A method for forming current patterns, said method comprising: a. selectively inkjetting a 100wt% solids hot melt resist composition comprising one or more waxes, one or more acrylate functional monomers free of acid groups and one or more radical photoinitiators adjacent a first surface of an actinic radiation transparent flexible film to form a continuous pattern on the first surface of the actinic radiation transparent flexible film; b. applying the actinic radiation transparent flexible film with the 100wt% solids hot melt resist composition having the continuous pattern to a surface having irregularities of a three dimensional substrate, the first surface of the actinic radiation transmittable flexible film with the 100wt% solids hot melt resist composition having the continuous pattern is adjacent the surface having irregularities of the three dimensional substrate and the actinic radiation transparent flexible film follows contours of the surface having irregularities of the three dimensional substrate; c. applying actinic radiation to a second surface of the actinic radiation transparent flexible film opposite the first surface with the 100wt% solids hot melt resist composition having the continuous pattern to cure the 100wt% solids hot melt resist composition; d. separating the actinic radiation transparent flexible film from the cured 100wt% solids hot melt resist composition having the continuous pattern with the cured 100wt% solids hot melt resist composition having the continuous pattern adhering to the surface having irregularities of the three dimensional substrate; e. etching sections of the three dimensional substrate not covered with the cured 100wt% solids hot melt resist composition having the continuous pattern; and f. plating metal on etched sections of the three dimensional substrate not covered with the cured 100wt% solids hot melt resist composition. a. selectively inkjetting a 100wt% solids hot melt resist composition comprising one or more waxes, one or more acrylate functional monomers free of acid groups and one or more radical photoinitiators adjacent a first surface of an actinic radiation transparent flexible film to form a continuous pattern on the first surface of the actinic radiation transparent flexible film; b. applying the actinic radiation transparent flexible film with the 100wt% solids hot melt resist composition having the continuous pattern to a surface having irregularities of a three dimensional substrate, the first surface of the actinic radiation transmittable flexible film with the 100wt% solids hot melt resist composition having the continuous pattern is adjacent the surface having irregularities of the three dimensional substrate and the actinic radiation transparent flexible film follows contours of the surface having irregularities of the three dimensional substrate; c. applying actinic radiation to a second surface of the actinic radiation transparent flexible film opposite the first surface with the 100wt% solids hot melt resist composition having the continuous pattern to cure the 100wt% solids hot melt resist composition; d. separating the actinic radiation transparent flexible film from the cured 100wt% solids hot melt resist composition having the continuous pattern with the cured 100wt% solids hot melt resist composition having the continuous pattern adhering to the surface having irregularities of the three dimensional substrate; e. etching sections of the three dimensional substrate not covered with the cured 100wt% solids hot melt resist composition having the continuous pattern; and f. plating metal on etched sections of the three dimensional substrate not covered with the cured 100wt% solids hot melt resist composition.