An exposure apparatus for forming a pattern on a substrate by using exposure light, comprising: a liquid supply mechanism arranged to supply a liquid onto the substrate to form a local liquid immersion area on a part of the substrate; a liquid recovery mechanism arranged to collect the liquid supplied to the substrate by the liquid immersion mechanism; a projection optical system having an optical element provided at an end of the projection optical system and being configured to project an image of the pattern onto the substrate through the liquid filling a gap between the optical element and the substrate; a stage apparatus which is movable with respect to the optical axis of the projection optical system, the stage apparatus being configured to hold the substrate and having an upper surface; and a control apparatus (CONT), wherein the exposure apparatus comprises a light-transmissive member provided at the stage apparatus, the light transmissive member having an upper surface and being arranged such that said upper surface is substantially coplanar with the upper surface of the substrate when held by the stage apparatus and with the upper surface of the stage apparatus; and a measurement apparatus comprising a light-receiving part which is arranged at the stage apparatus and below the light-transmissive member to receive light from the projection optical system to measure the wavefront aberration of the projection optical system, through the liquid of a liquid immersion area formed by the liquid supply mechanism on the light-transmissive member and through the light-transmissive member, and wherein the control apparatus is configured to cause the exposure apparatus to perform the wavefront aberration-measuring operation in which a gap between the light-transmissive member and the optical element is filled with the liquid. a liquid supply mechanism arranged to supply a liquid onto the substrate to form a local liquid immersion area on a part of the substrate; a liquid recovery mechanism arranged to collect the liquid supplied to the substrate by the liquid immersion mechanism; a projection optical system having an optical element provided at an end of the projection optical system and being configured to project an image of the pattern onto the substrate through the liquid filling a gap between the optical element and the substrate; a stage apparatus which is movable with respect to the optical axis of the projection optical system, the stage apparatus being configured to hold the substrate and having an upper surface; and a control apparatus (CONT), wherein the exposure apparatus comprises a light-transmissive member provided at the stage apparatus, the light transmissive member having an upper surface and being arranged such that said upper surface is substantially coplanar with the upper surface of the substrate when held by the stage apparatus and with the upper surface of the stage apparatus; and a measurement apparatus comprising a light-receiving part which is arranged at the stage apparatus and below the light-transmissive member to receive light from the projection optical system to measure the wavefront aberration of the projection optical system, through the liquid of a liquid immersion area formed by the liquid supply mechanism on the light-transmissive member and through the light-transmissive member, and wherein the control apparatus is configured to cause the exposure apparatus to perform the wavefront aberration-measuring operation in which a gap between the light-transmissive member and the optical element is filled with the liquid.