A substrate for an organic electronic device comprising: a light transmitting base layer; a scattering layer disposed on the light transmitting base layer comprising a pattern of anisotropic nanostructures having an aspect ratio in the range of 1.2 to 30, and an overcoat layer which is present on an upper part of the pattern of anisotropic nanostructures; and an electrode layer formed on the scattering layer, wherein an area occupied by the anisotropic nanostructures accounts for 20 to 70 % with respect an entire area of the scattering layer when observed from an upper side, wherein the overcoat layer has a refractive index in the range of 1.2 to 3.5 and comprises a polysiloxane, a polyamic acid, or a polyimide, wherein the anisotropic nanostructure has a refractive index higher than the overcoat layer, wherein a difference in the refractive indexes of the anisotropic nanostructure and the overcoat layer is in the range of 0.2 to 2.0; and wherein the aspect ratio is the ratio L/D of a largest dimension L of dimensions of the anisotropic nanostructure to a dimension D of the anisotropic nanostructure defined in a direction perpendicular to a direction in which the largest dimension L is defined, wherein the base layer comprises a glass base layer or a transparent polymer base layer, wherein the anisotropic nanostructure comprises a material selected from zinc oxide, zirconia, titania, silicon nitride, silicon nitride oxide, barium oxide, alumina or vanadium pentoxide, wherein the anisotropic nanostructures are columns which are formed by depositing a layer of the material on the base layer and etching at least a portion of the layer of the material, and wherein the plurality of anisotropic nanostructures are randomly disposed on the base layer, characterized in that the overcoat layer further comprises refractive particles having a refractive index of 2.0 or more and in that the anisotropic nanostructure has a refractive index of 1.7 or more. a light transmitting base layer; a scattering layer disposed on the light transmitting base layer comprising a pattern of anisotropic nanostructures having an aspect ratio in the range of 1.2 to 30, and an overcoat layer which is present on an upper part of the pattern of anisotropic nanostructures; and an electrode layer formed on the scattering layer, wherein an area occupied by the anisotropic nanostructures accounts for 20 to 70 % with respect an entire area of the scattering layer when observed from an upper side, wherein the overcoat layer has a refractive index in the range of 1.2 to 3.5 and comprises a polysiloxane, a polyamic acid, or a polyimide, wherein the anisotropic nanostructure has a refractive index higher than the overcoat layer, wherein a difference in the refractive indexes of the anisotropic nanostructure and the overcoat layer is in the range of 0.2 to 2.0; and wherein the aspect ratio is the ratio L/D of a largest dimension L of dimensions of the anisotropic nanostructure to a dimension D of the anisotropic nanostructure defined in a direction perpendicular to a direction in which the largest dimension L is defined, wherein the base layer comprises a glass base layer or a transparent polymer base layer, wherein the anisotropic nanostructure comprises a material selected from zinc oxide, zirconia, titania, silicon nitride, silicon nitride oxide, barium oxide, alumina or vanadium pentoxide, wherein the anisotropic nanostructures are columns which are formed by depositing a layer of the material on the base layer and etching at least a portion of the layer of the material, and wherein the plurality of anisotropic nanostructures are randomly disposed on the base layer,