mhurhangee/ep-ind-claims huggingface dataset:
Individual personal transport device having a carrying container which can be worn on the body of a user and is configured as a backpack or backpack carrying frame, in which a transport means provided and configured for transporting the user is at least partially stowed in a transport position, wherein the personal transport device is designed and configured to displace the transport means from the transport position into a use position, in which the transport means is arranged for transporting the user, at least semi-automatically and without the user setting down the carrying container carried on the back of the user and/or without a movement of the user changing a spatial position of the carrying container, wherein the transport means is connected to the carrying container both in the transport position and in the use position via a lifting mechanism, which comprises at least one connecting element and is designed and configured to move the transport means from the transport position into the use position and vice versa and permanently connects the carrying container to the transport means both in the transport position and in the use position, in that the connecting element engages on the one hand on the carrying container and on the other hand on the transport means, characterised in that the transport means is configured as a unicycle, wherein a wheel of the transport means is arranged between the feet of the user in the use position, and in that the connecting element comprises a telescopic rod and a rotary connector, wherein the telescopic rod is connected to the transport means via the rotary connector and the rotary connector is configured to swivel the transport means about a vertically arranged axis of rotation and comprises an extension arm which arranges the transport means eccentrically to the axis of rotation.
A brush head of a vacuum cleaner, comprising a brush head body, a front wiping plate, a rear wiping plate, a wiping plate driving device, and a water spraying assembly, wherein a dust collection pipe is provided in the brush head body; the dust collection pipe has a dust collection port; the front wiping plate and the rear wiping plate are provided at the bottom of the brush head body, respectively; cleaning cloth is provided on the front wiping plate and the rear wiping plate, respectively; the wiping plate driving device is provided in the brush head body; a water spraying port of the water spraying assembly is provided on the bottom of the brush head body and located between the front wiping plate and the rear wiping plate; characterized in that the dust collection port is formed on the front side of the bottom of the brush head body; the wiping plate driving device is connected to the front wiping plate and the rear wiping plate, and is configured to drive the front wiping plate and the rear wiping plate to move in opposite directions and move in a reciprocating motion; the front wiping plate is provided with a dust passing hole penetrating the upper and lower ends thereof, and the dust passing hole is located below the dust collection port, and the dust passing hole is configured to keep the dust collection port overlapping the dust passing hole when moving reciprocally along with the front wiping plate. the dust collection port is formed on the front side of the bottom of the brush head body; the wiping plate driving device is connected to the front wiping plate and the rear wiping plate, and is configured to drive the front wiping plate and the rear wiping plate to move in opposite directions and move in a reciprocating motion; the front wiping plate is provided with a dust passing hole penetrating the upper and lower ends thereof, and the dust passing hole is located below the dust collection port, and the dust passing hole is configured to keep the dust collection port overlapping the dust passing hole when moving reciprocally along with the front wiping plate.
A seat comprising a foot ring and a vertical central tube, characterised by a device for locking said foot ring to said vertical central tube, said device consisting of a lever arm housed in a housing provided in one of the spokes which connect the ring to a central sleeve, said arm having its hinged end eccentrically engaged by a pin fixed at its ends to the walls of the housing, said pin also being pivoted in horizontal slotted holes, a slide supporting a pad of antifriction material which, for a certain position of the lever arm, presses the vertical central tube housed in said sleeve against the inner lateral wall thereof.
A device comprising: an enclosing structure (26, 104, 204a-d, 204', 204a"-d", 204", 204a'-d') defining a closed loop flow path; a system configured to generate a plasma from a target species at a plasma generation site, the site being in fluid communication with said flow path; a reflective optic distanced from the plasma generation site by a distance d and formed with a through-hole, wherein the enclosing structure defining the closed loop flow path passes through said through-hole; means for introducing a gas in said enclosing structure (26, 104, 204a-d, 204', 204a"-d", 204", 204a'-d'); a pump (106, 216a, 216b, 208, 208a', 208b') configured to force said gas through said closed loop flow path; a heat exchanger (108, 220a, 220b, 250) configured to remove heat from gas flowing in said flow path; and a filter (110, 218a, 218b) configured to remove at least a portion of the target species from gas flowing in said flow path; wherein the gas has a gas number density over the distance d, the gas number density being sufficient to operate over the distance d to reduce an energy of ions created from the target species at the plasma generation site and travelling towards the optic to below 100 eV before the ions reach the optic. an enclosing structure (26, 104, 204a-d, 204', 204a"-d", 204", 204a'-d') defining a closed loop flow path; a system configured to generate a plasma from a target species at a plasma generation site, the site being in fluid communication with said flow path; a reflective optic distanced from the plasma generation site by a distance d and formed with a through-hole, wherein the enclosing structure defining the closed loop flow path passes through said through-hole; means for introducing a gas in said enclosing structure (26, 104, 204a-d, 204', 204a"-d", 204", 204a'-d'); a pump (106, 216a, 216b, 208, 208a', 208b') configured to force said gas through said closed loop flow path; a heat exchanger (108, 220a, 220b, 250) configured to remove heat from gas flowing in said flow path; and a filter (110, 218a, 218b) configured to remove at least a portion of the target species from gas flowing in said flow path; wherein the gas has a gas number density over the distance d, the gas number density being sufficient to operate over the distance d to reduce an energy of ions created from the target species at the plasma generation site and travelling towards the optic to below 100 eV before the ions reach the optic.
A motor driven kitchen device comprising a vessel and a working tool that is adapted to be rotationally driven, said working tool further comprising: - a clutch adapted to couple the working tool to a corresponding motor clutch of the kitchen device; - a firm frame with at least one arm (3, 4) that, depending on the rotational movement of the working tool, follows closely the inner surface of the kitchen device vessel; - a molded attachment molded in substantial length onto the first arm of the firm frame, which during rotation is in close proximity to the inner surface of the vessel characterized in that the molded attachment comprises a scraper sector and a spatula sector, said scraper sector extending from the first arm of the firm frame towards the direction of the inner surface of the vessel providing direct contact with the inner surface of the vessel and/or with processed food adhering to it, and said spatula sector having a longitudinal spatula tip extending by 2 - 20 mm from the first arm in the opposite direction, towards the clutch of the working tool. - a clutch adapted to couple the working tool to a corresponding motor clutch of the kitchen device; - a firm frame with at least one arm (3, 4) that, depending on the rotational movement of the working tool, follows closely the inner surface of the kitchen device vessel; - a molded attachment molded in substantial length onto the first arm of the firm frame, which during rotation is in close proximity to the inner surface of the vessel
Polymorphic Form I of Granisetron base characterised by the following positions (o2 θ): 9.8o, 15.4o, 16.2o, 17.4o, 18.3o, 19.0o, 20.8o, 21.2o, 21.7o, 23.5o, 25.4o, 27.1o, 27.7o, 28.1o, 28.7o, 29.0o and 29.3o on the X-ray powder diffractogram, and with a melting point of 153±1oC.
A stocker for storing a plurality of flat substrates, each flat substrate comprising two opposite flat surfaces and a peripheral edge, the stocker comprising a storage compartment including storage containers for holding the flat substrates, the storage containers configured for allowing access to the substrate by the peripheral edge without extending over the flat surfaces; a robot handling unit with an integrated grip arm comprising a first gripper characterized in that it further comprises arm, where a substrate can be seized at the edges for transferring the substrates in and out of a storage container, the first gripper arm handling a substrate by the peripheral edge without extending over the flat surfaces, the integrated grip arm further comprising a second gripper arm, comprising a Y-shape arm with grip elements (68, 70) at the ends for handling a substrate by extending over a flat surface; a station for supporting a substrate, wherein the substrates in the station can be handled by the integrated grip arm by either_the first gripper arm or the second gripper arm; and a load port configured for allowing access to the substrate by the second gripper arm, wherein the first gripper arm is designed to access substrates in a storage container and in the station, and wherein the second gripper arm is designed to access substrates in the load port and the station.
Device for the processing of bulk material, especially for comminuting, compacting and briquetting of feed material, with a machine frame formed by longitudinal and transversal walls into which rotates a roll unit with a least one pair of counterrotating rolls (7, 8) arranged side by side parallel to their axis while keeping between them a radial gap and rotatably born in the transversal walls, the processing being effected by the material passing through the gap between the rolls and the area section upstream from the gap between the rolls serving for the feeding of the material and the area downstream for the material discharge whereby the upstream area of the material feeding comprises a feed chute with longitudinal chute walls and frontal chute walls and whereby the frontal chute walls being arranged at a clear axial distance to the transversal walls of the machine frame to form a free space, characterized in that the rolls (7,8) are divided in axial direction into a centre section forming the effective enveloping surface for the material processing and two end sections serving for the fastening of the enveloping segments whereby the end sections are located respectively in the area between transversal wall and frontal chute wall.
Method for transmitting information between a central unit (DSLAM) and at least one decentralized unit (TN1, TN2, TN3) in a communication network, in which a value (kl 0) representing a distance between the central unit (DSLAM) and the at least one decentralized unit (TN1, TN2, TN3) is detected in the at least one decentralized unit (TN1, TN2, TN3) and this value (kl 0) is transmitted to the central unit (DSLAM), characterized in that a value (kl 0 ') representing a fictitious distance between the central unit and the at least one decentralized unit is determined in the central unit (DSLAM) by means of the value (kl 0) representing the distance, wherein the fictitious distance indicates a distance between the central unit and the at least one decentralized unit, in order to transmit with an optimized transmission power, this fictitious distance is transmitted to the at least one decentralized unit (TN1, TN2, TN3) and the information is transmitted in dependence on the value (kl 0 ') representing the fictitious distance.
A bacteria-resistant and bacteria-repellent, biocompatible, chemically stable surface for implant surfaces, characterized in that it is multiphase or forms a heterogenous mixed phase, and is at least bipolar, wherein at least one phase has a pzzp in a physiological environment of 5 or more, wherein the surface is formed as mixed oxides of the elements of the IVth and Vth subgroup of the periodic system.
A method of providing an implanted region in a semiconductor structure including a first region and a second region, the method comprising: providing a first implantation mask covering the first region of the semiconductor structure, the first implantation mask including a first sacrificial layer, wherein the first sacrificial layer is formed as a spin-on-carbon layer, and a second sacrificial layer, wherein the second sacrificial layer is formed as a spin-on-glass layer, subjecting the semiconductor structure to an ion implantation process wherein an extension of the first implantation mask is such that ion implantation in the first region is counteracted and ion implantation in the second region is allowed wherein the second region is implanted, forming a third sacrificial layer covering the second region of the semiconductor structure, wherein the third sacrificial layer includes carbon and is formed as a spin-on-carbon layer, removing the second sacrificial layer at the first region by etching, wherein the third sacrificial layer protects the second region from being affected by said etching, and removing the first sacrificial layer at the first region and the third sacrificial layer at the second region by etching in a same etching process, wherein the first sacrificial layer and the third sacrificial layer are etched by a same etchant. providing a first implantation mask covering the first region of the semiconductor structure, the first implantation mask including a first sacrificial layer, wherein the first sacrificial layer is formed as a spin-on-carbon layer, and a second sacrificial layer, wherein the second sacrificial layer is formed as a spin-on-glass layer, subjecting the semiconductor structure to an ion implantation process wherein an extension of the first implantation mask is such that ion implantation in the first region is counteracted and ion implantation in the second region is allowed wherein the second region is implanted, forming a third sacrificial layer covering the second region of the semiconductor structure, wherein the third sacrificial layer includes carbon and is formed as a spin-on-carbon layer, removing the second sacrificial layer at the first region by etching, wherein the third sacrificial layer protects the second region from being affected by said etching, and removing the first sacrificial layer at the first region and the third sacrificial layer at the second region by etching in a same etching process, wherein the first sacrificial layer and the third sacrificial layer are etched by a same etchant.
A biaxially oriented film comprising: a base film having a first side and a second side; a metallized layer on the first side; and a print-receptive coating on the second side, wherein the print-receptive coating comprises one or more acrylic polymers, wherein the biaxially oriented film has no blocking tendency, and wherein the biaxially oriented film has a distinctness of image decrease of ≤ 15% in a machine direction for the metallized layer when measured atop the print-receptive coating. a base film having a first side and a second side; a metallized layer on the first side; and a print-receptive coating on the second side, wherein the print-receptive coating comprises one or more acrylic polymers, wherein the biaxially oriented film has no blocking tendency, and wherein the biaxially oriented film has a distinctness of image decrease of ≤ 15% in a machine direction for the metallized layer when measured atop the print-receptive coating.
An image recording method comprising the steps of: applying an ink containing a coloring material and anionic resin particles to a recording medium; and applying a liquid composition to the recording medium so as to at least partly overlap with an area where the ink is applied, the liquid composition destabilizing a dispersion state of the coloring material or of the anionic resin particles in the ink, wherein the ink contains a trihydric or higher polyhydric alcohol compound having a group formed by substituting a hydrogen atom of a hydroxyl group by a structure represented by -R n -H, where R is an alkyleneoxy group including an ethyleneoxy group; and the number of "R"s per molecule is 40 or more and 120 or less when the polyhydric alcohol is a trihydric alcohol and is 12 or more and 400 or less when the polyhydric alcohol is a tetrahydric or higher polyhydric alcohol. applying an ink containing a coloring material and anionic resin particles to a recording medium; and applying a liquid composition to the recording medium so as to at least partly overlap with an area where the ink is applied, the liquid composition destabilizing a dispersion state of the coloring material or of the anionic resin particles in the ink, wherein the ink contains a trihydric or higher polyhydric alcohol compound having a group formed by substituting a hydrogen atom of a hydroxyl group by a structure represented by -R n -H, where R is an alkyleneoxy group including an ethyleneoxy group; and the number of "R"s per molecule is 40 or more and 120 or less when the polyhydric alcohol is a trihydric alcohol and is 12 or more and 400 or less when the polyhydric alcohol is a tetrahydric or higher polyhydric alcohol.
A pharmaceutical composition comprising a ribavirin, a methyltransferase inhibitor and a pharmaceutically acceptable carrier for use in the treatment of a pre-neoplasm, a precancerous lesion, neoplasm or a proliferative disorder, wherein the methyltransferase inhibitor is azacytidine.
Grease comprising a base oil containing at least 50% by mass of a diester compound of a glycol with a branched carboxylic acid represented by the general formula: [wherein R 1 and R 2 each independently represent a C 3 to C 20 branched alkyl group and R 3 and R 4 each independently represent a C 1 to C 6 alkyl group], and, as a thickener, a diurea compound represented by the general formula: R 6 -NHCONH-R 5 -NHCONH-R 7 [wherein R 6 and R 7 each independently represent a C 6 to C 24 monovalent chain hydrocarbon group, a C 6 to C 12 monovalent alicyclic hydrocarbon group or a C 6 to C 15 monovalent aromatic hydrocarbon group, and R 5 represents a C 6 to C 15 divalent aromatic hydrocarbon group and wherein x, y and z content (mole%) of the groups X, Y and Z, respectively, in the groups R 6 and R 7 satisfy the following formulas (a) and (b): x + y / x + y + z ≥ 0.90 x / y = 50 / 50 to 0 / 100
A refrigeration cycle apparatus comprising: a low-stage refrigeration cycle including a low-stage compressor, a low-stage condenser, a low-stage pressure reducing device, and a low-stage evaporator, and circulating low-stage refrigerant; a high-stage refrigeration cycle including a high-stage compressor, a high-stage condenser, a high-stage pressure reducing device, and a high-stage evaporator, and circulating high-stage refrigerant; a cascade condenser configured to exchange heat between the low-stage refrigerant in the low-stage condenser and the high-stage refrigerant in the high-stage evaporator; a controller, characterized in that the low-stage refrigerant is a refrigerant that is capable of undergoing disproportionation, and the controller is configured to change a low-pressure side pressure of the high-stage refrigeration cycle to maintain the low-stage refrigerant at a pressure lower than a disproportionation pressure at which the low-stage refrigerant undergoes disproportionation. a low-stage refrigeration cycle including a low-stage compressor, a low-stage condenser, a low-stage pressure reducing device, and a low-stage evaporator, and circulating low-stage refrigerant; a high-stage refrigeration cycle including a high-stage compressor, a high-stage condenser, a high-stage pressure reducing device, and a high-stage evaporator, and circulating high-stage refrigerant; a cascade condenser configured to exchange heat between the low-stage refrigerant in the low-stage condenser and the high-stage refrigerant in the high-stage evaporator; a controller, characterized in that the low-stage refrigerant is a refrigerant that is capable of undergoing disproportionation, and the controller is configured to change a low-pressure side pressure of the high-stage refrigeration cycle to maintain the low-stage refrigerant at a pressure lower than a disproportionation pressure at which the low-stage refrigerant undergoes disproportionation.
A syringe kit for mixing two medicinal chemicals which is used for mixing a medicinal chemical in a first barrel with a medicinal chemical in a second barrel by connecting the tip portion of the first barrel having a plunger to the tip portion of the second barrel having a plunger so as to communicate each other, wherein a connecting tube portion is formed at the tip portion of the first barrel, the outer periphery of the connecting tube portion has a male screw, a screw tube portion and a nozzle portion are formed at the tip portion of the second barrel, the inner periphery of the screw tube portion has a female screw which is screwed together with the male screw on the outer periphery of the connecting tube portion in a freely movable manner, characterized in that the inner periphery of the connecting tube portion has an inner tapered surface, and the outer periphery of the nozzle portion has an outer tapered surface which fits to the inner tapered surface on the inner periphery of the connecting tube portion; at least either the surface of the male screw and the outer periphery of the connecting tube portion of the first barrel or the surface of the female screw and the inner periphery of the screw tube portion of the second barrel is roughened to a surface roughness in a range between Ra1.0 and Ra2.0.