mhurhangee/ep-ind-claims huggingface dataset:
An aerosol dispensing apparatus (100, 500) comprising: a nebulizer (104, 200, 600) having an aerosol generator and an outlet conduit, and a controller, wherein the apparatus comprises a single dose aerosol chamber having a chamber nebulizer delivery port and an inhalation port, the apparatus comprises a filling stage comprising said nebulizer and a support for said single dose aerosol chamber, and said nebulizer (104, 200, 600) is adapted to deliver an aerosol dose into the chamber via the chamber nebulizer delivery port, the filling stage is configured for automatic engagement of the nebulizer outlet conduit with the chamber nebulizer delivery port and for separation after delivery of a dose, the nebulizer is configured to deliver at a flow rate in excess of 0.01 mL/min, and the nebulizer comprises a chamber sensor to detect presence of said chamber in engagement with the outlet conduit, and the controller is configured to commence aerosolization only upon said detection of said chamber. a nebulizer (104, 200, 600) having an aerosol generator and an outlet conduit, and a controller, wherein the apparatus comprises a single dose aerosol chamber having a chamber nebulizer delivery port and an inhalation port, the apparatus comprises a filling stage comprising said nebulizer and a support for said single dose aerosol chamber, and said nebulizer (104, 200, 600) is adapted to deliver an aerosol dose into the chamber via the chamber nebulizer delivery port, the filling stage is configured for automatic engagement of the nebulizer outlet conduit with the chamber nebulizer delivery port and for separation after delivery of a dose, the nebulizer is configured to deliver at a flow rate in excess of 0.01 mL/min, and the nebulizer comprises a chamber sensor to detect presence of said chamber in engagement with the outlet conduit, and the controller is configured to commence aerosolization only upon said detection of said chamber.
A laser-personalizable security article comprising: a multi-layer security document, the multi-layer security document comprising: an optically transparent cover layer with a first surface, a second surface, and a thickness between the first surface and the second surface, the first surface being at least partially a microstructured surface, wherein the microstructured surface forms microlenses or a lenticular surface; a composite image, wherein the composite image comprises a collection of complete or partial images located such that when viewed through the microstructured surface of the cover layer, the collection of complete or partial images forms the composite image; and an imagable layer adjacent to the cover layer, wherein the imagable layer comprises a laser imagable layer; and an optically transparent, removable, conformable layer, wherein the removable, conformable layer sufficiently wets out on the microstructured surface to render the micro structured surface invisible to a writing laser. a multi-layer security document, the multi-layer security document comprising: an optically transparent cover layer with a first surface, a second surface, and a thickness between the first surface and the second surface, the first surface being at least partially a microstructured surface, wherein the microstructured surface forms microlenses or a lenticular surface; a composite image, wherein the composite image comprises a collection of complete or partial images located such that when viewed through the microstructured surface of the cover layer, the collection of complete or partial images forms the composite image; and an imagable layer adjacent to the cover layer, wherein the imagable layer comprises a laser imagable layer; and an optically transparent cover layer with a first surface, a second surface, and a thickness between the first surface and the second surface, the first surface being at least partially a microstructured surface, wherein the microstructured surface forms microlenses or a lenticular surface; a composite image, wherein the composite image comprises a collection of complete or partial images located such that when viewed through the microstructured surface of the cover layer, the collection of complete or partial images forms the composite image; and an imagable layer adjacent to the cover layer, wherein the imagable layer comprises a laser imagable layer; and an optically transparent, removable, conformable layer, wherein the removable, conformable layer sufficiently wets out on the microstructured surface to render the micro structured surface invisible to a writing laser.
A compound of formula: wherein R 5 a is fluoro and R 5 b is hydrogen; or R 5 a is hydrogen and R 5 b is fluoro; or R 5 a and R 5 b are fluoro; or a compound of formula: wherein R 5 a is fluoro or hydrogen; and R 5 b is fluoro or hydrogen; or a compound of formula: wherein R 5 a is fluoro and R 5 b is hydrogen; or R 5 a is hydrogen and R 5 b is fluoro; or R 5 a and R 5 b are fluoro; or a compound of formula: wherein R 5 a is fluoro or hydrogen; and R 5 b is fluoro or hydrogen. wherein R 5 a is fluoro and R 5 b is hydrogen; or R 5 a is hydrogen and R 5 b is fluoro; or R 5 a and R 5 b are fluoro; or a compound of formula: wherein R 5 a is fluoro or hydrogen; and R 5 b is fluoro or hydrogen; or a compound of formula: wherein R 5 a is fluoro and R 5 b is hydrogen; or R 5 a is hydrogen and R 5 b is fluoro; or R 5 a and R 5 b are fluoro; or a compound of formula: wherein R 5 a is fluoro or hydrogen; and R 5 b is fluoro or hydrogen.
A method for producing an isothiocyanate using an organic primary amine and thiourea as starting materials, characterized in that the amount of thiourea is in the range of 1.1- to 10-fold as the stoichiometric ratio with respect to the amino groups of the organic primary amine, and the method comprises the following first or fourth method: the first method is a method including a step of producing a compound with a thioureido group and ammonia by reacting the organic primary amine and the thiourea, and a step of thermally decomposing the compound with a thioureido group and then separating an isothiocyanate and ammonia generated; the fourth method is a method including a step (a) of separating ammonia after producing an N-substituted O-substituted thiocarbamate and ammonia by reacting the organic primary amine, the thiourea and a hydroxy compound, and a step (b) of producing an isothiocyanate by thermally decomposing the N-substituted O-substituted thiocarbamate. the first method is a method including a step of producing a compound with a thioureido group and ammonia by reacting the organic primary amine and the thiourea, and a step of thermally decomposing the compound with a thioureido group and then separating an isothiocyanate and ammonia generated; the fourth method is a method including a step (a) of separating ammonia after producing an N-substituted O-substituted thiocarbamate and ammonia by reacting the organic primary amine, the thiourea and a hydroxy compound, and a step (b) of producing an isothiocyanate by thermally decomposing the N-substituted O-substituted thiocarbamate.
Method for reaction control of an oligomerization of olefins, comprising the steps: i) carrying out an oligomerization of olefins in a reactor containing a liquid medium comprising educt, catalyst, and/or solvent and/or product, ii) measuring temperature or temperature and pressure of the liquid of the reactor by means of sensor(s) (13, 14), iii) introducing an oxidizing catalyst poison into the reactor, if temperature or temperature and pressure measured exceed(s) predetermined value(s) below the value(s) of temperature or temperature and pressure under runaway conditions of the oligomerization of olefins. i) carrying out an oligomerization of olefins in a reactor containing a liquid medium comprising educt, catalyst, and/or solvent and/or product, ii) measuring temperature or temperature and pressure of the liquid of the reactor by means of sensor(s) (13, 14), iii) introducing an oxidizing catalyst poison into the reactor, if temperature or temperature and pressure measured exceed(s) predetermined value(s) below the value(s) of temperature or temperature and pressure under runaway conditions of the oligomerization of olefins.
A nucleic acid, comprising a plurality of nucleotide sequences, wherein each nucleotide sequence of the plurality comprises a genotype that is associated with a disease or condition; each nucleotide sequence is 600-10,000 base pairs long; and the plurality of nucleotide sequences comprises nucleotide sequences from at least 2 different chromosomes.
An austenitic stainless steel, which comprises by mass percent, C: 0.04 to 0.18%, Si: 0.02 to 1.5%, Mn: 0.02 to 2.0%, Ni: 6 to 30%, Cr: 15 to 30%, N: 0.03 to 0.35%, sol. Al; one or more elements selected from Nb: not more than 1.0%, V: not more than 0.5% and Ti: not more than 0.5%; and optionally one or more elements of one or more groups selected from the first to third groups listed below, with the balance being Fe and impurities: First group: Cu: not more than 4%, Mo: not more than 2%, W: not more than 2%, Co: not more than 1%, Ta: not more than 0.1%, Zr: not more than 0.1% and Hf: not more than 0.1%; Second group: B: not more than 0.012%; and Third group: Ca: not more than 0.02%, Mg: not more than 0.02% and rare earth element: not more than 0.1%, wherein the contents of P and S among the impurities are P: not more than 0.04% and S: not more than 0.03%, and wherein the value of P1 defined by the following formula satisfies the condition P1 ≤ 0.06: P 1 = S + P + Sn / 2 + As + Zn + Pb + Sb / 5 wherein each element symbol in the formula represents the content by mass percent of the element concerned, characterized in that sol. Al is 0.0005 to 0.03%, the contents of Sn, As, Zn, Pb and Sb among the impurities are Sn: not more than 0.1%, As: not more than 0.01%, Zn: not more than 0.01%, Pb: not more than 0.01% and Sb: not more than 0.01%, and the value of P2 defined by the following formula satisfies the condition 0.2 ≤ P2 ≤ 1.7 - 10 × P1: P 2 = Nb + 2 V + Ti wherein each element symbol in the formula represents the content by mass percent of the element concerned. First group: Cu: not more than 4%, Mo: not more than 2%, W: not more than 2%, Co: not more than 1%, Ta: not more than 0.1%, Zr: not more than 0.1% and Hf: not more than 0.1%; Second group: B: not more than 0.012%; and Third group: Ca: not more than 0.02%, Mg: not more than 0.02% and rare earth element: not more than 0.1%, wherein the contents of P and S among the impurities are P: not more than 0.04% and S: not more than 0.03%, and wherein the value of P1 defined by the following formula satisfies the condition P1 ≤ 0.06: P 1 = S + P + Sn / 2 + As + Zn + Pb + Sb / 5 wherein each element symbol in the formula represents the content by mass percent of the element concerned, characterized in that sol. Al is 0.0005 to 0.03%, the contents of Sn, As, Zn, Pb and Sb among the impurities are Sn: not more than 0.1%, As: not more than 0.01%, Zn: not more than 0.01%, Pb: not more than 0.01% and Sb: not more than 0.01%, and the value of P2 defined by the following formula satisfies the condition 0.2 ≤ P2 ≤ 1.7 - 10 × P1: P 2 = Nb + 2 V + Ti wherein each element symbol in the formula represents the content by mass percent of the element concerned.
A hydrogen sensor (10, 100) for detecting hydrogen in a fluid of oil in physical contact with the sensor, comprising: - an optical fiber with a fiber core, - a multilayer comprising a sensing layer, the multilayer being coated on an end surface of the fiber core perpendicular to a longitudinal axis of the optical fiber, - a first protection layer comprising PMMA, and - a second protection layer comprising one of SiO 2, Aluminium Oxide, and PTFE, wherein the first protection layer and the second protection layer are coated on the multilayer. - an optical fiber with a fiber core, - a multilayer comprising a sensing layer, the multilayer being coated on an end surface of the fiber core perpendicular to a longitudinal axis of the optical fiber, - a first protection layer comprising PMMA, and - a second protection layer comprising one of SiO 2, Aluminium Oxide, and PTFE, wherein the first protection layer and the second protection layer are coated on the multilayer.
A vapor compression system (20; 300) comprising: a centrifugal compressor having: an inlet; an outlet; an economizer port intermediate the inlet and outlet; a first impeller stage; a second impeller stage; and a motor coupled to the first impeller stage and second impeller stage; a first heat exchanger downstream of the outlet along a refrigerant flowpath; an expansion device; a second heat exchanger upstream of the inlet along the refrigerant flowpath; an economizer having an economizer line returning to the economizer port a first bypass flowpath (120; 320) positioned to deliver refrigerant from the compressor bypassing the first heat exchanger; and a valve positioned to control flow through the bypass flowpath, wherein: the first bypass flowpath extends from a first location intermediate the inlet and outlet to a second location (142; 342) downstream of the first heat exchanger along the refrigerant flowpath, and a second bypass flowpath extends from a third location downstream of the first location to a fourth location (150; 82) upstream of the expansion device. a centrifugal compressor having: an inlet; an outlet; an inlet; an outlet; an economizer port intermediate the inlet and outlet; a first impeller stage; a second impeller stage; and a motor coupled to the first impeller stage and second impeller stage; a first impeller stage; a second impeller stage; and a motor coupled to the first impeller stage and second impeller stage; a first heat exchanger downstream of the outlet along a refrigerant flowpath; an expansion device; a second heat exchanger upstream of the inlet along the refrigerant flowpath; an economizer having an economizer line returning to the economizer port a first bypass flowpath (120; 320) positioned to deliver refrigerant from the compressor bypassing the first heat exchanger; and a valve positioned to control flow through the bypass flowpath, the first bypass flowpath extends from a first location intermediate the inlet and outlet to a second location (142; 342) downstream of the first heat exchanger along the refrigerant flowpath, and a second bypass flowpath extends from a third location downstream of the first location to a fourth location (150; 82) upstream of the expansion device.
A solution comprising at least one peptide inhibitor of protein kinase C βII (PKCβII) and/or at least one peptide inhibitor of protein kinase C ζ (PKCζ) and/or at least one peptide activator of PKC δ for use in perfusion, preservation, and/or re-perfusion for organ preservation during organ transplantation.
A washing or cleaning agent, comprising at least one anionic and/or one non-ionic surfactant and encapsulated odorants and also non-encapsulated odorants, wherein a. less than 10 wt.% of the encapsulated odorants have a cLogP value ≥ 4.0 and a boiling point ≥ 275 °C, wt.% based on the total amount of encapsulated odorants, b. at least 25 wt.% of the encapsulated odorants have a cLogP value ≥ 4.0 and a boiling point < 275 °C, wt.% based on the total amount of the encapsulated odorants, c. at least 20 wt.% of the encapsulated odorants have a boiling point ≤ 250 °C, preferably ≤ 200 °C, wt.% based on the total amount of the encapsulated odorants, d. at least 30 wt.% of the encapsulated odorants have a cLogP value ≤ 3.0, wt.% based on the total amount of encapsulated odorants, and wherein the agent contains fragrance precursors, incorporated in microcapsules. a. less than 10 wt.% of the encapsulated odorants have a cLogP value ≥ 4.0 and a boiling point ≥ 275 °C, wt.% based on the total amount of encapsulated odorants, b. at least 25 wt.% of the encapsulated odorants have a cLogP value ≥ 4.0 and a boiling point < 275 °C, wt.% based on the total amount of the encapsulated odorants, c. at least 20 wt.% of the encapsulated odorants have a boiling point ≤ 250 °C, preferably ≤ 200 °C, wt.% based on the total amount of the encapsulated odorants, d. at least 30 wt.% of the encapsulated odorants have a cLogP value ≤ 3.0, wt.% based on the total amount of encapsulated odorants,
Process for preparing nonalternating formaldehyde/CO 2 copolymers, comprising the step of reacting formaldehyde or a formaldehyde-releasing compound with carbon dioxide in the presence of a catalyst system, characterized in that the catalyst system comprises a Lewis-acidic component and a basic component, wherein the Lewis-acidic component under reaction conditions is at least intermittently coordinatively unsaturated and wherein the basic component has a pK b of ≥ 0.
A control apparatus of a hybrid vehicle having at least one of an internal combustion engine and a rotating electric machine as a motive power source comprising: a main power supply connected to said rotating electric machine to be capable of sending/receiving electric power to/from said rotating electric machine; a plurality of sub-power supplies (10-2, 10-3) capable of sending/receiving electric power to/from said rotating electric machine; a switching device provided between said plurality of sub-power supplies (10-2, 10-3) and said rotating electric machine and configured to be able to connect any one of said plurality of sub-power supplies (10-2, 10-3) to said rotating electric machine in accordance with a given command; a switching control portion controlling said switching device; and a driving control portion executing either driving control of hybrid driving control in which said hybrid vehicle is driven with motive power of at least one of said internal combustion engine and said rotating electric machine and electric driving control in which said hybrid vehicle is driven with motive power of said rotating electric machine without using said internal combustion engine, characterized in that said switching control portion controls said switching device such that the number of said sub-power supplies (10-2, 10-3) connected to said rotating electric machine is smaller during said hybrid driving control than during said electric driving control. a main power supply connected to said rotating electric machine to be capable of sending/receiving electric power to/from said rotating electric machine; a plurality of sub-power supplies (10-2, 10-3) capable of sending/receiving electric power to/from said rotating electric machine; a switching device provided between said plurality of sub-power supplies (10-2, 10-3) and said rotating electric machine and configured to be able to connect any one of said plurality of sub-power supplies (10-2, 10-3) to said rotating electric machine in accordance with a given command; a switching control portion controlling said switching device; and a driving control portion executing either driving control of hybrid driving control in which said hybrid vehicle is driven with motive power of at least one of said internal combustion engine and said rotating electric machine and electric driving control in which said hybrid vehicle is driven with motive power of said rotating electric machine without using said internal combustion engine, characterized in that said switching control portion controls said switching device such that the number of said sub-power supplies (10-2, 10-3) connected to said rotating electric machine is smaller during said hybrid driving control than during said electric driving control.
A method of fabricating a flip-chip photonic-crystal light-emitting diode, comprising: providing an initial substrate comprising an epitaxial-growth surface and a light-output surface; characterized in that the method further comprises performing a nanoimprint process on the epitaxial-growth surface of the initial substrate to form a nano-level patterned substrate; forming a flip-chip LED structure on the epitaxial-growth surface of the nano-level patterned substrate; and performing a nanoimprint process on the light-output surface of the nano-level patterned substrate to form a flip-chip photonic-crystal LED, wherein performing the nanoimprint process on the epitaxial-growth surface of the initial substrate includes: cleaning the initial substrate and forming a first imprint resist layer on the epitaxial-growth surface of the initial substrate; pressing a first imprint mold onto the first imprint resist layer to transfer patterns of the first imprint mold into the first imprint resist layer; removing the first imprint mold and performing an etching process on the first imprint resist layer, thereby forming patterns in the epitaxial-growth surface of the initial substrate; and removing the first imprint resist layer to form the nano-level patterned substrate. providing an initial substrate comprising an epitaxial-growth surface and a light-output surface; characterized in that the method further comprises performing a nanoimprint process on the epitaxial-growth surface of the initial substrate to form a nano-level patterned substrate; forming a flip-chip LED structure on the epitaxial-growth surface of the nano-level patterned substrate; and performing a nanoimprint process on the light-output surface of the nano-level patterned substrate to form a flip-chip photonic-crystal LED, wherein performing the nanoimprint process on the epitaxial-growth surface of the initial substrate includes: cleaning the initial substrate and forming a first imprint resist layer on the epitaxial-growth surface of the initial substrate; pressing a first imprint mold onto the first imprint resist layer to transfer patterns of the first imprint mold into the first imprint resist layer; removing the first imprint mold and performing an etching process on the first imprint resist layer, thereby forming patterns in the epitaxial-growth surface of the initial substrate; and removing the first imprint resist layer to form the nano-level patterned substrate. cleaning the initial substrate and forming a first imprint resist layer on the epitaxial-growth surface of the initial substrate; pressing a first imprint mold onto the first imprint resist layer to transfer patterns of the first imprint mold into the first imprint resist layer; removing the first imprint mold and performing an etching process on the first imprint resist layer, thereby forming patterns in the epitaxial-growth surface of the initial substrate; and removing the first imprint resist layer to form the nano-level patterned substrate.
A grating structure, characterized by comprising a light entry part and multiple grating units; wherein the grating unit is a light-transmitting strip, wherein the multiple grating units 200 are parallel to each other and adjacent grating units are connected together, wherein a cross section of the grating unit comprises an arc part, so that the grating unit can cause an incident light beam to emerge in a diffused manner along the cross section, thereby forming a strip-shaped light band in a visual field, wherein two ends of the arc part are each connected to a straight line part. wherein the grating unit is a light-transmitting strip, wherein the multiple grating units 200 are parallel to each other and adjacent grating units are connected together, wherein a cross section of the grating unit comprises an arc part, so that the grating unit can cause an incident light beam to emerge in a diffused manner along the cross section, thereby forming a strip-shaped light band in a visual field, wherein two ends of the arc part are each connected to a straight line part.