A method for manufacturing a multi-spectral filter comprising a plurality of filter elements, each filter element being adapted to transmit a spectral band of electromagnetic radiation among a plurality of spectral bands, characterized in that the method comprises the following steps: - depositing a first common reflector (1-6; 1-11) for the plurality of filter elements on a substrate, - depositing, on the first reflector, a first cavity stack (7-15; 12-16) comprising at least N cavity layers and N-1 barrier layers deposited alternately, the upper layer being a cavity layer, - selectively etching a number M of cavity layers in a plurality of zones each corresponding to a filter element, where M varies from 0 to N-1 from one zone to another, and - selectively etching the barrier layers located between the etched cavity layers, such that each filter element comprises N-M cavity layers and N-M-1 non-etched barrier layers forming a cavity, the cavity layers and the barrier layers being made of different and optically transparent materials, the steps of selectively etching the cavity layers and the barrier layers being carried out: - either by etching the cavity layers and the barrier layers alternately, one after the other, with an etching recipe adapted to the material of the cavity layers and an etching recipe adapted to the material of the barrier layers, - or by etching the cavity layers and the barrier layers with an etching recipe adapted to the material of the cavity layers, with the exception of the last barrier layer, which is etched with an etching recipe adapted to the material of the barrier layers. - depositing a first common reflector (1-6; 1-11) for the plurality of filter elements on a substrate, - depositing, on the first reflector, a first cavity stack (7-15; 12-16) comprising at least N cavity layers and N-1 barrier layers deposited alternately, the upper layer being a cavity layer, - selectively etching a number M of cavity layers in a plurality of zones each corresponding to a filter element, where M varies from 0 to N-1 from one zone to another, and - selectively etching the barrier layers located between the etched cavity layers, such that each filter element comprises N-M cavity layers and N-M-1 non-etched barrier layers forming a cavity, the cavity layers and the barrier layers being made of different and optically transparent materials, the steps of selectively etching the cavity layers and the barrier layers being carried out: - either by etching the cavity layers and the barrier layers alternately, one after the other, with an etching recipe adapted to the material of the cavity layers and an etching recipe adapted to the material of the barrier layers, - or by etching the cavity layers and the barrier layers with an etching recipe adapted to the material of the cavity layers, with the exception of the last barrier layer, which is etched with an etching recipe adapted to the material of the barrier layers. - either by etching the cavity layers and the barrier layers alternately, one after the other, with an etching recipe adapted to the material of the cavity layers and an etching recipe adapted to the material of the barrier layers, - or by etching the cavity layers and the barrier layers with an etching recipe adapted to the material of the cavity layers, with the exception of the last barrier layer, which is etched with an etching recipe adapted to the material of the barrier layers. <EOS>