A vaporization device comprising: a microcontroller ; a reservoir configured to hold a vaporizable material; a resistive heater configured to thermally contact the vaporizable material from the reservoir; a resistance measurement circuit connected to the microcontroller configured to measure a resistance of the resistive heater when power is not being applied to the resistive heater; and a power source ; the microcontroller being configured to perform operations comprising: calculating a target resistance of the resistive heater correlating to a temperature of the resistive heater, the target resistance based on a determined baseline resistance of the resistive heater and a target change in resistance of the resistive heater, applying power from the power source to heat the resistive heater and adjusting the applied power to the resistive heater based on a difference between the measured resistance of the resistive heater and the target resistance of the resistive heater, characterized in that the microcontroller is further configured to perform the operation of determining the baseline resistance of the resistive heater, the determining of the baseline resistance comprising determining that a change in a measured resistance of the resistive heater with time is below a stability threshold during a period of time when the vaporization device has not been heating the resistive heater. a microcontroller ; a reservoir configured to hold a vaporizable material; a resistive heater configured to thermally contact the vaporizable material from the reservoir; a resistance measurement circuit connected to the microcontroller configured to measure a resistance of the resistive heater when power is not being applied to the resistive heater; and a power source ; the microcontroller being configured to perform operations comprising: calculating a target resistance of the resistive heater correlating to a temperature of the resistive heater, the target resistance based on a determined baseline resistance of the resistive heater and a target change in resistance of the resistive heater, applying power from the power source to heat the resistive heater and adjusting the applied power to the resistive heater based on a difference between the measured resistance of the resistive heater and the target resistance of the resistive heater, characterized in that the microcontroller is further configured to perform the operation of determining the baseline resistance of the resistive heater, the determining of the baseline resistance comprising determining that a change in a measured resistance of the resistive heater with time is below a stability threshold during a period of time when the vaporization device has not been heating the resistive heater. calculating a target resistance of the resistive heater correlating to a temperature of the resistive heater, the target resistance based on a determined baseline resistance of the resistive heater and a target change in resistance of the resistive heater, applying power from the power source to heat the resistive heater and adjusting the applied power to the resistive heater based on a difference between the measured resistance of the resistive heater and the target resistance of the resistive heater, characterized in that the microcontroller is further configured to perform the operation of determining the baseline resistance of the resistive heater, the determining of the baseline resistance comprising determining that a change in a measured resistance of the resistive heater with time is below a stability threshold during a period of time when the vaporization device has not been heating the resistive heater. <EOS>