Milling installation comprising a mill with a plurality of processing lines or a plurality of mills with one or more processing lines for industrial production of a plurality of milling products, wherein a processing line comprises at least one milling passage (B, C) with milling roll pairs (B1, B2, Bx; C1, C2, Cx) for milling a milling material and at least one downstream screening passage for sifting or screening the milling product, wherein a specific milling product with specific yield parameters and milling product parameters can be produced via the processing lines, and wherein each mill of the milling installation comprises at least one memory-programmable controller (201/PLC) for local open-loop and/or closed-loop control of the processing devices (31; Bx/Cx/Sx), assigned to the processing lines, via assigned I/O interfaces, characterised in that the milling installation comprises a central closed-loop and open-loop control device for optimised control of the milling installation, wherein the memory-programmable controllers (201/PLC) are connected bidirectionally via network interfaces to the central closed-loop and open-loop control device and can respond to control parameters (4311,...,431x) transmitted from the central closed-loop and open-loop control device, and wherein the processing devices (31; Bx/Cx/Sx) of a processing line are remotely actuatable based on the transmitted control parameters (4311,...,431x) of the closed-loop and open-loop control device by means of the memory-programmable controllers (201/PLC) via the assigned I/O interfaces and are locally controllable individually during their operation, the central closed-loop and open-loop control device comprises means for generating the control parameters (4311,...,431x) to be transmitted depending on passage-specific (43211,...,4321x) and/or passage-encompassing (43221,...,4322x) batch parameters, wherein the passage-encompassing parameters (43221,...,4322x) comprise parameters with the same or corresponding relevance for different processing lines with the processing devices and are usable centrally by the closed-loop and open-loop control device to generate the open-loop/closed-loop control and monitor a plurality of processing lines, and wherein the passage-specific parameters (43211,...,4321x) comprise parameters with only specific relevance for a certain processing line or specific for a processing device assigned to a specific processing line, and, by means of at least one of the control parameters (4311,...,431x) on the basis of one or more of the passage-specific and/or passage-encompassing parameters, different processing lines with assigned processing devices (31; Bx/Cx/Sx) can be optimised centrally by means of the closed-loop and open-loop control device and/or can be controlled uniformly, wherein by means of the closed-loop and open-loop control device the passage-encompassing parameters (43221,...,4322x) can be optimised and controlled globally, in a device-encompassing manner for at least two of the processing lines, whereas by means of the closed-loop and open-loop control device the passage-specific parameters can be optimised and controlled independently based on the particular processing line. the milling installation comprises a central closed-loop and open-loop control device for optimised control of the milling installation, wherein the memory-programmable controllers (201/PLC) are connected bidirectionally via network interfaces to the central closed-loop and open-loop control device and can respond to control parameters (4311,...,431x) transmitted from the central closed-loop and open-loop control device, and wherein the processing devices (31; Bx/Cx/Sx) of a processing line are remotely actuatable based on the transmitted control parameters (4311,...,431x) of the closed-loop and open-loop control device by means of the memory-programmable controllers (201/PLC) via the assigned I/O interfaces and are locally controllable individually during their operation, the central closed-loop and open-loop control device comprises means for generating the control parameters (4311,...,431x) to be transmitted depending on passage-specific (43211,...,4321x) and/or passage-encompassing (43221,...,4322x) batch parameters, wherein the passage-encompassing parameters (43221,...,4322x) comprise parameters with the same or corresponding relevance for different processing lines with the processing devices and are usable centrally by the closed-loop and open-loop control device to generate the open-loop/closed-loop control and monitor a plurality of processing lines, and wherein the passage-specific parameters (43211,...,4321x) comprise parameters with only specific relevance for a certain processing line or specific for a processing device assigned to a specific processing line, and, by means of at least one of the control parameters (4311,...,431x) on the basis of one or more of the passage-specific and/or passage-encompassing parameters, different processing lines with assigned processing devices (31; Bx/Cx/Sx) can be optimised centrally by means of the closed-loop and open-loop control device and/or can be controlled uniformly, wherein by means of the closed-loop and open-loop control device the passage-encompassing parameters (43221,...,4322x) can be optimised and controlled globally, in a device-encompassing manner for at least two of the processing lines, whereas by means of the closed-loop and open-loop control device the passage-specific parameters can be optimised and controlled independently based on the particular processing line.