A gas-type massage apparatus (1; 10) to administer a massage to a human body using a high-pressure gas, wherein the gas-type massage apparatus (1; 10) comprises: a gas-type massage device (2; 4); and a gas supply/discharge system to supply a high-pressure gas to a plurality of gas chambers of the gas-type massage device (2; 4) and discharge a high-pressure gas from the plurality of gas chambers, and wherein the gas-type massage device (2; 4) is fitted to at least one part of upper limbs or lower limbs of the human body along an axial direction, in which the one part extends, so as to surround the one part in a peripheral direction to administer a massage to the human body using the high-pressure gas, wherein the gas-type massage device (2; 4) has the plurality of gas chambers, each of which plurality of gas chambers can receive and discharge the high-pressure gas to expand and contract mutually independently, wherein the plurality of gas chambers comprise a first gas chamber group (21; 41) and a second gas chamber group (22; 42) being provided at the at least one part of upper limbs or lower limbs of the human body so as to be mutually adjacent in the axial direction, characterized in that the first gas chamber group (21; 41) has a first gas chamber of first group (211; 411) and a second gas chamber of first group (212; 412) along the peripheral direction, the first gas chamber of first group (211; 411) and the second gas chamber of first group (212; 412) being capable of expanding and contracting mutually independently, the second gas chamber group (22; 42) has a first gas chamber of second group (221; 421) and a second gas chamber of second group (222; 422) along the peripheral direction, the first gas chamber of second group (221; 421) and the second gas chamber of second group (222; 422) being capable of expanding and contracting mutually independently, the first gas chamber of first group (211; 411) and the first gas chamber of second group (221; 421) are provided so as to be mutually adjacent in the axial direction, the second gas chamber of first group (212; 412) and the second gas chamber of second group (222; 422) are provided so as to be mutually adjacent in the axial direction, and the gas supply/discharge system is configured to supply a high-pressure gas to the first gas chamber of first group (211; 411), the second gas chamber of first group (212; 412), the first gas chamber of second group (221; 421), the second gas chamber of second group (222; 422) in that order, or to the second gas chamber of first group (212; 412), the first gas chamber of first group (211; 411), the second gas chamber of second group (222; 422), the first gas chamber of second group (221; 421) in that order. a gas-type massage device (2; 4); and a gas supply/discharge system to supply a high-pressure gas to a plurality of gas chambers of the gas-type massage device (2; 4) and discharge a high-pressure gas from the plurality of gas chambers, and wherein the gas-type massage device (2; 4) is fitted to at least one part of upper limbs or lower limbs of the human body along an axial direction, in which the one part extends, so as to surround the one part in a peripheral direction to administer a massage to the human body using the high-pressure gas, wherein the gas-type massage device (2; 4) has the plurality of gas chambers, each of which plurality of gas chambers can receive and discharge the high-pressure gas to expand and contract mutually independently, wherein the plurality of gas chambers comprise a first gas chamber group (21; 41) and a second gas chamber group (22; 42) being provided at the at least one part of upper limbs or lower limbs of the human body so as to be mutually adjacent in the axial direction, characterized in that the first gas chamber group (21; 41) has a first gas chamber of first group (211; 411) and a second gas chamber of first group (212; 412) along the peripheral direction, the first gas chamber of first group (211; 411) and the second gas chamber of first group (212; 412) being capable of expanding and contracting mutually independently, the second gas chamber group (22; 42) has a first gas chamber of second group (221; 421) and a second gas chamber of second group (222; 422) along the peripheral direction, the first gas chamber of second group (221; 421) and the second gas chamber of second group (222; 422) being capable of expanding and contracting mutually independently, the first gas chamber of first group (211; 411) and the first gas chamber of second group (221; 421) are provided so as to be mutually adjacent in the axial direction, the second gas chamber of first group (212; 412) and the second gas chamber of second group (222; 422) are provided so as to be mutually adjacent in the axial direction, and the gas supply/discharge system is configured to supply a high-pressure gas to the first gas chamber of first group (211; 411), the second gas chamber of first group (212; 412), the first gas chamber of second group (221; 421), the second gas chamber of second group (222; 422) in that order, or to the second gas chamber of first group (212; 412), the first gas chamber of first group (211; 411), the second gas chamber of second group (222; 422), the first gas chamber of second group (221; 421) in that order.