Method for creating a flexible, multistable element by the following series of operations: - there is made a blank of a single-piece silicon component including, on the one hand, at least one flexible beam intended to form a flexible, multistable blade between two ends (E1, E2), and on the other hand, at least one rigid mass (M; M1; M2) of greater mass than any said flexible beam and having a larger cross-section at every point than that of any said flexible beam and any said rigid mass (M; M1; M2) intended to form a more rigid structure than any said flexible, multistable blade, and so that at least one said flexible beam having an initial curvilinear length extends between a first said rigid mass at a first said end and a second said rigid mass at a second said end, said first and second ends (E1, E2) being formed by the boundary of the area of smallest cross-section of said flexible beam with the area of largest cross-section of said rigid mass (M; M1; M2), and being separated by an initial distance less than or equal to said initial curvilinear length, and said first rigid mass and said second rigid mass forming together a rigid frame which is also a said rigid mass; - said component is subjected, in a furnace, to a silicon dioxide SiO 2 growth method by maintaining a temperature of 1100°C for several hours; - said duration of several hours is adjusted to obtain a cross-section of silicon dioxide SiO 2 which is greater on any said rigid mass (M; M1; M2) than that on any said flexible beam; - cooling is performed to ambient temperature, around 20°C, so as to deform by buckling at least said flexible beam having an initial curvilinear length during the cooling of said first rigid mass and of said second rigid mass whose contraction during cooling is greater than the contraction of said beam, so that the final distance between said first and second ends (E1, E2) is strictly less than the final curvilinear length of said flexible beam having an initial curvilinear length, and so that said final curvilinear length is greater than or equal to said initial curvilinear length. - there is made a blank of a single-piece silicon component including, on the one hand, at least one flexible beam intended to form a flexible, multistable blade between two ends (E1, E2), and on the other hand, at least one rigid mass (M; M1; M2) of greater mass than any said flexible beam and having a larger cross-section at every point than that of any said flexible beam and any said rigid mass (M; M1; M2) intended to form a more rigid structure than any said flexible, multistable blade, and so that at least one said flexible beam having an initial curvilinear length extends between a first said rigid mass at a first said end and a second said rigid mass at a second said end, said first and second ends (E1, E2) being formed by the boundary of the area of smallest cross-section of said flexible beam with the area of largest cross-section of said rigid mass (M; M1; M2), and being separated by an initial distance less than or equal to said initial curvilinear length, and said first rigid mass and said second rigid mass forming together a rigid frame which is also a said rigid mass; - said component is subjected, in a furnace, to a silicon dioxide SiO 2 growth method by maintaining a temperature of 1100°C for several hours; - said duration of several hours is adjusted to obtain a cross-section of silicon dioxide SiO 2 which is greater on any said rigid mass (M; M1; M2) than that on any said flexible beam; - cooling is performed to ambient temperature, around 20°C, so as to deform by buckling at least said flexible beam having an initial curvilinear length during the cooling of said first rigid mass and of said second rigid mass whose contraction during cooling is greater than the contraction of said beam, so that the final distance between said first and second ends (E1, E2) is strictly less than the final curvilinear length of said flexible beam having an initial curvilinear length, and so that said final curvilinear length is greater than or equal to said initial curvilinear length.