaced in some or all repeat units by reaction with the structure (I) alkylating agent through which said polymer or oligomer chains are cross-linked. an acid; copper ions; and a leveler that comprises an oligomer and/or polymer compound selected from the group consisting of salts comprising a cation having the structure: wherein: G is selected from the group consisting of -O-, O-((A) r -O) s - and -((A) r -O) s - A has the structure, B has the structure, D has the structure, each of p, q, r, t, u, w and y is an integer between 1 and 6 inclusive, each of v, x, k, and z is independently an integer between 0 and 6 inclusive, s is an integer between 1 and 10 inclusive, k is at least one when v or x is other than 0, each of R 1 to R 6 , R 9 to R 19 , R 23 , R 25 and R 34 is independently selected from the group consisting of hydrogen or lower alkyl comprising 1 to 4 carbon atoms, each of R 7 , R 8 , R 20 , R 21 , R 22 , R 24 and R 33 is independently selected from the group consisting of substituted or unsubstituted aliphatic hydrocarbyl having 1 to 4 carbon atoms, and n is greater than 1 and up to 30; provided that, when prepared by reaction of an alkylating agent of structure (I) with an amine compound of structure (II) in which R 13 is hydrogen said leveler may comprise or consist of polymer or oligomer chains that correspond to structure (III) except that R 13 is displaced in some or all repeat units by reaction with the structure (I) alkylating agent through which said polymer or oligomer chains are cross-linked. G is selected from the group consisting of -O-, O-((A) r -O) s - and -((A) r -O) s - A has the structure, B has the structure, D has the structure, each of p, q, r, t, u, w and y is an integer between 1 and 6 inclusive, each of v, x, k, and z is independently an integer between 0 and 6 inclusive, s is an integer between 1 and 10 inclusive, k is at least one when v or x is other than 0, each of R 1 to R 6 , R 9 to R 19 , R 23 , R 25 and R 34 is independently selected from the group consisting of hydrogen or lower alkyl comprising 1 to 4 carbon atoms, each of R 7 , R 8 , R 20 , R 21 , R 22 , R 24 and R 33 is independently selected from the group consisting of substituted or unsubstituted aliphatic hydrocarbyl having 1 to 4 carbon atoms, and n is greater than 1 and up to 30; <EOS>