A composition for a negative tone, aqueous base developable, broadband UV resist which is also sensitive in the areas exposed to broadband irradiation to subsequent cold laser ablation by an UV Excimer Laser emitting between 222 nm and 308 nm where the composition is comprised of components of type a) and b); a) components for imparting negative tone, aqueous base developable, broadband UV resist behavior comprised of a-2) at least one polymer comprising a structure of the following formula: wherein each of R 1b - R 5b is independently selected from the group consisting of H, F and CH 3, R 6b is selected from the group consisting of a substituted aryl, unsubstituted aryl, substituted heteroaryl and unsubstituted heteroaryl group; R 7b is a substituted or unsubstituted benzyl group; R 8b is selected from the group consisting of a linear or branched C 2 -C 10 hydroxy alkyl group; R 9b is an acid cleavable group, v = 10 - 40 mole%, w = 0 - 35 mole%, x = 0 - 60 mole%, y = 10 - 60 mole% and z = 25 - 40 mole% as a resin containing phenolic moieties, carboxylic acid moieties or a combination of both types moieties such that the resin dissolves in aqueous base; b-2) one or more free radical initiators activated by actinic radiation as photo-initiator sensitive to broadband irradiation, c-2) one or more crosslinkable acrylated monomers capable of undergoing free radical crosslinking wherein the acrylate functionality is greater than 1 as cross-linker, and d-2) a photoresist solvent, and b) a cold laser ablation excimer laser sensitizer component system comprised of at least one conjugated aryl additive absorbing ultraviolet radiation strongly in a range between from 222 nm to 310 nm, selected from the group consisting of; where each R 3 is independently selected from the group consisting of hydrogen, an alkyl group, an alkylenefluoroalkyl group, an alkylene aryl group, and an alkyleneoxyalkyl group; X 3 is selected from the group consisting of Cl, Br or I. a) components for imparting negative tone, aqueous base developable, broadband UV resist behavior comprised of a-2) at least one polymer comprising a structure of the following formula: wherein each of R 1b - R 5b is independently selected from the group consisting of H, F and CH 3, R 6b is selected from the group consisting of a substituted aryl, unsubstituted aryl, substituted heteroaryl and unsubstituted heteroaryl group; R 7b is a substituted or unsubstituted benzyl group; R 8b is selected from the group consisting of a linear or branched C 2 -C 10 hydroxy alkyl group; R 9b is an acid cleavable group, v = 10 - 40 mole%, w = 0 - 35 mole%, x = 0 - 60 mole%, y = 10 - 60 mole% and z = 25 - 40 mole% as a resin containing phenolic moieties, carboxylic acid moieties or a combination of both types moieties such that the resin dissolves in aqueous base; b-2) one or more free radical initiators activated by actinic radiation as photo-initiator sensitive to broadband irradiation, c-2) one or more crosslinkable acrylated monomers capable of undergoing free radical crosslinking wherein the acrylate functionality is greater than 1 as cross-linker, and d-2) a photoresist solvent, and a-2) at least one polymer comprising a structure of the following formula: wherein each of R 1b - R 5b is independently selected from the group consisting of H, F and CH 3, R 6b is selected from the group consisting of a substituted aryl, unsubstituted aryl, substituted heteroaryl and unsubstituted heteroaryl group; R 7b is a substituted or unsubstituted benzyl group; R 8b is selected from the group consisting of a linear or branched C 2 -C 10 hydroxy alkyl group; R 9b is an acid cleavable group, v = 10 - 40 mole%, w = 0 - 35 mole%, x = 0 - 60 mole%, y = 10 - 60 mole% and z = 25 - 40 mole% as a resin containing phenolic moieties, carboxylic acid moieties or a combination of both types moieties such that the resin dissolves in aqueous base; b-2) one or more free radical initiators activated by actinic radiation as photo-initiator sensitive to broadband irradiation, c-2) one or more crosslinkable acrylated monomers capable of undergoing free radical crosslinking wherein the acrylate functionality is greater than 1 as cross-linker, and d-2) a photoresist solvent, and b) a cold laser ablation excimer laser sensitizer component system comprised of at least one conjugated aryl additive absorbing ultraviolet radiation strongly in a range between from 222 nm to 310 nm, selected from the group consisting of; where each R 3 is independently selected from the group consisting of hydrogen, an alkyl group, an alkylenefluoroalkyl group, an alkylene aryl group, and an alkyleneoxyalkyl group; X 3 is selected from the group consisting of Cl, Br or I.