A laser exposure apparatus comprising: a polarization module; and an optical system configured to increase a uniformity of a laser beam emitted from the polarization module, wherein the polarization module includes: a first lens and a second lens that, together, reduce a one-directional length of a cross-section of at least one incident laser beam having an optical axis; a polarization beam splitter that divides the laser beam passing through the first and second lenses (TL1, TL2) into two laser beams (L3, L4) that are polarized in different directions with respect to each other; a first prism lens and a second prism lens that produce an output laser beam (Lout) by controlling the two laser beams (L5, L6) that are divided by the polarization beam splitter to positions that are symmetrical with respect to the optical axis; at least one half wave plate (H1, H2) disposed between the polarization beam splitter and the first prism lens; wherein an area of a cross-section of the output laser beam (Lout) is substantially the same as an area of the cross-section of the incident laser beam; and wherein a shape of the cross-section of the output laser beam (Lout) is substantially the same as a shape of the cross-section of the incident laser beam. a polarization module; and an optical system configured to increase a uniformity of a laser beam emitted from the polarization module, wherein the polarization module includes: a first lens and a second lens that, together, reduce a one-directional length of a cross-section of at least one incident laser beam having an optical axis; a polarization beam splitter that divides the laser beam passing through the first and second lenses (TL1, TL2) into two laser beams (L3, L4) that are polarized in different directions with respect to each other; a first prism lens and a second prism lens that produce an output laser beam (Lout) by controlling the two laser beams (L5, L6) that are divided by the polarization beam splitter to positions that are symmetrical with respect to the optical axis; at least one half wave plate (H1, H2) disposed between the polarization beam splitter and the first prism lens; wherein an area of a cross-section of the output laser beam (Lout) is substantially the same as an area of the cross-section of the incident laser beam; and wherein a shape of the cross-section of the output laser beam (Lout) is substantially the same as a shape of the cross-section of the incident laser beam. a first lens and a second lens that, together, reduce a one-directional length of a cross-section of at least one incident laser beam having an optical axis; a polarization beam splitter that divides the laser beam passing through the first and second lenses (TL1, TL2) into two laser beams (L3, L4) that are polarized in different directions with respect to each other; a first prism lens and a second prism lens that produce an output laser beam (Lout) by controlling the two laser beams (L5, L6) that are divided by the polarization beam splitter to positions that are symmetrical with respect to the optical axis; at least one half wave plate (H1, H2) disposed between the polarization beam splitter and the first prism lens; wherein an area of a cross-section of the output laser beam (Lout) is substantially the same as an area of the cross-section of the incident laser beam; and wherein a shape of the cross-section of the output laser beam (Lout) is substantially the same as a shape of the cross-section of the incident laser beam.