A platform stabilization system for isolating a payload from motion of a supporting structure, the platform stabilization system comprising: a support frame; a platform for carrying a payload; characterized in that, the platform stabilization system comprises: a plurality of isolators (120, 420C, 420D, 420h) each extending directly between the support frame and the platform; each isolator (120, 420C, 420D, 420h) permitting linear movement of the platform relative to the support frame with three degrees of freedom; each isolator (120, 420C, 420D, 420h) permitting rotational movement of the platform relative to the support frame with three degrees of freedom; the plurality of isolators (120, 420C, 420D, 420h) cooperating to form an isolation array (124, 424, 424C, 424D, 424h) supporting the platform directly within the support frame; the isolation array (124, 424, 424C, 424D, 424h) spacing the platform from the support frame; the isolation array (124, 424, 424C, 424D, 424h) permitting limited linear movement of the platform relative to the support frame with three degrees of freedom along three orthogonal platform axes; the isolation array (124, 424, 424C, 424D, 424h) permitting limited rotational movement of the platform relative to the support frame with three degrees of freedom about the three platform axes; the isolation array (124, 424, 424C, 424D, 424h) being substantially more resistant to linear movement of the platform relative to the support frame than to rotational movement of the platform relative to the support frame; and wherein the platform is not rotationally constrained by the isolation array (124, 424, 424C, 424D, 424h). a support frame; a platform for carrying a payload; characterized in that, the platform stabilization system comprises: a plurality of isolators (120, 420C, 420D, 420h) each extending directly between the support frame and the platform; each isolator (120, 420C, 420D, 420h) permitting linear movement of the platform relative to the support frame with three degrees of freedom; each isolator (120, 420C, 420D, 420h) permitting rotational movement of the platform relative to the support frame with three degrees of freedom; the plurality of isolators (120, 420C, 420D, 420h) cooperating to form an isolation array (124, 424, 424C, 424D, 424h) supporting the platform directly within the support frame; the isolation array (124, 424, 424C, 424D, 424h) spacing the platform from the support frame; the isolation array (124, 424, 424C, 424D, 424h) permitting limited linear movement of the platform relative to the support frame with three degrees of freedom along three orthogonal platform axes; the isolation array (124, 424, 424C, 424D, 424h) permitting limited rotational movement of the platform relative to the support frame with three degrees of freedom about the three platform axes; the isolation array (124, 424, 424C, 424D, 424h) being substantially more resistant to linear movement of the platform relative to the support frame than to rotational movement of the platform relative to the support frame; and wherein the platform is not rotationally constrained by the isolation array (124, 424, 424C, 424D, 424h). a plurality of isolators (120, 420C, 420D, 420h) each extending directly between the support frame and the platform; each isolator (120, 420C, 420D, 420h) permitting linear movement of the platform relative to the support frame with three degrees of freedom; each isolator (120, 420C, 420D, 420h) permitting rotational movement of the platform relative to the support frame with three degrees of freedom; the plurality of isolators (120, 420C, 420D, 420h) cooperating to form an isolation array (124, 424, 424C, 424D, 424h) supporting the platform directly within the support frame; the isolation array (124, 424, 424C, 424D, 424h) spacing the platform from the support frame; the isolation array (124, 424, 424C, 424D, 424h) permitting limited linear movement of the platform relative to the support frame with three degrees of freedom along three orthogonal platform axes; the isolation array (124, 424, 424C, 424D, 424h) permitting limited rotational movement of the platform relative to the support frame with three degrees of freedom about the three platform axes; the isolation array (124, 424, 424C, 424D, 424h) being substantially more resistant to linear movement of the platform relative to the support frame than to rotational movement of the platform relative to the support frame; and wherein the platform is not rotationally constrained by the isolation array (124, 424, 424C, 424D, 424h).