mhurhangee/ep-ind-claims huggingface dataset:
A negative electrode active material comprising nanometal particles and super-conductive nanoparticles, each of the super-conductive nanoparticles comprising n polycyclic nano-sheets, each of the n polycyclic nano-sheets comprising hexagonal rings, each of the hexagonal rings comprising 6 interconnected carbon atoms, each of the hexagonal rings being fused to at least another one of the hexagonal rings, the hexagonal rings of each of the n polycyclic nano-sheets being arranged in a plane, the n polycyclic nano-sheets being stacked in a direction normal to the plane, n being an integer in the range of 2 to 100, and each of the super-conductive nanoparticles having first and second carbon atoms respectively located in the n polycyclic nano-sheets, the first carbon atom being regarded as the origin A (0, 0, 0) of an x, y, z coordinate system and the second carbon atom having a coordinate B (a, b, c), d 50 of a and b each being independently equal to or less than 10 μm, and d 50 of c being equal to or less than 100 nm, L 1 indicating a distance between the first and second carbon atoms, L 2 indicating a distance between a third carbon atom and a fourth carbon atom, and L 1 being equal to or greater than L 2, the third carbon atom being selected from the carbon atoms of the n polycyclic nano-sheets except for the polycyclic nano-sheets having the first and the second carbon atoms, and the fourth carbon atom being selected from the carbon atoms of the n polycyclic nano-sheets except for the polycyclic nano-sheets having the first, second, and third carbon atoms, wherein the negative electrode active material has a diameter in the range of 3 μm to 60 μm, characterized in that each of the nanometal particles has a diameter in the range of 300 nm to 500 nm.
A diagnosis aiding apparatus, comprising: - a display; - a memory configured to store instructions; and - a processor that, upon executing the stored instructions, is configured to: * control the display to display a reference cross-section (20; 40; 70) of a 3D image obtainable from a measuring device, * control the display to display diagnosis information (30a, 31a; 50a; 80a, 81c) corresponding to the reference cross-section (20; 40; 70) within the cross section, and * control the display to display, within the displayed reference cross-section (20; 40; 70), diagnosis information (30b, 31b, 30c, 31c; 50b, 50c, 51c; 80b, 80c) corresponding to a different cross-section (60; 90) other than the displayed reference cross-section (20; 40; 70), CHARACTERISED IN THAT the processor is further configured to, in response to input of a user's selection of diagnosis information (50c; 80c) corresponding to the different cross-section (60; 90), control the different cross-section (60; 90) to be displayed for a predetermined length of time to allow a user's analysis of a lesion therein without physically moving the measuring device, and control the reference cross-section (20; 40; 70) to be displayed again after the predetermined length of time has lapsed. - a display; - a memory configured to store instructions; and - a processor that, upon executing the stored instructions, is configured to: * control the display to display a reference cross-section (20; 40; 70) of a 3D image obtainable from a measuring device, * control the display to display diagnosis information (30a, 31a; 50a; 80a, 81c) corresponding to the reference cross-section (20; 40; 70) within the cross section, and * control the display to display, within the displayed reference cross-section (20; 40; 70), diagnosis information (30b, 31b, 30c, 31c; 50b, 50c, 51c; 80b, 80c) corresponding to a different cross-section (60; 90) other than the displayed reference cross-section (20; 40; 70), * control the display to display a reference cross-section (20; 40; 70) of a 3D image obtainable from a measuring device, * control the display to display diagnosis information (30a, 31a; 50a; 80a, 81c) corresponding to the reference cross-section (20; 40; 70) within the cross section, and * control the display to display, within the displayed reference cross-section (20; 40; 70), diagnosis information (30b, 31b, 30c, 31c; 50b, 50c, 51c; 80b, 80c) corresponding to a different cross-section (60; 90) other than the displayed reference cross-section (20; 40; 70),
Stabilized hot melt adhesive comprising a) one or more hot melt adhesive materials selected from the group consisting of polyolefins such as amorphous poly-alpha-olefins, metallocene based polyolefins, styrene-isoprene-styrene block co-polymer, styrene-butadiene-styrene block co-polymer, polyacrylate, styrene-ethylene-butadiene-styrene (SEBS), acryl-copolymer, ethylene vinyl acetate, polyamide, polyester, polyurethane, polyimide, silane terminated polyolefin, silane terminated polyether and silane terminated polyurethane; wherein the hot melt adhesive does not comprise a branched polyurethane-polyacrylate resin containing silicon resin, a branched polyurethan-silicon containing polyacrylate resin or a branched polyurethane-polyacrylate resin; and b) a stabilizer composition comprising or consisting of components, and, wherein is a sterically hindered amine (HALS) selected from the group consisting of: wherein R = H, CH 3, OC 8 H 17 is a polymeric sterically hindered amine (HALS) selected from the group consisting of: wherein n = 15 - 21, wherein = 2 - 50, wherein wherein n = 3 - 5, wherein n = 3 - 5 wherein n = 3 - 5, wherein n= 5 - 8; is a sterically hindered phenol selected from the group consisting of: wherein R = C 8 H 17 or C 18 H 37 wherein R = C 8 H 17 or C 12 H 25 a) one or more hot melt adhesive materials selected from the group consisting of polyolefins such as amorphous poly-alpha-olefins, metallocene based polyolefins, styrene-isoprene-styrene block co-polymer, styrene-butadiene-styrene block co-polymer, polyacrylate, styrene-ethylene-butadiene-styrene (SEBS), acryl-copolymer, ethylene vinyl acetate, polyamide, polyester, polyurethane, polyimide, silane terminated polyolefin, silane terminated polyether and silane terminated polyurethane; wherein the hot melt adhesive does not comprise a branched polyurethane-polyacrylate resin containing silicon resin, a branched polyurethan-silicon containing polyacrylate resin or a branched polyurethane-polyacrylate resin; and b) a stabilizer composition comprising or consisting of components, and, wherein is a sterically hindered amine (HALS) selected from the group consisting of: wherein R = H, CH 3, OC 8 H 17 is a polymeric sterically hindered amine (HALS) selected from the group consisting of: wherein n = 15 - 21, wherein = 2 - 50, wherein wherein n = 3 - 5, wherein n = 3 - 5 wherein n = 3 - 5, wherein n= 5 - 8; is a sterically hindered phenol selected from the group consisting of: wherein R = C 8 H 17 or C 18 H 37 wherein R = C 8 H 17 or C 12 H 25 is a sterically hindered amine (HALS) selected from the group consisting of: wherein R = H, CH 3, OC 8 H 17 is a polymeric sterically hindered amine (HALS) selected from the group consisting of: wherein n = 15 - 21, wherein = 2 - 50, wherein wherein n = 3 - 5, wherein n = 3 - 5 wherein n = 3 - 5, wherein n= 5 - 8; wherein n = 15 - 21, wherein = 2 - 50, wherein wherein n = 3 - 5, wherein n = 3 - 5 wherein n = 3 - 5, wherein n= 5 - 8; is a sterically hindered phenol selected from the group consisting of: wherein R = C 8 H 17 or C 18 H 37 wherein R = C 8 H 17 or C 12 H 25 wherein R = C 8 H 17 or C 18 H 37 wherein R = C 8 H 17 or C 12 H 25
A method for producing a silicon nitride film having the following film properties (a) to (c) on a substrate having a temperature of 250°C or lower by using an organosilane gas as a raw material gas by a plasma chemical vapor deposition method, characterised in that: a processing gas obtained by adding a hydrogenous reducing gas comprising at least one of hydrogen gas, ammonia gas, amine, and hydrocarbon in a range of 200 to 2000 volumetric flow rate to an organosilane gas of 1 volumetric flow rate is used, the organosilane gas is represented by a formula (R 1 R 2 N) n SiH 4-n, wherein R 1 and R 2 are each independently a hydrocarbon group and n is any one of 2, 3 and 4, a pressure in a process chamber accommodating the substrate is adjusted to be in a range of 35 to 400 Pa, a density of high-frequency electric power applied to an electrode installed in the process chamber is adjusted to be in a range of 0.2 to 3.5 W/cm 2, and a linear velocity of the processing gas introduced into the process chamber is in a range of 0.3 to 5.0 cm/sec, (a) an etching rate by a buffered hydrofluoric acid solution containing 20.8% of NH 4 HF 2 is 10 nm/min or lower, (b) a formation rate of a silicon oxide while being exposed to a saturated water vapor atmosphere at 208 kPa and 121°C is 2 nm/hour or lower in terms of a silicon oxide film, and (c) an internal stress in the film is in the range of -1000 to 1000 MPa. a processing gas obtained by adding a hydrogenous reducing gas comprising at least one of hydrogen gas, ammonia gas, amine, and hydrocarbon in a range of 200 to 2000 volumetric flow rate to an organosilane gas of 1 volumetric flow rate is used, the organosilane gas is represented by a formula (R 1 R 2 N) n SiH 4-n, wherein R 1 and R 2 are each independently a hydrocarbon group and n is any one of 2, 3 and 4, a pressure in a process chamber accommodating the substrate is adjusted to be in a range of 35 to 400 Pa, a density of high-frequency electric power applied to an electrode installed in the process chamber is adjusted to be in a range of 0.2 to 3.5 W/cm 2, and a linear velocity of the processing gas introduced into the process chamber is in a range of 0.3 to 5.0 cm/sec, (a) an etching rate by a buffered hydrofluoric acid solution containing 20.8% of NH 4 HF 2 is 10 nm/min or lower, (b) a formation rate of a silicon oxide while being exposed to a saturated water vapor atmosphere at 208 kPa and 121°C is 2 nm/hour or lower in terms of a silicon oxide film, and (c) an internal stress in the film is in the range of -1000 to 1000 MPa. (a) an etching rate by a buffered hydrofluoric acid solution containing 20.8% of NH 4 HF 2 is 10 nm/min or lower, (b) a formation rate of a silicon oxide while being exposed to a saturated water vapor atmosphere at 208 kPa and 121°C is 2 nm/hour or lower in terms of a silicon oxide film, and (c) an internal stress in the film is in the range of -1000 to 1000 MPa.
A system for separating suspended substances from a liquid, with a filter assembly of the cyclone filter type with a filter housing which is rotationally symmetrical about a longitudinal axis, which comprises a filter element disposed centrally to the longitudinal axis and which is also in the form of a hollow cylinder and radially surrounds an inner cylindrical filtrate chamber and with it delimits a flow channel which is annular in cross section, which has a swirl chamber into which a flow feed line opens eccentrically and transversely to the longitudinal axis, as well as having a separating channel which is connected along the longitudinal axis indirectly or directly downstream of the swirl chamber, as well as with a flow guide surface assembly which has at least one flow guide surface element which extends parallel to the longitudinal axis and is disposed radially separated from the filter element and inside the separating channel, and which is rotatably mounted about the longitudinal axis and can be driven by means of a rotary motor, wherein the filtrate chamber is connected to a first discharge line and the separating channel is connected to a second discharge line, characterized in that the filter element has a filter wall which is configured in the form of a single-layered perforated sheet the perforation holes of which have a largest hole diameter in the range from 5 μm to 80 μm inclusive at the radially outer filter wall surface, in that means for measuring a pressure difference between the filtrate chamber and the separating channel are provided, in that a respective shut-off valve (14, 15) is introduced along the first and the second discharge line (12, 13), and in that a control unit is provided which actuates the rotary motor and/or at least one of the shut-off valves (14, 15)as a function of the pressure difference. in that means for measuring a pressure difference between the filtrate chamber and the separating channel are provided, in that a respective shut-off valve (14, 15) is introduced along the first and the second discharge line (12, 13), and in that a control unit is provided which actuates the rotary motor and/or at least one of the shut-off valves (14, 15)as a function of the pressure difference.
A computed tomography image display system, comprising: a mapping unit, configured to receive reconstructed volumetric image data of a subject with values in Hounsfield Units, hereinafter HU values, and a set of reference settings, including gray scale pixel value mappings of the reconstructed volumetric image data according to an imaging protocol, the mapping unit being configured to adjust the set of reference settings to an adjusted set of reference settings including a window level of the HU values or a window width of the HU values adjusted according to a pixel-value distribution analysis of HU values selected from the received reconstructed volumetric image data of the subject according to the set of reference settings, and to map the HU values to gray scale values according to the adjusted set of reference settings.
A video data buffering system comprising: means for determining a value of a portion of video data to be decoded by looking ahead at an encoded portion of a video data bitstream corresponding to the portion of video data to be decoded, wherein the value of the portion of video data to be decoded is based at least in part on a predicted number of times the portion of video data to be decoded will be referenced for motion compensation, wherein the value of the portion of video data to be decoded is a predicted bandwidth of the decoded portion of video data, a predicted lifespan of the decoded portion of video data, or a predicted bandwidth variation of the decoded portion of video data over the lifespan; means for decoding the encoded portion of the video data bitstream; and means for storing the decoded portion in a first buffer in a first memory when the predicted value is greater or equal to a threshold or in a second buffer in a second memory when the predicted value is less than a threshold, wherein the first buffer has a faster access time than the second buffer; subsequent to storing the decoded portion in the first buffer or the second buffer, means for updating the predicted value based on a frequency of reference to the decoded portion by a second encoded portion of the video data bitstream; and means for moving the decoded portion between the first buffer and the second buffer based on the updated predicted value.. means for determining a value of a portion of video data to be decoded by looking ahead at an encoded portion of a video data bitstream corresponding to the portion of video data to be decoded, wherein the value of the portion of video data to be decoded is based at least in part on a predicted number of times the portion of video data to be decoded will be referenced for motion compensation, wherein the value of the portion of video data to be decoded is a predicted bandwidth of the decoded portion of video data, a predicted lifespan of the decoded portion of video data, or a predicted bandwidth variation of the decoded portion of video data over the lifespan; means for decoding the encoded portion of the video data bitstream; and means for storing the decoded portion in a first buffer in a first memory when the predicted value is greater or equal to a threshold or in a second buffer in a second memory when the predicted value is less than a threshold, wherein the first buffer has a faster access time than the second buffer; subsequent to storing the decoded portion in the first buffer or the second buffer, means for updating the predicted value based on a frequency of reference to the decoded portion by a second encoded portion of the video data bitstream; and means for moving the decoded portion between the first buffer and the second buffer based on the updated predicted value..
A machining device comprising a frame, a driving shaft extending along an axis and intended to be coupled with a cutting tool, and a mechanism for driving the driving shaft, said mechanism comprising a first gear member coupled to the driving shaft and intended to rotate the driving shaft about its axis relatively to the frame, a second gear member helically connected to the driving shaft and intended to translate the driving shaft along its axis relatively to the frame with an advance movement, according to the relative rotation speed of said first and second gear members, and means for generating axial oscillations intended to generate an oscillating advance movement of the driving shaft along its axis, said second gear member being translatable relatively to said frame along the axis, characterized in that said means for generating axial oscillations comprise an electromechanical actuator mounted at fixed reference, attached to said frame, said electromechanical actuator being intended to be axially coupled to said second gear member in order to make it translationally oscillates, so as to superimpose an axial oscillation component to said advance movement.
An optical device for coupling an external optical signal into a plurality of on-chip channel photonic sub-circuits provided on a substrate, wherein the optical device comprises: a planar waveguide layer on the substrate; and a plurality of channel waveguides formed in the waveguide layer, wherein each of the plurality of channel waveguides comprises a waveguide transition structure having a waveguide aperture, characterized in that the optical device further comprises a diverging grating coupler configured to couple the external optical signal received at an angle between 0° and 30° with respect to the direction orthogonal to the plane of the waveguide layer and to thereby create an on-chip optical beam with diverging phase front in the waveguide layer, further characterized in that said waveguide apertures are oriented towards said grating coupler, and in that, for each of the plurality of channel waveguides a position of the waveguide aperture with respect to the grating coupler and a width of the waveguide aperture and an angle and a shape of the waveguide transition structure are selected to capture a predetermined portion of the optical power of the on-chip diverging optical beam, different selections of combinations of position, width, angle and shape being made for different channel waveguides. a planar waveguide layer on the substrate; and a plurality of channel waveguides formed in the waveguide layer, wherein each of the plurality of channel waveguides comprises a waveguide transition structure having a waveguide aperture, characterized in that the optical device further comprises a diverging grating coupler configured to couple the external optical signal received at an angle between 0° and 30° with respect to the direction orthogonal to the plane of the waveguide layer and to thereby create an on-chip optical beam with diverging phase front in the waveguide layer, further characterized in that said waveguide apertures are oriented towards said grating coupler, and in that, for each of the plurality of channel waveguides a position of the waveguide aperture with respect to the grating coupler and a width of the waveguide aperture and an angle and a shape of the waveguide transition structure are selected to capture a predetermined portion of the optical power of the on-chip diverging optical beam, different selections of combinations of position, width, angle and shape being made for different channel waveguides.
A roofing, cladding, or siding apparatus comprising: a roofing, cladding, or siding module comprising: an underlapping region and an exposed region, wherein the underlapping region is adapted to be substantially covered by the exposed region of an adjacent overlapping module when installed on a building surface; an outer surface and an under surface, wherein a projection extending from the exposed region to provide a bearing surface facing the under surface of the exposed region, and one or more clips attachable to the underlapping region to provide a tongue adapted to be received between the bearing surface and the under surface of the exposed region of an adjacent overlapping module when installed on a building surface, characterised in that said one or more clips is or are rotatable, wherein the clip and the module are complementarily adapted for the clip to rotate between an extended position wherein the tongue is received between the bearing surface and the under surface of the exposed region of an adjacent module, and a retracted position wherein the tongue is withdrawn from between the bearing surface and the under surface of the exposed region of the adjacent module. a roofing, cladding, or siding module comprising: an underlapping region and an exposed region, wherein the underlapping region is adapted to be substantially covered by the exposed region of an adjacent overlapping module when installed on a building surface; an outer surface and an under surface, wherein a projection extending from the exposed region to provide a bearing an underlapping region and an exposed region, wherein the underlapping region is adapted to be substantially covered by the exposed region of an adjacent overlapping module when installed on a building surface; an outer surface and an under surface, wherein a projection extending from the exposed region to provide a bearing surface facing the under surface of the exposed region, and one or more clips attachable to the underlapping region to provide a tongue adapted to be received between the bearing surface and the under surface of the exposed region of an adjacent overlapping module when installed on a building surface, characterised in that said one or more clips is or are rotatable, wherein the clip and the module are complementarily adapted for the clip to rotate between an extended position wherein the tongue is received between the bearing surface and the under surface of the exposed region of an adjacent module, and a retracted position wherein the tongue is withdrawn from between the bearing surface and the under surface of the exposed region of the adjacent module.