mhurhangee/ep-ind-claims huggingface dataset:
A process for forming a compound of formula, or a boronic acid anhydride thereof: comprising the steps: coupling a trifluoroacetic acid addition salt of a compound of formula ( XVIII): with a compound of formula ( XIXa): wherein the moiety -C X is an O-(N-hydroxysuccinimide)ester generated in situ by contacting N-(2-pyrazinecarbonyl)-L-phenylalanine with dicyclohexylcarbodiimide and N-hydroxysuccinimide, to form a compound of formula ( XXIII): deprotecting the boronic acid moiety to form the compound of formula, or a boronic acid anhydride thereof. coupling a trifluoroacetic acid addition salt of a compound of formula ( XVIII): with a compound of formula ( XIXa): wherein the moiety -C X is an O-(N-hydroxysuccinimide)ester generated in situ by contacting N-(2-pyrazinecarbonyl)-L-phenylalanine with dicyclohexylcarbodiimide and N-hydroxysuccinimide, to form a compound of formula ( XXIII): deprotecting the boronic acid moiety to form the compound of formula, or a boronic acid anhydride thereof.
A method for wireless communications by a base station, BS, using a shared radio frequency spectrum, SRFS, band, in a communication system having a first set of devices arranged to decode a wideband signal and a narrowband signal transmitted by the BS and a second set of devices arranged to decode the narrowband signal transmitted by the BS but not the wideband signal, comprising: performing a channel clear assessment, CCA, for at least a portion of the SRFS including one or more narrowband regions; transmitting a preamble to reserve the one or more narrowband regions, wherein the preamble comprises a wideband preamble for reserving a wideband region of the SRFS for a period of time, wherein the preamble is transmitted on a wideband region including the one or more narrowband regions and subsequent to the transmission of the wideband preamble, transmitting by the BS a narrowband preamble over a narrow band region of the SRFS for reserving a narrowband region of the SRFS for a period of time; and communicating with at least one machine type communications, MTC, user equipment, UE, after performing the CCA, on at least one of the narrowband regions. performing a channel clear assessment, CCA, for at least a portion of the SRFS including one or more narrowband regions; transmitting a preamble to reserve the one or more narrowband regions, wherein the preamble comprises a wideband preamble for reserving a wideband region of the SRFS for a period of time, wherein the preamble is transmitted on a wideband region including the one or more narrowband regions and subsequent to the transmission of the wideband preamble, transmitting by the BS a narrowband preamble over a narrow band region of the SRFS for reserving a narrowband region of the SRFS for a period of time; and communicating with at least one machine type communications, MTC, user equipment, UE, after performing the CCA, on at least one of the narrowband regions.
A light emitting glass structure comprising: a first substrate, the first substrate being a conductive substrate; a first contact strip disposed over the first substrate; a first conductive adhesive layer inter-coupling and electrically communicating the first contact strip with the first substrate; an interpose layer formed over the first substrate, the interpose layer comprising: a light emitting material; a dielectric layer formed along the light emitting material; and an electrode layer formed over the dielectric layer, the first contact strip being spatially displaced from the interpose layer, a second contact strip disposed over the interpose layer; a second conductive adhesive layer inter-coupling and electrically communicating the second contact strip with the interpose layer; a resin layer extending over the interpose layer with the second contact strip interposing the interpose layer and the resin layer; and a second substrate disposed over the resin layer with the resin layer interposing the first substrate and the second substrate. a first substrate, the first substrate being a conductive substrate; a first contact strip disposed over the first substrate; a first conductive adhesive layer inter-coupling and electrically communicating the first contact strip with the first substrate; an interpose layer formed over the first substrate, the interpose layer comprising: a light emitting material; a dielectric layer formed along the light emitting material; and an electrode layer formed over the dielectric layer, the first contact strip being spatially displaced from the interpose layer, a light emitting material; a dielectric layer formed along the light emitting material; and an electrode layer formed over the dielectric layer, the first contact strip being spatially displaced from the interpose layer, a second contact strip disposed over the interpose layer; a second conductive adhesive layer inter-coupling and electrically communicating the second contact strip with the interpose layer; a resin layer extending over the interpose layer with the second contact strip interposing the interpose layer and the resin layer; and a second substrate disposed over the resin layer with the resin layer interposing the first substrate and the second substrate.
An article of footwear comprising: an upper coupled to a midsole; a lateral stabilizing rail coupled to the upper and the midsole and extending from a forefoot portion of the article of footwear to a heel portion of the article of footwear, the lateral stabilizing rail comprising a forefoot end coupled to a bottom surface of the midsole and a heel end coupled to and wrapping around at least a portion of a heel end of the upper; and a medial stabilizing rail coupled to the upper and the midsole and extending from the forefoot portion of the article of footwear to the heel portion of the article of footwear, the medial stabilizing rail comprising a forefoot end coupled to the bottom surface of the midsole and a heel end coupled to and wrapping around at least a portion of the heel end of the upper, characterized in that the lateral stabilizing rail and the medial stabilizing rail are separate pieces. an upper coupled to a midsole; a lateral stabilizing rail coupled to the upper and the midsole and extending from a forefoot portion of the article of footwear to a heel portion of the article of footwear, the lateral stabilizing rail comprising a forefoot end coupled to a bottom surface of the midsole and a heel end coupled to and wrapping around at least a portion of a heel end of the upper; and a medial stabilizing rail coupled to the upper and the midsole and extending from the forefoot portion of the article of footwear to the heel portion of the article of footwear, the medial stabilizing rail comprising a forefoot end coupled to the bottom surface of the midsole and a heel end coupled to and wrapping around at least a portion of the heel end of the upper, characterized in that the lateral stabilizing rail and the medial stabilizing rail are separate pieces.
Countersink with - a base body having a central axis, - three geometrically defined cutting edges (3,5,7), - each of which is assigned a chip space (9, 11, 13), characterised in that a) the angle α between a first cutting edge and a second cutting edge is 100°, the angle β between the second cutting edge and a third cutting edge is 120°, and the angle γ between the third and the first cutting edge is 140°, where α < β < γ and α + β + γ = 360°, or that b) the angle α between a first cutting edge and a second cutting edge is 101°, the angle β between the second cutting edge and a third cutting edge is 120°, and the angle γ between the third cutting edge and the first cutting edge is 139°, where α < β < γ and α + β + γ = 360°. - a base body having a central axis, - three geometrically defined cutting edges (3,5,7), - each of which is assigned a chip space (9, 11, 13), a) the angle α between a first cutting edge and a second cutting edge is 100°, the angle β between the second cutting edge and a third cutting edge is 120°, and the angle γ between the third and the first cutting edge is 140°, where α < β < γ and α + β + γ = 360°, or that b) the angle α between a first cutting edge and a second cutting edge is 101°, the angle β between the second cutting edge and a third cutting edge is 120°, and the angle γ between the third cutting edge and the first cutting edge is 139°, where α < β < γ and α + β + γ = 360°.
A power receiving device characterized by comprising: a power receiving unit configured to move among a retracted position, a detection position and a power receiving position, the power receiving unit being configured to contactlessly receive electric power from a power transmitting unit in a state where the power receiving unit is arranged at the power receiving position, the power receiving unit being configured to detect a strength of a magnetic field or electric field that is formed by the power transmitting unit in a state where the power receiving unit is arranged at the detection position, a distance between the power receiving position and the detection position being shorter than a distance between the power receiving position and the retracted position; and a drive mechanism configured to drive the power receiving unit among the retracted position, the detection position and the power receiving position. a power receiving unit configured to move among a retracted position, a detection position and a power receiving position, the power receiving unit being configured to contactlessly receive electric power from a power transmitting unit in a state where the power receiving unit is arranged at the power receiving position, the power receiving unit being configured to detect a strength of a magnetic field or electric field that is formed by the power transmitting unit in a state where the power receiving unit is arranged at the detection position, a distance between the power receiving position and the detection position being shorter than a distance between the power receiving position and the retracted position; and a drive mechanism configured to drive the power receiving unit among the retracted position, the detection position and the power receiving position.
A differential phase shift keying, DPSK-, receiver for adapting to the imperfection of a transmitter consisting in an undesired time-dependent variation of the carrier frequency, the receiver comprising means to receive signal packets from the transmitter, a time offset estimation and timed symbol extraction unit configured to output complex symbols y(k) of the signal packet, with k being a symbol index, and to feed y(k) to a frequency offset estimation unit and a frequency offset compensation unit, whereas the frequency offset estimation unit is configured to deliver phase values s(k) of the symbols y(k) and the frequency offset compensation unit is configured to compensate the received symbols for frequency offset and frequency drift and to feed said compensated result q(k) to a demodulation reference estimation unit and a symbol demodulation unit, whereas the demodulation reference estimation unit is configured to support a symbol demodulation for the symbol decision and bit mapping, characterized in, that the frequency offset estimation unit comprises a first and a second phase estimation unit and a dirty-clean-selector, whereas the first phase estimation unit, outputting a first phase error estimate e dirty (k), comprises a first frequency offset estimation lowpass filter having a wider filter bandwidth than a second frequency offset estimation lowpass filter of the second phase estimation unit, outputting a second phase error estimate e clean (k), and the dirty-clean-selector is configured to compare a ratio of the second phase error estimate e clean (k) and the first phase error estimate e dirty (k) against a threshold value T and outputting a binary comparison result c(k), and the demodulation reference estimation unit comprises a first and a second filter, whereas the first filter as part of a "dirty"-receive path of the receiver has a wider filter bandwidth than the second filter as part of a "clean"-receive-path of the receiver, whereas if the ratio of the second and first phase error estimates e clean (k) / e dirty (k) falls below the threshold value T, the "clean"-receive path is used for outputting received information bits, otherwise the "dirty"-receive path is used.
Method for processing messages (230, 232) in a motor vehicle having at least one Ethernet controller, which has a message memory (96, 236), in which a received message (230, 232) is checked by the at least one Ethernet controller for the presence of at least one property, and in which the received message (230, 232) is stored in the message memory (96, 236) if this at least one property applies to the message (230, 232), characterized in that the received message (230, 232) comprises a value of at least one operating parameter of the motor vehicle and the property is defined by the at least one operating parameter of the motor vehicle and in that the message (230, 232) is stored according to the applicable property in a memory location of the message memory (96, 236) that is reserved for this message, wherein a first message (230, 232) whose at least one property is defined by means of at least one operating parameter has a first value of this at least one operating parameter and a second message (230, 232) whose at least one property is defined by means of the same at least one operating parameter as in the case of the first message (230, 232) has a second value of this at least one operating parameter, wherein an update process results in there being provision made for the older, first message (230, 232) to be replaced by the newer, second message (230, 232), with the value of the at least one operating parameter being changed within the message memory (96, 236).
A tool bit for removing orthodontic brackets, the tool bit comprising: a handpiece-engaging portion; a curved portion connected to the handpiece-engaging portion; and a working end portion connected to the curved portion, the working end portion having: a front beveled cutting surface and a side beveled cutting surface for cutting an adhesive that bonds the orthodontic brackets to respective teeth; and a blunt side surface for polishing away any residual adhesive that remains after the orthodontic brackets have been removed. a handpiece-engaging portion; a curved portion connected to the handpiece-engaging portion; and a working end portion connected to the curved portion, the working end portion having: a front beveled cutting surface and a side beveled cutting surface for cutting an adhesive that bonds the orthodontic brackets to respective teeth; and a blunt side surface for polishing away any residual adhesive that remains after the orthodontic brackets have been removed. a front beveled cutting surface and a side beveled cutting surface for cutting an adhesive that bonds the orthodontic brackets to respective teeth; and a blunt side surface for polishing away any residual adhesive that remains after the orthodontic brackets have been removed.
Accelerator disc for a centrifugal separator, especially centrifugal nozzle separator, the accelerator disc having a shape of a cone, comprising a cone-shaped shell having a height and blades mounted on the cone-shaped shell of the accelerator disc, the blades extend along the whole height of the cone-shaped shell and define flow passages, characterised in that additional shorter blades extend only along a part of the height of the cone-shaped shell and reach to the end of the flow passage between such blades which extend along the whole height of the cone-shaped shell, the additional shorter blades being arranged between the blades which extend along the whole height of the cone-shaped shell and the additional shorter blades having a wider profile than the blades extending along the whole height of the cone-shaped shell, wherein the blades (10, 11) are bent in the counter direction of rotation.
An actuator for a sealed fluid-filled lens comprising: a housing; a reservoir disposed within the housing; and a compression arm disposed adjacent to the reservoir, characterised in that: the compression arm has a first end that is fixed and a second end that is not fixed, and said compression arm flexes to compress the reservoir. a housing; a reservoir disposed within the housing; and a compression arm disposed adjacent to the reservoir, characterised in that: the compression arm has a first end that is fixed and a second end that is not fixed, and said compression arm flexes to compress the reservoir.
A method for data processing in a network component, - wherein a public IP address is provided from a network or from a carrier or from an operator, - wherein the network component maps the public IP address to a private IP address and a port information associated with a subscriber, wherein the network component is connected in downstream direction to at least one subscriber, - wherein the private IP address is supplied towards the subscriber together with said port information, - wherein the private IP address is used to address several subscribers connected to the network component, - wherein the network component confers with the subscriber whether it is capable of processing NAT and the network component performs NAT for any subscriber that is not capable of processing NAT, wherein a unique IP address is provided for each subscriber that is not capable of processing NAT and the private address is provided for each subscriber that is capable of processing NAT. - wherein a public IP address is provided from a network or from a carrier or from an operator, - wherein the network component maps the public IP address to a private IP address and a port information associated with a subscriber, wherein the network component is connected in downstream direction to at least one subscriber, - wherein the private IP address is supplied towards the subscriber together with said port information, - wherein the private IP address is used to address several subscribers connected to the network component, - wherein the network component confers with the subscriber whether it is capable of processing NAT and the network component performs NAT for any subscriber that is not capable of processing NAT, wherein a unique IP address is provided for each subscriber that is not capable of processing NAT and the private address is provided for each subscriber that is capable of processing NAT.
Pocket (1,11) for a garment, comprising: - a rear side configured to be turned towards the body of a person, and - a front side which is connected to the rear side and configured to face away from the body of a person, wherein the rear side is at least partly made of a radio-wave-reflecting first textile, which first textile comprises at least one metal-comprising thread, and wherein the front side is at least partly made of a radio-wave-reflecting second textile, which second textile comprises at least one metal-comprising thread, wherein the rear side is substantially completely made of the radio-wave-reflecting first textile, characterized in that the front side is partly made of the radio-wave-reflecting second textile, and wherein at least one other part of the front side is made of a third textile which is substantially permeable to radio waves, wherein the third textile is substantially free from metal-comprising threads. - a rear side configured to be turned towards the body of a person, and - a front side which is connected to the rear side and configured to face away from the body of a person,
A method of creating MEMS structures by selectively etching a silicon wafer that is patterned by using masking layers for defining the structural features of a MEMS device, characterized in that the method comprises: a) depositing and patterning a first mask on a silicon wafer in order to define desired first areas on the wafer to be etched in a first trench etching, b) depositing and patterning a first intermediate mask on top of the first mask, the first intermediate mask defining desired areas on the wafer to be recessed by etching to a first defined depth, c) etching recession trenches on the parts of the wafer not covered by the first intermediate mask nor the first mask in a recession trench etching, d) removing said first intermediate mask, e) etching first trenches (3a, 3b) and further etching the recession trenches on the parts of the wafer not covered by the first mask in a first trench etching, f) filling the first trenches (3a, 3b) and the recession trenches with a deposit layer, g) removing a part of the deposit layer on desired second areas to be etched in the second trench etching and leaving a remainder of the deposit layer on areas other than the second areas to function as a second mask (4") in order to define final structures, wherein lateral dimensions and mutual lateral alignment of the second areas in the second mask are defined by the remainder of the deposit layer filling the first trenches (3a, 3b) and the recession trenches etched on the parts of the wafer not covered by the first mask, h) etching parts of the wafer on the desired second areas in the second trench etching, and i) removing said second mask (4"). a) depositing and patterning a first mask on a silicon wafer in order to define desired first areas on the wafer to be etched in a first trench etching, b) depositing and patterning a first intermediate mask on top of the first mask, the first intermediate mask defining desired areas on the wafer to be recessed by etching to a first defined depth, c) etching recession trenches on the parts of the wafer not covered by the first intermediate mask nor the first mask in a recession trench etching, d) removing said first intermediate mask, e) etching first trenches (3a, 3b) and further etching the recession trenches on the parts of the wafer not covered by the first mask in a first trench etching, f) filling the first trenches (3a, 3b) and the recession trenches with a deposit layer, g) removing a part of the deposit layer on desired second areas to be etched in the second trench etching and leaving a remainder of the deposit layer on areas other than the second areas to function as a second mask (4") in order to define final structures, wherein lateral dimensions and mutual lateral alignment of the second areas in the second mask are defined by the remainder of the deposit layer filling the first trenches (3a, 3b) and the recession trenches etched on the parts of the wafer not covered by the first mask, h) etching parts of the wafer on the desired second areas in the second trench etching, and i) removing said second mask (4").