A system for photoaltering a material, the system comprising: a laser source operable to produce a primary pulsed beam; a holographic optical element configured to receive the primary pulsed beam and transmit a plurality of secondary beams (44, 46), the plurality of secondary beams (44, 46) based on the primary pulsed beam; and a scanner operable to direct the plurality of secondary beams (44, 46) to the material, wherein the primary pulsed beam has a first intensity (I 0), wherein the holographic optical element is further configured to transmit a first secondary beam and a second secondary beam, the first secondary beam having a second intensity (I 1), the second secondary beam having a third intensity (I 2), and wherein a sum of the second (I 1) and third (I 2) intensities is greater than about 80% of the first intensity (I 0), characterized in that the holographic optical element comprises: a first phase grating having a first surface and a second surface, the second surface of the first phase grating opposing the first surface of the first phase grating, the first surface of the first phase grating configured to receive the primary pulsed beam; and a second phase grating having a first surface and a second surface, the second surface of the second phase grating opposing the first surface of the second phase grating, the first surface of the second phase grating adjacent to the second surface of the first phase grating, wherein the first phase grating and the second phase grating maybe positioned with respect to one another and the second surface of the second phase grating configured to: transmit about 100% of the plurality of secondary beams (44, 46) when the first phase grating and the second phase grating are positioned in a first alignment; transmit about 0% of the plurality of secondary beams (44, 46) when the first phase grating and the second phase grating are positioned in a second alignment; and transmit a variable portion of each of the plurality of secondary beams (44, 46) when the first phase grating and the second phase grating are positioned between the first alignment and the second alignment. a laser source operable to produce a primary pulsed beam; a holographic optical element configured to receive the primary pulsed beam and transmit a plurality of secondary beams (44, 46), the plurality of secondary beams (44, 46) based on the primary pulsed beam; and a scanner operable to direct the plurality of secondary beams (44, 46) to the material, wherein the primary pulsed beam has a first intensity (I 0), wherein the holographic optical element is further configured to transmit a first secondary beam and a second secondary beam, the first secondary beam having a second intensity (I 1), the second secondary beam having a third intensity (I 2), and wherein a sum of the second (I 1) and third (I 2) intensities is greater than about 80% of the first intensity (I 0), characterized in that the holographic optical element comprises: a first phase grating having a first surface and a second surface, the second surface of the first phase grating opposing the first surface of the first phase grating, the first surface of the first phase grating configured to receive the primary pulsed beam; and a second phase grating having a first surface and a second surface, the second surface of the second phase grating opposing the first surface of the second phase grating, the first surface of the second phase grating adjacent to the second surface of the first phase grating, wherein the first phase grating and the second phase grating maybe positioned with respect to one another and the second surface of the second phase grating configured to: a first phase grating having a first surface and a second surface, the second surface of the first phase grating opposing the first surface of the first phase grating, the first surface of the first phase grating configured to receive the primary pulsed beam; and a second phase grating having a first surface and a second surface, the second surface of the second phase grating opposing the first surface of the second phase grating, the first surface of the second phase grating adjacent to the second surface of the first phase grating, wherein the first phase grating and the second phase grating maybe positioned with respect to one another and the second surface of the second phase grating configured to: transmit about 100% of the plurality of secondary beams (44, 46) when the first phase grating and the second phase grating are positioned in a first alignment; transmit about 0% of the plurality of secondary beams (44, 46) when the first phase grating and the second phase grating are positioned in a second alignment; and transmit a variable portion of each of the plurality of secondary beams (44, 46) when the first phase grating and the second phase grating are positioned between the first alignment and the second alignment.