A method for producing plasma flows of a metal and/or a gas comprising that electric discharges are periodically produced between an anode and a metal magnetron sputtering cathode (1, C, 23), the cathode produced from a metal or metals necessary for metal plasma production, in crossed electric and magnetic fields in a chamber having a low pressure of a gas, characterized in that the discharges are produced so that each discharge comprises - a first period with a high voltage and a low electrical current (I 1) supplied by a first power supply passing between the anode and cathode (1, C, 23) for achieving a sputtering discharge producing a metal vapor by magnetron sputtering, said sputtering discharges in said first periods being low intensity current quasi-stationary discharges, - each first period being followed by a second period with a low voltage and a high electrical current (I 2) supplied by a second power supply passing between the anode and cathode (1, C, 23) generating an ionizing discharge for producing an ionization of gas and the produced metal vapor, said ionizing discharges in said second periods being high intensity current non-quasi-stationary discharges in crossed electric and magnetic fields, - wherein in said first periods the driving current between the anode and the cathode (1, C, 23) is μ 1 S wherein μ 1 is measured in A/cm 2 having a value in the range of 0.1-1 A/cm 2 and S is the area of the active surface of the cathode (1, C, 23) measured in cm 2, - wherein in the second periods the driving current between the anode and the cathode (1, C, 23) is μ 2 S, where μ 2 is measured in A/cm 2 having a value in the range of 1-10 A/cm 2 and S is the area of the active surface of the cathode (1, C, 23) measured in cm 2, - wherein said high electrical current is higher than said low electrical current, - and wherein said first period has a longer duration than said second period. - a first period with a high voltage and a low electrical current (I 1) supplied by a first power supply passing between the anode and cathode (1, C, 23) for achieving a sputtering discharge producing a metal vapor by magnetron sputtering, said sputtering discharges in said first periods being low intensity current quasi-stationary discharges, - each first period being followed by a second period with a low voltage and a high electrical current (I 2) supplied by a second power supply passing between the anode and cathode (1, C, 23) generating an ionizing discharge for producing an ionization of gas and the produced metal vapor, said ionizing discharges in said second periods being high intensity current non-quasi-stationary discharges in crossed electric and magnetic fields, - wherein in said first periods the driving current between the anode and the cathode (1, C, 23) is μ 1 S wherein μ 1 is measured in A/cm 2 having a value in the range of 0.1-1 A/cm 2 and S is the area of the active surface of the cathode (1, C, 23) measured in cm 2, - wherein in the second periods the driving current between the anode and the cathode (1, C, 23) is μ 2 S, where μ 2 is measured in A/cm 2 having a value in the range of 1-10 A/cm 2 and S is the area of the active surface of the cathode (1, C, 23) measured in cm 2, - wherein said high electrical current is higher than said low electrical current, - and wherein said first period has a longer duration than said second period.