A method of imaging a sample in a charged particle apparatus, the charged particle apparatus equipped with • an evacuable sample chamber, • an electron beam column for producing a finely focused beam of electrons along an electron beam axis, said electron beam column equipped with an objective lens comprising an electrostatic immersion lens, • a focused ion beam column for producing a finely focused beam of ions along an ion beam axis, • the focused ion beam column and the electron beam column mounted on the sample chamber such that the electron beam axis and the ion beam axis intersect at an intersect position, • a sample manipulator showing a conductive plane equipped with means for holding the sample, the sample manipulator capable to tilt said plane between a first tilt angle in which the plane is perpendicular to the electron beam axis and a second tilt angle in which the plane is perpendicular to the ion beam axis, the electron beam column having an electrode closest to the intersect position and the focused ion beam column having an electrode closest to the intersect position, said electrodes (204, 212) connected to a common potential, and the plane to which the sample is mounted is electrically biased with respect to the electrodes (104, 212), the method comprising • mounting the sample on the plane of the sample manipulator, • directing a beam of finely focused electrons to the sample with the electron beam column, • directing a beam of ions to the sample with the focused ion beam column, characterized in that the electrode of the electron beam column closest to the intersect position and the electrode of the ion beam column closest to the intersect position are electrically biased to such an extent that, depending on the tilt angle, the ion beam and the electron beam intersect at the intersect section without showing transverse chromatic aberration, and the intersect of the beams is at the same position for both tilt angles. • an evacuable sample chamber, • an electron beam column for producing a finely focused beam of electrons along an electron beam axis, said electron beam column equipped with an objective lens comprising an electrostatic immersion lens, • a focused ion beam column for producing a finely focused beam of ions along an ion beam axis, • the focused ion beam column and the electron beam column mounted on the sample chamber such that the electron beam axis and the ion beam axis intersect at an intersect position, • a sample manipulator showing a conductive plane equipped with means for holding the sample, the sample manipulator capable to tilt said plane between a first tilt angle in which the plane is perpendicular to the electron beam axis and a second tilt angle in which the plane is perpendicular to the ion beam axis, the electron beam column having an electrode closest to the intersect position and the focused ion beam column having an electrode closest to the intersect position, said electrodes (204, 212) connected to a common potential, and the plane to which the sample is mounted is electrically biased with respect to the electrodes (104, 212), the method comprising • mounting the sample on the plane of the sample manipulator, • directing a beam of finely focused electrons to the sample with the electron beam column, • directing a beam of ions to the sample with the focused ion beam column,