A silicon carbide semiconductor device comprising: a silicon carbide substrate having a first main surface and a second main surface opposite to the first main surface, the silicon carbide substrate including a first impurity region, a second impurity region, and a third impurity region, the first impurity region having a first conductivity type, the second impurity region being in contact with the first impurity region and having a second conductivity type different from the first conductivity type, the third impurity region having the first conductivity type and being separated from the first impurity region by the second impurity region, the first impurity region including a first region, a second region, and a third region, the first region being in contact with the second impurity region, the second region being in contact with the first region, the second region being located opposite to the second impurity region when viewed from the first region, the second region having an impurity concentration higher than an impurity concentration of the first region, the third region being in contact with the second region, the third region being located opposite to the first region when viewed from the second region, the third region having an impurity concentration lower than the impurity concentration of the second region, a trench being formed in the first main surface of the silicon carbide substrate to have a side portion and a bottom portion, the side portion being continuous to the first main surface, the bottom portion being continuous to the side portion; a drain electrode being provided in contact with the second main surface of the silicon carbide substrate; a gate insulating film in contact with the first region, the second impurity region, and the third impurity region at the side portion of the trench, the gate insulating film being in contact with the first region at the bottom portion of the trench, the silicon carbide substrate further includes an embedded region that has the second conductivity type, that has an impurity concentration higher than the impurity concentration of the second impurity region, and that extends from a portion of an end portion of the second impurity region at the second main surface side toward the second main surface, and a thickness of the embedded region is larger than a thickness of the first region in a normal direction of the first main surface. a silicon carbide substrate having a first main surface and a second main surface opposite to the first main surface, the silicon carbide substrate including a first impurity region, a second impurity region, and a third impurity region, the first impurity region having a first conductivity type, the second impurity region being in contact with the first impurity region and having a second conductivity type different from the first conductivity type, the third impurity region having the first conductivity type and being separated from the first impurity region by the second impurity region, the first impurity region including a first region, a second region, and a third region, the first region being in contact with the second impurity region, the second region being in contact with the first region, the second region being located opposite to the second impurity region when viewed from the first region, the second region having an impurity concentration higher than an impurity concentration of the first region, the third region being in contact with the second region, the third region being located opposite to the first region when viewed from the second region, the third region having an impurity concentration lower than the impurity concentration of the second region, a trench being formed in the first main surface of the silicon carbide substrate to have a side portion and a bottom portion, the side portion being continuous to the first main surface, the bottom portion being continuous to the side portion; a drain electrode being provided in contact with the second main surface of the silicon carbide substrate; a gate insulating film in contact with the first region, the second impurity region, and the third impurity region at the side portion of the trench, the gate insulating film being in contact with the first region at the bottom portion of the trench, the silicon carbide substrate further includes an embedded region that has the second conductivity type, that has an impurity concentration higher than the impurity concentration of the second impurity region, and that extends from a portion of an end portion of the second impurity region at the second main surface side toward the second main surface, and a thickness of the embedded region is larger than a thickness of the first region in a normal direction of the first main surface.