An electrosurgical generator, comprising: a radio frequency output configured to output an electrosurgical waveform applied to tissue; a sensor module configured to continually sense tissue impedance resulting from the application of the electrosurgical waveform to tissue and generate at least one signal relating thereto; and a controller configured to: adjust power of the electrosurgical waveform generated by the radio frequency output, wherein the controller increases power of the electrosurgical waveform during a first sample window; receive the at least one signal from the sensor module to determine a direction of change in a first average impedance during the first sample window in response to the increase in power of the electrosurgical waveform made by the controller, wherein the controller performs a first adjustment of power of the electrosurgical waveform in response to the direction of change in the first average impedance during a subsequent sample window wherein the controller is further configured to increase the power of the electrosurgical waveform in response to a decrease in the first average impedance and decrease the power of the electrosurgical waveform in response to an increase in the first average impedance or the first average impedance being unchanged; determine a direction of change in a subsequent average impedance during the subsequent sample window in response to the first adjustment of power made by the controller; and perform a subsequent adjustment of power of the electrosurgical waveform in response to the direction of change in the subsequent average impedance, wherein the subsequent adjustment of power is reverse to that of the first adjustment of power when the direction of change in the first and subsequent average impedances is the same. a radio frequency output configured to output an electrosurgical waveform applied to tissue; a sensor module configured to continually sense tissue impedance resulting from the application of the electrosurgical waveform to tissue and generate at least one signal relating thereto; and a controller configured to: adjust power of the electrosurgical waveform generated by the radio frequency output, wherein the controller increases power of the electrosurgical waveform during a first sample window; receive the at least one signal from the sensor module to determine a direction of change in a first average impedance during the first sample window in response to the increase in power of the electrosurgical waveform made by the controller, wherein the controller performs a first adjustment of power of the electrosurgical waveform in response to the direction of change in the first average impedance during a subsequent sample window wherein the controller is further configured to increase the power of the electrosurgical waveform in response to a decrease in the first average impedance and decrease the power of the electrosurgical waveform in response to an increase in the first average impedance or the first average impedance being unchanged; determine a direction of change in a subsequent average impedance during the subsequent sample window in response to the first adjustment of power made by the controller; and perform a subsequent adjustment of power of the electrosurgical waveform in response to the direction of change in the subsequent average impedance, wherein the subsequent adjustment of power is reverse to that of the first adjustment of power when the direction of change in the first and subsequent average impedances is the same. adjust power of the electrosurgical waveform generated by the radio frequency output, wherein the controller increases power of the electrosurgical waveform during a first sample window; receive the at least one signal from the sensor module to determine a direction of change in a first average impedance during the first sample window in response to the increase in power of the electrosurgical waveform made by the controller, wherein the controller performs a first adjustment of power of the electrosurgical waveform in response to the direction of change in the first average impedance during a subsequent sample window wherein the controller is further configured to increase the power of the electrosurgical waveform in response to a decrease in the first average impedance and decrease the power of the electrosurgical waveform in response to an increase in the first average impedance or the first average impedance being unchanged; determine a direction of change in a subsequent average impedance during the subsequent sample window in response to the first adjustment of power made by the controller; and perform a subsequent adjustment of power of the electrosurgical waveform in response to the direction of change in the subsequent average impedance, wherein the subsequent adjustment of power is reverse to that of the first adjustment of power when the direction of change in the first and subsequent average impedances is the same.