mhurhangee/ep-ind-claims huggingface dataset:
A semiconductor structure (10A-E), comprising: a semiconductor substrate; a floating N-type well region over the semiconductor substrate; an undoped layer (125a, 125b) over the semiconductor substrate and in contact with the N-type well region wherein the undoped layer (125a, 125b) is not doped with impurities or is a light doping P-well region; a fully depleted silicon-on-insulator, FDSOI, transistor formed over the N-type well region, comprising: a buried oxide layer over the N-type well region; a source region over the buried oxide layer; a drain region over the buried oxide layer; a silicon-on-insulator, SOI, layer over the buried oxide layer and between the source and drain regions; and a metal gate over the SOI layer; a first shallow trench isolation, STI, region over the undoped layer (125a, 125b); a first P-type doped region over the undoped layer (125a, 125b), wherein the first P-type doped region is separated from the drain region of the FDSOI transistor by the first STI region; and a first interconnection element over the first P-type doped region and configured to connect the first P-type doped region and the undoped layer to a ground. a semiconductor substrate; a floating N-type well region over the semiconductor substrate; an undoped layer (125a, 125b) over the semiconductor substrate and in contact with the N-type well region wherein the undoped layer (125a, 125b) is not doped with impurities or is a light doping P-well region; a fully depleted silicon-on-insulator, FDSOI, transistor formed over the N-type well region, comprising: a buried oxide layer over the N-type well region; a source region over the buried oxide layer; a drain region over the buried oxide layer; a silicon-on-insulator, SOI, layer over the buried oxide layer and between the source and drain regions; and a metal gate over the SOI layer; a buried oxide layer over the N-type well region; a source region over the buried oxide layer; a drain region over the buried oxide layer; a silicon-on-insulator, SOI, layer over the buried oxide layer and between the source and drain regions; and a metal gate over the SOI layer; a first shallow trench isolation, STI, region over the undoped layer (125a, 125b); a first P-type doped region over the undoped layer (125a, 125b), wherein the first P-type doped region is separated from the drain region of the FDSOI transistor by the first STI region; and a first interconnection element over the first P-type doped region and configured to connect the first P-type doped region and the undoped layer to a ground.
A display device comprising: a first display; a second display comprising a back surface facing a back surface of the first display; a housing in which the first display and the second display are mounted; an inlet hole provided in the housing and configured to form a flow of external air drawn into the housing; a first outlet hole formed in a first area where the first display is provided; a second outlet hole formed in a second area where the second display is provided; a first temperature measuring part configured to measure the temperature in the first area; a second temperature measuring part configured to measure the temperature in the second area; a first outlet fan configured to discharge the air in the first area through the first outlet hole; a second outlet fan configured to discharge the air in the second area through the second outlet hole; a first backflow preventing part provided in the first outlet hole and configured to prevent air from flowing back into the housing from the outside through the first outlet hole; a second backflow preventing part provided in the second outlet hole and configured to prevent air from flowing back into the housing from the outside through the second outlet hole; and a flow rate controller configured to drive the first outlet fan and the second outlet fan based on the temperature measured in the first area and the temperature measured in the second area. a first display; a second display comprising a back surface facing a back surface of the first display; a housing in which the first display and the second display are mounted; an inlet hole provided in the housing and configured to form a flow of external air drawn into the housing; a first outlet hole formed in a first area where the first display is provided; a second outlet hole formed in a second area where the second display is provided; a first temperature measuring part configured to measure the temperature in the first area; a second temperature measuring part configured to measure the temperature in the second area; a first outlet fan configured to discharge the air in the first area through the first outlet hole; a second outlet fan configured to discharge the air in the second area through the second outlet hole; a first backflow preventing part provided in the first outlet hole and configured to prevent air from flowing back into the housing from the outside through the first outlet hole; a second backflow preventing part provided in the second outlet hole and configured to prevent air from flowing back into the housing from the outside through the second outlet hole; and a flow rate controller configured to drive the first outlet fan and the second outlet fan based on the temperature measured in the first area and the temperature measured in the second area.
A leveling device comprising - a targeting device, which defines an alignment axis and which can be aligned with a measuring rod for the purpose of determining height, - an imaging system, which is spatially separated from the targeting device and comprises - an imaging objective, to which an objective principal plane is assigned, and - a detector, comprising a recording surface lying in an image plane, wherein a field of view of the imaging system is defined by the imaging objective and the detector as that maximum angle range within which points can be detected by the imaging objective by means of the recording surface of the detector, and - an evaluation device, which is connected to the detector, wherein height information of the measuring rod at the height of the alignment axis can be provided as a measurement height by the evaluation device using the detector information, characterized in that the imaging objective and the detector are embodied and arranged relative to one another and to an object plane containing the alignment axis in such a way that all points of the object plane which lie within the field of view are simultaneously imaged sharply on the recording surface of the detector, wherein - the objective principal plane, - the image plane and - the object plane, are aligned relative to one another in a manner meeting the Scheimpflug condition. - a targeting device, which defines an alignment axis and which can be aligned with a measuring rod for the purpose of determining height, - an imaging system, which is spatially separated from the targeting device and comprises - an imaging objective, to which an objective principal plane is assigned, and - a detector, comprising a recording surface lying in an image plane, wherein a field of view of the imaging system is defined by the imaging objective and the detector as that maximum angle range within which points can be detected by the imaging objective by means of the recording surface of the detector, and - an imaging objective, to which an objective principal plane is assigned, and - a detector, comprising a recording surface lying in an image plane, - an evaluation device, which is connected to the detector, - the objective principal plane, - the image plane and - the object plane,
Off-axis digital holographic microscope comprising: - a spatially and temporally partially coherent light source arranged to produce a first partially coherent light beam; - a recording plane; - a microscope objective; - an object cell (Sa) arranged to hold a specimen to be studied located in a front focal plane of said microscope objective and said object cell (Sa) being optically conjugated with said recording plane; - a grating located in a plane optically conjugated with said recording plane, said grating defining a first and a second optical path, and said grating being arranged to split the first light beam into a non-zero order diffracted light beam along the first optical path as a reference light beam and a second light beam with a different diffraction order along the second optical path; - a first lens downstream the microscope objective, said grating being located in the back focal plane of said first lens; - a second lens, the grating being located in the front focal plane of said second lens and a third lens optically coupled to said second lens, said recording plane being located in the back focal plane of said third lens and said third lens being arranged to recombine the reference light beam and the second light beam into a recombined beam to be incident on the recording plane where they interfere with each other, wherein the optical path of the reference light beam and the optical path of the second light beam do not differ by more than the coherence length of the light source. - a spatially and temporally partially coherent light source arranged to produce a first partially coherent light beam; - a recording plane; - a microscope objective; - an object cell (Sa) arranged to hold a specimen to be studied located in a front focal plane of said microscope objective and said object cell (Sa) being optically conjugated with said recording plane; - a grating located in a plane optically conjugated with said recording plane, said grating defining a first and a second optical path, and said grating being arranged to split the first light beam into a non-zero order diffracted light beam along the first optical path as a reference light beam and a second light beam with a different diffraction order along the second optical path; - a first lens downstream the microscope objective, said grating being located in the back focal plane of said first lens; - a second lens, the grating being located in the front focal plane of said second lens and a third lens optically coupled to said second lens, said recording plane being located in the back focal plane of said third lens and said third lens being arranged to recombine the reference light beam and the second light beam into a recombined beam to be incident on the recording plane where they interfere with each other, wherein the optical path of the reference light beam and the optical path of the second light beam do not differ by more than the coherence length of the light source.
A motion simulator ride assembly comprising: a motion base; and a rider support assembly positioned beneath and coupled to the motion base, wherein the rider support assembly comprises a plurality of rider support units, each rider support unit of the plurality of rider support units comprising: an inversion table having a surface configured to support a frontal side of a rider, wherein the inversion table is configured to rotate about an axis to transition between a loading configuration and a ride configuration, wherein the ride configuration positions the rider in a substantially facedown and prone position, and a restraint system configured to secure the rider onto the inversion table, wherein the restraint system comprises a first moveable restraint and a second moveable restraint that are each coupled to the inversion table, and wherein the first and second moveable restraints are configured to move relative to the surface to move the first and second movable restraints from an unrestrained configuration to a restrained configuration; and a display screen configured to project a simulated environment, wherein the display screen is positioned below the motion base. motion base; and a rider support assembly positioned beneath and coupled to the motion base, wherein the rider support assembly comprises a plurality of rider support units, each rider support unit of the plurality of rider support units comprising: an inversion table having a surface configured to support a frontal side of a rider, wherein the inversion table is configured to rotate about an axis to transition between a loading configuration and a ride configuration, wherein the ride configuration positions the rider in a substantially facedown and prone position, and a restraint system configured to secure the rider onto the inversion table, wherein the restraint system comprises a first moveable restraint and a second moveable restraint that are each coupled to the inversion table, and wherein the first and second moveable restraints are configured to move relative to the surface to move the first and second movable restraints from an unrestrained configuration to a restrained configuration; and an inversion table having a surface configured to support a frontal side of a rider, wherein the inversion table is configured to rotate about an axis to transition between a loading configuration and a ride configuration, wherein the ride configuration positions the rider in a substantially facedown and prone position, and a restraint system configured to secure the rider onto the inversion table, wherein the restraint system comprises a first moveable restraint and a second moveable restraint that are each coupled to the inversion table, and wherein the first and second moveable restraints are configured to move relative to the surface to move the first and second movable restraints from an unrestrained configuration to a restrained configuration; and a display screen configured to project a simulated environment, wherein the display screen is positioned below the motion base.
A switchable light modulator device (203-205, 207, 209, 210) comprising first (100, 102, 104, 106, 108) and second substrates (101, 105, 107, 109) with opposite spaced apart major surfaces, and a fluid layer (303-305, 307, 309, 310) disposed between opposite said spaced apart major surfaces of said first and second substrates, characterized in that each of said substrates has first and second interoperable microstructures formed on said opposite major surfaces and extending from said opposite surfaces of said substrates into said fluid layer, said respective microstructures fitting together with an engagement length along a length of interoperating first and second microstructures to join said first and second substrates and to define wall portions for a plurality of cavities, said cavities sealing said fluid in discrete volumes, the engagement length being orthogonal to the juxtaposed parallel spaced apart major surfaces of the substrates, wherein the engagement length is from one tenth to ten tenths of the cell gap of said fluid layer, the cell gap corresponding to the orthogonal distance between the respective interfaces of the fluid layer with the first and second substrates.
A method for treating solid waste or contaminated water or contaminated soil or sand with the aim of cleaning them and recover metals or metal compounds therefrom, characterized in that the method comprises the method steps of: - pretreating the incoming material by liberating the incoming material from coarse mechanical impurities, when contaminated water is treated, or by crushing and liberating the incoming material from coarse mechanical foreign bodies, when solid waste or contaminated soil or sand is treated; - mixing the incoming material with a separating liquid, and separating the developed mixture into an oil-containing phase, an aqueous phase and a solid phase, when solid waste or contaminated soil or sand is treated; - concentrating the aqueous phase of the pretreated incoming material; - mixing the aqueous phase of the pretreated incoming material with an ionic liquid; - dissolving the metals or metal compounds in the ionic liquid; - separating the ionic liquid from the aqueous mixture; - eliminating or removing the metals or metal compounds from the ionic liquid by means of an electrolysis cell; - purifying the ionic liquid from possible mechanical and chemical impurities; - returning the ionic liquid into the circuit. - pretreating the incoming material by liberating the incoming material from coarse mechanical impurities, when contaminated water is treated, or by crushing and liberating the incoming material from coarse mechanical foreign bodies, when solid waste or contaminated soil or sand is treated; - mixing the incoming material with a separating liquid, and separating the developed mixture into an oil-containing phase, an aqueous phase and a solid phase, when solid waste or contaminated soil or sand is treated; - concentrating the aqueous phase of the pretreated incoming material; - mixing the aqueous phase of the pretreated incoming material with an ionic liquid; - dissolving the metals or metal compounds in the ionic liquid; - separating the ionic liquid from the aqueous mixture; - eliminating or removing the metals or metal compounds from the ionic liquid by means of an electrolysis cell; - purifying the ionic liquid from possible mechanical and chemical impurities; - returning the ionic liquid into the circuit.
A fiber structure comprising: a polymeric substrate fiber layer having a total surface energy greater than 45 mJ/m 2; and an antimicrobial coating having a thickness of less than 1.0 microns applied to a surface of the fiber layer, the substrate fiber layer having been subjected to a scouring process before application of the antimicrobial layer that is sufficient to achieve an antimicrobial coating having fewer than 1 coating gap of greater than 1 μm 2 in extent per 7 μm 2 of coated surface. a polymeric substrate fiber layer having a total surface energy greater than 45 mJ/m 2; and an antimicrobial coating having a thickness of less than 1.0 microns applied to a surface of the fiber layer, the substrate fiber layer having been subjected to a scouring process before application of the antimicrobial layer that is sufficient to achieve an antimicrobial coating having fewer than 1 coating gap of greater than 1 μm 2 in extent per 7 μm 2 of coated surface.
A filtration unit, comprising: a central hub having a lower header, which has a drain port and a process fluid inlet port through which the lower header receives a process fluid; wherein the process fluid inlet port and the drain port each form parts of independent fluid flow circuits; an upper header having a process fluid outlet port through which the process fluid exits the upper header and a backwash fluid inlet port configured to be coupled to an external backwash fluid source; a plurality of filter housings each having a cylindrical shell and a filter element arranged therein; wherein the cylindrical shell has a lower port fluidly connecting the cylindrical shell with the lower header, and an upper port fluidly connecting the cylindrical shell with the upper header, and wherein the lower and upper ports (14, 19) are arranged to direct the process fluid through the filter housing in a first direction during a filtering cycle and to direct a backwash fluid through the filter housing in a second direction during a backwashing cycle; two diverters (40; 40a), wherein one diverter is located in the upper header and the other diverter is located in the lower header; and at least one servomechanism (42, 42a) operatively coupled to the diverters (40, 40a), and configured to rotate the diverters (40, 40a) to selectively couple at least one of the plurality of filter housings to the backwash fluid inlet port and the drain port for the backwashing cycle; wherein the plurality of filter housings are vertically oriented and arranged around the central hub at the lower header. a central hub having a lower header, which has a drain port and a process fluid inlet port through which the lower header receives a process fluid; wherein the process fluid inlet port and the drain port each form parts of independent fluid flow circuits; an upper header having a process fluid outlet port through which the process fluid exits the upper header and a backwash fluid inlet port configured to be coupled to an external backwash fluid source; a plurality of filter housings each having a cylindrical shell and a filter element arranged therein; wherein the cylindrical shell has a lower port fluidly connecting the cylindrical shell with the lower header, and an upper port fluidly connecting the cylindrical shell with the upper header, and wherein the lower and upper ports (14, 19) are arranged to direct the process fluid through the filter housing in a first direction during a filtering cycle and to direct a backwash fluid through the filter housing in a second direction during a backwashing cycle; two diverters (40; 40a), wherein one diverter is located in the upper header and the other diverter is located in the lower header; and at least one servomechanism (42, 42a) operatively coupled to the diverters (40, 40a), and configured to rotate the diverters (40, 40a) to selectively couple at least one of the plurality of filter housings to the backwash fluid inlet port and the drain port for the backwashing cycle; wherein the plurality of filter housings are vertically oriented and arranged around the central hub at the lower header.
A wrapper (80, 90) for use in a package comprising a film (81, 91) having first and second edges on opposite sides of the film, and third and fourth edges on opposite side of the film between the first and second edges, wherein a tear strip (82, 92) extends across the film between the first and second edges, and a tab portion (85, 95) is provided at an end of the tear strip (82, 92), wherein the tear strip (82, 92) is defined by two reinforcing tear tapes (83a, 83b, 93a, 93b) on either side of the tear strip, each tear tape having a respective first remote end (84a, 84b, 94a, 94b) at the tab portion (85, 95), and the two tear tapes extend from the tab portion and diverge away from each other such that the width of the tear strip (82, 92) enlarges along at least a part of its length, and wherein the tear tapes have respective second remote ends (86a, 86b 96a, 96b) which are spaced from each other and spaced from the tab portion (85, 95), and wherein the tab portion (85, 95) is provided at the first edge, and characterised in that the tear tapes (83a, 83b, 93a, 93b) extend entirely across the film from the first edge to the second edge such that the respective second remote ends are disposed at the second edge of the film.