A method of manufacturing a pattern on a substrate web, comprising: providing a production tool (2, 12) having a surface relief structure (3, 13) of elevations and depressions, the elevations corresponding to the desired pattern to be applied to the substrate web; applying a curable material (6, 16) only onto the elevations of the surface relief structure on the production tool, and substantially not into the depressions; bringing the applied curable material on the surface relief structure into contact with a substrate web at a first location (L 1); transporting the substrate web and surface relief structure together in contact from the first location (L 1) to a second location (L 2), the first and second locations being spaced from one another along the transport direction of the substrate web; separating the substrate web from the surface relief structure at the second location whereupon the curable material forming the pattern is affixed to and carried by the substrate web; and curing the curable material on the substrate web by exposure to at least one curing energy source (8, 18a, 18b), either while the substrate web and surface relief structure are in contact between the first and second locations and/or after the substrate web has been separated from the surface relief structure at the second location; wherein the surface relief structure is substantially a cylinder and the first and second locations are spaced points on its circumference, whereby the substrate web and surface relief structure are transported along a portion of the circumference of the cylinder as the cylinder rotates, and the portion of the circumference of the cylinder is at least a quarter of the full circumference of the cylinder. providing a production tool (2, 12) having a surface relief structure (3, 13) of elevations and depressions, the elevations corresponding to the desired pattern to be applied to the substrate web; applying a curable material (6, 16) only onto the elevations of the surface relief structure on the production tool, and substantially not into the depressions; bringing the applied curable material on the surface relief structure into contact with a substrate web at a first location (L 1); transporting the substrate web and surface relief structure together in contact from the first location (L 1) to a second location (L 2), the first and second locations being spaced from one another along the transport direction of the substrate web; separating the substrate web from the surface relief structure at the second location whereupon the curable material forming the pattern is affixed to and carried by the substrate web; and curing the curable material on the substrate web by exposure to at least one curing energy source (8, 18a, 18b), either while the substrate web and surface relief structure are in contact between the first and second locations and/or after the substrate web has been separated from the surface relief structure at the second location; wherein the surface relief structure is substantially a cylinder and the first and second locations are spaced points on its circumference, whereby the substrate web and surface relief structure are transported along a portion of the circumference of the cylinder as the cylinder rotates, and the portion of the circumference of the cylinder is at least a quarter of the full circumference of the cylinder.