A grain-oriented electrical steel sheet comprising: a base steel sheet in which a final-annealed film is substantially not present on a surface, wherein (a) a status in which an oxide of forsterite, spinel, or cordierite is formed in a non-film-shaped form or (b) a status in which a part of a final-annealed film remains in a procedure where a once-formed final-annealed film is removed, is considered a status where a final-annealed film is substantially not present on the surface; an intermediate layer that is disposed on a surface of the base steel sheet and mainly contains silicon oxide which means that in the intermediate layer the Fe content is less than 30 atom%, the P content is less than 5 atom%, the Si content is 20 atom% or more, the O content is 50 atom% or more, and the Mg content is 10 atom% or less; and an insulation coating disposed on a surface of the intermediate layer; wherein the base steel sheet comprises, measured in accordance with the description, in mass%: Si: 0.50 to 7.00%, C: 0.005% or less, N: 0.0050% or less, optionally one or more of the following: acid-soluble Al: 0.0065% or less, Mn: 1.00% or less, S and Se: 0.001% or less in total, Bi: 0.010% or less, B: 0.0080% or less, Ti: 0.015% or less, Nb: 0.020% or less, V: 0.015% or less, Sn: 0.50% or less, Sb: 0.50% or less, Cr: 0.30% or less, Cu: 0.40% or less, P: 0.50% or less, Ni: 1.00% or less, and Mo: 0.10% or less; and a remainder being Fe and an impurity; wherein, in the intermediate layer, a value obtained by dividing a standard deviation σ of a thickness of the intermediate layer by an average value T of the thickness of the intermediate layer is 0.500 or less, whereby the standard deviation of the thickness, and the thickness are determined according to the description. a base steel sheet in which a final-annealed film is substantially not present on a surface, wherein (a) a status in which an oxide of forsterite, spinel, or cordierite is formed in a non-film-shaped form or (b) a status in which a part of a final-annealed film remains in a procedure where a once-formed final-annealed film is removed, is considered a status where a final-annealed film is substantially not present on the surface; an intermediate layer that is disposed on a surface of the base steel sheet and mainly contains silicon oxide which means that in the intermediate layer the Fe content is less than 30 atom%, the P content is less than 5 atom%, the Si content is 20 atom% or more, the O content is 50 atom% or more, and the Mg content is 10 atom% or less; and an insulation coating disposed on a surface of the intermediate layer; wherein the base steel sheet comprises, measured in accordance with the description, in mass%: Si: 0.50 to 7.00%, C: 0.005% or less, N: 0.0050% or less, optionally one or more of the following: acid-soluble Al: 0.0065% or less, Mn: 1.00% or less, S and Se: 0.001% or less in total, Bi: 0.010% or less, B: 0.0080% or less, Ti: 0.015% or less, Nb: 0.020% or less, V: 0.015% or less, Sn: 0.50% or less, Sb: 0.50% or less, Cr: 0.30% or less, Cu: 0.40% or less, P: 0.50% or less, Ni: 1.00% or less, and Mo: 0.10% or less; and a remainder being Fe and an impurity; wherein the base steel sheet comprises, measured in accordance with the description, in mass%: Si: 0.50 to 7.00%, C: 0.005% or less, N: 0.0050% or less, Si: 0.50 to 7.00%, C: 0.005% or less, N: 0.0050% or less, optionally one or more of the following: acid-soluble Al: 0.0065% or less, Mn: 1.00% or less, S and Se: 0.001% or less in total, Bi: 0.010% or less, B: 0.0080% or less, Ti: 0.015% or less, Nb: 0.020% or less, V: 0.015% or less, Sn: 0.50% or less, Sb: 0.50% or less, Cr: 0.30% or less, Cu: 0.40% or less, P: 0.50% or less, Ni: 1.00% or less, and Mo: 0.10% or less; and a remainder being Fe and an impurity; acid-soluble Al: 0.0065% or less, Mn: 1.00% or less, S and Se: 0.001% or less in total, Bi: 0.010% or less, B: 0.0080% or less, Ti: 0.015% or less, Nb: 0.020% or less, V: 0.015% or less, Sn: 0.50% or less, Sb: 0.50% or less, Cr: 0.30% or less, Cu: 0.40% or less, P: 0.50% or less, Ni: 1.00% or less, and Mo: 0.10% or less; and a remainder being Fe and an impurity; wherein, in the intermediate layer, a value obtained by dividing a standard deviation σ of a thickness of the intermediate layer by an average value T of the thickness of the intermediate layer is 0.500 or less, whereby the standard deviation of the thickness, and the thickness are determined according to the description.