A recording apparatus comprising: a recording section configured to record by ejecting liquid onto a medium; a maintenance section configured to move along a movement path, the movement path including a maintenance position at which maintenance of the recording section is performed and a retreat position retreated from the maintenance position; and a guide unit configured to guide the maintenance section along the movement path, wherein the maintenance section includes a first guided section which is guided by the guide unit, and a second guided section which is guided by the guide unit, the second guided section being positioned in a first movement direction (+F) with respect to the first guided section, the first movement direction being a direction from the retreat position toward the maintenance position, when the maintenance section moves from the maintenance position in the first movement direction (+F), the guide unit allows pivoting of the maintenance section with the first guided section as a pivot axis, characterized by the pivoting being accompanied by separation of the second guided section from the guide unit, and the first guided section is configured to separate from the guide unit, by moving in the first movement direction after the pivot of the maintenance section is allowed, wherein the guide unit includes a lower guide section (91, 92) configured to support the first guided section and the second guided section at least between the retreat position and the maintenance position in the movement path, and an upper guide section (93, 94) that is located above the lower guide section, and when the maintenance section moves from the maintenance position in the first movement direction (+F), the second guided section is released from restriction by the upper guide section, and pivot of the maintenance section, which accompanies upward movement of the second guided section, is allowed. a recording section configured to record by ejecting liquid onto a medium; a maintenance section configured to move along a movement path, the movement path including a maintenance position at which maintenance of the recording section is performed and a retreat position retreated from the maintenance position; and a guide unit configured to guide the maintenance section along the movement path, wherein the maintenance section includes a first guided section which is guided by the guide unit, and a second guided section which is guided by the guide unit, the second guided section being positioned in a first movement direction (+F) with respect to the first guided section, the first movement direction being a direction from the retreat position toward the maintenance position, a first guided section which is guided by the guide unit, and a second guided section which is guided by the guide unit, the second guided section being positioned in a first movement direction (+F) with respect to the first guided section, the first movement direction being a direction from the retreat position toward the maintenance position, when the maintenance section moves from the maintenance position in the first movement direction (+F), the guide unit allows pivoting of the maintenance section with the first guided section as a pivot axis, characterized by the pivoting being accompanied by separation of the second guided section from the guide unit, and the first guided section is configured to separate from the guide unit, by moving in the first movement direction after the pivot of the maintenance section is allowed, wherein the guide unit includes a lower guide section (91, 92) configured to support the first guided section and the second guided section at least between the retreat position and the maintenance position in the movement path, and an upper guide section (93, 94) that is located above the lower guide section, and a lower guide section (91, 92) configured to support the first guided section and the second guided section at least between the retreat position and the maintenance position in the movement path, and an upper guide section (93, 94) that is located above the lower guide section, and when the maintenance section moves from the maintenance position in the first movement direction (+F), the second guided section is released from restriction by the upper guide section, and pivot of the maintenance section, which accompanies upward movement of the second guided section, is allowed.