A wiping composition for disinfecting surfaces with reduced streaking, the wiping composition comprising an aqueous solution containing - an antimicrobial agent and - a residue reducing surfactant, wherein the antimicrobial agent is a halide salt or a carbonate/bicarbonate salt of a quaternary ammonium cation selected from the group consisting of an alkyl dimethyl benzyl ammonium, a dialkyl dimethyl ammonium, an alkyl dimethyl ethyl benzyl ammonium, and mixtures thereof, wherein the residue reducing surfactant a) has the following formula: wherein R2 comprises an alkyl group having up to 20 carbon atoms; or b) is selected from the group consisting of decyl betaine, myristyl betaine, palmityl betaine, lauryl betaine, cetyl betaine, stearyl betaine, coco dimethyl carboxymethyl betaine ("cocobetaine"), cocoamidoethyl betaine, cocoamidopropyl betaine, lauramidopropyl betaine, myristyl amidopropyl betaine, lauryl dimethyl carboxymethyl betaine, lauryl dimethyl alpha-carboxy-ethyl betaine, cetyl dimethylcarboxymethyl betaine, lauryl bis-(2-hydroxy-ethyl) carboxy methyl betaine, stearyl bis-(2-hydroxypropyl) carboxymethylbetaine, oleyl dimethyl gamma-carboxypropyl betaine, lauryl bis-(2-hydroxypropyl) alpha-carboxyethyl betaine, cocoamidopropyl dimethyl betaine, and mixtures thereof; or c) is a polymeric betaine having the following formula: and wherein the antimicrobial agent is present in the wiping composition in relation to the residue reducing surfactant at a weight ratio of from about 1:0.9 to about 1:3, and wherein the wiping composition has a pH of greater than about 8; and wherein the composition is free of alkyl polyglycoside and amine oxide surfactants. - an antimicrobial agent and - a residue reducing surfactant, wherein the antimicrobial agent is a halide salt or a carbonate/bicarbonate salt of a quaternary ammonium cation selected from the group consisting of an alkyl dimethyl benzyl ammonium, a dialkyl dimethyl ammonium, an alkyl dimethyl ethyl benzyl ammonium, and mixtures thereof, wherein the residue reducing surfactant a) has the following formula: wherein R2 comprises an alkyl group having up to 20 carbon atoms; or b) is selected from the group consisting of decyl betaine, myristyl betaine, palmityl betaine, lauryl betaine, cetyl betaine, stearyl betaine, coco dimethyl carboxymethyl betaine ("cocobetaine"), cocoamidoethyl betaine, cocoamidopropyl betaine, lauramidopropyl betaine, myristyl amidopropyl betaine, lauryl dimethyl carboxymethyl betaine, lauryl dimethyl alpha-carboxy-ethyl betaine, cetyl dimethylcarboxymethyl betaine, lauryl bis-(2-hydroxy-ethyl) carboxy methyl betaine, stearyl bis-(2-hydroxypropyl) carboxymethylbetaine, oleyl dimethyl gamma-carboxypropyl betaine, lauryl bis-(2-hydroxypropyl) alpha-carboxyethyl betaine, cocoamidopropyl dimethyl betaine, and mixtures thereof; or c) is a polymeric betaine having the following formula: and wherein the antimicrobial agent is present in the wiping composition in relation to the residue reducing surfactant at a weight ratio of from about 1:0.9 to about 1:3, and wherein the wiping composition has a pH of greater than about 8; and wherein the composition is free of alkyl polyglycoside and amine oxide surfactants. a) has the following formula: wherein R2 comprises an alkyl group having up to 20 carbon atoms; or b) is selected from the group consisting of decyl betaine, myristyl betaine, palmityl betaine, lauryl betaine, cetyl betaine, stearyl betaine, coco dimethyl carboxymethyl betaine ("cocobetaine"), cocoamidoethyl betaine, cocoamidopropyl betaine, lauramidopropyl betaine, myristyl amidopropyl betaine, lauryl dimethyl carboxymethyl betaine, lauryl dimethyl alpha-carboxy-ethyl betaine, cetyl dimethylcarboxymethyl betaine, lauryl bis-(2-hydroxy-ethyl) carboxy methyl betaine, stearyl bis-(2-hydroxypropyl) carboxymethylbetaine, oleyl dimethyl gamma-carboxypropyl betaine, lauryl bis-(2-hydroxypropyl) alpha-carboxyethyl betaine, cocoamidopropyl dimethyl betaine, and mixtures thereof; or c) is a polymeric betaine having the following formula: and wherein the antimicrobial agent is present in the wiping composition in relation to the residue reducing surfactant at a weight ratio of from about 1:0.9 to about 1:3, and wherein the wiping composition has a pH of greater than about 8; and wherein the composition is free of alkyl polyglycoside and amine oxide surfactants. wherein the antimicrobial agent is present in the wiping composition in relation to the residue reducing surfactant at a weight ratio of from about 1:0.9 to about 1:3, and wherein the wiping composition has a pH of greater than about 8; and wherein the composition is free of alkyl polyglycoside and amine oxide surfactants.