Method for correcting a light pattern provided by a first lighting device and a second lighting device; wherein the first lighting device comprises a plurality of light sources and projects a first light pattern; the second lighting device comprises a plurality of light sources and projects a second light pattern, wherein each of lighting devices (1, 2) comprises a matrix arrangement of solid-state light sources, with columns and rows; there is an overlapping zone between the first light pattern and the second light pattern, characterized in that the method comprises the steps of for each lighting device (1, 2), dividing the light sources in groups, each group being associated to a projection distance; calculating an overlapping region as a function of the projection distance (Dp); calculating a number of affected light sources for each group as a function of a representative dimension of the overlapping region, wherein, for each lighting device, the first affected light source is the affected light source which is closest to the other lighting device and the last affected light source is the affected light source which is farthest to the other lighting device; attenuate the intensity of the light emitted by the affected light sources in each group of each lighting device, following a monotonic attenuation pattern from 100% attenuation in the first affected light source to 0% in the last affected light source; and wherein the step of attenuation is symmetrical in both lighting devices (1, 2), in such a way that the attenuation in the first affected light source of one lighting device is the same as the attenuation in the first affected light source of the other lighting device, and the attenuation pattern is the same from the first affected light source to the last affected light source in both lighting devices. the first lighting device comprises a plurality of light sources and projects a first light pattern; the second lighting device comprises a plurality of light sources and projects a second light pattern, wherein each of lighting devices (1, 2) comprises a matrix arrangement of solid-state light sources, with columns and rows; there is an overlapping zone between the first light pattern and the second light pattern, characterized in that the method comprises the steps of for each lighting device (1, 2), dividing the light sources in groups, each group being associated to a projection distance; calculating an overlapping region as a function of the projection distance (Dp); calculating a number of affected light sources for each group as a function of a representative dimension of the overlapping region, wherein, for each lighting device, the first affected light source is the affected light source which is closest to the other lighting device and the last affected light source is the affected light source which is farthest to the other lighting device; attenuate the intensity of the light emitted by the affected light sources in each group of each lighting device, following a monotonic attenuation pattern from 100% attenuation in the first affected light source to 0% in the last affected light source; and wherein the step of attenuation is symmetrical in both lighting devices (1, 2), in such a way that the attenuation in the first affected light source of one lighting device is the same as the attenuation in the first affected light source of the other lighting device, and the attenuation pattern is the same from the first affected light source to the last affected light source in both lighting devices. for each lighting device (1, 2), dividing the light sources in groups, each group being associated to a projection distance; calculating an overlapping region as a function of the projection distance (Dp); calculating a number of affected light sources for each group as a function of a representative dimension of the overlapping region, wherein, for each lighting device, the first affected light source is the affected light source which is closest to the other lighting device and the last affected light source is the affected light source which is farthest to the other lighting device; attenuate the intensity of the light emitted by the affected light sources in each group of each lighting device, following a monotonic attenuation pattern from 100% attenuation in the first affected light source to 0% in the last affected light source; and wherein the step of attenuation is symmetrical in both lighting devices (1, 2), in such a way that the attenuation in the first affected light source of one lighting device is the same as the attenuation in the first affected light source of the other lighting device, and the attenuation pattern is the same from the first affected light source to the last affected light source in both lighting devices.