Embedded system for measuring vacuum characterized in it comprises: - a first compartment in which is situated a cold cathode ionization manometer comprising: - at least two pairs (2001, 2002) of magnets (2001a, 2001b, 2002a, 2002b), preferably circular; - a planar cathode forming a cathode chamber having an elongate, substantially parallelepiped shape and provided with at least one opening, preferably a lateral opening - a planar anode arranged in the cathode chamber, said anode comprising at least two openings (2005a, 2005b), preferably circular; and wherein: - the magnets (2001a, 2001b, 2002a, 2002b) have a magnetization of at least 795774 A/m and a maximum operating temperature of at least 80°C; - the anode and the cathode consist of a non-magnetic conductive material; - the cathode and the anode are arranged in the air gap of said pairs of magnets (2001a, 2001b, 2002a, 2002b) and the openings (2005a, 2005b) of the anode are located respectively between said pairs of magnets (2001, 2002) such that a plasma can be formed between each pair of magnets (2001, 2002), and - the signs of the poles formed by each pair of magnets (2001, 2002) are such that in two neighboring plasmas, the magnetic fields are parallel, of the same intensity and of opposite direction, said first compartment comprising at least one opening allowing the outside atmosphere to come into contact with said manometer; - a second compartment comprising an independent power supply source, an electronic control device, as well as an electronic storage medium and/or a telecommunication device; and wherein: - the first compartment and the second compartment are configured with respect to each other so that, when the embedded system is arranged on a planar substrate, in particular on the peripheral rim of said planar substrate, the thickness E of the embedded system is constant with respect to a surface of said planar substrate on which it is arranged. - a first compartment in which is situated a cold cathode ionization manometer comprising: - at least two pairs (2001, 2002) of magnets (2001a, 2001b, 2002a, 2002b), preferably circular; - a planar cathode forming a cathode chamber having an elongate, substantially parallelepiped shape and provided with at least one opening, preferably a lateral opening - a planar anode arranged in the cathode chamber, said anode comprising at least two openings (2005a, 2005b), preferably circular; and wherein: - the magnets (2001a, 2001b, 2002a, 2002b) have a magnetization of at least 795774 A/m and a maximum operating temperature of at least 80°C; - the anode and the cathode consist of a non-magnetic conductive material; - the cathode and the anode are arranged in the air gap of said pairs of magnets (2001a, 2001b, 2002a, 2002b) and the openings (2005a, 2005b) of the anode are located respectively between said pairs of magnets (2001, 2002) such that a plasma can be formed between each pair of magnets (2001, 2002), and - the signs of the poles formed by each pair of magnets (2001, 2002) are such that in two neighboring plasmas, the magnetic fields are parallel, of the same intensity and of opposite direction, said first compartment comprising at least one opening allowing the outside atmosphere to come into contact with said manometer; - a second compartment comprising an independent power supply source, an electronic control device, as well as an electronic storage medium and/or a telecommunication device; and wherein: - the first compartment and the second compartment are configured with respect to each other so that, when the embedded system is arranged on a planar substrate, in particular on the peripheral rim of said planar substrate, the thickness E of the embedded system is constant with respect to a surface of said planar substrate on which it is arranged. - at least two pairs (2001, 2002) of magnets (2001a, 2001b, 2002a, 2002b), preferably circular; - a planar cathode forming a cathode chamber having an elongate, substantially parallelepiped shape and provided with at least one opening, preferably a lateral opening - a planar anode arranged in the cathode chamber, said anode comprising at least two openings (2005a, 2005b), preferably circular; - the magnets (2001a, 2001b, 2002a, 2002b) have a magnetization of at least 795774 A/m and a maximum operating temperature of at least 80°C; - the anode and the cathode consist of a non-magnetic conductive material; - the cathode and the anode are arranged in the air gap of said pairs of magnets (2001a, 2001b, 2002a, 2002b) and the openings (2005a, 2005b) of the anode are located respectively between said pairs of magnets (2001, 2002) such that a plasma can be formed between each pair of magnets (2001, 2002), and - the signs of the poles formed by each pair of magnets (2001, 2002) are such that in two neighboring plasmas, the magnetic fields are parallel, of the same intensity and of opposite direction, - a second compartment comprising an independent power supply source, an electronic control device, as well as an electronic storage medium and/or a telecommunication device; - the first compartment and the second compartment are configured with respect to each other so that, when the embedded system is arranged on a planar substrate, in particular on the peripheral rim of said planar substrate, the thickness E of the embedded system is constant with respect to a surface of said planar substrate on which it is arranged.