mhurhangee/patent-ind-claim-en huggingface dataset:
A heterophasic polypropylene composition characterised by an MFR230/2.16 according to ISO1133 of at most 6.0 g/10 min and comprising a. ≥ 80.0 wt.-% of a polypropylene homopolymer and b. ≤ 20.0 wt.-% of an elastomeric ethylene-propylene rubber fraction, and c. a polymeric nucleating agent and d. at least one further nucleating or clarifying agent wherein the heterophasic polypropylene composition is further characterized by a xylene soluble fraction (XCS) of 5.0 to 20.0 wt.-% and in that the elastomeric ethylene-propylene rubber fraction (b) has an C2(XCS) of 20.0 to 38.0 wt.-%, and wherein the at least one further nucleating or clarifying agent (d) is selected from the groups of (i) salts of monocarboxylic acids and polycarboxylic acids, (ii) salts of diesters of phosphoric acid, and (iii) sorbitol derivatives and nonitol derivatives. a. ≥ 80.0 wt.-% of a polypropylene homopolymer and b. ≤ 20.0 wt.-% of an elastomeric ethylene-propylene rubber fraction, and c. a polymeric nucleating agent and d. at least one further nucleating or clarifying agent wherein the heterophasic polypropylene composition is further characterized by a xylene soluble fraction (XCS) of 5.0 to 20.0 wt.-% and in that the elastomeric ethylene-propylene rubber fraction (b) has an C2(XCS) of 20.0 to 38.0 wt.-%, and wherein the at least one further nucleating or clarifying agent (d) is selected from the groups of (i) salts of monocarboxylic acids and polycarboxylic acids, (ii) salts of diesters of phosphoric acid, and (iii) sorbitol derivatives and nonitol derivatives. (i) salts of monocarboxylic acids and polycarboxylic acids, (ii) salts of diesters of phosphoric acid, and (iii) sorbitol derivatives and nonitol derivatives.
A method for triggering upon signal events in a frequency domain test and measurement device, comprising: repeatedly sampling a time-varying signal ; generating, over time, a plurality of digital frequency domain spectrums based on sampling of the time-varying signal ; repeatedly updating a frequency domain bitmap for the time-varying signal by sequentially applying the digital frequency domain spectrums to a data store containing the frequency domain bitmap by increasing hit counts for cells of the frequency domain bitmap when the digital frequency domain spectrums include components corresponding to the cells of the frequency domain bitmap; wherein the frequency domain bitmap is a bitmap structure in which quantized amplitude or power level information is expressed as a function of frequency in a grid of cells created by dividing a spectrum graph into rows representing trace amplitude or power values and columns for points or ranges on the frequency axis; characterized in that the method further comprises: selecting a portion of the frequency domain bitmap ; determining a signal occupancy within the portion of the frequency domain bitmap based on hit counts of cells within the selected portion of the frequency domain bitmap; and triggering a capture of the time-varying signal in response to the signal occupancy determined for the portion of the frequency domain bitmap . repeatedly sampling a time-varying signal ; generating, over time, a plurality of digital frequency domain spectrums based on sampling of the time-varying signal ; repeatedly updating a frequency domain bitmap for the time-varying signal by sequentially applying the digital frequency domain spectrums to a data store containing the frequency domain bitmap by increasing hit counts for cells of the frequency domain bitmap when the digital frequency domain spectrums include components corresponding to the cells of the frequency domain bitmap; wherein the frequency domain bitmap is a bitmap structure in which quantized amplitude or power level information is expressed as a function of frequency in a grid of cells created by dividing a spectrum graph into rows representing trace amplitude or power values and columns for points or ranges on the frequency axis; characterized in that the method further comprises: selecting a portion of the frequency domain bitmap ; determining a signal occupancy within the portion of the frequency domain bitmap based on hit counts of cells within the selected portion of the frequency domain bitmap; and triggering a capture of the time-varying signal in response to the signal occupancy determined for the portion of the frequency domain bitmap . selecting a portion of the frequency domain bitmap ; determining a signal occupancy within the portion of the frequency domain bitmap based on hit counts of cells within the selected portion of the frequency domain bitmap; and triggering a capture of the time-varying signal in response to the signal occupancy determined for the portion of the frequency domain bitmap .
A resin composition comprising an ethylene-acrylic acid alkyl ester copolymer (L), a graft copolymer (M), and a styrene-based elastomer (N), wherein the graft copolymer (M) is obtained by a reaction among an ethylene-acrylic acid alkyl ester copolymer (A), a monomer component (B) containing at last one monomer selected from the group consisting of a (meth)acrylic acid alkyl ester monomer and an aromatic vinyl monomer, and t-butyl peroxymethacryloyloxyethyl carbonate (C), the styrene-based elastomer (N) is one or more block copolymers selected from the group consisting of a styrene-ethylene-propylene (SEP) block copolymer, a styrene-ethylene-butylene-styrene (SEBS) block copolymer, a styrene-ethylene-propylene-styrene (SEPS) block copolymer, and a styrene-ethylene-ethylene-propylene-styrene (SEEPS) block copolymer, and a weight ratio between the ethylene-acrylic acid alkyl ester copolymer (A) and the monomer component (B) ((A)/(B)) is 50/50 to 98/2. the graft copolymer (M) is obtained by a reaction among an ethylene-acrylic acid alkyl ester copolymer (A), a monomer component (B) containing at last one monomer selected from the group consisting of a (meth)acrylic acid alkyl ester monomer and an aromatic vinyl monomer, and t-butyl peroxymethacryloyloxyethyl carbonate (C), the styrene-based elastomer (N) is one or more block copolymers selected from the group consisting of a styrene-ethylene-propylene (SEP) block copolymer, a styrene-ethylene-butylene-styrene (SEBS) block copolymer, a styrene-ethylene-propylene-styrene (SEPS) block copolymer, and a styrene-ethylene-ethylene-propylene-styrene (SEEPS) block copolymer, and a weight ratio between the ethylene-acrylic acid alkyl ester copolymer (A) and the monomer component (B) ((A)/(B)) is 50/50 to 98/2.
Light emitting module of a lighting and/or signalling device of a vehicle, comprising : - a reflector having a focal point, - a main light source placed at the focal point of the reflector and arranged with the reflector so that the rays (r4) which it emits are reflected by the reflector so as to form a first light beam (F1) having a point of maximum intensity (A), - at least one secondary light source placed at a distance from the focal point of the reflector, - a spreading piece capable of being traversed by the light and of spreading the rays that pass through it, positioned between the secondary light source(s) and the reflector, the reflector , the secondary light source(s) and said part being arranged so that the rays (r1, r2 and r3) emitted by the secondary light source(s) pass through said spreading part and are then reflected by the reflector, so as to form a second light beam (F2), the second light beam (F2) having a given point of maximum intensity (A') whose intensity is lower than that of the point of maximum intensity (A) of said first beam (F1), the intensity of the point of maximum intensity (A') of the second light beam (F2) being at least thirty times lower than that of the point of maximum intensity (A) of said first beam (F1), said spreading piece being arranged such that the majority of the rays emitted by the main light source do not encounter said spreading piece , characterized in that the spreading piece has a cutout arranged in such a way that the rays (r4) emitted by the main light source reach the reflector directly through this cutout. - a reflector having a focal point, - a main light source placed at the focal point of the reflector and arranged with the reflector so that the rays (r4) which it emits are reflected by the reflector so as to form a first light beam (F1) having a point of maximum intensity (A), - at least one secondary light source placed at a distance from the focal point of the reflector, - a spreading piece capable of being traversed by the light and of spreading the rays that pass through it, positioned between the secondary light source(s) and the reflector, the reflector , the secondary light source(s) and said part being arranged so that the rays (r1, r2 and r3) emitted by the secondary light source(s) pass through said spreading part and are then reflected by the reflector, so as to form a second light beam (F2), the second light beam (F2) having a given point of maximum intensity (A') whose intensity is lower than that of the point of maximum intensity (A) of said first beam (F1), the intensity of the point of maximum intensity (A') of the second light beam (F2) being at least thirty times lower than that of the point of maximum intensity (A) of said first beam (F1), said spreading piece being arranged such that the majority of the rays emitted by the main light source do not encounter said spreading piece , characterized in that the spreading piece has a cutout arranged in such a way that the rays (r4) emitted by the main light source reach the reflector directly through this cutout.
Method for cleaning and/or disinfecting of sealing elements of a sealing machine or of a sealing assembly , wherein, during a cleaning mode, at least one cleaning and/or disinfection medium, which is supplied to the sealing element via at least one coupling piece , flows through and around the interior chamber of the respective sealing element and the functional elements therein, and the sealing tool serving to attach the respective closure onto a container , wherein the treatment of the sealing elements during the cleaning mode takes place one after another, in each case individually or in sealing element groups of at least two sealing elements , wherein, for this purpose, the sealing elements or sealing element groups, by way of a drive which allows for a stepped further movement of the rotor , move to a docking or cleaning station , which comprises the at least one coupling piece , wherein the at least one coupling piece is connected to the respective sealing element located at the cleaning station by mechanical delivery and coupling, and wherein, after the completion of the treatment of the respective sealing element , the at least one coupling piece is removed, again by mechanical means, from the respective sealing element , characterised in that for the removal of the at least one cleaning and/or disinfection medium, at least one further coupling piece of the cleaning station is mechanically coupled to the sealing element arranged at this station, and after the treatment is mechanically removed again from the sealing element .
A method for determining nonlinear hysteretic parameters and pore pressure in a formation through a borehole , comprising: generating strain in a volume surrounding the borehole by focusing a low frequency, periodic acoustic signal in the volume, the low frequency, periodic acoustic signal having a first frequency and a first amplitude; transmitting pulsed, high frequency acoustic signals through the volume when the strain is generated in the volume with the low frequency, periodic acoustic signal; measuring signals generated in the formation in the volume relating to particle velocity or particle acceleration in the formation ; determining the strain in the volume based on the signals generated in the formation in the volume relating to particle velocity or particle acceleration in the formation ; measuring time-of-flight of the pulsed, high frequency acoustic signals through the volume as a function of the strain in the volume; determining change of the time-of-flight of the pulsed, high frequency acoustic signals as a function of the strain in the volume; and determining nonlinear hysteretic parameters α, β, and δ based on the change of the time-of-flight of the pulsed, high frequency acoustic signals as a function of the strain in the volume, wherein the high frequency pulsed acoustic signals are generated in the borehole ; the low frequency, focused periodic acoustic signal is generated in the borehole ; the method further characterised in that pore pressure in the volume is determined based on the nonlinear hysteretic parameters α, β, and δ. generating strain in a volume surrounding the borehole by focusing a low frequency, periodic acoustic signal in the volume, the low frequency, periodic acoustic signal having a first frequency and a first amplitude; transmitting pulsed, high frequency acoustic signals through the volume when the strain is generated in the volume with the low frequency, periodic acoustic signal; measuring signals generated in the formation in the volume relating to particle velocity or particle acceleration in the formation ; determining the strain in the volume based on the signals generated in the formation in the volume relating to particle velocity or particle acceleration in the formation ; measuring time-of-flight of the pulsed, high frequency acoustic signals through the volume as a function of the strain in the volume; determining change of the time-of-flight of the pulsed, high frequency acoustic signals as a function of the strain in the volume; and determining nonlinear hysteretic parameters α, β, and δ based on the change of the time-of-flight of the pulsed, high frequency acoustic signals as a function of the strain in the volume, wherein the high frequency pulsed acoustic signals are generated in the borehole ; the low frequency, focused periodic acoustic signal is generated in the borehole ; the method further characterised in that pore pressure in the volume is determined based on the nonlinear hysteretic parameters α, β, and δ.
A process for urea production in a urea plant comprising a synthesis section, said section comprising a urea reactor, a stripper, a condenser and optionally a scrubber, and a recovery section operating at lower pressure than the synthesis section, said process comprising the steps of: a) reacting ammonia and CO 2 under urea forming conditions in the urea reactor to obtain a first urea solution, b) stripping the first urea solution with ammonia in the stripper to form a second urea solution and a first vapor phase containing ammonia, CO 2 and water, c) condensing the first vapor phase obtained in b) in the condenser to form a carbamate solution which is recycled to the reactor, d) subjecting the second urea solution to ammonia recovery in the recovery section to produce a third urea solution and a second vapor phase containing ammonia, e) recycling the second vapor phase to the urea synthesis section, wherein in the synthesis section a substantially isobaric loop is formed, wherein the second urea solution contains less than 3 wt.%, preferably less than 2 wt.%, more preferably less than 1 wt.% of CO 2 , and wherein the condenser is a submerged condenser. a) reacting ammonia and CO 2 under urea forming conditions in the urea reactor to obtain a first urea solution, b) stripping the first urea solution with ammonia in the stripper to form a second urea solution and a first vapor phase containing ammonia, CO 2 and water, c) condensing the first vapor phase obtained in b) in the condenser to form a carbamate solution which is recycled to the reactor, d) subjecting the second urea solution to ammonia recovery in the recovery section to produce a third urea solution and a second vapor phase containing ammonia, e) recycling the second vapor phase to the urea synthesis section, wherein in the synthesis section a substantially isobaric loop is formed,
A flow rate measurement device comprising: a flow rate signal detection unit for detecting a flow rate signal of a fluid to be measured flowing through a flow path; a flow rate calculation unit for calculating a flow rate from the flow rate signal detected by the flow rate signal detection unit; an oscillation circuit for generating a reference clock, the oscillation circuit being configured on a same semiconductor or on a same printed board as an electronic circuit, and the electronic circuit realizing the flow rate signal detection unit and the flow rate calculation unit; a temperature calculation unit for calculating a temperature of the electronic circuit from a frequency change resulting from a temperature change of the oscillation circuit; and a flow rate correction unit for correcting the flow rate calculated by the flow rate calculation unit by obtaining an offset flow rate at a desired temperature, based on the temperature calculated by the temperature calculation unit and a preliminarily obtained relationship between a temperature and an offset flow rate. a flow rate signal detection unit for detecting a flow rate signal of a fluid to be measured flowing through a flow path; a flow rate calculation unit for calculating a flow rate from the flow rate signal detected by the flow rate signal detection unit; an oscillation circuit for generating a reference clock, the oscillation circuit being configured on a same semiconductor or on a same printed board as an electronic circuit, and the electronic circuit realizing the flow rate signal detection unit and the flow rate calculation unit; a temperature calculation unit for calculating a temperature of the electronic circuit from a frequency change resulting from a temperature change of the oscillation circuit; and a flow rate correction unit for correcting the flow rate calculated by the flow rate calculation unit by obtaining an offset flow rate at a desired temperature, based on the temperature calculated by the temperature calculation unit and a preliminarily obtained relationship between a temperature and an offset flow rate.
A method of communicating with two or more hosts (50, 50a-50b) the method comprising: transmitting a first communication from a first host to a meter electronics to request a fluid property measured by a first meter assembly via the meter electronics, the meter electronics being configured to receive and process a first sensor signal from the first meter assembly to compute the fluid property measured by the first meter assembly; and transmitting a second communication from a second host to the meter to request a fluid property measured by a second meter assembly via the meter electronics, the meter electronics being configured to receive and process a second sensor signal from the second meter assembly to compute the fluid property measured by the second meter assembly: wherein the first communication includes a first address associated with the first meter assembly and the second communication includes the second address associated with a second meter assembly transmitting a first communication from a first host to a meter electronics to request a fluid property measured by a first meter assembly via the meter electronics, the meter electronics being configured to receive and process a first sensor signal from the first meter assembly to compute the fluid property measured by the first meter assembly; and transmitting a second communication from a second host to the meter to request a fluid property measured by a second meter assembly via the meter electronics, the meter electronics being configured to receive and process a second sensor signal from the second meter assembly to compute the fluid property measured by the second meter assembly: wherein the first communication includes a first address associated with the first meter assembly and the second communication includes the second address associated with a second meter assembly
A method of unlocking a security tag by a scanner , comprising: - receiving a confirmation signal to unlock the security tag being detachably locked to a merchandise , wherein the confirmation signal includes a RFID device identifier associated with a RFID device of the security tag , and the RFID device is associated with a wireless device of the security tag ; - identifying the wireless device associated with the RFID device based on the RFID device identifier ; - transmitting, from the scanner to the security tag , a wireless signal to the wireless device to enable a controller of the security tag to receive a release signal used to unlock the security tag from the merchandise , wherein the controller is unable to receive the release signal without receiving the wireless signal beforehand; and - transmitting, from the scanner to the security tag after transmission of the wireless signal , the release signal to the controller to unlock the security tag from the merchandise , wherein the release signal is different from the wireless signal , wherein at least a portion of an energy of the release signal is used to generate an unlocking signal for unlocking the security tag . - receiving a confirmation signal to unlock the security tag being detachably locked to a merchandise , wherein the confirmation signal includes a RFID device identifier associated with a RFID device of the security tag , and the RFID device is associated with a wireless device of the security tag ; - identifying the wireless device associated with the RFID device based on the RFID device identifier ; - transmitting, from the scanner to the security tag , a wireless signal to the wireless device to enable a controller of the security tag to receive a release signal used to unlock the security tag from the merchandise , wherein the controller is unable to receive the release signal without receiving the wireless signal beforehand; and - transmitting, from the scanner to the security tag after transmission of the wireless signal , the release signal to the controller to unlock the security tag from the merchandise , wherein the release signal is different from the wireless signal ,
Method for producing a solar cell, in particular a silicon thin-film solar cell, comprising the following method steps: - depositing a TCO layer on a glass substrate ; - depositing at least one silicon layer on the TCO layer ; characterised in that, before the TCO layer is deposited, the glass substrate is exposed to electron radiation, forming a light-scattering layer of the glass substrate , on which layer the TCO layer is deposited, the glass substrate being heated to a temperature between 200°C and 700°C before and/or during exposure to the electron radiation. - depositing a TCO layer on a glass substrate ; - depositing at least one silicon layer on the TCO layer ;