An ophthalmic lens comprising a transparent substrate with a front main face and with a rear main face, at least one of the main faces being coated with a multilayered antireflective coating comprising a stack of at least two high refractive index layers having a refractive index higher than or equal to 1.55 measured at 25°C and at a wavelength of 530 nm and at least two low refractive index layers having a refractive index lower than 1,55 measured at 25°C and at a wavelength of 530 nm, wherein said multilayered antireflective coating has: - a mean light reflection factor in the visible region for photopic vision Rv, as defined in the ISO 13666:1998 Standard, lower than or equal to 2.5% for at least an angle of incidence lower than 35°; - a mean light reflection factor in the visible region for scotopic vision Rv', defined by the following equation: where: Rv ′ − ∫ 380 780 R λ ⋅ V ′ λ ⋅ Ilum λ ⋅ dλ ∫ 380 780 V ′ λ ⋅ Ilum λ ⋅ dλ R(λ) is the reflectance at wavelength of A, Ilum(λ) is a reference illuminant D 65 (λ) V'(λ) is the spectral luminous efficiency function of eye as defined in CIE 1951 for scotopic vision, lower than or equal to 0.5%for at least an angle of incidence lower than 35°, wherein a high refractive index sheet is located between said substrate and said first low refractive index layer in the direction moving away from said substrate, said high refractive index sheet is a layer of TiO 2 having a thickness of about 8 to 20 nm and is in direct contact with the substrate, or said high refractive index sheet is a bilayer and comprises - a layer L1 of SiO x with x<2 having a thickness of about 5 to 15nm that is in direct contact with the substrate, and - a layer L2 of TiO 2 having a thickness of about 5 to 15nm that is in direct contact with said L1 layer. wherein said multilayered antireflective coating has: - a mean light reflection factor in the visible region for photopic vision Rv, as defined in the ISO 13666:1998 Standard, lower than or equal to 2.5% for at least an angle of incidence lower than 35°; - a mean light reflection factor in the visible region for scotopic vision Rv', defined by the following equation: where: Rv ′ − ∫ 380 780 R λ ⋅ V ′ λ ⋅ Ilum λ ⋅ dλ ∫ 380 780 V ′ λ ⋅ Ilum λ ⋅ dλ R(λ) is the reflectance at wavelength of A, Ilum(λ) is a reference illuminant D 65 (λ) V'(λ) is the spectral luminous efficiency function of eye as defined in CIE 1951 for scotopic vision, lower than or equal to 0.5%for at least an angle of incidence lower than 35°, - a mean light reflection factor in the visible region for photopic vision Rv, as defined in the ISO 13666:1998 Standard, lower than or equal to 2.5% for at least an angle of incidence lower than 35°; - a mean light reflection factor in the visible region for scotopic vision Rv', defined by the following equation: where: Rv ′ − ∫ 380 780 R λ ⋅ V ′ λ ⋅ Ilum λ ⋅ dλ ∫ 380 780 V ′ λ ⋅ Ilum λ ⋅ dλ R(λ) is the reflectance at wavelength of A, Ilum(λ) is a reference illuminant D 65 (λ) V'(λ) is the spectral luminous efficiency function of eye as defined in CIE 1951 for scotopic vision, lower than or equal to 0.5%for at least an angle of incidence lower than 35°, R(λ) is the reflectance at wavelength of A, Ilum(λ) is a reference illuminant D 65 (λ) V'(λ) is the spectral luminous efficiency function of eye as defined in CIE 1951 for scotopic vision, lower than or equal to 0.5%for at least an angle of incidence lower than 35°, wherein a high refractive index sheet is located between said substrate and said first low refractive index layer in the direction moving away from said substrate, said high refractive index sheet is a layer of TiO 2 having a thickness of about 8 to 20 nm and is in direct contact with the substrate, or said high refractive index sheet is a bilayer and comprises - a layer L1 of SiO x with x<2 having a thickness of about 5 to 15nm that is in direct contact with the substrate, and - a layer L2 of TiO 2 having a thickness of about 5 to 15nm that is in direct contact with said L1 layer. - a layer L1 of SiO x with x<2 having a thickness of about 5 to 15nm that is in direct contact with the substrate, and - a layer L2 of TiO 2 having a thickness of about 5 to 15nm that is in direct contact with said L1 layer.