A display device comprising: a gate electrode and a first metal formed on a substrate, the gate electrode being formed on a first region of the substrate and the first metal being formed on a second region of the substrate; an insulating film formed on the gate electrode and the first metal and provided with a first hole for exposing at least a part of the first metal; source and drain electrodes (124a, 124b) formed on the insulating film in the first region and a second metal formed on the insulating film in the second region; a pixel electrode formed on the source and drain electrodes (124a, 124b), to be electrically connected with the drain electrode, and a first protection electrode formed on the second metal, to be electrically connected with the second metal and at least partially cover the second metal; a passivation film formed on an entire surface of the substrate including the pixel electrode and the first protection electrode and provided with a second hole for exposing at least a part of the first metal and a third hole for exposing at least a part of the first protection electrode; and a connection electrode formed on the passivation film, connected with the first metal through a first contact hole made by combination of the first hole and the second hole, and connected with the first protection electrode through a second contact hole made of the third hole, wherein the first protection electrode is formed of the same material as that of the pixel electrode, wherein the second metal fully contacts with the first protection electrode, and wherein the first protection electrode is extended to a region where the second metal is not formed on the insulating film, characterized in that the third hole is formed in the passivation film to expose the extended region of the first protection electrode, which is not overlapped with the second metal. a gate electrode and a first metal formed on a substrate, the gate electrode being formed on a first region of the substrate and the first metal being formed on a second region of the substrate; an insulating film formed on the gate electrode and the first metal and provided with a first hole for exposing at least a part of the first metal; source and drain electrodes (124a, 124b) formed on the insulating film in the first region and a second metal formed on the insulating film in the second region; a pixel electrode formed on the source and drain electrodes (124a, 124b), to be electrically connected with the drain electrode, and a first protection electrode formed on the second metal, to be electrically connected with the second metal and at least partially cover the second metal; a passivation film formed on an entire surface of the substrate including the pixel electrode and the first protection electrode and provided with a second hole for exposing at least a part of the first metal and a third hole for exposing at least a part of the first protection electrode; and a connection electrode formed on the passivation film, connected with the first metal through a first contact hole made by combination of the first hole and the second hole, and connected with the first protection electrode through a second contact hole made of the third hole, wherein the first protection electrode is formed of the same material as that of the pixel electrode, wherein the second metal fully contacts with the first protection electrode, and wherein the first protection electrode is extended to a region where the second metal is not formed on the insulating film, characterized in that the third hole is formed in the passivation film to expose the extended region of the first protection electrode, which is not overlapped with the second metal.