mhurhangee/ep-ind-claims huggingface dataset:
A method of detecting logos in a video content comprising: generating a heatmap of logos detected in a first set of frames in a video sequence of said video content, wherein the heatmap is an image that has the same size as a frame of the video sequence, wherein each pixel of the heatmap is an accumulator which is increased by a constant value when a logo is detected at the pixel position in a frame of said first set of frames; identifying a first logo type where accumulators in the heatmap exceed a threshold value; determining a first bounding box in the heatmap surrounding said logo of the first logo type; detecting a logo in a current frame in the video sequence, wherein the current frame is not in the first set of frames; determining a second bounding box surrounding the logo of the current frame; determining whether the logo for the current frame matches the position of the logo of the first logo type by comparing the first bounding box to the second bounding box to determine whether the first bounding box overlaps the second bounding box by at least an overlap threshold; and providing to an encoding system the determination of whether the logo for the current frame matches the position of the logo of the first logo type. generating a heatmap of logos detected in a first set of frames in a video sequence of said video content, wherein the heatmap is an image that has the same size as a frame of the video sequence, wherein each pixel of the heatmap is an accumulator which is increased by a constant value when a logo is detected at the pixel position in a frame of said first set of frames; identifying a first logo type where accumulators in the heatmap exceed a threshold value; determining a first bounding box in the heatmap surrounding said logo of the first logo type; detecting a logo in a current frame in the video sequence, wherein the current frame is not in the first set of frames; determining a second bounding box surrounding the logo of the current frame; determining whether the logo for the current frame matches the position of the logo of the first logo type by comparing the first bounding box to the second bounding box to determine whether the first bounding box overlaps the second bounding box by at least an overlap threshold; and providing to an encoding system the determination of whether the logo for the current frame matches the position of the logo of the first logo type.
An information processing apparatus comprising: a communication unit configured to receive a plurality of Universal Plug and Play (UPnP) descriptions from a plurality of terminal devices, the UPnP descriptions comprising grouping information indicating one or more groups to which the terminal devices belong; and a processing unit configured to: process the UPnP descriptions; and assign the terminal devices to the one or more groups based on the grouping information, wherein the UPnP descriptions are device descriptions or service descriptions, and wherein the processing unit is configured to assign a first terminal device and a second terminal device of the terminal devices, to a first group, the information processing apparatus further comprising: a managing unit configured to: receive, from the first terminal device, a notification indicating one of a creation or a modification of content by the first terminal device; generate an event message indicating the notification; and supply the event message to the second terminal device. a communication unit configured to receive a plurality of Universal Plug and Play (UPnP) descriptions from a plurality of terminal devices, the UPnP descriptions comprising grouping information indicating one or more groups to which the terminal devices belong; and a processing unit configured to: process the UPnP descriptions; and assign the terminal devices to the one or more groups based on the grouping information, wherein the UPnP descriptions are device descriptions or service descriptions, and wherein the processing unit is configured to assign a first terminal device and a second terminal device of the terminal devices, to a first group, the information processing apparatus further comprising: process the UPnP descriptions; and assign the terminal devices to the one or more groups based on the grouping information, wherein the UPnP descriptions are device descriptions or service descriptions, and wherein the processing unit is configured to assign a first terminal device and a second terminal device of the terminal devices, to a first group, the information processing apparatus further comprising: a managing unit configured to: receive, from the first terminal device, a notification indicating one of a creation or a modification of content by the first terminal device; generate an event message indicating the notification; and supply the event message to the second terminal device. receive, from the first terminal device, a notification indicating one of a creation or a modification of content by the first terminal device; generate an event message indicating the notification; and supply the event message to the second terminal device.
A method of manufacturing a wing tip device of an aircraft, wherein the wing tip device comprises a unitized, monolithic leading edge torque box formed of polymer matrix fiber-reinforced material, wherein the leading edge torque box includes a skin defining a continuous, uninterrupted outer mold line, OML, surface extending aftwardly from a winglet leading edge by a distance of approximately 60% or more of a local chord length of the wing tip device such that airflow over the OML surface is maintained in a laminar state over a distance from the winglet leading edge of at least approximately 60% of the local chord length, and wherein the leading edge torque box includes at least one internal component extending between opposing inner surfaces of the skin, the method comprising: forming the leading edge torque box as a co-cured assembly using inner mold line, IML, tools including a pair of rigid soluble mandrels which expand upon heating such that the mandrels compact the skin against an OML tool surface while simultaneously compacting the at least one internal component which is positioned between the pair of soluble mandrels; and removing the rigid soluble mandrels by solubilization. forming the leading edge torque box as a co-cured assembly using inner mold line, IML, tools including a pair of rigid soluble mandrels which expand upon heating such that the mandrels compact the skin against an OML tool surface while simultaneously compacting the at least one internal component which is positioned between the pair of soluble mandrels; and removing the rigid soluble mandrels by solubilization.
A system for locating and reporting at least one condition of each of a plurality of objects within a harsh radio frequency environment resulting in RF signal reflection, signal attenuation and/or signal blockage, comprising: a portable, ultra-wideband pulse signal generator movable to the location of each of the objects and operative for transmitting UWB pulse signals reporting a condition of the object at the location, the UWB pulse signals having leading edges and having a spectrum spread in the range 3.1 to 10.6 GHz; a group of UWB radios, the group comprising a number of UWB radios above a minimum required for performing time delay of arrival processing, at multiple positions within the harsh environment for receiving the transmitted UWB pulse signals from the pulse signal generator, and for generating measurements related to the position of the pulse signal generator based on the received UWB pulse signals by measuring the time difference of arrival of the UWB pulse signals at each of the multiple positions and using leading edge algorithms to compensate for measurement bias introduced as a result of lack of line of sight between the pulse signal generator and one of the UWB radios and to identify the particular UWB radio which is not within line of sight of the pulse signal generator; a processor for calculating the three-dimensional position of the pulse signal generator using the measurements generated by the UWB radios; and a system for displaying an image of the object whose condition is being reported by the pulse signal generator, and for displaying the reported condition of the object. a portable, ultra-wideband pulse signal generator movable to the location of each of the objects and operative for transmitting UWB pulse signals reporting a condition of the object at the location, the UWB pulse signals having leading edges and having a spectrum spread in the range 3.1 to 10.6 GHz; a group of UWB radios, the group comprising a number of UWB radios above a minimum required for performing time delay of arrival processing, at multiple positions within the harsh environment for receiving the transmitted UWB pulse signals from the pulse signal generator, and for generating measurements related to the position of the pulse signal generator based on the received UWB pulse signals by measuring the time difference of arrival of the UWB pulse signals at each of the multiple positions and using leading edge algorithms to compensate for measurement bias introduced as a result of lack of line of sight between the pulse signal generator and one of the UWB radios and to identify the particular UWB radio which is not within line of sight of the pulse signal generator; a processor for calculating the three-dimensional position of the pulse signal generator using the measurements generated by the UWB radios; and a system for displaying an image of the object whose condition is being reported by the pulse signal generator, and for displaying the reported condition of the object.
Chemical-mechanical polishing composition for polishing of substrates comprising a surface region or layer consisting of copper or a copper-based alloy, said chemical-mechanical composition comprising an amount of abrasive particles consisting of an amount of composite particles wherein each composite particle comprises (i) a continuous matrix phase comprising an addition polymer of one or more ethylenically unsaturated monomers and dispersed in said continuous matrix phase (ii) a dispersed phase consisting of a plurality of divided phase domains consisting of silicon dioxide optionally an amount of further abrasive particles which are not composite particles one or more complexing agents selected from the group consisting of organic acids and inorganic acids; one or more corrosion inhibitors selected from the group consisting of azoles; one or more oxidizing agents selected from the group consisting of peroxides, persulfates, perchlorates, perbromates, periodates and permanganates; and water, wherein each of the said discrete domains is completely enveloped by said matrix phase. an amount of abrasive particles consisting of an amount of composite particles wherein each composite particle comprises (i) a continuous matrix phase comprising an addition polymer of one or more ethylenically unsaturated monomers and dispersed in said continuous matrix phase (ii) a dispersed phase consisting of a plurality of divided phase domains consisting of silicon dioxide optionally an amount of further abrasive particles which are not composite particles an amount of composite particles wherein each composite particle comprises (i) a continuous matrix phase comprising an addition polymer of one or more ethylenically unsaturated monomers and dispersed in said continuous matrix phase (ii) a dispersed phase consisting of a plurality of divided phase domains consisting of silicon dioxide (i) a continuous matrix phase comprising an addition polymer of one or more ethylenically unsaturated monomers and dispersed in said continuous matrix phase (ii) a dispersed phase consisting of a plurality of divided phase domains consisting of silicon dioxide optionally an amount of further abrasive particles which are not composite particles one or more complexing agents selected from the group consisting of organic acids and inorganic acids; one or more corrosion inhibitors selected from the group consisting of azoles; one or more oxidizing agents selected from the group consisting of peroxides, persulfates, perchlorates, perbromates, periodates and permanganates; and water,
A sample chamber assembly for molten metal, the sample chamber assembly comprising: - a cover plate and a housing, wherein the housing includes: - an immersion end having a first opening for a molten metal inflow conduit and an opposing end; and - a first face extending between the immersion end and the opposing end, the first face having a depression extending from proximate the immersion end toward the opposing end, the depression being in direct flow communication with the first opening and configured to receive the molten metal from the inflow conduit, - wherein the cover plate and the housing are configured to be assembled together along a first plane to form a sample cavity including the depression, such that an analysis surface of a solidified metal sample formed within the sample cavity lies in the first plane, - wherein the sample cavity and the first opening are aligned along a common longitudinal axis, and - wherein the first opening is spaced apart from the first plane, characterized in that - a ratio of the thermal diffusivity of the solidified metal sample to the thermal diffusivity of a material forming the housing is between 0.1 and 0.5, and - the housing is configured to be inseparable from the solidified metal sample and at least a portion of the housing is directly adjacent to the solidified metal sample and lies in the first plane. - a cover plate and a housing, wherein the housing includes: - an immersion end having a first opening for a molten metal inflow conduit and an opposing end; and - a first face extending between the immersion end and the opposing end, the first face having a depression extending from proximate the immersion end toward the opposing end, the depression being in direct flow communication with the first opening and configured to receive the molten metal from the inflow conduit, - wherein the cover plate and the housing are configured to be assembled together along a first plane to form a sample cavity including the depression, such that an analysis surface of a solidified metal sample formed within the sample cavity lies in the first plane, - wherein the sample cavity and the first opening are aligned along a common longitudinal axis, and - wherein the first opening is spaced apart from the first plane, characterized in that - a ratio of the thermal diffusivity of the solidified metal sample to the thermal diffusivity of a material forming the housing is between 0.1 and 0.5, and - the housing is configured to be inseparable from the solidified metal sample and at least a portion of the housing is directly adjacent to the solidified metal sample and lies in the first plane.
Double-effect hydraulic actuating cylinder assembly, particularly for hydraulic steering devices in particular for marine outboard motors, comprising a cylinder, at least one rod, one bracket and an idler arm, which cylinder is slidably fitted on the at least one rod coaxial to said cylinder, or vice versa, which rod sealingly projects out of at least one head of the actuating cylinder and it carries a separating piston which divides the cylinder into two variable volume chambers (11, 12), each of which two chambers (11, 12) has at least one hydraulic fluid inlet/outlet, and a sealing head for mutually sliding cylinder and rod which sealing head is connected to the cylinder, said rod being connected to said bracket for fastening said cylinder, at least one of said sealing heads being composed of two separate elements, of which a sealing element and a plug element, said idler arm being connected to said plug element, said sealing element being sealingly fitted into one of said two variable-volume chambers (11, 12), said sealing element engaging the inner side walls of said chamber (11, 12), said plug element being placed at the end parts of said cylinder, such to prevent said sealing element from sliding and said sealing element and said plug element being coaxial with respect to said rod, characterized in that said plug element is symmetric with respect to a plane perpendicular to the axis of the cylinder.
A method for manufacturing a light emitting diode structure, comprising: applying an anisotropic etchant to a surface of a silicon substrate, the silicon substrate having a Si(1,0,0) lattice orientation at the surface; forming an indentation on the Si(1,0,0) surface of the substrate with the applied anisotropic etchant, the indentation being defined by first and second planes with a Si(1,1,1) lattice orientation; and forming a light emitting diode structure on the first and second Si(1,1,1) planes of the indentation, wherein forming the light emitting diode structure includes depositing an N-type GaN material, an InGaN material, and a P-type GaN material on the first and second Si(1,1,1) planes in sequence, wherein the N-type GaN material is coalesced on the first and second Si(1,1,1) planes during deposition such that the N-type GaN material has a thickness that is not constant such that it has a planar surface opposite the substrate so as to reduce a dislocation density in the N-type GaN material, wherein the InGaN material and P-type GaN material have planar surfaces, wherein the first and second Si(1,1,1) planes extend from the Si(1,0,0) surface of the substrate towards the substrate and intercept each other at a junction to form a zigzag pattern, and wherein the N-type GaN material is directly deposited on the first and second Si(1,1,1) planes. applying an anisotropic etchant to a surface of a silicon substrate, the silicon substrate having a Si(1,0,0) lattice orientation at the surface; forming an indentation on the Si(1,0,0) surface of the substrate with the applied anisotropic etchant, the indentation being defined by first and second planes with a Si(1,1,1) lattice orientation; and forming a light emitting diode structure on the first and second Si(1,1,1) planes of the indentation, wherein forming the light emitting diode structure includes depositing an N-type GaN material, an InGaN material, and a P-type GaN material on the first and second Si(1,1,1) planes in sequence, wherein the N-type GaN material is coalesced on the first and second Si(1,1,1) planes during deposition such that the N-type GaN material has a thickness that is not constant such that it has a planar surface opposite the substrate so as to reduce a dislocation density in the N-type GaN material, wherein the InGaN material and P-type GaN material have planar surfaces, wherein the first and second Si(1,1,1) planes extend from the Si(1,0,0) surface of the substrate towards the substrate and intercept each other at a junction to form a zigzag pattern, and wherein the N-type GaN material is directly deposited on the first and second Si(1,1,1) planes.
An electrode (100, 300) for a secondary battery comprising: a current collector (110, 310) having an electrode tab (111, 311) protruding outward to at least one outer peripheral side thereof; an electrode mixture layer (120, 320) formed on the current collector; and an electrode protecting layer (130, 330) applied on the electrode mixture layer, wherein the electrode protecting layer (130, 330) includes a conductive material and a binder to supplement conductivity of the electrode mixture layer (120, 320) and prevent separation of the electrode mixture layer (120, 320) from the current collector (110, 310), characterized in that a thickness of the electrode protecting layer (130, 330) is continuously or discontinuously thickened corresponding to a separation distance from the electrode tab (111, 311) and in that a thickness of the electrode protecting layer on the electrode mixture layer (120, 320) at the maximum separation distance from the electrode tab (111, 311) is in a range of 101% to 110% of a thickness of the electrode protecting layer (130, 330) on the electrode mixture layer (120, 320) at the minimum distance from the electrode tab (111, 311). a current collector (110, 310) having an electrode tab (111, 311) protruding outward to at least one outer peripheral side thereof; an electrode mixture layer (120, 320) formed on the current collector; and an electrode protecting layer (130, 330) applied on the electrode mixture layer, wherein the electrode protecting layer (130, 330) includes a conductive material and a binder to supplement conductivity of the electrode mixture layer (120, 320) and prevent separation of the electrode mixture layer (120, 320) from the current collector (110, 310), characterized in that a thickness of the electrode protecting layer (130, 330) is continuously or discontinuously thickened corresponding to a separation distance from the electrode tab (111, 311) and in that a thickness of the electrode protecting layer on the electrode mixture layer (120, 320) at the maximum separation distance from the electrode tab (111, 311) is in a range of 101% to 110% of a thickness of the electrode protecting layer (130, 330) on the electrode mixture layer (120, 320) at the minimum distance from the electrode tab (111, 311).
Ventilation flap for switching systems characterized in that • the ventilation flap has a first ventilation flap element and at least one second ventilation flap element, • the first ventilation flap element has first ventilation slits, • the second ventilation flap element has second ventilation slits, • in a first position of the ventilation flap ∘ the first ventilation slits are closed off by the second ventilation flap element, and ∘ the second ventilation slits are closed off by the first ventilation flap element, • and in that in a second position of the ventilation flap ∘ the first ventilation slits are not closed off by the second ventilation flap element, and ∘ the second ventilation slits are not closed off by the first ventilation flap element. • the ventilation flap has a first ventilation flap element and at least one second ventilation flap element, • the first ventilation flap element has first ventilation slits, • the second ventilation flap element has second ventilation slits, • in a first position of the ventilation flap ∘ the first ventilation slits are closed off by the second ventilation flap element, and ∘ the second ventilation slits are closed off by the first ventilation flap element, ∘ the first ventilation slits are closed off by the second ventilation flap element, and ∘ the second ventilation slits are closed off by the first ventilation flap element, • and in that in a second position of the ventilation flap ∘ the first ventilation slits are not closed off by the second ventilation flap element, and ∘ the second ventilation slits are not closed off by the first ventilation flap element. ∘ the first ventilation slits are not closed off by the second ventilation flap element, and ∘ the second ventilation slits are not closed off by the first ventilation flap element.