A system for depositing a first material on a plurality of deposition sites in a deposition region of a substrate, the plurality of deposition sites being arranged in a first arrangement, wherein the substrate includes a first major surface and a second major surface that comprises the deposition region, the system comprising: a source for providing a first plurality of vaporized atoms of the first material, each vaporized atom of the first plurality thereof propagating along a propagation direction that is characterized by a propagation angle (θ p) relative to a first direction that is normal to a first plane defined by the substrate, wherein the range of propagation angles of the first plurality of vaporized atoms spans a first angular range (-θ m to +θ m); a shadow mask comprising (i) a handle substrate having a first thickness, a central opening, and a third major surface and (ii) a membrane that is suspended over the central opening, the membrane including a plurality of through-holes arranged in the first arrangement and a fourth major surface; a first chuck for holding the substrate, the first chuck being dimensioned and arranged to selectively impart a first attractive force on the first major surface; a second chuck for holding the shadow mask, the second chuck comprising a frame that surrounds a first opening that enables the material to pass through the second chuck to the through-holes, the frame including a mounting surface that surrounds the first opening and that lies in a second plane, wherein the mounting surface is in contact with the third major surface when the shadow mask is held in the second chuck; a collimator comprising a plurality of channels, the collimator being between the source and the shadow mask, wherein each channel of the plurality thereof is dimensioned and arranged to pass only vaporized atoms having a propagation angle within a second angular range (-θ c to +θ c) that is smaller than the first angular range; and a positioning system for controlling the relative position of the first chuck and the second chuck to align the shadow mask and the substrate; CHARACTERIZED IN THAT: the second chuck further includes a support grid located in the first opening, wherein the support grid is attached to the frame via a plate and includes a plurality of support ribs, each support rib having a top surface that is in a third plane that is separated from the second plane by a distance equal to the first thickness, and wherein the support ribs extend through the central opening and mechanically support the membrane when the shadow mask is mounted in the second chuck. a source for providing a first plurality of vaporized atoms of the first material, each vaporized atom of the first plurality thereof propagating along a propagation direction that is characterized by a propagation angle (θ p) relative to a first direction that is normal to a first plane defined by the substrate, wherein the range of propagation angles of the first plurality of vaporized atoms spans a first angular range (-θ m to +θ m); a shadow mask comprising (i) a handle substrate having a first thickness, a central opening, and a third major surface and (ii) a membrane that is suspended over the central opening, the membrane including a plurality of through-holes arranged in the first arrangement and a fourth major surface; a first chuck for holding the substrate, the first chuck being dimensioned and arranged to selectively impart a first attractive force on the first major surface; a second chuck for holding the shadow mask, the second chuck comprising a frame that surrounds a first opening that enables the material to pass through the second chuck to the through-holes, the frame including a mounting surface that surrounds the first opening and that lies in a second plane, wherein the mounting surface is in contact with the third major surface when the shadow mask is held in the second chuck; a collimator comprising a plurality of channels, the collimator being between the source and the shadow mask, wherein each channel of the plurality thereof is dimensioned and arranged to pass only vaporized atoms having a propagation angle within a second angular range (-θ c to +θ c) that is smaller than the first angular range; and a positioning system for controlling the relative position of the first chuck and the second chuck to align the shadow mask and the substrate; CHARACTERIZED IN THAT: the second chuck further includes a support grid located in the first opening, wherein the support grid is attached to the frame via a plate and includes a plurality of support ribs, each support rib having a top surface that is in a third plane that is separated from the second plane by a distance equal to the first thickness, and wherein the support ribs extend through the central opening and mechanically support the membrane when the shadow mask is mounted in the second chuck.