Method for compensating pattern placement errors during writing a pattern on a target in a charged-particle multi-beam exposure apparatus, wherein a layout is generated by exposing a plurality of beam field frames using a beam of electrically charged particles, wherein said beam field frames represent two-dimensional arrangements of pixels on the target and are written in a given time sequence, wherein each beam field frame has a nominal position on the target, and in each beam field frame each pixel has a relative nominal position and an exposure value, wherein for each beam field frame a local pattern density value is defined as the average of the exposure values of the pixels in the respective beam field frame, the local pattern density values defining exposure doses imparted to the target when exposing the respective beam field frames, thus causing a local pattern density evolution as a function of time by virtue of the time sequence of the beam field frames, wherein during writing the beam field frames on the target, the actual positions thereof deviate from their respective nominal positions by a placement error as a result of build-up effects within said exposure apparatus, said placement error depending on the local pattern density evolution during the respective times of writing the beam field frames, said method comprising the steps of: - establishing parameters of a predetermined displacement behavior model for describing a predicted value of the placement error as a function of local pattern density and time, - providing the sequence of beam field frames and defining times of writing of said beam field frames, - determining the local pattern density evolution relating to said sequence of beam field frames and pertinent writing times, - predicting values of the placement error for the beam field frames based on the local pattern density evolution and said displacement behavior model, - repositioning, for each of the beam field frames and using the respective predicted value of the placement error for the respective beam field frame, the position of the respective beam field frame for compensating the placement error. wherein in the step of determining the local pattern density evolution, a sequence of subsequent time intervals is defined, each time interval containing the times of writing of a plurality of beam field frames, and for each of said time intervals a representative local pattern density is determined from the respective plurality of beam field frames contained in the respective time interval. - establishing parameters of a predetermined displacement behavior model for describing a predicted value of the placement error as a function of local pattern density and time, - providing the sequence of beam field frames and defining times of writing of said beam field frames, - determining the local pattern density evolution relating to said sequence of beam field frames and pertinent writing times, - predicting values of the placement error for the beam field frames based on the local pattern density evolution and said displacement behavior model, - repositioning, for each of the beam field frames and using the respective predicted value of the placement error for the respective beam field frame, the position of the respective beam field frame for compensating the placement error.