An evaporator, comprising: at least one feeding member, each configured to transfer a source material in a transfer speed that is adjustable; and a heating member, configured to heat the source material transferred by the feeding member for evaporation to thereby generate a source material vapor, wherein each feeding member comprises a storage portion and a transfer portion, wherein: the storage portion is configured to store the source material before transferring to the transfer portion; and the transfer portion is configured to transfer the source material from the storage portion to the heating member, wherein the evaporator further comprises an evaporation chamber, wherein: the heating member is disposed inside the evaporation chamber; the storage portion of each feeding member is disposed outside the evaporation chamber; and the evaporation chamber is provided with a vapor outlet, configured to vent the source material vapor out of the evaporation chamber for subsequent coating onto a substrate, characterized in that the evaporation chamber comprises a vapor flow stabilizing plate, wherein: the vapor flow stabilizing plate is disposed inside the evaporation chamber, the evaporation chamber is partitioned into two cavities (A, B) by the vapor flow stabilizing plate, the heating member is disposed in one of the two cavities (A, B), and the vapor outlet is connected to another one of the two cavities (A, B); and the vapor flow stabilizing plate is provided with a plurality of openings, configured to allow the source material vapor generated from the heating member to move therethrough to subsequently vent out of the evaporation chamber through the vapor outlet, each opening of the vapor flow stabilizing plate has a substantially same size and shape; and a region closer to a center of the vapor flow stabilizing plate is configured to have a higher distribution density of openings. at least one feeding member, each configured to transfer a source material in a transfer speed that is adjustable; and a heating member, configured to heat the source material transferred by the feeding member for evaporation to thereby generate a source material vapor, wherein each feeding member comprises a storage portion and a transfer portion, wherein: the storage portion is configured to store the source material before transferring to the transfer portion; and the transfer portion is configured to transfer the source material from the storage portion to the heating member, the storage portion is configured to store the source material before transferring to the transfer portion; and the transfer portion is configured to transfer the source material from the storage portion to the heating member, wherein the evaporator further comprises an evaporation chamber, wherein: the heating member is disposed inside the evaporation chamber; the storage portion of each feeding member is disposed outside the evaporation chamber; and the evaporation chamber is provided with a vapor outlet, configured to vent the source material vapor out of the evaporation chamber for subsequent coating onto a substrate, the heating member is disposed inside the evaporation chamber; the storage portion of each feeding member is disposed outside the evaporation chamber; and the evaporation chamber is provided with a vapor outlet, configured to vent the source material vapor out of the evaporation chamber for subsequent coating onto a substrate, characterized in that the evaporation chamber comprises a vapor flow stabilizing plate, wherein: the vapor flow stabilizing plate is disposed inside the evaporation chamber, the evaporation chamber is partitioned into two cavities (A, B) by the vapor flow stabilizing plate, the heating member is disposed in one of the two cavities (A, B), and the vapor outlet is connected to another one of the two cavities (A, B); and the vapor flow stabilizing plate is provided with a plurality of openings, configured to allow the source material vapor generated from the heating member to move therethrough to subsequently vent out of the evaporation chamber through the vapor outlet, each opening of the vapor flow stabilizing plate has a substantially same size and shape; and a region closer to a center of the vapor flow stabilizing plate is configured to have a higher distribution density of openings. the vapor flow stabilizing plate is disposed inside the evaporation chamber, the evaporation chamber is partitioned into two cavities (A, B) by the vapor flow stabilizing plate, the heating member is disposed in one of the two cavities (A, B), and the vapor outlet is connected to another one of the two cavities (A, B); and the vapor flow stabilizing plate is provided with a plurality of openings, configured to allow the source material vapor generated from the heating member to move therethrough to subsequently vent out of the evaporation chamber through the vapor outlet, each opening of the vapor flow stabilizing plate has a substantially same size and shape; and a region closer to a center of the vapor flow stabilizing plate is configured to have a higher distribution density of openings.