A hard surface treatment composition comprising: a) 0.0001 to 3% of amphoteric acrylic copolymer by weight of the composition; and b) 0.0001 to 3% of amphoteric modified polysaccharide by weight of the composition; wherein: (i) the weight ratio of the amphoteric acrylic copolymer to the amphoteric modified polysaccharide is from 0.75:1 to 3:1; (ii)the amphoteric acrylic copolymer is different from the amphoteric modified polysaccharide; (iii) the amphoteric acrylic copolymer comprises, as polymerized monomers, at least monomer (a) and monomer (b), wherein: monomer (a) is presented by formula of CH 2 =CR 1 -CO-NH-R 2 -N + R 3 R 4 R 5 X -, wherein: R 1 represents a hydrogen atom or a C 1 -C 4 alkyl radical, R 2 represents a linear or branched C 1 -C 12 alkylene radical, R 3, R 4, and R 5 independently represent a hydrogen atom, an C 1 -C 18 alkyl radical, and X - represents an anion selected from the group of halogens, sulfates, alkylsulfates, hydroxide, phosphate, acetate, or formate; and monomer (b) is an ethylenically unsaturated acids and/or salts thereof; and (iv) the amphoteric modified polysaccharide comprises units of monomer (a). a) 0.0001 to 3% of amphoteric acrylic copolymer by weight of the composition; and b) 0.0001 to 3% of amphoteric modified polysaccharide by weight of the composition; wherein: (i) the weight ratio of the amphoteric acrylic copolymer to the amphoteric modified polysaccharide is from 0.75:1 to 3:1; (ii)the amphoteric acrylic copolymer is different from the amphoteric modified polysaccharide; (iii) the amphoteric acrylic copolymer comprises, as polymerized monomers, at least monomer (a) and monomer (b), wherein: monomer (a) is presented by formula of CH 2 =CR 1 -CO-NH-R 2 -N + R 3 R 4 R 5 X -, wherein: R 1 represents a hydrogen atom or a C 1 -C 4 alkyl radical, R 2 represents a linear or branched C 1 -C 12 alkylene radical, R 3, R 4, and R 5 independently represent a hydrogen atom, an C 1 -C 18 alkyl radical, and X - represents an anion selected from the group of halogens, sulfates, alkylsulfates, hydroxide, phosphate, acetate, or formate; and monomer (b) is an ethylenically unsaturated acids and/or salts thereof; and (iv) the amphoteric modified polysaccharide comprises units of monomer (a). (i) the weight ratio of the amphoteric acrylic copolymer to the amphoteric modified polysaccharide is from 0.75:1 to 3:1; (ii)the amphoteric acrylic copolymer is different from the amphoteric modified polysaccharide; (iii) the amphoteric acrylic copolymer comprises, as polymerized monomers, at least monomer (a) and monomer (b), wherein: monomer (a) is presented by formula of CH 2 =CR 1 -CO-NH-R 2 -N + R 3 R 4 R 5 X -, wherein: R 1 represents a hydrogen atom or a C 1 -C 4 alkyl radical, R 2 represents a linear or branched C 1 -C 12 alkylene radical, R 3, R 4, and R 5 independently represent a hydrogen atom, an C 1 -C 18 alkyl radical, and X - represents an anion selected from the group of halogens, sulfates, alkylsulfates, hydroxide, phosphate, acetate, or formate; and monomer (b) is an ethylenically unsaturated acids and/or salts thereof; and monomer (a) is presented by formula of CH 2 =CR 1 -CO-NH-R 2 -N + R 3 R 4 R 5 X -, wherein: R 1 represents a hydrogen atom or a C 1 -C 4 alkyl radical, R 2 represents a linear or branched C 1 -C 12 alkylene radical, R 3, R 4, and R 5 independently represent a hydrogen atom, an C 1 -C 18 alkyl radical, and X - represents an anion selected from the group of halogens, sulfates, alkylsulfates, hydroxide, phosphate, acetate, or formate; and R 1 represents a hydrogen atom or a C 1 -C 4 alkyl radical, R 2 represents a linear or branched C 1 -C 12 alkylene radical, R 3, R 4, and R 5 independently represent a hydrogen atom, an C 1 -C 18 alkyl radical, and X - represents an anion selected from the group of halogens, sulfates, alkylsulfates, hydroxide, phosphate, acetate, or formate; and monomer (b) is an ethylenically unsaturated acids and/or salts thereof; and (iv) the amphoteric modified polysaccharide comprises units of monomer (a).