A method for manufacturing a polyamide-imide containing a repeating structure of the following Chemical Formula 1a and a repeating structure of the following Chemical Formula 1b together: wherein, X 1 is a tetravalent organic group of the following Chemical Formula 2 derived from tetracarboxylic dianhydride, X 2 is a divalent organic group derived from the compound of the following Chemical Formula 3, wherein, Y 1 and Y 2 are, each independently, a divalent organic group derived from diisocyanate, and any one of Y 1 and Y 2 contains a divalent organic group derived from the compound of the following Chemical Formula 4: wherein, R 1 and R 2 are each independently a substituent selected from a halogen atom comprising -F, -CI, -Br and -I, a hydroxyl group (-OH), a thiol group (-SH), a nitro group (-NO 2), a cyano group, a C 1-10 alkyl group, a C 1-4 halogenoalkoxyl group, a C 1-10 halogenoalkyl group, and a C 6-20 aryl group, Q is selected from the group consisting of a single bond, -O-, -CR 18 R 19 -, -C(=O)-, - C(=O)O-, -C(=O)NH-, -S-, -SO 2 -, a phenylene group and a combination thereof, wherein R 18 and R 19 are each independently selected from the group consisting of a hydrogen atom, a C 1-10 alkyl group and a C 1-10 fluoroalkyl group; the method comprising the following steps of: a) stirring a solution of diisocyanate containing the compound of the following Chemical Formula 4; b) adding tetracarboxylic dianhydride containing the structure of the following Chemical Formula 2 and the compound of the following Chemical Formula 3 to the solution prepared in the step a) followed by reacting thereof to prepare a polyamide-imide precursor; and c) imidizing the polyamide-imide precursor: wherein, R 1 and R 2 are each independently a substituent selected from a halogen atom comprising -F, -CI, -Br and -I, a hydroxyl group (-OH), a thiol group (-SH), a nitro group (-NO 2), a cyano group, a C 1-10 alkyl group, a C 1-4 halogenoalkoxyl group, a C 1-10 halogenoalkyl group, and a C 6-20 aryl group. R 1 and R 2 are each independently a substituent selected from a halogen atom comprising -F, -CI, -Br and -I, a hydroxyl group (-OH), a thiol group (-SH), a nitro group (-NO 2), a cyano group, a C 1-10 alkyl group, a C 1-4 halogenoalkoxyl group, a C 1-10 halogenoalkyl group, and a C 6-20 aryl group, Q is selected from the group consisting of a single bond, -O-, -CR 18 R 19 -, -C(=O)-, - C(=O)O-, -C(=O)NH-, -S-, -SO 2 -, a phenylene group and a combination thereof, wherein R 18 and R 19 are each independently selected from the group consisting of a hydrogen atom, a C 1-10 alkyl group and a C 1-10 fluoroalkyl group; the method comprising the following steps of: a) stirring a solution of diisocyanate containing the compound of the following Chemical Formula 4; b) adding tetracarboxylic dianhydride containing the structure of the following Chemical Formula 2 and the compound of the following Chemical Formula 3 to the solution prepared in the step a) followed by reacting thereof to prepare a polyamide-imide precursor; and c) imidizing the polyamide-imide precursor: wherein, R 1 and R 2 are each independently a substituent selected from a halogen atom comprising -F, -CI, -Br and -I, a hydroxyl group (-OH), a thiol group (-SH), a nitro group (-NO 2), a cyano group, a C 1-10 alkyl group, a C 1-4 halogenoalkoxyl group, a C 1-10 halogenoalkyl group, and a C 6-20 aryl group. a) stirring a solution of diisocyanate containing the compound of the following Chemical Formula 4; b) adding tetracarboxylic dianhydride containing the structure of the following Chemical Formula 2 and the compound of the following Chemical Formula 3 to the solution prepared in the step a) followed by reacting thereof to prepare a polyamide-imide precursor; and c) imidizing the polyamide-imide precursor: wherein, R 1 and R 2 are each independently a substituent selected from a halogen atom comprising -F, -CI, -Br and -I, a hydroxyl group (-OH), a thiol group (-SH), a nitro group (-NO 2), a cyano group, a C 1-10 alkyl group, a C 1-4 halogenoalkoxyl group, a C 1-10 halogenoalkyl group, and a C 6-20 aryl group.