A method for manufacturing an organic light emitting diode display panel, comprising: (step 51) forming an active array on a transparent substrate, the active array comprising driving power lines, data lines (102a~102b), scan lines (101a~101b), and a plurality of pixel units which are defined by crossing of the scan lines (101a~101b) and the data lines (102a~102b), the pixel units comprising first electrodes which are transparent, switch transistors, driving transistors, and connecting lines between the switch transistors and driving transistors, wherein the scan lines (101a~101b), the data lines (102a~102b), the driving power lines, the connecting lines, the switch transistors and the driving transistors are opaque; forming a hydrophilic material layer on the transparent substrate with a material which is transparent and has hydrophilicity; (step 52) coating a photoresist layer on the transparent substrate so as to cover the active array, wherein the photoresist layer comprises a hydrophobic material and is coated on the hydrophilic material layer; (step 53) performing exposure on the photoresist layer from one side of the transparent substrate opposed to the photoresist layer, wherein a pattern constituted by the scan lines (101a∼101b), the data lines (102a∼102b), the driving power lines, the connecting lines, the switch transistors and the driving transistors is used as a mask plate to prevent exposure of the corresponding photoresist, so that a photoresist remaining region is formed by the photoresist layer; (step 54) conducting a development treatment on the photoresist layer, so that the photoresist outside the photoresist remaining region is removed and the photoresist in the photoresist remaining region is retained to form a first pixel defining layer having the same shape as the pattern used as the mask plate; removing the hydrophilic material layer exposed outside the photoresist remaining region, and obtaining a second pixel defining layer constituted by the remaining hydrophilic material layer; (step 55) forming an organic light emitting layer in a pixel region defined by the pixel defining layer; and forming (step 56) a second electrode on the organic light emitting layer. (step 51) forming an active array on a transparent substrate, the active array comprising driving power lines, data lines (102a~102b), scan lines (101a~101b), and a plurality of pixel units which are defined by crossing of the scan lines (101a~101b) and the data lines (102a~102b), the pixel units comprising first electrodes which are transparent, switch transistors, driving transistors, and connecting lines between the switch transistors and driving transistors, wherein the scan lines (101a~101b), the data lines (102a~102b), the driving power lines, the connecting lines, the switch transistors and the driving transistors are opaque; forming a hydrophilic material layer on the transparent substrate with a material which is transparent and has hydrophilicity; (step 52) coating a photoresist layer on the transparent substrate so as to cover the active array, wherein the photoresist layer comprises a hydrophobic material and is coated on the hydrophilic material layer; (step 53) performing exposure on the photoresist layer from one side of the transparent substrate opposed to the photoresist layer, wherein a pattern constituted by the scan lines (101a∼101b), the data lines (102a∼102b), the driving power lines, the connecting lines, the switch transistors and the driving transistors is used as a mask plate to prevent exposure of the corresponding photoresist, so that a photoresist remaining region is formed by the photoresist layer; (step 54) conducting a development treatment on the photoresist layer, so that the photoresist outside the photoresist remaining region is removed and the photoresist in the photoresist remaining region is retained to form a first pixel defining layer having the same shape as the pattern used as the mask plate; removing the hydrophilic material layer exposed outside the photoresist remaining region, and obtaining a second pixel defining layer constituted by the remaining hydrophilic material layer; (step 55) forming an organic light emitting layer in a pixel region defined by the pixel defining layer; and forming (step 56) a second electrode on the organic light emitting layer.