A curable dental composition for dental use comprising ∘ a resin matrix comprising hardenable components, the hardenable components comprising a hardenable component with at least one acidic moiety, ∘ an initiator system suitable for curing the hardenable components, ∘ polyoxometalate(s) and/or derivatives thereof being present in an amount of at least about 5 wt.-% with respect to the weight of the composition, the polyoxometalate comprising a dissolved polyoxometalate cluster(s), the dissolved polyoxometalate cluster(s) comprising polyoxometalate anion(s) being characterized by the formula (X x M m M' n O y) q-, with X being selected from Cu, Zn, Co, Fe, B, Ga, Rh, Al, Cr, Mn, Ni, Ti, Zr, Si, Ge P, As, Te, I, x being from 0 to 30, m being from 3 to 248 and n being from 0 to m/2, y being from 10 to 720, with the proviso that (0≤x<m+n), M or M' being one or more transition metal selected from V, Nb, Ta, Mo and W, O being oxygen, q being from 1 to 20, the hardenable component with at least one acidic moiety being characterized by the following formula: A n -B-C m - with A being an ethylenically unsaturated group, - B being a spacer group selected from (i) linear or branched C1 to C12 alkyl, optionally substituted with halogen atoms and/or hydroxyl groups (ii) C6 to C12 aryl, optionally substituted with other functional groups with halogen atoms and/or hydroxyl groups, or (iii) organic group having 4 to 20 carbon atoms bonded to one another by one or more ether, thioether, ester, thioester, thiocarbonyl, amide, urethane, carbonyl and/or sulfonyl linkages, - C being an acidic moiety, - m, n being independently selected from 1, 2, 3, 4, 5 or 6, wherein the acidic moiety comprises one or more carboxylic acid residues, phosphoric acid residues, phosphonic acid residues, sulphonic acid residues, or sulfinic acid residues. ∘ a resin matrix comprising hardenable components, the hardenable components comprising a hardenable component with at least one acidic moiety, ∘ an initiator system suitable for curing the hardenable components, ∘ polyoxometalate(s) and/or derivatives thereof being present in an amount of at least about 5 wt.-% with respect to the weight of the composition, the polyoxometalate comprising a dissolved polyoxometalate cluster(s), the dissolved polyoxometalate cluster(s) comprising polyoxometalate anion(s) being characterized by the formula (X x M m M' n O y) q-, with X being selected from Cu, Zn, Co, Fe, B, Ga, Rh, Al, Cr, Mn, Ni, Ti, Zr, Si, Ge P, As, Te, I, x being from 0 to 30, m being from 3 to 248 and n being from 0 to m/2, y being from 10 to 720, with the proviso that (0≤x<m+n), M or M' being one or more transition metal selected from V, Nb, Ta, Mo and W, O being oxygen, q being from 1 to 20, the hardenable component with at least one acidic moiety being characterized by the following formula: A n -B-C m - with A being an ethylenically unsaturated group, - B being a spacer group selected from (i) linear or branched C1 to C12 alkyl, optionally substituted with halogen atoms and/or hydroxyl groups (ii) C6 to C12 aryl, optionally substituted with other functional groups with halogen atoms and/or hydroxyl groups, or (iii) organic group having 4 to 20 carbon atoms bonded to one another by one or more ether, thioether, ester, thioester, thiocarbonyl, amide, urethane, carbonyl and/or sulfonyl linkages, - C being an acidic moiety, - m, n being independently selected from 1, 2, 3, 4, 5 or 6, - with A being an ethylenically unsaturated group, - B being a spacer group selected from (i) linear or branched C1 to C12 alkyl, optionally substituted with halogen atoms and/or hydroxyl groups (ii) C6 to C12 aryl, optionally substituted with other functional groups with halogen atoms and/or hydroxyl groups, or (iii) organic group having 4 to 20 carbon atoms bonded to one another by one or more ether, thioether, ester, thioester, thiocarbonyl, amide, urethane, carbonyl and/or sulfonyl linkages, - C being an acidic moiety, - m, n being independently selected from 1, 2, 3, 4, 5 or 6, wherein the acidic moiety comprises one or more carboxylic acid residues, phosphoric acid residues, phosphonic acid residues, sulphonic acid residues, or sulfinic acid residues.