A method for preparing a display substrate comprising forming a pixel defining layer on a substrate , wherein a method for preparing the pixel defining layer comprises: forming a basic pattern of the pixel defining layer on the substrate ; the basic pattern of the pixel defining layer comprises a first pattern of inorganic material, the first pattern being a top part of the basic pattern of the pixel defining layer; and subjecting the first pattern to a surface treatment with a self-assembled monomolecular layer to form a fluorinated monomolecular layer on a surface of the first pattern , and thus form the pixel defining layer ; wherein subjecting the first pattern to a surface treatment with the self-assembled monomolecular layer comprises: forming a photosensitive organic resin layer between the basic pattern of the pixel defining layer, the photosensitive organic resin layer exposing the first pattern; selecting fluorooctyl trichlorosilane as a self-assembled lyophobic material to subject the first pattern to a self-assembled surface treatment in a fluorooctyl trichlorosilane atmosphere to be held for 2 hours at a temperature ranging from 100-250°C to form the fluorinated monomolecular layer , wherein the fluorinated monomolecular layer is connected to the first pattern via a covalent bond, and the fluorooctyl trichlorosilane has a formula: and removing the photosensitive organic resin layer after the fluorinated monomolecular layer has been formed on the surface of the first pattern . forming a basic pattern of the pixel defining layer on the substrate ; the basic pattern of the pixel defining layer comprises a first pattern of inorganic material, the first pattern being a top part of the basic pattern of the pixel defining layer; and subjecting the first pattern to a surface treatment with a self-assembled monomolecular layer to form a fluorinated monomolecular layer on a surface of the first pattern , and thus form the pixel defining layer ; wherein subjecting the first pattern to a surface treatment with the self-assembled monomolecular layer comprises: forming a photosensitive organic resin layer between the basic pattern of the pixel defining layer, the photosensitive organic resin layer exposing the first pattern; selecting fluorooctyl trichlorosilane as a self-assembled lyophobic material to subject the first pattern to a self-assembled surface treatment in a fluorooctyl trichlorosilane atmosphere to be held for 2 hours at a temperature ranging from 100-250°C to form the fluorinated monomolecular layer , wherein the fluorinated monomolecular layer is connected to the first pattern via a covalent bond, and the fluorooctyl trichlorosilane has a formula: and forming a photosensitive organic resin layer between the basic pattern of the pixel defining layer, the photosensitive organic resin layer exposing the first pattern; selecting fluorooctyl trichlorosilane as a self-assembled lyophobic material to subject the first pattern to a self-assembled surface treatment in a fluorooctyl trichlorosilane atmosphere to be held for 2 hours at a temperature ranging from 100-250°C to form the fluorinated monomolecular layer , wherein the fluorinated monomolecular layer is connected to the first pattern via a covalent bond, and the fluorooctyl trichlorosilane has a formula: and removing the photosensitive organic resin layer after the fluorinated monomolecular layer has been formed on the surface of the first pattern . <EOS>