A method for manufacturing a film resonator, comprising: predetermining a filter structure with a plurality of film layers to be deposited and a mass loading layer to be deposited, predetermining a standard thickness range for each film layer to be deposited, predetermining a base frequency of the film resonator without the mass load layer and a target frequency of the film resonator with the mass load layer, predetermining a target frequency offset as the base frequency to the target frequency, the method further comprises: detecting a thickness of each film layer which has been deposited; when the detected thickness of any film layer which has been deposited is not in its standard thickness range, judging whether the mass loading layer has been deposited, and in a case that the mass loading layer has not been deposited, selecting for thickness compensation at least one film layer which has not been deposited from the plurality of film layers to be deposited; recalculating, in a model simulation of the filter structure, a compensated thickness of the selected at least one film layer which has not been deposited by substituting the target frequency and the thickness of the film layer which has been deposited into the model, wherein the compensated thickness is determined so that the target frequency is kept unchanged; calculating, in a model simulation of the filter structure, a new calculated thickness of the mass loading layer required for generating the target frequency offset by substituting the compensated thickness of the selected at least one film layer which has not been deposited and the target frequency offset into the model; and conducting subsequent film deposition so that the selected at least one film layer which has not been deposited is deposited with the compensated thickness and the mass loading layer is deposited with new calculated thickness of the mass loading layer. predetermining a filter structure with a plurality of film layers to be deposited and a mass loading layer to be deposited, predetermining a standard thickness range for each film layer to be deposited, predetermining a base frequency of the film resonator without the mass load layer and a target frequency of the film resonator with the mass load layer, predetermining a target frequency offset as the base frequency to the target frequency, the method further comprises: detecting a thickness of each film layer which has been deposited; when the detected thickness of any film layer which has been deposited is not in its standard thickness range, judging whether the mass loading layer has been deposited, and in a case that the mass loading layer has not been deposited, selecting for thickness compensation at least one film layer which has not been deposited from the plurality of film layers to be deposited; recalculating, in a model simulation of the filter structure, a compensated thickness of the selected at least one film layer which has not been deposited by substituting the target frequency and the thickness of the film layer which has been deposited into the model, wherein the compensated thickness is determined so that the target frequency is kept unchanged; calculating, in a model simulation of the filter structure, a new calculated thickness of the mass loading layer required for generating the target frequency offset by substituting the compensated thickness of the selected at least one film layer which has not been deposited and the target frequency offset into the model; and conducting subsequent film deposition so that the selected at least one film layer which has not been deposited is deposited with the compensated thickness and the mass loading layer is deposited with new calculated thickness of the mass loading layer. detecting a thickness of each film layer which has been deposited; when the detected thickness of any film layer which has been deposited is not in its standard thickness range, judging whether the mass loading layer has been deposited, and in a case that the mass loading layer has not been deposited, selecting for thickness compensation at least one film layer which has not been deposited from the plurality of film layers to be deposited; recalculating, in a model simulation of the filter structure, a compensated thickness of the selected at least one film layer which has not been deposited by substituting the target frequency and the thickness of the film layer which has been deposited into the model, wherein the compensated thickness is determined so that the target frequency is kept unchanged; calculating, in a model simulation of the filter structure, a new calculated thickness of the mass loading layer required for generating the target frequency offset by substituting the compensated thickness of the selected at least one film layer which has not been deposited and the target frequency offset into the model; and conducting subsequent film deposition so that the selected at least one film layer which has not been deposited is deposited with the compensated thickness and the mass loading layer is deposited with new calculated thickness of the mass loading layer.