A chemically amplified negative resist composition comprising a silicone structure-bearing polymer comprising recurring units of the general formula and having a weight average molecular weight of 3,000 to 500,000, wherein R 1 to R 4 are each independently a monovalent C 1 -C 8 hydrocarbon group, m is an integer of 1 to 100, a, b, c and d are each independently 0 or a positive number, a+b > 0, and a+b+c+d = 1, X is a divalent organic group having the general formula: wherein W is a divalent organic group selected from the following: n is 0 or 1, R 5 and R 6 are each independently a C 1 -C 4 alkyl or alkoxy group, k is independently 0, 1 or 2, Y is a divalent organic group having the general formula: wherein V is a divalent organic group selected from the following: p is 0 or 1, R 7 and R 8 are each independently a C 1 -C 4 alkyl or alkoxy group, h is independently 0, 1 or 2, at least one compound selected from polyhydric phenols having at least three hydroxyl groups as represented by the general formulae (4-A) to (4-E): wherein R 100 to R 125 are each independently hydrogen, hydroxyl, alkyl, cycloalkyl or aromatic group, which may be halo-substituted, at least three of R 100 to R 125 are hydroxyl, R 126 is hydrogen, hydroxyl, alkyl, cycloalkyl or aromatic group, which may be halo-substituted, Q 1 is a structure selected from the following: wherein R 127 and R 128 are each independently hydrogen, alkyl, cycloalkyl or aromatic group, which may be halo-substituted, q is 0 or 1, Q 2 is a structure selected from the following: and Q 3 is a structure selected from the following: a photoacid generator which is decomposed to generate an acid upon exposure to radiation of wavelength 190 to 500 nm, and a solvent. a silicone structure-bearing polymer comprising recurring units of the general formula and having a weight average molecular weight of 3,000 to 500,000, wherein R 1 to R 4 are each independently a monovalent C 1 -C 8 hydrocarbon group, m is an integer of 1 to 100, a, b, c and d are each independently 0 or a positive number, a+b > 0, and a+b+c+d = 1, X is a divalent organic group having the general formula: wherein W is a divalent organic group selected from the following: n is 0 or 1, R 5 and R 6 are each independently a C 1 -C 4 alkyl or alkoxy group, k is independently 0, 1 or 2, Y is a divalent organic group having the general formula: wherein V is a divalent organic group selected from the following: p is 0 or 1, R 7 and R 8 are each independently a C 1 -C 4 alkyl or alkoxy group, h is independently 0, 1 or 2, at least one compound selected from polyhydric phenols having at least three hydroxyl groups as represented by the general formulae (4-A) to (4-E): wherein R 100 to R 125 are each independently hydrogen, hydroxyl, alkyl, cycloalkyl or aromatic group, which may be halo-substituted, at least three of R 100 to R 125 are hydroxyl, R 126 is hydrogen, hydroxyl, alkyl, cycloalkyl or aromatic group, which may be halo-substituted, Q 1 is a structure selected from the following: wherein R 127 and R 128 are each independently hydrogen, alkyl, cycloalkyl or aromatic group, which may be halo-substituted, q is 0 or 1, Q 2 is a structure selected from the following: and Q 3 is a structure selected from the following: a photoacid generator which is decomposed to generate an acid upon exposure to radiation of wavelength 190 to 500 nm, and a solvent.