Detection component for detecting electromagnetic radiation (λ) in a wavelength range, comprising: - a support comprising a layer, called active layer, in which a plurality of structures (121a, 121b, 122, and 123) for detecting electromagnetic radiation (λ) in said wavelength range is arranged, with the support comprising a first surface from which the active layer extends, and a second surface opposite the first surface by which the support is intended to receive the electromagnetic radiation (λ), - at least one mask, called an opaque mask, arranged on a portion of the second surface of the support to block the electromagnetic radiation for at least one of the detection structures, called a masked structure, the detection component being characterized in that the opaque mask comprises at least a first, a second, and a third metal, and a material, called a transparent material, with a refractive index less than or equal to 2 in the wavelength range, the first metal having an extinction coefficient k m1 greater than or equal to 5n m1, or even 10n m1, and each of the second and third metals having an extinction coefficient k m2/3 strictly less than 5n m2/3, or even less than or equal to 2n m2/3, where n m1 and n m2/3 are the refractive indices of the first and each of the second and third metals in the wavelength range, the transparent material having an extinction coefficient k t less than or equal to 0.01, wherein the opaque mask comprises, starting from the second surface of the support, a successive stack of: - a first metal layer made of the first metal, - a second metal layer made of the second metal, - a third layer, called a transparent layer, made of the transparent material, and - an assembly of metal elements made of the third metal, said assembly being arranged on the transparent layer opposite the second metal layer, and wherein the second metal layer, the transparent layer, and the assembly of metal elements form MIM structures in the wavelength range. - a support comprising a layer, called active layer, in which a plurality of structures (121a, 121b, 122, and 123) for detecting electromagnetic radiation (λ) in said wavelength range is arranged, with the support comprising a first surface from which the active layer extends, and a second surface opposite the first surface by which the support is intended to receive the electromagnetic radiation (λ), - at least one mask, called an opaque mask, arranged on a portion of the second surface of the support to block the electromagnetic radiation for at least one of the detection structures, called a masked structure, the detection component being characterized in that the opaque mask comprises at least a first, a second, and a third metal, and a material, called a transparent material, with a refractive index less than or equal to 2 in the wavelength range, the first metal having an extinction coefficient k m1 greater than or equal to 5n m1, or even 10n m1, and each of the second and third metals having an extinction coefficient k m2/3 strictly less than 5n m2/3, or even less than or equal to 2n m2/3, where n m1 and n m2/3 are the refractive indices of the first and each of the second and third metals in the wavelength range, the transparent material having an extinction coefficient k t less than or equal to 0.01, wherein the opaque mask comprises, starting from the second surface of the support, a successive stack of: the detection component being characterized in that the opaque mask comprises at least a first, a second, and a third metal, and a material, called a transparent material, with a refractive index less than or equal to 2 in the wavelength range, the first metal having an extinction coefficient k m1 greater than or equal to 5n m1, or even 10n m1, and each of the second and third metals having an extinction coefficient k m2/3 strictly less than 5n m2/3, or even less than or equal to 2n m2/3, where n m1 and n m2/3 are the refractive indices of the first and each of the second and third metals in the wavelength range, the transparent material having an extinction coefficient k t less than or equal to 0.01, wherein the opaque mask comprises, starting from the second surface of the support, a successive stack of: - a first metal layer made of the first metal, - a second metal layer made of the second metal, - a third layer, called a transparent layer, made of the transparent material, and - an assembly of metal elements made of the third metal, said assembly being arranged on the transparent layer opposite the second metal layer, and wherein the second metal layer, the transparent layer, and the assembly of metal elements form MIM structures in the wavelength range.