A method for preparing a lithographic printing plate, the method comprising: (a) imagewise exposing a negative-working lithographic printing plate precursor comprising a substrate having disposed thereon a negative-working radiation-sensitive imageable layer, and optionally, a hydrophilic overcoat disposed on the negative-working radiation-sensitive imageable layer, to provide an exposed precursor comprising exposed regions and non-exposed regions in the negative-working radiation-sensitive imageable layer; (b) optionally heating the exposed precursor to a temperature of at least 60°C and up to and including 180°C; (c) optionally washing the exposed precursor to remove the hydrophilic overcoat; (d) treating the exposed precursor with one or more successive applications of a processing solution to provide an exposed and processed precursor, the processing solution having a pH of at least 7 and up to and including 11 and comprising: component that is a nitrogen-containing base having an atmospheric pressure melting point of at least 40°C, and is present in an amount of at least 1 weight % based on the total processing solution weight; component that is a non-ionic surfactant that independently has an atmospheric pressure melting point, glass transition temperature, or pour point of at least 40°C, and is present in an amount of at least 1 weight % based on the total processing solution weight; component that is a hydroxy-containing solution promoter that is present in an amount of at least 0.5 weight % based on the total processing solution weight; and component that is a hydrophilic surface protective compound that can be present in an amount of at least 1 weight % based on the total processing solution weight; (e) optionally, drying the exposed and processed precursor; and (f) mounting the exposed and processed precursor on a printing press, with the proviso that the exposed precursor is not further treated with any liquid between (d) and (f). (a) imagewise exposing a negative-working lithographic printing plate precursor comprising a substrate having disposed thereon a negative-working radiation-sensitive imageable layer, and optionally, a hydrophilic overcoat disposed on the negative-working radiation-sensitive imageable layer, to provide an exposed precursor comprising exposed regions and non-exposed regions in the negative-working radiation-sensitive imageable layer; (b) optionally heating the exposed precursor to a temperature of at least 60°C and up to and including 180°C; (c) optionally washing the exposed precursor to remove the hydrophilic overcoat; (d) treating the exposed precursor with one or more successive applications of a processing solution to provide an exposed and processed precursor, the processing solution having a pH of at least 7 and up to and including 11 and comprising: component that is a nitrogen-containing base having an atmospheric pressure melting point of at least 40°C, and is present in an amount of at least 1 weight % based on the total processing solution weight; component that is a non-ionic surfactant that independently has an atmospheric pressure melting point, glass transition temperature, or pour point of at least 40°C, and is present in an amount of at least 1 weight % based on the total processing solution weight; component that is a hydroxy-containing solution promoter that is present in an amount of at least 0.5 weight % based on the total processing solution weight; and component that is a hydrophilic surface protective compound that can be present in an amount of at least 1 weight % based on the total processing solution weight; component that is a nitrogen-containing base having an atmospheric pressure melting point of at least 40°C, and is present in an amount of at least 1 weight % based on the total processing solution weight; component that is a non-ionic surfactant that independently has an atmospheric pressure melting point, glass transition temperature, or pour point of at least 40°C, and is present in an amount of at least 1 weight % based on the total processing solution weight; component that is a hydroxy-containing solution promoter that is present in an amount of at least 0.5 weight % based on the total processing solution weight; and component that is a hydrophilic surface protective compound that can be present in an amount of at least 1 weight % based on the total processing solution weight; (e) optionally, drying the exposed and processed precursor; and (f) mounting the exposed and processed precursor on a printing press,