A coating apparatus which applies a material to an object to be coated, comprising: an applicator comprising a meniscus pillar forming portion configured to form a meniscus pillar of the material in conjunction with a surface to be coated of the object to be coated and a recess (52, 55) formed in a position different from that of the meniscus pillar forming portion and recessed relative to the surroundings thereof; a material supply unit which supplies the material to the applicator; a first moving mechanism configured to move the position of the applicator relative to the surface to be coated along the surface to be coated; a second moving mechanism (70, 150) configured to move the position of the applicator relative to the surface to be coated so that the meniscus pillar, which is formed between the meniscus pillar forming portion and the surface to be coated, is moved between the surface to be coated and the recess (52, 55); and a third moving mechanism configured to move the position of the applicator relatively toward and away from the surface to be coated, characterized in that the applicator is rotatable through a predetermined angular range, and the second moving mechanism is configured to rotate the applicator relative to the surface to be coated of the object to be coated through the predetermined angular range, thereby locating the recess (52, 55) opposite the surface to be coated. an applicator comprising a meniscus pillar forming portion configured to form a meniscus pillar of the material in conjunction with a surface to be coated of the object to be coated and a recess (52, 55) formed in a position different from that of the meniscus pillar forming portion and recessed relative to the surroundings thereof; a material supply unit which supplies the material to the applicator; a first moving mechanism configured to move the position of the applicator relative to the surface to be coated along the surface to be coated; a second moving mechanism (70, 150) configured to move the position of the applicator relative to the surface to be coated so that the meniscus pillar, which is formed between the meniscus pillar forming portion and the surface to be coated, is moved between the surface to be coated and the recess (52, 55); and a third moving mechanism configured to move the position of the applicator relatively toward and away from the surface to be coated, a material supply unit which supplies the material to the applicator; a first moving mechanism configured to move the position of the applicator relative to the surface to be coated along the surface to be coated; a second moving mechanism (70, 150) configured to move the position of the applicator relative to the surface to be coated so that the meniscus pillar, which is formed between the meniscus pillar forming portion and the surface to be coated, is moved between the surface to be coated and the recess (52, 55); and a third moving mechanism configured to move the position of the applicator relatively toward and away from the surface to be coated, characterized in that the applicator is rotatable through a predetermined angular range, and the second moving mechanism is configured to rotate the applicator relative to the surface to be coated of the object to be coated through the predetermined angular range, thereby locating the recess (52, 55) opposite the surface to be coated.