mhurhangee/ep-ind-claims huggingface dataset:
An auxiliary air cylinder inflation system, comprising: a control air cylinder inflation valve, a control air cylinder, an auxiliary air cylinder inflation valve, a first passage and a second passage, characterised in that the control air cylinder inflation valve is provided with a train pipe air outlet, the control air cylinder is provided with a first train pipe inflation port, and the auxiliary air cylinder inflation valve is provided with a second train pipe inflation port; and the first passage communicates with the train pipe air outlet and the first train pipe inflation port, the second passage communicates with the train pipe air outlet and the second train pipe inflation port; and the first passage is connected in parallel with the second passage. a control air cylinder inflation valve, a control air cylinder, an auxiliary air cylinder inflation valve, a first passage and a second passage, characterised in that the control air cylinder inflation valve is provided with a train pipe air outlet, the control air cylinder is provided with a first train pipe inflation port, and the auxiliary air cylinder inflation valve is provided with a second train pipe inflation port; and the first passage communicates with the train pipe air outlet and the first train pipe inflation port, the second passage communicates with the train pipe air outlet and the second train pipe inflation port; and the first passage is connected in parallel with the second passage.
A composition having melt flow rate, measured according to ISO 1133 - 230°C, 2.16 Kg, of equal to or higher than 25 g/10 min, comprising: from 55 to 90% by weight of a propylene composition comprising (percent by weight): 70-95% by weight of a propylene homopolymer having a Polydispersity Index of from 4.3 to 10, a fraction insoluble in xylene at 25 °C higher than 90% and a MFR (ISO 1133 - 230°C, 2.16 Kg) of from 100 to 250 g/10 min; 5-30% by weight of a copolymer of propylene with from 36 to 44% of ethylene-derived units; the composition having an intrinsic viscosity of the fraction soluble in xylene at 25 °C (XSIV) comprised between 3.0 and 5.0 dl/g; from 5 to 35 by weight of a heterophasic propylene polymer, having MFR (ISO 1133 - 230°C, 2.16 Kg) of from 10 to 25 g/10 min; flexural modulus higher than 1400 MPa measured according to ISO178, and having from 5 to 20% of a copolymer rubber component and from 80 to 95% of a matrix propylene polymer component; from 2 to 10% by weight, of an ethylene based elastoplastic copolymer; from 0 to 20% of talc; the sum of the percentage amounts of the individual components of the composition being equal to 100%, including conventional additives and pigments. from 55 to 90% by weight of a propylene composition comprising (percent by weight): 70-95% by weight of a propylene homopolymer having a Polydispersity Index of from 4.3 to 10, a fraction insoluble in xylene at 25 °C higher than 90% and a MFR (ISO 1133 - 230°C, 2.16 Kg) of from 100 to 250 g/10 min; 5-30% by weight of a copolymer of propylene with from 36 to 44% of ethylene-derived units; the composition having an intrinsic viscosity of the fraction soluble in xylene at 25 °C (XSIV) comprised between 3.0 and 5.0 dl/g; 70-95% by weight of a propylene homopolymer having a Polydispersity Index of from 4.3 to 10, a fraction insoluble in xylene at 25 °C higher than 90% and a MFR (ISO 1133 - 230°C, 2.16 Kg) of from 100 to 250 g/10 min; 5-30% by weight of a copolymer of propylene with from 36 to 44% of ethylene-derived units; from 5 to 35 by weight of a heterophasic propylene polymer, having MFR (ISO 1133 - 230°C, 2.16 Kg) of from 10 to 25 g/10 min; flexural modulus higher than 1400 MPa measured according to ISO178, and having from 5 to 20% of a copolymer rubber component and from 80 to 95% of a matrix propylene polymer component; from 2 to 10% by weight, of an ethylene based elastoplastic copolymer; from 0 to 20% of talc; the sum of the percentage amounts of the individual components of the composition being equal to 100%, including conventional additives and pigments.
Device for determining the interlaminar shearing resistance and the shearing modulus of a sample of fibre-reinforced plastic laminates at a shearing plane, comprising a) a movable upper base body and a fixed-position lower base body, b) wherein the sample is positioned between the upper base body and the lower base body in a sample space, c) wherein, at the upper base body, laterally to the sample and parallel to the shear plane, a support plate is provided, and at the lower base body, laterally to the sample, parallel to the shear plane, and opposite the support plate, a further support plate is provided, spaced apart by the thickness (d) of the sample, d) wherein the shearing plane can be adjusted as desired orthogonally to the movement path over the entire thickness (d) of the sample, wherein the shearing plane lies parallel to the travel path, e) wherein a pressure plate is secured to the upper base body, and a pressure plate is secured to the lower base body, wherein the pressure plates (7, 8) are aligned orthogonally to the shearing plane and are configured such as to introduce a force into the sample, characterised in that f) the support plates (10, 11) can be relocated by means of guide rails (12, 13) orthogonally to the shearing plane in each case independently of the upper base body or of the lower base body. a) a movable upper base body and a fixed-position lower base body, b) wherein the sample is positioned between the upper base body and the lower base body in a sample space, c) wherein, at the upper base body, laterally to the sample and parallel to the shear plane, a support plate is provided, and at the lower base body, laterally to the sample, parallel to the shear plane, and opposite the support plate, a further support plate is provided, spaced apart by the thickness (d) of the sample, d) wherein the shearing plane can be adjusted as desired orthogonally to the movement path over the entire thickness (d) of the sample, wherein the shearing plane lies parallel to the travel path, e) wherein a pressure plate is secured to the upper base body, and a pressure plate is secured to the lower base body, wherein the pressure plates (7, 8) are aligned orthogonally to the shearing plane and are configured such as to introduce a force into the sample, characterised in that f) the support plates (10, 11) can be relocated by means of guide rails (12, 13) orthogonally to the shearing plane in each case independently of the upper base body or of the lower base body.
Process for treating the external surface of a ski sole of ultra-high molecular weight polyethylene (UHMWPE) produced by sintering, comprising the step of depositing on said surface polyalkylsiloxane, said process being characterised by comprising the successive steps of: - treating said surface with a plasma jet, by using a process gas including air, and - depositing on said surface a polyalkylsiloxane film, by a plasma treatment using an inert gas as carrier and an allylalkoxysilane as precursor. - treating said surface with a plasma jet, by using a process gas including air, and - depositing on said surface a polyalkylsiloxane film, by a plasma treatment using an inert gas as carrier and an allylalkoxysilane as precursor.
A flat leaf spring for a linear motor, wherein the spring consists of an inner fastening section, an outer fastening section, and a spring arm connecting the inner fastening section and the outer fastening section, in particular wherein the flat leaf spring is made from a single sheet such that the inner fastening section, the spring arm, and the outer fastening section are integral with each other, wherein the spring arm spirals around the center of area of the inner fastening section and the flat leaf spring is oblate in its plane of extension characterized in that a ratio between a width (w) of the leaf spring and a height (h) of the flat leaf spring has a value of at least about 1.33, the direction in which the height is measured being perpendicular to the direction in which the width is measured, and wherein the spring arm spirals around the centre of area of the inner fastening section over an angular range of at least 360 degree.
A thin film transistor comprising a gate electrode, a semiconductor layer overlapping with the gate electrode, the semiconductor layer including a first semiconductor layer and a second semiconductor layer, the first semiconductor layer including a first organic semiconductor material, the second semiconductor layer being farther spaced apart from the gate electrode than the first semiconductor layer, the second semiconductor layer including a second organic semiconductor material, and a HOMO energy level of the second organic semiconductor material being higher than a HOMO energy level of the first organic semiconductor material, wherein higher means greater in absolute values; and a source electrode and a drain electrode that are electrically connected to the semiconductor layer, wherein the first organic semiconductor material and the second organic semiconductor material each include a fused polycyclic heteroaromatic compound, characterized in that the fused polycyclic heteroaromatic compound of the first organic semiconductor material includes 8 or more fused rings, and the fused polycyclic heteroaromatic compound of the second organic semiconductor material includes less than 8 fused rings. a gate electrode, a semiconductor layer overlapping with the gate electrode, the semiconductor layer including a first semiconductor layer and a second semiconductor layer, the first semiconductor layer including a first organic semiconductor material, the second semiconductor layer being farther spaced apart from the gate electrode than the first semiconductor layer, the second semiconductor layer including a second organic semiconductor material, and a HOMO energy level of the second organic semiconductor material being higher than a HOMO energy level of the first organic semiconductor material, wherein higher means greater in absolute values; and a source electrode and a drain electrode that are electrically connected to the semiconductor layer, wherein the first organic semiconductor material and the second organic semiconductor material each include a fused polycyclic heteroaromatic compound, characterized in that the fused polycyclic heteroaromatic compound of the first organic semiconductor material includes 8 or more fused rings, and the fused polycyclic heteroaromatic compound of the second organic semiconductor material includes less than 8 fused rings.
Process for preparing chlorosilanes in a fluidized-bed reactor by reaction of a hydrogen chloride-containing reaction gas with a particulate contact composition containing silicon and optionally a catalyst, wherein the chlorosilanes have the general formula H n SiCl 4-n and/or H m Cl 6-m Si 2 where n = 1-4 and m = 0-4 and wherein the hydraulic diameter d hyd of the fluidized-bed reactor, the superficial velocity of the gas u L in the fluidized-bed reactor and the Sauter diameter d 32 of the particulate contact composition are selected so that points are imaged on an area in a cartesian coordinate system in which the Archimedes number Ar is plotted against the Reynolds number Re, where the area is defined by the equations 1a and 1b: Ar = 3 ⋅ 10 − 3 ⋅ Re 2 − 8.18 ⋅ Re + 1200 Ar = 4 ⋅ 10 − 6 ⋅ Re 2 − 0.69 ⋅ Re + 14400 with a lower limit Ar = 1 and an upper limit Ar = 3000, where Ar is determined by means of equation 3 Ar = g ⋅ d 32 3 υ F 2 ⋅ ρ P − ρ F ρ F and g is the acceleration due to gravity [m/s 2], d 32 is the Sauter diameter of the particles [m], ρ p is the solids density of the particles [kg/m 3], ρ F is the fluid density [kg/m 3], ν F is the kinematic viscosity of the fluid [m 2 /s], where Re is determined by means of equation 4 Re = u L ⋅ d hyd υ F and u L is the superficial velocity of the gas [m/s] and d hyd is the hydraulic diameter [m], where d hyd is determined by means of equation 5 d hyd = 4 ∗ A q, free U total, wetted and A q, free corresponds to the free flow cross section [m 2] in the fluidized-bed reactor and U total, wetted corresponds to the wetted perimeter [m] of all internals in the fluidized-bed reactor, where d hyd is from 0.7 to 1.8 m, u L is from 0.05 to 4 m/s and d 32 is from 5 to 500 μm. g is the acceleration due to gravity [m/s 2], d 32 is the Sauter diameter of the particles [m], ρ p is the solids density of the particles [kg/m 3], ρ F is the fluid density [kg/m 3], ν F is the kinematic viscosity of the fluid [m 2 /s], A q, free corresponds to the free flow cross section [m 2] in the fluidized-bed reactor and U total, wetted corresponds to the wetted perimeter [m] of all internals in the fluidized-bed reactor,
A process for the production of a decorative, abrasion-resistant laminate, comprising the following steps: (a) application of a thermoplastic as melt to a flexible carrier web, the surface of which has slightly adhesive properties, in order to form a thermoplastic wearlayer; (b) cooling of the thermoplastic wearlayer located on the carrier; (c) transfer of the wearlayer to a substrate via melting of the carrier web, provided with the wearlayer, onto the substrate at elevated temperature, thus forming a composite comprising, in this sequence, the substrate, the wearlayer, and the carrier; (d) cooling of the composite; and (e) removal of the carrier web from the wearlayer, where, after the step (b) and before the step (c), the thermoplastic wearlayer applied on the carrier web is provided with a reverse print, and the print image of the reverse print is positioned in such a way as to be synchronous with respect to the structure of the carrier web. (a) application of a thermoplastic as melt to a flexible carrier web, the surface of which has slightly adhesive properties, in order to form a thermoplastic wearlayer; (b) cooling of the thermoplastic wearlayer located on the carrier; (c) transfer of the wearlayer to a substrate via melting of the carrier web, provided with the wearlayer, onto the substrate at elevated temperature, thus forming a composite comprising, in this sequence, the substrate, the wearlayer, and the carrier; (d) cooling of the composite; and (e) removal of the carrier web from the wearlayer,
A ferromagnetic powder composition comprising soft magnetic iron-based core particles, wherein the surface of the core particles is provided with a first phosphorus-based inorganic insulating layer and at least one metal-organic layer, located outside the first layer, of a metal-organic compound having the following general formula: R 1 [(R 1) x (R 2) y] n O n-1 R 1 wherein M is a central atom selected from Si, Ti, Al, or Zr; O is oxygen; R 1 is a hydrolysable group; R 2 is an organic moiety and wherein at least one R 2 contains at least one amino group; wherein n is the number of repeatable units and n = 2-20; wherein is 0 or 1; wherein y is 1 or 2; wherein a metallic or semi-metallic particulate compound having a Mohs hardness of less than 3.5 being adhered to at least one metal-organic layer; and wherein the powder composition further comprises a particulate lubricant; characterised in that the metallic or semi-metallic particulate compound is bismuth oxide. wherein M is a central atom selected from Si, Ti, Al, or Zr; O is oxygen; R 1 is a hydrolysable group; R 2 is an organic moiety and wherein at least one R 2 contains at least one amino group; wherein n is the number of repeatable units and n = 2-20; wherein is 0 or 1; wherein y is 1 or 2;
An apparatus, comprising: a deposition chamber elongated horizontally and comprising a top portion with a top cover and a bottom portion with a bottom cover, a filter positioned horizontally in the deposition chamber separating the top portion from the bottom portion, wherein the filter comprises a deposition area, an inlet arranged in the top portion of the deposition chamber and configured to provide a gas comprising high aspect ratio molecular structures, HARM-structures, into the deposition chamber, an outlet arranged in the bottom portion of the deposition chamber and configured to collect gas from the deposition chamber, and a control system configured to control gas flow at the inlet and the outlet, wherein the inlet, the outlet and the filter are arranged to create a gas flow path for the gas comprising HARM-structures from the inlet in the top portion towards the outlet in the bottom portion and through the filter, wherein the direction of flow of the gas comprising HARM-structures in proximity to the deposition area of the filter is at least partially parallel to the filter; and wherein the control system and the relative positions of the inlet, the outlet, the top cover, the bottom cover and the filter are arranged to maintain a laminar gas flow of the gas comprising HARM-structures in proximity to the deposition area of the filter. a deposition chamber elongated horizontally and comprising a top portion with a top cover and a bottom portion with a bottom cover, a filter positioned horizontally in the deposition chamber separating the top portion from the bottom portion, wherein the filter comprises a deposition area, an inlet arranged in the top portion of the deposition chamber and configured to provide a gas comprising high aspect ratio molecular structures, HARM-structures, into the deposition chamber, an outlet arranged in the bottom portion of the deposition chamber and configured to collect gas from the deposition chamber, and a control system configured to control gas flow at the inlet and the outlet, wherein the inlet, the outlet and the filter are arranged to create a gas flow path for the gas comprising HARM-structures from the inlet in the top portion towards the outlet in the bottom portion and through the filter, wherein the direction of flow of the gas comprising HARM-structures in proximity to the deposition area of the filter is at least partially parallel to the filter; and wherein the control system and the relative positions of the inlet, the outlet, the top cover, the bottom cover and the filter are arranged to maintain a laminar gas flow of the gas comprising HARM-structures in proximity to the deposition area of the filter.
An aircraft seat comprising: a seat pan base; a metallic lattice disposed on the seat pan base; and a seat cover disposed on the metallic lattice; wherein the seat cover defines one or more contoured portions, and the contoured portions define variable cross-sectional thicknesses disposed in regions to provide more or less cushioning, characterized in that the metallic lattice defines internal regions of differing lattice structure resulting in different local negative stiffness. a seat pan base; a metallic lattice disposed on the seat pan base; and a seat cover disposed on the metallic lattice; wherein the seat cover defines one or more contoured portions, and the contoured portions define variable cross-sectional thicknesses disposed in regions to provide more or less cushioning, characterized in that the metallic lattice defines internal regions of differing lattice structure resulting in different local negative stiffness.
A cosmetic composition having an antioxidant efficacy, the cosmetic composition comprising Dahlia pinnata extract, wherein the Dahlia pinnata composition has a content of the Dahlia pinnata extract in a range of from 500 μg/ml to 10000 μg/ml, wherein the Dahlia pinnata extract is extracted by adding and stirring 5 to 20 ml of ethanol per 1 g of Dahlia pinnata petals, and wherein the Dahlia pinnata composition has a phenolic compound content of 43.1 μg/100 mg to 56.5 μg/100 mg.
A method for forming a memory cell, the method comprising: forming a stack of materials, wherein forming the stack of materials includes: forming a first electrode, forming a memory element (714A, 714B), forming a second electrode 712, a switch element (710A, 710B), and a third electrode; performing a first etch, by a directional process, of the switch element before etching the third electrode; performing a second etch, by a selective process before etching the third electrode, of the switch element to a smallest lateral dimension that is less than a smallest lateral dimension to which the first electrode, the second electrode 712, and the third electrode are to be etched; performing a third etch of the third electrode; and performing a fourth etch, by a selective process, of the memory element (714A, 714B) to a smallest lateral dimension that is less than a smallest lateral dimension to which the first electrode, the second electrode 712, and the third electrode is to be etched and different than the smallest lateral dimension of the selectively etched switch element, wherein the first etch, the second etch, the third etch, and the fourth etch are performed subsequent to forming the stack of materials. forming a stack of materials, wherein forming the stack of materials includes: forming a first electrode, forming a memory element (714A, 714B), forming a second electrode 712, a switch element (710A, 710B), and a third electrode; forming a first electrode, forming a memory element (714A, 714B), forming a second electrode 712, a switch element (710A, 710B), and a third electrode; performing a first etch, by a directional process, of the switch element before etching the third electrode; performing a second etch, by a selective process before etching the third electrode, of the switch element to a smallest lateral dimension that is less than a smallest lateral dimension to which the first electrode, the second electrode 712, and the third electrode are to be etched; performing a third etch of the third electrode; and performing a fourth etch, by a selective process, of the memory element (714A, 714B) to a smallest lateral dimension that is less than a smallest lateral dimension to which the first electrode, the second electrode 712, and the third electrode is to be etched and different than the smallest lateral dimension of the selectively etched switch element, wherein the first etch, the second etch, the third etch, and the fourth etch are performed subsequent to forming the stack of materials.
Arrangement for sealing an open cavity against hot gas entrainment, wherein said open cavity being arranged between two axially adjacent stationary components (1, 2) limiting radially a hot gas path of a rotary flow machine, of which at least the downstream component carries at least one airfoil extending radially into said hot gas path, and a multitude of supply conduits arranged in at least one row passing through one of the two stationary components (1, 2) merge into said open cavity for directing air jets into said open cavity, wherein each of the supply conduits - merges into the open cavity in a distance h to the hot gas path with 5 mm ≤ h ≤ 100 mm, - provides a channels axis at its outlet being inclined with respect to the axial hot gas flow direction by an angle θ with 0° ≤ θ ≤ 60° and being inclined in an circumferential direction with respect to said axial hot gas flow by an angle β with 0° < β ≤ 60°, - provides a diameter d with 0.4 mm ≤ d ≤ 3 mm, - is arranged at a location close to the at least one airfoil characterized in that the open cavity provides an axial width w with 5 mm < w ≤ 30 mm and a circumferential extension, and the adjacent supply conduits are arranged side by side in circumferential direction closing a mutual pitch p with 2d ≤ p ≤ 20d. - merges into the open cavity in a distance h to the hot gas path with 5 mm ≤ h ≤ 100 mm, - provides a channels axis at its outlet being inclined with respect to the axial hot gas flow direction by an angle θ with 0° ≤ θ ≤ 60° and being inclined in an circumferential direction with respect to said axial hot gas flow by an angle β with 0° < β ≤ 60°, - provides a diameter d with 0.4 mm ≤ d ≤ 3 mm, - is arranged at a location close to the at least one airfoil characterized in that the open cavity provides an axial width w with 5 mm < w ≤ 30 mm and a circumferential extension, and the adjacent supply conduits are arranged side by side in circumferential direction closing a mutual pitch p with 2d ≤ p ≤ 20d.