Device for anisotropically etching a substrate, comprising a first reaction chamber (101; 401; 501; 601), into which a first gas can be introduced; a second reaction chamber (102; 402; 502; 602), into which a second gas can be introduced; at least one coil unit (110, 112; 410, 112; 510; 610; L1, L2), by means of which at least one electromagnetic alternating field can be generated; wherein at least one first reactive species can be generated by means of applying the generated at least one electromagnetic alternating field to the introduced first gas in the first reaction chamber (101; 401; 501; 601), and wherein at least one second reactive species can be generated by means of applying the generated at least one electromagnetic alternating field to the introduced second gas in the second reaction chamber (102; 402; 502; 602; 702); a separating unit (120; 420; 620; 720), by means of which a direct gas exchange between the first reaction chamber (101; 401; 501; 601) and the second reaction chamber (102; 402; 502; 602) can be prevented or suppressed; an etching chamber for accommodating the substrate to be anisotropically etched; and a mixing unit (130; 130, 132; 232, 243; 332; 432, 434), which is arranged and designed such that the generated at least one first reactive species and the generated at least one second reactive species mix with one another during a movement from the two reaction chambers (101, 102; 401, 402; 501, 502; 601, 602) in the direction of the etching chamber in the mixing unit (130; 130, 132; 232, 243; 332; 432, 434) and enter the etching chamber for anisotropically etching the substrate while mixed with one another; characterized in that the mixing unit (130; 130, 132; 130, 232, 234; 130, 332; 130, 432, 434) has at least one redirection unit (132; 232; 332; 432), by means of which, to redirect at least a part of the generated at least one first reactive species, a direct path of the generated at least one first reactive species from the first reaction chamber (101; 401; 501; 601; 701) to the substrate is partially or completely blocked; and wherein the first redirection unit (132; 232; 332; 432) is arranged such that gas streams of the first reactive species and the second reactive species are oriented one into another. a first reaction chamber (101; 401; 501; 601), into which a first gas can be introduced; a second reaction chamber (102; 402; 502; 602), into which a second gas can be introduced; at least one coil unit (110, 112; 410, 112; 510; 610; L1, L2), by means of which at least one electromagnetic alternating field can be generated; wherein at least one first reactive species can be generated by means of applying the generated at least one electromagnetic alternating field to the introduced first gas in the first reaction chamber (101; 401; 501; 601), and wherein at least one second reactive species can be generated by means of applying the generated at least one electromagnetic alternating field to the introduced second gas in the second reaction chamber (102; 402; 502; 602; 702); a separating unit (120; 420; 620; 720), by means of which a direct gas exchange between the first reaction chamber (101; 401; 501; 601) and the second reaction chamber (102; 402; 502; 602) can be prevented or suppressed; an etching chamber for accommodating the substrate to be anisotropically etched; and a mixing unit (130; 130, 132; 232, 243; 332; 432, 434), which is arranged and designed such that the generated at least one first reactive species and the generated at least one second reactive species mix with one another during a movement from the two reaction chambers (101, 102; 401, 402; 501, 502; 601, 602) in the direction of the etching chamber in the mixing unit (130; 130, 132; 232, 243; 332; 432, 434) and enter the etching chamber for anisotropically etching the substrate while mixed with one another; characterized in that the mixing unit (130; 130, 132; 130, 232, 234; 130, 332; 130, 432, 434) has at least one redirection unit (132; 232; 332; 432), by means of which, to redirect at least a part of the generated at least one first reactive species, a direct path of the generated at least one first reactive species from the first reaction chamber (101; 401; 501; 601; 701) to the substrate is partially or completely blocked; and wherein the first redirection unit (132; 232; 332; 432) is arranged such that gas streams of the first reactive species and the second reactive species are oriented one into another.