A method for producing an optical lens comprising the steps of: forming two or more marks (m1, m2, m3, m4) outside a lens region set in a lens substrate , wherein the two or more marks adapted to perform position alignment serve as a reference of the contour shape (F) of the lens region; pattern-forming a masking layer above one principal surface of the lens substrate while controlling formation position of the masking layer with the two or more marks (m1, m2, m3, m4) as a reference, wherein the masking layer has an aperture at a predetermined position in the lens region; performing a selective process with respect to a surface exposed at the bottom of the aperture of the masking layer by performing a process from above the masking layer ; and removing the masking layer from above the lens substrate to form a processed pattern by the selective process on the side of the one principal surface of the lens substrate , wherein in the step of performing the selective process, a process for forming a transparent material film on the surface exposed at the bottom of the aperture of the masking layer and on the masking layer is performed, and wherein in the step of removing the masking layer , by removing the transparent material film formed on the masking layer along with the masking layer , a transparent pattern formed of the transparent material film , as the processed pattern, is formed only on the surface exposed at the bottom of the aperture of the masking layer , further comprising the step of: forming an antireflection film above the one principal surface of the lens substrate after the time when the processed pattern has been formed. forming two or more marks (m1, m2, m3, m4) outside a lens region set in a lens substrate , wherein the two or more marks adapted to perform position alignment serve as a reference of the contour shape (F) of the lens region; pattern-forming a masking layer above one principal surface of the lens substrate while controlling formation position of the masking layer with the two or more marks (m1, m2, m3, m4) as a reference, wherein the masking layer has an aperture at a predetermined position in the lens region; performing a selective process with respect to a surface exposed at the bottom of the aperture of the masking layer by performing a process from above the masking layer ; and removing the masking layer from above the lens substrate to form a processed pattern by the selective process on the side of the one principal surface of the lens substrate , wherein in the step of performing the selective process, a process for forming a transparent material film on the surface exposed at the bottom of the aperture of the masking layer and on the masking layer is performed, and wherein in the step of removing the masking layer , by removing the transparent material film formed on the masking layer along with the masking layer , a transparent pattern formed of the transparent material film , as the processed pattern, is formed only on the surface exposed at the bottom of the aperture of the masking layer , further comprising the step of: forming an antireflection film above the one principal surface of the lens substrate after the time when the processed pattern has been formed. <EOS>