Method for recording a measurement value (dφ/dx, M), wherein - an electrical excitation signal (Ue) having a predetermined excitation frequency (f), with or without a superimposed DC part (Uoffset), is fed to an input of a component (100, C) which responds to the electrical excitation signal (Ue) and varies a property to a measurable extent for electron holography as a function of the excitation signal, - at least one electron holography measurement step is carried out, in which - an electron beam (Se) is directed onto the component (100, C), penetrates and/or passes through the component (100, C) and is subsequently superimposed with a reference electron beam (Sr), and - an electron hologram resulting from interference of the two electron beams (Se, Sr) during a predetermined measurement window is measured, and a phase image is determined therefrom, and - the measurement value is formed with the aid of the phase image, - wherein the temporal length (Tf) of the measurement window of the electron holography measurement step is less than half the period duration of the electrical excitation signal (Ue), characterized in that - a sinusoidal electrical excitation signal (Ue) is fed to the input of the component (100, C) as the excitation signal, - at least two electron holography measurement steps of the type described are carried out successively with different excitation frequencies (f), - in each of the electron holography measurement steps, the length (Tf) of the measurement window and the respective period length of the sinusoidal excitation signal (Ue) are adapted to one another, specifically in such a way that the ratio between the length (Tf) of the measurement window and the respective period length of the excitation signal (Ue) is equally large for all electron holography measurement steps, and - in each of the electron holography measurement steps - independently of the respective excitation frequency (f) - the location of the measurement window in relation to the time profile of the excitation signal (Ue) is always the same. - an electrical excitation signal (Ue) having a predetermined excitation frequency (f), with or without a superimposed DC part (Uoffset), is fed to an input of a component (100, C) which responds to the electrical excitation signal (Ue) and varies a property to a measurable extent for electron holography as a function of the excitation signal, - at least one electron holography measurement step is carried out, in which - an electron beam (Se) is directed onto the component (100, C), penetrates and/or passes through the component (100, C) and is subsequently superimposed with a reference electron beam (Sr), and - an electron hologram resulting from interference of the two electron beams (Se, Sr) during a predetermined measurement window is measured, and a phase image is determined therefrom, and - the measurement value is formed with the aid of the phase image, - wherein the temporal length (Tf) of the measurement window of the electron holography measurement step is less than half the period duration of the electrical excitation signal (Ue), characterized in that - a sinusoidal electrical excitation signal (Ue) is fed to the input of the component (100, C) as the excitation signal, - at least two electron holography measurement steps of the type described are carried out successively with different excitation frequencies (f), - in each of the electron holography measurement steps, the length (Tf) of the measurement window and the respective period length of the sinusoidal excitation signal (Ue) are adapted to one another, specifically in such a way that the ratio between the length (Tf) of the measurement window and the respective period length of the excitation signal (Ue) is equally large for all electron holography measurement steps, and - in each of the electron holography measurement steps - independently of the respective excitation frequency (f) - the location of the measurement window in relation to the time profile of the excitation signal (Ue) is always the same.