A method for alignment and contact-making of a first substrate with a second substrate with the following sequences: - fixing of the first substrate on a first mount and of the second substrate on a second mount which is located oppositely the first mount, the first and second substrate (15, 15') being located between the first and second mount (9, 9') with a distance A between a first contact surface of the first substrate and a second contact surface of the second substrate in a Z direction, - moving the first mount to a first detection unit in a first detection position and the second mount to a second detection unit in a second detection position opposite to the first detection position, - detecting a first X-Y position of a first alignment marking located in a peripheral region of the first substrate in the first detection position which has moved in an X and/or Y direction along the first contact surface, - detecting a second X-Y position of a second alignment marking located in a peripheral region of the second substrate in the second detection position which has moved in an X and/or Y direction along the second contact surface, - moving the first mount to the second detection unit in the second detection position and the second mount to the first detection unit in the first detection position, - detecting a third X-Y position of a third alignment marking (20") located in a peripheral region of the first substrate in the second detection position, - detecting a fourth X-Y position of a fourth alignment marking (20"') located in a peripheral region of the second substrate in the first detection position, - aligning the first substrate relative to the second substrate by adjustment units (4, 4') based on the first, second, third and fourth X-Y positions which have been detected by the detections and - contact-making of the first substrate, which has been aligned relative to the second substrate, with the second substrate. - fixing of the first substrate on a first mount and of the second substrate on a second mount which is located oppositely the first mount, the first and second substrate (15, 15') being located between the first and second mount (9, 9') with a distance A between a first contact surface of the first substrate and a second contact surface of the second substrate in a Z direction, - moving the first mount to a first detection unit in a first detection position and the second mount to a second detection unit in a second detection position opposite to the first detection position, - detecting a first X-Y position of a first alignment marking located in a peripheral region of the first substrate in the first detection position which has moved in an X and/or Y direction along the first contact surface, - detecting a second X-Y position of a second alignment marking located in a peripheral region of the second substrate in the second detection position which has moved in an X and/or Y direction along the second contact surface, - moving the first mount to the second detection unit in the second detection position and the second mount to the first detection unit in the first detection position, - detecting a third X-Y position of a third alignment marking (20") located in a peripheral region of the first substrate in the second detection position, - detecting a fourth X-Y position of a fourth alignment marking (20"') located in a peripheral region of the second substrate in the first detection position, - aligning the first substrate relative to the second substrate by adjustment units (4, 4') based on the first, second, third and fourth X-Y positions which have been detected by the detections and - contact-making of the first substrate, which has been aligned relative to the second substrate, with the second substrate.