A sample processing apparatus, comprising: a sample stage having an opening and configured to support a sample support such that the sample support covers the opening; a first stage configured to move along a first axis; a second stage configured to move alternately toward and away from the opening along a second axis orthogonal to the first axis, the second stage coupled to the first stage wherein the second stage is movable with the first stage along the first axis; a plurality of heater elements disposed on the second stage and linearly positioned along a third axis orthogonal to the first axis and the second axis; and a plurality of magnets disposed on the second stage and linearly positioned along the third axis, wherein: the first stage is configured to sequentially move the heater elements and the magnets to a plurality of column positions (C1-C12) along the first axis, wherein at each column position, at least the heater elements or the magnets are aligned with a column of sample containers of the sample support when the sample support is mounted to the sample stage, the column being arranged along the third axis; and the second stage is configured to, at each column position, move the heater elements and the magnets between an upper position at which the heater elements and the magnets are proximate to the sample support when the sample support is mounted to the sample stage, and a lower position at which the heater elements and the magnets are remote from the sample support, characterized in that the magnets are positioned adjacent to the heater elements such that each magnet is spaced from a respective one of the heater elements along the first axis. a sample stage having an opening and configured to support a sample support such that the sample support covers the opening; a first stage configured to move along a first axis; a second stage configured to move alternately toward and away from the opening along a second axis orthogonal to the first axis, the second stage coupled to the first stage wherein the second stage is movable with the first stage along the first axis; a plurality of heater elements disposed on the second stage and linearly positioned along a third axis orthogonal to the first axis and the second axis; and a plurality of magnets disposed on the second stage and linearly positioned along the third axis, wherein: the first stage is configured to sequentially move the heater elements and the magnets to a plurality of column positions (C1-C12) along the first axis, wherein at each column position, at least the heater elements or the magnets are aligned with a column of sample containers of the sample support when the sample support is mounted to the sample stage, the column being arranged along the third axis; and the second stage is configured to, at each column position, move the heater elements and the magnets between an upper position at which the heater elements and the magnets are proximate to the sample support when the sample support is mounted to the sample stage, and a lower position at which the heater elements and the magnets are remote from the sample support, characterized in that the magnets are positioned adjacent to the heater elements such that each magnet is spaced from a respective one of the heater elements along the first axis. the first stage is configured to sequentially move the heater elements and the magnets to a plurality of column positions (C1-C12) along the first axis, wherein at each column position, at least the heater elements or the magnets are aligned with a column of sample containers of the sample support when the sample support is mounted to the sample stage, the column being arranged along the third axis; and the second stage is configured to, at each column position, move the heater elements and the magnets between an upper position at which the heater elements and the magnets are proximate to the sample support when the sample support is mounted to the sample stage, and a lower position at which the heater elements and the magnets are remote from the sample support, characterized in that the magnets are positioned adjacent to the heater elements such that each magnet is spaced from a respective one of the heater elements along the first axis.