A multi-axis MEMS gyroscope, provided with a micromechanical detection structure having a main extension in a horizontal plane (xy), comprising: a substrate of semiconductor material; a driving-mass arrangement (14a-14b), designed to be driven in a driving movement; a driven-mass arrangement, having a central window, coupled elastically to said driving-mass arrangement (14a-14b), and designed to be driven in motion by said driving movement; a sensing-mass arrangement (20; 35a-35b, 37a-37b), designed to perform, in response to the movement of the driven-mass arrangement, in the presence of a first angular velocity (ω x) about a first horizontal axis (x) of the horizontal plane (xy) a first detection movement of rotation out of the horizontal plane (xy) about a second horizontal axis (y) of the horizontal plane (xy), perpendicular to the first horizontal axis (x), and further a second detection movement of rotation out of the horizontal plane (xy) about the first horizontal axis (x), in the presence of a second angular velocity (ω y) about the second horizontal axis (y) of the horizontal plane (xy); a sensing-electrode arrangement (29a-29b, 30a-30b), fixed with respect to the substrate and arranged underneath, and capacitively coupled to, the sensing-mass arrangement (20; 35a-35b, 37a-37b); and an anchorage assembly, arranged within the central window of the driven-mass arrangement, elastically coupled to the driven-mass arrangement, and configured to constrain the driven-mass arrangement to the substrate at anchorage elements, characterized in that said anchorage assembly comprises a rigid structure (25a-25b), suspended above said substrate, elastically connected to said driven mass arrangement by elastic connection elements (26a-26b) at a central portion of said rigid structure (25a-25b), and to said anchorage elements by elastic decoupling elements at end portions of said rigid structure (25a-25b); wherein said anchorage elements are positioned at a distance from said elastic connection elements (26a-26b) and in the proximity of said sensing-electrode arrangement (29a-29b, 30a-30b) in the horizontal plane (xy). a substrate of semiconductor material; a driving-mass arrangement (14a-14b), designed to be driven in a driving movement; a driven-mass arrangement, having a central window, coupled elastically to said driving-mass arrangement (14a-14b), and designed to be driven in motion by said driving movement; a sensing-mass arrangement (20; 35a-35b, 37a-37b), designed to perform, in response to the movement of the driven-mass arrangement, in the presence of a first angular velocity (ω x) about a first horizontal axis (x) of the horizontal plane (xy) a first detection movement of rotation out of the horizontal plane (xy) about a second horizontal axis (y) of the horizontal plane (xy), perpendicular to the first horizontal axis (x), and further a second detection movement of rotation out of the horizontal plane (xy) about the first horizontal axis (x), in the presence of a second angular velocity (ω y) about the second horizontal axis (y) of the horizontal plane (xy); a sensing-electrode arrangement (29a-29b, 30a-30b), fixed with respect to the substrate and arranged underneath, and capacitively coupled to, the sensing-mass arrangement (20; 35a-35b, 37a-37b); and an anchorage assembly, arranged within the central window of the driven-mass arrangement, elastically coupled to the driven-mass arrangement, and configured to constrain the driven-mass arrangement to the substrate at anchorage elements, characterized in that said anchorage assembly comprises a rigid structure (25a-25b), suspended above said substrate, elastically connected to said driven mass arrangement by elastic connection elements (26a-26b) at a central portion of said rigid structure (25a-25b), and to said anchorage elements by elastic decoupling elements at end portions of said rigid structure (25a-25b); wherein said anchorage elements are positioned at a distance from said elastic connection elements (26a-26b) and in the proximity of said sensing-electrode arrangement (29a-29b, 30a-30b) in the horizontal plane (xy).