A method for producing a light deflection structure, wherein a substrate material of a substrate is irradiated with at least one pulsed laser beam and wherein the substrate material is transparent or partially transparent for the pulsed laser radiation used to produce the light deflection structure, comprising the following steps: a) generating a first plurality of interaction regions, in each of which the at least one laser beam interacts with the substrate material, along a first path with spatial overlap of the interaction regions; characterized in that the method includes the following steps: b) generating a second plurality of interaction regions with spatial overlap of the interaction regions along a second path offset from the first path with spatial overlap to the first path; c) optionally generating a further plurality of interaction regions with spatial overlap of the further interaction regions along a further path offset from the previously used paths (P1, P2) and with spatial overlap with the immediately previously used path (PN-1); d) optionally executing step c) several times to obtain a predetermined number of paths (P1, P2, PN), wherein - type II modifications of the substrate material are produced, the type II modifications resulting from self-organizing effects due to multiple irradiation of a same location, wherein - at least one process parameter is changed from path (P1, P2, PN) to path (P1, P2, PN) to produce a predetermined deflection geometry, wherein the process parameter is selected from a group consisting of: a spectrum, a pulse energy, a fluence, a temporal pulse width, a temporal pulse shape, a spatial pulse shape, a beam dynamics, a polarization, in particular polarization direction, a pulse repetition rate, a micropulse repetition rate, a focus size, a focus cross-sectional shape, and a focus profile, a feed of a laser spot per unit time relative to the substrate, a pulse number per laser spot, and an overlap of directly adjacent interaction regions with one another, wherein a diffractive deflection geometry or a scattering deflection geometry is generated. a) generating a first plurality of interaction regions, in each of which the at least one laser beam interacts with the substrate material, along a first path with spatial overlap of the interaction regions; b) generating a second plurality of interaction regions with spatial overlap of the interaction regions along a second path offset from the first path with spatial overlap to the first path; c) optionally generating a further plurality of interaction regions with spatial overlap of the further interaction regions along a further path offset from the previously used paths (P1, P2) and with spatial overlap with the immediately previously used path (PN-1); d) optionally executing step c) several times to obtain a predetermined number of paths (P1, P2, PN), wherein - type II modifications of the substrate material are produced, the type II modifications resulting from self-organizing effects due to multiple irradiation of a same location, wherein - at least one process parameter is changed from path (P1, P2, PN) to path (P1, P2, PN) to produce a predetermined deflection geometry, wherein the process parameter is selected from a group consisting of: a spectrum, a pulse energy, a fluence, a temporal pulse width, a temporal pulse shape, a spatial pulse shape, a beam dynamics, a polarization, in particular polarization direction, a pulse repetition rate, a micropulse repetition rate, a focus size, a focus cross-sectional shape, and a focus profile, a feed of a laser spot per unit time relative to the substrate, a pulse number per laser spot, and an overlap of directly adjacent interaction regions with one another, wherein a diffractive deflection geometry or a scattering deflection geometry is generated. - type II modifications of the substrate material are produced, the type II modifications resulting from self-organizing effects due to multiple irradiation of a same location, wherein - at least one process parameter is changed from path (P1, P2, PN) to path (P1, P2, PN) to produce a predetermined deflection geometry, wherein the process parameter is selected from a group consisting of: a spectrum, a pulse energy, a fluence, a temporal pulse width, a temporal pulse shape, a spatial pulse shape, a beam dynamics, a polarization, in particular polarization direction, a pulse repetition rate, a micropulse repetition rate, a focus size, a focus cross-sectional shape, and a focus profile, a feed of a laser spot per unit time relative to the substrate, a pulse number per laser spot, and an overlap of directly adjacent interaction regions with one another, wherein a diffractive deflection geometry or a scattering deflection geometry is generated.