A system for generating a plasma comprising: a first, circular electrode; a second, suspended electrode disposed in the center of the first, circular electrode; a first, current power supply for supplying power at the second, suspended electrode; a second, deflection field power supply for generating a magnetic field; a ring magnet connected to said second deflection field power supply; wherein said first, circular electrode and said second, suspended electrode are disposed within said ring magnet; a initiator circuit between the first and the second electrode; a voltage power supply connected to the initiator circuit; a sequencer for coordinating a discharge of power from the first, current power supply, a discharge of power from the initiator circuit and a discharge of power from the second deflection field power supply, an impedance matching circuit connected between the first, current power supply and the second, suspended electrode; wherein the first, current power supply and the initiator circuit are configured to provide sufficient power to cause a discharge of power so as to generate a plasma between said first circular electrode and said second suspended electrode, the current sufficient to exceed a pinch effect threshold, wherein the second deflection field power supply is configured such that the magnetic field generated by the discharge of power from said second deflection field power supply rotates the plasma; and wherein, after the plasma has been established, the first, current power supply is configured to continue to supply power to the second, suspended electrode at lower voltage levels, the plasma creating a low resistance discharge path between the first and second electrode; and wherein the impedance matching circuit is configured to facilitate the coincidence of population inversion and ionic saturation of the plasma with saturation of the magnetic field and alignment of the flux generated by the deflection field power supply and the ring magnet. a first, circular electrode; a second, suspended electrode disposed in the center of the first, circular electrode; a first, current power supply for supplying power at the second, suspended electrode; a second, deflection field power supply for generating a magnetic field; a ring magnet connected to said second deflection field power supply; wherein said first, circular electrode and said second, suspended electrode are disposed within said ring magnet; a initiator circuit between the first and the second electrode; a voltage power supply connected to the initiator circuit; a sequencer for coordinating a discharge of power from the first, current power supply, a discharge of power from the initiator circuit and a discharge of power from the second deflection field power supply, an impedance matching circuit connected between the first, current power supply and the second, suspended electrode; wherein the first, current power supply and the initiator circuit are configured to provide sufficient power to cause a discharge of power so as to generate a plasma between said first circular electrode and said second suspended electrode, the current sufficient to exceed a pinch effect threshold, wherein the second deflection field power supply is configured such that the magnetic field generated by the discharge of power from said second deflection field power supply rotates the plasma; and wherein, after the plasma has been established, the first, current power supply is configured to continue to supply power to the second, suspended electrode at lower voltage levels, the plasma creating a low resistance discharge path between the first and second electrode; and wherein the impedance matching circuit is configured to facilitate the coincidence of population inversion and ionic saturation of the plasma with saturation of the magnetic field and alignment of the flux generated by the deflection field power supply and the ring magnet.