A patterning process comprising the steps of: forming an antistatic film on a chemically amplified resist film of a substrate having the chemically amplified resist film by using a conductive polymer composition; irradiating in a pattern with electron beam; peeling the antistatic film with H z O; and developing with an alkaline developer to obtain a resist pattern; wherein the conductive polymer composition comprises: a n-conjugated conductive polymer having at least one repeating unit shown by the following general formulae,, and; and a dopant polymer which contains a repeating unit "a" shown by the following general formula and has a weight-average molecular weight in a range of 1,000 to 500,000, the weight-average molecular weight being measured by a gel permeation chromatography by using water, dimethyl formamide, or tetrahydrofuran as a solvent, in terms of polyethylene oxide, polyethylene glycol, or polystyrene; wherein "X" represents S, O, Se, Te, or NR 5; R 1 and R 2 each independently represent any of a hydrogen atom, a hydroxy group, a halogen atom, and a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally containing a heteroatom; R 1 and R 2 may be bonded to each other at any positions to form a ring; R 5 represents a hydrogen atom, a linear or branched saturated or unsaturated alkyl group having 1 to 10 carbon atoms, or a substituted or unsubstituted aryl group having 6 to 10 carbon atoms; with the proviso that in the general formula, when "X" represents S, Se, or Te, or "X" represents NR 5 and R 5 represents a hydrogen atom, R 1 and R 2 do not both represent hydrogen atoms; wherein R 3 represents a hydrogen atom or a methyl group; R 4 represents any of a single bond, an ester group, or a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms and optionally containing either or both of an ether group and an ester group; "Z" represents any of a phenylene group, a naphtylene group, and an ester group; and "a" is 0.2≤a≤1.0; wherein a total content of the component and the component in the conductive polymer composition is in the range of 0.05 to 5.0% by mass, and the component is in an amount that the sulfo group in the component is in the range of 0.1 to 10 mole per 1 mole of the component. a n-conjugated conductive polymer having at least one repeating unit shown by the following general formulae,, and; and a dopant polymer which contains a repeating unit "a" shown by the following general formula and has a weight-average molecular weight in a range of 1,000 to 500,000, the weight-average molecular weight being measured by a gel permeation chromatography by using water, dimethyl formamide, or tetrahydrofuran as a solvent, in terms of polyethylene oxide, polyethylene glycol, or polystyrene; wherein "X" represents S, O, Se, Te, or NR 5; R 1 and R 2 each independently represent any of a hydrogen atom, a hydroxy group, a halogen atom, and a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally containing a heteroatom; R 1 and R 2 may be bonded to each other at any positions to form a ring; R 5 represents a hydrogen atom, a linear or branched saturated or unsaturated alkyl group having 1 to 10 carbon atoms, or a substituted or unsubstituted aryl group having 6 to 10 carbon atoms; with the proviso that in the general formula, when "X" represents S, Se, or Te, or "X" represents NR 5 and R 5 represents a hydrogen atom, R 1 and R 2 do not both represent hydrogen atoms; wherein R 3 represents a hydrogen atom or a methyl group; R 4 represents any of a single bond, an ester group, or a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms and optionally containing either or both of an ether group and an ester group; "Z" represents any of a phenylene group, a naphtylene group, and an ester group; and "a" is 0.2≤a≤1.0; wherein a total content of the component and the component in the conductive polymer composition is in the range of 0.05 to 5.0% by mass, and the component is in an amount that the sulfo group in the component is in the range of 0.1 to 10 mole per 1 mole of the component.