A method for replicating a nanopillared surface, the method comprising: providing a nanomask prepared by: applying a polymer solution to the nanomask-substrate surface of the nanomask substrate, the polymer solution comprising: an amphiphilic block copolymer having hydrophobic blocks and hydrophilic blocks; a hydrophilic homopolymer that is chemically compatible with the hydrophilic blocks of the amphiphilic block copolymer; and an application solvent; removing the application solvent to cause the amphiphilic block copolymer and the hydrophilic homopolymer in the polymer solution to self-assemble on the nanomask substrate surface to form the self-assembled polymer layer defining the template surface opposite the nanomask substrate surface, the self-assembled polymer layer having hydrophobic domains adjacent to the nano mask substrate surface and hydrophilic domains, the hydrophilic domains extending into the self- assembled polymer layer from the template surface; and removing at least a portion of the hydrophilic domains to form the plurality of pores in the self-assembled polymer layer with openings at the template surface; applying a nanopillar-forming material to at least one replica-substrate surface of a replica substrate to form a precursor layer on the replica-substrate surface; contacting the template surface of the nanomask with the precursor layer; curing the precursor layer while the template surface remains in contact with the precursor layer to form a cured precursor layer between the template surface and the replica-substrate surface; removing the nanomask to expose a nanopillared surface comprising a plurality of nanopillars on the replica-substrate surface, the plurality of nanopillars on the replica-substrate surface corresponding to the plurality of pores in the template surface. providing a nanomask prepared by: applying a polymer solution to the nanomask-substrate surface of the nanomask substrate, the polymer solution comprising: an amphiphilic block copolymer having hydrophobic blocks and hydrophilic blocks; a hydrophilic homopolymer that is chemically compatible with the hydrophilic blocks of the amphiphilic block copolymer; and an application solvent; removing the application solvent to cause the amphiphilic block copolymer and the hydrophilic homopolymer in the polymer solution to self-assemble on the nanomask substrate surface to form the self-assembled polymer layer defining the template surface opposite the nanomask substrate surface, the self-assembled polymer layer having hydrophobic domains adjacent to the nano mask substrate surface and hydrophilic domains, the hydrophilic domains extending into the self- assembled polymer layer from the template surface; and removing at least a portion of the hydrophilic domains to form the plurality of pores in the self-assembled polymer layer with openings at the template surface; applying a polymer solution to the nanomask-substrate surface of the nanomask substrate, the polymer solution comprising: an amphiphilic block copolymer having hydrophobic blocks and hydrophilic blocks; a hydrophilic homopolymer that is chemically compatible with the hydrophilic blocks of the amphiphilic block copolymer; and an application solvent; an amphiphilic block copolymer having hydrophobic blocks and hydrophilic blocks; a hydrophilic homopolymer that is chemically compatible with the hydrophilic blocks of the amphiphilic block copolymer; and an application solvent; removing the application solvent to cause the amphiphilic block copolymer and the hydrophilic homopolymer in the polymer solution to self-assemble on the nanomask substrate surface to form the self-assembled polymer layer defining the template surface opposite the nanomask substrate surface, the self-assembled polymer layer having hydrophobic domains adjacent to the nano mask substrate surface and hydrophilic domains, the hydrophilic domains extending into the self- assembled polymer layer from the template surface; and removing at least a portion of the hydrophilic domains to form the plurality of pores in the self-assembled polymer layer with openings at the template surface; applying a nanopillar-forming material to at least one replica-substrate surface of a replica substrate to form a precursor layer on the replica-substrate surface; contacting the template surface of the nanomask with the precursor layer; curing the precursor layer while the template surface remains in contact with the precursor layer to form a cured precursor layer between the template surface and the replica-substrate surface; removing the nanomask to expose a nanopillared surface comprising a plurality of nanopillars on the replica-substrate surface, the plurality of nanopillars on the replica-substrate surface corresponding to the plurality of pores in the template surface.