A delivery device for thin-film material deposition onto a substrate comprising: (a) a plurality of inlet ports (14, 16,18) comprising at least a first inlet port, a second inlet port, and a third inlet port capable of receiving a common supply for a first gaseous material, a second gaseous material, and a third gaseous material, respectively; (b) at least one exhaust port capable of receiving exhaust gas from thin-film material deposition and at least two elongated exhaust channels, each of the elongated exhaust channels capable of gaseous fluid communication with the at least one exhaust port; (c) at least three groups of elongated emissive channels (i) a first group comprising one or more first elongated emissive channels, (ii) a second group comprising one or more second elongated emissive channels, and (iii) a third group comprising at least two third elongated emissive channels, each of the first, second, and third elongated emissive channels capable of gaseous fluid communication, respectively, with one of the corresponding first inlet port, second inlet port, and third inlet port; wherein each of the first, second, and third elongated emissive channels and each of the elongated exhaust channels extend in a length direction substantially in parallel; wherein each first elongated emissive channel is separated on at least one elongated side thereof from a nearest second elongated emissive channel by a relatively nearer elongated exhaust channel and a relatively less near third elongated emissive channel; wherein each first elongated emissive channel and each second elongated emissive channel is situated between relatively nearer elongated exhaust channels and between relatively less nearer elongated emissive channels; (d) a gas diffuser associated with at least one group of the three groups of elongated emissive channels such that at least one of the first, second, and third gaseous material, respectively, is capable of passing through the gas diffuser prior to delivery from the delivery device to the substrate, during thin-film material deposition onto the substrate, and wherein the gas diffuser maintains flow isolation of the at least one of first, second, and third gaseous material downstream from each of the elongated emissive channels in the at least one group of elongated emissive channels; wherein the gas diffuser comprises a mechanically formed assembly comprising a series of at least two elements (142, 146, 148) each element compising a substantially parallel surface area facing each other; wherein at least one element comprises a plurality of perforations (143, 147, 149) extending in an elongated direction, wherein each plurality of perforations is associated with the flow from one of the each elongated emissive channels in the at least one group of elongated emissive channels; and wherein the gas diffuser deflects gaseous material passing from each of the plurality of perforations into a thin space between the parallel surface areas in the two elements. (a) a plurality of inlet ports (14, 16,18) comprising at least a first inlet port, a second inlet port, and a third inlet port capable of receiving a common supply for a first gaseous material, a second gaseous material, and a third gaseous material, respectively; (b) at least one exhaust port capable of receiving exhaust gas from thin-film material deposition and at least two elongated exhaust channels, each of the elongated exhaust channels capable of gaseous fluid communication with the at least one exhaust port; (c) at least three groups of elongated emissive channels (i) a first group comprising one or more first elongated emissive channels, (ii) a second group comprising one or more second elongated emissive channels, and (iii) a third group comprising at least two third elongated emissive channels, each of the first, second, and third elongated emissive channels capable of gaseous fluid communication, respectively, with one of the corresponding first inlet port, second inlet port, and third inlet port; wherein each of the first, second, and third elongated emissive channels and each of the elongated exhaust channels extend in a length direction substantially in parallel; wherein each first elongated emissive channel is separated on at least one elongated side thereof from a nearest second elongated emissive channel by a relatively nearer elongated exhaust channel and a relatively less near third elongated emissive channel; wherein each first elongated emissive channel and each second elongated emissive channel is situated between relatively nearer elongated exhaust channels and between relatively less nearer elongated emissive channels; (d) a gas diffuser associated with at least one group of the three groups of elongated emissive channels such that at least one of the first, second, and third gaseous material, respectively, is capable of passing through the gas diffuser prior to delivery from the delivery device to the substrate, during thin-film material deposition onto the substrate, and wherein the gas diffuser maintains flow isolation of the at least one of first, second, and third gaseous material downstream from each of the elongated emissive channels in the at least one group of elongated emissive channels;