An exposure apparatus for exposing a substrate to light passing through liquid, the apparatus comprising: a stage for holding the substrate; and a liquid supply system for supplying the liquid onto the stage holding the substrate, wherein the stage comprises: a substrate holder for holding the substrate, the substrate holder including a support member for supporting a rear surface (Pb) of the substrate and a first circumferential wall configured to surround the support member and to face the rear surface of the substrate on the support member; a second circumferential wall configured to surround the substrate holder and to form a first space and a second space, the first space located between the second circumferential wall and the first circumferential wall, the second space located on an outer side of the second circumferential wall; a plate member for surrounding the substrate on the support member; and a recovery passage (52, 52') for applying suction to at least one recovery port (51, 57) located at at least one of the first space and the second space, and wherein the second circumferential wall is arranged under a gap between the plate member and the substrate on the support member so that a part of an upper surface of the second circumferential wall faces the rear surface of the substrate on the support member and another part of the upper surface of the second circumferential wall faces an rear surface (Tb) of the plate member. a stage for holding the substrate; and a liquid supply system for supplying the liquid onto the stage holding the substrate, wherein the stage comprises: a substrate holder for holding the substrate, the substrate holder including a support member for supporting a rear surface (Pb) of the substrate and a first circumferential wall configured to surround the support member and to face the rear surface of the substrate on the support member; a second circumferential wall configured to surround the substrate holder and to form a first space and a second space, the first space located between the second circumferential wall and the first circumferential wall, the second space located on an outer side of the second circumferential wall; a plate member for surrounding the substrate on the support member; and a recovery passage (52, 52') for applying suction to at least one recovery port (51, 57) located at at least one of the first space and the second space, and wherein the second circumferential wall is arranged under a gap between the plate member and the substrate on the support member so that a part of an upper surface of the second circumferential wall faces the rear surface of the substrate on the support member and another part of the upper surface of the second circumferential wall faces an rear surface (Tb) of the plate member. a substrate holder for holding the substrate, the substrate holder including a support member for supporting a rear surface (Pb) of the substrate and a first circumferential wall configured to surround the support member and to face the rear surface of the substrate on the support member; a second circumferential wall configured to surround the substrate holder and to form a first space and a second space, the first space located between the second circumferential wall and the first circumferential wall, the second space located on an outer side of the second circumferential wall; a plate member for surrounding the substrate on the support member; and a recovery passage (52, 52') for applying suction to at least one recovery port (51, 57) located at at least one of the first space and the second space, and wherein the second circumferential wall is arranged under a gap between the plate member and the substrate on the support member so that a part of an upper surface of the second circumferential wall faces the rear surface of the substrate on the support member and another part of the upper surface of the second circumferential wall faces an rear surface (Tb) of the plate member.