A fluid flow system for directing a fluid toward a use device comprising: a plurality of resistance temperature detectors (RTDs) (102, 202, 302, 402, 502); a heating circuit (214, 314) in electrical communication with the plurality of RTDs (102, 202, 302, 402, 502) and capable of applying electrical power to the RTDs (102, 202, 302, 402, 502); a measurement circuit (210, 310) in communication with the plurality of RTDs (102, 202, 302, 402, 502); a controller (212, 312) in communication with the heating circuit (214, 314) and the measurement circuit (210, 310) and capable of operating each of the plurality of RTDs (102, 202, 302, 402, 502) in a heating mode via the heating circuit (214, 314) and a measurement mode via the measurement circuit (210, 310), the controller (212, 312) being configured to: operate each of the one or more of the plurality of RTDs (102, 202, 302, 402, 502) in the heating mode of operation in order to maintain each of the one or more RTDs (102, 202, 302, 402, 502) at a different elevated characterization temperature to induce a deposit from the process fluid to form on at least one of the one or more RTDs (102, 202, 302, 402, 502), the characterization temperature of one RTD (102, 202, 302, 402, 502) being different from the characterization temperature of all other RTDs (102, 202, 302, 402, 502), at least one of the characterization temperatures being higher than a typical operating temperature of the use device; for each of the one or more RTDs (102, 202, 302, 402, 502), periodically switch the RTD (102, 202, 302, 402, 502) between the heating mode and the measurement mode in order to measure the temperature of the RTD (102, 202, 302, 402, 502), observe changes in the thermal behavior of the RTD (102, 202, 302, 402, 502) in one or both of the heating mode and the measurement mode, and characterize a level of deposit from the process fluid onto the RTD (102, 202, 302, 402, 502) based on the observed changes; determine a temperature-dependent deposition profile based on the characterized level of deposit of each of the one or more RTDs (102, 202, 302, 402, 502); and determine if a deposit condition exists for the use device based on the deposition profile. a plurality of resistance temperature detectors (RTDs) (102, 202, 302, 402, 502); a heating circuit (214, 314) in electrical communication with the plurality of RTDs (102, 202, 302, 402, 502) and capable of applying electrical power to the RTDs (102, 202, 302, 402, 502); a measurement circuit (210, 310) in communication with the plurality of RTDs (102, 202, 302, 402, 502); a controller (212, 312) in communication with the heating circuit (214, 314) and the measurement circuit (210, 310) and capable of operating each of the plurality of RTDs (102, 202, 302, 402, 502) in a heating mode via the heating circuit (214, 314) and a measurement mode via the measurement circuit (210, 310), the controller (212, 312) being configured to: operate each of the one or more of the plurality of RTDs (102, 202, 302, 402, 502) in the heating mode of operation in order to maintain each of the one or more RTDs (102, 202, 302, 402, 502) at a different elevated characterization temperature to induce a deposit from the process fluid to form on at least one of the one or more RTDs (102, 202, 302, 402, 502), the characterization temperature of one RTD (102, 202, 302, 402, 502) being different from the characterization temperature of all other RTDs (102, 202, 302, 402, 502), at least one of the characterization temperatures being higher than a typical operating temperature of the use device; for each of the one or more RTDs (102, 202, 302, 402, 502), periodically switch the RTD (102, 202, 302, 402, 502) between the heating mode and the measurement mode in order to measure the temperature of the RTD (102, 202, 302, 402, 502), observe changes in the thermal behavior of the RTD (102, 202, 302, 402, 502) in one or both of the heating mode and the measurement mode, and characterize a level of deposit from the process fluid onto the RTD (102, 202, 302, 402, 502) based on the observed changes; periodically switch the RTD (102, 202, 302, 402, 502) between the heating mode and the measurement mode in order to measure the temperature of the RTD (102, 202, 302, 402, 502), observe changes in the thermal behavior of the RTD (102, 202, 302, 402, 502) in one or both of the heating mode and the measurement mode, and characterize a level of deposit from the process fluid onto the RTD (102, 202, 302, 402, 502) based on the observed changes; determine a temperature-dependent deposition profile based on the characterized level of deposit of each of the one or more RTDs (102, 202, 302, 402, 502); and determine if a deposit condition exists for the use device based on the deposition profile.