A computer-implemented method of analyzing a dual-pattern, the computer-implemented method comprising: projecting a full-field dual-pattern to a full projection field, the full-field dual-pattern comprising a full-field left pattern projected to the full projection field and encoding a left encoded pattern by two different feature shapes; and a full-field right pattern projected to the full projection field and encoding a right encoded pattern by two different feature shapes; the full-field left pattern and the full-field right pattern being associated with a baseline offset; detecting the full-field left pattern using a first filter corresponding to the full-field left pattern; detecting the full-field right pattern using a second filter corresponding to the full-field right pattern; and dimensioning an object included in the full projection field based on the detected full-field left pattern, the detected full-field right pattern, and the baseline offset, wherein the baseline offset is associated with a fixed pitch grid; wherein dimensioning the object comprises: identifying a portion of the full-field left pattern; identifying a portion of the full-field right pattern matching the portion of the full-field left pattern, including: determining the left encoded pattern for the portion of the full-field left pattern; and detecting, using a local area coded feature matching algorithm, the portion of the full-field right pattern representing the right encoded pattern, wherein the left encoded pattern matches the right encoded pattern; determining a dimensioning offset between features of the portion of the full-field left pattern and features of the portion of the full-field right pattern; and calculating dimensioning parameters based on the dimensioning offset and the baseline offset. projecting a full-field dual-pattern to a full projection field, the full-field dual-pattern comprising a full-field left pattern projected to the full projection field and encoding a left encoded pattern by two different feature shapes; and a full-field right pattern projected to the full projection field and encoding a right encoded pattern by two different feature shapes; the full-field left pattern and the full-field right pattern being associated with a baseline offset; detecting the full-field left pattern using a first filter corresponding to the full-field left pattern; detecting the full-field right pattern using a second filter corresponding to the full-field right pattern; and dimensioning an object included in the full projection field based on the detected full-field left pattern, the detected full-field right pattern, and the baseline offset, wherein the baseline offset is associated with a fixed pitch grid; wherein dimensioning the object comprises: identifying a portion of the full-field left pattern; identifying a portion of the full-field right pattern matching the portion of the full-field left pattern, including: determining the left encoded pattern for the portion of the full-field left pattern; and detecting, using a local area coded feature matching algorithm, the portion of the full-field right pattern representing the right encoded pattern, wherein the left encoded pattern matches the right encoded pattern; determining a dimensioning offset between features of the portion of the full-field left pattern and features of the portion of the full-field right pattern; and calculating dimensioning parameters based on the dimensioning offset and the baseline offset. identifying a portion of the full-field left pattern; identifying a portion of the full-field right pattern matching the portion of the full-field left pattern, including: determining the left encoded pattern for the portion of the full-field left pattern; and detecting, using a local area coded feature matching algorithm, the portion of the full-field right pattern representing the right encoded pattern, wherein the left encoded pattern matches the right encoded pattern; determining the left encoded pattern for the portion of the full-field left pattern; and detecting, using a local area coded feature matching algorithm, the portion of the full-field right pattern representing the right encoded pattern, wherein the left encoded pattern matches the right encoded pattern; determining a dimensioning offset between features of the portion of the full-field left pattern and features of the portion of the full-field right pattern; and calculating dimensioning parameters based on the dimensioning offset and the baseline offset.