mhurhangee/ep-ind-claims huggingface dataset:
A membrane catalyst layer assembly of an electrochemical device, comprising: a polymer electrolyte membrane; and a pair of catalyst layers disposed on main surfaces of the polymer electrolyte membrane, wherein one of the pair of catalyst layers contains: mesoporous carbon with an average particle size of 100 nm or more, the mesoporous carbon having mesopores with a mode radius in the range of 1 to 25 nm and a pore volume in the range of 1.0 to 3.0 cm 3 /g; a catalytic metal supported on the mesoporous carbon; a proton-conducting resin; and at least one type of carbon particles with a smaller average particle size than the mesoporous carbon, and the one of the pair of catalyst layers has a first surface layer which is adjacent to the polymer electrolyte membrane and contains the mesoporous carbon, and a second surface layer which is opposite the polymer electrolyte membrane and contains the mesoporous carbon, a volume percentage of the mesoporous carbon in the second surface layer is lower than a volume percentage of the mesoporous carbon in the first surface layer, and a volume percentage of the catalytic metal in a second surface layer opposite the polymer electrolyte membrane is lower than a volume percentage of the catalytic metal in a first surface layer adjacent to the polymer electrolyte membrane. a polymer electrolyte membrane; and a pair of catalyst layers disposed on main surfaces of the polymer electrolyte membrane, wherein one of the pair of catalyst layers contains: mesoporous carbon with an average particle size of 100 nm or more, the mesoporous carbon having mesopores with a mode radius in the range of 1 to 25 nm and a pore volume in the range of 1.0 to 3.0 cm 3 /g; a catalytic metal supported on the mesoporous carbon; a proton-conducting resin; and at least one type of carbon particles with a smaller average particle size than the mesoporous carbon, and mesoporous carbon with an average particle size of 100 nm or more, the mesoporous carbon having mesopores with a mode radius in the range of 1 to 25 nm and a pore volume in the range of 1.0 to 3.0 cm 3 /g; a catalytic metal supported on the mesoporous carbon; a proton-conducting resin; and at least one type of carbon particles with a smaller average particle size than the mesoporous carbon, and the one of the pair of catalyst layers has a first surface layer which is adjacent to the polymer electrolyte membrane and contains the mesoporous carbon, and a second surface layer which is opposite the polymer electrolyte membrane and contains the mesoporous carbon, a volume percentage of the mesoporous carbon in the second surface layer is lower than a volume percentage of the mesoporous carbon in the first surface layer, and a volume percentage of the catalytic metal in a second surface layer opposite the polymer electrolyte membrane is lower than a volume percentage of the catalytic metal in a first surface layer adjacent to the polymer electrolyte membrane.
Fluid valve with axial flow, in particular a coolant shut-off valve with a solenoid comprising a coil, a core and a flow-through armature unit, as well as magnetic reflux elements (18, 20, 22), a housing in which the solenoid is arranged, a first connection piece fastened to a first axial end of the housing and in which a flow-around body is arranged which comprises a valve seat, a second connection piece mounted at an opposite axial end of the housing, and a closing surface at an axial end portion (54, 56) of the armature unit, which cooperates with the valve seat, characterized in that the flow-around body has an axially symmetric flow-around region with a first incident flow surface and an outflow surface which together comprise at least three surface sections (84, 85, 86, 88, 91) arranged one behind the other in the axial direction, the curvature of which changes between concave and convex from one surface section (84, 85, 86, 88, 91) to the axially adjacent surface section (84, 85, 86, 88, 91), the flow-around body being made as a single piece from an elastomer or as a two-component injection molded part and comprising an outer circumferential ring connected with the flow-around region of the flow-around body via webs.
A pharmaceutical composition comprising 1,3-propanedisulfonic acid or a pharmaceutically acceptable salt thereof for use in a method of treating or preventing an amyloid related disease in a subject, wherein the 1,3-propanedisulfonic acid or pharmaceutically acceptable salt thereof is administered at a dosage of about 1200 mg twice daily for a creatinine clearance rate of >80 mL/min, a dosage of about 800 mg twice daily for a creatinine clearance rate of between about 30 and 80 mL/min, or a dosage of about 400 mg twice daily for a creatinine clearance rate of between about 20 and 30 mL/min.
A metallic nanoparticle dispersion comprising metallic nanoparticles and a liquid carrier, the dispersion having a viscosity between 2 and 100 mPa.s at 25°C and at a shear rate of 90 s -1, characterized in that the dispersion further includes a dispersion-stabilizing compound according to Formula I, wherein Q represents the necessary atoms to form a substituted or unsubstituted five or six membered heteroaromatic ring; M is selected from the group consisting of a proton, a monovalent cationic group and an acyl group.
An apparatus comprising: a printed circuit board; a flexible printed circuit; a rigid structure component disposed on a first side of the printed circuit board; an interconnection interface disposed on a second side of the printed circuit board opposite to the rigid structure component, and configured to interconnect the flexible printed circuit and the printed circuit board; and a conductive interconnection material disposed at the interconnection interface between the flexible printed circuit and the printed circuit board, wherein the interconnection interface comprises a first interconnection terminal and a second interconnection terminal, characterized in that the first interconnection terminal comprises a plurality of adjacent bond pads and the second interconnection terminal comprises a plurality of adjacent bond pads, wherein in a connected state of the flexible printed circuit and the printed circuit board, a channel is formed between a pair of adjacent bond pads of the first terminal and on a corresponding bond pad of the second terminal, a pitch of a pitch pattern of the plurality of adjacent bond pads of the first interconnection terminal is constant and a pitch of a pitch pattern of the plurality of adjacent bond pads of the second interconnection terminal is varied, and the first interconnection terminal comprises a first set of the plurality of adjacent bond pads and a second set of the plurality of adjacent bond pads, wherein a width of a bond pad in the first set is greater than a width of a bond pad in the second set. a printed circuit board; a flexible printed circuit; a rigid structure component disposed on a first side of the printed circuit board; an interconnection interface disposed on a second side of the printed circuit board opposite to the rigid structure component, and configured to interconnect the flexible printed circuit and the printed circuit board; and a conductive interconnection material disposed at the interconnection interface between the flexible printed circuit and the printed circuit board, wherein the interconnection interface comprises a first interconnection terminal and a second interconnection terminal, characterized in that the first interconnection terminal comprises a plurality of adjacent bond pads and the second interconnection terminal comprises a plurality of adjacent bond pads, wherein in a connected state of the flexible printed circuit and the printed circuit board, a channel is formed between a pair of adjacent bond pads of the first terminal and on a corresponding bond pad of the second terminal, a pitch of a pitch pattern of the plurality of adjacent bond pads of the first interconnection terminal is constant and a pitch of a pitch pattern of the plurality of adjacent bond pads of the second interconnection terminal is varied, and the first interconnection terminal comprises a first set of the plurality of adjacent bond pads and a second set of the plurality of adjacent bond pads, wherein a width of a bond pad in the first set is greater than a width of a bond pad in the second set.
An optical measurement system, comprising: an image generation system configured for generating test image information and outputting light containing the test image information to an optical device under test; an image measurement system configured for obtaining detected image information according to the light passing through the optical device under test; and a control system configured for calculating and/or selecting the test image information and outputting the test image information to the image generation system, and characterized in that the test image information further comprises a wavefront compensation, wherein the wavefront compensation is configured for compensating a missing part in the optical device under test and/or the wavefront compensation is configured for simulating a light field modulated by a subsequently unassembled lens element according to a design file to measure and adjust the position of at least one lens element of the optical device under test in a lens assembling process of the optical device under test. an image generation system configured for generating test image information and outputting light containing the test image information to an optical device under test; an image measurement system configured for obtaining detected image information according to the light passing through the optical device under test; and a control system configured for calculating and/or selecting the test image information and outputting the test image information to the image generation system, and characterized in that the test image information further comprises a wavefront compensation, wherein the wavefront compensation is configured for compensating a missing part in the optical device under test and/or the wavefront compensation is configured for simulating a light field modulated by a subsequently unassembled lens element according to a design file to measure and adjust the position of at least one lens element of the optical device under test in a lens assembling process of the optical device under test.
A corrugated-tube protective member comprising: a main body with tubular shape configured to be arranged at an inner circumference of an end part of a corrugated tube, the corrugated tube having a plurality of ridge portions disposed along a longitudinal direction of the corrugated tube; at least one rib on an outer circumference of the main body configured to be arranged inside the corrugated tube and configured to engage with corresponding ridge portion of the plurality of ridge portions at an inside of the corresponding ridge portion in a direction of removal of the main body with respect to the corrugated tube; and a stopper on an outer circumference of an end part in a longitudinal direction of the main body having an outer diameter set to be equal to or larger than an outer diameter of the ridge portion and configured to be arranged to face an end surface in the longitudinal direction of the corrugated tube in an insertion direction of the main body into the corrugated tube, wherein an interval between the stopper and one rib which is adjacent to the stopper is set to be larger than an interval between engageable surfaces on the ridge portions adjacent to each other, the engageable surface being a surface configured to engage with the rib, wherein a plurality of the ribs are disposed along the longitudinal direction of the main body. a main body with tubular shape configured to be arranged at an inner circumference of an end part of a corrugated tube, the corrugated tube having a plurality of ridge portions disposed along a longitudinal direction of the corrugated tube; at least one rib on an outer circumference of the main body configured to be arranged inside the corrugated tube and configured to engage with corresponding ridge portion of the plurality of ridge portions at an inside of the corresponding ridge portion in a direction of removal of the main body with respect to the corrugated tube; and a stopper on an outer circumference of an end part in a longitudinal direction of the main body having an outer diameter set to be equal to or larger than an outer diameter of the ridge portion and configured to be arranged to face an end surface in the longitudinal direction of the corrugated tube in an insertion direction of the main body into the corrugated tube, wherein an interval between the stopper and one rib which is adjacent to the stopper is set to be larger than an interval between engageable surfaces on the ridge portions adjacent to each other, the engageable surface being a surface configured to engage with the rib, wherein a plurality of the ribs are disposed along the longitudinal direction of the main body.
A screw part having - a shank which at least partially has at least one external thread turn in a threaded portion, and - a sleeve surrounding the shank in a circumferential direction around more than three-fourths of the circumference, wherein - the sleeve extends along a sleeve portion in a longitudinal direction of the shank, characterized in that - the sleeve has at least one radial elevation structure on an outer circumferential face, wherein - the at least one radial elevation structure has at least one structural element having an elastic design in the radial direction, wherein - the at least one radial elevation structure has an extent, on the outer circumferential face of the sleeve along the longitudinal direction, that is greater than a width of the at least one structural element. - a shank which at least partially has at least one external thread turn in a threaded portion, and - a sleeve surrounding the shank in a circumferential direction around more than three-fourths of the circumference, wherein - the sleeve extends along a sleeve portion in a longitudinal direction of the shank, - the sleeve has at least one radial elevation structure on an outer circumferential face, wherein - the at least one radial elevation structure has at least one structural element having an elastic design in the radial direction, wherein - the at least one radial elevation structure has an extent, on the outer circumferential face of the sleeve along the longitudinal direction, that is greater than a width of the at least one structural element.
A touch sensing apparatus, comprising: a light transmissive element that defines a touch surface; a set of emitters arranged around the periphery of the touch surface to emit beams of light into the light transmissive element, wherein the beams of light propagate inside the light transmissive element while illuminating the touch surface such that an object touching the touch surface causes an attenuation of the propagating light, wherein each beam of light diverges in the plane of the touch surface as the beam propagates through the light transmissive element; a set of light detectors arranged around the periphery of the touch surface to receive light from the set of emitters on a plurality of light paths, wherein each light detector is arranged to receive light from more than one emitter; and a processing element configured to determine, based on output signals of the light detectors, a light energy value for each light path; to generate a transmission value for each light path based on the light energy value; and to operate an image reconstruction algorithm on at least part of the thus-generated transmission values so as to determine the position of the object on the touch surface, characterised in that the image reconstruction algorithm is an algorithm for transmission tomography. a light transmissive element that defines a touch surface; a set of emitters arranged around the periphery of the touch surface to emit beams of light into the light transmissive element, wherein the beams of light propagate inside the light transmissive element while illuminating the touch surface such that an object touching the touch surface causes an attenuation of the propagating light, wherein each beam of light diverges in the plane of the touch surface as the beam propagates through the light transmissive element; a set of light detectors arranged around the periphery of the touch surface to receive light from the set of emitters on a plurality of light paths, wherein each light detector is arranged to receive light from more than one emitter; and a processing element configured to determine, based on output signals of the light detectors, a light energy value for each light path; to generate a transmission value for each light path based on the light energy value; and to operate an image reconstruction algorithm on at least part of the thus-generated transmission values so as to determine the position of the object on the touch surface, characterised in that the image reconstruction algorithm is an algorithm for transmission tomography.
A liquid crystal medium comprising one or more polymerisable compounds having two polymerisable groups at a concentration ≤1% by weight one or more polymerisable compounds having three polymerisable groups at a concentration ≤0.5% by weight, one or more terphenyl compounds of formula T at a concentration <3% by weight, in which the individual radicals, on each occurrence identically or differently, and each, independently of one another, have the following meanings each, independently of one another, denote L 5,6 F, Cl, OCF 3, CF 3, CH 3, CH 2 F or CHF 2, R 1, R 2 each, independently of one another, alkyl having 1 to 12 C atoms, where, in addition, one or two non-adjacent CH 2 groups may be replaced by -O-, -CH=CH-, -CO-, -OCO- or -COO- in such a way that O atoms are not linked directly to one another. L 5,6 F, Cl, OCF 3, CF 3, CH 3, CH 2 F or CHF 2, R 1, R 2 each, independently of one another, alkyl having 1 to 12 C atoms, where, in addition, one or two non-adjacent CH 2 groups may be replaced by -O-, -CH=CH-, -CO-, -OCO- or -COO- in such a way that O atoms are not linked directly to one another.
A method for forming a ceramic matrix composite article, the method comprising: forming by melt infiltration with molten silicon a ceramic matrix composite substrate comprising a ceramic fiber reinforcement material in a ceramic matrix material having a free silicon proportion or content, wherein the term free silicon refers to the presence of elemental silicon or silicon alloy where silicon makes up greater than about 33 atomic percent of the silicon alloy; and forming by chemical vapor infiltration a ceramic matrix composite outer layer comprising a ceramic fiber reinforcement material in a ceramic matrix material without any free silicon proportion disposed on at least a portion of the ceramic matrix substrate, wherein the forming by chemical vapor infiltration of the ceramic matrix composite outer layer comprises the steps of laying up at least one prepreg layer on the ceramic matrix composite substrate, wherein the at least one prepreg layer includes unidirectionally-aligned tows impregnated with a ceramic matrix precursor; heating the at least one laid-up disposed prepreg layer in vacuum or in an inert atmosphere to produce a porous layer; and subjecting the porous layer to chemical vapor infiltration with a gaseous source of silicon carbide. forming by melt infiltration with molten silicon a ceramic matrix composite substrate comprising a ceramic fiber reinforcement material in a ceramic matrix material having a free silicon proportion or content, wherein the term free silicon refers to the presence of elemental silicon or silicon alloy where silicon makes up greater than about 33 atomic percent of the silicon alloy; and forming by chemical vapor infiltration a ceramic matrix composite outer layer comprising a ceramic fiber reinforcement material in a ceramic matrix material without any free silicon proportion disposed on at least a portion of the ceramic matrix substrate, wherein the forming by chemical vapor infiltration of the ceramic matrix composite outer layer comprises the steps of laying up at least one prepreg layer on the ceramic matrix composite substrate, wherein the at least one prepreg layer includes unidirectionally-aligned tows impregnated with a ceramic matrix precursor; heating the at least one laid-up disposed prepreg layer in vacuum or in an inert atmosphere to produce a porous layer; and subjecting the porous layer to chemical vapor infiltration with a gaseous source of silicon carbide. wherein the forming by chemical vapor infiltration of the ceramic matrix composite outer layer comprises the steps of laying up at least one prepreg layer on the ceramic matrix composite substrate, wherein the at least one prepreg layer includes unidirectionally-aligned tows impregnated with a ceramic matrix precursor; heating the at least one laid-up disposed prepreg layer in vacuum or in an inert atmosphere to produce a porous layer; and subjecting the porous layer to chemical vapor infiltration with a gaseous source of silicon carbide.
A method of fabricating a semiconductor device, the method comprising: forming an etching target layer on a substrate that includes a cell region and a key region; sequentially forming a lower mask layer and an upper mask layer on the etching target layer; performing a first photolithography process to pattern the upper mask layer to form an upper mask pattern, the upper mask pattern including a plurality of holes on the cell region, a preliminary key pattern on the key region, a bar pattern on the key region, and a trench between the preliminary key pattern and the bar pattern; forming a pillar pattern (OFLA) and a dam pattern (ODAM) that correspondingly fill the plurality of holes and the trench of the upper mask pattern; performing a second photolithography process to selectively remove the upper mask pattern except for the bar pattern; patterning, using the pillar pattern (OFLA), the dam pattern (ODAM), and the bar pattern as an etching mask, the lower mask layer to form a lower mask pattern; and patterning, using the lower mask pattern as an etching mask, the etching target layer to form an etching target pattern on the cell region and a key pattern on the key region. forming an etching target layer on a substrate that includes a cell region and a key region; sequentially forming a lower mask layer and an upper mask layer on the etching target layer; performing a first photolithography process to pattern the upper mask layer to form an upper mask pattern, the upper mask pattern including a plurality of holes on the cell region, a preliminary key pattern on the key region, a bar pattern on the key region, and a trench between the preliminary key pattern and the bar pattern; forming a pillar pattern (OFLA) and a dam pattern (ODAM) that correspondingly fill the plurality of holes and the trench of the upper mask pattern; performing a second photolithography process to selectively remove the upper mask pattern except for the bar pattern; patterning, using the pillar pattern (OFLA), the dam pattern (ODAM), and the bar pattern as an etching mask, the lower mask layer to form a lower mask pattern; and patterning, using the lower mask pattern as an etching mask, the etching target layer to form an etching target pattern on the cell region and a key pattern on the key region.