A Method for automatically calibrating a device for generatively producing a three-dimensional object, wherein the device comprises the following: a build area, in which the object is to be constructed layer by layer by selective solidification of a pulverulent material, an irradiation device for emitting electromagnetic radiation (20, 21) onto selective areas of the applied layer of the material, wherein the irradiation device comprises at least a first and a second scanner (14, 15), and the first scanner irradiates a first scan field in the build area, and the second scanner irradiates a second scan field in the build area; and a control unit for controlling the device, with the steps: irradiating an applied layer of the material or a target by means of the first scanner in order to produce a first test pattern in the material or the target; irradiating the applied layer of the material or the target by means of the second scanner in order to produce a second test pattern in the material or the target; detecting the first and second test patterns (33, 34) by means of a camera and assigning the first and second test patterns (33, 34) to the first and second scanners (14, 15), respectively; characterized by the following steps: comparing the first and second test patterns (33, 34) with one another; determining a relative deviation between the first test pattern and the second test pattern; calibrating the first and/or the second scanner (14, 15) in such a way that the relative deviation between the first test pattern and the second test pattern falls below a setpoint value. a build area, in which the object is to be constructed layer by layer by selective solidification of a pulverulent material, an irradiation device for emitting electromagnetic radiation (20, 21) onto selective areas of the applied layer of the material, wherein the irradiation device comprises at least a first and a second scanner (14, 15), and the first scanner irradiates a first scan field in the build area, and the second scanner irradiates a second scan field in the build area; and a control unit for controlling the device, with the steps: irradiating an applied layer of the material or a target by means of the first scanner in order to produce a first test pattern in the material or the target; irradiating the applied layer of the material or the target by means of the second scanner in order to produce a second test pattern in the material or the target; detecting the first and second test patterns (33, 34) by means of a camera and assigning the first and second test patterns (33, 34) to the first and second scanners (14, 15), respectively; characterized by the following steps: comparing the first and second test patterns (33, 34) with one another; determining a relative deviation between the first test pattern and the second test pattern; calibrating the first and/or the second scanner (14, 15) in such a way that the relative deviation between the first test pattern and the second test pattern falls below a setpoint value. irradiating an applied layer of the material or a target by means of the first scanner in order to produce a first test pattern in the material or the target; irradiating the applied layer of the material or the target by means of the second scanner in order to produce a second test pattern in the material or the target; detecting the first and second test patterns (33, 34) by means of a camera and assigning the first and second test patterns (33, 34) to the first and second scanners (14, 15), respectively; characterized by the following steps: comparing the first and second test patterns (33, 34) with one another; determining a relative deviation between the first test pattern and the second test pattern; calibrating the first and/or the second scanner (14, 15) in such a way that the relative deviation between the first test pattern and the second test pattern falls below a setpoint value. comparing the first and second test patterns (33, 34) with one another; determining a relative deviation between the first test pattern and the second test pattern; calibrating the first and/or the second scanner (14, 15) in such a way that the relative deviation between the first test pattern and the second test pattern falls below a setpoint value.