A laminated body forming apparatus for forming a laminated body of coating film on a substrate that is transported, the apparatus comprises a plurality of die head apparatuses (120A, 120B, 120C) each of which has: a front blade (130A, 130B); a rear blade (130B, 130C) positioned downstream of the front blade in a transport direction of the substrate; a center blade (140A, 140B) positioned between the front blade (130A, 130B) and the rear blade (130B, 130C); and an internal impurity removal space (180A, 180B) that removes impurities contained in a coating film of the slurry formed by passing by the center blade (140A, 140B), the front blade (130A, 130B) and the center blade (140A, 140B) being configured to form a pool of the slurry, the internal impurity removal space (180A, 180B) being positioned between the center blade (140A, 140B) and the rear blade (130B, 130C), a distance (D 4A) separating the rear blade (130B, 130C) and the substrate being set smaller than a distance (D 1A) separating the center blade (140A, 140B) and the substrate, wherein the plurality of die head apparatuses (120A, 120B) are arranged in series along the transport direction of the substrate, and external impurity removal spaces (180A, 180B) that remove impurities contained in a coating film of a slurry are respectively provided on downstream sides of the plurality of die head apparatuses (120A, 120B) in the transport direction, characterized in that the plurality of die head apparatuses (120A, 120B) include a first die head apparatus, a second die head apparatus that is adjacent to the first die head apparatus and that is positioned downstream of the first die head apparatus in the transport direction of the substrate, and a front blade of the second die head apparatus also serves as a rear blade of the first die head apparatus, the external impurity removal space positioned between the first die head apparatus and the second die head apparatus also serves as an internal impurity removal space of the first die head apparatus, and a distance separating the front blade of the second die head apparatus and the substrate is set to be smaller than a distance separating a center blade of the first die head apparatus and the substrate. the apparatus comprises a plurality of die head apparatuses (120A, 120B, 120C) each of which has: a front blade (130A, 130B); a rear blade (130B, 130C) positioned downstream of the front blade in a transport direction of the substrate; a center blade (140A, 140B) positioned between the front blade (130A, 130B) and the rear blade (130B, 130C); and an internal impurity removal space (180A, 180B) that removes impurities contained in a coating film of the slurry formed by passing by the center blade (140A, 140B), the front blade (130A, 130B) and the center blade (140A, 140B) being configured to form a pool of the slurry, the internal impurity removal space (180A, 180B) being positioned between the center blade (140A, 140B) and the rear blade (130B, 130C), a distance (D 4A) separating the rear blade (130B, 130C) and the substrate being set smaller than a distance (D 1A) separating the center blade (140A, 140B) and the substrate, a front blade (130A, 130B); a rear blade (130B, 130C) positioned downstream of the front blade in a transport direction of the substrate; a center blade (140A, 140B) positioned between the front blade (130A, 130B) and the rear blade (130B, 130C); and an internal impurity removal space (180A, 180B) that removes impurities contained in a coating film of the slurry formed by passing by the center blade (140A, 140B), the front blade (130A, 130B) and the center blade (140A, 140B) being configured to form a pool of the slurry, the internal impurity removal space (180A, 180B) being positioned between the center blade (140A, 140B) and the rear blade (130B, 130C), a distance (D 4A) separating the rear blade (130B, 130C) and the substrate being set smaller than a distance (D 1A) separating the center blade (140A, 140B) and the substrate, wherein the plurality of die head apparatuses (120A, 120B) are arranged in series along the transport direction of the substrate, and external impurity removal spaces (180A, 180B) that remove impurities contained in a coating film of a slurry are respectively provided on downstream sides of the plurality of die head apparatuses (120A, 120B) in the transport direction, characterized in that the plurality of die head apparatuses (120A, 120B) include a first die head apparatus, a second die head apparatus that is adjacent to the first die head apparatus and that is positioned downstream of the first die head apparatus in the transport direction of the substrate, and a front blade of the second die head apparatus also serves as a rear blade of the first die head apparatus, the external impurity removal space positioned between the first die head apparatus and the second die head apparatus also serves as an internal impurity removal space of the first die head apparatus, and a distance separating the front blade of the second die head apparatus and the substrate is set to be smaller than a distance separating a center blade of the first die head apparatus and the substrate.