A chemical vapor deposition apparatus comprising: a reaction chamber in which deposition materials are housed; a gas supply tube provided in the reaction chamber; a rotary drive device that rotates the gas supply tube about a rotation axis of the gas supply tube in the reaction chamber, and a rotary gas introduction part that is connected to the rotary drive device through a coupling, wherein an inside of the gas supply tube is divided into a first gas flowing section and a second gas flowing section, both of which extend along with the rotation axis, a first gas ejection port, which ejects a first gas flowing in the first gas flowing section into the reaction chamber, and a second gas ejection port, which ejects a second gas flowing in the second gas flowing section into the reaction chamber, are provided adjoiningly on a tube wall of the gas supply tube in a circumferential direction of the rotation axis, the first gas ejection port and the second gas ejection port form a pair in a plane, a normal line of which corresponds to the rotation axis, and the rotary gas introduction part comprises a first through hole and a second through hole, each of which passes through a side wall of the rotary gas introduction part, the first through hole being located at a position closer to the gas supply tube than the second through hole in a direction of the rotation axis, the rotary gas introduction part further comprises a sealing that is provided between the first through hole and the second through hole in the direction of the rotation axis, the sealing, the first through hole and the second through hole being provided and being configured to separate a first raw material gas group A flowing into the first through hole and a second raw material gas group B flowing into the second through hole, and a partition (105a,135) is provided in an inside of the rotary gas introduction part, the partition (105a,135) being configured such that the first raw material gas group A and the second raw material gas group B are separately introduced to the first gas flowing section and the second gas flowing section, respectively. a reaction chamber in which deposition materials are housed; a gas supply tube provided in the reaction chamber; a rotary drive device that rotates the gas supply tube about a rotation axis of the gas supply tube in the reaction chamber, and a rotary gas introduction part that is connected to the rotary drive device through a coupling, wherein an inside of the gas supply tube is divided into a first gas flowing section and a second gas flowing section, both of which extend along with the rotation axis, a first gas ejection port, which ejects a first gas flowing in the first gas flowing section into the reaction chamber, and a second gas ejection port, which ejects a second gas flowing in the second gas flowing section into the reaction chamber, are provided adjoiningly on a tube wall of the gas supply tube in a circumferential direction of the rotation axis, the first gas ejection port and the second gas ejection port form a pair in a plane, a normal line of which corresponds to the rotation axis, and the rotary gas introduction part comprises a first through hole and a second through hole, each of which passes through a side wall of the rotary gas introduction part, the first through hole being located at a position closer to the gas supply tube than the second through hole in a direction of the rotation axis, the rotary gas introduction part further comprises a sealing that is provided between the first through hole and the second through hole in the direction of the rotation axis, the sealing, the first through hole and the second through hole being provided and being configured to separate a first raw material gas group A flowing into the first through hole and a second raw material gas group B flowing into the second through hole, and a partition (105a,135) is provided in an inside of the rotary gas introduction part, the partition (105a,135) being configured such that the first raw material gas group A and the second raw material gas group B are separately introduced to the first gas flowing section and the second gas flowing section, respectively. the rotary gas introduction part further comprises a sealing that is provided between the first through hole and the second through hole in the direction of the rotation axis, the sealing, the first through hole and the second through hole being provided and being configured to separate a first raw material gas group A flowing into the first through hole and a second raw material gas group B flowing into the second through hole, and a partition (105a,135) is provided in an inside of the rotary gas introduction part, the partition (105a,135) being configured such that the first raw material gas group A and the second raw material gas group B are separately introduced to the first gas flowing section and the second gas flowing section, respectively.