A method of forming an imprint lithography template having features with non-convex cross-sections, the method comprising: forming a first material layer on a substrate (2001; 2001a; 2001b; 2001c; 2001d; 2001e); forming in a print field a first patterned layer of formable material over the first material layer using a first imprint lithography template having groups of patterning surfaces, each group having features with convex geometric cross-sections and a first centermost point (C 1), wherein each group of patterning surfaces is printed in a respective subfield of the print field; removing (703, 704) portions of the first patterned layer and the first material layer to form recesses in the first material layer having convex geometric cross-sections; forming (705, 706) in said print field a second patterned layer of formable material over the first material layer using a second imprint lithography template having groups of patterning surfaces, each group having features with convex geometric cross-sections and a second centermost point (C 2), wherein each group of patterning surfaces is printed in a respective subfield in correspondence with a group of patterning surfaces formed by the first imprint lithography template such that the patterning surfaces of each subfield are displaced relative to the corresponding patterning surfaces formed by the first imprint lithography template in the first material layer; wherein in the centermost subfield of the print field, the first centermost point (C 1) coincides with the second centermost point (C 2), and wherein in all subfields of the print field other than the centermost subfield, the second centermost point (C 2) is offset with respect to the first centermost point (C 1) of a respective set bias, each set bias of the subfields being unique in the print field; removing portions of the second patterned layer and the first material layer to form recesses in the first material layer having non-convex geometric cross-sections; etching the substrate (2001; 2001a; 2001b; 2001c; 2001d; 2001e) to form recesses (2014; 2014a; 2014b; 2014c; 2014d; 2014e) in the substrate having non-convex geometric cross-sections; and removing remaining portions of the second patterned layer; and removing remaining portions of the first material layer. forming a first material layer on a substrate (2001; 2001a; 2001b; 2001c; 2001d; 2001e); forming in a print field a first patterned layer of formable material over the first material layer using a first imprint lithography template having groups of patterning surfaces, each group having features with convex geometric cross-sections and a first centermost point (C 1), wherein each group of patterning surfaces is printed in a respective subfield of the print field; removing (703, 704) portions of the first patterned layer and the first material layer to form recesses in the first material layer having convex geometric cross-sections; forming (705, 706) in said print field a second patterned layer of formable material over the first material layer using a second imprint lithography template having groups of patterning surfaces, each group having features with convex geometric cross-sections and a second centermost point (C 2), wherein each group of patterning surfaces is printed in a respective subfield in correspondence with a group of patterning surfaces formed by the first imprint lithography template such that the patterning surfaces of each subfield are displaced relative to the corresponding patterning surfaces formed by the first imprint lithography template in the first material layer; wherein in the centermost subfield of the print field, the first centermost point (C 1) coincides with the second centermost point (C 2), and wherein in all subfields of the print field other than the centermost subfield, the second centermost point (C 2) is offset with respect to the first centermost point (C 1) of a respective set bias, each set bias of the subfields being unique in the print field; removing portions of the second patterned layer and the first material layer to form recesses in the first material layer having non-convex geometric cross-sections; etching the substrate (2001; 2001a; 2001b; 2001c; 2001d; 2001e) to form recesses (2014; 2014a; 2014b; 2014c; 2014d; 2014e) in the substrate having non-convex geometric cross-sections; and removing remaining portions of the second patterned layer; and removing remaining portions of the first material layer.