mhurhangee/ep-ind-claims huggingface dataset:
A method for manufacture of a platform and elevation support arrangement; wherein an elevation support is to be hingedly mounted to a platform around a first axis extending along a first direction via a hinge member arranged between the platform and the elevation support; and wherein the elevation support is configured to be locked to the platform in a fixed position by means of an adjustable locking mechanism, wherein the elevation support is in a lowered and locked state to the platform, the adjustable locking mechanism comprising a first and a second opening (11', 11") arranged at a first distance from each other and comprising a first and second sliding shaft element (13', 13") arranged at a second distance from each other each configured to slide along a second direction perpendicular to the first axis; the method comprises the steps of: - providing the platform, the elevation support and the adjustable locking mechanism; - mounting the elevation support to the platform; - adjusting the adjustable locking mechanism so that the first distance corresponds with the second distance; and - locking the adjustable locking mechanism by sliding the first shaft element into the first opening and by sliding the second shaft element (13") into the second opening (11"); wherein - the step of adjusting the adjustable locking mechanism comprises moving the first opening or the first sliding shaft element in a third direction parallel or essentially parallel with the first direction, wherein said moving of the first opening or the first sliding shaft element is performed by rotating a first eccentric housing comprising said first opening or the first sliding shaft element around an eccentric housing axis extending perpendicular to the first axis, wherein the first eccentric housing is rotatably arranged in the elevation support or in the platform. - providing the platform, the elevation support and the adjustable locking mechanism; - mounting the elevation support to the platform; - adjusting the adjustable locking mechanism so that the first distance corresponds with the second distance; and - locking the adjustable locking mechanism by sliding the first shaft element into the first opening and by sliding the second shaft element (13") into the second opening (11"); wherein - the step of adjusting the adjustable locking mechanism comprises moving the first opening or the first sliding shaft element in a third direction parallel or essentially parallel with the first direction, wherein said moving of the first opening or the first sliding shaft element is performed by rotating a first eccentric housing comprising said first opening or the first sliding shaft element around an eccentric housing axis extending perpendicular to the first axis, wherein the first eccentric housing is rotatably arranged in the elevation support or in the platform.
Channel cover (10, 30) for a drainage channel, which drainage channel comprises an upwardly open inlet region extending in the longitudinal direction and a frame extending on both sides of the inlet region in the channel longitudinal direction for receiving the channel cover, the channel cover comprising at least two load supports extending in the channel longitudinal direction and transverse supports extending between the load supports in the transverse direction of the channel and rigidly connected to the load supports, the transverse supports protruding beyond the load supports at the attachment side of the channel cover and thus forming attachment regions for attaching the channel cover to the frame of the drainage channel, characterised in that the channel cover is single-piece and consists of cast metal and the channel cover comprises an upper cover plate, on the underside of which the transverse supports and the load supports extending in the longitudinal direction are formed.
An apparatus for administering sub-atmospheric pressure to a wound, comprising: (a) a reticulated screen for a wound; (b) a cover adapted to cover the wound and the screen and to provide an enclosure above the wound and the screen and adapted to maintain sub-atmospheric pressure at the site of the wound; (c) a seal configured to seal the cover to tissue surrounding the wound; and (d) a source of suction configured to generate a time-varying sub-atmospheric pressure (310, 320, 330, 340) having a periodic waveform comprising a gradual change in pressure, the suction source cooperating with the cover to supply the time-varying sub-atmospheric pressure to the enclosure; characterised in that the reticulated screen is configured to stimulate tissue growth at the wound and has a degree of reticulation selected to deter tissue growth within the screen, and the time-varying sub-atmospheric pressure is supplied to the enclosure for a time sufficient to stimulate tissue growth at the wound. (a) a reticulated screen for a wound; (b) a cover adapted to cover the wound and the screen and to provide an enclosure above the wound and the screen and adapted to maintain sub-atmospheric pressure at the site of the wound; (c) a seal configured to seal the cover to tissue surrounding the wound; and (d) a source of suction configured to generate a time-varying sub-atmospheric pressure (310, 320, 330, 340) having a periodic waveform comprising a gradual change in pressure, the suction source cooperating with the cover to supply the time-varying sub-atmospheric pressure to the enclosure; characterised in that the reticulated screen is configured to stimulate tissue growth at the wound and has a degree of reticulation selected to deter tissue growth within the screen, and the time-varying sub-atmospheric pressure is supplied to the enclosure for a time sufficient to stimulate tissue growth at the wound.
An apparatus (100, 100') for the culture of photosynthetic microorganisms (50, 50') comprising - at least one first panel (20, 20') containing said photosynthetic microorganisms (50, 50') inside it within a circuit having an input and an output; and - at least one device for artificial lighting (10, 10') of said photosynthetic microorganisms (50, 50'), wherein - said at least one device for artificial lighting (10, 10') is an optical device and comprises ▪ a panel having an optical guide (1, 1'); ▪ a plurality of LEDs (2, 2'); and ▪ a regulation and control panel (4, 4') of said at least one device for artificial lighting (10, 10'), - said at least one regulation and control panel (4,4') is suitable to vary both the spectrum, between 200 and 900 nm in order to optimize both the quality of the light emitted, and the light intensity, between 1% and 100% in order to obtain emission uniformity, through the optical guide (1, 1'); and - the first panel and the panel with the optical guide are facing one another. - at least one first panel (20, 20') containing said photosynthetic microorganisms (50, 50') inside it within a circuit having an input and an output; and - at least one device for artificial lighting (10, 10') of said photosynthetic microorganisms (50, 50'), wherein - said at least one device for artificial lighting (10, 10') is an optical device and comprises ▪ a panel having an optical guide (1, 1'); ▪ a plurality of LEDs (2, 2'); and ▪ a regulation and control panel (4, 4') of said at least one device for artificial lighting (10, 10'), ▪ a panel having an optical guide (1, 1'); ▪ a plurality of LEDs (2, 2'); and ▪ a regulation and control panel (4, 4') of said at least one device for artificial lighting (10, 10'), - said at least one regulation and control panel (4,4') is suitable to vary both the spectrum, between 200 and 900 nm in order to optimize both the quality of the light emitted, and the light intensity, between 1% and 100% in order to obtain emission uniformity, through the optical guide (1, 1'); and - the first panel and the panel with the optical guide are facing one another.
A polarization state converting element for a laser machining apparatus, comprising: a plurality of waveplates; and a rotation mechanism (5a,5b,19a,19b) that rotates the respective waveplates (1a,1b,14a,14b) independently to one another around an optical axis, wherein the waveplates (1a,1b,14a,14b) are each made of a material having neither optical rotatory property nor birefringence, but having transparency, a function of phase delay depending on polarization being applied on a surface of each waveplate, and wherein the plurality of waveplates are two 1/8 waveplates (1a,1b,14a,14b), wherein the function of phase delay is applied to the substrate by forming grooves in a constant direction on the surface of the substrate, or by applying specific coating to a wedge plate. a plurality of waveplates; and a rotation mechanism (5a,5b,19a,19b) that rotates the respective waveplates (1a,1b,14a,14b) independently to one another around an optical axis, wherein the waveplates (1a,1b,14a,14b) are each made of a material having neither optical rotatory property nor birefringence, but having transparency, a function of phase delay depending on polarization being applied on a surface of each waveplate, and wherein the plurality of waveplates are two 1/8 waveplates (1a,1b,14a,14b), wherein the function of phase delay is applied to the substrate by forming grooves in a constant direction on the surface of the substrate, or by applying specific coating to a wedge plate.
In a computing system having a loader, a fault handler and an application policy manager in an execution container and a resource manager for verifying the loader and controlling access to security domains, the resource manager operating at higher security level than the loader and the loader belonging to a higher security level than the fault handler and an antivirus application contained in protected pages of a guest OS installed in addition to a host operating system, a method comprising: specifying, by the AV application, a fault handler code image, a fault handler manifest, a memory location of the AV application, and an AV application manifest by way of processor instructions to the loader; verifying, by the loader, the fault handler code image and the fault handler manifest with the application policy manager; creating, by the loader, a first security domain having a first security level, copying the fault handler code image to memory associated with the first security domain, and initiating execution of the fault handler; requesting, by the loader, to lock memory pages in the guest OS that are reserved for the AV application; locking, by the fault handler, the executable code image of the AV application by setting traps on selected code segments in guest OS memory pages; measuring, by the loader, AV application memory and comparing the measurement to the application manifest; and promoting, by the loader, the AV application from a second security domain with a second security level to the first security domain, when the AV application is successfully verified by the measuring and comparing step, the first security level being higher than the second security level. specifying, by the AV application, a fault handler code image, a fault handler manifest, a memory location of the AV application, and an AV application manifest by way of processor instructions to the loader; verifying, by the loader, the fault handler code image and the fault handler manifest with the application policy manager; creating, by the loader, a first security domain having a first security level, copying the fault handler code image to memory associated with the first security domain, and initiating execution of the fault handler; requesting, by the loader, to lock memory pages in the guest OS that are reserved for the AV application; locking, by the fault handler, the executable code image of the AV application by setting traps on selected code segments in guest OS memory pages; measuring, by the loader, AV application memory and comparing the measurement to the application manifest; and promoting, by the loader, the AV application from a second security domain with a second security level to the first security domain, when the AV application is successfully verified by the measuring and comparing step, the first security level being higher than the second security level.
Mixture for a thermoset-forming polymer system, comprising (i) at least one liquid component of the thermoset-forming polymer system, (ii) a polyester reactive with the thermoset-forming polymer system, and (iii) a nucleating seed-former for the crystallization of the polyester reactive with the thermoset-forming polymer system, where at 20°C ≥ 10 wt% of the total amount of polyester reactive with a thermoset-forming polymer system is present in crystalline state and in suspension. (i) at least one liquid component of the thermoset-forming polymer system, (ii) a polyester reactive with the thermoset-forming polymer system, and (iii) a nucleating seed-former for the crystallization of the polyester reactive with the thermoset-forming polymer system,
A vehicle body for a motor vehicle having a support, especially a side member, which is formed from fibre-reinforced plastics material, especially carbon fibre-reinforced plastics material, and which as a supporting structural element has an action absorbing collision energy effect in the event of a collision of the motor vehicle, wherein an end face (3; 4) of the support is formed obliquely relative to a load plane (11; 12) which runs perpendicular to a collision load path, wherein the collision load path has a plate element (9; 10), wherein a side (11; 12) of the plate element (9; 10) which faces the end face (3; 4) of the support is formed inclined relative to the end face (3; 4) of the support and lying partially directly or indirectly against the end face (3; 4) of the support, and wherein the collision load path further has a bumper transverse member and a deformation element for absorption of energy up to a collision energy threshold load.
A biocomposite material comprising a plurality of cellulose fragments made up of a network of cellulose microfibrils, hydrophilic binder located within the network of cellulose microfibrils and hydrophobic binder arranged to interact with the hydrophilic binder so as to encapsulate the plurality of cellulose fragments.
Method for controlling a medical imaging system, comprising the steps: - providing a three-dimensional structure image comprising both surface data relating to external contours and structure data relating to internal structures of a body region, - recording the body region of a patient by means of a camera system while the patient is situated in or on the medical imaging system, and producing a three-dimensional surface image from these recordings, - registering at least locally the surface image and the structure image in relation to each other, characterised in that the method comprises the following steps: - producing an overlay image, wherein the overlay image comprises at least part of the registered structure image (rSB) including the registered structure data (rSD) in the form of an overlay with the registered surface image (rOB) and/or the real view of the corresponding part of the real body region, - controlling the medical imaging system in such a way that the medical imaging system records regions of the patient on the basis of the arrangement of the registered structure data (rSD) in the overlay image. - providing a three-dimensional structure image comprising both surface data relating to external contours and structure data relating to internal structures of a body region, - recording the body region of a patient by means of a camera system while the patient is situated in or on the medical imaging system, and producing a three-dimensional surface image from these recordings, - registering at least locally the surface image and the structure image in relation to each other, - producing an overlay image, wherein the overlay image comprises at least part of the registered structure image (rSB) including the registered structure data (rSD) in the form of an overlay with the registered surface image (rOB) and/or the real view of the corresponding part of the real body region, - controlling the medical imaging system in such a way that the medical imaging system records regions of the patient on the basis of the arrangement of the registered structure data (rSD) in the overlay image.
A composition comprising: asphalt or asphalt mix, wherein polyphosphoric acid is present in the asphalt or asphalt mix; and a dispersion of a hydrogen sulfide scavenger in an organic solvent, wherein the hydrogen sulfide scavenger comprises a copper based compound, wherein the solvent is an aliphatic or aromatic solvent, wherein the solvent further comprises alcohol, wherein the alcohol is not miscible with the aliphatic or aromatic solvent, wherein the dispersion further comprises an organoclay suspension agent and an emulsifier, and wherein the proportion of hydrogen sulfide scavenger is between 0.01% and 5% by weight with respect to the total weight of the asphalt composition.
A process for reducing scaling in the pulp and paper industry, characterized in - providing an alkaline aqueous process fluid in a process for making paper, board or pulp, said fluid containing calcium ions and carbonate ions which provide a tendency for calcium carbonate scaling, - causing said fluid to pass through equipment having portions, wherein said fluid is subjected to a change in energy by a change in pressure and/or speed, and - preventing precipitation of said calcium ions and carbonate ions and scaling on said equipment by introducing carbon dioxide into said fluid prior to the passage of said fluid through said equipment. - providing an alkaline aqueous process fluid in a process for making paper, board or pulp, said fluid containing calcium ions and carbonate ions which provide a tendency for calcium carbonate scaling, - causing said fluid to pass through equipment having portions, wherein said fluid is subjected to a change in energy by a change in pressure and/or speed, and - preventing precipitation of said calcium ions and carbonate ions and scaling on said equipment by introducing carbon dioxide into said fluid prior to the passage of said fluid through said equipment.
A method for fabricating an epitaxial wafer (300A; 300B), comprising a silicon carbide substrate (110; 310; 330) and an epitaxial structure (320; 340) disposed on the silicon carbide substrate (310; 330), said epitaxial structure (320; 340) comprising a first epitaxial layer (117; 322; 342) and a second epitaxial layer (119; 324; 344) disposed on the first epitaxial layer (117; 322; 342);, each of the first (117; 322; 342) and second epitaxial layers (119; 324; 344) comprising silicon carbide, said method comprising the following steps: • a step of disposing the silicon carbide substrate (110; 310; 330) in a reaction chamber; • a step of injecting in the reaction chamber a reactive gas include a growth gas for epitaxial growth and a doping gas, wherein said growth gas includes silicon and carbon, wherein said doping gas includes a dilution gas and a source gas containing said an n-type or p-type dopant, • a step of rotating said silicon carbide substrate (110; 310; 330) at a predetermined and controlled rotation speed that is set to be comprised between 50 rpm and 100 rpm, and controlling the dilution ratio of the source gas in the doping gas wherein the dilution ratio of the source gas in the doping gas is given by the following expression: dilution ratio = flux of source gas / flux of doping gas; • a step of growing an epitaxial layer (115, 117, 119, 322, 342, 324, 344) comprising a pregrowing step of the first epitaxial layer (117; 322; 342) on the silicon carbide substrate (310; 330), and a growing step of the second epitaxial layer (119; 324; 344) on the first epitaxial layer (115, 117; 322; 342); wherein during the pregrowth step, the dilution ratio of the source gas is controlled to be set within 1/70 to 1/30 and the C/Si ratio of the epitaxial layers is of 0,7 to less than 1, and during the growth step the dilution ratio of the source gas is controlled to be set within 1/100 to 1/10 and the C/Si ratio of the epitaxial layers is 1 or more, thus leading to a standard deviation from the mean concentration of dopant of said epitaxial structure (320; 340) from a center to an edge of the epitaxial wafer being of 10% or less of the mean concentration of dopant. • a step of disposing the silicon carbide substrate (110; 310; 330) in a reaction chamber; • a step of injecting in the reaction chamber a reactive gas include a growth gas for epitaxial growth and a doping gas, • a step of rotating said silicon carbide substrate (110; 310; 330) at a predetermined and controlled rotation speed that is set to be comprised between 50 rpm and 100 rpm, and controlling the dilution ratio of the source gas in the doping gas wherein the dilution ratio of the source gas in the doping gas is given by the following expression: dilution ratio = flux of source gas / flux of doping gas; • a step of growing an epitaxial layer (115, 117, 119, 322, 342, 324, 344) comprising a pregrowing step of the first epitaxial layer (117; 322; 342) on the silicon carbide substrate (310; 330), and a growing step of the second epitaxial layer (119; 324; 344) on the first epitaxial layer (115, 117; 322; 342);
A device for controlling and protecting against electrical failures in a power supply system of a three-phase network with a protective conductor, wherein the device comprises: - first acquisition means of each of the phases of the three-phase network; - second acquisition means of a signal from the protective conductor; characterized in that the device further comprises: - control means (3, 4) configured for detecting a voltage value between each of the phases and the protective conductor and determining a loss of ground reference if said voltage value exceeds a pre-established threshold; - at least one electrical cut-off element switchable between a closed state for conduction and an open state for interrupting power from the second acquisition means, wherein the switching from a closed state to an open state occurs as a result of the determination of the loss of ground reference; and - transmission means (8, 27 and 28) configured to transmit an electrical failure signal to external equipment, as a result of the determination of the loss of ground reference. - first acquisition means of each of the phases of the three-phase network; - second acquisition means of a signal from the protective conductor; - control means (3, 4) configured for detecting a voltage value between each of the phases and the protective conductor and determining a loss of ground reference if said voltage value exceeds a pre-established threshold; - at least one electrical cut-off element switchable between a closed state for conduction and an open state for interrupting power from the second acquisition means, wherein the switching from a closed state to an open state occurs as a result of the determination of the loss of ground reference; and - transmission means (8, 27 and 28) configured to transmit an electrical failure signal to external equipment, as a result of the determination of the loss of ground reference.