An exposure apparatus comprising: a stage on which a substrate is placed; a plurality of light irradiation units arrayed in a right and left direction and configured to emit light independently of each other to different positions in the right and left direction on a surface of the substrate, such that the irradiation units being capable of forming a strip-like irradiation area having a length not shorter than the diameter of the substrate and extending continuously from one end to the other end, in the right and left direction, of the surface of the substrate placed on the stage; a rotation mechanism configured to rotate the substrate placed on the stage relative to the irradiation area; a stage moving mechanism configured to move the stage relative to the irradiation area in a back and forth direction; and a control unit configured to output control signals that make said exposure apparatus perform a first step that rotates the substrate relative to the irradiation area having a first illuminance distribution formed by the plurality of light irradiation units such that the whole surface of the substrate is exposed, and a second step that moves the substrate in the back and forth direction relative to the irradiation area having a second illuminance distribution, which is different from the first illuminance distribution, formed by the plurality of light irradiation units while rotation of the substrate is being stopped, such that the whole surface of the substrate is exposed, characterized in that the first illuminance distribution causes uneven exposure amount distribution over the surface of the substrate, and the second illuminance distribution causes uneven exposure amount distribution over the surface of the substrate, which is different from the uneven exposure amount distribution over the surface of the substrate caused by the first illuminance distribution. a stage on which a substrate is placed; a plurality of light irradiation units arrayed in a right and left direction and configured to emit light independently of each other to different positions in the right and left direction on a surface of the substrate, such that the irradiation units being capable of forming a strip-like irradiation area having a length not shorter than the diameter of the substrate and extending continuously from one end to the other end, in the right and left direction, of the surface of the substrate placed on the stage; a rotation mechanism configured to rotate the substrate placed on the stage relative to the irradiation area; a stage moving mechanism configured to move the stage relative to the irradiation area in a back and forth direction; and a control unit configured to output control signals that make said exposure apparatus perform a first step that rotates the substrate relative to the irradiation area having a first illuminance distribution formed by the plurality of light irradiation units such that the whole surface of the substrate is exposed, and a second step that moves the substrate in the back and forth direction relative to the irradiation area having a second illuminance distribution, which is different from the first illuminance distribution, formed by the plurality of light irradiation units while rotation of the substrate is being stopped, such that the whole surface of the substrate is exposed, characterized in that the first illuminance distribution causes uneven exposure amount distribution over the surface of the substrate, and the second illuminance distribution causes uneven exposure amount distribution over the surface of the substrate, which is different from the uneven exposure amount distribution over the surface of the substrate caused by the first illuminance distribution.