A measurement system, which is configured to obtain an own measurement result of the measurement system through use of a different system's measurement result obtained by a different measurement system, the measurement system comprising: an output data acquisition unit configured to acquire output data including the different system's measurement result, which has been obtained by the different measurement system; a display unit configured to display the acquired output data comprising the different system's measurement result; a designated position acquisition unit configured to acquire a position designated by a user, at which the different system's measurement result is represented within the displayed output data, as a designated position, wherein the acquired output data is displayed in the form of a data matrix and the designated position is indicated by the coordinate of the matrix field at which the different system's measurement result is represented; a different system's measurement result acquisition unit configured to acquire the different system's measurement result at the designated position, which is included in the output data acquired by the output data acquisition unit; a measurement result acquisition unit configured to acquire the own measurement result through use of the acquired different system's measurement result, wherein the different system's measurement result is used by the measurement system for calculating the own measurement result; and a position data storage unit configured to store position data indicating the designated position, wherein the different system's measurement result acquisition unit is configured to acquire, when the position data is already stored in the position data storage unit in a case where the output data acquisition unit acquires different output data obtained by the different measurement system, the different system's measurement result included at the designated position indicated by the position data, wherein the measurement system is an X-ray fluorescence spectrometer configured to analyze a sample based on fluorescent X-rays generated by irradiating a surface of the sample with primary X-rays, and wherein the sample is a substrate having a surface on which a thin film is formed, and the acquired different system's measurement result is a film thickness or a density of the thin film or a concentration of an element contained in the thin film, which has been measured by the different measurement system. an output data acquisition unit configured to acquire output data including the different system's measurement result, which has been obtained by the different measurement system; a display unit configured to display the acquired output data comprising the different system's measurement result; a designated position acquisition unit configured to acquire a position designated by a user, at which the different system's measurement result is represented within the displayed output data, as a designated position, wherein the acquired output data is displayed in the form of a data matrix and the designated position is indicated by the coordinate of the matrix field at which the different system's measurement result is represented; a different system's measurement result acquisition unit configured to acquire the different system's measurement result at the designated position, which is included in the output data acquired by the output data acquisition unit; a measurement result acquisition unit configured to acquire the own measurement result through use of the acquired different system's measurement result, wherein the different system's measurement result is used by the measurement system for calculating the own measurement result; and a position data storage unit configured to store position data indicating the designated position, wherein the different system's measurement result acquisition unit is configured to acquire, when the position data is already stored in the position data storage unit in a case where the output data acquisition unit acquires different output data obtained by the different measurement system, the different system's measurement result included at the designated position indicated by the position data, wherein the measurement system is an X-ray fluorescence spectrometer configured to analyze a sample based on fluorescent X-rays generated by irradiating a surface of the sample with primary X-rays, and wherein the sample is a substrate having a surface on which a thin film is formed, and the acquired different system's measurement result is a film thickness or a density of the thin film or a concentration of an element contained in the thin film, which has been measured by the different measurement system.