An exposure apparatus that has an illumination optical system configured to illuminate a mask with illumination light and a projection optical system configured to project a pattern image of the mask onto a substrate, and is configured to perform a scanning exposure of the substrate by moving each of the mask and the substrate relative to the illumination light, the apparatus comprising: a first base member disposed above the projection optical system and having a first opening section through which the illumination light is arranged to pass; a first stage system having a first stage, a movable member and a first drive system, wherein the first stage is disposed on the first base member, and has a second opening section through which the illumination light is arranged to pass and a support member arranged for supporting the mask in the second opening section, the movable member is disposed on the first base member, and provided so as to surround the first stage, and the first drive system includes a first motor (136 1, 136 2, 138 1, 138 2) having a mover (26 1, 26 2, 28 1, 28 2) provided at the first stage and a stator (136 1, 136 2, 138 1, 138 2) provided at the movable member, and is configured to be capable of moving the first stage in directions of three degrees of freedom, the X-axis, Y-axis, and θz directions, within a predetermined plane orthogonal to an optical axis of the projection optical system; a second base member disposed below the projection optical system; a second stage system having a second stage and a second drive system, wherein the second stage is disposed on the second base member, and has a holder for holding the substrate, and the second drive system has a second motor configured to drive the second stage, and the second drive system is configured to move the second stage on the second base member; and a controller configured to control the first and the second drive systems so that, in the scanning exposure, the mask and the substrate are each moved relative to the illumination light in a first direction of the directions of three degrees of freedom, wherein the movable member is supported by levitation on the first base member, and is configured to be movable by a reaction force generated in movement of the first stage by the first drive system. a first base member disposed above the projection optical system and having a first opening section through which the illumination light is arranged to pass; a first stage system having a first stage, a movable member and a first drive system, wherein the first stage is disposed on the first base member, and has a second opening section through which the illumination light is arranged to pass and a support member arranged for supporting the mask in the second opening section, the movable member is disposed on the first base member, and provided so as to surround the first stage, and the first drive system includes a first motor (136 1, 136 2, 138 1, 138 2) having a mover (26 1, 26 2, 28 1, 28 2) provided at the first stage and a stator (136 1, 136 2, 138 1, 138 2) provided at the movable member, and is configured to be capable of moving the first stage in directions of three degrees of freedom, the X-axis, Y-axis, and θz directions, within a predetermined plane orthogonal to an optical axis of the projection optical system; a second base member disposed below the projection optical system; a second stage system having a second stage and a second drive system, wherein the second stage is disposed on the second base member, and has a holder for holding the substrate, and the second drive system has a second motor configured to drive the second stage, and the second drive system is configured to move the second stage on the second base member; and a controller configured to control the first and the second drive systems so that, in the scanning exposure, the mask and the substrate are each moved relative to the illumination light in a first direction of the directions of three degrees of freedom, wherein the movable member is supported by levitation on the first base member, and is configured to be movable by a reaction force generated in movement of the first stage by the first drive system.