Method for exactly aligning at least two holograms (52,52R,52G,52B, 53,53R,53G,53B) arranged in optical waveguides (5,5R,5G,5B) with respect to one another, with - writing a first hologram (51R,52R,53R) and a first mark (71R,72R,721R) in a first optical waveguide, - writing a second hologram (51G,52G,53G) and a second mark (71G,72G,721G) in a second optical waveguide, - positioning the first optical waveguide and the second optical waveguide with respect to one another, - illuminating the first mark (71R,72R,721R) and the second mark (71G,72G,721G) using a light beam (LS1,LS2) that successively passes mutually associated marks (71R,72R,721R,71G,72G,721G) of the first optical waveguide and of the second optical waveguide and that is in each case influenced by the mutually associated marks (71R,72R,721R, 71G,72G,721G), wherein the marks (71R,71G,72R,72G,721R,721G) of the individual optical waveguides (5R,5G) are grating structures or holograms that influence the light (LS1,LS2) used during the illumination and are adapted to one another in such a way that a correct alignment is detectable, and wherein the marks (71R,71G,72R,72G,721R,721G) have a lens function whose associated focal lengths are selected in such a way that a correct pattern only occurs during the illumination when the distance between the individual optical waveguides (5R,5G) also takes a specified value, - detecting a pattern occurring during the illumination with the light beam (LS1,LS2) after passing the first mark (71R,72R,721R) and the second mark (71G,72G,721G), and - changing the position of one of the optical waveguides (5R,5G,5B) until the detected pattern matches a specified pattern. - writing a first hologram (51R,52R,53R) and a first mark (71R,72R,721R) in a first optical waveguide, - writing a second hologram (51G,52G,53G) and a second mark (71G,72G,721G) in a second optical waveguide, - positioning the first optical waveguide and the second optical waveguide with respect to one another, - illuminating the first mark (71R,72R,721R) and the second mark (71G,72G,721G) using a light beam (LS1,LS2) that successively passes mutually associated marks (71R,72R,721R,71G,72G,721G) of the first optical waveguide and of the second optical waveguide and that is in each case influenced by the mutually associated marks (71R,72R,721R, 71G,72G,721G), wherein the marks (71R,71G,72R,72G,721R,721G) of the individual optical waveguides (5R,5G) are grating structures or holograms that influence the light (LS1,LS2) used during the illumination and are adapted to one another in such a way that a correct alignment is detectable, and wherein the marks (71R,71G,72R,72G,721R,721G) have a lens function whose associated focal lengths are selected in such a way that a correct pattern only occurs during the illumination when the distance between the individual optical waveguides (5R,5G) also takes a specified value, - detecting a pattern occurring during the illumination with the light beam (LS1,LS2) after passing the first mark (71R,72R,721R) and the second mark (71G,72G,721G), and - changing the position of one of the optical waveguides (5R,5G,5B) until the detected pattern matches a specified pattern.