A positive resist composition comprising a resin whose solubility in an alkaline developer increases under the action of an acid, a compound capable of generating an acid upon irradiation with actinic rays or radiation, at least one resin having a fluorine atom and/or a silicon atom, and a solvent; wherein each resin is selected from the following resins and: a resin having a fluorine atom and/or a silicon atom and having an alicyclic structure, the alicyclic structure being contained in a repeat unit represented by one of the following formulae (Q-1)-(Q-4): wherein R represents an organic group or a halogen atom, k represents an integer of 0 to 3, L represents a single bond or a linking group, X represents a hydrogen atom, a substituted or unsubstituted alkyl group, or a halogen atom, and Q represents an alicyclic structure; a resin containing a repeat unit represented by the following formula and a repeat unit represented by the following formula: wherein X represents a hydrogen atom, a substituted or unsubstituted alkyl group, or a halogen atom, L represents a single bond or a linking group, P represents an organic group having a fluorine atom and/or a silicon atom, S represents an unsubstituted alkyl group, and the molar ratio m:n is 1:99-99:1; and wherein the total amount of resins and is 0.1-5.0 mass% based on the total mass of solids in the composition. a resin whose solubility in an alkaline developer increases under the action of an acid, a compound capable of generating an acid upon irradiation with actinic rays or radiation, at least one resin having a fluorine atom and/or a silicon atom, and a solvent; wherein each resin is selected from the following resins and: a resin having a fluorine atom and/or a silicon atom and having an alicyclic structure, the alicyclic structure being contained in a repeat unit represented by one of the following formulae (Q-1)-(Q-4): wherein R represents an organic group or a halogen atom, k represents an integer of 0 to 3, L represents a single bond or a linking group, X represents a hydrogen atom, a substituted or unsubstituted alkyl group, or a halogen atom, and Q represents an alicyclic structure; a resin containing a repeat unit represented by the following formula and a repeat unit represented by the following formula: wherein X represents a hydrogen atom, a substituted or unsubstituted alkyl group, or a halogen atom, L represents a single bond or a linking group, P represents an organic group having a fluorine atom and/or a silicon atom, S represents an unsubstituted alkyl group, and the molar ratio m:n is 1:99-99:1; and wherein the total amount of resins and is 0.1-5.0 mass% based on the total mass of solids in the composition. a resin having a fluorine atom and/or a silicon atom and having an alicyclic structure, the alicyclic structure being contained in a repeat unit represented by one of the following formulae (Q-1)-(Q-4): wherein R represents an organic group or a halogen atom, k represents an integer of 0 to 3, L represents a single bond or a linking group, X represents a hydrogen atom, a substituted or unsubstituted alkyl group, or a halogen atom, and Q represents an alicyclic structure; R represents an organic group or a halogen atom, k represents an integer of 0 to 3, L represents a single bond or a linking group, X represents a hydrogen atom, a substituted or unsubstituted alkyl group, or a halogen atom, and Q represents an alicyclic structure; a resin containing a repeat unit represented by the following formula and a repeat unit represented by the following formula: wherein X represents a hydrogen atom, a substituted or unsubstituted alkyl group, or a halogen atom, L represents a single bond or a linking group, P represents an organic group having a fluorine atom and/or a silicon atom, S represents an unsubstituted alkyl group, and the molar ratio m:n is 1:99-99:1; and X represents a hydrogen atom, a substituted or unsubstituted alkyl group, or a halogen atom, L represents a single bond or a linking group, P represents an organic group having a fluorine atom and/or a silicon atom, S represents an unsubstituted alkyl group, and the molar ratio m:n is 1:99-99:1; and