An immersion exposure apparatus for exposing a substrate, the apparatus comprising: a last optical element arranged to be above the substrate during exposure; and a containment member arranged to surround the last optical element for containing immersion liquid in a space defined between the substrate and the last optical element, characterised in that the containment member comprises: a first inlet arranged for removing immersion liquid from beneath the containment member; an outlet arranged radially outwardly from the first inlet with respect to the space for supplying fluid to beneath the containment member; and a second inlet arranged radially outwardly from the outlet with respect to the space for removing fluid from beneath the containment member, wherein the containment member has a bottom side surface that is arranged to face the substrate during exposure, the first inlet being arranged at the bottom side surface to remove immersion liquid from a gap between the bottom side surface and the substrate, and wherein the containment member is provided such that during the exposure, a distance between the bottom side surface at which the first inlet is arranged and the substrate is shorter than a distance between the end surface of the optical element and the substrate. a last optical element arranged to be above the substrate during exposure; and a containment member arranged to surround the last optical element for containing immersion liquid in a space defined between the substrate and the last optical element, characterised in that the containment member comprises: a first inlet arranged for removing immersion liquid from beneath the containment member; an outlet arranged radially outwardly from the first inlet with respect to the space for supplying fluid to beneath the containment member; and a second inlet arranged radially outwardly from the outlet with respect to the space for removing fluid from beneath the containment member, wherein the containment member has a bottom side surface that is arranged to face the substrate during exposure, the first inlet being arranged at the bottom side surface to remove immersion liquid from a gap between the bottom side surface and the substrate, and wherein the containment member is provided such that during the exposure, a distance between the bottom side surface at which the first inlet is arranged and the substrate is shorter than a distance between the end surface of the optical element and the substrate. a first inlet arranged for removing immersion liquid from beneath the containment member; an outlet arranged radially outwardly from the first inlet with respect to the space for supplying fluid to beneath the containment member; and a second inlet arranged radially outwardly from the outlet with respect to the space for removing fluid from beneath the containment member, wherein the containment member has a bottom side surface that is arranged to face the substrate during exposure, the first inlet being arranged at the bottom side surface to remove immersion liquid from a gap between the bottom side surface and the substrate, and wherein the containment member is provided such that during the exposure, a distance between the bottom side surface at which the first inlet is arranged and the substrate is shorter than a distance between the end surface of the optical element and the substrate.