A method for writing an imageable material using multiple beams, such as laser beams, wherein N beams are available and N is at least four; said method comprising: - preparing subsequent patterns each having Y rows of N pixel locations, said subsequent patterns including a first and a second pattern; wherein the first and the second pattern overlap with each other in an overlap area consisting of O columns and Y rows of pixel locations, wherein O is at least two and smaller than N; - selecting for each row i of said first pattern Mi1 pixel locations; - selecting for each row i of said second pattern Mi2 pixel locations; - writing simultaneously, for each row i, said Mi1 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material; and next moving said N beams relative to said imageable material in a slow scan direction over (N-O) pixel locations; - writing simultaneously, for each row i, said Mi2 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material; - wherein said selecting is such that at least one of the following conditions is fulfilled: said Mi1 pixel locations of said first pattern are selected such that, for a row i, at least one selected pixel location thereof is separated from an adjacent selected pixel location by at least one non-selected pixel location located in the overlap area; and said Mi2 pixel locations of said second pattern are selected such that, for said row i, said non-selected pixel location of the first pattern is selected in the second pattern; wherein different rows of the first pattern contain selected pixel locations in different columns of the overlap area; said Mi1 pixel locations of said first pattern are selected such that, the number Mi1 is different for at least two different rows and such that any non-selected pixel location of the first pattern is selected in the second pattern. - preparing subsequent patterns each having Y rows of N pixel locations, said subsequent patterns including a first and a second pattern; wherein the first and the second pattern overlap with each other in an overlap area consisting of O columns and Y rows of pixel locations, wherein O is at least two and smaller than N; - selecting for each row i of said first pattern Mi1 pixel locations; - selecting for each row i of said second pattern Mi2 pixel locations; - writing simultaneously, for each row i, said Mi1 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material; and next moving said N beams relative to said imageable material in a slow scan direction over (N-O) pixel locations; - writing simultaneously, for each row i, said Mi2 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material; - wherein said selecting is such that at least one of the following conditions is fulfilled: said Mi1 pixel locations of said first pattern are selected such that, for a row i, at least one selected pixel location thereof is separated from an adjacent selected pixel location by at least one non-selected pixel location located in the overlap area; and said Mi2 pixel locations of said second pattern are selected such that, for said row i, said non-selected pixel location of the first pattern is selected in the second pattern; wherein different rows of the first pattern contain selected pixel locations in different columns of the overlap area; said Mi1 pixel locations of said first pattern are selected such that, the number Mi1 is different for at least two different rows and such that any non-selected pixel location of the first pattern is selected in the second pattern. said Mi1 pixel locations of said first pattern are selected such that, for a row i, at least one selected pixel location thereof is separated from an adjacent selected pixel location by at least one non-selected pixel location located in the overlap area; and said Mi2 pixel locations of said second pattern are selected such that, for said row i, said non-selected pixel location of the first pattern is selected in the second pattern; wherein different rows of the first pattern contain selected pixel locations in different columns of the overlap area; said Mi1 pixel locations of said first pattern are selected such that, the number Mi1 is different for at least two different rows and such that any non-selected pixel location of the first pattern is selected in the second pattern.