A method of manufacturing a batch of in vivo analyte sensor systems, comprising: forming multiple in vivo analyte sensor systems, each in vivo analyte sensor system comprising: an in vivo analyte sensor comprising: a substrate; a conductive layer (804, 804a, 804b) disposed over at least a portion of the substrate; a dielectric layer disposed over the conductive layer and having a void therein; a sensing layer disposed within the void and formed over the conductive layer to define an active area of the analyte sensor that generates one or more signals corresponding to a monitored analyte level after insertion of the analyte sensor and when maintained in fluid contact with interstitial fluid, wherein the area of the sensing layer in contact with the conducting layer has a sensor-to-sensor coefficient of variation of less than approximately 5% within the batch; and a membrane layer formed on the sensing layer, wherein the membrane layer has a defined thickness with a sensor-to-sensor coefficient of variation of less than approximately 5% within the batch; and a sensor electronics assembly comprising a data processor, determining the thickness of the membrane layer of each analyte sensor in the batch and at one or more points of the membrane layer; determining a calibration parameter based on a mean of the determined thicknesses of the membrane layers of the batch of analyte sensors; and storing the determined calibration parameter in the data processor of the sensor electronics assembly of each of the in vivo analyte sensor systems in the batch, or providing the determined calibration parameter with each of the in vivo analyte sensor systems in the batch, during manufacture of the analyte sensor systems; wherein the data processor is configured to correlate the generated one or more signals with the monitored analyte level by applying the determined calibration parameter to the generated one or more signals. an in vivo analyte sensor comprising: a substrate; a conductive layer (804, 804a, 804b) disposed over at least a portion of the substrate; a dielectric layer disposed over the conductive layer and having a void therein; a sensing layer disposed within the void and formed over the conductive layer to define an active area of the analyte sensor that generates one or more signals corresponding to a monitored analyte level after insertion of the analyte sensor and when maintained in fluid contact with interstitial fluid, wherein the area of the sensing layer in contact with the conducting layer has a sensor-to-sensor coefficient of variation of less than approximately 5% within the batch; and a membrane layer formed on the sensing layer, wherein the membrane layer has a defined thickness with a sensor-to-sensor coefficient of variation of less than approximately 5% within the batch; and a sensor electronics assembly comprising a data processor, a substrate; a conductive layer (804, 804a, 804b) disposed over at least a portion of the substrate; a dielectric layer disposed over the conductive layer and having a void therein; a sensing layer disposed within the void and formed over the conductive layer to define an active area of the analyte sensor that generates one or more signals corresponding to a monitored analyte level after insertion of the analyte sensor and when maintained in fluid contact with interstitial fluid, wherein the area of the sensing layer in contact with the conducting layer has a sensor-to-sensor coefficient of variation of less than approximately 5% within the batch; and a membrane layer formed on the sensing layer, wherein the membrane layer has a defined thickness with a sensor-to-sensor coefficient of variation of less than approximately 5% within the batch; and a sensor electronics assembly comprising a data processor, determining the thickness of the membrane layer of each analyte sensor in the batch and at one or more points of the membrane layer; determining a calibration parameter based on a mean of the determined thicknesses of the membrane layers of the batch of analyte sensors; and storing the determined calibration parameter in the data processor of the sensor electronics assembly of each of the in vivo analyte sensor systems in the batch, or providing the determined calibration parameter with each of the in vivo analyte sensor systems in the batch, during manufacture of the analyte sensor systems; wherein the data processor is configured to correlate the generated one or more signals with the monitored analyte level by applying the determined calibration parameter to the generated one or more signals.