A system for generating cold plasma, the system comprising: a control unit and an elongated member, wherein the control unit is connectable to a first proximal end of the elongated member; wherein said elongated member comprises: a plasma generating unit at a second distal end thereof, a gas transmission channel and an electricity transmission channel, each extending from said first proximal end towards said plasma generating unit; wherein the control unit comprises: a gas supply unit configured to provide a selected gas composition through said gas transmission channel, and a power supply unit configured to generate a selected sequence of high-frequency electrical pulses directed through said electricity transmission channel, thereby providing power and gas of said selected composition to the plasma generating unit for generating cold plasma, said power supply unit comprises a resonance circuit configured for generating the high-frequency electrical pulses, said electricity transmission channel is a coaxial cable having a predetermined impedance, characterised in that the predetermined impedance of the coaxial cable is configured to be part of an impedance of the resonance circuit and capable to tune the resonance circuit to generate a carrier frequency of the high-frequency electrical pulses. a control unit and an elongated member, wherein the control unit is connectable to a first proximal end of the elongated member; wherein said elongated member comprises: a plasma generating unit at a second distal end thereof, a gas transmission channel and an electricity transmission channel, each extending from said first proximal end towards said plasma generating unit; wherein the control unit comprises: a gas supply unit configured to provide a selected gas composition through said gas transmission channel, and a power supply unit configured to generate a selected sequence of high-frequency electrical pulses directed through said electricity transmission channel, thereby providing power and gas of said selected composition to the plasma generating unit for generating cold plasma, said power supply unit comprises a resonance circuit configured for generating the high-frequency electrical pulses, said electricity transmission channel is a coaxial cable having a predetermined impedance, characterised in that the predetermined impedance of the coaxial cable is configured to be part of an impedance of the resonance circuit and capable to tune the resonance circuit to generate a carrier frequency of the high-frequency electrical pulses. a plasma generating unit at a second distal end thereof, a gas transmission channel and an electricity transmission channel, each extending from said first proximal end towards said plasma generating unit; wherein the control unit comprises: a gas supply unit configured to provide a selected gas composition through said gas transmission channel, and a power supply unit configured to generate a selected sequence of high-frequency electrical pulses directed through said electricity transmission channel, thereby providing power and gas of said selected composition to the plasma generating unit for generating cold plasma, a gas supply unit configured to provide a selected gas composition through said gas transmission channel, and a power supply unit configured to generate a selected sequence of high-frequency electrical pulses directed through said electricity transmission channel, thereby providing power and gas of said selected composition to the plasma generating unit for generating cold plasma, said power supply unit comprises a resonance circuit configured for generating the high-frequency electrical pulses, said electricity transmission channel is a coaxial cable having a predetermined impedance, characterised in that the predetermined impedance of the coaxial cable is configured to be part of an impedance of the resonance circuit and capable to tune the resonance circuit to generate a carrier frequency of the high-frequency electrical pulses.