An electric circuitry for strain measurement, comprising: - at least a first ring oscillator and at least a second ring oscillator being arranged on a substrate, wherein the at least one first ring oscillator comprises at least a first delay chain and the at least one second ring oscillator comprises at least a second delay chain, wherein the at least one first delay chain of a plurality of delay elements (110a,..., 110n) and the at least one second delay chain of a plurality of delay elements (210a,..., 210n) are arranged on the substrate, the propagation delay time of the respective delay elements (110a,..., 110n; 220a,..., 220n) of the at least one first and second delay chain (110, 210) being dependent on a strain applied to the substrate, wherein the at least one first ring oscillator has a first oscillation frequency being dependent on a direction of the strain applied on the substrate, wherein the at least one second ring oscillator has a second oscillation frequency being dependent on the direction of the strain applied on the substrate, and - a processing circuit configured to determine a magnitude of the strain applied on the substrate in dependence on the first and second oscillation frequencies, characterized in that the delay elements (110a,..., 110n) of the at least one first delay chain have other orientation on the substrate than the delay elements (210a,..., 210n) of the at least one second delay chain such that the at least one first ring oscillator and the at least one second ring oscillator are arranged on the substrate in different orientations. - at least a first ring oscillator and at least a second ring oscillator being arranged on a substrate, wherein the at least one first ring oscillator comprises at least a first delay chain and the at least one second ring oscillator comprises at least a second delay chain, wherein the at least one first delay chain of a plurality of delay elements (110a,..., 110n) and the at least one second delay chain of a plurality of delay elements (210a,..., 210n) are arranged on the substrate, the propagation delay time of the respective delay elements (110a,..., 110n; 220a,..., 220n) of the at least one first and second delay chain (110, 210) being dependent on a strain applied to the substrate, wherein the at least one first ring oscillator has a first oscillation frequency being dependent on a direction of the strain applied on the substrate, wherein the at least one second ring oscillator has a second oscillation frequency being dependent on the direction of the strain applied on the substrate, and wherein the at least one first ring oscillator comprises at least a first delay chain and the at least one second ring oscillator comprises at least a second delay chain, wherein the at least one first delay chain of a plurality of delay elements (110a,..., 110n) and the at least one second delay chain of a plurality of delay elements (210a,..., 210n) are arranged on the substrate, the propagation delay time of the respective delay elements (110a,..., 110n; 220a,..., 220n) of the at least one first and second delay chain (110, 210) being dependent on a strain applied to the substrate, wherein the at least one first ring oscillator has a first oscillation frequency being dependent on a direction of the strain applied on the substrate, wherein the at least one second ring oscillator has a second oscillation frequency being dependent on the direction of the strain applied on the substrate, and - a processing circuit configured to determine a magnitude of the strain applied on the substrate in dependence on the first and second oscillation frequencies, characterized in that the delay elements (110a,..., 110n) of the at least one first delay chain have other orientation on the substrate than the delay elements (210a,..., 210n) of the at least one second delay chain such that the at least one first ring oscillator and the at least one second ring oscillator are arranged on the substrate in different orientations. characterized in that the delay elements (110a,..., 110n) of the at least one first delay chain have other orientation on the substrate than the delay elements (210a,..., 210n) of the at least one second delay chain such that the at least one first ring oscillator and the at least one second ring oscillator are arranged on the substrate in different orientations.