Method for producing a nuclear component by the direct liquid injection metal organic chemical vapour deposition (DLI-MOCVD) method, the nuclear component being chosen from among a nuclear fuel cladding, a spacer grid, a guide tube, a plate fuel or an absorber rod, comprising: - i) a supporting base containing a substrate based on a metal chosen from among zirconium, titanium, vanadium, molybdenum or the base alloys thereof, the substrate being optionally clad with an interlayer positioned between the substrate and at least one protective layer; - ii) said at least one protective layer cladding said supporting base and composed of a protective material comprising chromium which is an amorphous chromium carbide; the method comprising the following successive steps: a) vaporising a stock solution containing a hydrocarbon solvent devoid of oxygen atoms, a bis(arene) type precursor comprising chromium; and containing where appropriate an additional precursor; the precursors having a decomposition temperature between 300°C and 600°C; b) in a chemical vapour deposition reactor wherein said supporting base to be clad is located and of which the atmosphere is at a deposition temperature between 300°C and 500°C and under a deposition pressure between 13 Pa and 7000 Pa; introducing the stock solution vaporised in step a), which induces the deposition of said at least one protective layer on said supporting base. - i) a supporting base containing a substrate based on a metal chosen from among zirconium, titanium, vanadium, molybdenum or the base alloys thereof, the substrate being optionally clad with an interlayer positioned between the substrate and at least one protective layer; - ii) said at least one protective layer cladding said supporting base and composed of a protective material comprising chromium which is an amorphous chromium carbide; the method comprising the following successive steps: a) vaporising a stock solution containing a hydrocarbon solvent devoid of oxygen atoms, a bis(arene) type precursor comprising chromium; and containing where appropriate an additional precursor; the precursors having a decomposition temperature between 300°C and 600°C; b) in a chemical vapour deposition reactor wherein said supporting base to be clad is located and of which the atmosphere is at a deposition temperature between 300°C and 500°C and under a deposition pressure between 13 Pa and 7000 Pa; introducing the stock solution vaporised in step a), which induces the deposition of said at least one protective layer on said supporting base. a) vaporising a stock solution containing a hydrocarbon solvent devoid of oxygen atoms, a bis(arene) type precursor comprising chromium; and containing where appropriate an additional precursor; the precursors having a decomposition temperature between 300°C and 600°C; b) in a chemical vapour deposition reactor wherein said supporting base to be clad is located and of which the atmosphere is at a deposition temperature between 300°C and 500°C and under a deposition pressure between 13 Pa and 7000 Pa; introducing the stock solution vaporised in step a), which induces the deposition of said at least one protective layer on said supporting base.