A deposition mask extending in a first direction, the deposition mask comprising: a central axis line extending in the first direction and arranged at a central position in a second direction orthogonal to the first direction; a point P1 and a point Q1 provided on one side of the central axis line and spaced apart from each other along the first direction; and a point P2 and a point Q2 provided on the other side of the central axis line and spaced apart from each other along the first direction, wherein the point P1 and the point P2 are arranged to be symmetric with each other with respect to the central axis line and the point Q1 and the point Q2 are arranged to be symmetric with each other with respect to the central axis line and when a dimension from the point P1 to the point Q1 is X1, a dimension from the point P2 to the point Q2 is X2, and a design value is αx, as described in paragraph of the description, the deposition mask satisfies the following, α x − X 1 + X 2 2 ≤ 40 μm X 1 − X 2 ≤ 60 μm wherein the deposition mask comprises: a first ear portion and a second ear portion that form a pair of end portions in the first direction; a plurality of through-holes provided between the first ear portion and the second ear portion; and a first side edge and a second side edge that form a pair of side edges in the second direction perpendicular to the first direction, wherein the point P1 and the point P2 are formed on a side closest to the first ear portion and are positioned at center points of corresponding through-holes, the point Q1 and the point Q2 are formed on a side closest to the second ear portion and are positioned at center points of corresponding through-holes, the through-holes corresponding to the point P1 and the point Q1 are formed on a side closest to the first side edge, and the through-holes corresponding to the point P2 and point Q2 are formed on a side closest to the second side edge. a central axis line extending in the first direction and arranged at a central position in a second direction orthogonal to the first direction; a point P1 and a point Q1 provided on one side of the central axis line and spaced apart from each other along the first direction; and a point P2 and a point Q2 provided on the other side of the central axis line and spaced apart from each other along the first direction, wherein the point P1 and the point P2 are arranged to be symmetric with each other with respect to the central axis line and the point Q1 and the point Q2 are arranged to be symmetric with each other with respect to the central axis line and when a dimension from the point P1 to the point Q1 is X1, a dimension from the point P2 to the point Q2 is X2, and a design value is αx, as described in paragraph of the description, the deposition mask satisfies the following, α x − X 1 + X 2 2 ≤ 40 μm X 1 − X 2 ≤ 60 μm wherein the deposition mask comprises: a first ear portion and a second ear portion that form a pair of end portions in the first direction; a plurality of through-holes provided between the first ear portion and the second ear portion; and a first side edge and a second side edge that form a pair of side edges in the second direction perpendicular to the first direction, wherein the point P1 and the point P2 are formed on a side closest to the first ear portion and are positioned at center points of corresponding through-holes, the point Q1 and the point Q2 are formed on a side closest to the second ear portion and are positioned at center points of corresponding through-holes, the through-holes corresponding to the point P1 and the point Q1 are formed on a side closest to the first side edge, and the through-holes corresponding to the point P2 and point Q2 are formed on a side closest to the second side edge. a first ear portion and a second ear portion that form a pair of end portions in the first direction; a plurality of through-holes provided between the first ear portion and the second ear portion; and a first side edge and a second side edge that form a pair of side edges in the second direction perpendicular to the first direction, the point P1 and the point P2 are formed on a side closest to the first ear portion and are positioned at center points of corresponding through-holes, the point Q1 and the point Q2 are formed on a side closest to the second ear portion and are positioned at center points of corresponding through-holes, the through-holes corresponding to the point P1 and the point Q1 are formed on a side closest to the first side edge, and the through-holes corresponding to the point P2 and point Q2 are formed on a side closest to the second side edge.