A curable composition for use in a high-temperature lithography-based photopolymerization method, wherein the composition comprises the following polymerizable Components A to C, wherein Component A is at least one oligomeric dimethacrylate represented by the following chemical formula and serves as a glass transition temperature modifier: wherein R 1 and R 2 each independently represent a divalent unbranched, branched or cyclic aliphatic C 5 -C 15 residue, with the proviso that at least one of R 1 and R 2 is or comprises a cycloaliphatic C 5 -C 6 structure, R 3 each represents a divalent, unbranched or branched C 2 -C 4 alkyl residue, and n is an integer from 1 to 5, with the proviso that R 1, R 2, R 3 and n are selected such that the oligomeric dimethacrylate has a number average molecular weight of 0.4 to 5 kDa; Component B is at least one, optionally polyether-modified, (poly)carbonate (poly)urethane dimethacrylate of one of the following chemical formulae,, or, which serves as a toughness modifier: wherein: R 4 and R 5 each independently represent a divalent, unbranched or branched or cyclic aliphatic C 5 -C 15 residue, R 6 each independently represents a divalent, unbranched or branched C 2 -C 4 alkyl residue, R 7 each independently represents a divalent, unbranched or branched C 2 -C 6 alkyl residue, n are each independently an integer from 1 to 10, m are each independently an integer from 1 to 20, o are each independently an integer from 5 to 50, and p is an integer from 1 to 40, with the proviso that R 4, R 5, R 6, R 7, n, m, o and p are selected such that the (poly)carbonate (poly)urethane dimethacrylate has a number average molecular weight greater than 5 kDa; and Component C is at least a mono- or multifunctional methacrylate-based reactive diluent, wherein Component A is at least one oligomeric dimethacrylate represented by the following chemical formula and serves as a glass transition temperature modifier: wherein R 1 and R 2 each independently represent a divalent unbranched, branched or cyclic aliphatic C 5 -C 15 residue, with the proviso that at least one of R 1 and R 2 is or comprises a cycloaliphatic C 5 -C 6 structure, R 3 each represents a divalent, unbranched or branched C 2 -C 4 alkyl residue, and n is an integer from 1 to 5, with the proviso that R 1, R 2, R 3 and n are selected such that the oligomeric dimethacrylate has a number average molecular weight of 0.4 to 5 kDa; Component B is at least one, optionally polyether-modified, (poly)carbonate (poly)urethane dimethacrylate of one of the following chemical formulae,, or, which serves as a toughness modifier: wherein: R 4 and R 5 each independently represent a divalent, unbranched or branched or cyclic aliphatic C 5 -C 15 residue, R 6 each independently represents a divalent, unbranched or branched C 2 -C 4 alkyl residue, R 7 each independently represents a divalent, unbranched or branched C 2 -C 6 alkyl residue, n are each independently an integer from 1 to 10, m are each independently an integer from 1 to 20, o are each independently an integer from 5 to 50, and p is an integer from 1 to 40, with the proviso that R 4, R 5, R 6, R 7, n, m, o and p are selected such that the (poly)carbonate (poly)urethane dimethacrylate has a number average molecular weight greater than 5 kDa; and Component C is at least a mono- or multifunctional methacrylate-based reactive diluent,