A liquid immersion exposure apparatus that has an illumination optical system for illuminating a mask with illumination light and a projection optical system for projecting a pattern image of the illuminated mask on a substrate, and that exposes the substrate with the illumination light via the projection optical system and a liquid, the apparatus comprising: a nozzle member provided surrounding the projection optical system and configured to supply the liquid; a first stage system placed above the projection optical system, and having a first movable body for holding the mask and a first electromagnetic motor for driving the first movable body; a first detection system (13A, 13B) configured to detect a mark of the mask or a mark of the first movable body; a first encoder system having a plurality of first heads (26A 1-3, 26B 1-3, 26C 1-3) arranged to each irradiate a first measurement beam to a first grating section (24A, 24B, 28) placed substantially parallel to a predetermined plane orthogonal to an optical axis of the projection optical system and having a reflective grating, the first encoder system being configured to measure positional information of the first movable body that is moved by the first electromagnetic motor; a second stage system placed below the projection optical system, and having a second movable body for holding the substrate and a second electromagnetic motor for driving the second movable body; a second detection system configured to detect a mark of the substrate or a mark of the second movable body; a second encoder system having a plurality of second heads (46A-D) arranged to each irradiate a second measurement beam to a second grating section (52A-D) placed substantially parallel to the predetermined plane and having a reflective grating, the second encoder system being configured to measure positional information of the second movable body that is moved by the second electromagnetic motor; and a control system configured to control a drive of the first movable body by the first electromagnetic motor based on measurement information of the first encoder system and to control a drive of the second movable body by the second electromagnetic motor based on measurement information of the second encoder system, in order to move each of the mask and the substrate relative to the illumination light, in an exposure operation of the substrate, wherein in each of the exposure operation and a detection operation of the mark by the first detection system, the positional information of the first movable body is measured by the first encoder system, and in each of the exposure operation and a detection operation of the mark by the second detection system, the positional information of the second movable body is measured by the second encoder system. a nozzle member provided surrounding the projection optical system and configured to supply the liquid; a first stage system placed above the projection optical system, and having a first movable body for holding the mask and a first electromagnetic motor for driving the first movable body; a first detection system (13A, 13B) configured to detect a mark of the mask or a mark of the first movable body; a first encoder system having a plurality of first heads (26A 1-3, 26B 1-3, 26C 1-3) arranged to each irradiate a first measurement beam to a first grating section (24A, 24B, 28) placed substantially parallel to a predetermined plane orthogonal to an optical axis of the projection optical system and having a reflective grating, the first encoder system being configured to measure positional information of the first movable body that is moved by the first electromagnetic motor; a second stage system placed below the projection optical system, and having a second movable body for holding the substrate and a second electromagnetic motor for driving the second movable body; a second detection system configured to detect a mark of the substrate or a mark of the second movable body; a second encoder system having a plurality of second heads (46A-D) arranged to each irradiate a second measurement beam to a second grating section (52A-D) placed substantially parallel to the predetermined plane and having a reflective grating, the second encoder system being configured to measure positional information of the second movable body that is moved by the second electromagnetic motor; and a control system configured to control a drive of the first movable body by the first electromagnetic motor based on measurement information of the first encoder system and to control a drive of the second movable body by the second electromagnetic motor based on measurement information of the second encoder system, in order to move each of the mask and the substrate relative to the illumination light, in an exposure operation of the substrate, wherein in each of the exposure operation and a detection operation of the mark by the first detection system, the positional information of the first movable body is measured by the first encoder system, and in each of the exposure operation and a detection operation of the mark by the second detection system, the positional information of the second movable body is measured by the second encoder system.