Method (100, 200, 300, 500, 600) for producing at least one opto-electronically active component by exposure to electromagnetic radiation featuring: a) Providing of at least one substrate with an upper side and a bottom side, i) wherein upper and bottom side face each other ii) wherein the substrate is made ofiat least a layer or a stack of layers, consisting of at least two layers stacked upon each other iii) wherein the bottom side of the substrate contains at least a first electrode layer iv) wherein the upper side contains at least one structure and v) wherein the substrate and the first electrode layer are arranged in such a way that the substrate and the first electrode layer are at least transparent or translucent towards one wave length range of the electromagnetic radiation. b) Application of at least one additional first layer above the first electrode layer, i) wherein the first additional layer is applied in such a way that it at least partly absorbs the electromagnetic radiation and ii) wherein the electrical conductivity of the first additional layer is changed in its volume and/or at the transition to at least one adjacent layer; c) Exposure of the additional first layer to electromagnetic radiation through the substrate and the first electrode layer i) wherein the electromagnetic radiation is refracted or diffracted upon impinging on the structure, whereby at least two areas with different exposure intensities are generated in the additional first layer, ii) wherein the intensities of exposure to radiation above the structure are inhomogeneous, and iii) wherein the exposure to radiation takes place in dependence on the location with a different angle of incidence and/or different intensity; d) Application of at least one additional second electrode layer at least partly above the additional first layer. a) Providing of at least one substrate with an upper side and a bottom side, i) wherein upper and bottom side face each other ii) wherein the substrate is made ofiat least a layer or a stack of layers, consisting of at least two layers stacked upon each other iii) wherein the bottom side of the substrate contains at least a first electrode layer iv) wherein the upper side contains at least one structure and v) wherein the substrate and the first electrode layer are arranged in such a way that the substrate and the first electrode layer are at least transparent or translucent towards one wave length range of the electromagnetic radiation. i) wherein upper and bottom side face each other ii) wherein the substrate is made ofiat least a layer or a stack of layers, consisting of at least two layers stacked upon each other iii) wherein the bottom side of the substrate contains at least a first electrode layer iv) wherein the upper side contains at least one structure and v) wherein the substrate and the first electrode layer are arranged in such a way that the substrate and the first electrode layer are at least transparent or translucent towards one wave length range of the electromagnetic radiation. b) Application of at least one additional first layer above the first electrode layer, i) wherein the first additional layer is applied in such a way that it at least partly absorbs the electromagnetic radiation and ii) wherein the electrical conductivity of the first additional layer is changed in its volume and/or at the transition to at least one adjacent layer; i) wherein the first additional layer is applied in such a way that it at least partly absorbs the electromagnetic radiation and ii) wherein the electrical conductivity of the first additional layer is changed in its volume and/or at the transition to at least one adjacent layer; c) Exposure of the additional first layer to electromagnetic radiation through the substrate and the first electrode layer i) wherein the electromagnetic radiation is refracted or diffracted upon impinging on the structure, whereby at least two areas with different exposure intensities are generated in the additional first layer, ii) wherein the intensities of exposure to radiation above the structure are inhomogeneous, and iii) wherein the exposure to radiation takes place in dependence on the location with a different angle of incidence and/or different intensity; i) wherein the electromagnetic radiation is refracted or diffracted upon impinging on the structure, whereby at least two areas with different exposure intensities are generated in the additional first layer, ii) wherein the intensities of exposure to radiation above the structure are inhomogeneous, and iii) wherein the exposure to radiation takes place in dependence on the location with a different angle of incidence and/or different intensity; d) Application of at least one additional second electrode layer at least partly above the additional first layer.