A method for irradiating a target with a beam of energetic radiation composed of electrically charged particles, comprising the steps of - providing a pattern definition means having a plurality of apertures transparent to said radiation, - illuminating said pattern definition means by means of an illuminating wide beam (lb), which traverses the pattern definition means through said apertures thus forming a patterned beam (pb) consisting of a corresponding plurality of beamlets, - forming said patterned beam into a pattern image (pm) on the location of the target, said pattern image comprising the images of at least part of the plurality of apertures covering a number of pattern pixels (px) on the target, and - generating a relative movement between said target and the pattern definition means producing a movement of said pattern image on the target along a path over a region (r1, SR) where a beam exposure is to be performed, said region being composed of a plurality of pattern pixels (px) arranged in a regular arrangement and having a total width (Ry,YR) as measured across a main direction (sd) of said relative movement, said movement defining a number of stripes (s11-s22, u11-u22, sa1-sc2) covering said region in sequential exposures, said stripes running substantially parallel to each other along said main direction and having respective widths as measured across said main direction, characterized in that the number of stripes (s11-s22, u11-u22, sa1-sc2) is written in a consecutive order in at least two passes (ps1, ps2, psa-psc), wherein each stripe belongs to exactly one of said passes, wherein for each pass, the widths of the stripes of one pass combine into a cover of the total width (Ry, YR), wherein each pass (ps1, ps2, psa-psc, pp1, pp2, kp1, kp2) is associated with one of a number of partial grids (G1, G2, Ga-Gc) of pattern pixels which are exposable during the respective pass, the partial grids (G1, G2, Ga-Gc) being mutually different and, when taken together, combining to the complete plurality of pattern pixels (px) which compose said region where a beam exposure is to be performed. - providing a pattern definition means having a plurality of apertures transparent to said radiation, - illuminating said pattern definition means by means of an illuminating wide beam (lb), which traverses the pattern definition means through said apertures thus forming a patterned beam (pb) consisting of a corresponding plurality of beamlets, - forming said patterned beam into a pattern image (pm) on the location of the target, said pattern image comprising the images of at least part of the plurality of apertures covering a number of pattern pixels (px) on the target, and - generating a relative movement between said target and the pattern definition means producing a movement of said pattern image on the target along a path over a region (r1, SR) where a beam exposure is to be performed, said region being composed of a plurality of pattern pixels (px) arranged in a regular arrangement and having a total width (Ry,YR) as measured across a main direction (sd) of said relative movement, said movement defining a number of stripes (s11-s22, u11-u22, sa1-sc2) covering said region in sequential exposures, said stripes running substantially parallel to each other along said main direction and having respective widths as measured across said main direction, characterized in that