Method for offsetting a non-punctiform imaging field in an object plane, which imaging field is imaged by at least one pair of imaging beam paths (2a, 2b, 2c, 2d) of an imaging system of a microscopy system, wherein the at least one pair of imaging beam paths (2a, 2b, 2c, 2d) includes a stereo angle (□) in the object plane, wherein the microscopy system has an offset apparatus with a first mirror face, arranged along the at least one pair of imaging beam paths, for deflecting the at least one pair of imaging beam paths (2a, 2b, 2c, 2d), which first mirror face is swivelable; wherein the method comprises the following: acquiring an offset of the imaging field to be brought about in the case of a stationary imaging system from a first position in the object plane to a second position, different from the first position, in the object plane; and swivelling the first mirror face in a manner dependent on the acquired offset to be brought about in order thus to offset the imaging field of the imaging system in a first direction in the object plane; wherein the offset apparatus furthermore has a second mirror face, arranged along the at least one pair of imaging beam paths (2a, 2b, 2c, 2d), for deflecting the at least one pair of imaging beam paths (2a, 2b, 2c, 2d), wherein the second mirror face is swivelable, and wherein the first mirror face is swivelable about a first swivel axis and the second mirror face is swivelable about a second swivel axis, wherein the second swivel axis differs from the first swivel axis and wherein the first swivel axis includes an angle of substantially 90° with a first deflection plane, which is spanned by an optical axis (K; K*), incident on the first mirror face and reflected by the first mirror face, of an imaging beam path of the at least one pair of imaging beam paths (2a, 2b, 2c, 2d) and wherein the second swivel axis includes an angle of substantially 90° with a second deflection plane, which is spanned by the optical axis (K; K*), incident on the second mirror face and reflected by the second mirror face, of an imaging beam path of the at least one pair of imaging beam paths (2a, 2b, 2c, 2d), and wherein the second swivel axis is arranged substantially parallel to the first deflection plane; and the method furthermore comprises: swivelling the second mirror face in a manner dependent on the acquired offset to be brought about in order thus to offset the imaging field of the imaging system in a second direction, different from the first direction, in the object plane. acquiring an offset of the imaging field to be brought about in the case of a stationary imaging system from a first position in the object plane to a second position, different from the first position, in the object plane; and swivelling the first mirror face in a manner dependent on the acquired offset to be brought about in order thus to offset the imaging field of the imaging system in a first direction in the object plane; wherein the offset apparatus furthermore has a second mirror face, arranged along the at least one pair of imaging beam paths (2a, 2b, 2c, 2d), for deflecting the at least one pair of imaging beam paths (2a, 2b, 2c, 2d), wherein the second mirror face is swivelable, and wherein the first mirror face is swivelable about a first swivel axis and the second mirror face is swivelable about a second swivel axis, wherein the second swivel axis differs from the first swivel axis and wherein the first swivel axis includes an angle of substantially 90° with a first deflection plane, which is spanned by an optical axis (K; K*), incident on the first mirror face and reflected by the first mirror face, of an imaging beam path of the at least one pair of imaging beam paths (2a, 2b, 2c, 2d) and wherein the second swivel axis includes an angle of substantially 90° with a second deflection plane, which is spanned by the optical axis (K; K*), incident on the second mirror face and reflected by the second mirror face, of an imaging beam path of the at least one pair of imaging beam paths (2a, 2b, 2c, 2d), and wherein the second swivel axis is arranged substantially parallel to the first deflection plane; and the method furthermore comprises: swivelling the second mirror face in a manner dependent on the acquired offset to be brought about in order thus to offset the imaging field of the imaging system in a second direction, different from the first direction, in the object plane. swivelling the second mirror face in a manner dependent on the acquired offset to be brought about in order thus to offset the imaging field of the imaging system in a second direction, different from the first direction, in the object plane.