A decorative member comprising: a color developing layer including a light reflective layer and a light absorbing layer provided on the light reflective layer; and a substrate provided on one surface of the color developing layer and including a pattern layer adjacent to the color developing layer, wherein the pattern layer includes a convex portion or concave portion shape having an asymmetric-structured cross-section, wherein: the light absorbing layer consists of silicon (Si); and a warm tone parameter σ represented by Equation 1 is greater than 0.7 and less than or equal to 1.4: σ = T x × T y wherein: - T x is 1, if T 1 = m × T 0 + 10 nm, m being an integer, - if not, T x is determined according to Equation 2: Tx = T 1 − 10 nm + T 0 − T 1 − 10 nm + T 0 T 0 × T 0 × T 0 − 1 Ty is represented by Equation 3 Ty = T 2 + 5 × T 0 5 × T 0 in Equation 2. T 1 − 10 nm + T 0 T 0 is a maximum integer that is not greater than T 1 − 1 0nm + T 0 T 0 and wherein, T 0 is 60 nm, T 1 is an average thickness of the light absorbing layer included in one cross-section in a thickness direction of the decorative member, and T 2 is an average thickness of the light reflective layer included in one cross-section in a thickness direction of the decorative member, wherein the thickness T 1 of the light absorbing layer is 40 nm to 300 nm, wherein the thickness T 2 of the light reflective layer is 1 nm to 100 nm, wherein Tx is greater than 0.5 and less than or equal to 1, wherein Ty is greater than 1.0 and less than or equal to 1.4. a color developing layer including a light reflective layer and a light absorbing layer provided on the light reflective layer; and a substrate provided on one surface of the color developing layer and including a pattern layer adjacent to the color developing layer, wherein the pattern layer includes a convex portion or concave portion shape having an asymmetric-structured cross-section, wherein: the light absorbing layer consists of silicon (Si); and a warm tone parameter σ represented by Equation 1 is greater than 0.7 and less than or equal to 1.4: σ = T x × T y wherein: - T x is 1, if T 1 = m × T 0 + 10 nm, m being an integer, - if not, T x is determined according to Equation 2: Tx = T 1 − 10 nm + T 0 − T 1 − 10 nm + T 0 T 0 × T 0 × T 0 − 1 Ty is represented by Equation 3 Ty = T 2 + 5 × T 0 5 × T 0 in Equation 2. T 1 − 10 nm + T 0 T 0 is a maximum integer that is not greater than T 1 − 1 0nm + T 0 T 0 and wherein, T 0 is 60 nm, T 1 is an average thickness of the light absorbing layer included in one cross-section in a thickness direction of the decorative member, and T 2 is an average thickness of the light reflective layer included in one cross-section in a thickness direction of the decorative member, wherein the thickness T 1 of the light absorbing layer is 40 nm to 300 nm, wherein the thickness T 2 of the light reflective layer is 1 nm to 100 nm, wherein Tx is greater than 0.5 and less than or equal to 1, wherein Ty is greater than 1.0 and less than or equal to 1.4. the light absorbing layer consists of silicon (Si); and a warm tone parameter σ represented by Equation 1 is greater than 0.7 and less than or equal to 1.4: σ = T x × T y wherein: - T x is 1, if T 1 = m × T 0 + 10 nm, m being an integer, - if not, T x is determined according to Equation 2: Tx = T 1 − 10 nm + T 0 − T 1 − 10 nm + T 0 T 0 × T 0 × T 0 − 1 - T x is 1, if T 1 = m × T 0 + 10 nm, m being an integer, - if not, T x is determined according to Equation 2: Tx = T 1 − 10 nm + T 0 − T 1 − 10 nm + T 0 T 0 × T 0 × T 0 − 1 Ty is represented by Equation 3 Ty = T 2 + 5 × T 0 5 × T 0 in Equation 2. T 1 − 10 nm + T 0 T 0 is a maximum integer that is not greater than T 1 − 1 0nm + T 0 T 0 and wherein, T 0 is 60 nm, T 1 is an average thickness of the light absorbing layer included in one cross-section in a thickness direction of the decorative member, and T 2 is an average thickness of the light reflective layer included in one cross-section in a thickness direction of the decorative member, wherein the thickness T 1 of the light absorbing layer is 40 nm to 300 nm, wherein the thickness T 2 of the light reflective layer is 1 nm to 100 nm, wherein Tx is greater than 0.5 and less than or equal to 1, wherein Ty is greater than 1.0 and less than or equal to 1.4.