A film (100, 200) for use as an interleaf between substrates, the film comprising: a first side (110, 210) having a first micro-embossed surface and a first formed pattern; a second side having a second micro-embossed surface and a second formed pattern; a basis weight of between about 35 gsm and about 80 gsm; a Low Load Thickness of between about 150 micrometers and 400 micrometers according to the Low Load Thickness Test, which measures an embossed thickness of the film, utilizing a motorized micrometer having a 50.7 mm diameter anvil, a dead weight load of 147,250 g/m 2, and a dwell time of 2-5 seconds; a flexural stiffness of between about 150 grams and about 500 grams according to the Circular Bend Stiffness Test, which measures a maximum force required to push a sample through an orifice of 38.1 mm in a platform during a 57 mm downward stroke, starting at 3 mm above a top of the platform, utilizing a plunger having a flat 25.4 mm diameter surface forcing the sample through the orifice; wherein the first micro-embossed surface and the second micro-embossed surface each have an average surface roughness Ra in the range of about 0.1 micrometers to about 18.0 micrometers, a surface roughness Rz, which is an average of heights of five highest peaks and five lowest valleys, of between about 10 micrometers and about 30 micrometers, and an average spacing between peaks Sm of between about 100 micrometers and about 300 micrometers; wherein the first formed pattern and the second formed pattern are complementary to each other, wherein the first formed pattern comprises a plurality of first peaks (112, 212) and a plurality of first valleys (114, 214) extending in a first direction, wherein the first peaks alternate with the first valleys in a second direction, perpendicular to the first direction, wherein the second formed pattern comprises a plurality of second peaks and a plurality of second valleys extending in the first direction, wherein the second peaks alternate with the second valleys in the second direction, wherein each first peak on the first side of the film is opposite to a second valley on the second side of the film, each first valley on the first side of the film is opposite a second peak on the second side of the film, and first substantially planar portions connecting respective first peaks and first valleys on the first side of the film are opposite to second substantially planar portions connecting respective second peaks and second valleys on the second side of the film, thereby giving a cross-section of the film taken along the second direction an undulating configuration a first side (110, 210) having a first micro-embossed surface and a first formed pattern; a second side having a second micro-embossed surface and a second formed pattern; a basis weight of between about 35 gsm and about 80 gsm; a Low Load Thickness of between about 150 micrometers and 400 micrometers according to the Low Load Thickness Test, which measures an embossed thickness of the film, utilizing a motorized micrometer having a 50.7 mm diameter anvil, a dead weight load of 147,250 g/m 2, and a dwell time of 2-5 seconds; a flexural stiffness of between about 150 grams and about 500 grams according to the Circular Bend Stiffness Test, which measures a maximum force required to push a sample through an orifice of 38.1 mm in a platform during a 57 mm downward stroke, starting at 3 mm above a top of the platform, utilizing a plunger having a flat 25.4 mm diameter surface forcing the sample through the orifice; wherein the first micro-embossed surface and the second micro-embossed surface each have an average surface roughness Ra in the range of about 0.1 micrometers to about 18.0 micrometers, a surface roughness Rz, which is an average of heights of five highest peaks and five lowest valleys, of between about 10 micrometers and about 30 micrometers, and an average spacing between peaks Sm of between about 100 micrometers and about 300 micrometers; wherein the first formed pattern and the second formed pattern are complementary to each other, wherein the first formed pattern comprises a plurality of first peaks (112, 212) and a plurality of first valleys (114, 214) extending in a first direction, wherein the first peaks alternate with the first valleys in a second direction, perpendicular to the first direction, wherein the second formed pattern comprises a plurality of second peaks and a plurality of second valleys extending in the first direction, wherein the second peaks alternate with the second valleys in the second direction, wherein each first peak on the first side of the film is opposite to a second valley on the second side of the film, each first valley on the first side of the film is opposite a second peak on the second side of the film, and first substantially planar portions connecting respective first peaks and first valleys on the first side of the film are opposite to second substantially planar portions connecting respective second peaks and second valleys on the second side of the film, thereby giving a cross-section of the film taken along the second direction an undulating configuration