A method for producing a thin film made of lead zirconate titanate in 111-oriented perovskite structure, with the steps: - providing a substrate having a substrate temperature of 500 to 550°C and a lead target, a zirconium target and a titanium target; - applying the thin film by sputtering of lead, zirconium and titanium from the respective targets onto the substrate, wherein -- the total deposition rate of lead, zirconium and titanium is greater than 10 nm/min, -- the deposition rate of zirconium is selected in such a way that the atomic concentration of zirconium based on the atomic concentration of zirconium together with titanium in the thin film is between 0.2 and 0.3, and -- the deposition rate of lead depending on the substrate temperature and the total deposition rate of lead, zirconium and titanium is selected so low that a X-ray diffractometer diagram of the 111-oriented lead zirconate titanate has a significant peak value in the region of the diffraction angle of 33 to 35.5° ; -- the deposition rate of lead is selected in such a way that the atomic concentration of lead based on the atomic concentration of zirconium together with titanium in the thin film is between 1.1 and 1.3; and - finishing the thin film. - providing a substrate having a substrate temperature of 500 to 550°C and a lead target, a zirconium target and a titanium target; - applying the thin film by sputtering of lead, zirconium and titanium from the respective targets onto the substrate, wherein -- the total deposition rate of lead, zirconium and titanium is greater than 10 nm/min, -- the deposition rate of zirconium is selected in such a way that the atomic concentration of zirconium based on the atomic concentration of zirconium together with titanium in the thin film is between 0.2 and 0.3, and -- the deposition rate of lead depending on the substrate temperature and the total deposition rate of lead, zirconium and titanium is selected so low that a X-ray diffractometer diagram of the 111-oriented lead zirconate titanate has a significant peak value in the region of the diffraction angle of 33 to 35.5° ; -- the deposition rate of lead is selected in such a way that the atomic concentration of lead based on the atomic concentration of zirconium together with titanium in the thin film is between 1.1 and 1.3; and -- the total deposition rate of lead, zirconium and titanium is greater than 10 nm/min, -- the deposition rate of zirconium is selected in such a way that the atomic concentration of zirconium based on the atomic concentration of zirconium together with titanium in the thin film is between 0.2 and 0.3, and -- the deposition rate of lead depending on the substrate temperature and the total deposition rate of lead, zirconium and titanium is selected so low that a X-ray diffractometer diagram of the 111-oriented lead zirconate titanate has a significant peak value in the region of the diffraction angle of 33 to 35.5° ; -- the deposition rate of lead is selected in such a way that the atomic concentration of lead based on the atomic concentration of zirconium together with titanium in the thin film is between 1.1 and 1.3; and - finishing the thin film. <EOS>