Method (300; 400) for evaluating an apparatus having at least one antenna array, the apparatus configured for forming a plurality of communication beam patterns using the antenna array, the method comprising: positioning (310; 410) of the apparatus in a measurement environment or changing the relative position of the probe antenna/antennas of the measurement environment adapted to measure beam patterns and/or beam correspondence between a transmission beam pattern and a reception beam pattern; controlling (320; 420) the apparatus so as to form a predefined beam pattern of the plurality of communication beam patterns; and measuring (330; 430) the predefined beam pattern using the measurement environment and/or the apparatus; wherein the predefined beam pattern is a first of a plurality (42; 44) of predefined beam patterns, the plurality (42; 44) of predefined beam patterns being a subset of the plurality of communication beam patterns, characterized in that the apparatus is controlled so as to sequentially form the plurality (42; 44) of predefined beam patterns, and wherein the respective predefined beam pattern is measured, the method further comprising: changing a relative position between the apparatus and the measurement environment into a changed relative position after having measured the plurality of predefined beam patterns; and such that the apparatus is controlled to form the plurality of predefined beam pattens or a further plurality of predefined beam patterns in the changed relative position; the method comprising measuring the plurality of predefined beam patterns or the further plurality of beam patterns in the changed relative position. positioning (310; 410) of the apparatus in a measurement environment or changing the relative position of the probe antenna/antennas of the measurement environment adapted to measure beam patterns and/or beam correspondence between a transmission beam pattern and a reception beam pattern; controlling (320; 420) the apparatus so as to form a predefined beam pattern of the plurality of communication beam patterns; and measuring (330; 430) the predefined beam pattern using the measurement environment and/or the apparatus; wherein the predefined beam pattern is a first of a plurality (42; 44) of predefined beam patterns, the plurality (42; 44) of predefined beam patterns being a subset of the plurality of communication beam patterns, characterized in that the apparatus is controlled so as to sequentially form the plurality (42; 44) of predefined beam patterns, and wherein the respective predefined beam pattern is measured, the method further comprising: changing a relative position between the apparatus and the measurement environment into a changed relative position after having measured the plurality of predefined beam patterns; and such that the apparatus is controlled to form the plurality of predefined beam pattens or a further plurality of predefined beam patterns in the changed relative position; the method comprising measuring the plurality of predefined beam patterns or the further plurality of beam patterns in the changed relative position. changing a relative position between the apparatus and the measurement environment into a changed relative position after having measured the plurality of predefined beam patterns; and such that the apparatus is controlled to form the plurality of predefined beam pattens or a further plurality of predefined beam patterns in the changed relative position; the method comprising measuring the plurality of predefined beam patterns or the further plurality of beam patterns in the changed relative position.