A method for applying at least one coating on a substrate on at least a non-line of sight region of the substrate comprising: presenting said substrate to a chamber; said chamber having a down stream pressure, P c, with an operating range from about 10 -4 to about 10 3 Torr; presenting at least one evaporant source to said chamber; presenting supersonic carrier gas streams comprised of gas molecules to said chamber, said carrier gas streams being defined by a pressure ratio that gives the carrier gas molecules a predetermined flow velocity, v f; impinging said evaporant source with at least one energetic beam in said chamber to generate an evaporated vapor flux comprised of evaporant molecules, wherein said evaporated vapor flux is directed by said carrier gas streams toward said substrate; and deflecting at least a portion of said generated evaporated vapor flux by said carrier gas streams, wherein the evaporant molecules have said predetermined flow velocity, v f, and said evaporated vapor flux coats all surfaces of the substrate including an area facing opposite said evaporant source, wherein said predetermined flow velocity, v f, allows the scattering time interval, t, of said evaporant molecules and gas molecules to be less than the time the evaporant molecules are within the mean free path, λ, of the non-line of sight region of the substrate to be coated, said scattering time interval, t, being defined as the time between collisions of the evaporant molecules and the carrier gas molecules, and said mean free path, λ, being defined as the path segment between successive collisions between a carrier gas molecule and an evaporant molecule. presenting said substrate to a chamber; said chamber having a down stream pressure, P c, with an operating range from about 10 -4 to about 10 3 Torr; presenting at least one evaporant source to said chamber; presenting supersonic carrier gas streams comprised of gas molecules to said chamber, said carrier gas streams being defined by a pressure ratio that gives the carrier gas molecules a predetermined flow velocity, v f; impinging said evaporant source with at least one energetic beam in said chamber to generate an evaporated vapor flux comprised of evaporant molecules, wherein said evaporated vapor flux is directed by said carrier gas streams toward said substrate; and deflecting at least a portion of said generated evaporated vapor flux by said carrier gas streams, wherein the evaporant molecules have said predetermined flow velocity, v f, and said evaporated vapor flux coats all surfaces of the substrate including an area facing opposite said evaporant source, wherein said predetermined flow velocity, v f, allows the scattering time interval, t, of said evaporant molecules and gas molecules to be less than the time the evaporant molecules are within the mean free path, λ, of the non-line of sight region of the substrate to be coated, said scattering time interval, t, being defined as the time between collisions of the evaporant molecules and the carrier gas molecules, and said mean free path, λ, being defined as the path segment between successive collisions between a carrier gas molecule and an evaporant molecule.