An apparatus for processing exhaust fluid in which a fluid generated in a process chamber of an apparatus for manufacturing a semiconductor, a display panel, or a solar cell is ejected to the outside, wherein the apparatus for processing exhaust fluid is connectable to the process chamber and comprises: a vacuum pump that,is connectable to the process chamber, and adapted to vacuumize an inside of the process chamber, and to eject the fluid generated in the process chamber to the outside; and a plasma reactor, characterized in that the plasma reactor is adapted for plasma forming in the plasma reactor, and further adapted to decompose the fluid generated in the process chamber, wherein the plasma reactor comprises: an electrically insulating conduit connected to the vacuum pump and connectable to the process chamber such that, when connected, it is provided between the process chamber and the vacuum pump and provides a space in which the fluid decomposes; at least one electrode unit that is provided on an outer circumferential surface of the conduit, forms an annular shape of a predetermined length that surrounds the conduit and receives a voltage to form the plasma; and a buffer unit that is formed of an electrically conductive elastic substance and is disposed between the conduit and the electrode unit to attach the conduit and the electrode unit closely together, and an external pipe into which the conduit, the electrode unit and the buffer unit are inserted; wherein sealing flanges are provided on both end portions of the conduit and the external pipe to seal a space between the conduit and the external pipe; wherein the plasma reactor has a dual pipe structure in which the external pipe is disposed outside the conduit for preventing fluid such as process by-products from leaking out when the conduit cracks or is damaged. a vacuum pump that,is connectable to the process chamber, and adapted to vacuumize an inside of the process chamber, and to eject the fluid generated in the process chamber to the outside; and a plasma reactor, the plasma reactor is adapted for plasma forming in the plasma reactor, and further adapted to decompose the fluid generated in the process chamber, wherein the plasma reactor comprises: an electrically insulating conduit connected to the vacuum pump and connectable to the process chamber such that, when connected, it is provided between the process chamber and the vacuum pump and provides a space in which the fluid decomposes; at least one electrode unit that is provided on an outer circumferential surface of the conduit, forms an annular shape of a predetermined length that surrounds the conduit and receives a voltage to form the plasma; and a buffer unit that is formed of an electrically conductive elastic substance and is disposed between the conduit and the electrode unit to attach the conduit and the electrode unit closely together, and an external pipe into which the conduit, the electrode unit and the buffer unit are inserted; wherein sealing flanges are provided on both end portions of the conduit and the external pipe to seal a space between the conduit and the external pipe; wherein the plasma reactor has a dual pipe structure in which the external pipe is disposed outside the conduit for preventing fluid such as process by-products from leaking out when the conduit cracks or is damaged. an electrically insulating conduit connected to the vacuum pump and connectable to the process chamber such that, when connected, it is provided between the process chamber and the vacuum pump and provides a space in which the fluid decomposes; at least one electrode unit that is provided on an outer circumferential surface of the conduit, forms an annular shape of a predetermined length that surrounds the conduit and receives a voltage to form the plasma; and a buffer unit that is formed of an electrically conductive elastic substance and is disposed between the conduit and the electrode unit to attach the conduit and the electrode unit closely together, and an external pipe into which the conduit, the electrode unit and the buffer unit are inserted; wherein sealing flanges are provided on both end portions of the conduit and the external pipe to seal a space between the conduit and the external pipe; wherein the plasma reactor has a dual pipe structure in which the external pipe is disposed outside the conduit for preventing fluid such as process by-products from leaking out when the conduit cracks or is damaged.