A low-e coated glass which can be treated thermally and developed by means of accumulating onto each other on a glass substrate and comprising pluralities of thin films having: • a first dielectric layer comprising Si x N y with a thickness between 15 nm - 22 nm provided in a manner directly contacting onto the substrate; • a first infrared reflective layer being silver with a thickness between 8 nm - 15 nm positioned on said first dielectric layer ; • a first barrier layer being NiCrOx and with a thickness between 1 nm - 2.4 nm positioned on said first infrared layer ; • a second infrared reflective layer being silver with a thickness between 8 nm - 15 nm positioned on said first barrier layer and an upper dielectric structure with a thickness between 35 nm - 50 nm positioned at the continuation thereof, said invention is characterized in that • said low-e coating comprises a first coring structure with a total thickness between 18 nm - 25 nm and positioned between the first dielectric layer and the first infrared reflective layer and comprising a first coring layer being ZnAlO x and an absorbing layer comprising NiCr and which directly contacts the first infrared reflective layer , • an intermediate dielectric structure with a total thickness between 80 nm - 100 nm and which is positioned under the second infrared layer in a manner directly contacting thereto and which provides reaching of the glass , whereon it is coated, to the targeted performance values and comprising a second dielectric layer being ZnAlO x , a third dielectric layer being Si x N y and second coring layer being ZnAlO x ; • said upper dielectric structure comprises a second barrier layer being NiCrO x layer; a fourth dielectric layer being ZnAlO x and an upper dielectric layer being SiO x N y , • reflection a* and b* color values of the low-e coated glass on the glass side are at 60° and lower angle and the change depending on the angled view is lower than 3 points and in the negative region when compared with orthogonal view. • a first dielectric layer comprising Si x N y with a thickness between 15 nm - 22 nm provided in a manner directly contacting onto the substrate; • a first infrared reflective layer being silver with a thickness between 8 nm - 15 nm positioned on said first dielectric layer ; • a first barrier layer being NiCrOx and with a thickness between 1 nm - 2.4 nm positioned on said first infrared layer ; • a second infrared reflective layer being silver with a thickness between 8 nm - 15 nm positioned on said first barrier layer and an upper dielectric structure with a thickness between 35 nm - 50 nm positioned at the continuation thereof, said invention is characterized in that • said low-e coating comprises a first coring structure with a total thickness between 18 nm - 25 nm and positioned between the first dielectric layer and the first infrared reflective layer and comprising a first coring layer being ZnAlO x and an absorbing layer comprising NiCr and which directly contacts the first infrared reflective layer , • an intermediate dielectric structure with a total thickness between 80 nm - 100 nm and which is positioned under the second infrared layer in a manner directly contacting thereto and which provides reaching of the glass , whereon it is coated, to the targeted performance values and comprising a second dielectric layer being ZnAlO x , a third dielectric layer being Si x N y and second coring layer being ZnAlO x ; • said upper dielectric structure comprises a second barrier layer being NiCrO x layer; a fourth dielectric layer being ZnAlO x and an upper dielectric layer being SiO x N y , • reflection a* and b* color values of the low-e coated glass on the glass side are at 60° and lower angle and the change depending on the angled view is lower than 3 points and in the negative region when compared with orthogonal view. <EOS>