A surface-coated cutting tool comprising a base material and a coating film formed on a surface of the base material, the coating film including a first alternating layer and a second alternating layer formed on the first alternating layer, the first alternating layer including first and second layers, the second alternating layer including third and fourth layers, one or a plurality of the first layers and one or a plurality of the second layers being layered alternately, one or a plurality of the third layers and one or a plurality of the fourth layers being layered alternately, each of the one or plurality of the first layers being composed of a nitride or carbonitride of Al a Cr b M1 1-a-b, respective atomic ratios of the metal atoms in the first layer satisfying 0.5≤a≤0.9, 0<b≤0.4, and 0≤1-a-b≤0.1, each of the one or plurality of the second layers being composed of a nitride or carbonitride of Al c Ti d M2 i-c-d, respective atomic ratios of the metal atoms in the second layer satisfying 0.35≤c≤0.7, 0.3≤d<0.7, and 0≤1-c-d≤0.1, each of the one or plurality of the third layers being composed of a nitride or carbonitride of Al e Ti f M3 i-e-f, respective atomic ratios of the metal atoms in the third layer satisfying 0.35≤e≤0.7, 0.3≤f≤0.7, and 0≤1-e-f≤0.1, each of the one or plurality of the fourth layers being composed of a nitride or carbonitride of Al g Ti h M4 i-g-h, respective atomic ratios of the metal atoms in the fourth layer satisfying 0.35≤g≤0.7, 0.3≤h≤0.7, and 0≤1-g-h≤0.1, the atomic ratio e of Al in the third layer and the atomic ratio g of Al in the fourth layer satisfying 0.05≤|g-e|≤0.2, the atomic ratio f of Ti in the third layer and the atomic ratio h of Ti in the fourth layer satisfying 0.05≤|h-f|≤0.2, each of the M1, the M2, the M3, and the M4 being one or more elements selected from a group consisting of Si, B, a group 4 element, a group 5 element, and a group 6 element except Cr and Ti in a periodic table, wherein each of a thickness λ1 of the first layer and a thickness λ2 of the second layer is not less than 0.005 μm and not more than 2 μm, λ1/λ2, which is a ratio of the thickness of the first layer and the thickness of the second layer, satisfies 1≤λ1/λ2≤5 each of a thickness λ3 of the third layer and a thickness λ4 of the fourth layer is not less than 0.005 μm and not more than 2 μm, λ3/λ4, which is a ratio of the thickness of the third layer and the thickness of the fourth layer, satisfies 1≤λ3/λ4≤5, and the coating film has an entire thickness of not less than 0.5 μm and not more than 15 μm. the coating film including a first alternating layer and a second alternating layer formed on the first alternating layer, the first alternating layer including first and second layers, the second alternating layer including third and fourth layers, one or a plurality of the first layers and one or a plurality of the second layers being layered alternately, one or a plurality of the third layers and one or a plurality of the fourth layers being layered alternately, each of the one or plurality of the first layers being composed of a nitride or carbonitride of Al a Cr b M1 1-a-b, respective atomic ratios of the metal atoms in the first layer satisfying 0.5≤a≤0.9, 0<b≤0.4, and 0≤1-a-b≤0.1, each of the one or plurality of the second layers being composed of a nitride or carbonitride of Al c Ti d M2 i-c-d, respective atomic ratios of the metal atoms in the second layer satisfying 0.35≤c≤0.7, 0.3≤d<0.7, and 0≤1-c-d≤0.1, each of the one or plurality of the third layers being composed of a nitride or carbonitride of Al e Ti f M3 i-e-f, respective atomic ratios of the metal atoms in the third layer satisfying 0.35≤e≤0.7, 0.3≤f≤0.7, and 0≤1-e-f≤0.1, each of the one or plurality of the fourth layers being composed of a nitride or carbonitride of Al g Ti h M4 i-g-h, respective atomic ratios of the metal atoms in the fourth layer satisfying 0.35≤g≤0.7, 0.3≤h≤0.7, and 0≤1-g-h≤0.1, the atomic ratio e of Al in the third layer and the atomic ratio g of Al in the fourth layer satisfying 0.05≤|g-e|≤0.2, the atomic ratio f of Ti in the third layer and the atomic ratio h of Ti in the fourth layer satisfying 0.05≤|h-f|≤0.2, each of the M1, the M2, the M3, and the M4 being one or more elements selected from a group consisting of Si, B, a group 4 element, a group 5 element, and a group 6 element except Cr and Ti in a periodic table, each of a thickness λ1 of the first layer and a thickness λ2 of the second layer is not less than 0.005 μm and not more than 2 μm, λ1/λ2, which is a ratio of the thickness of the first layer and the thickness of the second layer, satisfies 1≤λ1/λ2≤5 each of a thickness λ3 of the third layer and a thickness λ4 of the fourth layer is not less than 0.005 μm and not more than 2 μm, λ3/λ4, which is a ratio of the thickness of the third layer and the thickness of the fourth layer, satisfies 1≤λ3/λ4≤5, and the coating film has an entire thickness of not less than 0.5 μm and not more than 15 μm.