A resist composition comprising at least: a polymer containing one or more repeating units having a structure shown by the following general formula and/or one or more repeating units having a structure shown by the following general formula, an alkaline-solubility of the polymer being increased by an acid, a photo acid generator generating, with responding to a high energy beam, a sulfonic acid shown by the following general formula, and an onium sulfonate shown by the following general formula; wherein, each R 1 and R 3 independently represents a hydrogen atom or a methyl group, and each R 2 and R 4 independently represents a linear, a branched, or a cyclic alkyl group having 1 to 7 carbon atoms and optionally containing an oxygen atom; wherein, R 5 represents a hydrogen atom or a trifluoromethyl group, R 6 represents a linear, a branched, or a cyclic alkyl group, substituted or unsubstituted, having 1 to 23 carbon atoms, or an aryl group, substituted or unsubstituted, having 6 to 14 carbon atoms; and wherein, R 7 represents a monovalent hydrocarbon group optionally containing a hetero atom, excluding the cases that R 7 represents a vinyl group and an isopropenyl group, n represents an integer of 1 to 3, and M + represents a counter cation having a substituent and is any of a sulfonium cation, an iodonium cation, and an ammonium cation. a polymer containing one or more repeating units having a structure shown by the following general formula and/or one or more repeating units having a structure shown by the following general formula, an alkaline-solubility of the polymer being increased by an acid, a photo acid generator generating, with responding to a high energy beam, a sulfonic acid shown by the following general formula, and an onium sulfonate shown by the following general formula; wherein, each R 1 and R 3 independently represents a hydrogen atom or a methyl group, and each R 2 and R 4 independently represents a linear, a branched, or a cyclic alkyl group having 1 to 7 carbon atoms and optionally containing an oxygen atom; wherein, R 5 represents a hydrogen atom or a trifluoromethyl group, R 6 represents a linear, a branched, or a cyclic alkyl group, substituted or unsubstituted, having 1 to 23 carbon atoms, or an aryl group, substituted or unsubstituted, having 6 to 14 carbon atoms; and wherein, R 7 represents a monovalent hydrocarbon group optionally containing a hetero atom, excluding the cases that R 7 represents a vinyl group and an isopropenyl group, n represents an integer of 1 to 3, and M + represents a counter cation having a substituent and is any of a sulfonium cation, an iodonium cation, and an ammonium cation. wherein, each R 1 and R 3 independently represents a hydrogen atom or a methyl group, and each R 2 and R 4 independently represents a linear, a branched, or a cyclic alkyl group having 1 to 7 carbon atoms and optionally containing an oxygen atom; wherein, R 5 represents a hydrogen atom or a trifluoromethyl group, R 6 represents a linear, a branched, or a cyclic alkyl group, substituted or unsubstituted, having 1 to 23 carbon atoms, or an aryl group, substituted or unsubstituted, having 6 to 14 carbon atoms; and wherein, R 7 represents a monovalent hydrocarbon group optionally containing a hetero atom, excluding the cases that R 7 represents a vinyl group and an isopropenyl group, n represents an integer of 1 to 3, and M + represents a counter cation having a substituent and is any of a sulfonium cation, an iodonium cation, and an ammonium cation.