A method for controlling an axial radial rolling mill for rings, wherein the axial radial rolling mill comprises: - a main roller adapted to stay in contact with an outer perimeter surface of the ring being processed, - a contrast roller having an axis of rotation coplanar to the axis of rotation of the main roller and adapted to stay in contact with an inner perimeter surface of the ring being processed, - a pair of guide rollers having axes of rotation parallel to the axis of rotation of the main roller and adapted to stay in contact with the outer perimeter surface of the ring being processed, and - a pair of tapered rollers (130, 135) having coplanar axes of rotation on said plane of symmetry, which are respectively adapted to stay in contact with the opposite axial ends (215, 220) of the ring being processed, wherein the control method provides for adjusting the rotational speed of each tapered roller (130, 135) by means of the steps of: - establishing a reference value (v) of the rotational speed of the tapered roller (130, 135), - applying a correction (d1, d2) to said reference value (v) to obtain a corrected value (v*, v**) of the rotational speed of the tapered roller (130, 135), - actuating the tapered roller (130, 135) at a rotational speed having the corrected value (v*, v**), and wherein the correction (d1, d2) comprises at least one feedback contribution (r1, r2) provided by a controller (S120, S150) of the proportional-integrative or proportional-integrative-derivative type, characterized in that the control method provides for varying at least the coefficients of the proportional part and of the integrative part of the controller (S120, S150) on the basis of the value of at least one physical parameter of the ring being processed. wherein the axial radial rolling mill comprises: - a main roller adapted to stay in contact with an outer perimeter surface of the ring being processed, - a contrast roller having an axis of rotation coplanar to the axis of rotation of the main roller and adapted to stay in contact with an inner perimeter surface of the ring being processed, - a pair of guide rollers having axes of rotation parallel to the axis of rotation of the main roller and adapted to stay in contact with the outer perimeter surface of the ring being processed, and - a pair of tapered rollers (130, 135) having coplanar axes of rotation on said plane of symmetry, which are respectively adapted to stay in contact with the opposite axial ends (215, 220) of the ring being processed, - a main roller adapted to stay in contact with an outer perimeter surface of the ring being processed, - a contrast roller having an axis of rotation coplanar to the axis of rotation of the main roller and adapted to stay in contact with an inner perimeter surface of the ring being processed, - a pair of guide rollers having axes of rotation parallel to the axis of rotation of the main roller and adapted to stay in contact with the outer perimeter surface of the ring being processed, and - a pair of tapered rollers (130, 135) having coplanar axes of rotation on said plane of symmetry, which are respectively adapted to stay in contact with the opposite axial ends (215, 220) of the ring being processed, wherein the control method provides for adjusting the rotational speed of each tapered roller (130, 135) by means of the steps of: - establishing a reference value (v) of the rotational speed of the tapered roller (130, 135), - applying a correction (d1, d2) to said reference value (v) to obtain a corrected value (v*, v**) of the rotational speed of the tapered roller (130, 135), - actuating the tapered roller (130, 135) at a rotational speed having the corrected value (v*, v**), and - establishing a reference value (v) of the rotational speed of the tapered roller (130, 135), - applying a correction (d1, d2) to said reference value (v) to obtain a corrected value (v*, v**) of the rotational speed of the tapered roller (130, 135), - actuating the tapered roller (130, 135) at a rotational speed having the corrected value (v*, v**), and wherein the correction (d1, d2) comprises at least one feedback contribution (r1, r2) provided by a controller (S120, S150) of the proportional-integrative or proportional-integrative-derivative type,