Arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, equipped with - a particle beam source for emitting a particle beam, - an illumination system for shaping and deflecting the particle beam for the illumination of a first aperture diaphragm array, wherein the aperture diaphragm array is a multiple-diaphragm array for generating separate particle beamlets, - a second multiple-diaphragm array on which the first multiple-diaphragm array is imaged by means of a condenser lens system (31 - 32) and which has diaphragm apertures which are adapted to the first multiple-diaphragm array while taking into account the imaging scale, wherein - the first multiple-diaphragm array and the second multiple-diaphragm array are constructed as multiple-format diaphragm arrays (41, 42) for generating particle beamlets with different beam cross sections, and - a multibeam deflector system for individual beam deflection of the separate particle beams, and reduction optics having at least one stage for reduced imaging of the particle beamlets passed by the second aperture diaphragm array onto a substrate, wherein - at least three multibeam deflector arrays (51, 52, 53) for individual deflection of the particle beamlets of a particle beamlet array with equal beam cross sections are associated with the first multiple-format diaphragm array and with the second multiple-format diaphragm array, of which - at least a first multibeam deflector array is arranged between the first multiple-format diaphragm array and the second multiple-format diaphragm array in order to generate different cross sections of the particle beamlets after the second multiple-format diaphragm array by means of an individual beam deflection of the individual particle beamlets, and - at least a second multibeam deflector array is arranged in the vicinity of the second multiple-format diaphragm array in order to deflect individual particle beamlets individually in partial crossovers or to deliberately blank individual particle beamlets at an outlet aperture diaphragm arranged in a crossover downstream, characterized in that - at least a third multibeam deflector array is arranged downstream of the second multiple-format diaphragm array at a distance of 10 - 20% of the distance between the multiple-format diaphragm array and crossover in order to generate different positions of the particle beamlets on the substrate. - a particle beam source for emitting a particle beam, - an illumination system for shaping and deflecting the particle beam for the illumination of a first aperture diaphragm array, wherein the aperture diaphragm array is a multiple-diaphragm array for generating separate particle beamlets, - a second multiple-diaphragm array on which the first multiple-diaphragm array is imaged by means of a condenser lens system (31 - 32) and which has diaphragm apertures which are adapted to the first multiple-diaphragm array while taking into account the imaging scale, wherein - the first multiple-diaphragm array and the second multiple-diaphragm array are constructed as multiple-format diaphragm arrays (41, 42) for generating particle beamlets with different beam cross sections, and - a multibeam deflector system for individual beam deflection of the separate particle beams, and reduction optics having at least one stage for reduced imaging of the particle beamlets passed by the second aperture diaphragm array onto a substrate, wherein - at least three multibeam deflector arrays (51, 52, 53) for individual deflection of the particle beamlets of a particle beamlet array with equal beam cross sections are associated with the first multiple-format diaphragm array and with the second multiple-format diaphragm array, of which - at least a first multibeam deflector array is arranged between the first multiple-format diaphragm array and the second multiple-format diaphragm array in order to generate different cross sections of the particle beamlets after the second multiple-format diaphragm array by means of an individual beam deflection of the individual particle beamlets, and - at least a second multibeam deflector array is arranged in the vicinity of the second multiple-format diaphragm array in order to deflect individual particle beamlets individually in partial crossovers or to deliberately blank individual particle beamlets at an outlet aperture diaphragm arranged in a crossover downstream, - at least a first multibeam deflector array is arranged between the first multiple-format diaphragm array and the second multiple-format diaphragm array in order to generate different cross sections of the particle beamlets after the second multiple-format diaphragm array by means of an individual beam deflection of the individual particle beamlets, and - at least a second multibeam deflector array is arranged in the vicinity of the second multiple-format diaphragm array in order to deflect individual particle beamlets individually in partial crossovers or to deliberately blank individual particle beamlets at an outlet aperture diaphragm arranged in a crossover downstream, - at least a third multibeam deflector array is arranged downstream of the second multiple-format diaphragm array at a distance of 10 - 20% of the distance between the multiple-format diaphragm array and crossover in order to generate different positions of the particle beamlets on the substrate.