Sputtering target comprising an electrically conductive, oxidic target material, where the target material consists, together with impurities, of at least one metal oxide - of molybdenum (Mo) as metallic main constituent, and of at least one doping element M from the group consisting of tantalum (Ta), niobium (Nb), vanadium and titanium (Ti), characterized in that the target material comprises, based on a polished section thereof - measured using a Raman microscope as indicated in the description - a matrix phase composed of a mixed oxide (Mo 1-x M x) 5 O 14 where 0.01 ≤ x ≤ 0.13, where M in this mixed oxide is one or more elements from the group consisting of tantalum (Ta), niobium (Nb), vanadium and titanium (Ti), wherein the matrix phase composed of the mixed oxide in the target material has, based on a polished section of the target material - measured using a Raman microscope as indicated in the description - a proportion of 100% or a proportion of ≥ 60% by volume and the target material consists furthermore of a. MoO 2 and Mo 4 O 11 and also b. optionally one or more compound(s) from the group consisting of: - MoO 3, - further substoichiometric molybdenum oxides from the group consisting of Mo 17 O 47, Mo 5 O 14, Mo 8 O 23, Mo 9 O 26 and Mo 18 O 52, - stoichiometric and/or substoichiometric Ta oxide(s), - stoichiometric and/or substoichiometric Nb oxide(s), - stoichiometric and/or substoichiometric V oxide(s), and - stoichiometric and/or substoichiometric Ti oxide(s), as one or more second phases which are distributed as islands in the matrix phase, with these second phases forming, based on a polished section of the target material and measured using a Raman microscope as indicated in the description, a total proportion of ≤ 40% by volume, wherein the proportion of the second phase MoOs in the target material is, based on a polished section of the target material - measured using a Raman microscope as indicated in the description - in the range 0 - 2% by volume, wherein the oxygen content in % by weight and determined by carrier gas hot extraction the target material is in the range from 26 to 32% by weight and wherein the total proportion of the doping element M in at.% in the target material relative to the total content of Mo and the doping element M in at.% is in the range 0.02 - 0.15. - of molybdenum (Mo) as metallic main constituent, and of at least one doping element M from the group consisting of tantalum (Ta), niobium (Nb), vanadium and titanium (Ti), characterized in that the target material comprises, based on a polished section thereof - measured using a Raman microscope as indicated in the description - a matrix phase composed of a mixed oxide (Mo 1-x M x) 5 O 14 where 0.01 ≤ x ≤ 0.13, where M in this mixed oxide is one or more elements from the group consisting of tantalum (Ta), niobium (Nb), vanadium and titanium (Ti), wherein the matrix phase composed of the mixed oxide in the target material has, based on a polished section of the target material - measured using a Raman microscope as indicated in the description - a proportion of 100% or a proportion of ≥ 60% by volume and the target material consists furthermore of a. MoO 2 and Mo 4 O 11 and also b. optionally one or more compound(s) from the group consisting of: - MoO 3, - further substoichiometric molybdenum oxides from the group consisting of Mo 17 O 47, Mo 5 O 14, Mo 8 O 23, Mo 9 O 26 and Mo 18 O 52, - stoichiometric and/or substoichiometric Ta oxide(s), - stoichiometric and/or substoichiometric Nb oxide(s), - stoichiometric and/or substoichiometric V oxide(s), and - stoichiometric and/or substoichiometric Ti oxide(s), as one or more second phases which are distributed as islands in the matrix phase, with these second phases forming, based on a polished section of the target material and measured using a Raman microscope as indicated in the description, a total proportion of ≤ 40% by volume, wherein the proportion of the second phase MoOs in the target material is, based on a polished section of the target material - measured using a Raman microscope as indicated in the description - in the range 0 - 2% by volume, wherein the oxygen content in % by weight and determined by carrier gas hot extraction the target material is in the range from 26 to 32% by weight and wherein the total proportion of the doping element M in at.% in the target material relative to the total content of Mo and the doping element M in at.% is in the range 0.02 - 0.15. a. MoO 2 and Mo 4 O 11 and also b. optionally one or more compound(s) from the group consisting of: - MoO 3, - further substoichiometric molybdenum oxides from the group consisting of Mo 17 O 47, Mo 5 O 14, Mo 8 O 23, Mo 9 O 26 and Mo 18 O 52, - stoichiometric and/or substoichiometric Ta oxide(s), - stoichiometric and/or substoichiometric Nb oxide(s), - stoichiometric and/or substoichiometric V oxide(s), and - stoichiometric and/or substoichiometric Ti oxide(s), - MoO 3, - further substoichiometric molybdenum oxides from the group consisting of Mo 17 O 47, Mo 5 O 14, Mo 8 O 23, Mo 9 O 26 and Mo 18 O 52, - stoichiometric and/or substoichiometric Ta oxide(s), - stoichiometric and/or substoichiometric Nb oxide(s), - stoichiometric and/or substoichiometric V oxide(s), and - stoichiometric and/or substoichiometric Ti oxide(s),