A multiple-glazed glass unit adapted to separate an indoor space and an outdoor space, the multiple-glazed glass unit comprising a pair of glass panes opposed across a gap layer to be spaced at a predetermined distance from each other, wherein a first low-emissivity (Low-E) film is formed on one principal surface of one of the pair of glass panes that is located closer to the indoor space, the one principal surface facing the gap layer , a second low-emissivity film is formed on the other principal surface of the one glass pane , the other principal surface facing the indoor space, the second low-emissivity film formed on the other principal surface facing the indoor space has an arithmetic average surface roughness Ra of 14 nm or less, the first low-emissivity film has a first multilayer structure comprising: a metal layer; a sacrificial layer disposed on a surface of the metal layer facing the gap layer, the sacrificial layer being in contact with the metal layer; and a pair of dielectric layers sandwiching the metal layer and the sacrificial layer, the second low-emissivity film has a second multilayer structure, characterized in that the second multilayer structure comprises, in order from the other principal surface on which the second low-emissivity film is formed, an underlayer, which has a thickness from 35 nm to 70 nm and is a first underlayer containing tin oxide or titanium oxide as a main component, and a second underlayer containing silicon oxide or aluminum oxide as a main component, the first underlayer being on the other principal surface, a transparent electrically-conductive oxide layer which comprises fluorine-doped tin oxide and has a thickness from 120 nm to 260 nm, and an amorphous layer which comprises a silica layer having a thickness of 15 to 70 nm, the following expression being satisfied: d2 ≥ d1 × 0.11 + 1.4 nm, where d1 represents a thickness of the transparent electrically-conductive oxide layer and d2 represents a thickness of the amorphous layer, and the second low-emissivity film having an emissivity ε of 0.34 or less. a first low-emissivity (Low-E) film is formed on one principal surface of one of the pair of glass panes that is located closer to the indoor space, the one principal surface facing the gap layer , a second low-emissivity film is formed on the other principal surface of the one glass pane , the other principal surface facing the indoor space, the second low-emissivity film formed on the other principal surface facing the indoor space has an arithmetic average surface roughness Ra of 14 nm or less, the first low-emissivity film has a first multilayer structure comprising: a metal layer; a sacrificial layer disposed on a surface of the metal layer facing the gap layer, the sacrificial layer being in contact with the metal layer; and a pair of dielectric layers sandwiching the metal layer and the sacrificial layer, the second low-emissivity film has a second multilayer structure, characterized in that the second multilayer structure comprises, in order from the other principal surface on which the second low-emissivity film is formed, an underlayer, which has a thickness from 35 nm to 70 nm and is a first underlayer containing tin oxide or titanium oxide as a main component, and a second underlayer containing silicon oxide or aluminum oxide as a main component, the first underlayer being on the other principal surface, a transparent electrically-conductive oxide layer which comprises fluorine-doped tin oxide and has a thickness from 120 nm to 260 nm, and an amorphous layer which comprises a silica layer having a thickness of 15 to 70 nm, the following expression being satisfied: d2 ≥ d1 × 0.11 + 1.4 nm, where d1 represents a thickness of the transparent electrically-conductive oxide layer and d2 represents a thickness of the amorphous layer, and the second low-emissivity film having an emissivity ε of 0.34 or less. <EOS>