A sterilization and deodorization apparatus, comprising: a frame that defines an outer appearance of the sterilization and deodorization apparatus; a plasma unit disposed at a first side of the frame, that forms a plasma region to generate a plurality of ions; and a filter disposed at a second side of the frame and spaced apart from the plasma unit, wherein the filter includes: a filter frame having a plurality of through-holes that passes air therethrough; and a photocatalyst applied to the filter to perform a photocatalytic reaction, characterized in that the plasma unit comprises first and second substrates (200, 300), which are disposed opposite to each other, and wherein a predetermined space is provided between the first and second substrates (200, 300), wherein the first substrate comprises: a first substrate body having a plate shape; at least one first flow hole that passes through the first substrate body to guide a flow of air; and at least one pattern frame disposed to surround at least a portion of the first flow hole, and wherein the second substrate comprises: a second substrate body having a plate shape; and at least one second flow hole that passes through the second substrate body to guide a flow of the air, wherein the at least one pattern frame comprises: a closed pattern that surrounds the at least one first flow hole; and at least one discharge tip that protrudes from an outer circumferential surface of the closed pattern. a frame that defines an outer appearance of the sterilization and deodorization apparatus; a plasma unit disposed at a first side of the frame, that forms a plasma region to generate a plurality of ions; and a filter disposed at a second side of the frame and spaced apart from the plasma unit, wherein the filter includes: a filter frame having a plurality of through-holes that passes air therethrough; and a photocatalyst applied to the filter to perform a photocatalytic reaction, characterized in that the plasma unit comprises first and second substrates (200, 300), which are disposed opposite to each other, and wherein a predetermined space is provided between the first and second substrates (200, 300), wherein the first substrate comprises: a first substrate body having a plate shape; at least one first flow hole that passes through the first substrate body to guide a flow of air; and at least one pattern frame disposed to surround at least a portion of the first flow hole, and wherein the second substrate comprises: a second substrate body having a plate shape; and at least one second flow hole that passes through the second substrate body to guide a flow of the air, wherein the at least one pattern frame comprises: a closed pattern that surrounds the at least one first flow hole; and at least one discharge tip that protrudes from an outer circumferential surface of the closed pattern. a filter frame having a plurality of through-holes that passes air therethrough; and a photocatalyst applied to the filter to perform a photocatalytic reaction, characterized in that the plasma unit comprises first and second substrates (200, 300), which are disposed opposite to each other, and wherein a predetermined space is provided between the first and second substrates (200, 300), wherein the first substrate comprises: a first substrate body having a plate shape; at least one first flow hole that passes through the first substrate body to guide a flow of air; and at least one pattern frame disposed to surround at least a portion of the first flow hole, and wherein the second substrate comprises: a second substrate body having a plate shape; and at least one second flow hole that passes through the second substrate body to guide a flow of the air, wherein the at least one pattern frame comprises: a closed pattern that surrounds the at least one first flow hole; and at least one discharge tip that protrudes from an outer circumferential surface of the closed pattern. a first substrate body having a plate shape; at least one first flow hole that passes through the first substrate body to guide a flow of air; and at least one pattern frame disposed to surround at least a portion of the first flow hole, and wherein the second substrate comprises: a second substrate body having a plate shape; and at least one second flow hole that passes through the second substrate body to guide a flow of the air, wherein the at least one pattern frame comprises: a closed pattern that surrounds the at least one first flow hole; and at least one discharge tip that protrudes from an outer circumferential surface of the closed pattern. a second substrate body having a plate shape; and at least one second flow hole that passes through the second substrate body to guide a flow of the air, wherein the at least one pattern frame comprises: a closed pattern that surrounds the at least one first flow hole; and at least one discharge tip that protrudes from an outer circumferential surface of the closed pattern. a closed pattern that surrounds the at least one first flow hole; and at least one discharge tip that protrudes from an outer circumferential surface of the closed pattern.