Electrode unit (10, 101...109), suitable for plasma treatment of a plurality of substrates in a treatment chamber of a plasma treatment system, comprising - a plurality of plasma electrode pairs along a first direction, wherein each plasma electrode pair consists of a first plasma electrode and a second plasma electrode arranged parallel to each other and opposite each other and electrically insulated from each other, and is capable, in the presence of a defined voltage, of igniting a plasma in a plasma space between the first and the second plasma electrode (12, 13) of the plasma electrode pair, - at least one internal electrical supply network (17, 18, 20), which is suitable, within the treatment chamber, for supplying a first voltage to each first plasma electrode of the electrode unit (10, 101...109) and a second voltage to each second plasma electrode of the electrode unit (10, 101...109), wherein at least one of the voltages is a voltage having a frequency in the range of 1 MHz to 100 MHz, - a first connection terminal and a second connection terminal, which are suitable for feeding the first voltage through the first connection terminal and the second voltage through the second connection terminal into the at least one internal electrical supply network (17, 18, 20), characterised in that the at least one internal electrical supply network (17, 18, 20) is designed according to the arrangement of the plasma electrodes (12, 13) within the electrode unit (10, 101... 109) and the frequency of the first voltage and/or the second voltage, wherein the at least one internal electrical supply network (17, 18, 20) has supply lines (174a-g, 184a-g) between the first and the second connection terminal (A, B) and at least two first and at least two second plasma electrodes (12, 13), respectively, and/or intermediate lines (172a-i, 182a-i, 212a-212i, 222a-222i) between two adjacent first or second plasma electrodes (2, 3) and one feed point (173, 182, 213, 222) into each of a first or second system (170, 180, 210, 220) of interconnected intermediate lines (172a-172i, 182a-182i, 212a-i, 222a-i), and one connecting line (171, 181, 211, 221) between each of the first and the second connection terminal (A, B) and the associated feed point (173, 183, 213, 223), and the design of the network consists of a suitable arrangement of the supply lines (174a-g, 184a-g) and/or suitable geometric dimensions of the suppy lines (174a-g, 184a-g) and/or of the intermediate lines (172a-i, 182a-i, 212a-212i, 222a-222i) and/or of the connecting lines (171, 181, 211, 221) and/or a suitable material of the supply lines (174a-g, 184a-g) and/or of the intermediate lines (172a-l, 182a-l, 212a-212i, 222a-222i) and/or of the connecting lines (171, 181, 211, 221) and/or a suitable arrangement of the feed point (173, 183, 213, 223) with respect to the electrode unit (10, 101...109) along the first direction. - a plurality of plasma electrode pairs along a first direction, wherein each plasma electrode pair consists of a first plasma electrode and a second plasma electrode arranged parallel to each other and opposite each other and electrically insulated from each other, and is capable, in the presence of a defined voltage, of igniting a plasma in a plasma space between the first and the second plasma electrode (12, 13) of the plasma electrode pair, - at least one internal electrical supply network (17, 18, 20), which is suitable, within the treatment chamber, for supplying a first voltage to each first plasma electrode of the electrode unit (10, 101...109) and a second voltage to each second plasma electrode of the electrode unit (10, 101...109), wherein at least one of the voltages is a voltage having a frequency in the range of 1 MHz to 100 MHz, - a first connection terminal and a second connection terminal, which are suitable for feeding the first voltage through the first connection terminal and the second voltage through the second connection terminal into the at least one internal electrical supply network (17, 18, 20),