A method for producing a ferroelectric thin film made of PZT comprising: coating a composition for forming a ferroelectric thin film on a base electrode of a substrate having a substrate body and the base electrode that has crystal faces oriented in the direction, performing calcination of the coated composition, and subsequently performing firing of the coated composition to crystallize the coated composition, and thereby forming a ferroelectric thin film made of PZT on the base electrode, the ferroelectric thin film made of PZT includes an orientation controlling layer and a thickness adjusting layer, an amount of the composition for forming a ferroelectric thin film coated on the base electrode is controlled such that a thickness of the orientation controlling layer after crystallization is in a range of 35 nm to 150 nm, and the preferred orientation of crystals of the orientation controlling layer and the thickness adjusting layer is controlled in the plane, characterized in that the method includes: performing the formation of the orientation controlling layer by a process including coating the composition for forming a ferroelectric thin film containing a Pb compound, a Zr compound, and a Ti compound on the base electrode, performing calcination of the coated composition at a temperature in a range of 150°C to 200°C or in a range of 285°C to 315°C, and then performing firing of the coated composition; and after forming the orientation controlling layer, forming the thickness adjusting layer by coating the composition for forming a ferroelectric thin film on the orientation controlling layer, performing calcination of the coated composition at a temperature in a range of 200°C to 450°C, and then performing firing of the coated composition. coating a composition for forming a ferroelectric thin film on a base electrode of a substrate having a substrate body and the base electrode that has crystal faces oriented in the direction, performing calcination of the coated composition, and subsequently performing firing of the coated composition to crystallize the coated composition, and thereby forming a ferroelectric thin film made of PZT on the base electrode, the ferroelectric thin film made of PZT includes an orientation controlling layer and a thickness adjusting layer, an amount of the composition for forming a ferroelectric thin film coated on the base electrode is controlled such that a thickness of the orientation controlling layer after crystallization is in a range of 35 nm to 150 nm, and the preferred orientation of crystals of the orientation controlling layer and the thickness adjusting layer is controlled in the plane, characterized in that the method includes: performing the formation of the orientation controlling layer by a process including coating the composition for forming a ferroelectric thin film containing a Pb compound, a Zr compound, and a Ti compound on the base electrode, performing calcination of the coated composition at a temperature in a range of 150°C to 200°C or in a range of 285°C to 315°C, and then performing firing of the coated composition; and after forming the orientation controlling layer, forming the thickness adjusting layer by coating the composition for forming a ferroelectric thin film on the orientation controlling layer, performing calcination of the coated composition at a temperature in a range of 200°C to 450°C, and then performing firing of the coated composition. performing the formation of the orientation controlling layer by a process including coating the composition for forming a ferroelectric thin film containing a Pb compound, a Zr compound, and a Ti compound on the base electrode, performing calcination of the coated composition at a temperature in a range of 150°C to 200°C or in a range of 285°C to 315°C, and then performing firing of the coated composition; and after forming the orientation controlling layer, forming the thickness adjusting layer by coating the composition for forming a ferroelectric thin film on the orientation controlling layer, performing calcination of the coated composition at a temperature in a range of 200°C to 450°C, and then performing firing of the coated composition.