A touch panel comprising: a first conductive substrate comprising a first transparent substrate and a first conductive pattern provided on the first transparent substrate, and a second conductive substrate comprising a second transparent substrate and a second conductive pattern provided on the second transparent substrate in a laminate form, characterized in that the first conductive pattern comprises regions A and B having different aperture ratios having a difference of 0.5% or more therebetween, the second conductive pattern comprises region C overlapping the region A and region D overlapping the region B, and a difference between a product of the aperture ratio of the region A and the aperture ratio of the region C and a product of the aperture ratio of the region B and the aperture ratio of the region D is 2% or less, and wherein the first conductive pattern and the second conductive pattern comprise a pattern formed of a conductive metal line, wherein the first conductive pattern further comprises region AB, and the region AB is provided between the region A and the region B, and has an aperture ratio between the aperture ratio of the region A and the aperture ratio of the region B, wherein the second conductive pattern further comprises region CD, and the region CD is provided between the region C and the region D, overlaps the region AB, and has an aperture ratio between the aperture ratio of the region C and the aperture ratio of the region D, wherein the difference between the product of the aperture ratio of the region AB and the aperture ratio of the region CD and the product of the aperture ratio of the region A and the aperture ratio of the region C is 1% or less, wherein the difference between the product of the aperture ratio of the region AB and the aperture ratio of the region CD and the product of the aperture ratio of the region B and the aperture ratio of the region D is 1% or less, wherein a surface resistance difference between the region A and the region B of the first conductive pattern is 20% or less, and wherein the surface resistance difference between the region C and the region D of the second conductive pattern is 20% or less. a first conductive substrate comprising a first transparent substrate and a first conductive pattern provided on the first transparent substrate, and a second conductive substrate comprising a second transparent substrate and a second conductive pattern provided on the second transparent substrate in a laminate form, characterized in that the first conductive pattern comprises regions A and B having different aperture ratios having a difference of 0.5% or more therebetween, the second conductive pattern comprises region C overlapping the region A and region D overlapping the region B, and a difference between a product of the aperture ratio of the region A and the aperture ratio of the region C and a product of the aperture ratio of the region B and the aperture ratio of the region D is 2% or less, and wherein the first conductive pattern and the second conductive pattern comprise a pattern formed of a conductive metal line, wherein the first conductive pattern further comprises region AB, and the region AB is provided between the region A and the region B, and has an aperture ratio between the aperture ratio of the region A and the aperture ratio of the region B, wherein the second conductive pattern further comprises region CD, and the region CD is provided between the region C and the region D, overlaps the region AB, and has an aperture ratio between the aperture ratio of the region C and the aperture ratio of the region D, wherein the difference between the product of the aperture ratio of the region AB and the aperture ratio of the region CD and the product of the aperture ratio of the region A and the aperture ratio of the region C is 1% or less, wherein the difference between the product of the aperture ratio of the region AB and the aperture ratio of the region CD and the product of the aperture ratio of the region B and the aperture ratio of the region D is 1% or less, wherein a surface resistance difference between the region A and the region B of the first conductive pattern is 20% or less, and wherein the surface resistance difference between the region C and the region D of the second conductive pattern is 20% or less.