An inductively-coupled plasma generation system, comprising: a dielectric tube extending in a length direction; a first inductive coil structure provided to enclose the dielectric tube and to produce ICP in the dielectric tube; an RF power supply configured to provide positive and negative outputs having opposite phases, to respectively supply positive and negative outputs of RF power to both ends of the first inductive coil structure, and to change a driving frequency; a first main capacitor provided between a positive output terminal of the RF power supply and one end of the first inductive coil structure; and a second main capacitor provided between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure, wherein the first inductive coil structure (110; 310; 410) comprises: inductive coils (112, 114, 116, 118; 312, 314, 316, 318; 412, 414, 416, 418) connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer; and auxiliary capacitors (113, 115, 117), which are respectively provided between adjacent ones of the inductive coils (112, 114, 116, 118) to distribute a voltage applied to the inductive coils, wherein each of the inductive coils (112, 114, 116, 118) has the same inductance of a first inductance L1, wherein each of the auxiliary capacitors (113, 115, 117) has the same capacitance of a first capacitance C1, wherein a driving frequency of the RF power supply is controlled to coincide with a resonance frequency, which is determined by the first inductance L1 and the first capacitance C1 connected in series to each other, wherein each of the first main capacitor and the second main capacitor has the same capacitance of a second capacitance C2, and wherein the second capacitance C2 is two times the first capacitance C1. a dielectric tube extending in a length direction; a first inductive coil structure provided to enclose the dielectric tube and to produce ICP in the dielectric tube; an RF power supply configured to provide positive and negative outputs having opposite phases, to respectively supply positive and negative outputs of RF power to both ends of the first inductive coil structure, and to change a driving frequency; a first main capacitor provided between a positive output terminal of the RF power supply and one end of the first inductive coil structure; and a second main capacitor provided between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure, wherein the first inductive coil structure (110; 310; 410) comprises: inductive coils (112, 114, 116, 118; 312, 314, 316, 318; 412, 414, 416, 418) connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer; and wherein each of the inductive coils (112, 114, 116, 118) has the same inductance of a first inductance L1, wherein each of the auxiliary capacitors (113, 115, 117) has the same capacitance of a first capacitance C1, wherein a driving frequency of the RF power supply is controlled to coincide with a resonance frequency, which is determined by the first inductance L1 and the first capacitance C1 connected in series to each other, wherein each of the first main capacitor and the second main capacitor has the same capacitance of a second capacitance C2, and wherein the second capacitance C2 is two times the first capacitance C1.