Micromechanical sensor component for a rate-of-rotation sensor, comprising: a mounting; a first, second, third and fourth seismic mass (12a to 12d), which are arranged on the mounting adjustably about an intermediate space surrounded by the four seismic masses (12a to 12d); wherein the first, second, third and fourth seismic masses (12a to 12d) are arranged adjustably on the mounting in such a way that the first seismic mass and the second seismic mass are adjustable with respect to the mounting at least along a first pivot axis and the third seismic mass and the fourth seismic mass are adjustable with respect to the mounting at least along a second pivot axis, which is aligned inclined in relation to the first pivot axis, and wherein each of the four seismic masses (12a to 12d) is connected to at least one other of the four seismic masses (12a to 12d) via at least one mass coupling element (22a to 22d, 24), and a first rocker structure, which is connected to the first seismic mass via a first rocker coupling element and to the second seismic mass via a second rocker coupling element and is arranged on the mounting adjacent to an outer side of the third seismic mass, which is directed away from the first seismic mass and the second seismic mass, in such a way that the first rocker structure can be set in a first rocking motion about a specified first pivot axis with respect to the mounting; characterized in that the micromechanical sensor component comprises a second rocker structure, which is at least connected to the first seismic mass via a third rocker coupling element and to the second seismic mass via a fourth rocker coupling element and is arranged on the mounting adjacent to an outer side of the fourth seismic mass, which is directed away from the first seismic mass and the second seismic mass, in such a way that the second rocker structure can be set in a second rocking motion about a specified second pivot axis with respect to the mounting. a mounting; a first, second, third and fourth seismic mass (12a to 12d), which are arranged on the mounting adjustably about an intermediate space surrounded by the four seismic masses (12a to 12d); wherein the first, second, third and fourth seismic masses (12a to 12d) are arranged adjustably on the mounting in such a way that the first seismic mass and the second seismic mass are adjustable with respect to the mounting at least along a first pivot axis and the third seismic mass and the fourth seismic mass are adjustable with respect to the mounting at least along a second pivot axis, which is aligned inclined in relation to the first pivot axis, and wherein each of the four seismic masses (12a to 12d) is connected to at least one other of the four seismic masses (12a to 12d) via at least one mass coupling element (22a to 22d, 24), and a first rocker structure, which is connected to the first seismic mass via a first rocker coupling element and to the second seismic mass via a second rocker coupling element and is arranged on the mounting adjacent to an outer side of the third seismic mass, which is directed away from the first seismic mass and the second seismic mass, in such a way that the first rocker structure can be set in a first rocking motion about a specified first pivot axis with respect to the mounting; characterized in that the micromechanical sensor component comprises a second rocker structure, which is at least connected to the first seismic mass via a third rocker coupling element and to the second seismic mass via a fourth rocker coupling element and is arranged on the mounting adjacent to an outer side of the fourth seismic mass, which is directed away from the first seismic mass and the second seismic mass, in such a way that the second rocker structure can be set in a second rocking motion about a specified second pivot axis with respect to the mounting.