A water treatment separation membrane comprising: a support having pores; a polyamide layer formed on the support; and a passivation layer formed on the polyamide layer by using an aqueous solution including an amine group-containing compound, an epoxy group-containing compound, and a fluorine-containing compound wherein the aqueous solution includes: 0.5 to 10 wt% of the amine group-containing compound; 0.5 to 10 wt% of the epoxy group-containing compound; 0.1 to 2 wt% of the fluorine-containing compound; and a remainder of a solvent, the passivation layer including at least one compound represented by the following Chemical Formulae 6 and 7: in which A is a fluorine-substituted compound selected from the ground consisting of C1-20 alkylene, aryl alkylene, alkylene oxide, alkenylene, aryl alkenylene and alkenyl oxide; R1 is hydrogen or a hydroxyl group; each of R2, R3, R4, and R5 is independently hydrogen, a hydroxyl group or an alkoxyalkyl oxirane group; a is an integer from 0 to 150, b is an integer from 0 to 3, c is an integer from 0 to 5, m is an integer from 0 to 10, n is an integer from 0 to 15, and o is an integer from 0 to 10, wherein the compound is produced by reactions between the amine group-containing compound, the epoxy group-containing compound and the fluorine-containing compound. a support having pores; a polyamide layer formed on the support; and a passivation layer formed on the polyamide layer by using an aqueous solution including an amine group-containing compound, an epoxy group-containing compound, and a fluorine-containing compound wherein the aqueous solution includes: 0.5 to 10 wt% of the amine group-containing compound; 0.5 to 10 wt% of the epoxy group-containing compound; 0.1 to 2 wt% of the fluorine-containing compound; and 0.5 to 10 wt% of the amine group-containing compound; 0.5 to 10 wt% of the epoxy group-containing compound; 0.1 to 2 wt% of the fluorine-containing compound; and a remainder of a solvent, the passivation layer including at least one compound represented by the following Chemical Formulae 6 and 7: in which A is a fluorine-substituted compound selected from the ground consisting of C1-20 alkylene, aryl alkylene, alkylene oxide, alkenylene, aryl alkenylene and alkenyl oxide; R1 is hydrogen or a hydroxyl group; each of R2, R3, R4, and R5 is independently hydrogen, a hydroxyl group or an alkoxyalkyl oxirane group; a is an integer from 0 to 150, b is an integer from 0 to 3, c is an integer from 0 to 5, m is an integer from 0 to 10, n is an integer from 0 to 15, and o is an integer from 0 to 10, in which A is a fluorine-substituted compound selected from the ground consisting of C1-20 alkylene, aryl alkylene, alkylene oxide, alkenylene, aryl alkenylene and alkenyl oxide; R1 is hydrogen or a hydroxyl group; each of R2, R3, R4, and R5 is independently hydrogen, a hydroxyl group or an alkoxyalkyl oxirane group; a is an integer from 0 to 150, b is an integer from 0 to 3, c is an integer from 0 to 5, m is an integer from 0 to 10, n is an integer from 0 to 15, and o is an integer from 0 to 10, wherein the compound is produced by reactions between the amine group-containing compound, the epoxy group-containing compound and the fluorine-containing compound. <EOS>