A system, comprising: a processor configured to: receive an indication of a selection of a first piece of equipment in an industrial monitoring system; determine a first feature of interest (150,151) in a first plot including information derived from a first sensor of one or more sensors configured to monitor a first piece of equipment in an industrial monitoring system; characterized in that the processor is further configured to: match the first feature of interest (150,151) with a corresponding second feature (154,155) of interest in a second plot by calculating a correlation for one or more portions of other plots to determine whether an analyzed one of said one or more portions of each of the other plots corresponds to the first feature of interest (150, 151) in the first plot, wherein the second plot corresponds to a second sensor configured to measure a second piece of equipment; align the first feature of interest (150, 151) with the second feature of interest (154, 155) by shifting at least one of the first plot and the second plot so that the first and second features of interest timely coincide with each other; overlay the shifted first plot and the second plot based at least in part on the first feature of interest (150,151) and the corresponding second feature of interest (154,155); and output the overlay of the first plot with the second plot to a graphical user interface. receive an indication of a selection of a first piece of equipment in an industrial monitoring system; determine a first feature of interest (150,151) in a first plot including information derived from a first sensor of one or more sensors configured to monitor a first piece of equipment in an industrial monitoring system; characterized in that the processor is further configured to: match the first feature of interest (150,151) with a corresponding second feature (154,155) of interest in a second plot by calculating a correlation for one or more portions of other plots to determine whether an analyzed one of said one or more portions of each of the other plots corresponds to the first feature of interest (150, 151) in the first plot, wherein the second plot corresponds to a second sensor configured to measure a second piece of equipment; align the first feature of interest (150, 151) with the second feature of interest (154, 155) by shifting at least one of the first plot and the second plot so that the first and second features of interest timely coincide with each other; overlay the shifted first plot and the second plot based at least in part on the first feature of interest (150,151) and the corresponding second feature of interest (154,155); and output the overlay of the first plot with the second plot to a graphical user interface. match the first feature of interest (150,151) with a corresponding second feature (154,155) of interest in a second plot by calculating a correlation for one or more portions of other plots to determine whether an analyzed one of said one or more portions of each of the other plots corresponds to the first feature of interest (150, 151) in the first plot, wherein the second plot corresponds to a second sensor configured to measure a second piece of equipment; align the first feature of interest (150, 151) with the second feature of interest (154, 155) by shifting at least one of the first plot and the second plot so that the first and second features of interest timely coincide with each other; overlay the shifted first plot and the second plot based at least in part on the first feature of interest (150,151) and the corresponding second feature of interest (154,155); and output the overlay of the first plot with the second plot to a graphical user interface.