An imprint lithography method of configuring a multilayer wearable eyepiece, the imprint lithography method comprising: forming a first optical layer (200, 300, 400, 700, 800) by: imprinting a functional pattern comprising first features of a first order of magnitude in size at first locations on a side of a first substrate using shallow features of the first order of magnitude in size of a patterning template, the first features comprising first diffraction gratings configured to project light of a first wavelength range and to focus a virtual image at a first depth plane, wherein the first diffraction gratings comprise a first incoupling grating and form a first orthogonal pupil expander region and a first exit pupil expander region; and imprinting an auxiliary pattern (206, 306, 406) surrounding the functional pattern, the auxiliary pattern comprising: additional first features of the first order of magnitude in size, wherein the additional first features comprise anti-reflective features; and second features of a second order of magnitude in size respectively at second locations spaced laterally apart from the first locations on the side of the first substrate using deep features of the second order of magnitude in size of the patterning template, the second order of magnitude being greater in size than the first order of magnitude; wherein the functional pattern and the auxiliary pattern are imprinted in a single imprinting step; curing the first features, the additional first features and the second features; forming a second optical layer (200, 300, 400, 700, 800) comprising a second substrate and thereon imprinted second diffraction gratings configured to project light of a second wavelength range and to focus the virtual image at a second depth plane, wherein the second diffraction gratings comprise a second incoupling grating and form a second orthogonal pupil expander region and a second exit pupil expander region; and attaching the first optical layer (200, 300, 400, 700, 800) to the second optical layer (200, 300, 400, 700, 800) along the second features to define a gap between the first substrate and the second substrate, thereby yielding at least a portion of the multilayer wearable eyepiece. imprinting a functional pattern comprising first features of a first order of magnitude in size at first locations on a side of a first substrate using shallow features of the first order of magnitude in size of a patterning template, the first features comprising first diffraction gratings configured to project light of a first wavelength range and to focus a virtual image at a first depth plane, wherein the first diffraction gratings comprise a first incoupling grating and form a first orthogonal pupil expander region and a first exit pupil expander region; and imprinting an auxiliary pattern (206, 306, 406) surrounding the functional pattern, the auxiliary pattern comprising: additional first features of the first order of magnitude in size, wherein the additional first features comprise anti-reflective features; and second features of a second order of magnitude in size respectively at second locations spaced laterally apart from the first locations on the side of the first substrate using deep features of the second order of magnitude in size of the patterning template, the second order of magnitude being greater in size than the first order of magnitude; wherein the functional pattern and the auxiliary pattern are imprinted in a single imprinting step; curing the first features, the additional first features and the second features; forming a second optical layer (200, 300, 400, 700, 800) comprising a second substrate and thereon imprinted second diffraction gratings configured to project light of a second wavelength range and to focus the virtual image at a second depth plane, wherein the second diffraction gratings comprise a second incoupling grating and form a second orthogonal pupil expander region and a second exit pupil expander region; and attaching the first optical layer (200, 300, 400, 700, 800) to the second optical layer (200, 300, 400, 700, 800) along the second features to define a gap between the first substrate and the second substrate, thereby yielding at least a portion of the multilayer wearable eyepiece. additional first features of the first order of magnitude in size, wherein the additional first features comprise anti-reflective features; and second features of a second order of magnitude in size respectively at second locations spaced laterally apart from the first locations on the side of the first substrate using deep features of the second order of magnitude in size of the patterning template, the second order of magnitude being greater in size than the first order of magnitude; wherein the functional pattern and the auxiliary pattern are imprinted in a single imprinting step; curing the first features, the additional first features and the second features; forming a second optical layer (200, 300, 400, 700, 800) comprising a second substrate and thereon imprinted second diffraction gratings configured to project light of a second wavelength range and to focus the virtual image at a second depth plane, wherein the second diffraction gratings comprise a second incoupling grating and form a second orthogonal pupil expander region and a second exit pupil expander region; and attaching the first optical layer (200, 300, 400, 700, 800) to the second optical layer (200, 300, 400, 700, 800) along the second features to define a gap between the first substrate and the second substrate, thereby yielding at least a portion of the multilayer wearable eyepiece.