mhurhangee/ep-ind-claims huggingface dataset:
A showerhead for vacuum deposition of several species, said showerhead comprising a pre-chamber divided into several quarters containing each at least one outlet for said species, each of said quarter containing at least one species, wherein said pre-chamber communicates with at least one reservoir of said at least one species said showerhead comprising quarters containing the same species, wherein the quarters containing the same species communicate with a same reservoir, said showerhead comprising furthermore a homogenizing ring positioned between the quarters and said reservoir(s), to improve the pressure and flow uniformity of the gas species flowing into the quarters, wherein said homogenizing ring is connected to said quarters through a series of apertures evenly distributed either below the quarters or laterally.
A liquid discharging apparatus comprising: a supply flow path through which ink as liquid is supplied to a discharging unit from an accommodation portion of the ink; a sheet-like filter arranged in the supply flow path; a branch flow path provided between the filter and the discharging unit in the supply flow path; and a switching unit configured to perform switching to make the flowing liquid which has passed through a formation position of the filter flow whether to the discharging unit or to the branch flow path; a posture changing unit configured to change a posture of the filter and characterized in that the filter is inverted by rotation between a first posture in which a front surface of the filter is located at an upstream side in the flow direction of the liquid and a second posture in which a rear surface of the filter is located at the upstream side in the flow direction of the liquid. a supply flow path through which ink as liquid is supplied to a discharging unit from an accommodation portion of the ink; a sheet-like filter arranged in the supply flow path; a branch flow path provided between the filter and the discharging unit in the supply flow path; and a switching unit configured to perform switching to make the flowing liquid which has passed through a formation position of the filter flow whether to the discharging unit or to the branch flow path; a posture changing unit configured to change a posture of the filter and characterized in that the filter is inverted by rotation between a first posture in which a front surface of the filter is located at an upstream side in the flow direction of the liquid and a second posture in which a rear surface of the filter is located at the upstream side in the flow direction of the liquid.
A method performed on one or more computing systems for determining whether a media player application includes, or is operating in, one or more active modes, the method comprising: receiving an indication that a control that affects a media player application has been activated, wherein the control comprises one or more of a play control, a next track control or a previous track control; characterised in that the method comprises the steps of: identifying, by the one or more computing systems in response to the indication, one or more active modes of the application that cannot be made inactive by the control; and generating, on a display in response to identifying the one or more active modes that cannot be made inactive by the control, a graphical representation of the one or more active modes. receiving an indication that a control that affects a media player application has been activated, wherein the control comprises one or more of a play control, a next track control or a previous track control; characterised in that the method comprises the steps of: identifying, by the one or more computing systems in response to the indication, one or more active modes of the application that cannot be made inactive by the control; and generating, on a display in response to identifying the one or more active modes that cannot be made inactive by the control, a graphical representation of the one or more active modes. identifying, by the one or more computing systems in response to the indication, one or more active modes of the application that cannot be made inactive by the control; and generating, on a display in response to identifying the one or more active modes that cannot be made inactive by the control, a graphical representation of the one or more active modes.
Heat exchanger for gas, particularly for the exhaust gases of an engine, which comprises a plurality of parallel ducts disposed inside a casing and through which flow the gases to be cooled by heat exchange with a coolant fluid, characterized in that the casing comprises a series of protrusions stamped on its surface and directed towards the inside of the casing, such that said protrusions are disposed at a predetermined distance with respect to the assembly of ducts, thus guaranteeing a controlled expansion of the ducts before the pressure increases and in that the protrusions include at their end a flat surface intended to come into contact with a duct.
An infusion system comprising: a frame that carries a beta detector, a gamma detector, and a controller communicatively coupled to the beta detector and the gamma detector, wherein the frame is further configured to receive a strontium-rubidium radioisotope generator that generates a radioactive eluate via elution, the beta detector is positioned to measure beta emissions emitted from the radioactive eluate, the gamma detector is positioned to measure gamma emissions emitted from the radioactive eluate, and characterised in that the controller is configured to determine an activity of rubidium in the radioactive eluate based on the beta emissions measured by the beta detector and determine an activity of strontium in the radioactive eluate based on the gamma emissions measured by the gamma detector. a frame that carries a beta detector, a gamma detector, and a controller communicatively coupled to the beta detector and the gamma detector, wherein the frame is further configured to receive a strontium-rubidium radioisotope generator that generates a radioactive eluate via elution, the beta detector is positioned to measure beta emissions emitted from the radioactive eluate, the gamma detector is positioned to measure gamma emissions emitted from the radioactive eluate, and characterised in that the controller is configured to determine an activity of rubidium in the radioactive eluate based on the beta emissions measured by the beta detector and determine an activity of strontium in the radioactive eluate based on the gamma emissions measured by the gamma detector.
A deposition mask having a plurality of through-holes formed therein, comprising: a first surface and a second surface having the plurality of through-holes formed therein; a pair of long side surfaces connected to the first surface and the second surface, the pair of long side surfaces delimiting a profile of the deposition mask in a longitudinal direction of the deposition mask; and a pair of short side surfaces connected to the first surface and the second surface, the pair of short side surfaces delimiting a profile of the deposition mask in a width direction of the deposition mask; wherein: each of the long side surfaces includes a first portion that is recessed inside, the first portion having a first end portion positioned on the side of the first surface, and a second end portion positioned on the side of the second surface and positioned inside the first end portion; the through-hole includes a first recess formed on the side of the first surface, and a second recess formed on the side of the second surface and connected to the first recess through a hole connection portion; and the first end portion of the first portion of the long side surface is positioned closer to the first surface than the hole connection portion. a first surface and a second surface having the plurality of through-holes formed therein; a pair of long side surfaces connected to the first surface and the second surface, the pair of long side surfaces delimiting a profile of the deposition mask in a longitudinal direction of the deposition mask; and a pair of short side surfaces connected to the first surface and the second surface, the pair of short side surfaces delimiting a profile of the deposition mask in a width direction of the deposition mask; wherein: each of the long side surfaces includes a first portion that is recessed inside, the first portion having a first end portion positioned on the side of the first surface, and a second end portion positioned on the side of the second surface and positioned inside the first end portion; the through-hole includes a first recess formed on the side of the first surface, and a second recess formed on the side of the second surface and connected to the first recess through a hole connection portion; and the first end portion of the first portion of the long side surface is positioned closer to the first surface than the hole connection portion. each of the long side surfaces includes a first portion that is recessed inside, the first portion having a first end portion positioned on the side of the first surface, and a second end portion positioned on the side of the second surface and positioned inside the first end portion; the through-hole includes a first recess formed on the side of the first surface, and a second recess formed on the side of the second surface and connected to the first recess through a hole connection portion; and the first end portion of the first portion of the long side surface is positioned closer to the first surface than the hole connection portion.
An aftertreatment system with an exhaust gas sampling device, the aftertreatment system comprising a housing and configured to treat exhaust gas flowing therethrough, the exhaust gas sampling device comprising: an inlet passage configured to extract a portion of the exhaust gas from the aftertreatment system, an outlet passage being configured to reintroduce the portion of the exhaust gas back into the aftertreatment system; a sensor passage and a sensor, the sensor passage being positioned fluidly between the inlet passage and the outlet passage, the sensor being in fluid communication with the sensor passage and configured to provide a signal indicative of a property of the portion of the exhaust gas; and the inlet passage and the outlet passage are adapted to be at least partially positioned inside the housing of the aftertreatment system characterised in that an inlet opening (157, 165, 172) of the inlet passage is centered about a longitudinal axis of the housing and spaced from the periphery of the housing of the aftertreatment system. an inlet passage configured to extract a portion of the exhaust gas from the aftertreatment system, an outlet passage being configured to reintroduce the portion of the exhaust gas back into the aftertreatment system; a sensor passage and a sensor, the sensor passage being positioned fluidly between the inlet passage and the outlet passage, the sensor being in fluid communication with the sensor passage and configured to provide a signal indicative of a property of the portion of the exhaust gas; and the inlet passage and the outlet passage are adapted to be at least partially positioned inside the housing of the aftertreatment system characterised in that an inlet opening (157, 165, 172) of the inlet passage is centered about a longitudinal axis of the housing and spaced from the periphery of the housing of the aftertreatment system.
A feeding system, comprising: a plurality of material tanks, each of which has an air outlet; a plurality of blowers, having air inlets in communication with air outlets of the material tanks in one-to-one correspondence; a dust remover, having an air inlet; and a connecting pipe, having a first end in communication with the air inlet of the dust remover and a second end movably arranged between a first connection position and a second connection position, wherein, at the first connection position, the second end is connected with the air outlet of one of the plurality of blowers; at the second connection position, the second end is connected with the air outlet of another one of the plurality of blowers. a plurality of material tanks, each of which has an air outlet; a plurality of blowers, having air inlets in communication with air outlets of the material tanks in one-to-one correspondence; a dust remover, having an air inlet; and a connecting pipe, having a first end in communication with the air inlet of the dust remover and a second end movably arranged between a first connection position and a second connection position, wherein, at the first connection position, the second end is connected with the air outlet of one of the plurality of blowers; at the second connection position, the second end is connected with the air outlet of another one of the plurality of blowers.
A low emissivity coating, comprising: a plurality of phase adjustment layers (40, 50, 62), wherein the phase adjustment layers (40, 50, 62) comprise a dielectric or semiconductor material; a first metal functional layer; and a second metal functional layer located over and spaced from the first metal functional layer, wherein the first metal functional layer has a geometric thickness in the range of 6 nm to 8 nm; wherein the second metal functional layer has a geometric thickness in the range of 8 nm to 10 nm; wherein the metal functional layers (46, 58) comprise a material selected from the group consisting of silver, gold, platinum, palladium, osmium, iridium, rhodium, ruthenium, copper, rhenium, aluminum, and combinations thereof; and wherein the low emissivity coating provides a reference IGU SHGC of at least 0.4 and a reference IGU U factor of no greater than 2.27 W/(m 2 ·K) (0.4 BTU/hr-ft 2 -°F). a plurality of phase adjustment layers (40, 50, 62), wherein the phase adjustment layers (40, 50, 62) comprise a dielectric or semiconductor material; a first metal functional layer; and a second metal functional layer located over and spaced from the first metal functional layer, wherein the first metal functional layer has a geometric thickness in the range of 6 nm to 8 nm; wherein the second metal functional layer has a geometric thickness in the range of 8 nm to 10 nm; wherein the metal functional layers (46, 58) comprise a material selected from the group consisting of silver, gold, platinum, palladium, osmium, iridium, rhodium, ruthenium, copper, rhenium, aluminum, and combinations thereof; and wherein the low emissivity coating provides a reference IGU SHGC of at least 0.4 and a reference IGU U factor of no greater than 2.27 W/(m 2 ·K) (0.4 BTU/hr-ft 2 -°F).
Swimming pool aerator being intended for use in swimming pools equipped with a water recirculation circuit, said swimming pool aerator comprising a spray body with a Venturi tube channel and an atmospheric air intake pipe for intake of air from above the pool, whereby said spray body consists of a frustoconical plastic tube, provided at the smaller diameter end with a connecting means to a recirculating water outlet in the pool, below the pool water level, the other end, of larger diameter, being free for the jet outlet of the aspirated air together with the recirculated water, in the pool water, the axis of the frustoconical plastic tube being inclined at an angle (a) between 10 - 20 degrees to the perpendicular to the base plane of the connecting means, and in the first third of the length of the spray body from the end with the connecting means, said spray body being provided with a cylindrical branch also acting as guide, in which the lower end of the air intake pipe has been inserted by sliding until it reaches the inner wall of the tube.
Method for disassembling a pipe mount, wherein the pipe mount has a housing which comprises a shell and a first end plate fastened to the shell on a first end side of the housing, characterized in that the pipe mount comprises a second end plate attached to the shell on a second side of the housing lying opposite the first end side, wherein a spring and an axially movable spring collar are arranged within the housing, wherein the spring bears firstly against the spring collar and secondly against the second end plate and is compressed as a result in such a way that the spring exerts a spring force on the spring collar in the direction of the first end plate, wherein a stop element is arranged between the first end plate and the spring collar, which limits the axial movement of the spring collar in such a way that the spring is compressed when the spring collar bears against the stop element, and wherein the method comprises the following steps: a) exerting a force on the spring collar by way of a force-generating device, which force counteracts the spring force generated by the spring, b) removing the stop element while the force generated by the force-generating device on the spring collar is at least as great as the spring force generated by the spring, c) reducing the force generated by the force-generating device on the spring collar to an amount below the spring force generated by the spring, d) opening the housing, and e) removing the spring and the spring collar from the housing. a) exerting a force on the spring collar by way of a force-generating device, which force counteracts the spring force generated by the spring, b) removing the stop element while the force generated by the force-generating device on the spring collar is at least as great as the spring force generated by the spring, c) reducing the force generated by the force-generating device on the spring collar to an amount below the spring force generated by the spring, d) opening the housing, and e) removing the spring and the spring collar from the housing.
Use of a lubricating oil composition for lubricating a refrigerating machine, the lubricating oil composition comprising a lubricant base oil, a 3,4,5-trihydroxybenzoic acid C2-12 alkyl ester at 5-500 ppm by mass, and a phosphorus compound at 0.001-10.0% by mass, based on the total mass of the lubricating oil composition, wherein the phosphorus compound is at least one compound selected from the group consisting of phosphoric acid esters, acidic phosphoric acid esters, thiophosphoric acid esters, acidic phosphoric acid ester amine salts, chlorinated phosphoric acid ester and phosphorous acid esters, wherein the lubricant base oil consists of at least one polar oxygen-containing compound. a lubricant base oil, a 3,4,5-trihydroxybenzoic acid C2-12 alkyl ester at 5-500 ppm by mass, and a phosphorus compound at 0.001-10.0% by mass, based on the total mass of the lubricating oil composition, wherein the phosphorus compound is at least one compound selected from the group consisting of phosphoric acid esters, acidic phosphoric acid esters, thiophosphoric acid esters, acidic phosphoric acid ester amine salts, chlorinated phosphoric acid ester and phosphorous acid esters, wherein the lubricant base oil consists of at least one polar oxygen-containing compound.
A method for forming an edge-chamfered substrate with a buried insulating layer, characterised in that, the method comprises the following steps of: providing a first substrate for forming a top semiconductor layer of the substrate with the buried insulating layer; forming an etching mask layer on the surface of the first substrate; chamfering the first substrate and the etching mask layer on the surface of the first substrate by edge grinding; by spin etching, etching the first substrate which is exposed by the edge grinding on the etching mask layer; providing a second substrate for forming a handle layer of the substrate with the buried insulating layer; and bonding the first substrate to the second substrate via the buried insulating layer, wherein the edge-grinded surface of the first substrate faces the second substrate. providing a first substrate for forming a top semiconductor layer of the substrate with the buried insulating layer; forming an etching mask layer on the surface of the first substrate; chamfering the first substrate and the etching mask layer on the surface of the first substrate by edge grinding; by spin etching, etching the first substrate which is exposed by the edge grinding on the etching mask layer; providing a second substrate for forming a handle layer of the substrate with the buried insulating layer; and bonding the first substrate to the second substrate via the buried insulating layer, wherein the edge-grinded surface of the first substrate faces the second substrate.
A polyethylene blend-composition suitable for blown film comprising the melt blending product of: from 0.5 to 5 percent by weight of a high density polyethylene having a density in the range of from 0.950 to 0.970 g/cm 3, and a melt flow rate (I 2) in the range of from less than 0.5 g/10 minutes, and a molecular weight distribution (M w /M n) in the range of from 10 to 40, and M z in the range of from 800,000 to 5,000,000 g/mol; 90 percent or greater by weight of a linear low density polyethylene having a density in the range of from 0.910 to 0.950 g/cm 3, and a melt index (I 2) in the range of from 0.1 to less than or equal to 5 g/10 minutes; optionally a hydrotalcite based neutralizing agent; optionally one or more nucleating agents; and optionally one or more antioxidants. from 0.5 to 5 percent by weight of a high density polyethylene having a density in the range of from 0.950 to 0.970 g/cm 3, and a melt flow rate (I 2) in the range of from less than 0.5 g/10 minutes, and a molecular weight distribution (M w /M n) in the range of from 10 to 40, and M z in the range of from 800,000 to 5,000,000 g/mol; 90 percent or greater by weight of a linear low density polyethylene having a density in the range of from 0.910 to 0.950 g/cm 3, and a melt index (I 2) in the range of from 0.1 to less than or equal to 5 g/10 minutes; optionally a hydrotalcite based neutralizing agent; optionally one or more nucleating agents; and optionally one or more antioxidants.