A system for implanting a spinal implant into a disc space between adjacent vertebral bodies, the system comprising: a spinal implant including proximal and distal adjustment assemblies (150, 170) that are independently operable to change a height of the proximal or distal region (100a, 100b), respectively, of the spinal implant; and a driving instrument for adjusting the spinal implant, the driving instrument comprising: an outer shaft including a distal end; and an inner shaft disposed within the outer shaft, the inner shaft including a distal end, the distal ends of the outer and inner shafts configured to actuate the respective proximal and distal adjustment assemblies (150, 170) of the spinal implant and a proximal end extending proximally from the outer shaft and configured to be rotated such that rotation of the inner shaft results in simultaneous rotation of the inner and outer shafts, wherein rotation of the outer shaft ceases at a first value of resistance associated with the proximal adjustment assembly and rotation of the inner shaft ceases at a second value of resistance associated with the distal adjustment assembly, such that cessation of rotation of the inner shaft is independent from cessation of rotation of the outer shaft. a spinal implant including proximal and distal adjustment assemblies (150, 170) that are independently operable to change a height of the proximal or distal region (100a, 100b), respectively, of the spinal implant; and a driving instrument for adjusting the spinal implant, the driving instrument comprising: an outer shaft including a distal end; and an inner shaft disposed within the outer shaft, the inner shaft including a distal end, the distal ends of the outer and inner shafts configured to actuate the respective proximal and distal adjustment assemblies (150, 170) of the spinal implant and a proximal end extending proximally from the outer shaft and configured to be rotated such that rotation of the inner shaft results in simultaneous rotation of the inner and outer shafts, wherein rotation of the outer shaft ceases at a first value of resistance associated with the proximal adjustment assembly and rotation of the inner shaft ceases at a second value of resistance associated with the distal adjustment assembly, such that cessation of rotation of the inner shaft is independent from cessation of rotation of the outer shaft. an outer shaft including a distal end; and an inner shaft disposed within the outer shaft, the inner shaft including a distal end, the distal ends of the outer and inner shafts configured to actuate the respective proximal and distal adjustment assemblies (150, 170) of the spinal implant and a proximal end extending proximally from the outer shaft and configured to be rotated such that rotation of the inner shaft results in simultaneous rotation of the inner and outer shafts, wherein rotation of the outer shaft ceases at a first value of resistance associated with the proximal adjustment assembly and rotation of the inner shaft ceases at a second value of resistance associated with the distal adjustment assembly, such that cessation of rotation of the inner shaft is independent from cessation of rotation of the outer shaft.