An apparatus for processing a substrate, comprising: a planar stator; a first mover positioned on the planar stator; a second mover positioned on the planar stator, wherein the first and second movers are configured to move laterally and longitudinally over the planar stator in a horizontal plane independently of one another; a first substrate support coupled to the first mover and positionable to receive a substrate in a substrate loading position; a second substrate support coupled to the second mover and positionable to receive a substrate in the substrate loading position; a processing head configured to process a first substrate positioned on the first substrate support when the first substrate support is in a first substrate processing position, wherein the processing head is further configured to process a second substrate positioned on the second substrate support when the second substrate support is in a second substrate processing position, wherein the processing head is configured to deposit a patterned layer on the first and second substrates; and an inspection system configured to capture data regarding the position and orientation of the first substrate disposed on the first substrate support when the first substrate support is in the substrate loading position and to capture data regarding the position and orientation of the second substrate disposed on the second substrate support when the second substrate support is in the substrate loading position; wherein the apparatus is configured to move the first substrate support from the substrate support loading position to the first substrate processing position at least partially based on the data captured by the inspection system via the planar stator and the first mover and wherein the apparatus is configured to move the second substrate support from the substrate loading position to the second substrate processing position at least partially based on the data captured by the inspection system via the planar stator and the second mover. a planar stator; a first mover positioned on the planar stator; a second mover positioned on the planar stator, wherein the first and second movers are configured to move laterally and longitudinally over the planar stator in a horizontal plane independently of one another; a first substrate support coupled to the first mover and positionable to receive a substrate in a substrate loading position; a second substrate support coupled to the second mover and positionable to receive a substrate in the substrate loading position; a processing head configured to process a first substrate positioned on the first substrate support when the first substrate support is in a first substrate processing position, wherein the processing head is further configured to process a second substrate positioned on the second substrate support when the second substrate support is in a second substrate processing position, wherein the processing head is configured to deposit a patterned layer on the first and second substrates; and an inspection system configured to capture data regarding the position and orientation of the first substrate disposed on the first substrate support when the first substrate support is in the substrate loading position and to capture data regarding the position and orientation of the second substrate disposed on the second substrate support when the second substrate support is in the substrate loading position;