mhurhangee/patent-ind-claim-en huggingface dataset:
A method for wireless communications at a first cell, comprising: determining a number of one or more active user equipments, UEs, in the first cell that might benefit from reduced interference if a base station of a second cell protected a first set of resources by transmitting almost blank subframes, ABS, to be used by the first cell; characterized in that wherein the determining comprises counting one or more UEs in the first cell that are strongly interfered by transmissions in the second cell based on a difference, for each of a plurality of UEs, in reference signal received power, RSRP, between the first cell and the second cell and whose downlink traffic is higher than a threshold; and reporting the determined number of active UEs to the base station of the second cell. determining a number of one or more active user equipments, UEs, in the first cell that might benefit from reduced interference if a base station of a second cell protected a first set of resources by transmitting almost blank subframes, ABS, to be used by the first cell; characterized in that wherein the determining comprises counting one or more UEs in the first cell that are strongly interfered by transmissions in the second cell based on a difference, for each of a plurality of UEs, in reference signal received power, RSRP, between the first cell and the second cell and whose downlink traffic is higher than a threshold; and reporting the determined number of active UEs to the base station of the second cell.
A service sending method, wherein the method comprises: obtaining , by a network device, at least two data streams, wherein the at least two data streams comprise a first data stream and a second data stream; identifying at least two idle blocks in the second data stream, generating a first information block and a second information block at locations of the at least two idle blocks ; inserting the first data stream into the second data stream, to generate a third data stream, wherein the third data stream comprises the first information block and the second information block, and wherein the first information block and the second information block are generated from the second data stream; and wherein the first information block is used to carry the first data stream, the second information block is used to carry a first data stream distribution indication map, the first data stream distribution indication map is used to indicate a location of the first information block, and the second information block is identified by using a preset map block type; and sending the third data stream . obtaining , by a network device, at least two data streams, wherein the at least two data streams comprise a first data stream and a second data stream; identifying at least two idle blocks in the second data stream, generating a first information block and a second information block at locations of the at least two idle blocks ; inserting the first data stream into the second data stream, to generate a third data stream, wherein the third data stream comprises the first information block and the second information block, and wherein the first information block and the second information block are generated from the second data stream; and wherein the first information block is used to carry the first data stream, the second information block is used to carry a first data stream distribution indication map, the first data stream distribution indication map is used to indicate a location of the first information block, and the second information block is identified by using a preset map block type; and sending the third data stream .
A back-illuminated semiconductor photodetector comprising a semiconductor substrate including a first main surface and a second main surface opposing each other, wherein the semiconductor substrate includes a first semiconductor region of a first conductivity type, and a plurality of second semiconductor regions of a second conductivity type, the second semiconductor regions provided in a side of the second main surface and constituting pn junctions with the first semiconductor region, each of the plurality of second semiconductor regions includes a first region including a textured surface (TS), and a second region including no textured surface, characterised in that the thickness of the first region at the deepest position of recesses of the textured surface is smaller than the distance between a surface of the second region and the deepest position in a thickness direction of the semiconductor substrate, and the first main surface is a light incident surface of the semiconductor substrate. a semiconductor substrate including a first main surface and a second main surface opposing each other, wherein the semiconductor substrate includes a first semiconductor region of a first conductivity type, and a plurality of second semiconductor regions of a second conductivity type, the second semiconductor regions provided in a side of the second main surface and constituting pn junctions with the first semiconductor region, each of the plurality of second semiconductor regions includes a first region including a textured surface (TS), and a second region including no textured surface, characterised in that the thickness of the first region at the deepest position of recesses of the textured surface is smaller than the distance between a surface of the second region and the deepest position in a thickness direction of the semiconductor substrate, and the first main surface is a light incident surface of the semiconductor substrate.
A method to manufacture at least two different coils (9-14) around a component of an article; the method comprises the steps of: moving, by means of a main conveyor and along a winding path (P), a carriage carrying at least one seat designed to house the component ; placing, in an input station (S1) arranged along the winding path (P), the component in the seat of the carriage ; characterized by winding, in a first winding station (S3) arranged along the winding path (P) downstream of the input station (S1), a first externally insulated conductor wire around the component in order to obtain a series of turns making up a first coil (9-14); and winding, in a second winding station (S6) arranged along the winding path (P) downstream of the first winding station (S3), a second externally insulated conductor wire around the component in order to obtain a series of turns making up a second coil (9-14); changing, in a first handling station (S5) arranged along the winding path (P) between the first winding station (S3) and the second winding station (S6), the orientation of the component relative to the carriage . moving, by means of a main conveyor and along a winding path (P), a carriage carrying at least one seat designed to house the component ; placing, in an input station (S1) arranged along the winding path (P), the component in the seat of the carriage ; characterized by winding, in a first winding station (S3) arranged along the winding path (P) downstream of the input station (S1), a first externally insulated conductor wire around the component in order to obtain a series of turns making up a first coil (9-14); and winding, in a second winding station (S6) arranged along the winding path (P) downstream of the first winding station (S3), a second externally insulated conductor wire around the component in order to obtain a series of turns making up a second coil (9-14); changing, in a first handling station (S5) arranged along the winding path (P) between the first winding station (S3) and the second winding station (S6), the orientation of the component relative to the carriage .
An arc welding control method for alternately repeating a short-circuit period and an arc period as a main component while feeding a welding wire to a base material at a constant wire feeding speed using a shield gas containing carbon dioxide, the arc welding control method comprising: starting the arc period by increasing a welding current (Ia) in the short-circuit period; and performing control in the arc period, the control including: first control of increasing the welding current (Ia) to a first current value in a range from 200 A to 300 A inclusive at a first gradient (S1) and maintaining the welding current (Ia) at the first current value for a first period (T1); second control of reducing the welding current (Ia) from the first current value to a second current value at a second gradient (S2) and maintaining the welding current (Ia) at the second current value for a second period (T2); third control of increasing the welding current (Ia) from the second current value to a third current value higher than the first current value at a third gradient (S3); and fourth control that is started to reduce the welding current (Ia) from the third current value within 0.5 ms after the welding current (la) reaches the third current value under the third control. starting the arc period by increasing a welding current (Ia) in the short-circuit period; and performing control in the arc period, the control including: first control of increasing the welding current (Ia) to a first current value in a range from 200 A to 300 A inclusive at a first gradient (S1) and maintaining the welding current (Ia) at the first current value for a first period (T1); second control of reducing the welding current (Ia) from the first current value to a second current value at a second gradient (S2) and maintaining the welding current (Ia) at the second current value for a second period (T2); third control of increasing the welding current (Ia) from the second current value to a third current value higher than the first current value at a third gradient (S3); and fourth control that is started to reduce the welding current (Ia) from the third current value within 0.5 ms after the welding current (la) reaches the third current value under the third control. first control of increasing the welding current (Ia) to a first current value in a range from 200 A to 300 A inclusive at a first gradient (S1) and maintaining the welding current (Ia) at the first current value for a first period (T1); second control of reducing the welding current (Ia) from the first current value to a second current value at a second gradient (S2) and maintaining the welding current (Ia) at the second current value for a second period (T2); third control of increasing the welding current (Ia) from the second current value to a third current value higher than the first current value at a third gradient (S3); and fourth control that is started to reduce the welding current (Ia) from the third current value within 0.5 ms after the welding current (la) reaches the third current value under the third control.
A mask comprising: a mask body ; ear materials , constituting a pair, coupled to the mask body ; and auxiliary materials provided on an outer surface side of the mask body , wherein the outer surface is a side facing away from a face of a wearer when the mask is worn, wherein in a state before start of use, the mask body , the ear materials , and the auxiliary materials are stacked in this order, the ear materials , constituting the pair, are separably coupled with each other, and provided on the outer surface side of the mask body , outlines of the ear materials have a wavy shape, and the ear materials , constituting the pair, are coupled to the outer surface in side portions of the mask body via the auxiliary materials . a mask body ; ear materials , constituting a pair, coupled to the mask body ; and auxiliary materials provided on an outer surface side of the mask body , wherein the outer surface is a side facing away from a face of a wearer when the mask is worn, wherein in a state before start of use, the mask body , the ear materials , and the auxiliary materials are stacked in this order, the ear materials , constituting the pair, are separably coupled with each other, and provided on the outer surface side of the mask body , outlines of the ear materials have a wavy shape, and the ear materials , constituting the pair, are coupled to the outer surface in side portions of the mask body via the auxiliary materials .
A display system comprising: a Multi-Functional Peripheral , MFP, configured to perform specific processing based on a request from a terminal , the MFP comprising: a connection portion configured to connect the MFP to the terminal ; an obtaining portion configured to obtain, from another MFP , screen data indicating an element corresponding to a part or a whole of a first screen , the first screen having been displayed in the terminal by said another MFP before the MFP connects to the terminal ; and a display control portion configured to arrange a second screen including the part or the whole of the first screen based on the screen data to control the terminal to display the second screen , a terminal ; and the another MFP; wherein the another MFP includes a second connection portion configured to connect the another MFP to the terminal , and a second display control portion configured to control the terminal to display the first screen , the first screen being used for a user to perform operation for the specific processing, and the terminal includes a display portion configured to display the first screen and the second screen . a connection portion configured to connect the MFP to the terminal ; an obtaining portion configured to obtain, from another MFP , screen data indicating an element corresponding to a part or a whole of a first screen , the first screen having been displayed in the terminal by said another MFP before the MFP connects to the terminal ; and a display control portion configured to arrange a second screen including the part or the whole of the first screen based on the screen data to control the terminal to display the second screen , a terminal ; and the another MFP; wherein the another MFP includes a second connection portion configured to connect the another MFP to the terminal , and a second display control portion configured to control the terminal to display the first screen , the first screen being used for a user to perform operation for the specific processing, and the terminal includes a display portion configured to display the first screen and the second screen .
A method of making a security device, comprising: (a) forming an array of primary focussing elements on a first region of a focussing element support layer , by: (a)(i) applying at least one transparent curable material either to the focussing element support layer or to a casting tool carrying a surface relief over an area which includes at least the first region, the surface relief comprising portions corresponding to the primary focussing elements ,; (a)(ii) forming the transparent curable material(s) with the casting tool ; and (a)(iii) curing the transparent curable material(s) so as to retain the surface relief in the first region; wherein the surface relief further includes a plurality of structures of greater depth than the height of the primary focussing elements such that the cured transparent material(s) include a plurality of features protruding above the height of the primary focussing elements between primary focussing elements of the array, wherein the surface relief is configured such that more than one of the primary focussing elements of the array space each of the plurality of features from the next, and wherein the features protruding above the height of the primary focussing elements are arranged with a spacing of at least one feature every 50 primary focussing elements. (a) forming an array of primary focussing elements on a first region of a focussing element support layer , by: (a)(i) applying at least one transparent curable material either to the focussing element support layer or to a casting tool carrying a surface relief over an area which includes at least the first region, the surface relief comprising portions corresponding to the primary focussing elements ,; (a)(ii) forming the transparent curable material(s) with the casting tool ; and (a)(iii) curing the transparent curable material(s) so as to retain the surface relief in the first region; wherein the surface relief further includes a plurality of structures of greater depth than the height of the primary focussing elements such that the cured transparent material(s) include a plurality of features protruding above the height of the primary focussing elements between primary focussing elements of the array, wherein the surface relief is configured such that more than one of the primary focussing elements of the array space each of the plurality of features from the next, and wherein the features protruding above the height of the primary focussing elements are arranged with a spacing of at least one feature every 50 primary focussing elements. (a)(i) applying at least one transparent curable material either to the focussing element support layer or to a casting tool carrying a surface relief over an area which includes at least the first region, the surface relief comprising portions corresponding to the primary focussing elements ,; (a)(ii) forming the transparent curable material(s) with the casting tool ; and (a)(iii) curing the transparent curable material(s) so as to retain the surface relief in the first region;
A method for producing a metal orthopedic implant, the implant including anterior and posterior surfaces defining not bone-contacting surfaces and side surfaces defining bone-contacting surfaces, the method comprising the following steps: a. additively building the orthopedic implant in a vertical build direction, the vertical build direction being defined by either an anterior surface to posterior surface direction or a posterior surface to anterior surface direction; b. reheating the formed implant body; and c. eroding one or more of the bone contacting surfaces of the orthopedic implant; wherein reheating the formed implant body comprises treating the implant with hot isostatic pressure, the density of the implant body being equal to 100% after treating with hot isostatic pressure. a. additively building the orthopedic implant in a vertical build direction, the vertical build direction being defined by either an anterior surface to posterior surface direction or a posterior surface to anterior surface direction; b. reheating the formed implant body; and c. eroding one or more of the bone contacting surfaces of the orthopedic implant; wherein reheating the formed implant body comprises treating the implant with hot isostatic pressure, the density of the implant body being equal to 100% after treating with hot isostatic pressure.
A liquid crystal backlight device comprising: a frame that includes a first frame having an opening and a second frame defining a space with the first frame; a liquid crystal panel that is located on a side of the first frame opposite to the second frame , and covers the opening; a backlight unit (103 107) that is located in the space (S2), and irradiates the liquid crystal panel with light; an optical sheet that is located between the first frame and the backlight unit (103 107); a first elastic member that is located between the liquid crystal panel and the first frame , and surrounds the opening of the first frame without any gap; a plurality of second elastic members that are located between the first frame and the optical sheet , surround the opening of the first frame , and are arranged at a predetermined spacing from each other; and a seal material , arranged at an outside surface of the liquid crystal backlight device , that seals a hole (106d 105c 104d) which is formed through a lateral part of the frame as seen in an arrangement direction of the first frame and the second frame and through which the space and an outside of the liquid crystal backlight device are arranged to communicate with each other when the seal material is removed. a frame that includes a first frame having an opening and a second frame defining a space with the first frame; a liquid crystal panel that is located on a side of the first frame opposite to the second frame , and covers the opening; a backlight unit (103 107) that is located in the space (S2), and irradiates the liquid crystal panel with light; an optical sheet that is located between the first frame and the backlight unit (103 107); a first elastic member that is located between the liquid crystal panel and the first frame , and surrounds the opening of the first frame without any gap; a plurality of second elastic members that are located between the first frame and the optical sheet , surround the opening of the first frame , and are arranged at a predetermined spacing from each other; and a seal material , arranged at an outside surface of the liquid crystal backlight device , that seals a hole (106d 105c 104d) which is formed through a lateral part of the frame as seen in an arrangement direction of the first frame and the second frame and through which the space and an outside of the liquid crystal backlight device are arranged to communicate with each other when the seal material is removed.
An assembly comprising a railway vehicle car and at least one ballast , the car comprising at least one frame , and the frame bounding, as a sub-frame, at least one space for receiving the at least one ballast characterised in that the receiving space comprises a sleeve , and the ballast comprises a slide , the sleeve and the slide being complementary so that the sleeve is configured to receive the slide of the ballast .
A micro-electromechanical system (1B to 1H) for actuation of a micro-cantilever by base excitation, the system comprising: a base substrate ; a micro-cantilever having a free end and a fixed end, the fixed end being fixed to the base substrate ; and one or more thermal actuators coupled to the micro-cantilever and to the base substrate , wherein the one or more thermal actuators comprises an electrically conductive material to facilitate electro-thermal heating of the one or more thermal actuators to actuate the micro-cantilever ; wherein the system (1B to 1H) is configured to induce high frequency vibration of the free end of the micro-cantilever by base excitation caused by cyclic activation of the thermal actuator . a base substrate ; a micro-cantilever having a free end and a fixed end, the fixed end being fixed to the base substrate ; and one or more thermal actuators coupled to the micro-cantilever and to the base substrate , wherein the one or more thermal actuators comprises an electrically conductive material to facilitate electro-thermal heating of the one or more thermal actuators to actuate the micro-cantilever ; wherein the system (1B to 1H) is configured to induce high frequency vibration of the free end of the micro-cantilever by base excitation caused by cyclic activation of the thermal actuator .
Additional electric radiator for a motor vehicle, including a heating zone and a compartment housing electronic components for controlling the heating, said electronic components being arranged on a printed circuit board , characterized in that the printed circuit board has a longitudinal partially milled zone and is folded at an angle along said partially milled zone , the printed circuit board has first and second longitudinal zones that are separated by the partially milled zone , the first longitudinal zone of the printed circuit board bearing high-power electronic components.