A susceptor (3, 200) and a wafer located on the susceptor (3, 200), which susceptor (3, 200) is configured to support the wafer to manufacture an epitaxial wafer in a chamber of a fabrication apparatus in which a gas is provided into the chamber, comprising: - a first body (31, 41, 51, 61, 71, 81, 220) of the susceptor including a top surface, a bottom surface and a plurality of first holes (33, 224) passing through the first body (31, 41, 51, 61, 71, 81, 220); and - a second body (32, 42, 52, 62, 72, 82, 210) of the susceptor including a top surface, a bottom surface and a plurality of second holes (34, 214) passing through the second body (32, 42, 52, 62, 72, 82, 210), wherein: - the bottom surface of the second body (32, 42, 52, 62, 72, 82, 210) is spaced from the top surface of the first body (31, 41, 51, 61, 71, 81, 220) to form a gap, - the gap allows a gas to pass from the second holes (34, 214) to the first holes (33, 224), - the bottom surface of the second body (32, 42, 52, 62, 72, 82, 210) and the top surface of the first body (31, 41, 51, 61, 71, 81, 220) have different cross-sectional shapes, the cross-sectional shapes are selected from a group consisting of linear, curved in a convex direction, and curved in a concave direction, wherein the first holes and the second holes are arranged in radial direction along several lines starting from center to an outer edge of the respective first and second bodies, wherein, by rotating at least one of the first and second bodies, a first number of first holes (33, 224) near the center is in substantial alignment with a first number of second holes (34, 214) near the center, and wherein a second number of first holes (33, 224) near the outer edge is misaligned with a second number of second holes (34, 214) near the outer edge. - a first body (31, 41, 51, 61, 71, 81, 220) of the susceptor including a top surface, a bottom surface and a plurality of first holes (33, 224) passing through the first body (31, 41, 51, 61, 71, 81, 220); and - a second body (32, 42, 52, 62, 72, 82, 210) of the susceptor including a top surface, a bottom surface and a plurality of second holes (34, 214) passing through the second body (32, 42, 52, 62, 72, 82, 210), wherein: - the bottom surface of the second body (32, 42, 52, 62, 72, 82, 210) is spaced from the top surface of the first body (31, 41, 51, 61, 71, 81, 220) to form a gap, - the gap allows a gas to pass from the second holes (34, 214) to the first holes (33, 224), - the bottom surface of the second body (32, 42, 52, 62, 72, 82, 210) and the top surface of the first body (31, 41, 51, 61, 71, 81, 220) have different cross-sectional shapes, the cross-sectional shapes are selected from a group consisting of linear, curved in a convex direction, and curved in a concave direction, wherein the first holes and the second holes are arranged in radial direction along several lines starting from center to an outer edge of the respective first and second bodies, - the bottom surface of the second body (32, 42, 52, 62, 72, 82, 210) is spaced from the top surface of the first body (31, 41, 51, 61, 71, 81, 220) to form a gap, - the gap allows a gas to pass from the second holes (34, 214) to the first holes (33, 224), - the bottom surface of the second body (32, 42, 52, 62, 72, 82, 210) and the top surface of the first body (31, 41, 51, 61, 71, 81, 220) have different cross-sectional shapes, the cross-sectional shapes are selected from a group consisting of linear, curved in a convex direction, and curved in a concave direction, wherein the first holes and the second holes are arranged in radial direction along several lines starting from center to an outer edge of the respective first and second bodies,