mhurhangee/ep-ind-claims huggingface dataset:
Process for preparing a polyoxyalkylene polyol comprising addition of an alkylene oxide onto an H-functional starter substance in the presence of a double metal cyanide catalyst; wherein the alkylene oxide with the mass flow ṁ ( alkylene oxide), the H-functional starter substance with the mass flow ṁ ( starter substance) and the double metal cyanide catalyst in a dispersion medium with the mass flow ṁ are during the reaction continuously metered into the reactor having the reaction volume V and the resulting reaction mixture is continuously removed from the reactor; and wherein the quotient of the sum of the mass flows ∑ ṁ, composed of ṁ ( alkylene oxide), ṁ ( starter substance) and ṁ, and the reaction volume V in the steady state is not less than 1200 g/(h·L). wherein the alkylene oxide with the mass flow ṁ ( alkylene oxide), the H-functional starter substance with the mass flow ṁ ( starter substance) and the double metal cyanide catalyst in a dispersion medium with the mass flow ṁ are during the reaction continuously metered into the reactor having the reaction volume V and the resulting reaction mixture is continuously removed from the reactor; and wherein the quotient of the sum of the mass flows ∑ ṁ, composed of ṁ ( alkylene oxide), ṁ ( starter substance) and ṁ, and the reaction volume V in the steady state is not less than 1200 g/(h·L).
A disc pump comprising: a pump base having an elliptical sidewall closed at one end by a first end wall to form a cavity and an upper surface extending radially outwardly from the sidewall, the upper surface including a sealing surface and at least one indentation; at least one aperture extending through the pump base into the cavity; and an actuator including a piezoelectric disc and an isolator extending radially outwardly between the piezoelectric disc and the sidewall, the disc pump being characterized in that; the isolator has at least one isolator valve aperture extending through the isolator and having an opening proximate the upper surface of the pump base and a peripheral portion of the cavity, and in that the disc pump further comprises; a valve flap disposed between the opening of the isolator valve aperture on one side and the upper surface of the pump base and the peripheral portion of the cavity on the other side, the valve flap having at least one valve flap aperture extending between the opening of the isolator valve aperture and the indentation, wherein the valve flap prevents the flow of fluids through the isolator valve aperture when seated against the sealing surface and permits the flow of fluids through the indentation and the isolator valve aperture when not seated against the sealing surface. a pump base having an elliptical sidewall closed at one end by a first end wall to form a cavity and an upper surface extending radially outwardly from the sidewall, the upper surface including a sealing surface and at least one indentation; at least one aperture extending through the pump base into the cavity; and an actuator including a piezoelectric disc and an isolator extending radially outwardly between the piezoelectric disc and the sidewall, the disc pump being characterized in that; the isolator has at least one isolator valve aperture extending through the isolator and having an opening proximate the upper surface of the pump base and a peripheral portion of the cavity, and in that the disc pump further comprises; a valve flap disposed between the opening of the isolator valve aperture on one side and the upper surface of the pump base and the peripheral portion of the cavity on the other side, the valve flap having at least one valve flap aperture extending between the opening of the isolator valve aperture and the indentation, wherein the valve flap prevents the flow of fluids through the isolator valve aperture when seated against the sealing surface and permits the flow of fluids through the indentation and the isolator valve aperture when not seated against the sealing surface.
A beam adjustment method for an electron beam being radiated from an electron gun, the method comprising: installing, on an irradiation surface to which the electron beam is radiated, a detection part having a Faraday cup catching electrical charges of the electron beam; installing, on a side of the electron gun further than the detection part, a shielding plate having a plurality of opening holes through which the electron beam is passable, and installing a knife edge between the shielding plate and the Faraday cup which covers an opening of the Faraday cup and has a plurality of passing holes through which the electron beam is passable, wherein: the opening holes are formed in positions facing the passing holes, and a size of an opening of each of the opening holes is set to be larger than a size of an opening of each of the passing holes; causing, upon performing beam diameter measurement processing in which a beam diameter of the electron beam is measured, the electron beam to pass through the opening holes being provided for the shielding plate, and radiating the electron beam to the Faraday cup; and radiating, upon performing normal processing in which the beam diameter of the electron beam is not measured, the electron beam to the shielding plate. installing, on an irradiation surface to which the electron beam is radiated, a detection part having a Faraday cup catching electrical charges of the electron beam; installing, on a side of the electron gun further than the detection part, a shielding plate having a plurality of opening holes through which the electron beam is passable, and installing a knife edge between the shielding plate and the Faraday cup which covers an opening of the Faraday cup and has a plurality of passing holes through which the electron beam is passable, wherein: the opening holes are formed in positions facing the passing holes, and a size of an opening of each of the opening holes is set to be larger than a size of an opening of each of the passing holes; the opening holes are formed in positions facing the passing holes, and a size of an opening of each of the opening holes is set to be larger than a size of an opening of each of the passing holes; causing, upon performing beam diameter measurement processing in which a beam diameter of the electron beam is measured, the electron beam to pass through the opening holes being provided for the shielding plate, and radiating the electron beam to the Faraday cup; and radiating, upon performing normal processing in which the beam diameter of the electron beam is not measured, the electron beam to the shielding plate.
A Pt-AI-X diffusion aluminide coating on a single crystal nickel superalloy substrate, where X is Hf and/or Zr and wherein the coating includes an outer additive region having an outer coating surface where the Pt content is 2 to 16 atomic %, where the Al content is 31 to 40 atomic %, and where at least one of Hf and Zr is present, and wherein the coating has a highest concentration of at least one of Hf and Zr at a location adjacent to an inner diffusion zone of the coating, the coating having an overall coating thickness of 25 to 45 micrometer where the overall coating thickness includes the diffusion zone and the outer additive region.
A method for recovering a fuel material deposit from a formation, the method comprising: providing a combustion fuel and an oxidant into a combustor positioned above ground; combusting the combustion fuel to provide a CO 2 containing stream comprising supercritical CO 2; expanding the CO 2 containing stream comprising supercritical CO 2 across a turbine for power generation to form an expanded CO 2 containing stream; injecting at least a portion of the CO 2 containing stream into the formation including the fuel material deposit for recovery such that at least a portion of the fuel material in the formation and at least a portion of the CO 2 stream flow from the formation and into a recovery well, wherein the CO 2 containing stream injected into the formation comprises supercritical CO 2; receiving from the recovery well a recovery stream comprising the fuel material and the CO 2; separating the recovery stream into a recovered gas stream comprising methane and CO 2 and a recovered liquid stream; and directing at least a portion of the recovered gas stream comprising methane and CO 2 to the combustor as at least a portion of the combustion fuel. providing a combustion fuel and an oxidant into a combustor positioned above ground; combusting the combustion fuel to provide a CO 2 containing stream comprising supercritical CO 2; expanding the CO 2 containing stream comprising supercritical CO 2 across a turbine for power generation to form an expanded CO 2 containing stream; injecting at least a portion of the CO 2 containing stream into the formation including the fuel material deposit for recovery such that at least a portion of the fuel material in the formation and at least a portion of the CO 2 stream flow from the formation and into a recovery well, wherein the CO 2 containing stream injected into the formation comprises supercritical CO 2; receiving from the recovery well a recovery stream comprising the fuel material and the CO 2; separating the recovery stream into a recovered gas stream comprising methane and CO 2 and a recovered liquid stream; and directing at least a portion of the recovered gas stream comprising methane and CO 2 to the combustor as at least a portion of the combustion fuel.
Pneumatic power wrench, comprising a housing with a pressure air inlet passage and an exhaust air outlet passage, a rotation motor, and an exhaust air outlet unit communicating with the outlet passage, wherein the outlet unit comprises • a first outlet opening means (26,27) forming a main exhaust air flow path, • a second outlet opening means (31,32) forming an additional exhaust air flow path, and • a manually operable valve (35,41) arranged to control the additional exhaust air flow path by controlling said second outlet opening means (31,32), characterized in that the outlet unit comprises a casing, and said second outlet opening means (31,32) comprises at least one aperture (31,32) on said casing, and said valve (35,41) comprises a valve element provided with at least one aperture (36,37), wherein said valve element is movable between a fully open position wherein said at least one aperture (36,37) of the valve element is aligned with said at least one aperture (31,32) of the casing, and a fully closed position wherein said at least one aperture (36,37) of the valve element is completely out of alignment with said at least one aperture (31,32) of the casing, wherein the casing is cylindrical in shape and comprises a cylindrical wall and a transverse end wall, and said first outlet opening means (26,27) is located on the cylindrical wall, and said at least one aperture (31,32) forming the second outlet opening means are located on the end wall, and the valve element is located at the end wall. • a first outlet opening means (26,27) forming a main exhaust air flow path, • a second outlet opening means (31,32) forming an additional exhaust air flow path, and • a manually operable valve (35,41) arranged to control the additional exhaust air flow path by controlling said second outlet opening means (31,32),
Use of a coating composition for increasing the scuff resistance of a surface on a chocolate-coated or chocolate-enrobed product selected from biscuits and cookies, wherein said coating composition is applied to the surface of the chocolate by spraying or enrobing, and wherein the coating composition comprises: i) a solvent selected from water, ethanol, and isopropanol, or any combination thereof: ii) one or more first film forming agents, wherein the one or more first film forming agents provide strength and flexibility to a film that is formed when the coating composition is dried, and wherein the coating composition which has been applied is dried to provide a chocolate-coated or chocolate-enrobed product having a surface with increased scuff resistance. i) a solvent selected from water, ethanol, and isopropanol, or any combination thereof: ii) one or more first film forming agents, wherein the one or more first film forming agents provide strength and flexibility to a film that is formed when the coating composition is dried, and wherein the coating composition which has been applied is dried to provide a chocolate-coated or chocolate-enrobed product having a surface with increased scuff resistance.
A memory forming method, comprising providing a substrate, wherein the substrate comprises at least word line structures and active regions, wherein bottom dielectric layers and bit line contact layers located on a top surface of the substrate, the bottom dielectric layers have bit line contact openings exposing the active regions in the substrate, and the bit line contact layers cover the bottom dielectric layers and fill the bit line contact openings; etching part of the bit line contact layers to form the bit line contact layers of different heights; forming conductive layers on top surfaces of the bit line contact layers of different heights, top surfaces of the conductive layers being at the same height in a direction perpendicular to an extension direction of the word line structures; and the top surfaces of the conductive layers being at different heights, at all positions in the bit line direction, in the extension direction of the word line structures: forming top dielectric layers on the top surfaces of the conductive layers; and sequentially etching part of the top dielectric layers, part of the conductive layers, and part of the bit line contact layers of different heights to form discrete bit line structures. wherein bottom dielectric layers and bit line contact layers located on a top surface of the substrate, the bottom dielectric layers have bit line contact openings exposing the active regions in the substrate, and the bit line contact layers cover the bottom dielectric layers and fill the bit line contact openings; etching part of the bit line contact layers to form the bit line contact layers of different heights; forming conductive layers on top surfaces of the bit line contact layers of different heights, top surfaces of the conductive layers being at the same height in a direction perpendicular to an extension direction of the word line structures; and the top surfaces of the conductive layers being at different heights, at all positions in the bit line direction, in the extension direction of the word line structures: forming top dielectric layers on the top surfaces of the conductive layers; and sequentially etching part of the top dielectric layers, part of the conductive layers, and part of the bit line contact layers of different heights to form discrete bit line structures. forming top dielectric layers on the top surfaces of the conductive layers; and sequentially etching part of the top dielectric layers, part of the conductive layers, and part of the bit line contact layers of different heights to form discrete bit line structures.
A shield system for protecting a curved object, the system comprising at least one flexible pad comprising: a spacing ridge projecting at an angle from a first major surface of the pad for providing a spacing between the first major surface and a shield shell; a support ridge projecting from the first major surface and extending transverse to the spacing ridge, wherein the support ridge comprises a flexure region adapted to unbend in the event that the pad is curved about an axis aligned with the spacing ridge to inhibit strain in the support ridge from causing deflection of the spacing ridge. a spacing ridge projecting at an angle from a first major surface of the pad for providing a spacing between the first major surface and a shield shell; a support ridge projecting from the first major surface and extending transverse to the spacing ridge, wherein the support ridge comprises a flexure region adapted to unbend in the event that the pad is curved about an axis aligned with the spacing ridge to inhibit strain in the support ridge from causing deflection of the spacing ridge.
A method of fabrication of a device, the method comprising: thinning a back-side of a substrate of the device to expose a portion of a first via and a portion of a second via that extend completely or partially through the substrate; forming a first diode at the back-side of the substrate, wherein the first diode is coupled to the first via; forming a layer of the device, the layer separate from the substrate; and forming a second diode that includes a semiconductor material, the second diode formed on the second via, the layer located between the second diode and the back-side of the substrate. thinning a back-side of a substrate of the device to expose a portion of a first via and a portion of a second via that extend completely or partially through the substrate; forming a first diode at the back-side of the substrate, wherein the first diode is coupled to the first via; forming a layer of the device, the layer separate from the substrate; and forming a second diode that includes a semiconductor material, the second diode formed on the second via, the layer located between the second diode and the back-side of the substrate.
A tractor, comprising a handrail frame provided at a front part of a getting on/off area on the right or left side of a driving part and provided with a handrail part on an upper part thereof, a lamp attached to the handrail frame, a harness disposed along the handrail frame and connected to the lamp, and a mounting member for mounting the harness along the handrail frame, the tractor further comprising a floor at a lower part of the driving part and a partition wall provided between the driving part and a front side engine, wherein the handrail frame comprises the handrail part provided along the left and right direction, a vertical frame part extending downward from an outer end portion of the handrail part and connected to the floor, characterized in that a lateral frame part is connected across the partition wall and the vertical frame part on a lower side of the handrail part, and wherein the lamp is attached to the vertical frame part, and the harness is attached along the lateral frame part by the mounting member.
A micro-gyroscope for detecting motions relative to an X and/or Y and Z axis, particularly as a 3D, 5D, or 6D sensor, having a substrate, having a plurality of oscillating sample masses, having anchors (3, 4) and anchor springs (5, 6) disposed between the anchors (3, 4) and sample mass for attaching the oscillating sample masses to the substrate, having drive elements for oscillating the sample masses in the X-Y plane, in order to generate Coriolis forces when the substrate is rotated, and having sensor elements, particularly electrodes disposed below the sample masses, in order to detect deflections of the sample masses due to the generated Coriolis forces, characterized in that one of the anchors (3, 4) being a central anchor and others being outer anchors, the sample masses are disposed uniformly about the central anchor and can be driven radially relative to the central anchor, the anchor springs (5, 6) are designed such that the sample masses can be deflected both radially in the X-Y plane and out of the X-Y plane, a sensor mass is disposed on one, particularly on each of the sample masses, by means of sensor springs, and the sensor springs allow deflection of the sensor mass within the plane of the sample mass or the X-Y plane, and orthogonal to the radial drive direction of the sample masses.
A passive-matrix display device, comprising: a) a substrate having a display area; b) a plurality of row electrodes formed over the substrate in the display area extending in a row direction and a plurality of column electrodes formed over the substrate in the display area extending in a column direction different from the row direction, the row and column electrodes (16, 12) overlapping to form pixels; c) wherein the pixels are divided into two or more separate pixel groups, each pixel group having group row electrodes (16A, 16B) and separate group column electrodes (12A, 12B); and d) four spaced column driver chiplets located in the display area, wherein each column driver chiplet is an integrated circuit that is formed on an independent substrate, and each column driver chiplet is applied on the substrate having the display area, e) four spaced row driver chiplets located in the display area, wherein each row driver chiplet is an integrated circuit that is formed on independent substrate, and each row driver chiplet is applied to the substrate having the display area, wherein, the passive-matrix display device further comprises four pixel groups (32A, 32B, 32C, 32D), arranged in a 2 x 2 configuration, characterised in that each of the four column driver chiplets (20A, 20B, 20C, 20D) is configured to control separate column electrodes in a respective one of the four pixel groups (32A, 32B, 32C, 32D), the row electrodes are electrically continuous across horizontally adjacent pixel groups (32A, 32B) and the column electrodes of each pixel group (32A, 32B, 32C, 32D) are electrically separate, the horizontally adjacent pixel groups (32A, 32B) are controlled by two of said four row driver chiplets (23A, 23B), which are connected to the row electrodes of the horizontally adjacent pixel groups (32A, 32B), the two row driver chiplets (23A, 23B) providing the same signal, one row driver chiplet of the two row driver chiplets is positioned between the horizontally adjacent pixel groups (32A, 32B), such as to be contiguous to each group of the horizontally adjacent pixel groups (32A, 32B). a) a substrate having a display area; b) a plurality of row electrodes formed over the substrate in the display area extending in a row direction and a plurality of column electrodes formed over the substrate in the display area extending in a column direction different from the row direction, the row and column electrodes (16, 12) overlapping to form pixels; c) wherein the pixels are divided into two or more separate pixel groups, each pixel group having group row electrodes (16A, 16B) and separate group column electrodes (12A, 12B); and d) four spaced column driver chiplets located in the display area, wherein each column driver chiplet is an integrated circuit that is formed on an independent substrate, and each column driver chiplet is applied on the substrate having the display area, e) four spaced row driver chiplets located in the display area, wherein each row driver chiplet is an integrated circuit that is formed on independent substrate, and each row driver chiplet is applied to the substrate having the display area,
Method for producing packages of container groups (3.1), which each have at least one container in at least two rows, wherein the containers are fed to a container inlet (4.1) of a device in at least one two-lane container stream (5.1, 5.2), having at least one treatment section (6.1, 6.2) of the device on which the containers are provided with applications of an adhesive, preferably a contact adhesive, and from the containers treated in this way, on a transport section, an at least two-lane container stream is formed, from which the container groups (3.1) are separated out and are compressed for connecting the containers of each container group (3.1) to the applications of adhesive to form a package, characterised in that the separation of the container groups (3.1) takes place with pressing heads moved in a transport direction of the transport section, which secure the containers at their casing surface and press them against one another for the compacting of the container groups (3.1), and in each case are provided in pairs opposite one another on sides of the transport section extending in transport direction.