Infrared device, comprising a substrate, a recess in the substrate, a membrane spanning at least a portion of the recess, and supported by the substrate: a configuration for one of selectively emitting and selectively absorbing infrared radiation of a band, the configuration being arranged on or in the membrane and comprising: a pattern made from an electrically conducting material on a first level, the pattern comprising a set of at least two electrically conducting first elements separated by gaps; an electrically conducting film on a second level; a first dielectric layer between the pattern and the film; a second dielectric layer; and a further layer, in which one or more of: a heater is arranged for heating the configuration to emit the infrared radiation of the band; and a thermal sensor is arranged for sensing the selective infrared radiation of the band absorbed by the configuration, the second dielectric layer extending between the electrically conducting film on the second level and said further layer, wherein the heater if available, and / or the thermal sensor if available are / is arranged on or in the membrane, characterized in that: the film at least extends over an area of the second level that is defined by a projection of the pattern and gaps in the pattern onto the second level, and a thickness of the first dielectric layer between the pattern and the film is less than a center wavelength of the band, so that magnetic polariton resonance is generated and exploited as a dominant effect. a substrate, a recess in the substrate, a membrane spanning at least a portion of the recess, and supported by the substrate: a configuration for one of selectively emitting and selectively absorbing infrared radiation of a band, the configuration being arranged on or in the membrane and comprising: a pattern made from an electrically conducting material on a first level, the pattern comprising a set of at least two electrically conducting first elements separated by gaps; an electrically conducting film on a second level; a first dielectric layer between the pattern and the film; a second dielectric layer; and a further layer, in which one or more of: a heater is arranged for heating the configuration to emit the infrared radiation of the band; and a thermal sensor is arranged for sensing the selective infrared radiation of the band absorbed by the configuration, the second dielectric layer extending between the electrically conducting film on the second level and said further layer, a configuration for one of selectively emitting and selectively absorbing infrared radiation of a band, the configuration being arranged on or in the membrane and comprising: a pattern made from an electrically conducting material on a first level, the pattern comprising a set of at least two electrically conducting first elements separated by gaps; an electrically conducting film on a second level; a first dielectric layer between the pattern and the film; a second dielectric layer; and a further layer, in which one or more of: a heater is arranged for heating the configuration to emit the infrared radiation of the band; and a thermal sensor is arranged for sensing the selective infrared radiation of the band absorbed by the configuration, the second dielectric layer extending between the electrically conducting film on the second level and said further layer, wherein the heater if available, and / or the thermal sensor if available are / is arranged on or in the membrane, characterized in that: the film at least extends over an area of the second level that is defined by a projection of the pattern and gaps in the pattern onto the second level, and a thickness of the first dielectric layer between the pattern and the film is less than a center wavelength of the band, so that magnetic polariton resonance is generated and exploited as a dominant effect. the heater if available, and / or the thermal sensor if available are / is arranged on or in the membrane, characterized in that: the film at least extends over an area of the second level that is defined by a projection of the pattern and gaps in the pattern onto the second level, and a thickness of the first dielectric layer between the pattern and the film is less than a center wavelength of the band, so that magnetic polariton resonance is generated and exploited as a dominant effect.