A method for the production of a nanostructured carbon-based material, wherein said method comprises the steps of: i) preparing a suspension by mixing - a carbon compound selected from the group consisting of graphite and graphitic materials, with - exfoliating agents, wherein said exfoliating agents are pure or in solution, wherein - said carbon compound is present in a percentage comprised in the range from 0.5-80% by weight of the total weight of said suspension; - said exfoliating agents, if in solution, are present in the solution of exfoliating agent at a percentage of more than 0.001 by weight of the total weight of the solution; wherein said exfoliating agents are constituted by oligomers or polymers comprising 1 to 1000 repeating units, preferably 3 to 20 repeating units, comprising - at least one ether group, preferably at least one ethoxy group; and - at least one benzene substituted by: - said at least one ether group; and by - one or more functional groups selected from the group consisting of: aromatic amines, aramids (aromatic amides), aromatic imines, aromatic imides, aromatic sulfides, aromatic phosphorus compounds, aromatic carboxylic compounds, variously substituted phenols, aromatic alcohols, aromatic ethers, aromatic aldehydes, aromatic esters, aromatic anhydrides, nitroaromatic groups, the pyridine group, the pyrimidine group, the imidazole group, azobenzene, anthracenes, diphenyls, aromatic halides, alkane with one or more aromatic groups present in the chain, alkenes with one or more aromatic groups present in the chain, dienes with one or more aromatic groups present in the chain, or mixtures thereof; ii) sonicating the suspension obtained in step i) and/or performing mechanical milling of the suspension obtained in step i). i) preparing a suspension by mixing - a carbon compound selected from the group consisting of graphite and graphitic materials, with - exfoliating agents, wherein said exfoliating agents are pure or in solution, wherein - said carbon compound is present in a percentage comprised in the range from 0.5-80% by weight of the total weight of said suspension; - said exfoliating agents, if in solution, are present in the solution of exfoliating agent at a percentage of more than 0.001 by weight of the total weight of the solution; wherein said exfoliating agents are constituted by oligomers or polymers comprising 1 to 1000 repeating units, preferably 3 to 20 repeating units, comprising - at least one ether group, preferably at least one ethoxy group; and - at least one benzene substituted by: - said at least one ether group; and by - one or more functional groups selected from the group consisting of: aromatic amines, aramids (aromatic amides), aromatic imines, aromatic imides, aromatic sulfides, aromatic phosphorus compounds, aromatic carboxylic compounds, variously substituted phenols, aromatic alcohols, aromatic ethers, aromatic aldehydes, aromatic esters, aromatic anhydrides, nitroaromatic groups, the pyridine group, the pyrimidine group, the imidazole group, azobenzene, anthracenes, diphenyls, aromatic halides, alkane with one or more aromatic groups present in the chain, alkenes with one or more aromatic groups present in the chain, dienes with one or more aromatic groups present in the chain, or mixtures thereof; - a carbon compound selected from the group consisting of graphite and graphitic materials, with - exfoliating agents, wherein said exfoliating agents are pure or in solution, wherein - said carbon compound is present in a percentage comprised in the range from 0.5-80% by weight of the total weight of said suspension; - said exfoliating agents, if in solution, are present in the solution of exfoliating agent at a percentage of more than 0.001 by weight of the total weight of the solution; wherein said exfoliating agents are constituted by oligomers or polymers comprising 1 to 1000 repeating units, preferably 3 to 20 repeating units, comprising - at least one ether group, preferably at least one ethoxy group; and - at least one benzene substituted by: - said at least one ether group; and by - one or more functional groups selected from the group consisting of: aromatic amines, aramids (aromatic amides), aromatic imines, aromatic imides, aromatic sulfides, aromatic phosphorus compounds, aromatic carboxylic compounds, variously substituted phenols, aromatic alcohols, aromatic ethers, aromatic aldehydes, aromatic esters, aromatic anhydrides, nitroaromatic groups, the pyridine group, the pyrimidine group, the imidazole group, azobenzene, anthracenes, diphenyls, aromatic halides, alkane with one or more aromatic groups present in the chain, alkenes with one or more aromatic groups present in the chain, dienes with one or more aromatic groups present in the chain, or mixtures thereof; ii) sonicating the suspension obtained in step i) and/or performing mechanical milling of the suspension obtained in step i).