mhurhangee/ep-ind-claims huggingface dataset:
An electronic device (101, 200, 300) including a flexible display (250, 350), comprising: a housing including a first surface, a second surface facing in a direction opposite to the first surface, a first side surface surrounding at least part of a space between the first surface and the second surface, and a second side surface facing in a direction opposite to the first side surface, wherein a part of the housing is configured to perform a slide-in operation and a slide-out operation with respect to the housing, wherein the housing is configured such that, when the part of the housing slides, a distance between the first side surface and the second side surface varies; and a flexible display (250, 350) including a first portion visible to an outside through at least one surface of the housing and a second portion extending from the first portion, wherein as at least a part of the second portion is visible to the outside through the at least one surface of the housing based on the part of the housing performing the slide-out operation, the first portion is extendable, wherein the second portion of the flexible display (250, 350) includes a dummy area invisible to the outside independent on the housing performing a slide-in operation or a slide-out operation, in which a strain gauge is wired as a resistance measurement sensor, and wherein the electronic device (101, 200, 300) is further comprising a structure (345, 346) configured to change resistance on the dummy area based on a sliding movement of the part of the housing. a housing including a first surface, a second surface facing in a direction opposite to the first surface, a first side surface surrounding at least part of a space between the first surface and the second surface, and a second side surface facing in a direction opposite to the first side surface, wherein a part of the housing is configured to perform a slide-in operation and a slide-out operation with respect to the housing, wherein the housing is configured such that, when the part of the housing slides, a distance between the first side surface and the second side surface varies; and a flexible display (250, 350) including a first portion visible to an outside through at least one surface of the housing and a second portion extending from the first portion, wherein as at least a part of the second portion is visible to the outside through the at least one surface of the housing based on the part of the housing performing the slide-out operation, the first portion is extendable, wherein the second portion of the flexible display (250, 350) includes a dummy area invisible to the outside independent on the housing performing a slide-in operation or a slide-out operation, in which a strain gauge is wired as a resistance measurement sensor, and wherein the electronic device (101, 200, 300) is further comprising a structure (345, 346) configured to change resistance on the dummy area based on a sliding movement of the part of the housing.
Aircraft comprising a floor comprising several beams parallel to each other and perpendicular to a longitudinal direction, several rails parallel to each other and to the longitudinal direction, at least one fixed floor part and at least one movable floor part that is movable relative to the fixed floor part, having at least one longitudinal edge (46.1, 46.2) parallel to the longitudinal direction; the aircraft comprising a load-bearing structure supporting the floor; the aircraft being such that at least two of said beams each comprise a first beam portion (48.1) secured to a first element chosen from the fixed floor part and the movable floor part and a second beam portion (48.2) secured to a second element, chosen from the fixed floor part and the movable floor part, different from the first element, the first and second beam portions (48.1, 48.2) being aligned, positioned end to end and separated at a cutting plane positioned approximately in line with the longitudinal edge (46.1, 46.2), such that at least one of said rails comprises at least one first rail portion (50.1) secured to the movable floor part and at least one second rail portion (50.2) secured to the fixed floor part of the floor, extending said first rail portion (50.1), and such that the floor comprises at least one hinge connecting the movable floor part and the fixed floor part and having a pivot axis parallel to the longitudinal direction, said hinge comprising, for at least said two beams, a pivot link which connects the first and second beam portions (48.1, 48.2), the beams of the floor resting on the load-bearing structure in the region of each movable floor part, the beams of the floor being fastened to the load-bearing structure in the region of each fixed floor part.
A method of filling a container with liquid compositions, comprising the step of: providing a container that has an opening, wherein the total volume of said container ranges from 10 ml to 10 liters; providing a first liquid feed composition and a second liquid feed composition that is different from said first liquid feed composition; partially filling said container with the first liquid feed composition to from 0.01% to 40% of the total volume of said container, wherein the first liquid feed composition comprises one or more perfumes, colorants, opacifiers, pearlescent aids, enzymes, brighteners, bleaches, bleach activators, catalysts, chelants, polymers; and subsequently, filling the remaining volume of the container, or a portion thereof, with the second liquid feed composition, wherein at least 80% of the total volume of said container is filled with said second liquid feed composition, wherein the second liquid feed composition comprises one or more surfactants, solvents, builders, structurants, and/or combinations thereof, wherein the second liquid feed composition is filled through the top opening into said container by one or more liquid nozzles, wherein said one or more liquid nozzles are arranged to generate one or more liquid flows characterized by a dynamic flow profile, which comprises an increasing flow rate at the beginning of step and/or a decreasing flow rate at the end of step in combination with a peak flow rate in the middle of step. providing a container that has an opening, wherein the total volume of said container ranges from 10 ml to 10 liters; providing a first liquid feed composition and a second liquid feed composition that is different from said first liquid feed composition; partially filling said container with the first liquid feed composition to from 0.01% to 40% of the total volume of said container, wherein the first liquid feed composition comprises one or more perfumes, colorants, opacifiers, pearlescent aids, enzymes, brighteners, bleaches, bleach activators, catalysts, chelants, polymers; and subsequently, filling the remaining volume of the container, or a portion thereof, with the second liquid feed composition, wherein at least 80% of the total volume of said container is filled with said second liquid feed composition, wherein the second liquid feed composition comprises one or more surfactants, solvents, builders, structurants, and/or combinations thereof,
A combine harvester having a cleaning device including at least one sieve (14, 24, 24') through which air flows and which in a sieve frame has a plurality of rows of slats mounted pivotably on axes of rotation for adjusting the sieve opening width of the sieve (14, 24, 24'), which are actuable by an adjusting device,wherein the at least one sieve (14, 24, 24') has at least two successively arranged portions (I, II, III) with rows of slats mounted therein and actuable jointly by the adjusting device and wherein at least in two adjacent portions (I, II; I, III) upon actuation of the adjusting device for adjusting the sieve opening width with the same slat size different opening angles (A, B, C) are set with respect to a horizontal sieve plane embraced by the sieve frame, characterised in that the rows of slats in the respectively preceding portion (I, II) have a greater opening angle (A, B, C) than in the following portion (II, III).
A method of processing a substrate, comprising: forming a metal and silicon layer on a substrate, comprising: flowing a first sputtering gas into a first processing volume, wherein the first processing volume is a processing volume of a first processing chamber; applying a power to a first target disposed in the first processing volume, wherein the first target comprises a metal-silicon alloy and a sputtering surface thereof is angled with respect to a surface of a substrate at between 10° and 50°; forming a first plasma in a region proximate to the sputtering surface of the first target; and depositing the metal and silicon layer on the surface of the substrate, annealing the metal and silicon layer in a second processing volume, wherein the second processing volume is a processing volume of a second processing chamber, and wherein annealing the metal and silicon layer comprises: pressurizing the second processing volume to a pressure of more than 1 times atmospheric pressure using a pressurized gas delivered thereinto; heating the substrate to an anneal temperature of not more than 400 °C; and maintaining the substrate at the anneal temperature for 30 seconds or more. flowing a first sputtering gas into a first processing volume, wherein the first processing volume is a processing volume of a first processing chamber; applying a power to a first target disposed in the first processing volume, wherein the first target comprises a metal-silicon alloy and a sputtering surface thereof is angled with respect to a surface of a substrate at between 10° and 50°; forming a first plasma in a region proximate to the sputtering surface of the first target; and depositing the metal and silicon layer on the surface of the substrate, annealing the metal and silicon layer in a second processing volume, wherein the second processing volume is a processing volume of a second processing chamber, and wherein annealing the metal and silicon layer comprises: pressurizing the second processing volume to a pressure of more than 1 times atmospheric pressure using a pressurized gas delivered thereinto; heating the substrate to an anneal temperature of not more than 400 °C; and maintaining the substrate at the anneal temperature for 30 seconds or more. pressurizing the second processing volume to a pressure of more than 1 times atmospheric pressure using a pressurized gas delivered thereinto; heating the substrate to an anneal temperature of not more than 400 °C; and maintaining the substrate at the anneal temperature for 30 seconds or more.
A bispecific antibody comprising at least one anti-TNF-a antibody or antigen-binding fragment thereof and at least one anti-IL-6 antibody or antigen-binding fragment thereof, wherein the bispecific antibody comprises a chimeric or humanized anti-TNF-a IgG antibody and four chimeric or humanized antigen-binding fragments of the anti-IL-6 antibody, wherein the anti-IL-6 antibody or fragment thereof comprises the heavy chain CDR sequences CDR1 (GFTFSRFGMH, SEQ ID NO:107), CDR2 (YIGRGSSTIYYADTVKG, SEQ ID NO:108) and CDR3 (SNWDGAMDY, SEQ ID NO:109) and the light chain CDR sequences CDR1 (RASGNIHNFLA, SEQ ID NO:110), CDR2 (NAETLAD, SEQ ID NO:111) and CDR3 (QHFWSTPWT, SEQ ID NO:112) and the anti-TNF-a antibody or fragment thereof comprises the heavy chain CDR sequences CDR1 (GFWN, SEQ ID NO:113), CDR2 (YISYSGRTYYNPSLKS, SEQ ID NO:114) and CDR3 (DANYVLDY, SEQ ID NO:115) and the light chain CDR sequences CDR1 (KSSQSLLNSSTQKNYLA, SEQ ID NO:116), CDR2 (FASARES, SEQ ID NO:117) and CDR3 (QQHYRTPFT, SEQ ID NO:118).
A method for measuring and/or acquiring layer thicknesses and voids of one or more layers of a temporary bonded wafer stack on a plurality of measuring points distributed on the wafer stack, with the following sequence: - arrangement of a measurement means for measuring and/or acquiring the layer thicknesses and voids of the layers of the wafer stack at the measuring points relative to a flat side of the wafer stack, - emission of signals in the form of electromagnetic waves by a transmitter of the measurement means, and receiving the signals which have been reflected by the wafer stack by a receiver of the measurement means, - evaluation of the signals which have been received by the receiver by an evaluation unit, wherein signals reflected by at least two transitions between layers of the wafer stack are distinguised by the evaluation unit and their distances to each other and/or to a reference plane are determined, and wherein the movement of the wafer stack and/or of the measurement means parallel to the reference plane and thus the position of each measuring point along the reference plane is detectable. - arrangement of a measurement means for measuring and/or acquiring the layer thicknesses and voids of the layers of the wafer stack at the measuring points relative to a flat side of the wafer stack, - emission of signals in the form of electromagnetic waves by a transmitter of the measurement means, and receiving the signals which have been reflected by the wafer stack by a receiver of the measurement means, - evaluation of the signals which have been received by the receiver by an evaluation unit, wherein signals reflected by at least two transitions between layers of the wafer stack are distinguised by the evaluation unit and their distances to each other and/or to a reference plane are determined, and wherein the movement of the wafer stack and/or of the measurement means parallel to the reference plane and thus the position of each measuring point along the reference plane is detectable.
A composition comprising bactericidal/permeability increasing protein and/or its congeners for use in the treatment of hematopoietic tissue injury resulting from exposure to radiation, chemoradiotherapy, radiotherapy, disease, toxin or drug or biologic-mediated therapy in a subject.
A syringe device comprising: a syringe body comprising a cylindrical housing and a chamber within the housing, the chamber having a longitudinal axis; a piston comprising a stem, a longitudinal axis, a first end at a first end of the longitudinal axis, and a second end opposing the first end, the first end being external to the chamber, the piston comprising a first opening at the first end and a second opening at the second end; a fluid passageway extending through the first opening, longitudinally through the stem and through the second opening of the piston; a third opening disposed along the longitudinal axis at a position between the first end and the second end of the piston other than at the first or second end of the piston and traversing the fluid passageway; a piston seal attached to the second end of the piston; and a valve, at least a portion of which is inserted within the third opening and orthogonally traversing the fluid passageway, the valve controlling selective fluid passage through the piston and characterized by the valve being at least partially insertable within the cylindrical housing of the syringe body. a syringe body comprising a cylindrical housing and a chamber within the housing, the chamber having a longitudinal axis; a piston comprising a stem, a longitudinal axis, a first end at a first end of the longitudinal axis, and a second end opposing the first end, the first end being external to the chamber, the piston comprising a first opening at the first end and a second opening at the second end; a fluid passageway extending through the first opening, longitudinally through the stem and through the second opening of the piston; a third opening disposed along the longitudinal axis at a position between the first end and the second end of the piston other than at the first or second end of the piston and traversing the fluid passageway; a piston seal attached to the second end of the piston; and a valve, at least a portion of which is inserted within the third opening and orthogonally traversing the fluid passageway, the valve controlling selective fluid passage through the piston and characterized by the valve being at least partially insertable within the cylindrical housing of the syringe body.
- Hypohalite liquid bleaching composition having a pH of between 10.5 and 14.0 comprising: - at least one metal-phthalocyanine pigment or at least one optical brightener or mixtures thereof wherein the metal-phthalocyanine pigment is present in an amount of between 0.0005% to 0.005% by weight on the total weight of the composition and the optical brightener is present in an amount of between 0.005% to 0.5% by weight on the total weight of the composition; - at least a surfactant system selected from the group consisting of: a) at least 0.01% by weight of an anionic surfactant; b) at least 0.01% by weight of a cationic surfactant; c) at least 0.5% by weight of a zwitterionic surfactant; d) at least 0.01% by weight of a non ionic surfactant; or e) a mixture of at least two of a), b), c) and d); and - a stabilizer of formula R 1 -O-(R 2 CHCH 2 O) s -H wherein R 1 represents a phenyl group; R 2 represents a hydrogen atom and s represents an integer from 1 to 2 - pH buffering component selected from the group consisting of alkali metal salts of carbonates, polycarbonates, sesquicarbonates, silicates, polysilicates, boron salts, phosphates, stannates, alluminates and mixtures thereof. - at least one metal-phthalocyanine pigment or at least one optical brightener or mixtures thereof wherein the metal-phthalocyanine pigment is present in an amount of between 0.0005% to 0.005% by weight on the total weight of the composition and the optical brightener is present in an amount of between 0.005% to 0.5% by weight on the total weight of the composition; - at least a surfactant system selected from the group consisting of: a) at least 0.01% by weight of an anionic surfactant; b) at least 0.01% by weight of a cationic surfactant; c) at least 0.5% by weight of a zwitterionic surfactant; d) at least 0.01% by weight of a non ionic surfactant; or e) a mixture of at least two of a), b), c) and d); and a) at least 0.01% by weight of an anionic surfactant; b) at least 0.01% by weight of a cationic surfactant; c) at least 0.5% by weight of a zwitterionic surfactant; d) at least 0.01% by weight of a non ionic surfactant; or e) a mixture of at least two of a), b), c) and d); and - a stabilizer of formula R 1 -O-(R 2 CHCH 2 O) s -H wherein R 1 represents a phenyl group; R 2 represents a hydrogen atom and s represents an integer from 1 to 2 - pH buffering component selected from the group consisting of alkali metal salts of carbonates, polycarbonates, sesquicarbonates, silicates, polysilicates, boron salts, phosphates, stannates, alluminates and mixtures thereof.
A liquid ejection head comprising: a module equipped with a substrate capable of ejecting a liquid by driving an ejection energy generation element and a flow path part that is fluidly connected to the substrate; a support member configured to support the substrate; and a frame (205, 1205) configured to support the module that is inserted and engaged, and to support the support member at an insertion surface of the module, wherein, if the module is inserted and engaged with the frame, the frame and the flow path part face each other via a space in a direction (X, Y) intersecting an inserting direction of the module and abut on each other in the inserting direction so as to be supported; characterized in that the flow path part is configured with a plurality of members (312, 314, 316) connected in the inserting direction, and an abutment part of the flow path part that abuts on the frame is formed on a member positioned upstream in the inserting direction. a module equipped with a substrate capable of ejecting a liquid by driving an ejection energy generation element and a flow path part that is fluidly connected to the substrate; a support member configured to support the substrate; and a frame (205, 1205) configured to support the module that is inserted and engaged, and to support the support member at an insertion surface of the module, wherein, if the module is inserted and engaged with the frame, the frame and the flow path part face each other via a space in a direction (X, Y) intersecting an inserting direction of the module and abut on each other in the inserting direction so as to be supported; characterized in that the flow path part is configured with a plurality of members (312, 314, 316) connected in the inserting direction, and an abutment part of the flow path part that abuts on the frame is formed on a member positioned upstream in the inserting direction.
A method for determining ion current in an ion chamber, said method comprising the steps of: coupling first and second electrodes (104, 106) of an ion chamber to a voltage at a first polarity; determining a first current between the first and the second electrodes (104, 106) of the ion chamber caused by the voltage at the first polarity; coupling the first and the second electrodes (104, 106) of the ion chamber to the voltage at a second polarity; determining a second current between the first and the second electrodes (104, 106) of the ion chamber caused by the voltage at the second polarity; and determining a difference between the first and second currents, wherein the difference is the ion current through the ion chamber. coupling first and second electrodes (104, 106) of an ion chamber to a voltage at a first polarity; determining a first current between the first and the second electrodes (104, 106) of the ion chamber caused by the voltage at the first polarity; coupling the first and the second electrodes (104, 106) of the ion chamber to the voltage at a second polarity; determining a second current between the first and the second electrodes (104, 106) of the ion chamber caused by the voltage at the second polarity; and determining a difference between the first and second currents, wherein the difference is the ion current through the ion chamber.