An electroplated article comprising: a base member that includes one or more base member-metallic elements; and an electroplated layer that is formed directly on the base member, the electroplated layer including at least a first electroplated layer-metallic element and a second electroplated layer-metallic element that is different from the first electroplated layer-metallic element, wherein the second electroplated layer-metallic element is a metallic element that is identical to at least one of the one or more base member-metallic elements, and a ratio of the second electroplated layer-metallic element in the electroplated layer is continuously decreased as being away from the base member in the thickness direction of the electroplated layer, characterized in that: alloy grains including at least the first and second electroplated layer-metallic elements are distributed in the electroplated layer such that an interface is not observed between the base member and the electroplated layer in a first TEM (Transmission Electron Microscope) image obtained at magnification of 200 000, and wherein at least one of following conditions is satisfied: (a) the electroplated layer includes a region where the grains, each having a width equal to or less than 100 nm or equal to or less than 50 nm, are formed; and (b) when rectangular frames are respectively applied to the grains observed in a second TEM image obtained at magnification of 1 000 000 and a value of half of area of each rectangular frame is determined as an area of the grain, an average area of the grains in the second TEM image is equal to or less than 1 000 nm 2. a base member that includes one or more base member-metallic elements; and an electroplated layer that is formed directly on the base member, the electroplated layer including at least a first electroplated layer-metallic element and a second electroplated layer-metallic element that is different from the first electroplated layer-metallic element, wherein the second electroplated layer-metallic element is a metallic element that is identical to at least one of the one or more base member-metallic elements, and a ratio of the second electroplated layer-metallic element in the electroplated layer is continuously decreased as being away from the base member in the thickness direction of the electroplated layer, characterized in that: alloy grains including at least the first and second electroplated layer-metallic elements are distributed in the electroplated layer such that an interface is not observed between the base member and the electroplated layer in a first TEM (Transmission Electron Microscope) image obtained at magnification of 200 000, and wherein at least one of following conditions is satisfied: (a) the electroplated layer includes a region where the grains, each having a width equal to or less than 100 nm or equal to or less than 50 nm, are formed; and (b) when rectangular frames are respectively applied to the grains observed in a second TEM image obtained at magnification of 1 000 000 and a value of half of area of each rectangular frame is determined as an area of the grain, an average area of the grains in the second TEM image is equal to or less than 1 000 nm 2. alloy grains including at least the first and second electroplated layer-metallic elements are distributed in the electroplated layer such that an interface is not observed between the base member and the electroplated layer in a first TEM (Transmission Electron Microscope) image obtained at magnification of 200 000, and wherein at least one of following conditions is satisfied: (a) the electroplated layer includes a region where the grains, each having a width equal to or less than 100 nm or equal to or less than 50 nm, are formed; and (b) when rectangular frames are respectively applied to the grains observed in a second TEM image obtained at magnification of 1 000 000 and a value of half of area of each rectangular frame is determined as an area of the grain, an average area of the grains in the second TEM image is equal to or less than 1 000 nm 2. (a) the electroplated layer includes a region where the grains, each having a width equal to or less than 100 nm or equal to or less than 50 nm, are formed; and (b) when rectangular frames are respectively applied to the grains observed in a second TEM image obtained at magnification of 1 000 000 and a value of half of area of each rectangular frame is determined as an area of the grain, an average area of the grains in the second TEM image is equal to or less than 1 000 nm 2.