A method of manufacturing a display device, comprising: providing a base layer comprising a plurality of sub-pixels (SP1, SP2, SP3) each including an emission area and a non-emission area; and forming, on the base layer, a display element layer emitting light from the emission area of each of the sub-pixels (SP1, SP2, SP3), wherein the forming of the display element layer comprises: forming a first electrode and a second electrode spaced apart from each other in the emission area of each of the sub-pixels (SP1, SP2, SP3); forming a first insulating layer exposing a portion of an upper surface of each of the first and the second electrodes (REL1, REL2); aligning a plurality of light emitting elements between the first and the second electrodes (REL1, REL2) by respectively applying corresponding alignment voltages to the first and the second electrodes (REL1, REL2); forming a second insulating layer exposing ends (EP1, EP2) of each of the light emitting elements by depositing an insulating material layer (INSM2) on the light emitting elements and then etching the insulating material layer (INSM2) by using a mask; exposing a portion (15_a) of an electrode layer disposed on the ends (EP1, EP2) of each of the light emitting elements and a portion (11_a) of a first semiconductor layer by using the second insulating layer as an etching mask to remove an insulating film disposed on the exposed ends (EP1, EP2) of each of the light emitting elements; and forming a first contact electrode and a second contact electrode on the second insulating layer. providing a base layer comprising a plurality of sub-pixels (SP1, SP2, SP3) each including an emission area and a non-emission area; and forming, on the base layer, a display element layer emitting light from the emission area of each of the sub-pixels (SP1, SP2, SP3), wherein the forming of the display element layer comprises: forming a first electrode and a second electrode spaced apart from each other in the emission area of each of the sub-pixels (SP1, SP2, SP3); forming a first insulating layer exposing a portion of an upper surface of each of the first and the second electrodes (REL1, REL2); aligning a plurality of light emitting elements between the first and the second electrodes (REL1, REL2) by respectively applying corresponding alignment voltages to the first and the second electrodes (REL1, REL2); forming a second insulating layer exposing ends (EP1, EP2) of each of the light emitting elements by depositing an insulating material layer (INSM2) on the light emitting elements and then etching the insulating material layer (INSM2) by using a mask; exposing a portion (15_a) of an electrode layer disposed on the ends (EP1, EP2) of each of the light emitting elements and a portion (11_a) of a first semiconductor layer by using the second insulating layer as an etching mask to remove an insulating film disposed on the exposed ends (EP1, EP2) of each of the light emitting elements; and forming a first contact electrode and a second contact electrode on the second insulating layer. forming a first electrode and a second electrode spaced apart from each other in the emission area of each of the sub-pixels (SP1, SP2, SP3); forming a first insulating layer exposing a portion of an upper surface of each of the first and the second electrodes (REL1, REL2); aligning a plurality of light emitting elements between the first and the second electrodes (REL1, REL2) by respectively applying corresponding alignment voltages to the first and the second electrodes (REL1, REL2); forming a second insulating layer exposing ends (EP1, EP2) of each of the light emitting elements by depositing an insulating material layer (INSM2) on the light emitting elements and then etching the insulating material layer (INSM2) by using a mask; exposing a portion (15_a) of an electrode layer disposed on the ends (EP1, EP2) of each of the light emitting elements and a portion (11_a) of a first semiconductor layer by using the second insulating layer as an etching mask to remove an insulating film disposed on the exposed ends (EP1, EP2) of each of the light emitting elements; and forming a first contact electrode and a second contact electrode on the second insulating layer.