An exposure apparatus for exposing a substrate by exposure light via a liquid, comprising: a projection optical system; a reference frame which supports the projection optical system; an apparatus frame which supports the reference frame; a vibration isolator disposed between the reference frame and the apparatus frame; a substrate stage which is movable below an optical member while holding the substrate; a controller for controlling the operation of the exposure apparatus including the movement of the substrate stage; and a liquid immersion member for forming a liquid immersion space on the substrate so that an optical path of exposure light emitted from an emitting surface of the optical member is filled with liquid, the liquid immersion member comprising: a first member that is disposed at at least a portion of a surrounding of the optical member and that comprises a first lower surface; a second member that is disposed at at least a portion of a surrounding of the optical path below the first member, that comprises a second upper surface which faces the first lower surface via a gap and a second lower surface to which the substrate is able to face, and that is movable with respect to the first member; and a recovery part that is disposed at outside of the first lower surface with respect to the optical path for performing liquid recovery from a space between the first member and the second member, wherein the controller is configured to move the second member with respect to the first member so that the relative movement between the second member and the substrate is decreased, wherein the exposure apparatus further comprises a support member connected to the second member and a driving apparatus configured to move the support member, and wherein the driving apparatus is supported by the apparatus frame. a projection optical system; a reference frame which supports the projection optical system; an apparatus frame which supports the reference frame; a vibration isolator disposed between the reference frame and the apparatus frame; a substrate stage which is movable below an optical member while holding the substrate; a controller for controlling the operation of the exposure apparatus including the movement of the substrate stage; and a liquid immersion member for forming a liquid immersion space on the substrate so that an optical path of exposure light emitted from an emitting surface of the optical member is filled with liquid, the liquid immersion member comprising: a first member that is disposed at at least a portion of a surrounding of the optical member and that comprises a first lower surface; a second member that is disposed at at least a portion of a surrounding of the optical path below the first member, that comprises a second upper surface which faces the first lower surface via a gap and a second lower surface to which the substrate is able to face, and that is movable with respect to the first member; and a recovery part that is disposed at outside of the first lower surface with respect to the optical path for performing liquid recovery from a space between the first member and the second member, a first member that is disposed at at least a portion of a surrounding of the optical member and that comprises a first lower surface; a second member that is disposed at at least a portion of a surrounding of the optical path below the first member, that comprises a second upper surface which faces the first lower surface via a gap and a second lower surface to which the substrate is able to face, and that is movable with respect to the first member; and a recovery part that is disposed at outside of the first lower surface with respect to the optical path for performing liquid recovery from a space between the first member and the second member, wherein the controller is configured to move the second member with respect to the first member so that the relative movement between the second member and the substrate is decreased, wherein the exposure apparatus further comprises a support member connected to the second member and a driving apparatus configured to move the support member, and wherein the driving apparatus is supported by the apparatus frame.