An apparatus for sealingly enclosing a first aspect of a substrate member in a reaction chamber, the apparatus comprising: a) a baseplate member having a first surface, wherein said first surface comprises a raised platform medially disposed thereon, said platform having a top surface forming a flat ledge dimensioned for contactingly receiving the first aspect of the substrate member in juxtaposition with said top surface thereof, and outside edges and outside lateral wall surfaces therearound, wherein said top surface is interrupted by a recess defined by interior walls having a height ranging from 5 to 100 micrometers, a recessed slab connecting the bottom edges of the interior walls, and the flat ledge connecting the top edges of the interior walls and the outside edges of the platform, said flat ledge forming a hard support for supporting the first aspect of the substrate member thereon, whereby a reaction chamber with headspace volume is formed between the recessed slab and the first aspect of the substrate member when sealed to said flat ledge; b) a gasket member fitted to the outside edges of said raised platform, which encloses a lip formed on the raised platform, which gasket member is adapted to sealingly clamp the substrate member to the lip, and c) a first bellows pump and a second bellows pump, said first bellows pump having a first fluidic connection to said reaction chamber and said second bellows pump having a second fluidic connection to said reaction chamber, at least one of said first and second bellows pumps (212, 214) having one or more fluidic connections to one or more reagent reservoirs or vents disposed outside the reaction chamber. a) a baseplate member having a first surface, wherein said first surface comprises a raised platform medially disposed thereon, said platform having a top surface forming a flat ledge dimensioned for contactingly receiving the first aspect of the substrate member in juxtaposition with said top surface thereof, and outside edges and outside lateral wall surfaces therearound, wherein said top surface is interrupted by a recess defined by interior walls having a height ranging from 5 to 100 micrometers, a recessed slab connecting the bottom edges of the interior walls, and the flat ledge connecting the top edges of the interior walls and the outside edges of the platform, said flat ledge forming a hard support for supporting the first aspect of the substrate member thereon, whereby a reaction chamber with headspace volume is formed between the recessed slab and the first aspect of the substrate member when sealed to said flat ledge; b) a gasket member fitted to the outside edges of said raised platform, which encloses a lip formed on the raised platform, which gasket member is adapted to sealingly clamp the substrate member to the lip, and c) a first bellows pump and a second bellows pump, said first bellows pump having a first fluidic connection to said reaction chamber and said second bellows pump having a second fluidic connection to said reaction chamber, at least one of said first and second bellows pumps (212, 214) having one or more fluidic connections to one or more reagent reservoirs or vents disposed outside the reaction chamber.