A composition useful in forming microelectronic structures, said composition comprising a nonpolymeric compound dispersed or dissolved in a solvent system, together with a catalyst and a crosslinking agent dispersed in said a solvent system, said nonpolymeric compound having less than 10 monomeric repeat units and comprising at least two epoxy moieties and at least one adamantyl group, wherein said nonpolymeric compound is of the formula: or wherein: each m is at least 2; each n is at least 1; each is a core component each R is individually -O- or -CH 2 -; R 3 and R 4 are different from each other in a given compound and each selected from the group consisting of -L- y and -OR 2 ', wherein: each y is 1-2; each R 2 is individually an -H, alkyl, sulfonate, ester, carbonate, carbamate, or functionalized derivative thereof; each L is individually an amino, ether, thio, hydrazine, sulfinate, sulfonate, sulfonamide, ester, carbonate, carbamate, amide, or urea linkage; each X is a chemical modification group selected from the group consisting of light attenuating moieties, solubility enhancing moieties, adhesion promoting moieties, rheology modifiers, and combinations thereof, said light attenuating moieties being selected from the group consisting of benzene, naphthalene, anthracene, C 1 -C 12 alkyls, and substituted derivatives thereof, said solubility enhancing moieties being selected from the group consisting of hydroxy groups, acids, and fatty chains, said adhesion promoting moieties being selected from the group consisting of alcohols, polar groups, and thiols, and said rheology modifiers being selected from the group consisting of phenols and hydroxyls; at least one of said moieties is of the formula: wherein * is the attachment point to the compound, said catalyst is selected from the group consisting of sulfonic acids, photoacid generators, thermal acid generators, carboxylic acids, phosphoric acids, and mixtures thereof; and said crosslinking agent is selected from the group consisting of aminoplasts, multifunctional epoxy resins, anhydrides, vinyl ethers, and mixtures thereof. each m is at least 2; each n is at least 1; each is a core component each R is individually -O- or -CH 2 -; R 3 and R 4 are different from each other in a given compound and each selected from the group consisting of -L- y and -OR 2 ', wherein: each y is 1-2; each R 2 is individually an -H, alkyl, sulfonate, ester, carbonate, carbamate, or functionalized derivative thereof; each L is individually an amino, ether, thio, hydrazine, sulfinate, sulfonate, sulfonamide, ester, carbonate, carbamate, amide, or urea linkage; each X is a chemical modification group selected from the group consisting of light attenuating moieties, solubility enhancing moieties, adhesion promoting moieties, rheology modifiers, and combinations thereof, said light attenuating moieties being selected from the group consisting of benzene, naphthalene, anthracene, C 1 -C 12 alkyls, and substituted derivatives thereof, said solubility enhancing moieties being selected from the group consisting of hydroxy groups, acids, and fatty chains, said adhesion promoting moieties being selected from the group consisting of alcohols, polar groups, and thiols, and said rheology modifiers being selected from the group consisting of phenols and hydroxyls; at least one of said moieties is of the formula: wherein * is the attachment point to the compound, said catalyst is selected from the group consisting of sulfonic acids, photoacid generators, thermal acid generators, carboxylic acids, phosphoric acids, and mixtures thereof; and said crosslinking agent is selected from the group consisting of aminoplasts, multifunctional epoxy resins, anhydrides, vinyl ethers, and mixtures thereof. each y is 1-2; each R 2 is individually an -H, alkyl, sulfonate, ester, carbonate, carbamate, or functionalized derivative thereof; each L is individually an amino, ether, thio, hydrazine, sulfinate, sulfonate, sulfonamide, ester, carbonate, carbamate, amide, or urea linkage; each X is a chemical modification group selected from the group consisting of light attenuating moieties, solubility enhancing moieties, adhesion promoting moieties, rheology modifiers, and combinations thereof, said light attenuating moieties being selected from the group consisting of benzene, naphthalene, anthracene, C 1 -C 12 alkyls, and substituted derivatives thereof, said solubility enhancing moieties being selected from the group consisting of hydroxy groups, acids, and fatty chains, said adhesion promoting moieties being selected from the group consisting of alcohols, polar groups, and thiols, and said rheology modifiers being selected from the group consisting of phenols and hydroxyls; at least one of said moieties is of the formula: wherein * is the attachment point to the compound, said catalyst is selected from the group consisting of sulfonic acids, photoacid generators, thermal acid generators, carboxylic acids, phosphoric acids, and mixtures thereof; and said crosslinking agent is selected from the group consisting of aminoplasts, multifunctional epoxy resins, anhydrides, vinyl ethers, and mixtures thereof.