A method for producing a fluoride fluorescent material, wherein the fluoride fluorescent material has a hexagonal crystal structure, P63mc space group symmetry, and a composition represented by the following formula (I): K 2 [Ge 1-a Mn 4+ a F 6 ] (I) wherein in the formula (I), a satisfies 0 < a < 0.2, wherein the method comprises: preparing fluoride particles comprising a composition represented by the following formula (I): K 2 [Ge 1-a Mn 4+ a F 6 ] (I) wherein in the formula (I), a satisfies 0 < a < 0.2, by mixing a first solution containing at least potassium ion and hydrogen fluoride, a second solution containing at least a first complex ion including tetravalent manganese and hydrogen fluoride, and a third solution containing at least a second complex ion including germanium and fluoride ion, rinsing the resulting fluoride particles with a rinsing liquid, drying at a temperature of 50°C or more and 110°C or less; and bringing the fluoride particles into contact with a fluorine-containing substance which is fluorine gas, and subjecting to a heat treatment in an inert gas atmosphere containing 3% by volume or more and 30% by volume or less of fluorine gas at a temperature in a range of 450°C or more and 550°C or less, wherein the inert gas atmosphere means an atmosphere containing argon, helium, nitrogen as a major component in the atmosphere. wherein in the formula (I), a satisfies 0 < a < 0.2, wherein the method comprises: preparing fluoride particles comprising a composition represented by the following formula (I): K 2 [Ge 1-a Mn 4+ a F 6 ] (I) wherein in the formula (I), a satisfies 0 < a < 0.2, by mixing a first solution containing at least potassium ion and hydrogen fluoride, a second solution containing at least a first complex ion including tetravalent manganese and hydrogen fluoride, and a third solution containing at least a second complex ion including germanium and fluoride ion, rinsing the resulting fluoride particles with a rinsing liquid, drying at a temperature of 50°C or more and 110°C or less; and bringing the fluoride particles into contact with a fluorine-containing substance which is fluorine gas, and subjecting to a heat treatment in an inert gas atmosphere containing 3% by volume or more and 30% by volume or less of fluorine gas at a temperature in a range of 450°C or more and 550°C or less, wherein the inert gas atmosphere means an atmosphere containing argon, helium, nitrogen as a major component in the atmosphere. wherein in the formula (I), a satisfies 0 < a < 0.2, by mixing a first solution containing at least potassium ion and hydrogen fluoride, a second solution containing at least a first complex ion including tetravalent manganese and hydrogen fluoride, and a third solution containing at least a second complex ion including germanium and fluoride ion, rinsing the resulting fluoride particles with a rinsing liquid, drying at a temperature of 50°C or more and 110°C or less; and bringing the fluoride particles into contact with a fluorine-containing substance which is fluorine gas, and subjecting to a heat treatment in an inert gas atmosphere containing 3% by volume or more and 30% by volume or less of fluorine gas at a temperature in a range of 450°C or more and 550°C or less, wherein the inert gas atmosphere means an atmosphere containing argon, helium, nitrogen as a major component in the atmosphere. <EOS>