A cleaning system for cleaning a photoconductive surface from particles and excess fluid, the photoconductive surface moving relative to the cleaning system, the cleaning system comprising: at least two wiper blades comprising a first wiper blade and a second wiper blade; the first wiper blade to contact the photoconductive surface and to wipe at least some of the particles and at least some of the excess fluid from the photoconductive surface, the first wiper blade being attached to a first support having first and second arms (18a, 18b), the first wiper blade having a first free portion extending beyond the first and second arms (18a, 18b) of the first support towards the photoconductive surface; and the second wiper blade to contact the photoconductive surface and to wipe at least some of the particles and at least some of the excess fluid that have passed the first wiper blade, from the photoconductive surface, the second wiper blade being attached to a second support having first and second arms (24a, 24b), the second wiper blade having second free portion extending beyond the first and second arms (24a, 24b) of the second support towards the photoconductive surface, characterised in that the first free portion of the first wiper blade is longer than the second free portion of the second wiper blade, so that the second wiper blade contacts the photoconductive surface with a second predetermined pressing force that is higher than a first predetermined pressing force with which the first wiper blade contacts the photoconductive surface; wherein the length of the first free portion of the first wiper blade is in the range of 10 to 13 mm, and the length of the second free portion of the second wiper blade is in the range of 5 to 7 mm. at least two wiper blades comprising a first wiper blade and a second wiper blade; the first wiper blade to contact the photoconductive surface and to wipe at least some of the particles and at least some of the excess fluid from the photoconductive surface, the first wiper blade being attached to a first support having first and second arms (18a, 18b), the first wiper blade having a first free portion extending beyond the first and second arms (18a, 18b) of the first support towards the photoconductive surface; and the second wiper blade to contact the photoconductive surface and to wipe at least some of the particles and at least some of the excess fluid that have passed the first wiper blade, from the photoconductive surface, the second wiper blade being attached to a second support having first and second arms (24a, 24b), the second wiper blade having second free portion extending beyond the first and second arms (24a, 24b) of the second support towards the photoconductive surface, characterised in that the first free portion of the first wiper blade is longer than the second free portion of the second wiper blade, so that the second wiper blade contacts the photoconductive surface with a second predetermined pressing force that is higher than a first predetermined pressing force with which the first wiper blade contacts the photoconductive surface; wherein the length of the first free portion of the first wiper blade is in the range of 10 to 13 mm, and the length of the second free portion of the second wiper blade is in the range of 5 to 7 mm.