A multi-column electron beam exposure apparatus having a plurality of column cells, comprising: a mask for exposure, the mask comprising: stencil pattern groups each constituted by a plurality of stencil patterns, the stencil pattern groups respectively provided for the plurality of column cells; and a single mask substrate mounted on a mask stage for moving the mask for exposure, wherein the stencil pattern groups are arranged at intervals corresponding to arrangement intervals of the plurality of column cells, and all of the stencil pattern groups are mounted on the single mask substrate, wherein the stencil pattern groups include: first stencil pattern groups each formed within a deflectable range of an electron beam of each of the plurality of column cells; and a second stencil pattern group having two or more of the first stencil pattern groups, the second stencil pattern group being formed within a deflectable range of the electron beam of each of the plurality of column cells and within a movable range of the mask stage, the multi-column electron beam exposure apparatus further comprising: a two-dimensionally movable mask stage arranged to be shared by all the column cells, wherein the mask stage is arranged to be movable within a distance equal to the width of the second stencil pattern group formed on the mask substrate. a mask for exposure, the mask comprising: stencil pattern groups each constituted by a plurality of stencil patterns, the stencil pattern groups respectively provided for the plurality of column cells; and a single mask substrate mounted on a mask stage for moving the mask for exposure, wherein stencil pattern groups each constituted by a plurality of stencil patterns, the stencil pattern groups respectively provided for the plurality of column cells; and a single mask substrate mounted on a mask stage for moving the mask for exposure, wherein the stencil pattern groups are arranged at intervals corresponding to arrangement intervals of the plurality of column cells, and all of the stencil pattern groups are mounted on the single mask substrate, wherein the stencil pattern groups include: first stencil pattern groups each formed within a deflectable range of an electron beam of each of the plurality of column cells; and a second stencil pattern group having two or more of the first stencil pattern groups, the second stencil pattern group being formed within a deflectable range of the electron beam of each of the plurality of column cells and within a movable range of the mask stage, first stencil pattern groups each formed within a deflectable range of an electron beam of each of the plurality of column cells; and a second stencil pattern group having two or more of the first stencil pattern groups, the second stencil pattern group being formed within a deflectable range of the electron beam of each of the plurality of column cells and within a movable range of the mask stage, the multi-column electron beam exposure apparatus further comprising: a two-dimensionally movable mask stage arranged to be shared by all the column cells, wherein the mask stage is arranged to be movable within a distance equal to the width of the second stencil pattern group formed on the mask substrate. a two-dimensionally movable mask stage arranged to be shared by all the column cells, wherein the mask stage is arranged to be movable within a distance equal to the width of the second stencil pattern group formed on the mask substrate.