A conductive film comprising a transparent substrate, a pattern constituted by a fine metal wire and disposed on one side or both sides of the transparent substrate, and an intermediate layer between the transparent substrate and the conductive part, wherein: the fine metal wire comprises conductive metal atoms M and oxygen atoms a; and when the thickness of the fine metal wire is defined as T in STEM-EDX analysis on a cross-section of the fine metal wire perpendicular to a direction of drawing of the fine metal wire, the atom% ratio O/M 0.10-0.90 of the oxygen atoms a to the conductive metal atoms M in a thickness region from 0.10T to 0.90T from a fine metal wire interface on the transparent substrate side is 0.01 or more and 1.00 or less, the atom% ratio O/M 0.75-0.90 in a thickness region from 0.75T to 0.90T from the fine metal wire interface on the transparent substrate side is 0.25 or less, the atom% ratio O/M 0.10-0.25 in a thickness region from 0.10T to 0.25T from the fine metal wire interface on the transparent substrate side is 0.05 or more, the conductive metal atoms M comprise at least one or more metal elements selected from the group consisting of silver, copper, and aluminum, the fine metal wire comprises at least one or more metal oxides selected from the group consisting of cuprous oxide, cupric oxide, silver oxide, and aluminum oxide, the metal atoms of the metal oxide are the same as the conductive metal atoms M, a refractive index of the intermediate layer is smaller than that of the transparent substrate, a theoretical refractive index of the fine metal wire in a thickness region from 0.10T to 0.25T from the fine metal wire interface on the transparent substrate side is smaller than the refractive index of the intermediate layer, wherein the theoretical refractive index of the fine metal wire is a refractive index value calculated from the constituent atoms or materials and the compositional ratio thereof, and the fine metal wire comprises 50% by mass or more of a conductive component comprising the conductive metal atoms M. when the thickness of the fine metal wire is defined as T in STEM-EDX analysis on a cross-section of the fine metal wire perpendicular to a direction of drawing of the fine metal wire, the atom% ratio O/M 0.10-0.90 of the oxygen atoms a to the conductive metal atoms M in a thickness region from 0.10T to 0.90T from a fine metal wire interface on the transparent substrate side is 0.01 or more and 1.00 or less, the atom% ratio O/M 0.75-0.90 in a thickness region from 0.75T to 0.90T from the fine metal wire interface on the transparent substrate side is 0.25 or less, the atom% ratio O/M 0.10-0.25 in a thickness region from 0.10T to 0.25T from the fine metal wire interface on the transparent substrate side is 0.05 or more, the conductive metal atoms M comprise at least one or more metal elements selected from the group consisting of silver, copper, and aluminum, the fine metal wire comprises at least one or more metal oxides selected from the group consisting of cuprous oxide, cupric oxide, silver oxide, and aluminum oxide, the metal atoms of the metal oxide are the same as the conductive metal atoms M, a refractive index of the intermediate layer is smaller than that of the transparent substrate, a theoretical refractive index of the fine metal wire in a thickness region from 0.10T to 0.25T from the fine metal wire interface on the transparent substrate side is smaller than the refractive index of the intermediate layer, wherein the theoretical refractive index of the fine metal wire is a refractive index value calculated from the constituent atoms or materials and the compositional ratio thereof, and the fine metal wire comprises 50% by mass or more of a conductive component comprising the conductive metal atoms M.