A substrate cleaning apparatus comprising: a substrate support mechanism configured to support a substrate; a roll-type first cleaning member configured to clean a first surface of the substrate by rotating while being in contact with a bevel and/or an edge of the first surface of the substrate, a roll-type second cleaning member facing the first cleaning member and configured to clean a second surface of the substrate by rotating while being in contact with a bevel or an edge of the second surface of the substrate, and a rotation axis of the first cleaning member is in parallel with a substrate support plane of the substrate support mechanism, a rotation axis of the second clean ing member is in parallel with a substrate support plane of the substrate support mechanism, and the first and the second cleaning members (2a, 2b) each comprise a plurality of large diameter portions (21a, 21b) and a plurality of small diameter portions (22a, 22b), the large diameter portions (21a, 21b) and the small diameter portions (22a, 22b) being alternately arranged along a longitudinal direction of the respective cleaning member (2a, 2b), thereby forming a plurality of grooves (23a, 23b) in a circumferential direction, each groove (23a, 23b) being separated from adjacent grooves (23a, 23b) by the large diameter portions (21a, 21b), and the small diameter portions of the second cleaning member are located facing the large diameter portions of the first cleaning member, the large diameter portions of the second cleaning member are located facing the small diameter portions of the first cleaning member, characterized in that the large diameter portions of the roll type cleaning member and the small diameter portions of the roll type cleaning member are engaged with each other, and the small diameter portions of the roll type cleaning member and the large diameter portions of the roll type cleaning member are engaged with each other, such that the first cleaning member and the second cleaning member can rotate without being in contact with each other, and in that the apparatus further comprises an actuator configured to swing the first and second cleaning members (2a, 2b) in a horizontal and/or a vertical direction of the substrate when the substrate is cleaned. a substrate support mechanism configured to support a substrate; a roll-type first cleaning member configured to clean a first surface of the substrate by rotating while being in contact with a bevel and/or an edge of the first surface of the substrate, a roll-type second cleaning member facing the first cleaning member and configured to clean a second surface of the substrate by rotating while being in contact with a bevel or an edge of the second surface of the substrate, and a rotation axis of the first cleaning member is in parallel with a substrate support plane of the substrate support mechanism, a rotation axis of the second clean ing member is in parallel with a substrate support plane of the substrate support mechanism, and the first and the second cleaning members (2a, 2b) each comprise a plurality of large diameter portions (21a, 21b) and a plurality of small diameter portions (22a, 22b), the large diameter portions (21a, 21b) and the small diameter portions (22a, 22b) being alternately arranged along a longitudinal direction of the respective cleaning member (2a, 2b), thereby forming a plurality of grooves (23a, 23b) in a circumferential direction, each groove (23a, 23b) being separated from adjacent grooves (23a, 23b) by the large diameter portions (21a, 21b), and the small diameter portions of the second cleaning member are located facing the large diameter portions of the first cleaning member, the large diameter portions of the second cleaning member are located facing the small diameter portions of the first cleaning member, characterized in that the large diameter portions of the roll type cleaning member and the small diameter portions of the roll type cleaning member are engaged with each other, and the small diameter portions of the roll type cleaning member and the large diameter portions of the roll type cleaning member are engaged with each other, such that the first cleaning member and the second cleaning member can rotate without being in contact with each other, and in that the apparatus further comprises an actuator configured to swing the first and second cleaning members (2a, 2b) in a horizontal and/or a vertical direction of the substrate when the substrate is cleaned.