A method for treating a surface of a releasing chamber in contact with a test object, the releasing chamber comprising the following components: a chamber ; a chamber door , a suction tube , an exhaust tube and a sampling tube connected with the chamber ; a stirring fan mounted in the chamber ; and an air duct board ; the method is used for treating the surface of at least one component of the chamber , the chamber door , the suction tube , the exhaust tube , the sampling tube , the stirring fan and the air duct board in contact with the test object, characterized in that the following steps are comprised: washing the components of the releasing chamber made by processing stainless steel or glass, to remove contaminants; and production of a deactivated layer by processing the surface of the component washed in step , or first production of an intermediate layer by processing the surface of the component washed in step , and then production of the deactivated layer by processing the surface of the intermediate layer , whereby the deactivated layer is obtained by coating, dip-coating or plating the intermediate layer or the surface of the component washed in step with a low-surface-tension organic compound and wherein the low-surface-tension organic compound includes a fluorinated organic compound, a silane compound, hydrogen-containing silicone oil or poly-glycol, and then baking it at a high temperature above 300°C or whereby said deactivated layer is obtained by coating, dip-coating or plating the surface of the component washed in step or the intermediate layer with SiO 2 sol and then baking it at a high temperature above 300 °C and finally removing excess materials with a solvent or whereby said deactivated layer is obtained by coating, dip-coating or plating the surface of the component washed in step or the intermediate layer with polybenzimidazole pyrrolidone (PY), polytetrafluoroethylene, polyfluoroalkyls, orthosilicate or ethyl orthosilicate and then baking it at a high temperature above 300°C, and whereby said intermediate layer is a SiO 2 layer or in the form of a three-dimensional mesh or porous skeleton phase, having a thickness from submicron to micron. washing the components of the releasing chamber made by processing stainless steel or glass, to remove contaminants; and production of a deactivated layer by processing the surface of the component washed in step , or first production of an intermediate layer by processing the surface of the component washed in step , and then production of the deactivated layer by processing the surface of the intermediate layer , whereby the deactivated layer is obtained by coating, dip-coating or plating the intermediate layer or the surface of the component washed in step with a low-surface-tension organic compound and wherein the low-surface-tension organic compound includes a fluorinated organic compound, a silane compound, hydrogen-containing silicone oil or poly-glycol, and then baking it at a high temperature above 300°C or whereby said deactivated layer is obtained by coating, dip-coating or plating the surface of the component washed in step or the intermediate layer with SiO 2 sol and then baking it at a high temperature above 300 °C and finally removing excess materials with a solvent or whereby said deactivated layer is obtained by coating, dip-coating or plating the surface of the component washed in step or the intermediate layer with polybenzimidazole pyrrolidone (PY), polytetrafluoroethylene, polyfluoroalkyls, orthosilicate or ethyl orthosilicate and then baking it at a high temperature above 300°C, and whereby said intermediate layer is a SiO 2 layer or in the form of a three-dimensional mesh or porous skeleton phase, having a thickness from submicron to micron. <EOS>