An interferometric electron microscope causing electron waves to interfere with each other, comprising: an electron source; an irradiating lens system (3, 4) irradiating a specimen with an electron beam emitted from the electron source; a focusing lens system (5, 9) focusing an image of the specimen; an observational plane used for observing the image of the specimen focused by the focusing lens system (5, 9); an artificial grating disposed between the electron source and the irradiating lens system (3, 4) and diffracting the electron beam emitted from the electron source to produce a first electron wave and a second electron wave; a voltage-applied mask disposed in the irradiating lens system (3, 4), the voltage applied mask comprising two holes (20, 21) for passing, respectively, the first and second electron waves, a first electrode arranged at a center of the voltage-applied mask and between the two holes (20, 21), and two second electrodes (23a, 23b) arranged, respectively, on outer sides of the two holes (19, 20), wherein the voltage-applied mask is configured to interrupt electron waves other than diffracted waves used as the first electron wave and the second electron wave, of electron waves diffracted by the artificial grating, and is operable to deflect the electron waves to control positions and angles at which the first electron wave and the second electron wave irradiate a specimen plane; and an electron beam biprism disposed in the focusing lens system (5, 9) and operable to deflect the objective wave and the reference wave to superimpose the objective wave and the reference wave on the observational plane so as to produce an image. an electron source; an irradiating lens system (3, 4) irradiating a specimen with an electron beam emitted from the electron source; a focusing lens system (5, 9) focusing an image of the specimen; an observational plane used for observing the image of the specimen focused by the focusing lens system (5, 9); an artificial grating disposed between the electron source and the irradiating lens system (3, 4) and diffracting the electron beam emitted from the electron source to produce a first electron wave and a second electron wave; a voltage-applied mask disposed in the irradiating lens system (3, 4), the voltage applied mask comprising two holes (20, 21) for passing, respectively, the first and second electron waves, a first electrode arranged at a center of the voltage-applied mask and between the two holes (20, 21), and two second electrodes (23a, 23b) arranged, respectively, on outer sides of the two holes (19, 20), wherein the voltage-applied mask is configured to interrupt electron waves other than diffracted waves used as the first electron wave and the second electron wave, of electron waves diffracted by the artificial grating, and is operable to deflect the electron waves to control positions and angles at which the first electron wave and the second electron wave irradiate a specimen plane; and an electron beam biprism disposed in the focusing lens system (5, 9) and operable to deflect the objective wave and the reference wave to superimpose the objective wave and the reference wave on the observational plane so as to produce an image.