An electroluminescent display device comprising: a substrate having an active area, and a bezel area disposed outside the active area, wherein the bezel area includes a bending area, a link area between the active area and the bending area, and a pad area adjacent to the bending area; a gate insulation layer disposed on the substrate in the active area, the link area and the pad area, but not in the bending area; a first portion of a planarization layer disposed in the active area, and at least partially covering a first signal line extended from the active area to the link area; a second portion of the planarization layer disposed in the bending area and formed at a time of forming the first portion of the planarization layer; wherein the planarization layer is made of organic insulation material, first and second touch electrodes (Tx, Rx) disposed to cross over each other on an encapsulation layer above the first portion of the planarization layer with a first organic insulation layer disposed between the first and second touch electrodes (Tx, Rx); a first signal line link pattern connected to the first signal line in the link area and extending to the bending area and disposed directly on the second portion of the planarization layer in the bending area; and second and third signal lines (TW, RW) connected to the first and second touch electrodes (Tx, Rx) respectively, the second and third signal lines (TW, RW) extending from the link area to the bending area and arranged directly on the second portion of the planarization layer in parallel with the first signal line link pattern in the bending area, wherein the first organic insulation layer covers the first touch electrode (Tx) in the active area, the first signal line extended from the active area in the link area, the second signal line, and the third signal line, and wherein the first organic insulation layer is disposed directly on the first signal line link pattern, the second signal line and the third signal line in the bending area. a substrate having an active area, and a bezel area disposed outside the active area, wherein the bezel area includes a bending area, a link area between the active area and the bending area, and a pad area adjacent to the bending area; a gate insulation layer disposed on the substrate in the active area, the link area and the pad area, but not in the bending area; a first portion of a planarization layer disposed in the active area, and at least partially covering a first signal line extended from the active area to the link area; a second portion of the planarization layer disposed in the bending area and formed at a time of forming the first portion of the planarization layer; wherein the planarization layer is made of organic insulation material, first and second touch electrodes (Tx, Rx) disposed to cross over each other on an encapsulation layer above the first portion of the planarization layer with a first organic insulation layer disposed between the first and second touch electrodes (Tx, Rx); a first signal line link pattern connected to the first signal line in the link area and extending to the bending area and disposed directly on the second portion of the planarization layer in the bending area; and second and third signal lines (TW, RW) connected to the first and second touch electrodes (Tx, Rx) respectively, the second and third signal lines (TW, RW) extending from the link area to the bending area and arranged directly on the second portion of the planarization layer in parallel with the first signal line link pattern in the bending area, wherein the first organic insulation layer covers the first touch electrode (Tx) in the active area, the first signal line extended from the active area in the link area, the second signal line, and the third signal line, and wherein the first organic insulation layer is disposed directly on the first signal line link pattern, the second signal line and the third signal line in the bending area.