An organic light emitting device (OLED), comprising: a substrate; a plurality of OLED pixels (Pixel 1, Pixel 2, Pixel 3), each comprising an OLED pixel (Pixel 1) having an organic stack, disposed over the substrate; a first barrier element (222,), disposed over the substrate and forming an insulating grid surrounding the OLED pixel; and a second barrier, disposed over the OLED pixel and first barrier element, wherein the first barrier element predominantly provides an edge seal for each respective OLED pixel, and the second barrier element encapsulates the OLED pixel to provide a top seal; and characterized in that: each organic stack is contained within its own hermetically sealed structure; and the first barrier element comprises at least one of: - an amorphous or polycrystalline material that includes one or more materials from the group consisting of: a metal oxide, metal nitride, metal oxynitride, metal carbide and metal oxyboride; - multiple alternate layers of SiO x N y /SiO x C y deposited at room temperature by plasma enhanced chemical vapor deposition (PECVD); - a single hybrid barrier layer deposited by plasma enhanced chemical vapor deposition (PECVD) of an organic precursor with a reactive gas; - a hybrid material comprising inorganic SiO 2 and polymeric silicone deposited at room temperature; and - a hybrid barrier material including SiO x C y H z, wherein each respective OLED pixel comprises a stack having a cathode layer, an organic layer and an anode layer, wherein each stack is patterned and surrounded by the first barrier element to isolate at least one of the organic layer of the respective OLED pixel from an organic layer of adjacent stacks, the cathode layer of the respective OLED pixel from a cathode layer of adjacent stacks, and the anode layer of the respective OLED pixel from an anode layer of adjacent stacks, and wherein the first barrier element is inverted to form a shadow mask for OLED pixel isolation from the first barrier element during disposition. a substrate; a plurality of OLED pixels (Pixel 1, Pixel 2, Pixel 3), each comprising an OLED pixel (Pixel 1) having an organic stack, disposed over the substrate; a first barrier element (222,), disposed over the substrate and forming an insulating grid surrounding the OLED pixel; and a second barrier, disposed over the OLED pixel and first barrier element, wherein the first barrier element predominantly provides an edge seal for each respective OLED pixel, and the second barrier element encapsulates the OLED pixel to provide a top seal; and characterized in that: each organic stack is contained within its own hermetically sealed structure; and the first barrier element comprises at least one of: - an amorphous or polycrystalline material that includes one or more materials from the group consisting of: a metal oxide, metal nitride, metal oxynitride, metal carbide and metal oxyboride; - multiple alternate layers of SiO x N y /SiO x C y deposited at room temperature by plasma enhanced chemical vapor deposition (PECVD); - a single hybrid barrier layer deposited by plasma enhanced chemical vapor deposition (PECVD) of an organic precursor with a reactive gas; - a hybrid material comprising inorganic SiO 2 and polymeric silicone deposited at room temperature; and - a hybrid barrier material including SiO x C y H z, each organic stack is contained within its own hermetically sealed structure; and the first barrier element comprises at least one of: - an amorphous or polycrystalline material that includes one or more materials from the group consisting of: a metal oxide, metal nitride, metal oxynitride, metal carbide and metal oxyboride; - multiple alternate layers of SiO x N y /SiO x C y deposited at room temperature by plasma enhanced chemical vapor deposition (PECVD); - a single hybrid barrier layer deposited by plasma enhanced chemical vapor deposition (PECVD) of an organic precursor with a reactive gas; - a hybrid material comprising inorganic SiO 2 and polymeric silicone deposited at room temperature; and - a hybrid barrier material including SiO x C y H z, - an amorphous or polycrystalline material that includes one or more materials from the group consisting of: a metal oxide, metal nitride, metal oxynitride, metal carbide and metal oxyboride; - multiple alternate layers of SiO x N y /SiO x C y deposited at room temperature by plasma enhanced chemical vapor deposition (PECVD); - a single hybrid barrier layer deposited by plasma enhanced chemical vapor deposition (PECVD) of an organic precursor with a reactive gas; - a hybrid material comprising inorganic SiO 2 and polymeric silicone deposited at room temperature; and - a hybrid barrier material including SiO x C y H z, wherein each respective OLED pixel comprises a stack having a cathode layer, an organic layer and an anode layer, wherein each stack is patterned and surrounded by the first barrier element to isolate at least one of the organic layer of the respective OLED pixel from an organic layer of adjacent stacks, the cathode layer of the respective OLED pixel from a cathode layer of adjacent stacks, and the anode layer of the respective OLED pixel from an anode layer of adjacent stacks, and wherein the first barrier element is inverted to form a shadow mask for OLED pixel isolation from the first barrier element during disposition.