A variable data lithography system for applying a multicomponent image to a substrate, comprising: an imaging member comprising: an arbitrarily reimageable surface layer; a dampening solution subsystem for applying a layer of dampening solution to said arbitrarily reimageable surface layer and wherein said arbitrarily reimageable surface layer has roughness on the order of the layer thickness of the dampening solution; a patterning subsystem for selectively removing portions of the dampening solution layer so as to produce a latent image in the dampening solution; an image transfer subsystem for transferring the inked latent image to a substrate, and; a cleaning subsystem adapted to remove residual marking material and residual dampening solution from the arbitrarily reimageable surface layer after the image has been transferred to the substrate; characterised by a marking material subsystem, comprising: a plurality of marking material assemblies (46a, 46b, 46c, 46d), each for applying marking material over the arbitrarily reimageable surface layer such that said marking material selectively occupies regions of the reimageable surface layer where dampening solution was removed by the patterning subsystem to thereby produce a latent image of said marking material; each marking material assembly further comprising a marking material source; wherein each marking material assembly further comprises a control mechanism for selectively engaging and disengaging each of said plurality of marking material assemblies with the reimageable surface layer of said imaging member so as to produce a multicomponent image. an imaging member comprising: an arbitrarily reimageable surface layer; a dampening solution subsystem for applying a layer of dampening solution to said arbitrarily reimageable surface layer and wherein said arbitrarily reimageable surface layer has roughness on the order of the layer thickness of the dampening solution; a patterning subsystem for selectively removing portions of the dampening solution layer so as to produce a latent image in the dampening solution; an image transfer subsystem for transferring the inked latent image to a substrate, and; a cleaning subsystem adapted to remove residual marking material and residual dampening solution from the arbitrarily reimageable surface layer after the image has been transferred to the substrate; characterised by a marking material subsystem, comprising: a plurality of marking material assemblies (46a, 46b, 46c, 46d), each for applying marking material over the arbitrarily reimageable surface layer such that said marking material selectively occupies regions of the reimageable surface layer where dampening solution was removed by the patterning subsystem to thereby produce a latent image of said marking material; each marking material assembly further comprising a marking material source; wherein each marking material assembly further comprises a control mechanism for selectively engaging and disengaging each of said plurality of marking material assemblies with the reimageable surface layer of said imaging member so as to produce a multicomponent image. an arbitrarily reimageable surface layer; a dampening solution subsystem for applying a layer of dampening solution to said arbitrarily reimageable surface layer and wherein said arbitrarily reimageable surface layer has roughness on the order of the layer thickness of the dampening solution; a patterning subsystem for selectively removing portions of the dampening solution layer so as to produce a latent image in the dampening solution; an image transfer subsystem for transferring the inked latent image to a substrate, and; a cleaning subsystem adapted to remove residual marking material and residual dampening solution from the arbitrarily reimageable surface layer after the image has been transferred to the substrate; characterised by a marking material subsystem, comprising: a plurality of marking material assemblies (46a, 46b, 46c, 46d), each for applying marking material over the arbitrarily reimageable surface layer such that said marking material selectively occupies regions of the reimageable surface layer where dampening solution was removed by the patterning subsystem to thereby produce a latent image of said marking material; each marking material assembly further comprising a marking material source; wherein each marking material assembly further comprises a control mechanism for selectively engaging and disengaging each of said plurality of marking material assemblies with the reimageable surface layer of said imaging member so as to produce a multicomponent image.