A broad spectrum liquid cleaning composition, comprising: a quaternary ammonium halogen having a structural formula wherein X - is a halogen, wherein each R 1 and R 2, independently, is an alkyl having from 1 to 7 carbon atoms and wherein each R 3 and R 4, independently, is an alkyl having from 8 to 25 carbon atoms; or an N-alkyl dimethyl benzyl ammonium chloride wherein said alkyl has from 12 to 18 carbon atoms; or an N-alkyl dimethyl ethyl benzyl ammonium chloride wherein said alkyl has from 12 to 18 carbon atoms, wherein the quaternary ammonium halogen is present in an amount from 7 wt.% to 25 wt.% based upon the total weight of the cleaning composition; an alkaline agent that is an organic alcohol amine, a strong base, sodium carbonate, or sodium bicarbonate, wherein the alkaline agent is present in an amount from 5 wt.% to 10 wt.% based upon the total weight of the cleaning composition; a chelant that is an alkylglycine organic acid, iminodisuccinic acid, ethylene diaminedisuccinate, carboxymethyl inulin, or glutamic acid N,N-diacetic acid; wherein the chelant is present in an amount from 0.2 wt.% to 3.0 wt.% based on the total weight of the cleaning composition, a nonionic surfactant coupler comprising one or more alkyl amine oxides having from 6 to 14 carbon atoms in an amount of from 0.50 wt.% to 5.0 wt.% based on the total weight of the cleaning composition; at least one alkoxylated nonionic surfactant comprising an amine alkoxylated surfactant having from 2 to 20 repeat units of an alkylene oxide, or at least one alcohol alkoxylated nonionic surfactant, or an alkoxylated block copolymer of ethylene oxide-propylene oxide; a solvent system comprising water, or an aliphatic alcohol, or both; wherein said broad spectrum cleaning composition has less than 0.5 wt.% of ethylene diamine tetraacetic acid (EDTA), hydroxyethylethylenediamine tetraacetic acid (HEDTA), and ethylene triaminepentaacetic acid, based upon the total weight of the cleaning composition, wherein said broad spectrum cleaning composition has less than 1 wt.% of phenol, and wherein the pH of said liquid cleaning composition is from 7 to 13. wherein X - is a halogen, wherein each R 1 and R 2, independently, is an alkyl having from 1 to 7 carbon atoms and wherein each R 3 and R 4, independently, is an alkyl having from 8 to 25 carbon atoms; or an N-alkyl dimethyl benzyl ammonium chloride wherein said alkyl has from 12 to 18 carbon atoms; or an N-alkyl dimethyl ethyl benzyl ammonium chloride wherein said alkyl has from 12 to 18 carbon atoms, wherein the quaternary ammonium halogen is present in an amount from 7 wt.% to 25 wt.% based upon the total weight of the cleaning composition; an alkaline agent that is an organic alcohol amine, a strong base, sodium carbonate, or sodium bicarbonate, wherein the alkaline agent is present in an amount from 5 wt.% to 10 wt.% based upon the total weight of the cleaning composition; a chelant that is an alkylglycine organic acid, iminodisuccinic acid, ethylene diaminedisuccinate, carboxymethyl inulin, or glutamic acid N,N-diacetic acid; wherein the chelant is present in an amount from 0.2 wt.% to 3.0 wt.% based on the total weight of the cleaning composition, a nonionic surfactant coupler comprising one or more alkyl amine oxides having from 6 to 14 carbon atoms in an amount of from 0.50 wt.% to 5.0 wt.% based on the total weight of the cleaning composition; at least one alkoxylated nonionic surfactant comprising an amine alkoxylated surfactant having from 2 to 20 repeat units of an alkylene oxide, or at least one alcohol alkoxylated nonionic surfactant, or an alkoxylated block copolymer of ethylene oxide-propylene oxide; a solvent system comprising water, or an aliphatic alcohol, or both; wherein said broad spectrum cleaning composition has less than 0.5 wt.% of ethylene diamine tetraacetic acid (EDTA), hydroxyethylethylenediamine tetraacetic acid (HEDTA), and ethylene triaminepentaacetic acid, based upon the total weight of the cleaning composition, wherein said broad spectrum cleaning composition has less than 1 wt.% of phenol, and wherein the pH of said liquid cleaning composition is from 7 to 13.