A method of making a micro-wire pattern in an article, the method comprising: providing a photocurable article comprising a photocurable composition on a transparent substrate, the photocurable composition comprising: a compound that generates an acid upon exposure to radiation of at least 190 nm and up to and including 500 nm, a multifunctional epoxy compound having an epoxy equivalent molecular weight of less than 1,000 and a softening point of 20°C or more, and an epoxysilane oligomer having a softening point less than or equal to 20°C and that is represented by the following Structure: wherein R and R 1 are independently substituted or unsubstituted alkyl groups, R 2 is a substituted or unsubstituted linear, branched, or cyclic alkyl group or an alkyl ether residue substituted with an epoxide, R 3 is hydrogen or a substituted or unsubstituted alkyl, and x + y > 2; imprinting a pattern of micro-channels within the photocurable composition; exposing the photocurable composition to curing radiation to form cured photocurable composition and photocured micro-channels within the cured photocurable composition on the transparent substrate; applying a conductive composition comprising metal nano-particles to the photocured micro-channels; removing any excess conductive composition outside the photocured micro-channels while leaving conductive composition within the photocured micro-channels; drying the conductive composition in the photocured micro-channels at a temperature of less than 60°C to provide a dried conductive composition as conductive micro-wires in the photocured micro-channels; exposing the dried conductive composition in the photocured micro-channels to hydrogen chloride at a temperature of less than 60°C to enhance the conductivity of the conductive micro-wires in the photocured micro-channels; and polishing the outer surface of the cured photocurable composition in the presence of water, to form a micro-wire pattern on the transparent substrate. providing a photocurable article comprising a photocurable composition on a transparent substrate, the photocurable composition comprising: a compound that generates an acid upon exposure to radiation of at least 190 nm and up to and including 500 nm, a multifunctional epoxy compound having an epoxy equivalent molecular weight of less than 1,000 and a softening point of 20°C or more, and an epoxysilane oligomer having a softening point less than or equal to 20°C and that is represented by the following Structure: a compound that generates an acid upon exposure to radiation of at least 190 nm and up to and including 500 nm, a multifunctional epoxy compound having an epoxy equivalent molecular weight of less than 1,000 and a softening point of 20°C or more, and an epoxysilane oligomer having a softening point less than or equal to 20°C and that is represented by the following Structure: wherein R and R 1 are independently substituted or unsubstituted alkyl groups, R 2 is a substituted or unsubstituted linear, branched, or cyclic alkyl group or an alkyl ether residue substituted with an epoxide, R 3 is hydrogen or a substituted or unsubstituted alkyl, and x + y > 2; imprinting a pattern of micro-channels within the photocurable composition; exposing the photocurable composition to curing radiation to form cured photocurable composition and photocured micro-channels within the cured photocurable composition on the transparent substrate; applying a conductive composition comprising metal nano-particles to the photocured micro-channels; removing any excess conductive composition outside the photocured micro-channels while leaving conductive composition within the photocured micro-channels; drying the conductive composition in the photocured micro-channels at a temperature of less than 60°C to provide a dried conductive composition as conductive micro-wires in the photocured micro-channels; exposing the dried conductive composition in the photocured micro-channels to hydrogen chloride at a temperature of less than 60°C to enhance the conductivity of the conductive micro-wires in the photocured micro-channels; and polishing the outer surface of the cured photocurable composition in the presence of water, to form a micro-wire pattern on the transparent substrate.