A method of fabricating an electrochromic device on an architectural glass substrate, the method comprising: (a) depositing a tungsten oxide electrochromic layer; (b) depositing a solid inorganic lithium ion conducting layer; (c) depositing a nickel tungsten oxide counter electrode layer for reversibly exchanging lithium ions with the electrochromic layer during operation of the electrochromic device; and (d) lithiating the nickel tungsten oxide counter electrode layer with metallic lithium, wherein (a)-(d) produces a stack on the substrate in which the ion conducting layer separates the electrochromic layer and the counter electrode layer, wherein said method includes fabricating the electrochromic device in an integrated deposition system comprising multiple deposition stations, including a lithium deposition station having a metallic lithium containing target, each devoted to depositing a particular component, or portion of a component of said electrochromic device, wherein the multiple deposition stations are fully integrated such that said architectural glass substrate passes from one station to the next without being exposed to an external environment, and wherein the integrated deposition system includes a substrate holder and transport mechanism such that the architectural glass substrate is held in a vertical orientation while in the multiple deposition stations; and wherein the amount of metallic lithium deposited in the stack is an amount sufficient to compensate the blind charge in the electrochromic layer and an additional amount of 1.5 to 2.5 times, by mass, the amount used to compensate the blind charge in the electrochromic layer. (a) depositing a tungsten oxide electrochromic layer; (b) depositing a solid inorganic lithium ion conducting layer; (c) depositing a nickel tungsten oxide counter electrode layer for reversibly exchanging lithium ions with the electrochromic layer during operation of the electrochromic device; and (d) lithiating the nickel tungsten oxide counter electrode layer with metallic lithium, wherein (a)-(d) produces a stack on the substrate in which the ion conducting layer separates the electrochromic layer and the counter electrode layer, wherein said method includes fabricating the electrochromic device in an integrated deposition system comprising multiple deposition stations, including a lithium deposition station having a metallic lithium containing target, each devoted to depositing a particular component, or portion of a component of said electrochromic device, wherein the multiple deposition stations are fully integrated such that said architectural glass substrate passes from one station to the next without being exposed to an external environment, and wherein the integrated deposition system includes a substrate holder and transport mechanism such that the architectural glass substrate is held in a vertical orientation while in the multiple deposition stations; and wherein the amount of metallic lithium deposited in the stack is an amount sufficient to compensate the blind charge in the electrochromic layer and an additional amount of 1.5 to 2.5 times, by mass, the amount used to compensate the blind charge in the electrochromic layer.