An exposure apparatus for exposing a substrate with light via liquid, the apparatus comprising: a stage that includes a substrate table for holding the substrate; and a liquid supply apparatus (11,12,13) for supplying liquid to form an immersion region on the substrate when held on the stage, the substrate table having: a plurality of support members that are provided on a base material and are arranged to support a rear surface of the substrate; a supply port that is formed on a substrate-facing surface of the base material for supplying gas to a space between the base material and the rear surface of the substrate when supported by the plurality of support members; a suction port that is formed on the substrate-facing surface of the base material for suctioning gas within the space; an outer circumferential wall that is provided on the base material to face the rear surface of the substrate when supported by the plurality of support members and to surround the plurality of support members, the supply port and the suction port; and an inner circumferential wall that is provided on the base material between the supply port and the suction port and is arranged with a gap between its upper surface and the rear surface of the substrate; characterised in that the suction port is arranged to suction gas within an enclosed space enclosed by the outer circumferential wall so as to generate a gas flow in a direction from a center of a rear surface of the substrate toward an outer edge of the substrate, so as to negatively pressurize the enclosed space, and the inner circumferential wall is arranged to restrict the gas flow from the supply port via the gap within the enclosed space so as not to be an obstacle to the negative pressurization of the enclosed space. a stage that includes a substrate table for holding the substrate; and a liquid supply apparatus (11,12,13) for supplying liquid to form an immersion region on the substrate when held on the stage, the substrate table having: a plurality of support members that are provided on a base material and are arranged to support a rear surface of the substrate; a supply port that is formed on a substrate-facing surface of the base material for supplying gas to a space between the base material and the rear surface of the substrate when supported by the plurality of support members; a suction port that is formed on the substrate-facing surface of the base material for suctioning gas within the space; an outer circumferential wall that is provided on the base material to face the rear surface of the substrate when supported by the plurality of support members and to surround the plurality of support members, the supply port and the suction port; and an inner circumferential wall that is provided on the base material between the supply port and the suction port and is arranged with a gap between its upper surface and the rear surface of the substrate; characterised in that the suction port is arranged to suction gas within an enclosed space enclosed by the outer circumferential wall so as to generate a gas flow in a direction from a center of a rear surface of the substrate toward an outer edge of the substrate, so as to negatively pressurize the enclosed space, and the inner circumferential wall is arranged to restrict the gas flow from the supply port via the gap within the enclosed space so as not to be an obstacle to the negative pressurization of the enclosed space. a plurality of support members that are provided on a base material and are arranged to support a rear surface of the substrate; a supply port that is formed on a substrate-facing surface of the base material for supplying gas to a space between the base material and the rear surface of the substrate when supported by the plurality of support members; a suction port that is formed on the substrate-facing surface of the base material for suctioning gas within the space; an outer circumferential wall that is provided on the base material to face the rear surface of the substrate when supported by the plurality of support members and to surround the plurality of support members, the supply port and the suction port; and an inner circumferential wall that is provided on the base material between the supply port and the suction port and is arranged with a gap between its upper surface and the rear surface of the substrate; characterised in that the suction port is arranged to suction gas within an enclosed space enclosed by the outer circumferential wall so as to generate a gas flow in a direction from a center of a rear surface of the substrate toward an outer edge of the substrate, so as to negatively pressurize the enclosed space, and the inner circumferential wall is arranged to restrict the gas flow from the supply port via the gap within the enclosed space so as not to be an obstacle to the negative pressurization of the enclosed space.