An apparatus for depositing material on the surface of a substrate, comprising at least one deposition source comprising a material outlet opening and being adapted to emit material from the material outlet opening, wherein the material outlet opening has an elongate central region comprising two opposite straight parallel spaced edges delimiting the material outlet opening on opposite sides, wherein an axis extending parallel to and in the middle between the two opposite edges is a longitudinal axis of the central region of the material outlet opening, a substrate holder adapted to support a substrate thereon, a support structure comprising a source mounting portion, which is selectively rotatable about a first axis and to which the at least one deposition source is mounted such that it rotates about the first axis together with the source mounting portion and such that the longitudinal axis of the central region of the material outlet opening of the at least one deposition source is parallel to the first axis, a shielding element disposed between the at least one deposition source and the substrate holder and having an aperture, which has two opposite sides on opposite sides of a straight line extending parallel to the first axis, and a drive arrangement adapted to selectively cause a rotation of the source mounting portion about the first axis, selective adjustment of a width of the aperture defined by the distance between the two opposite sides of the aperture perpendicular to the first axis, a relative movement between the substrate holder on the one hand and the source mounting portion and the shielding element on the other hand along a second axis, which extends perpendicularly to the first axis, and a relative movement between the source mounting portion on the one hand and the substrate holder and the shielding element on the other hand along the second axis and along a third axis, which extends perpendicularly to the first axis and to the second axis. at least one deposition source comprising a material outlet opening and being adapted to emit material from the material outlet opening, wherein the material outlet opening has an elongate central region comprising two opposite straight parallel spaced edges delimiting the material outlet opening on opposite sides, wherein an axis extending parallel to and in the middle between the two opposite edges is a longitudinal axis of the central region of the material outlet opening, a substrate holder adapted to support a substrate thereon, a support structure comprising a source mounting portion, which is selectively rotatable about a first axis and to which the at least one deposition source is mounted such that it rotates about the first axis together with the source mounting portion and such that the longitudinal axis of the central region of the material outlet opening of the at least one deposition source is parallel to the first axis, a shielding element disposed between the at least one deposition source and the substrate holder and having an aperture, which has two opposite sides on opposite sides of a straight line extending parallel to the first axis, and a drive arrangement adapted to selectively cause a rotation of the source mounting portion about the first axis, selective adjustment of a width of the aperture defined by the distance between the two opposite sides of the aperture perpendicular to the first axis, a relative movement between the substrate holder on the one hand and the source mounting portion and the shielding element on the other hand along a second axis, which extends perpendicularly to the first axis, and a relative movement between the source mounting portion on the one hand and the substrate holder and the shielding element on the other hand along the second axis and along a third axis, which extends perpendicularly to the first axis and to the second axis. a rotation of the source mounting portion about the first axis, selective adjustment of a width of the aperture defined by the distance between the two opposite sides of the aperture perpendicular to the first axis, a relative movement between the substrate holder on the one hand and the source mounting portion and the shielding element on the other hand along a second axis, which extends perpendicularly to the first axis, and a relative movement between the source mounting portion on the one hand and the substrate holder and the shielding element on the other hand along the second axis and along a third axis, which extends perpendicularly to the first axis and to the second axis.