An apparatus to clean a sample for spectroscopic analysis, comprising: a single dispenser configured to dispense a solution comprising an organic solvent that is selected to remove interferant particles from a slide substrate while retaining particles of interest that have been collected onto the slide substrate; a sample fixing station configured to receive a slide substrate having a sample thereon, wherein the sample fixing station comprises a heated surface upon which the slide substrate is heated to a controlled temperature for a predetermined heating time, to fix the sample to a substrate surface of the slide substrate; an incubation station configured to receive the slide substrate after the sample has been fixed at the fixing station, wherein the incubation station holds the sample for a predetermined incubation time; a washing station configured to receive the slide substrate after the sample has been incubated at the incubation station, wherein the dispenser is configured to dispense the organic solvent onto the sample to wash the sample on the slide substrate; a drying station configured to receive the slide substrate from the washing station after the slide substrate has been washed, wherein the drying station comprises a heated surface that is heated to a controlled temperature to dry the sample by applying heat to the slide substrate for a predetermined drying time that is sufficient to remove any organic solvent dispensed by the dispenser onto the slide substrate, wherein the sample on the slide substrate after processing at the drying station has retained particles of interest and interferant particles are removed from the slide substrate; and a rotary platform configured to automatically serially feed the slide substrate: from the sample fixing station to the incubation station; from the incubation station to the washing station; and from the washing station to the drying station; and wherein the single dispenser is configured to dispense the solution comprising an organic solvent to the slide substrate to implement processes associated with each of the sample fixing station, the sample incubation station and the sample washing station, such that, after the sample substrate leaves the drying station, any concentrations of impurities are removed from the sample that would otherwise mask the spectral signature of the retained particles of interest within the sample. a single dispenser configured to dispense a solution comprising an organic solvent that is selected to remove interferant particles from a slide substrate while retaining particles of interest that have been collected onto the slide substrate; a sample fixing station configured to receive a slide substrate having a sample thereon, wherein the sample fixing station comprises a heated surface upon which the slide substrate is heated to a controlled temperature for a predetermined heating time, to fix the sample to a substrate surface of the slide substrate; an incubation station configured to receive the slide substrate after the sample has been fixed at the fixing station, wherein the incubation station holds the sample for a predetermined incubation time; a washing station configured to receive the slide substrate after the sample has been incubated at the incubation station, wherein the dispenser is configured to dispense the organic solvent onto the sample to wash the sample on the slide substrate; a drying station configured to receive the slide substrate from the washing station after the slide substrate has been washed, wherein the drying station comprises a heated surface that is heated to a controlled temperature to dry the sample by applying heat to the slide substrate for a predetermined drying time that is sufficient to remove any organic solvent dispensed by the dispenser onto the slide substrate, wherein the sample on the slide substrate after processing at the drying station has retained particles of interest and interferant particles are removed from the slide substrate; and a rotary platform configured to automatically serially feed the slide substrate: from the sample fixing station to the incubation station; from the incubation station to the washing station; and from the washing station to the drying station; and from the sample fixing station to the incubation station; from the incubation station to the washing station; and from the washing station to the drying station; and wherein the single dispenser is configured to dispense the solution comprising an organic solvent to the slide substrate to implement processes associated with each of the sample fixing station, the sample incubation station and the sample washing station, such that, after the sample substrate leaves the drying station, any concentrations of impurities are removed from the sample that would otherwise mask the spectral signature of the retained particles of interest within the sample.