Installation for processing coated substrates, with the following features: - at least one evacuable process box for accommodating at least one substrate, with a gas-tightly sealable housing, which forms a hollow space, wherein the housing has at least one first housing section (7, 9; 28) coupable to a cooling device for its cooling, wherein the housing comprises at least one second housing section (5, 6), which is implemented such that the substrate is thermally treatable by incident electromagnetic thermal radiation, wherein the at least one second housing section (5, 6) is different from the at least one first housing section (7, 9; 28), wherein the hollow space is divided by at least one separating wall into a process space for accommodating the substrate and an intermediate space, wherein the separating wall has one or a plurality of openings (23, 24, 37), wherein the separating wall is implemented such that during the thermal processing a loss in mass of a gaseous substance generated by the thermal processing of the coated substrate out of the process space is less than 50%, preferably less than 20%, more preferably less than 10%, of the mass of the gaseous substance generated during the thermal process, wherein an area ratio, formed from an opening area of the one or a plurality of openings divided by an inner surface of the process space, is in the range from 5 x 10 -5 to 5 x 10 -4, wherein the separating wall is arranged between the substrate and the housing section (7, 9; 28) coupleable to the cooling device, and wherein the housing is provided with at least one sealable gas passage opening into the hollow space, for evacuating and introducing gas into the hollow space; - a cooling device for cooling a housing section (7, 9; 28) of the process box; - at least one loading/unloading unit for loading and/or unloading the process box, - at least one heating unit for heating the substrate in the process box; - at least one cooling unit for cooling the substrate in the process box; - at least one pumping-out device for draining the hollow space of the process box; - at least one gas supply device for supplying the hollow space of the process box with at least one gas; - at least one transport mechanism, which is implemented for the purpose of executing a relative movement between, on the one hand, the process box and, on the other, the heating unit, cooling unit, and loading/unloading unit. - at least one evacuable process box for accommodating at least one substrate, with a gas-tightly sealable housing, which forms a hollow space, wherein the housing has at least one first housing section (7, 9; 28) coupable to a cooling device for its cooling, wherein the housing comprises at least one second housing section (5, 6), which is implemented such that the substrate is thermally treatable by incident electromagnetic thermal radiation, wherein the at least one second housing section (5, 6) is different from the at least one first housing section (7, 9; 28), wherein the hollow space is divided by at least one separating wall into a process space for accommodating the substrate and an intermediate space, wherein the separating wall has one or a plurality of openings (23, 24, 37), wherein the separating wall is implemented such that during the thermal processing a loss in mass of a gaseous substance generated by the thermal processing of the coated substrate out of the process space is less than 50%, preferably less than 20%, more preferably less than 10%, of the mass of the gaseous substance generated during the thermal process, wherein an area ratio, formed from an opening area of the one or a plurality of openings divided by an inner surface of the process space, is in the range from 5 x 10 -5 to 5 x 10 -4, wherein the separating wall is arranged between the substrate and the housing section (7, 9; 28) coupleable to the cooling device, and wherein the housing is provided with at least one sealable gas passage opening into the hollow space, for evacuating and introducing gas into the hollow space; - a cooling device for cooling a housing section (7, 9; 28) of the process box; - at least one loading/unloading unit for loading and/or unloading the process box, - at least one heating unit for heating the substrate in the process box; - at least one cooling unit for cooling the substrate in the process box; - at least one pumping-out device for draining the hollow space of the process box; - at least one gas supply device for supplying the hollow space of the process box with at least one gas; - at least one transport mechanism, which is implemented for the purpose of executing a relative movement between, on the one hand, the process box and, on the other, the heating unit, cooling unit, and loading/unloading unit.