An imprint lithography system comprising: a template with a mold, a substrate, with the mold configured to generate a pattern in the substrate, a polymeric fluid dispensing system, a source of actinic radiation, a system to determine relative spatial parameters between first and second coordinate systems, said system comprising: an analysis system to sense relative alignment between said two coordinate systems at multiple points and determine relative spatial parameters therebetween, with said relative spatial parameters including a relative area and a relative shape, wherein: said first coordinate system is defined by a first set of gratings, periodic along a first direction, and said second coordinate system is defined by a second set of gratings, periodic in two orthogonal directions, in superimposition with said first set of gratings, the first coordinate system is defined on the template and the second is defined on the substrate, and said analysis system further includes a plurality of detection systems (70, 80, 90, 100, 110, 120), each of which is configured to sense optical energy diffracted at an oblique angle with respect to a normal to one of said two coordinate systems, characterised in that, none of the detection systems (70,80,90,100,110,120) are in superimposition with the entire area of the mold to allow actinic radiation to propagate therethrough. a template with a mold, a substrate, with the mold configured to generate a pattern in the substrate, a polymeric fluid dispensing system, a source of actinic radiation, a system to determine relative spatial parameters between first and second coordinate systems, said system comprising: an analysis system to sense relative alignment between said two coordinate systems at multiple points and determine relative spatial parameters therebetween, with said relative spatial parameters including a relative area and a relative shape, an analysis system to sense relative alignment between said two coordinate systems at multiple points and determine relative spatial parameters therebetween, with said relative spatial parameters including a relative area and a relative shape, wherein: said first coordinate system is defined by a first set of gratings, periodic along a first direction, and said second coordinate system is defined by a second set of gratings, periodic in two orthogonal directions, in superimposition with said first set of gratings, the first coordinate system is defined on the template and the second is defined on the substrate, and said analysis system further includes a plurality of detection systems (70, 80, 90, 100, 110, 120), each of which is configured to sense optical energy diffracted at an oblique angle with respect to a normal to one of said two coordinate systems, said first coordinate system is defined by a first set of gratings, periodic along a first direction, and said second coordinate system is defined by a second set of gratings, periodic in two orthogonal directions, in superimposition with said first set of gratings, the first coordinate system is defined on the template and the second is defined on the substrate, and said analysis system further includes a plurality of detection systems (70, 80, 90, 100, 110, 120), each of which is configured to sense optical energy diffracted at an oblique angle with respect to a normal to one of said two coordinate systems, characterised in that, none of the detection systems (70,80,90,100,110,120) are in superimposition with the entire area of the mold to allow actinic radiation to propagate therethrough.