A method for fabricating an anode on a pre-treated porous metal substrate the method comprising the steps of: providing a porous metal substrate (10, 103), wherein the porous metal substrate (10,103) is mainly composed of Ni, a first powder of redox stable perovskite material, and a second powder of oxide mixture capable of conducting both electron and oxygen ion after converted to a cermet mixture by hydrogen reduction; sieving the first and second powders into groups according to the sizes thereof; applying a pre-treatment process to the porous metal substrate (10, 103),, wherein the pre-treatment process further includes: (a) eroding the porous metal substrate (10, 103) in an acid; (b) impregnating the porous metal substrate (10, 103) with an Fe-contained material by a vacuum means, and then sintering the porous metal substrate (10, 103) in a 1150∼1350°C hydrogen reduced or vacuum atmosphere, wherein the amount of Fe in the porous metal substrate (10, 103) is 6 ∼ 15 wt%; (c) forming a first porous surface film of nickel powder on the porous metal substrate (10, 103) and a second porous surface film of nickel-YSZ powder on the first porous surface film; and sintering the porous metal substrate in a 1250∼1400°C reduced or vacuum atmosphere, (d) repeat (a) until gas-permeability of the porous metal substrate is 1.974 x 10 -12 to 4.935 x 10 -12 m 2 (2 to 5 Darcy) and the size of the surface holes on the porous metal substrate is less than 50 μm; and (e) oxidizing surface of the porous metal substrate; wherein after the pre-treatment process comprising steps (a) to (e) and hydrogen reduction, the pre-treated porous metal substrate has constituent powder particles containing porous shells of fine Fe and Ni particles on the surfaces of the constituent powder particles of the porous metal substrate; forming a first anode functional layer of the first powder on the pretreated porous metal substrate by using a high-voltage high-enthalpy Ar-He-H 2 -N 2 atmospheric-pressure plasma spraying; and forming a second anode functional layer of the second powder on the first anode functional layer by a high-voltage high-enthalpy Ar-He-H 2 -N 2 atmospheric-pressure plasma spraying and hydrogen reduction. providing a porous metal substrate (10, 103), wherein the porous metal substrate (10,103) is mainly composed of Ni, a first powder of redox stable perovskite material, and a second powder of oxide mixture capable of conducting both electron and oxygen ion after converted to a cermet mixture by hydrogen reduction; sieving the first and second powders into groups according to the sizes thereof; applying a pre-treatment process to the porous metal substrate (10, 103),, wherein the pre-treatment process further includes: (a) eroding the porous metal substrate (10, 103) in an acid; (b) impregnating the porous metal substrate (10, 103) with an Fe-contained material by a vacuum means, and then sintering the porous metal substrate (10, 103) in a 1150∼1350°C hydrogen reduced or vacuum atmosphere, wherein the amount of Fe in the porous metal substrate (10, 103) is 6 ∼ 15 wt%; (c) forming a first porous surface film of nickel powder on the porous metal substrate (10, 103) and a second porous surface film of nickel-YSZ powder on the first porous surface film; and sintering the porous metal substrate in a 1250∼1400°C reduced or vacuum atmosphere, (d) repeat (a) until gas-permeability of the porous metal substrate is 1.974 x 10 -12 to 4.935 x 10 -12 m 2 (2 to 5 Darcy) and the size of the surface holes on the porous metal substrate is less than 50 μm; and (e) oxidizing surface of the porous metal substrate; wherein after the pre-treatment process comprising steps (a) to (e) and hydrogen reduction, the pre-treated porous metal substrate has constituent powder particles containing porous shells of fine Fe and Ni particles on the surfaces of the constituent powder particles of the porous metal substrate; (a) eroding the porous metal substrate (10, 103) in an acid; (b) impregnating the porous metal substrate (10, 103) with an Fe-contained material by a vacuum means, and then sintering the porous metal substrate (10, 103) in a 1150∼1350°C hydrogen reduced or vacuum atmosphere, wherein the amount of Fe in the porous metal substrate (10, 103) is 6 ∼ 15 wt%; (c) forming a first porous surface film of nickel powder on the porous metal substrate (10, 103) and a second porous surface film of nickel-YSZ powder on the first porous surface film; and sintering the porous metal substrate in a 1250∼1400°C reduced or vacuum atmosphere, (d) repeat (a) until gas-permeability of the porous metal substrate is 1.974 x 10 -12 to 4.935 x 10 -12 m 2 (2 to 5 Darcy) and the size of the surface holes on the porous metal substrate is less than 50 μm; and (e) oxidizing surface of the porous metal substrate; wherein after the pre-treatment process comprising steps (a) to (e) and hydrogen reduction, the pre-treated porous metal substrate has constituent powder particles containing porous shells of fine Fe and Ni particles on the surfaces of the constituent powder particles of the porous metal substrate; forming a first anode functional layer of the first powder on the pretreated porous metal substrate by using a high-voltage high-enthalpy Ar-He-H 2 -N 2 atmospheric-pressure plasma spraying; and forming a second anode functional layer of the second powder on the first anode functional layer by a high-voltage high-enthalpy Ar-He-H 2 -N 2 atmospheric-pressure plasma spraying and hydrogen reduction.