Method for calculating a pattern to be exposed on a target by means of a charged-particle multi-beam writing apparatus, said apparatus exposing a multitude of pixels (px) within an exposure region on the target to generate said pattern by means of a scanning stripe exposure, wherein the pattern is realized as a pixel graphic composed of a plurality of pixels defined in accordance with a raster grid on the exposure region, wherein each of said pixels is represented by a geometric pixel shape located at a respective pixel position and is assigned an intensity value corresponding to a value of exposure dose to be exposed for the respective pixel, the method comprising the steps of: (i) providing the vector pattern as a number of pattern elements (921, 931), wherein each pattern element has a respective geometric shape comprising a boundary and an interior, and is associated with a respective assigned dose, said assigned dose defining a value of exposure dose to be exposed for pixels within the interior of the respective shape, (ii) rasterizing the vector pattern into the pattern by calculating, for each of the plurality of pixels, respective intensity values based on the vector pattern, wherein a position correction for at least one edge position of a pattern element boundary is performed during one of steps (i) and (ii), said position correction including the steps of: - determining a position value describing said edge position, - determining a corrected position value based on the position value, and - modifying the pattern to effectively shift the pattern element boundary in accordance with the corrected position value; characterized by using a predefined non-linear function during determining a corrected position value based on the position value, said predefined non-linear function ( f ξ Φ − 1) describing the inverse of the relationship between a nominal position value ( d, dx), said nominal position value being used as input value during exposure of the pattern, and position (d, dx) of the pattern element boundary generated when exposed with said nominal position value, with at least one parameter, said at least one parameter including the assigned dose of the pattern element involved. wherein the pattern is realized as a pixel graphic composed of a plurality of pixels defined in accordance with a raster grid on the exposure region, wherein each of said pixels is represented by a geometric pixel shape located at a respective pixel position and is assigned an intensity value corresponding to a value of exposure dose to be exposed for the respective pixel, the method comprising the steps of: (i) providing the vector pattern as a number of pattern elements (921, 931), wherein each pattern element has a respective geometric shape comprising a boundary and an interior, and is associated with a respective assigned dose, said assigned dose defining a value of exposure dose to be exposed for pixels within the interior of the respective shape, (ii) rasterizing the vector pattern into the pattern by calculating, for each of the plurality of pixels, respective intensity values based on the vector pattern, (i) providing the vector pattern as a number of pattern elements (921, 931), wherein each pattern element has a respective geometric shape comprising a boundary and an interior, and is associated with a respective assigned dose, said assigned dose defining a value of exposure dose to be exposed for pixels within the interior of the respective shape, (ii) rasterizing the vector pattern into the pattern by calculating, for each of the plurality of pixels, respective intensity values based on the vector pattern, wherein a position correction for at least one edge position of a pattern element boundary is performed during one of steps (i) and (ii), said position correction including the steps of: - determining a position value describing said edge position, - determining a corrected position value based on the position value, and - modifying the pattern to effectively shift the pattern element boundary in accordance with the corrected position value; - determining a position value describing said edge position, - determining a corrected position value based on the position value, and - modifying the pattern to effectively shift the pattern element boundary in accordance with the corrected position value; characterized by using a predefined non-linear function during determining a corrected position value based on the position value, said predefined non-linear function ( f ξ Φ − 1) describing the inverse of the relationship between a nominal position value ( d, dx), said nominal position value being used as input value during exposure of the pattern, and position (d, dx) of the pattern element boundary generated when exposed with said nominal position value, with at least one parameter, said at least one parameter including the assigned dose of the pattern element involved.