A wastewater treatment system comprising: a front end system including at least one resin tank configured to contain an ion exchange resin configured to target a particular metal, the at least one resin tank configured to receive an output from an oxidation reactor configured to receive a flow of wastewater from a wastewater producing process, the output from the oxidation reactor configured to be treated in the at least one resin tank, resulting in treated water and saturated resin in the at least one resin tank, the at least one resin tank configured to remove the treated water; and a central processing system configured to receive a saturated resin tank from the front end system, the central processing system configured to fluidize contents of the saturated resin tank to generate a slurry, the central processing system including a vacuum filter band system configured to receive the slurry from the saturated resin tank and to provide a cascading resin rinse to the slurry, the central processing system further including a metal specific purification system configured to receive a metal solution from the vacuum filter band system and allow the metal solution to flow through a plurality of purification units resulting in a metal-filled purification unit, wherein the metal specific purification system includes the plurality of purification units, the central processing system further including a repetitive stripping system configured to receive the metal-filled purification unit from the metal specific purification system to process the metal solution received from the vacuum filter band system, the repetitive stripping system further including a plurality of acid tanks configured to sequentially apply acid contained in the plurality of acid tanks to the metal-filled purification unit to generate a metal salt solution from the metal solution, wherein the repetitive stripping system includes the plurality of acid tanks. a front end system including at least one resin tank configured to contain an ion exchange resin configured to target a particular metal, the at least one resin tank configured to receive an output from an oxidation reactor configured to receive a flow of wastewater from a wastewater producing process, the output from the oxidation reactor configured to be treated in the at least one resin tank, resulting in treated water and saturated resin in the at least one resin tank, the at least one resin tank configured to remove the treated water; and a central processing system configured to receive a saturated resin tank from the front end system, the central processing system configured to fluidize contents of the saturated resin tank to generate a slurry, the central processing system including a vacuum filter band system configured to receive the slurry from the saturated resin tank and to provide a cascading resin rinse to the slurry, the central processing system further including a metal specific purification system configured to receive a metal solution from the vacuum filter band system and allow the metal solution to flow through a plurality of purification units resulting in a metal-filled purification unit, wherein the metal specific purification system includes the plurality of purification units, the central processing system further including a repetitive stripping system configured to receive the metal-filled purification unit from the metal specific purification system to process the metal solution received from the vacuum filter band system, the repetitive stripping system further including a plurality of acid tanks configured to sequentially apply acid contained in the plurality of acid tanks to the metal-filled purification unit to generate a metal salt solution from the metal solution, wherein the repetitive stripping system includes the plurality of acid tanks.