A nozzle surface cleaning apparatus (80, 280, 380) for cleaning a nozzle surface of a droplet ejection head, comprising: a nozzle surface cleaning liquid deposition device for depositing cleaning liquid onto the nozzle surface of the droplet ejection head; a wiping member travel device for causing a wiping member having absorbing characteristics to travel; a wiping member cleaning liquid deposition device for depositing cleaning liquid onto the wiping member; and a pressing device for pressing and abutting the wiping member, on which the cleaning liquid has been deposited, against the nozzle surface on which the cleaning liquid has been deposited by the nozzle surface cleaning liquid deposition device, and for wiping the nozzle surface with the wiping member, characterised by: a first flow channel for supplying the cleaning liquid to the nozzle surface cleaning liquid deposition device; a second flow channel for supplying the cleaning liquid to the wiping member cleaning liquid deposition device; a common flow channel for supplying the cleaning liquid to the first flow channel and the second flow channel; and either (a) a switching device arranged to switch the cleaning liquid, supplied from the common flow channel, to the first flow channel or to the second flow channel, or (b) a flow channel resistance member provided for the second flow channel. a nozzle surface cleaning liquid deposition device for depositing cleaning liquid onto the nozzle surface of the droplet ejection head; a wiping member travel device for causing a wiping member having absorbing characteristics to travel; a wiping member cleaning liquid deposition device for depositing cleaning liquid onto the wiping member; and a pressing device for pressing and abutting the wiping member, on which the cleaning liquid has been deposited, against the nozzle surface on which the cleaning liquid has been deposited by the nozzle surface cleaning liquid deposition device, and for wiping the nozzle surface with the wiping member, characterised by: a first flow channel for supplying the cleaning liquid to the nozzle surface cleaning liquid deposition device; a second flow channel for supplying the cleaning liquid to the wiping member cleaning liquid deposition device; a common flow channel for supplying the cleaning liquid to the first flow channel and the second flow channel; and either (a) a switching device arranged to switch the cleaning liquid, supplied from the common flow channel, to the first flow channel or to the second flow channel, or (b) a flow channel resistance member provided for the second flow channel. a first flow channel for supplying the cleaning liquid to the nozzle surface cleaning liquid deposition device; a second flow channel for supplying the cleaning liquid to the wiping member cleaning liquid deposition device; a common flow channel for supplying the cleaning liquid to the first flow channel and the second flow channel; and either (a) a switching device arranged to switch the cleaning liquid, supplied from the common flow channel, to the first flow channel or to the second flow channel, or (b) a flow channel resistance member provided for the second flow channel.