An anti-breakdown ion source discharge apparatus, comprising a discharge chamber; wherein the discharge chamber is sleeved with an ion source chamber; and a region configured to place a discharge component (3, 4, 5) is enclosed between the discharge chamber and the ion source chamber; wherein the discharge component includes a radio-frequency coil, a lower conductive connecting part, and an upper conductive connecting part; and the radio-frequency coil is sleeved on an exterior of the discharge chamber; and the radio-frequency coil is fixed on a coil support base; wherein one end of the lower conductive connecting part is connected to a tail end of the radio-frequency coil through a lower connecting plate, and another end of the lower conductive connecting par is connected to a lower radio-frequency column; and the lower radio-frequency column is fixed on an inner wall at a bottom of the ion source chamber; and one end of the upper conductive connecting part is connected to a head end of the radio-frequency coil through an upper connecting plate, another end of the upper conductive connecting part is connected to an upper radio-frequency column; and the upper radio-frequency column is fixed on the inner wall at the bottom of the ion source chamber; wherein the apparatus further includes: a coil support configured to support the radio-frequency coil and arranged along a circumferential direction of the coil support base; and the coil support base is locked on the inner wall at the bottom of the ion source chamber; wherein the radio-frequency coil passes through the coil support; and the upper conductive connecting part sequentially crosses over the radio-frequency coil and the coil support base from an outside of the radio-frequency coil and extends into a bottom of the discharge chamber through a bottom of the coil support base; and an upper insulation fixing element configured to fix the upper conductive connecting part, wherein the upper insulation fixing element is sleeved on the upper conductive connecting part and fixed on the inner wall at the bottom of the ion source chamber. wherein the discharge chamber is sleeved with an ion source chamber; and a region configured to place a discharge component (3, 4, 5) is enclosed between the discharge chamber and the ion source chamber; wherein the discharge component includes a radio-frequency coil, a lower conductive connecting part, and an upper conductive connecting part; and the radio-frequency coil is sleeved on an exterior of the discharge chamber; and the radio-frequency coil is fixed on a coil support base; wherein one end of the lower conductive connecting part is connected to a tail end of the radio-frequency coil through a lower connecting plate, and another end of the lower conductive connecting par is connected to a lower radio-frequency column; and the lower radio-frequency column is fixed on an inner wall at a bottom of the ion source chamber; and one end of the upper conductive connecting part is connected to a head end of the radio-frequency coil through an upper connecting plate, another end of the upper conductive connecting part is connected to an upper radio-frequency column; and the upper radio-frequency column is fixed on the inner wall at the bottom of the ion source chamber; wherein the apparatus further includes: a coil support configured to support the radio-frequency coil and arranged along a circumferential direction of the coil support base; and the coil support base is locked on the inner wall at the bottom of the ion source chamber; wherein the radio-frequency coil passes through the coil support; and the upper conductive connecting part sequentially crosses over the radio-frequency coil and the coil support base from an outside of the radio-frequency coil and extends into a bottom of the discharge chamber through a bottom of the coil support base; and an upper insulation fixing element configured to fix the upper conductive connecting part, wherein the upper insulation fixing element is sleeved on the upper conductive connecting part and fixed on the inner wall at the bottom of the ion source chamber. a coil support configured to support the radio-frequency coil and arranged along a circumferential direction of the coil support base; and the coil support base is locked on the inner wall at the bottom of the ion source chamber; wherein the radio-frequency coil passes through the coil support; and the upper conductive connecting part sequentially crosses over the radio-frequency coil and the coil support base from an outside of the radio-frequency coil and extends into a bottom of the discharge chamber through a bottom of the coil support base; and an upper insulation fixing element configured to fix the upper conductive connecting part, wherein the upper insulation fixing element is sleeved on the upper conductive connecting part and fixed on the inner wall at the bottom of the ion source chamber.