An organic electronic device, comprising: a substrate; a first electrode layer (102, 1021, 1022) on the substrate; an organic layer that comprises an emitting layer and that is formed on the first electrode layer (102, 1021, 1022); a second electrode layer formed on the organic layer, the substrate, comprising: a base layer; and an optical functional layer that is formed on the base layer and that has a smaller projected area than that of the base layer, wherein the first electrode layer(102, 1021, 1022) has a larger projected area than that of the optical functional layer and is formed on both of the optical functional layer and the base layer on which the optical functional layer is not formed, wherein a difference (R1-R2) between a resistivity per unit width measured between the first electrode layer(102, 1021, 1022) on the optical functional layer and the first electrode layer(102, 1021, 1022) on the base layer on which the optical functional layer is not formed and a resistivity per unit width measured with respect to a standard electrode formed by using the same material as used for forming the first electrode layer(102, 1021, 1022) by the same method as measuring the resistivity is 10 Ω·cm or less, wherein the optical functional layer includes a light scattering layer and a planarized layer which is formed on the light scattering layer, and wherein the light scattering layer includes a matrix material and scattering particles having a different refractive index from the matrix material, wherein the scattering particles have a refractive index of 2.0 to 3.5, wherein a ratio (T1/T2) of a thickness of the optical functional layer relative to a thickness of the first electrode layer(102, 1021, 1022) formed on the base layer on which the optical functional layer is not formed is from 3 to 15, and wherein the first electrode layer (102, 1021, 1022) on the base layer has a pencil hardness of 6H or more and the first electrode layer (102, 1021, 1022) on the optical functional layer has a pencil hardness of 2B to 5H. a substrate; a first electrode layer (102, 1021, 1022) on the substrate; an organic layer that comprises an emitting layer and that is formed on the first electrode layer (102, 1021, 1022); a second electrode layer formed on the organic layer, the substrate, comprising: a base layer; and an optical functional layer that is formed on the base layer and that has a smaller projected area than that of the base layer, a base layer; and an optical functional layer that is formed on the base layer and that has a smaller projected area than that of the base layer, wherein the first electrode layer(102, 1021, 1022) has a larger projected area than that of the optical functional layer and is formed on both of the optical functional layer and the base layer on which the optical functional layer is not formed, wherein a difference (R1-R2) between a resistivity per unit width measured between the first electrode layer(102, 1021, 1022) on the optical functional layer and the first electrode layer(102, 1021, 1022) on the base layer on which the optical functional layer is not formed and a resistivity per unit width measured with respect to a standard electrode formed by using the same material as used for forming the first electrode layer(102, 1021, 1022) by the same method as measuring the resistivity is 10 Ω·cm or less, wherein the optical functional layer includes a light scattering layer and a planarized layer which is formed on the light scattering layer, and wherein the light scattering layer includes a matrix material and scattering particles having a different refractive index from the matrix material, wherein the scattering particles have a refractive index of 2.0 to 3.5, wherein a ratio (T1/T2) of a thickness of the optical functional layer relative to a thickness of the first electrode layer(102, 1021, 1022) formed on the base layer on which the optical functional layer is not formed is from 3 to 15, and wherein the first electrode layer (102, 1021, 1022) on the base layer has a pencil hardness of 6H or more and the first electrode layer (102, 1021, 1022) on the optical functional layer has a pencil hardness of 2B to 5H.