A method for transferring a fractured pattern (210, 310), decomposed into elementary shapes, onto a substrate by direct writing by means of a particle or photon beam, including an exposure step, comprising exposing the substrate to a plurality of shots of a shaped particle or photon beam, each shot corresponding to an elementary shape, to obtain a transferred pattern on the surface of said substrate; the method comprising, before said exposure step: - a step of identifying at least one elementary shape (2000, 3000) of the fractured pattern, called removable elementary shape, whose removal induces modifications of the transferred pattern within a preset tolerance, said step being carried out by applying a set of rules to a list of elementary shapes of the fractured pattern; and - a step of removing said removable shape or shapes from the fractured pattern, to obtain a modified fractured pattern; wherein, during said exposure step, each shot corresponds to an elementary shape of said modified fractured pattern; characterized in that at least some of said rules define criteria which have to be met for an elementary shape to be identified as being removable, including at least one of the following: - maximal height of the elementary shape lower or lower or equal than a preset value; - maximal jog length lower, or lower or equal, than a preset value; - distance of the elementary shape from the pattern edge higher, or higher or equal, than a preset value; - fraction of the perimeter of the elementary shape belonging to the edge of the pattern lower, or lower or equal, than a preset value; - distance of a peripheral elementary shape from the nearest neighboring pattern higher, or higher or equal, than a preset value; - minimal width (d) of the region of the pattern where the elementary shape is situated larger, or larger or equal, than a preset value; - surface of the elementary shape lower,or lower or equal, than a preset value; - maximal length of the translation of an edge of the adjacent elementary shape necessary to compensate for the removal, lower or lower or equal, than a preset value; - distance of the closed elementary shape already recognized as removable smaller, or smaller or equal, than a preset value; - elementary shape not belonging to a critical region of the pattern. - a step of identifying at least one elementary shape (2000, 3000) of the fractured pattern, called removable elementary shape, whose removal induces modifications of the transferred pattern within a preset tolerance, said step being carried out by applying a set of rules to a list of elementary shapes of the fractured pattern; and - a step of removing said removable shape or shapes from the fractured pattern, to obtain a modified fractured pattern; - maximal height of the elementary shape lower or lower or equal than a preset value; - maximal jog length lower, or lower or equal, than a preset value; - distance of the elementary shape from the pattern edge higher, or higher or equal, than a preset value; - fraction of the perimeter of the elementary shape belonging to the edge of the pattern lower, or lower or equal, than a preset value; - distance of a peripheral elementary shape from the nearest neighboring pattern higher, or higher or equal, than a preset value; - minimal width (d) of the region of the pattern where the elementary shape is situated larger, or larger or equal, than a preset value; - surface of the elementary shape lower,or lower or equal, than a preset value; - maximal length of the translation of an edge of the adjacent elementary shape necessary to compensate for the removal, lower or lower or equal, than a preset value; - distance of the closed elementary shape already recognized as removable smaller, or smaller or equal, than a preset value; - elementary shape not belonging to a critical region of the pattern.