A method of forming a microelectronic structure, said method comprising: providing a stack comprising: a substrate having a surface; and one or more optional intermediate layers on said substrate surface; applying a composition to said intermediate layers, if present, or to said substrate surface, if no intermediate layers are present, said composition comprising a block copolymer comprising a first block and a second block, wherein: said first block is selected from the group consisting of: a polymer comprising random monomers of vinylbenzocyclobutene, styrene, and a monomer other than styrene or vinylbenzocyclobutene, wherein said monomer other than styrene or vinylbenzocyclobutene is a styrene-containing monomer; and a polymer comprising random monomers of vinyl biphenyl and styrene; and said second block is selected from the group consisting of polymers of methyl methacrylate, lactic acid, ethylene oxide, methyl acrylate, vinyl ester, and vinyl amide; and causing said composition to self-assemble into a self-assembled layer, wherein said self-assembled layer comprises a first self-assembled region and a second self-assembled region different from said first self-assembled region. providing a stack comprising: a substrate having a surface; and one or more optional intermediate layers on said substrate surface; a substrate having a surface; and one or more optional intermediate layers on said substrate surface; applying a composition to said intermediate layers, if present, or to said substrate surface, if no intermediate layers are present, said composition comprising a block copolymer comprising a first block and a second block, wherein: said first block is selected from the group consisting of: a polymer comprising random monomers of vinylbenzocyclobutene, styrene, and a monomer other than styrene or vinylbenzocyclobutene, wherein said monomer other than styrene or vinylbenzocyclobutene is a styrene-containing monomer; and a polymer comprising random monomers of vinyl biphenyl and styrene; and said second block is selected from the group consisting of polymers of methyl methacrylate, lactic acid, ethylene oxide, methyl acrylate, vinyl ester, and vinyl amide; and said first block is selected from the group consisting of: a polymer comprising random monomers of vinylbenzocyclobutene, styrene, and a monomer other than styrene or vinylbenzocyclobutene, wherein said monomer other than styrene or vinylbenzocyclobutene is a styrene-containing monomer; and a polymer comprising random monomers of vinyl biphenyl and styrene; and a polymer comprising random monomers of vinylbenzocyclobutene, styrene, and a monomer other than styrene or vinylbenzocyclobutene, wherein said monomer other than styrene or vinylbenzocyclobutene is a styrene-containing monomer; and a polymer comprising random monomers of vinyl biphenyl and styrene; and said second block is selected from the group consisting of polymers of methyl methacrylate, lactic acid, ethylene oxide, methyl acrylate, vinyl ester, and vinyl amide; and causing said composition to self-assemble into a self-assembled layer, wherein said self-assembled layer comprises a first self-assembled region and a second self-assembled region different from said first self-assembled region.