Negative working photosensitive photoresist composition comprising: a) at least one polymer comprising a structure of the following formula: wherein R 1 -R 5 is independently H, F or CH 3, R 6 is selected from a group consisting of a substituted aryl, unsubstituted aryl, substituted heteroaryl group and substituted heteroaryl group, R 7 is a substituted or unsubstituted benzyl group, R 8 is a linear or branched C 2 -C 10 hydroxy alkyl group or a C 2 -C 10 hydroxy alkyl acrylate, and R 9 is an acid cleavable group chosen from a t-butyl group, a tetrahydropyran-2-yl group, a tetrahydrofuran-2-yl group, a 4-methoxytetrahydropyran-4-yl group, a 1-ethoxyethyl group, a 1-butoxyethyl group, a 1-propoxyethyl group, a 3-oxocyclohexyl group, a 2-methyl-2-adamantyl group, a 2-ethyl-2-adamantyl group, a 8-methyl-8-tricyclo[5.2.1.0 2,6]decyl group, a 1,2,7,7-tetramethyl-2-norbornyl group, a 2-acetoxymenthyl group, a 2-hydroxymethyl group, a 1-methyl-1-cyclohexylethyl group, a 4-methyl-2-oxotetrahydro-2H-pyran-4-yl group, a 2,3-dimethylbutan-2-yl group, a 2,3,3-trimethylbutan-2-yl group, a 1-methyl cyclopentyl group, a 1-ethyl cyclopentyl group, a 1-methyl cyclohexyl group, a 1-ethyl cyclohexyl group, a 1,2,3,3-tetra-methylbicyclo[2.2.1]heptan-2-yl group, a 2-ethyl-1,3,3-trimethyl-bicyclo[2.2.1]heptan-2-yl group, a 2,6,6-trimethylbicyclo[3.1.1]heptan-2-yl group, a 2,3-dimethylpentan-3-yl group, or a 3-ethyl-2-methylpentan-3-yl group, v = 10 - 40 mole%, w = 0 - 35 mole%, x = 0 - 60 mole%, y = 10 - 60 mole%, and where z is present and ranges up to 45 mole%; b) one or more free radical initiators activated by actinic radiation, c) one or more crosslinkable acrylated monomers capable of undergoing free radical crosslinking wherein the acrylate functionality is greater than 1, and d) a solvent. a) at least one polymer comprising a structure of the following formula: wherein R 1 -R 5 is independently H, F or CH 3, R 6 is selected from a group consisting of a substituted aryl, unsubstituted aryl, substituted heteroaryl group and substituted heteroaryl group, R 7 is a substituted or unsubstituted benzyl group, R 8 is a linear or branched C 2 -C 10 hydroxy alkyl group or a C 2 -C 10 hydroxy alkyl acrylate, and R 9 is an acid cleavable group chosen from a t-butyl group, a tetrahydropyran-2-yl group, a tetrahydrofuran-2-yl group, a 4-methoxytetrahydropyran-4-yl group, a 1-ethoxyethyl group, a 1-butoxyethyl group, a 1-propoxyethyl group, a 3-oxocyclohexyl group, a 2-methyl-2-adamantyl group, a 2-ethyl-2-adamantyl group, a 8-methyl-8-tricyclo[5.2.1.0 2,6]decyl group, a 1,2,7,7-tetramethyl-2-norbornyl group, a 2-acetoxymenthyl group, a 2-hydroxymethyl group, a 1-methyl-1-cyclohexylethyl group, a 4-methyl-2-oxotetrahydro-2H-pyran-4-yl group, a 2,3-dimethylbutan-2-yl group, a 2,3,3-trimethylbutan-2-yl group, a 1-methyl cyclopentyl group, a 1-ethyl cyclopentyl group, a 1-methyl cyclohexyl group, a 1-ethyl cyclohexyl group, a 1,2,3,3-tetra-methylbicyclo[2.2.1]heptan-2-yl group, a 2-ethyl-1,3,3-trimethyl-bicyclo[2.2.1]heptan-2-yl group, a 2,6,6-trimethylbicyclo[3.1.1]heptan-2-yl group, a 2,3-dimethylpentan-3-yl group, or a 3-ethyl-2-methylpentan-3-yl group, v = 10 - 40 mole%, w = 0 - 35 mole%, x = 0 - 60 mole%, y = 10 - 60 mole%, and where z is present and ranges up to 45 mole%; R 1 -R 5 is independently H, F or CH 3, R 6 is selected from a group consisting of a substituted aryl, unsubstituted aryl, substituted heteroaryl group and substituted heteroaryl group, R 7 is a substituted or unsubstituted benzyl group, R 8 is a linear or branched C 2 -C 10 hydroxy alkyl group or a C 2 -C 10 hydroxy alkyl acrylate, and R 9 is an acid cleavable group chosen from a t-butyl group, a tetrahydropyran-2-yl group, a tetrahydrofuran-2-yl group, a 4-methoxytetrahydropyran-4-yl group, a 1-ethoxyethyl group, a 1-butoxyethyl group, a 1-propoxyethyl group, a 3-oxocyclohexyl group, a 2-methyl-2-adamantyl group, a 2-ethyl-2-adamantyl group, a 8-methyl-8-tricyclo[5.2.1.0 2,6]decyl group, a 1,2,7,7-tetramethyl-2-norbornyl group, a 2-acetoxymenthyl group, a 2-hydroxymethyl group, a 1-methyl-1-cyclohexylethyl group, a 4-methyl-2-oxotetrahydro-2H-pyran-4-yl group, a 2,3-dimethylbutan-2-yl group, a 2,3,3-trimethylbutan-2-yl group, a 1-methyl cyclopentyl group, a 1-ethyl cyclopentyl group, a 1-methyl cyclohexyl group, a 1-ethyl cyclohexyl group, a 1,2,3,3-tetra-methylbicyclo[2.2.1]heptan-2-yl group, a 2-ethyl-1,3,3-trimethyl-bicyclo[2.2.1]heptan-2-yl group, a 2,6,6-trimethylbicyclo[3.1.1]heptan-2-yl group, a 2,3-dimethylpentan-3-yl group, or a 3-ethyl-2-methylpentan-3-yl group, v = 10 - 40 mole%, w = 0 - 35 mole%, x = 0 - 60 mole%, y = 10 - 60 mole%, and where z is present and ranges up to 45 mole%; b) one or more free radical initiators activated by actinic radiation, c) one or more crosslinkable acrylated monomers capable of undergoing free radical crosslinking wherein the acrylate functionality is greater than 1, and d) a solvent.