A detector for determining a position of at least one object, the detector comprising: - at least one projector for illuminating the object with at least one illumination pattern, wherein the illumination pattern comprises a plurality of illumination features; - at least one sensor element having a matrix of optical sensors, the optical sensors each having a light-sensitive area, wherein each optical sensor is designed to generate at least one sensor signal in response to an illumination of its respective light-sensitive area by a reflection light beam propagating from the object to the detector, wherein the sensor element is configured to determine at least one reflection image comprising a plurality of reflection features, wherein each of the reflection features comprises a beam profile; - at least one evaluation device configured for determining initial distance information of the reflection features by analysis of their respective beam profiles, wherein the analysis of a beam profile comprises evaluating a combined signal, Q, from the respective sensor signals, wherein the evaluation device is configured for performing a calibration method comprising: a) matching the reflection features to reference features of a reference image considering the initial distance information thereby determining pairs of matched reflection and reference features; b) Determining an epipolar line of the matched reference feature in the reference image for each of the pairs of matched reflection and reference features; c) determining an epipolar line distance, d, of the matched reflection feature to said epipolar line; characterized in that the calibration method comprises d) evaluating the epipolar line distances, d, as a function of an image position (x,y) in the reference image thereby determining a geometric pattern; e) determining at least one correction for rotation and/or translation of the reflection image depending on the geometric pattern. - at least one projector for illuminating the object with at least one illumination pattern, wherein the illumination pattern comprises a plurality of illumination features; - at least one sensor element having a matrix of optical sensors, the optical sensors each having a light-sensitive area, wherein each optical sensor is designed to generate at least one sensor signal in response to an illumination of its respective light-sensitive area by a reflection light beam propagating from the object to the detector, wherein the sensor element is configured to determine at least one reflection image comprising a plurality of reflection features, wherein each of the reflection features comprises a beam profile; - at least one evaluation device configured for determining initial distance information of the reflection features by analysis of their respective beam profiles, wherein the analysis of a beam profile comprises evaluating a combined signal, Q, from the respective sensor signals, wherein the evaluation device is configured for performing a calibration method comprising: a) matching the reflection features to reference features of a reference image considering the initial distance information thereby determining pairs of matched reflection and reference features; b) Determining an epipolar line of the matched reference feature in the reference image for each of the pairs of matched reflection and reference features; c) determining an epipolar line distance, d, of the matched reflection feature to said epipolar line; characterized in that the calibration method comprises d) evaluating the epipolar line distances, d, as a function of an image position (x,y) in the reference image thereby determining a geometric pattern; e) determining at least one correction for rotation and/or translation of the reflection image depending on the geometric pattern. a) matching the reflection features to reference features of a reference image considering the initial distance information thereby determining pairs of matched reflection and reference features; b) Determining an epipolar line of the matched reference feature in the reference image for each of the pairs of matched reflection and reference features; c) determining an epipolar line distance, d, of the matched reflection feature to said epipolar line; characterized in that the calibration method comprises d) evaluating the epipolar line distances, d, as a function of an image position (x,y) in the reference image thereby determining a geometric pattern; e) determining at least one correction for rotation and/or translation of the reflection image depending on the geometric pattern.