Electromechanical component (100; 200; 300; 400; 500; 600; 700; 800; 900; 1000) for deflecting a particle beam (250; 750; 850; 950), comprising: a first electrode (110; 210; 310; 410; 510; 610; 710; 810; 910; 1010); a second electrode (120; 220; 320; 420; 520; 620; 720; 820; 920; 1020); a substrate (240; 740; 840; 940; 1040); wherein the first electrode (110; 210; 310; 410; 510; 610; 710; 810; 910; 1010) and the second electrode (120; 220; 320; 420; 520; 620; 720; 820; 920; 1020) are located opposite one another at a distance; wherein the substrate (240; 740; 840; 940; 1040) comprises an opening (250; 750; 850; 950; 1050) in a region between the first electrode (110; 210; 310; 410; 510; 610; 710; 810; 910; 1010) and the second electrode (120; 220; 320; 420; 520; 620; 720; 820; 920; 1020); wherein the first electrode (110; 210; 310; 410; 510; 610; 710; 810; 910; 1010) and the second electrode (120; 220; 320; 420; 520; 620; 720; 820; 920; 1020) are arranged to generate a useful electrical field in the event of there being a potential difference between the first electrode (110; 210; 310; 410; 510; 610; 710; 810; 910; 1010) and the second electrode (120; 220; 320; 420; 520; 620; 720; 820; 920; 1020); and wherein the opening (250; 750; 850; 950; 1050) is configured to enable passage of the particle beam (250; 750; 850; 950) through the electromechanical component (100; 200; 300; 400; 500; 600; 700; 800; 900; 1000); wherein the first electrode (110; 210; 310; 410; 510; 610; 710; 810; 910; 1010) and the second electrode (120; 220; 320; 420; 520; 620; 720; 820; 920; 1020) are configured such that the useful electrical field is suited to influence the particle beam (250; 750; 850; 950); characterized by an elastically deformable proving structure (130; 230; 330; 430; 530; 630; 730; 830; 930; 1030); wherein the proving structure (130; 230; 330; 430; 530; 630; 730; 830; 930; 1030) is configured to be deflected in the event of there being a potential difference between the first electrode (110; 210; 310; 410; 510; 610; 710; 810; 910; 1010) and the second electrode (120; 220; 320; 420; 520; 620; 720; 820; 920; 1020). a first electrode (110; 210; 310; 410; 510; 610; 710; 810; 910; 1010); a second electrode (120; 220; 320; 420; 520; 620; 720; 820; 920; 1020); a substrate (240; 740; 840; 940; 1040); wherein the first electrode (110; 210; 310; 410; 510; 610; 710; 810; 910; 1010) and the second electrode (120; 220; 320; 420; 520; 620; 720; 820; 920; 1020) are located opposite one another at a distance; wherein the substrate (240; 740; 840; 940; 1040) comprises an opening (250; 750; 850; 950; 1050) in a region between the first electrode (110; 210; 310; 410; 510; 610; 710; 810; 910; 1010) and the second electrode (120; 220; 320; 420; 520; 620; 720; 820; 920; 1020); wherein the first electrode (110; 210; 310; 410; 510; 610; 710; 810; 910; 1010) and the second electrode (120; 220; 320; 420; 520; 620; 720; 820; 920; 1020) are arranged to generate a useful electrical field in the event of there being a potential difference between the first electrode (110; 210; 310; 410; 510; 610; 710; 810; 910; 1010) and the second electrode (120; 220; 320; 420; 520; 620; 720; 820; 920; 1020); and wherein the opening (250; 750; 850; 950; 1050) is configured to enable passage of the particle beam (250; 750; 850; 950) through the electromechanical component (100; 200; 300; 400; 500; 600; 700; 800; 900; 1000); wherein the first electrode (110; 210; 310; 410; 510; 610; 710; 810; 910; 1010) and the second electrode (120; 220; 320; 420; 520; 620; 720; 820; 920; 1020) are configured such that the useful electrical field is suited to influence the particle beam (250; 750; 850; 950); characterized by an elastically deformable proving structure (130; 230; 330; 430; 530; 630; 730; 830; 930; 1030); wherein the proving structure (130; 230; 330; 430; 530; 630; 730; 830; 930; 1030) is configured to be deflected in the event of there being a potential difference between the first electrode (110; 210; 310; 410; 510; 610; 710; 810; 910; 1010) and the second electrode (120; 220; 320; 420; 520; 620; 720; 820; 920; 1020).