A photocurable composition to be used for manufacturing a film having a predetermined pattern shape by curing the photocurable composition with light under a state where the photocurable composition is brought into contact with a mold having concavo-convex structure on a surface thereof, the photocurable composition comprising: a polymerizable compound; a photopolymerization initiator; a photosensitive gas generating agent for generating a gas through light stimulation; and a gas generation promotor for increasing an aggregation rate of the gas generated from the photosensitive gas generating agent at an interface between the mold and the photocurable composition, wherein the gas generation promotor comprises a fluorine atom-containing surfactant that is free of a polymerizable substituent and represented by one of the following formulae to, and wherein the amount of the gas generation promoter is in a range of 0.001wt% to 10wt% of the total weight of the polymerizable compound: Rf 1 -Rc 1 -X 1 where in the formula, Rf 1 represents a monovalent functional group constituted of fluorine atoms and carbon atoms, Rc 1 represents a divalent functional group constituted of hydrogen atoms, oxygen atoms, and carbon atoms, and X 1 represents a hydroxyl group, a carboxyl group, a sulfo group, an amino group, or an alkoxy group; Rf 1 -Rc 1 -Rf 2 where in the formula, Rf 1 and Rf 2 each represent a monovalent functional group constituted of fluorine atoms and carbon atoms, and Rf 1 and Rf 2 may be identical to or different from each other, and Rc 1 represents a divalent functional group constituted of hydrogen atoms, oxygen atoms, and carbon atoms; X 1 -Rc 1 -Rf 3 -Rc 2 -X 2 where in the formula, Rf 3 represents a divalent functional group constituted of fluorine atoms and carbon atoms, Rc 1 and Rc 2 each represent a divalent functional group constituted of hydrogen atoms, oxygen atoms, and carbon atoms, and Rc 1 and Rc 2 may be identical to or different from each other, and X 1 and X 2 each represent a hydroxyl group, a carboxyl group, a sulfo group, an amino group, or an alkoxy group, and X 1 and X 2 may be identical to or different from each other. a polymerizable compound; a photopolymerization initiator; a photosensitive gas generating agent for generating a gas through light stimulation; and a gas generation promotor for increasing an aggregation rate of the gas generated from the photosensitive gas generating agent at an interface between the mold and the photocurable composition, wherein the gas generation promotor comprises a fluorine atom-containing surfactant that is free of a polymerizable substituent and represented by one of the following formulae to, and wherein the amount of the gas generation promoter is in a range of 0.001wt% to 10wt% of the total weight of the polymerizable compound: Rf 1 -Rc 1 -X 1 where in the formula, Rf 1 represents a monovalent functional group constituted of fluorine atoms and carbon atoms, Rc 1 represents a divalent functional group constituted of hydrogen atoms, oxygen atoms, and carbon atoms, and X 1 represents a hydroxyl group, a carboxyl group, a sulfo group, an amino group, or an alkoxy group; Rf 1 -Rc 1 -Rf 2 where in the formula, Rf 1 and Rf 2 each represent a monovalent functional group constituted of fluorine atoms and carbon atoms, and Rf 1 and Rf 2 may be identical to or different from each other, and Rc 1 represents a divalent functional group constituted of hydrogen atoms, oxygen atoms, and carbon atoms; X 1 -Rc 1 -Rf 3 -Rc 2 -X 2 where in the formula, Rf 3 represents a divalent functional group constituted of fluorine atoms and carbon atoms, Rc 1 and Rc 2 each represent a divalent functional group constituted of hydrogen atoms, oxygen atoms, and carbon atoms, and Rc 1 and Rc 2 may be identical to or different from each other, and X 1 and X 2 each represent a hydroxyl group, a carboxyl group, a sulfo group, an amino group, or an alkoxy group, and X 1 and X 2 may be identical to or different from each other.