A beam control system (200, 300,400) comprising: a conformal window; an illuminator (258; 358) configured to provide a first beam of electromagnetic energy at a first wavelength; an optical system configured to transmit the first beam through the conformal window toward a target and to receive a return beam of the first wavelength reflected from the target and back through the conformal window; a target wavefront sensor (270; 370) configured to determine a wavefront distortion error of the return beam along a path to the target, wherein said path includes at least one first wavefront control element (250; 350; 352) on which said return beam is reflected; a laser (284; 384) configured to provide a second beam of electromagnetic energy at a second wavelength, wherein said laser (284, 384) is a high energy laser comprising: a master oscillator (284, 384) configured to emit a master oscillator beam at the second wavelength and a power amplifier beamline (288, 388) configured to increase a power of the master oscillator beam to produce the second beam; a phase conjugate mirror (292, 392) configured to reverse a direction of a wavefront of the second beam emitted from the power amplifier beamline (288, 388); at least one second wavefront control element (282; 382; 386) positioned between the master oscillator (284, 384) and the power amplifier beamline (288, 388); an adaptive optics processor (280, 380) configured to: - cause the at least one first wavefront control element (250; 350; 352) to null the wavefront distortion error of the return beam along said path to the target; - cause the at least one second wavefront control element (282; 382; 386) to pre-distort the second beam with the conjugate of the at least one first wavefront control element (250; 350; 352); wherein said beam control system is configured to apply a bias to the target wavefront sensor (270, 370) to compensate for a chromatic aberration between the return beam and the second beam associated with an index dispersion of the conformal window. a conformal window; an illuminator (258; 358) configured to provide a first beam of electromagnetic energy at a first wavelength; an optical system configured to transmit the first beam through the conformal window toward a target and to receive a return beam of the first wavelength reflected from the target and back through the conformal window; a target wavefront sensor (270; 370) configured to determine a wavefront distortion error of the return beam along a path to the target, wherein said path includes at least one first wavefront control element (250; 350; 352) on which said return beam is reflected; a laser (284; 384) configured to provide a second beam of electromagnetic energy at a second wavelength, wherein said laser (284, 384) is a high energy laser comprising: a master oscillator (284, 384) configured to emit a master oscillator beam at the second wavelength and a power amplifier beamline (288, 388) configured to increase a power of the master oscillator beam to produce the second beam; a phase conjugate mirror (292, 392) configured to reverse a direction of a wavefront of the second beam emitted from the power amplifier beamline (288, 388); at least one second wavefront control element (282; 382; 386) positioned between the master oscillator (284, 384) and the power amplifier beamline (288, 388); an adaptive optics processor (280, 380) configured to: - cause the at least one first wavefront control element (250; 350; 352) to null the wavefront distortion error of the return beam along said path to the target; - cause the at least one second wavefront control element (282; 382; 386) to pre-distort the second beam with the conjugate of the at least one first wavefront control element (250; 350; 352); - cause the at least one first wavefront control element (250; 350; 352) to null the wavefront distortion error of the return beam along said path to the target; - cause the at least one second wavefront control element (282; 382; 386) to pre-distort the second beam with the conjugate of the at least one first wavefront control element (250; 350; 352); wherein said beam control system is configured to apply a bias to the target wavefront sensor (270, 370) to compensate for a chromatic aberration between the return beam and the second beam associated with an index dispersion of the conformal window.