mhurhangee/ep-ind-claims huggingface dataset:
The use of a cosmetic composition containing a) from 0.05 to 5.0 wt.% of at least one hydrophobically modified (meth)acrylic acid copolymer that is formed from - at least one monomer from the group comprising acrylic acid, methacrylic acid, C 1 -C 6 alkyl acrylic acid esters, C 1 -C 6 alkyl methacrylic acid esters, - at least one monomer from the group comprising C 10 -C 30 alkyl acrylates, steareth-20 methacrylate, beheneth-25 methacrylate, steareth-20 itaconate, ceteth-20 itaconate, palmeth-25 acrylate or C 10 - 30 alkyl PEG-20 itaconates; b) from 0.1 to 8.0 wt.% of at least one hydrophobically modified polysaccharide from the group comprising starch octenylsuccinates; c) from 0.1 to 10 wt.% of at least one wax from the group comprising beeswax and carnauba wax, for temporarily shaping keratin-containing fibers, in particular human hair. a) from 0.05 to 5.0 wt.% of at least one hydrophobically modified (meth)acrylic acid copolymer that is formed from - at least one monomer from the group comprising acrylic acid, methacrylic acid, C 1 -C 6 alkyl acrylic acid esters, C 1 -C 6 alkyl methacrylic acid esters, - at least one monomer from the group comprising C 10 -C 30 alkyl acrylates, steareth-20 methacrylate, beheneth-25 methacrylate, steareth-20 itaconate, ceteth-20 itaconate, palmeth-25 acrylate or C 10 - 30 alkyl PEG-20 itaconates; - at least one monomer from the group comprising acrylic acid, methacrylic acid, C 1 -C 6 alkyl acrylic acid esters, C 1 -C 6 alkyl methacrylic acid esters, - at least one monomer from the group comprising C 10 -C 30 alkyl acrylates, steareth-20 methacrylate, beheneth-25 methacrylate, steareth-20 itaconate, ceteth-20 itaconate, palmeth-25 acrylate or C 10 - 30 alkyl PEG-20 itaconates; b) from 0.1 to 8.0 wt.% of at least one hydrophobically modified polysaccharide from the group comprising starch octenylsuccinates; c) from 0.1 to 10 wt.% of at least one wax from the group comprising beeswax and carnauba wax,
A battery comprising: a cathode; an anode; and a liquid electrolyte, wherein the anode comprises at least one anode active material from the group consisting of simple substances or alloys of silicon (Si) or tin (Sn), and compounds selected from SiB 4, SiB 6, Mg 2 Si, Mg 2 Sn, Ni 2 Si, TiSi 2, MoSi 2, CoSi 2, NiSi 2, CaSi 2, CrSi 2, Cu 5 Si, FeSi 2, MnSi 2, NbSi 2, TaSi 2, VSi 2, WSi 2, ZnSi 2, SiC, Si 3 N 4, Si 2 N 2 O, SiO v (o<v≤2), SnO w (O<w≤2), SnSiO 3, LiSiO, and LiSnO, a capacity of the anode includes a capacity component derived from inserting and extracting a light metal by the anode active material, and the electrolyte includes a light metallic salt, and a solvent, wherein the content of the light metallic salt is from 0.01 mol/kg to 2.0 mol/kg in relation to the solvent, and wherein the light metallic salt is bis [1,2-benzene diorate (2-)-O, O'] lithium borate expressed by Chemical formula 11, or tris [1,2-benzene diorate (2-)-O, O'] lithium phosphate expressed by Chemical formula 12. a cathode; an anode; and a liquid electrolyte, wherein the anode comprises at least one anode active material from the group consisting of simple substances or alloys of silicon (Si) or tin (Sn), and compounds selected from SiB 4, SiB 6, Mg 2 Si, Mg 2 Sn, Ni 2 Si, TiSi 2, MoSi 2, CoSi 2, NiSi 2, CaSi 2, CrSi 2, Cu 5 Si, FeSi 2, MnSi 2, NbSi 2, TaSi 2, VSi 2, WSi 2, ZnSi 2, SiC, Si 3 N 4, Si 2 N 2 O, SiO v (o<v≤2), SnO w (O<w≤2), SnSiO 3, LiSiO, and LiSnO, a capacity of the anode includes a capacity component derived from inserting and extracting a light metal by the anode active material, and the electrolyte includes a light metallic salt, and a solvent, wherein the content of the light metallic salt is from 0.01 mol/kg to 2.0 mol/kg in relation to the solvent, and wherein the light metallic salt is bis [1,2-benzene diorate (2-)-O, O'] lithium borate expressed by Chemical formula 11, or tris [1,2-benzene diorate (2-)-O, O'] lithium phosphate expressed by Chemical formula 12. a capacity of the anode includes a capacity component derived from inserting and extracting a light metal by the anode active material, and the electrolyte includes a light metallic salt,
Cryostat arrangement comprising a vacuum tank in which a superconducting magnet coil system to be cooled is arranged, a cryocooler being provided which actively cools the cryostat arrangement and comprises a coolant circuit comprising a compressor and a cold head, which has an at least single-stage, in particular dual-stage cold finger that is in thermal contact with the superconducting magnet coil system, a volumetric vessel containing cryogenic fluid, in particular containing helium, being arranged such that it is thermally conductively connected to the superconducting magnet coil system and to parts of the cryostat arrangement via which ambient heat can flow to the superconducting magnet coil system, characterized in that the volumetric vessel holds between 0.5 and 5 liters, in that the volumetric vessel is connected to the coolant circuit of the cryocooler by means of a pressure-resistant line that is guided through the vacuum tank at least in part, in that at least one fluidic component, which may comprise a throttle element, an on-off valve or a regulating valve, is arranged in the pressure-resistant line, by means of which the flow rate of cryogenic fluid through the pressure-resistant line can be influenced in a defined manner, and in that the fluidic component is designed such that it influences the flow rate of the volume flow brought about by a pressure differential between the volumetric vessel and the coolant circuit of the cryocooler such that either the volumetric vessel is filled with cryogenic fluid from the coolant circuit of the cryocooler with a time constant of at least 15 min or the cryogenic fluid flows out of the volumetric vessel into the coolant circuit of the cryocooler with a time constant of at least 15 min.
Aqueous polyurethane urea dispersion containing polyurethane urea polymers composed of a) from 5 to 40 wt.% of at least one aliphatic or aromatic polyisocyanate having a functionality 2, b) from 40 to 90 wt.% of at least one amorphous polyester polyol having a functionality ≥ 2 and a molar mass M n of from 400 to 8000 g/mol, composed of succinic acid and at least two different dihydroxy compounds whose carbon skeleton contains from 2 to 12 carbon atoms, c) from 0.1 to 5 wt.% of at least one isocyanate-reactive compound having a functionality ≥ 2 which contains potentially ionic groups, d) from 0.1 to 17 wt.% of at least one polyamine having a molar mass M n of from 32 to 400 g/mol and a functionality of from 1 to 3, e) optionally from 0 to 15 wt.% of at least one non-ionic, isocyanate-reactive hydrophilising agent, f) optionally from 0 to 7.0 wt.% of at least one polyhydroxy compound having a molar mass M n < 400 g/mol and a functionality of from 2 to 4, g) optionally from 0 to 8.0 wt.% of at least one neutralising agent for neutralising the potentially ionic groups of component c), wherein the sum of components a) to g) is 100 wt.%. a) from 5 to 40 wt.% of at least one aliphatic or aromatic polyisocyanate having a functionality 2, b) from 40 to 90 wt.% of at least one amorphous polyester polyol having a functionality ≥ 2 and a molar mass M n of from 400 to 8000 g/mol, composed of succinic acid and at least two different dihydroxy compounds whose carbon skeleton contains from 2 to 12 carbon atoms, c) from 0.1 to 5 wt.% of at least one isocyanate-reactive compound having a functionality ≥ 2 which contains potentially ionic groups, d) from 0.1 to 17 wt.% of at least one polyamine having a molar mass M n of from 32 to 400 g/mol and a functionality of from 1 to 3, e) optionally from 0 to 15 wt.% of at least one non-ionic, isocyanate-reactive hydrophilising agent, f) optionally from 0 to 7.0 wt.% of at least one polyhydroxy compound having a molar mass M n < 400 g/mol and a functionality of from 2 to 4, g) optionally from 0 to 8.0 wt.% of at least one neutralising agent for neutralising the potentially ionic groups of component c),
A hearing aid comprising a receiver, an output port, a conduit for conveying sound to the output port and a barrier element adapted for baffling entry of ear wax and moisture and for being acoustically transparent, wherein the barrier element comprises a slab with an exterior surface, and wherein the barrier element has a number of through-going pores, the diameter d of each of the through-going pores being smaller than 200 micrometre, characterized in that the exterior surface is microstructured with a square-wave like profile having alternating peaks and throughs with the ratio of the amount of material left relative to the amount of material removed being below 50 % and surface coated by molecular vapor deposition with a moisture repellant matter to make the surface super-hydrophobic exhibiting a contact angle to water exceeding 145°.
A process for preparing a compound represented by formula: (wherein R 2 and R 3 each independently represents a protecting group for carboxyl group), which comprises reacting a compound represented by formula: (wherein R 2 represents a protecting group for carboxyl group) with a malonic acid derivative in the presence of a base and an asymmetric catalyst in a two layer solvent system of hydrophobic solvent and water.
Holding-down device for plate shears, which can be pressed by a mechanically controlled non-variable stroke onto a plate to be cut, wherein raising is carried out by a roller lever by means of a cam disc and actuating levers are provided between roller lever and holding-down device, characterised in that the start position of the holding-down device before start of the stroke is settable, that a spindle with righthand and lefthand threads, by means of which the distance between the roller lever and the actuating levers is variable by rotation, is provided between the roller lever and the actuating levers and that the roller lever can be lifted off by the cam disc.
A protective casing, comprising: a metallic microlattice layer configured to surround an object and impregnated with a heat absorbing material, wherein the metallic microlattice layer comprises a layer of supporting scaffolding formed by a plurality of conjoined sections of truss elements; a flexible insulation layer that surrounds the metallic microlattice layer; and an outer protective layer that surrounds the flexible insulation layer. a metallic microlattice layer configured to surround an object and impregnated with a heat absorbing material, wherein the metallic microlattice layer comprises a layer of supporting scaffolding formed by a plurality of conjoined sections of truss elements; a flexible insulation layer that surrounds the metallic microlattice layer; and an outer protective layer that surrounds the flexible insulation layer.
A metal gasket bellows seal (300; 506) comprising: a first ply (400; 500) comprised of a first material (401; 501) having a first yield strength; a second ply (402; 502) positioned adjacent to the first ply (400; 500) and comprised of a second material (403; 503) having a second yield strength that is different than the first yield strength, wherein: the second yield strength is less than the first yield strength; the metal gasket bellows seal (300; 506) has a first end, a second end and a serpentine shape; the first ply (400; 500) and the second ply (402; 502) define a first dimple proximate to the first end and a second dimple proximate to the second end; and at least one spacer (504; 700) is positioned between the first ply and the second ply and configured to reduce a surface area of contact between the first ply and the second ply, wherein the at least one spacer (504; 700) is comprised of a third material that includes a ceramic; characterized in that the first material is an alloy having, by weight percent (wt%), 58% nickel, 19% chromium, 13% cobalt, 4% molybdenum, 3% titanium and 1.4% aluminum, and the second material (403; 503) is an alloy having, by weight percent (wt%), 39% cobalt, 22% nickel, 22% chromium and 14% tungsten. a first ply (400; 500) comprised of a first material (401; 501) having a first yield strength; a second ply (402; 502) positioned adjacent to the first ply (400; 500) and comprised of a second material (403; 503) having a second yield strength that is different than the first yield strength, wherein: the second yield strength is less than the first yield strength; the metal gasket bellows seal (300; 506) has a first end, a second end and a serpentine shape; the first ply (400; 500) and the second ply (402; 502) define a first dimple proximate to the first end and a second dimple proximate to the second end; and at least one spacer (504; 700) is positioned between the first ply and the second ply and configured to reduce a surface area of contact between the first ply and the second ply, wherein the at least one spacer (504; 700) is comprised of a third material that includes a ceramic; characterized in that the second yield strength is less than the first yield strength; the metal gasket bellows seal (300; 506) has a first end, a second end and a serpentine shape; the first ply (400; 500) and the second ply (402; 502) define a first dimple proximate to the first end and a second dimple proximate to the second end; and at least one spacer (504; 700) is positioned between the first ply and the second ply and configured to reduce a surface area of contact between the first ply and the second ply, wherein the at least one spacer (504; 700) is comprised of a third material that includes a ceramic; characterized in that the first material is an alloy having, by weight percent (wt%), 58% nickel, 19% chromium, 13% cobalt, 4% molybdenum, 3% titanium and 1.4% aluminum, and the second material (403; 503) is an alloy having, by weight percent (wt%), 39% cobalt, 22% nickel, 22% chromium and 14% tungsten.
A restraining element for holding a child, having a vehicle seat belt system comprising a diagonal belt section and a horizontal belt section, in particular for use with a child seat, wherein the restraining element is configured in such a way that in a use state, it extends roughly transversely above the thighs of a child sitting on a seat surface, characterized in that the restraining element has a first belt guide for the diagonal belt section and a second belt guide, wherein the second belt guide is configured to interact with the horizontal belt section in such a way that, in the use state of the restraining element, the horizontal belt section extends directly across the thigh of the child.
A system for reliably broadcasting a transmission in a wireless network over a plurality of timeslots, comprising: a source node; and a plurality of relay nodes (111, 112,... 117), wherein at least one of the plurality of relay nodes is N hops from the source node, wherein the source node is configured to broadcast the transmission in a first timeslot of the plurality of timeslots with a time-to-live, TTL, field set to M and a hop count field set to 1, wherein M is greater than or equal to N, wherein the source node is further configured to evaluate a trade-off between power consumption and communication reliability, and re-broadcast the transmission in a second timeslot subsequent to the first timeslot based on the evaluation and as long as the hop count field is less than or equal to the TTL field, wherein the hop count field of the transmission is incremented prior to the source node re-broadcasting the transmission, wherein each of the plurality of relay nodes (111, 112,...117) is configured to receive the transmission in at least one of the plurality of timeslots, and re-broadcast the transmission in a relay timeslot that is subsequent to the at least one of the plurality timeslots as long as the hop count field is less than or equal to the TTL field, and wherein the hop count field of the received transmission is incremented prior to each of the plurality of relay nodes (111, 112,...117) re- broadcasting the transmission. a source node; and a plurality of relay nodes (111, 112,... 117), wherein at least one of the plurality of relay nodes is N hops from the source node, wherein the source node is configured to broadcast the transmission in a first timeslot of the plurality of timeslots with a time-to-live, TTL, field set to M and a hop count field set to 1, wherein M is greater than or equal to N, wherein the source node is further configured to evaluate a trade-off between power consumption and communication reliability, and re-broadcast the transmission in a second timeslot subsequent to the first timeslot based on the evaluation and as long as the hop count field is less than or equal to the TTL field, wherein the hop count field of the transmission is incremented prior to the source node re-broadcasting the transmission, wherein each of the plurality of relay nodes (111, 112,...117) is configured to receive the transmission in at least one of the plurality of timeslots, and re-broadcast the transmission in a relay timeslot that is subsequent to the at least one of the plurality timeslots as long as the hop count field is less than or equal to the TTL field, and wherein the hop count field of the received transmission is incremented prior to each of the plurality of relay nodes (111, 112,...117) re- broadcasting the transmission.
A method, comprising: deploying a circuit assembly having a first wafer bonded to a second wafer with an oxide layer, wherein the first wafer comprises a detector and the second wafer comprises a read out integrated circuit, ROIC, wherein a first surface of the first wafer is bonded to a first surface of the second wafer; creating a bonding oxide on a second surface of the second wafer; thinning the first wafer after depositing the bonding oxide; annealing the circuit assembly; applying a coating over at least a portion of the first wafer after annealing the circuit assembly; polishing the bonding oxide on the second surface of the second wafer after applying the coating over at least the portion of the first wafer: securing a shim to the polished bonding oxide on the second surface of the second wafer to reduce bow of the circuit assembly; and removing the coating after securing the shim. deploying a circuit assembly having a first wafer bonded to a second wafer with an oxide layer, wherein the first wafer comprises a detector and the second wafer comprises a read out integrated circuit, ROIC, wherein a first surface of the first wafer is bonded to a first surface of the second wafer; creating a bonding oxide on a second surface of the second wafer; thinning the first wafer after depositing the bonding oxide; annealing the circuit assembly; applying a coating over at least a portion of the first wafer after annealing the circuit assembly; polishing the bonding oxide on the second surface of the second wafer after applying the coating over at least the portion of the first wafer: securing a shim to the polished bonding oxide on the second surface of the second wafer to reduce bow of the circuit assembly; and removing the coating after securing the shim. securing a shim to the polished bonding oxide on the second surface of the second wafer to reduce bow of the circuit assembly; and removing the coating after securing the shim.
A compound represented by the general formula: or a pharmacologically acceptable salt thereof wherein R 1 represents a heterocyclic group selected from a pyrazolyl group and a pyrimidinyl group, which heterocyclic group may be substituted with 1 to 4 group(s) independently selected from substituent group A; R 2 independently represents a halogen atom or a C 1 -C 6 alkyl group; n represents 0, 1, or 2; and substituent group A represents the group consisting of halogen atoms, C 1 -C 6 alkyl groups, C 1 -C 6 halogenated alkyl groups, C 1 -C 6 alkoxy groups, a carboxy group, C 2 -C 7 carboxyalkyl groups, C 2 -C 7 alkylcarbonyl groups, C 2 -C 7 alkoxycarbonyl groups, a cyano group, C 1 -C 6 alkylsulfonyl groups, groups represented by the formula -C(=O)-NR 3 R 4 (R 3 and R 4 are identical to or different from each other and each independently represents a hydrogen atom, a C 1 -C 6 alkyl group, or a C 3 -C 6 cycloalkyl group, or R 3 and R 4 form a 4 to 6-membered saturated heterocyclic ring together with the nitrogen atom bound therewith, wherein the 4 to 6-membered saturated heterocyclic ring may further contain one oxygen atom), mono-C 2 -C 7 alkoxycarbonylamino groups, and an oxo group. R 1 represents a heterocyclic group selected from a pyrazolyl group and a pyrimidinyl group, which heterocyclic group may be substituted with 1 to 4 group(s) independently selected from substituent group A; R 2 independently represents a halogen atom or a C 1 -C 6 alkyl group; n represents 0, 1, or 2; and substituent group A represents the group consisting of halogen atoms, C 1 -C 6 alkyl groups, C 1 -C 6 halogenated alkyl groups, C 1 -C 6 alkoxy groups, a carboxy group, C 2 -C 7 carboxyalkyl groups, C 2 -C 7 alkylcarbonyl groups, C 2 -C 7 alkoxycarbonyl groups, a cyano group, C 1 -C 6 alkylsulfonyl groups, groups represented by the formula -C(=O)-NR 3 R 4 (R 3 and R 4 are identical to or different from each other and each independently represents a hydrogen atom, a C 1 -C 6 alkyl group, or a C 3 -C 6 cycloalkyl group, or R 3 and R 4 form a 4 to 6-membered saturated heterocyclic ring together with the nitrogen atom bound therewith, wherein the 4 to 6-membered saturated heterocyclic ring may further contain one oxygen atom), mono-C 2 -C 7 alkoxycarbonylamino groups, and an oxo group.
A method of oxidizing or reoxidizing a gate structure formed by etching during the fabrication of semiconductor device, said structure comprising an oxide insulating layer formed over a semiconductor substrate, a silicon-containing structure formed on said oxide insulating layer, a metal nitride structure formed on said silicon-containing structure, a metal structure formed on the metal nitride structure, and a nitride structure formed on the metal structure, the method comprising the step of: re-oxidizing, in a semiconductor processing chamber, a damaged portion of said oxide insulating layer and oxidizing said silicon-containing structure while leaving said metal nitride structure and said metal structure substantially unoxidized by introducing O 2 and H 2 in the semiconductor processing chamber in a reaction, such that the reaction between said O 2 and H 2 does not increase the pressure in the processing chamber beyond a predetermined safe level. re-oxidizing, in a semiconductor processing chamber, a damaged portion of said oxide insulating layer and oxidizing said silicon-containing structure while leaving said metal nitride structure and said metal structure substantially unoxidized by introducing O 2 and H 2 in the semiconductor processing chamber in a reaction, such that the reaction between said O 2 and H 2 does not increase the pressure in the processing chamber beyond a predetermined safe level.
An anionic flocculant comprising: galactomannan; and a polysaccharide other than the galactomannan, wherein the anionic flocculant has a bulk density of 0.50 g/cm 3 or more but 1.00 g/cm 3 or less, the anionic flocculant has a particle diameter D 50 of 250 μm or more but 850 μm or less, and the anionic flocculant has a particle diameter D 10 of 150 μm or more, and wherein a difference (D 50 - D 10) between the particle diameter D 50 and the particle diameter D 10 is 100 μm or more but 200 μm or less. galactomannan; and a polysaccharide other than the galactomannan, wherein the anionic flocculant has a bulk density of 0.50 g/cm 3 or more but 1.00 g/cm 3 or less, the anionic flocculant has a particle diameter D 50 of 250 μm or more but 850 μm or less, and the anionic flocculant has a particle diameter D 10 of 150 μm or more, and wherein a difference (D 50 - D 10) between the particle diameter D 50 and the particle diameter D 10 is 100 μm or more but 200 μm or less.