An exhaust gas sampling apparatus comprising: an exhaust gas flow path through which an exhaust gas flows; a dilution gas flow path through which a dilution gas flows; a main flow path that is connected with the exhaust gas flow path and the dilution gas flow path to flow a diluted exhaust gas that is a mixture of the exhaust gas that has flown through the exhaust gas flow path and the dilution gas that has flown through the dilution gas flow path; a constant volume sampler that is provided in the main flow path; a diluted exhaust gas sampling flow path for sampling a first part of the diluted exhaust gas upstream of the constant volume sampler from the main flow path to introduce the first part into an analytical device, while a remaining, second part of the diluted exhaust gas flows through the constant volume sampler; a flow rate control mechanism that is provided in the diluted exhaust gas sampling flow path and configured to control a flow rate (Q samp) of the first part of the diluted exhaust gas; and a control device that is configured to control the flow rate control mechanism to set a ratio (Q samp /Q CVS) of the flow rate (Q samp) of the first part of the diluted exhaust gas to a flow rate (Q CVS) of the second part of the diluted exhaust gas, characterized in that the control device is configured to calculate, based on a temperature of the second part of the diluted exhaust gas, the flow rate (Q CVS) of the second part of the diluted exhaust gas to set the ratio (Q samp /Q CVS) so as to make the flow rate (Q samp) of the first part of the diluted exhaust gas equal to a predetermined value. an exhaust gas flow path through which an exhaust gas flows; a dilution gas flow path through which a dilution gas flows; a main flow path that is connected with the exhaust gas flow path and the dilution gas flow path to flow a diluted exhaust gas that is a mixture of the exhaust gas that has flown through the exhaust gas flow path and the dilution gas that has flown through the dilution gas flow path; a constant volume sampler that is provided in the main flow path; a diluted exhaust gas sampling flow path for sampling a first part of the diluted exhaust gas upstream of the constant volume sampler from the main flow path to introduce the first part into an analytical device, while a remaining, second part of the diluted exhaust gas flows through the constant volume sampler; a flow rate control mechanism that is provided in the diluted exhaust gas sampling flow path and configured to control a flow rate (Q samp) of the first part of the diluted exhaust gas; and a control device that is configured to control the flow rate control mechanism to set a ratio (Q samp /Q CVS) of the flow rate (Q samp) of the first part of the diluted exhaust gas to a flow rate (Q CVS) of the second part of the diluted exhaust gas, characterized in that the control device is configured to calculate, based on a temperature of the second part of the diluted exhaust gas, the flow rate (Q CVS) of the second part of the diluted exhaust gas to set the ratio (Q samp /Q CVS) so as to make the flow rate (Q samp) of the first part of the diluted exhaust gas equal to a predetermined value.