A device for producing light-exposed structures on a workpiece having a light-sensitive surface with - a seat for the workpiece , - an optical unit comprising a coherent light source and a flat diffraction grating for generating a strip-shaped illumination pattern having strips extending in a longitudinal direction (X) and having a pattern width (B) extending in a transverse direction on the surface of the workpiece , wherein the diffraction grating is obliquely tilted relative to at least part of the surface of the workpiece that is light-exposed by the illumination pattern , - a device for moving the surface of the workpiece and the optical unit relative to each other, wherein the device is designed to move in accordance with a path sequence, - wherein the path sequence comprises at least a first movement path (42a - d) in the longitudinal direction (X) in order to generate a first light-exposed structure on the surface of the workpiece , said structures having strips, characterized in that - the illumination pattern has an intensity distribution in which the intensity of the maxima forming the stripes decreases in the transverse direction from the center towards the edges, - the path sequence comprises at least a second movement path (42a - d) in the longitudinal direction (X) in order to generate a second light-exposed structure on the surface of the workpiece , said structure having strips, which are oriented parallel to the first illuminated pattern, - wherein the first and second movement path (42a - d) are spaced apart from each other by less than the pattern width (B), - and wherein the first and second light-exposed structures overlap in such a way that strips of the first and second light-exposed structures are arranged to lie on each other. - a seat for the workpiece , - an optical unit comprising a coherent light source and a flat diffraction grating for generating a strip-shaped illumination pattern having strips extending in a longitudinal direction (X) and having a pattern width (B) extending in a transverse direction on the surface of the workpiece , wherein the diffraction grating is obliquely tilted relative to at least part of the surface of the workpiece that is light-exposed by the illumination pattern , - a device for moving the surface of the workpiece and the optical unit relative to each other, wherein the device is designed to move in accordance with a path sequence, - wherein the path sequence comprises at least a first movement path (42a - d) in the longitudinal direction (X) in order to generate a first light-exposed structure on the surface of the workpiece , said structures having strips, - the illumination pattern has an intensity distribution in which the intensity of the maxima forming the stripes decreases in the transverse direction from the center towards the edges, - the path sequence comprises at least a second movement path (42a - d) in the longitudinal direction (X) in order to generate a second light-exposed structure on the surface of the workpiece , said structure having strips, which are oriented parallel to the first illuminated pattern, - wherein the first and second movement path (42a - d) are spaced apart from each other by less than the pattern width (B), - and wherein the first and second light-exposed structures overlap in such a way that strips of the first and second light-exposed structures are arranged to lie on each other. <EOS>