A film formation apparatus comprising: a target containing a magnetic material; a support that supports a substrate and locates the substrate in an arrangement region opposing the target; and a first magnetic field formation unit located at a side of the arrangement region opposite to the target, the first magnetic field formation unit includes a first magnetic circuit and a first oscillation unit, a second magnetic field formation unit located at a side of the target opposite to the support, the second magnetic field formation unit includes a second magnetic circuit; wherein the first magnetic field formation unit is configured to form a horizontal magnetic field parallel to an oscillation direction (Ds), which is one direction extending along the substrate, at a side of the arrangement region where the target is located, and the first magnetic field formation unit is configured to oscillate the horizontal magnetic field in the oscillation direction (Ds) at least between one end of the arrangement region and another end of the arrangement region in the oscillation direction (Ds), wherein the first magnetic field formation unit includes a pair of permanent magnets (21a, 21b) and a yoke to form the horizontal magnetic field, each of the permanent magnets (21a, 21b) is pillar-shaped and includes an end opposing the arrangement region as a distal end, and a magnetic pole at the distal end of one of the permanent magnets (21a, 21b) and a magnetic pole at the distal end of the other one of the permanent magnets (21a, 21b) are different magnetic poles; characterized in that the second magnetic field formation unit includes further a second oscillation unit, wherein the second magnetic field formation unit is configured to oscillate in the oscillation direction (Ds) between one end of the target and another end of the target in the oscillation direction (Ds) and is configured to form a magnetic field at a side of the target where the support is located; wherein the first magnetic field formation unit is configured to synchronize oscillation of the magnetic field formed by the second magnetic field formation unit and oscillation of the horizontal magnetic field formed by the first magnetic field formation unit. a target containing a magnetic material; a support that supports a substrate and locates the substrate in an arrangement region opposing the target; and a first magnetic field formation unit located at a side of the arrangement region opposite to the target, the first magnetic field formation unit includes a first magnetic circuit and a first oscillation unit, a second magnetic field formation unit located at a side of the target opposite to the support, the second magnetic field formation unit includes a second magnetic circuit; wherein the first magnetic field formation unit is configured to form a horizontal magnetic field parallel to an oscillation direction (Ds), which is one direction extending along the substrate, at a side of the arrangement region where the target is located, and the first magnetic field formation unit is configured to oscillate the horizontal magnetic field in the oscillation direction (Ds) at least between one end of the arrangement region and another end of the arrangement region in the oscillation direction (Ds), wherein the first magnetic field formation unit includes a pair of permanent magnets (21a, 21b) and a yoke to form the horizontal magnetic field, each of the permanent magnets (21a, 21b) is pillar-shaped and includes an end opposing the arrangement region as a distal end, and a magnetic pole at the distal end of one of the permanent magnets (21a, 21b) and a magnetic pole at the distal end of the other one of the permanent magnets (21a, 21b) are different magnetic poles; characterized in that the second magnetic field formation unit includes further a second oscillation unit, wherein the second magnetic field formation unit is configured to oscillate in the oscillation direction (Ds) between one end of the target and another end of the target in the oscillation direction (Ds) and is configured to form a magnetic field at a side of the target where the support is located; wherein the first magnetic field formation unit is configured to synchronize oscillation of the magnetic field formed by the second magnetic field formation unit and oscillation of the horizontal magnetic field formed by the first magnetic field formation unit.