A two-dimensional optical scanning system comprising: a first scanning micromirror device (105, 200), wherein the first scanning micromirror device comprises: a first platform coupled to a first base by a plurality of first support flexures, wherein the first platform is oscillatable about a first axis; a stress relief layer positioned on a first side of the first platform; a first reflector positioned on the first side of the first platform, wherein the stress relief layer is positioned between the first reflector and the first platform; a first conducting coil positioned on a second side of the first platform opposite to the first side of the first platform, the first conducting coil arranged to apply magnetic forces to the first platform about the first axis; and a first magnetic field source arranged to apply a first magnetic field to the first platform; and a second scanning micromirror device (115, 300) in optical communication with the first scanning micromirror device (105, 200), wherein the second scanning micromirror device comprises: a first frame coupled to a second base by a plurality of second support flexures, wherein the first frame is oscillatable about a second axis; a second platform coupled to the first frame, wherein the second platform is oscillatable about the second axis together with the first frame; a second reflector positioned on the second platform; a second conducting coil positioned on the first frame, the second conducting coil arranged to apply magnetic forces to the first frame about the second axis; and a second magnetic field source arranged to apply a second magnetic field to the first frame. a first scanning micromirror device (105, 200), wherein the first scanning micromirror device comprises: a first platform coupled to a first base by a plurality of first support flexures, wherein the first platform is oscillatable about a first axis; a stress relief layer positioned on a first side of the first platform; a first reflector positioned on the first side of the first platform, wherein the stress relief layer is positioned between the first reflector and the first platform; a first conducting coil positioned on a second side of the first platform opposite to the first side of the first platform, the first conducting coil arranged to apply magnetic forces to the first platform about the first axis; and a first magnetic field source arranged to apply a first magnetic field to the first platform; and a first platform coupled to a first base by a plurality of first support flexures, wherein the first platform is oscillatable about a first axis; a stress relief layer positioned on a first side of the first platform; a first reflector positioned on the first side of the first platform, wherein the stress relief layer is positioned between the first reflector and the first platform; a first conducting coil positioned on a second side of the first platform opposite to the first side of the first platform, the first conducting coil arranged to apply magnetic forces to the first platform about the first axis; and a first magnetic field source arranged to apply a first magnetic field to the first platform; and a second scanning micromirror device (115, 300) in optical communication with the first scanning micromirror device (105, 200), wherein the second scanning micromirror device comprises: a first frame coupled to a second base by a plurality of second support flexures, wherein the first frame is oscillatable about a second axis; a second platform coupled to the first frame, wherein the second platform is oscillatable about the second axis together with the first frame; a second reflector positioned on the second platform; a second conducting coil positioned on the first frame, the second conducting coil arranged to apply magnetic forces to the first frame about the second axis; and a second magnetic field source arranged to apply a second magnetic field to the first frame. a first frame coupled to a second base by a plurality of second support flexures, wherein the first frame is oscillatable about a second axis; a second platform coupled to the first frame, wherein the second platform is oscillatable about the second axis together with the first frame; a second reflector positioned on the second platform; a second conducting coil positioned on the first frame, the second conducting coil arranged to apply magnetic forces to the first frame about the second axis; and a second magnetic field source arranged to apply a second magnetic field to the first frame.