Method of analyzing an object using a charged particle beam device, - the charged particle beam device comprising a charged particle source for generating a charged particle beam, an objective lens for focusing the charged particle beam onto the object, a first detector for detecting interaction radiation and a second detector for detecting interaction particles, wherein the method comprises the following steps: - providing the object comprising a sample (15A, 15A', 15A", 15A'") and a resin by arranging the sample (15A, 15A', 15A", 15A'") in the resin; - generating the charged particle beam using the charged particle source; - guiding the charged particle beam onto the sample (15A, 15A', 15A", 15A"') and the resin using the objective lens; - guiding the charged particle beam over the sample (15A, 15A', 15A", 15A"') and the resin; - generating interaction radiation emitted from the sample (15A, 15A', 15A", 15A"') and the resin due to interaction of the charged particle beam with the sample (15A, 15A', 15A", 15A"') as well as interaction of the charged particle beam with the resin; - identifying a first area in which the resin is arranged and identifying a second area in which the sample (15A, 15A', 15A", 15A"') is arranged by detecting the interaction radiation using the first detector; - identifying a position of at least one particle of the resin in the first area or at least one particle of the sample (15A, 15A', 15A", 15A"') in the second area by detecting interaction particles using the second detector wherein the interaction particles are generated by the interaction of the charged particle beam with the at least one particle of the resin or of the sample (15A, 15A', 15A", 15A"'); and - analyzing the at least one particle of the resin or of the sample (15A, 15A', 15A", 15A"') using the charged particle beam. - the charged particle beam device comprising a charged particle source for generating a charged particle beam, an objective lens for focusing the charged particle beam onto the object, a first detector for detecting interaction radiation and a second detector for detecting interaction particles, - providing the object comprising a sample (15A, 15A', 15A", 15A'") and a resin by arranging the sample (15A, 15A', 15A", 15A'") in the resin; - generating the charged particle beam using the charged particle source; - guiding the charged particle beam onto the sample (15A, 15A', 15A", 15A"') and the resin using the objective lens; - guiding the charged particle beam over the sample (15A, 15A', 15A", 15A"') and the resin; - generating interaction radiation emitted from the sample (15A, 15A', 15A", 15A"') and the resin due to interaction of the charged particle beam with the sample (15A, 15A', 15A", 15A"') as well as interaction of the charged particle beam with the resin; - identifying a first area in which the resin is arranged and identifying a second area in which the sample (15A, 15A', 15A", 15A"') is arranged by detecting the interaction radiation using the first detector; - identifying a position of at least one particle of the resin in the first area or at least one particle of the sample (15A, 15A', 15A", 15A"') in the second area by detecting interaction particles using the second detector wherein the interaction particles are generated by the interaction of the charged particle beam with the at least one particle of the resin or of the sample (15A, 15A', 15A", 15A"'); and - analyzing the at least one particle of the resin or of the sample (15A, 15A', 15A", 15A"') using the charged particle beam.