An etching composition for texturing a crystalline silicon wafer, comprising, based on a total amount of the composition: 0.1 to 20 wt% of an alkaline compound wherein the alkaline compound is one or more selected from the group consisting of potassium hydroxide, sodium hydroxide, ammonium hydroxide, tetrahydroxymethyl ammonium, and tetrahydroxyethyl ammonium; 0.1 to 50 wt% of a cyclic compound having a boiling point of 100°C or more; 0.00001 to 10 wt% of a silica-containing compound; and the remainder being residual water such that the total amount of the composition is 100 wt%; wherein the cyclic compound having a boiling point of 100 °C or more is one or more selected from the group consisting of piperazine, N-methylpiperazine, N-ethylpiperazine, hydroxyethylpiperazine, N-(2-aminoethyl)piperazine, N,N'-dimethylpiperazine, morpholine, N-methylmorpholine, N-ethylmorpholine, N-phenylmorpholine, N-cocomorpholine, N-(2-aminoethyl)morpholine, N-(2-cyanoethyl)morpholine, N-(2-hydroxyethyl)morpholine, N-(2-hydroxypropyl)morpholine, N-acetylmorpholine, N-formylmorpholine, N-methymorpholine-N-oxide, picoline, N-methylpiperidine, 3,5-dimethylpiperidine, N-ethylpiperidine, N-(2-hydroxyethyl)piperidine, N-methyl-4-piperidone, N-vinyl-2-piperidone, N-methylpyrrolidine, N-methylpyrrolidone, N-ethyl-2-pyrrolidone, N-isopropyl-2-pyrrolidone, N-butyl-2-pyrrolidone, N-tert-butyl-2-pyrrolidone, N-hexyl-2-pyrrolidone, N-octyl-2-pyrrolidone, N-benzyl-2-pyrrolidone, N-cyclohexyl-2-pyrrolidone, N-vinly-2-pyrrolidone, N-(2-hydroxyethyl)-2-pyrrolidone, N-(2-methoxyethyl)-2-pyrrolidone, N-(2-methoxypropyl)-2-pyrrolidone, N-(2-ethoxyethyl)-2-pyrrolidone, N-methylimidazolidinone, dimethylimidazolidinone, N-(2-hydroxyethyl)-ethyleneurea, N-methylaniline, N-ethylaniline, N,N-dimethylaniline, N-(2-hydroxyethyl)aniline, N,N-bis-(2-hydroxyethyl)aniline, N-ethyl-N-(2-hydroxyethyl)aniline, N,N-diethyl-o-toluidine, N-ethyl-N-(2-hydroxyethyl)-m-toluidine, dimethylbenzylamine, γ-butyrolactone, tolyltriazole, 1,2,3-benzotriazole, 1,2,3-triazole, 1,2,4-triazole, 3-amino-1,2,4-triazole, 4-amino-4H-1,2,4-triazole, 1-hydroxybenzotriazole, 1-methylbenzotriazole, 2-methylbenzotriazole, 5-methylbenzotriazole, benzotriazole-5-carbonate, and nitrobenzotriazole, and wherein the silica-containing compound is one or more selected from the group consisting of liquid sodium silicate; liquid potassium silicate; and liquid lithium silicate. 0.1 to 20 wt% of an alkaline compound wherein the alkaline compound is one or more selected from the group consisting of potassium hydroxide, sodium hydroxide, ammonium hydroxide, tetrahydroxymethyl ammonium, and tetrahydroxyethyl ammonium; 0.1 to 50 wt% of a cyclic compound having a boiling point of 100°C or more; 0.00001 to 10 wt% of a silica-containing compound; and the remainder being residual water such that the total amount of the composition is 100 wt%; wherein the cyclic compound having a boiling point of 100 °C or more is one or more selected from the group consisting of piperazine, N-methylpiperazine, N-ethylpiperazine, hydroxyethylpiperazine, N-(2-aminoethyl)piperazine, N,N'-dimethylpiperazine, morpholine, N-methylmorpholine, N-ethylmorpholine, N-phenylmorpholine, N-cocomorpholine, N-(2-aminoethyl)morpholine, N-(2-cyanoethyl)morpholine, N-(2-hydroxyethyl)morpholine, N-(2-hydroxypropyl)morpholine, N-acetylmorpholine, N-formylmorpholine, N-methymorpholine-N-oxide, picoline, N-methylpiperidine, 3,5-dimethylpiperidine, N-ethylpiperidine, N-(2-hydroxyethyl)piperidine, N-methyl-4-piperidone, N-vinyl-2-piperidone, N-methylpyrrolidine, N-methylpyrrolidone, N-ethyl-2-pyrrolidone, N-isopropyl-2-pyrrolidone, N-butyl-2-pyrrolidone, N-tert-butyl-2-pyrrolidone, N-hexyl-2-pyrrolidone, N-octyl-2-pyrrolidone, N-benzyl-2-pyrrolidone, N-cyclohexyl-2-pyrrolidone, N-vinly-2-pyrrolidone, N-(2-hydroxyethyl)-2-pyrrolidone, N-(2-methoxyethyl)-2-pyrrolidone, N-(2-methoxypropyl)-2-pyrrolidone, N-(2-ethoxyethyl)-2-pyrrolidone, N-methylimidazolidinone, dimethylimidazolidinone, N-(2-hydroxyethyl)-ethyleneurea, N-methylaniline, N-ethylaniline, N,N-dimethylaniline, N-(2-hydroxyethyl)aniline, N,N-bis-(2-hydroxyethyl)aniline, N-ethyl-N-(2-hydroxyethyl)aniline, N,N-diethyl-o-toluidine, N-ethyl-N-(2-hydroxyethyl)-m-toluidine, dimethylbenzylamine, γ-butyrolactone, tolyltriazole, 1,2,3-benzotriazole, 1,2,3-triazole, 1,2,4-triazole, 3-amino-1,2,4-triazole, 4-amino-4H-1,2,4-triazole, 1-hydroxybenzotriazole, 1-methylbenzotriazole, 2-methylbenzotriazole, 5-methylbenzotriazole, benzotriazole-5-carbonate, and nitrobenzotriazole, and wherein the silica-containing compound is one or more selected from the group consisting of liquid sodium silicate; liquid potassium silicate; and liquid lithium silicate.