A transparent conductive gas barrier laminate (10A, 10B, 20A, 20B, 30A, 30B, 40A, 40B) comprising a transparent gas barrier film and a transparent conductive layer in this order from outside toward inside, wherein the transparent gas barrier film has a b ∗ value of more than 0 in a L ∗ a ∗ b ∗ color system, wherein the transparent gas barrier film includes a transparent base film and a barrier layer that is formed on at least one surface of the transparent base film, wherein the transparent base film is a PET or PEN film and the barrier layer includes at least a silicon oxide-deposited layer; and the transparent conductive layer contains a mixture of polyethylene dioxythiophene and polystyrene sulfonic acid, wherein the transparent conductive layer has a b ∗ value of less than 0 in the L ∗ a ∗ b ∗ color system, characterized in that: the barrier layer further includes a gas barrier covering layer, wherein the silicon oxide-deposited layer is provided on the surface of the transparent base film and the gas barrier covering layer is provided on the silicon oxide-deposited layer, said gas barrier covering layer comprises at least one component selected from the group consisting of hydroxyl group-containing polymer compound, metal alkoxide, metal alkoxide hydrolysate and metal alkoxide polymer, the laminate (10A, 10B, 20A, 20B, 30A, 30B, 40A, 40B) has a b ∗ value of less than 0 in the L ∗ a ∗ b ∗ color system, wherein the b ∗ value is measured according to the method as described in the description. the transparent gas barrier film has a b ∗ value of more than 0 in a L ∗ a ∗ b ∗ color system, wherein the transparent gas barrier film includes a transparent base film and a barrier layer that is formed on at least one surface of the transparent base film, wherein the transparent base film is a PET or PEN film and the barrier layer includes at least a silicon oxide-deposited layer; and the transparent conductive layer contains a mixture of polyethylene dioxythiophene and polystyrene sulfonic acid, wherein the transparent conductive layer has a b ∗ value of less than 0 in the L ∗ a ∗ b ∗ color system, characterized in that: the barrier layer further includes a gas barrier covering layer, wherein the silicon oxide-deposited layer is provided on the surface of the transparent base film and the gas barrier covering layer is provided on the silicon oxide-deposited layer, said gas barrier covering layer comprises at least one component selected from the group consisting of hydroxyl group-containing polymer compound, metal alkoxide, metal alkoxide hydrolysate and metal alkoxide polymer, the laminate (10A, 10B, 20A, 20B, 30A, 30B, 40A, 40B) has a b ∗ value of less than 0 in the L ∗ a ∗ b ∗ color system, wherein the b ∗ value is measured according to the method as described in the description. the barrier layer further includes a gas barrier covering layer, wherein the silicon oxide-deposited layer is provided on the surface of the transparent base film and the gas barrier covering layer is provided on the silicon oxide-deposited layer, said gas barrier covering layer comprises at least one component selected from the group consisting of hydroxyl group-containing polymer compound, metal alkoxide, metal alkoxide hydrolysate and metal alkoxide polymer, the laminate (10A, 10B, 20A, 20B, 30A, 30B, 40A, 40B) has a b ∗ value of less than 0 in the L ∗ a ∗ b ∗ color system, wherein the b ∗ value is measured according to the method as described in the description.