A processor comprising: an instruction unit to receive a first instruction, a second instruction, and a third instruction; and an execution unit to execute the first instruction, the second instruction, and the third instruction, wherein execution of the first instruction includes initializing a measurement field in a control structure of a secure enclave with an initial value, execution of the second instruction includes adding a region to the secure enclave, and execution of the third instruction includes measuring a subregion of the region, wherein: execution of the second instruction also includes extending the initial value to generate a first extended value, where the first extended value is based on attributes of the region; execution of the second instruction also includes replacing the initial value in the secure enclave control structure with the first extended value; execution of the third instruction includes extending the first extended value to generate a second extended value, wherein the second extended value is based on a measurement of the subregion; execution of the third instruction also includes replacing the first extended value in the secured enclave control structure with the second extended value; and the instruction unit is also to receive a fourth instruction, the execution unit is also to execute a fourth instruction, and execution of the fourth instruction includes locking the measurement field in the secure enclave control structure. an instruction unit to receive a first instruction, a second instruction, and a third instruction; and an execution unit to execute the first instruction, the second instruction, and the third instruction, wherein execution of the first instruction includes initializing a measurement field in a control structure of a secure enclave with an initial value, execution of the second instruction includes adding a region to the secure enclave, and execution of the third instruction includes measuring a subregion of the region, wherein: execution of the second instruction also includes extending the initial value to generate a first extended value, where the first extended value is based on attributes of the region; execution of the second instruction also includes replacing the initial value in the secure enclave control structure with the first extended value; execution of the third instruction includes extending the first extended value to generate a second extended value, wherein the second extended value is based on a measurement of the subregion; execution of the third instruction also includes replacing the first extended value in the secured enclave control structure with the second extended value; and the instruction unit is also to receive a fourth instruction, the execution unit is also to execute a fourth instruction, and execution of the fourth instruction includes locking the measurement field in the secure enclave control structure. execution of the second instruction also includes extending the initial value to generate a first extended value, where the first extended value is based on attributes of the region; execution of the second instruction also includes replacing the initial value in the secure enclave control structure with the first extended value; execution of the third instruction includes extending the first extended value to generate a second extended value, wherein the second extended value is based on a measurement of the subregion; execution of the third instruction also includes replacing the first extended value in the secured enclave control structure with the second extended value; and the instruction unit is also to receive a fourth instruction, the execution unit is also to execute a fourth instruction, and execution of the fourth instruction includes locking the measurement field in the secure enclave control structure.