A process of making an organic or inorganic thin film on a substrate by atomic layer deposition, comprising simultaneously directing a series of gas flows delivered from at least one delivering head having an output face separated a distance from the substrate along substantially parallel elongated channels, and wherein the series of gas flows comprises, in order, at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, optionally repeated a plurality of times, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material and the second reactive gaseous material is capable of reacting with a surface treated with the first reactive gaseous material to form the thin film, wherein the first reactive gaseous material, the second reactive gaseous material or both is a volatile organic compound; wherein the process is carried out in a deposition system comprising: (a) a plurality of sources for, respectively, a plurality of gaseous materials comprising at least a first, a second, and a third source for a first, a second, and a third gaseous material, respectively; (b) the at least one delivery head for delivering the plurality of gaseous materials to a substrate receiving thin film deposition and comprising: (i) a plurality of inlet ports comprising at least a first, a second, and a third inlet port for receiving the first, the second, and the third gaseous material, respectively; and (ii) an output face and comprising a plurality of substantially parallel elongated output openings for each of the first, the second, and the third gaseous materials, wherein the delivery head is designed to deliver the first, the second, and the third gaseous materials simultaneously from the elongated output openings in the output face; wherein the process is carried out substantially at or above atmospheric pressure, wherein the temperature of the substrate during deposition is under 250°C, and wherein the deposited organic thin film comprises at least 20 atomic weight percent carbon, and wherein at least part of a force maintaining a separation between the output face of the delivery head and the substrate surface during thin film deposition is generated due to flows of one or more of the gaseous materials from the delivery head to the substrate surface for thin film deposition. (a) a plurality of sources for, respectively, a plurality of gaseous materials comprising at least a first, a second, and a third source for a first, a second, and a third gaseous material, respectively; (b) the at least one delivery head for delivering the plurality of gaseous materials to a substrate receiving thin film deposition and comprising: (i) a plurality of inlet ports comprising at least a first, a second, and a third inlet port for receiving the first, the second, and the third gaseous material, respectively; and (ii) an output face and comprising a plurality of substantially parallel elongated output openings for each of the first, the second, and the third gaseous materials, wherein the delivery head is designed to deliver the first, the second, and the third gaseous materials simultaneously from the elongated output openings in the output face; (i) a plurality of inlet ports comprising at least a first, a second, and a third inlet port for receiving the first, the second, and the third gaseous material, respectively; and (ii) an output face and comprising a plurality of substantially parallel elongated output openings for each of the first, the second, and the third gaseous materials, wherein the delivery head is designed to deliver the first, the second, and the third gaseous materials simultaneously from the elongated output openings in the output face;