EUV radiation generating apparatus, comprising: a driver laser arrangement for generating a laser beam, a vacuum chamber, in which a target material can be arranged, a beam guiding device for guiding the laser beam from the driver laser device in a first direction onto the target material, and a polariser arrangement, comprising: a first polariser device having a first polariser surface for linear polarisation of a laser beam propagating in the first direction, which strikes the first polariser surface at a first angle (α B) being different from 0°, characterized in that the polarizer arrangement comprises: a phase shift device for rotating a polarisation direction (p) of the linearly polarised laser beam transmitted at the first polariser surface by a predetermined rotation angle (β) that is between 80° and 100°, and a second polariser device having a second polariser surface, which the linearly polarised laser beam strikes at a second angle (α B) being different from 0°, after having passed through the phase shift device and is transmitted by the second polariser surface, wherein an incidence plane (Y, Z) of the laser beam striking the second polariser surface is rotated by the predetermined angle (β) relative to an incidence plane (X, Z) of the laser beam striking the first polariser surface. a driver laser arrangement for generating a laser beam, a vacuum chamber, in which a target material can be arranged, a beam guiding device for guiding the laser beam from the driver laser device in a first direction onto the target material, and a polariser arrangement, comprising: a first polariser device having a first polariser surface for linear polarisation of a laser beam propagating in the first direction, which strikes the first polariser surface at a first angle (α B) being different from 0°, characterized in that the polarizer arrangement comprises: a phase shift device for rotating a polarisation direction (p) of the linearly polarised laser beam transmitted at the first polariser surface by a predetermined rotation angle (β) that is between 80° and 100°, and a second polariser device having a second polariser surface, which the linearly polarised laser beam strikes at a second angle (α B) being different from 0°, after having passed through the phase shift device and is transmitted by the second polariser surface, wherein an incidence plane (Y, Z) of the laser beam striking the second polariser surface is rotated by the predetermined angle (β) relative to an incidence plane (X, Z) of the laser beam striking the first polariser surface. a first polariser device having a first polariser surface for linear polarisation of a laser beam propagating in the first direction, which strikes the first polariser surface at a first angle (α B) being different from 0°, characterized in that the polarizer arrangement comprises: a phase shift device for rotating a polarisation direction (p) of the linearly polarised laser beam transmitted at the first polariser surface by a predetermined rotation angle (β) that is between 80° and 100°, and a second polariser device having a second polariser surface, which the linearly polarised laser beam strikes at a second angle (α B) being different from 0°, after having passed through the phase shift device and is transmitted by the second polariser surface, wherein an incidence plane (Y, Z) of the laser beam striking the second polariser surface is rotated by the predetermined angle (β) relative to an incidence plane (X, Z) of the laser beam striking the first polariser surface. a phase shift device for rotating a polarisation direction (p) of the linearly polarised laser beam transmitted at the first polariser surface by a predetermined rotation angle (β) that is between 80° and 100°, and a second polariser device having a second polariser surface, which the linearly polarised laser beam strikes at a second angle (α B) being different from 0°, after having passed through the phase shift device and is transmitted by the second polariser surface, wherein an incidence plane (Y, Z) of the laser beam striking the second polariser surface is rotated by the predetermined angle (β) relative to an incidence plane (X, Z) of the laser beam striking the first polariser surface.