A liquid crystal display device , comprising: a first substrate and a second substrate disposed so that a main surface of the first substrate and a main surface of the second substrate are opposed to each other; a liquid crystal layer placed between the first substrate and the second substrate ; a plurality of gate lines disposed on the main surface of the second substrate ; a plurality of source lines disposed on the main surface of the second substrate so as to be intersected by the plurality of gate lines ; a first insulation film placed on the main surface of the second substrate so as to cover the plurality of gate lines and the plurality of source lines ; a light-shielding film (BM) placed on the first insulation film so as to cover the plurality of source lines ; a second insulation film placed on the first insulation film so as to cover the plurality of gate lines , the plurality of source lines , and the light-shielding film (BM); a signal electrode disposed on the second insulation film ; a common electrode disposed on the second insulation film , for forming an electric field between the common electrode and the signal electrode ; a shield electrode (S) being placed so as to lie between the signal electrode located in a region surrounded by gate lines and source lines , and the source line as seen in a plan view; and a third insulation film being placed between the shield electrode (S) and the light-shielding film (BM), characterised in that the shield electrode (S) is placed so as to lie between the first insulation film and the light-shielding film (BM) as see in a sectional view, a whole of the shield electrode (S) being located in a light-shielding film (BM) formation region, the light-shielding film (BM) being formed so as to cover the whole of the shield electrode (S). a first substrate and a second substrate disposed so that a main surface of the first substrate and a main surface of the second substrate are opposed to each other; a liquid crystal layer placed between the first substrate and the second substrate ; a plurality of gate lines disposed on the main surface of the second substrate ; a plurality of source lines disposed on the main surface of the second substrate so as to be intersected by the plurality of gate lines ; a first insulation film placed on the main surface of the second substrate so as to cover the plurality of gate lines and the plurality of source lines ; a light-shielding film (BM) placed on the first insulation film so as to cover the plurality of source lines ; a second insulation film placed on the first insulation film so as to cover the plurality of gate lines , the plurality of source lines , and the light-shielding film (BM); a signal electrode disposed on the second insulation film ; a common electrode disposed on the second insulation film , for forming an electric field between the common electrode and the signal electrode ; a shield electrode (S) being placed so as to lie between the signal electrode located in a region surrounded by gate lines and source lines , and the source line as seen in a plan view; and a third insulation film being placed between the shield electrode (S) and the light-shielding film (BM), characterised in that the shield electrode (S) is placed so as to lie between the first insulation film and the light-shielding film (BM) as see in a sectional view, a whole of the shield electrode (S) being located in a light-shielding film (BM) formation region, the light-shielding film (BM) being formed so as to cover the whole of the shield electrode (S). <EOS>