An optical lens with an antireflective film, comprising: a lens substrate; and an antireflective film formed on the lens substrate, wherein the antireflective film is formed of at least ten layers, each of the layers forming the antireflective film has a physical thickness of 140 nm or less, in order from an air side, the antireflective film has a first layer formed as an MgF 2 layer, in order from the air side, the antireflective film has a second layer, a fourth layer, a sixth layer, an eighth layer, and a tenth layer each having a refractive index of 2.0 or more and 2.3 or less, in order from the air side, the antireflective film has a third layer, a fifth layer, a seventh layer, and a ninth layer each formed as an SiO 2 layer, quarter wave optical thicknesses Q 1, Q 2, Q 3, Q 4, Q 5, Q 6, Q 7, Q 8, Q 9, and Q 10 of the first, second, third, fourth, fifth, sixth, seventh, eighth, ninth, and tenth layers (21, 22, 23, 24, 25, 26, 27, 28, 29, 30), respectively, in a design reference wavelength of 550 nm satisfy equations,,,,,,,,, and, respectively: Q 1 = 0.05 × n s + A1 0.79 ≤ A1 ≤ 0.91; Q 2 = 0.09 × n s + A2 1.64 ≤ A2 ≤ 1.85; Q 3 = A3 0.68 ≤ A3 ≤ 1.02; Q 4 = A4 0.02 ≤ A4 ≤ 0. 22; Q 5 = A5 0.68 ≤ A5 ≤ 1. 02; Q 6 = − 0.31 × n s + A6 1.01 ≤ A6 ≤ 1.29; Q 7 = A7 0.10 ≤ A7 ≤ 0.35; Q 8 = 0.79 × n s + A8 − 1.64 ≤ A8 ≤ 0.01; Q 9 = − 0.64 × n s + A9 1.26 ≤ A9 ≤ 1.55; and Q 10 = 0.32 × n s + A10 − 0.38 ≤ A10 ≤ 0.19, where n s shows a refractive index of the lens substrate in a wavelength of 587.56 nm, each of the quarter wave optical thicknesses of the respective layers of the antireflective film in the design reference wavelength is obtained by dividing an optical thickness of each of the layers of the antireflective film by λ 0 /4, and the optical thickness of each of the layers of the antireflective film is obtained by a product of: the refractive index of each of the layers of the antireflective film in the design reference wavelength and the physical thickness (nm) of each of the layers of the antireflective film. a lens substrate; and an antireflective film formed on the lens substrate, wherein the antireflective film is formed of at least ten layers, each of the layers forming the antireflective film has a physical thickness of 140 nm or less, in order from an air side, the antireflective film has a first layer formed as an MgF 2 layer, in order from the air side, the antireflective film has a second layer, a fourth layer, a sixth layer, an eighth layer, and a tenth layer each having a refractive index of 2.0 or more and 2.3 or less, in order from the air side, the antireflective film has a third layer, a fifth layer, a seventh layer, and a ninth layer each formed as an SiO 2 layer, quarter wave optical thicknesses Q 1, Q 2, Q 3, Q 4, Q 5, Q 6, Q 7, Q 8, Q 9, and Q 10 of the first, second, third, fourth, fifth, sixth, seventh, eighth, ninth, and tenth layers (21, 22, 23, 24, 25, 26, 27, 28, 29, 30), respectively, in a design reference wavelength of 550 nm satisfy equations,,,,,,,,, and, respectively: Q 1 = 0.05 × n s + A1 0.79 ≤ A1 ≤ 0.91; Q 2 = 0.09 × n s + A2 1.64 ≤ A2 ≤ 1.85; Q 3 = A3 0.68 ≤ A3 ≤ 1.02; Q 4 = A4 0.02 ≤ A4 ≤ 0. 22; Q 5 = A5 0.68 ≤ A5 ≤ 1. 02; Q 6 = − 0.31 × n s + A6 1.01 ≤ A6 ≤ 1.29; Q 7 = A7 0.10 ≤ A7 ≤ 0.35; Q 8 = 0.79 × n s + A8 − 1.64 ≤ A8 ≤ 0.01; Q 9 = − 0.64 × n s + A9 1.26 ≤ A9 ≤ 1.55; and Q 10 = 0.32 × n s + A10 − 0.38 ≤ A10 ≤ 0.19, where n s shows a refractive index of the lens substrate in a wavelength of 587.56 nm, each of the quarter wave optical thicknesses of the respective layers of the antireflective film in the design reference wavelength is obtained by dividing an optical thickness of each of the layers of the antireflective film by λ 0 /4, and the optical thickness of each of the layers of the antireflective film is obtained by a product of: the refractive index of each of the layers of the antireflective film in the design reference wavelength and the physical thickness (nm) of each of the layers of the antireflective film.