An apparatus for detecting characteristics of a probe, wherein the apparatus comprises: a vacuum chamber; a sample holder; a beam generator, adapted to generate a beam of charged particles within the vacuum chamber, wherein interaction particles and/or interaction radiation are generated when the beam of charged particles falls onto a sample of the probe mounted or positioned on the sample holder; an electromechanical unit within the vacuum chamber and comprising a tilting unit; and a detector comprising a plurality of detection units and being mounted or positioned on the tilting unit of the electromechanical unit, wherein the electromechanical unit allows for the detector to move from a first position with respect to the beam generator to a second position with respect to the beam generator and vice versa by a horizontal positioning of the tilting unit holding the detector in combination with a tilting of the detector by the tilting unit, upon a corresponding actuation of the electromechanical unit performable from outside of the vacuum chamber, wherein the detector is configured to: perform a first measurement method in the first position; and perform a second measurement method in the second position, wherein the second measurement method is different from the first measurement method, wherein the apparatus is configured so that: in the first position, an active surface of the detector is substantially parallel to a beam axis along which the beam of charged particles is generated, and in the second position, the active surface of the detector is substantially perpendicular to the beam axis and the detector is horizontally positioned underneath the sample holder. a vacuum chamber; a sample holder; a beam generator, adapted to generate a beam of charged particles within the vacuum chamber, wherein interaction particles and/or interaction radiation are generated when the beam of charged particles falls onto a sample of the probe mounted or positioned on the sample holder; an electromechanical unit within the vacuum chamber and comprising a tilting unit; and a detector comprising a plurality of detection units and being mounted or positioned on the tilting unit of the electromechanical unit, wherein the electromechanical unit allows for the detector to move from a first position with respect to the beam generator to a second position with respect to the beam generator and vice versa by a horizontal positioning of the tilting unit holding the detector in combination with a tilting of the detector by the tilting unit, upon a corresponding actuation of the electromechanical unit performable from outside of the vacuum chamber, wherein the detector is configured to: perform a first measurement method in the first position; and perform a second measurement method in the second position, wherein the second measurement method is different from the first measurement method, wherein the apparatus is configured so that: in the first position, an active surface of the detector is substantially parallel to a beam axis along which the beam of charged particles is generated, and in the second position, the active surface of the detector is substantially perpendicular to the beam axis and the detector is horizontally positioned underneath the sample holder. perform a first measurement method in the first position; and perform a second measurement method in the second position, wherein the second measurement method is different from the first measurement method, wherein the apparatus is configured so that: in the first position, an active surface of the detector is substantially parallel to a beam axis along which the beam of charged particles is generated, and in the second position, the active surface of the detector is substantially perpendicular to the beam axis and the detector is horizontally positioned underneath the sample holder. in the first position, an active surface of the detector is substantially parallel to a beam axis along which the beam of charged particles is generated, and in the second position, the active surface of the detector is substantially perpendicular to the beam axis and the detector is horizontally positioned underneath the sample holder.