A laminate comprising: a base material, a silicon-containing layer and a polymer layer obtained from an organic acid metallic salt having a polymerizable group, wherein the silicon-containing layer and the polymer layer are sequentially laminated over at least one surface of the base material, the silicon-containing layer includes a high nitrogen concentration region comprised of silicon atoms and nitrogen atoms, silicon atoms and nitrogen atoms and oxygen atoms, or silicon atoms and nitrogen atoms and oxygen atoms and carbon atoms, and the high nitrogen concentration region is formed by irradiating energy ray onto a polysilazane film formed over the base material under an oxygen concentration equal to or lower than 5% and/or a relative humidity at room temperature (23°C) equal to or lower than 30% so as to denature at least a part of the film, wherein a composition ratio of the nitrogen atoms, which is measured using X-ray photoelectron spectroscopy and represented by the following formula, is in a range of 0.01 to 1 in the high nitrogen concentration region the composition ratio of the nitrogen atoms / the composition ratio of the oxygen atoms + the composition ratio of the nitrogen atoms, and the organic acid metallic salt is a metallic salt of at least one selected from carboxylic acids, sulfonic acids and mercapto acids. a base material, a silicon-containing layer and a polymer layer obtained from an organic acid metallic salt having a polymerizable group, wherein the silicon-containing layer and the polymer layer are sequentially laminated over at least one surface of the base material, the silicon-containing layer includes a high nitrogen concentration region comprised of silicon atoms and nitrogen atoms, silicon atoms and nitrogen atoms and oxygen atoms, or silicon atoms and nitrogen atoms and oxygen atoms and carbon atoms, and the high nitrogen concentration region is formed by irradiating energy ray onto a polysilazane film formed over the base material under an oxygen concentration equal to or lower than 5% and/or a relative humidity at room temperature (23°C) equal to or lower than 30% so as to denature at least a part of the film, wherein a composition ratio of the nitrogen atoms, which is measured using X-ray photoelectron spectroscopy and represented by the following formula, is in a range of 0.01 to 1 in the high nitrogen concentration region the composition ratio of the nitrogen atoms / the composition ratio of the oxygen atoms + the composition ratio of the nitrogen atoms, and the organic acid metallic salt is a metallic salt of at least one selected from carboxylic acids, sulfonic acids and mercapto acids. wherein the silicon-containing layer and the polymer layer are sequentially laminated over at least one surface of the base material, the silicon-containing layer includes a high nitrogen concentration region comprised of silicon atoms and nitrogen atoms, silicon atoms and nitrogen atoms and oxygen atoms, or silicon atoms and nitrogen atoms and oxygen atoms and carbon atoms, and the high nitrogen concentration region is formed by irradiating energy ray onto a polysilazane film formed over the base material under an oxygen concentration equal to or lower than 5% and/or a relative humidity at room temperature (23°C) equal to or lower than 30% so as to denature at least a part of the film, wherein a composition ratio of the nitrogen atoms, which is measured using X-ray photoelectron spectroscopy and represented by the following formula, is in a range of 0.01 to 1 in the high nitrogen concentration region the composition ratio of the nitrogen atoms / the composition ratio of the oxygen atoms + the composition ratio of the nitrogen atoms, and the organic acid metallic salt is a metallic salt of at least one selected from carboxylic acids, sulfonic acids and mercapto acids.