A photosensitive resin composition comprising: at least one precursor selected from the group consisting of a polyimide precursor and a polybenzoxazole precursor; a compound having a sulfurous ester structure; and a photoradical polymerization initiator, characterized in that the photosensitive resin composition satisfies one of the following conditions A, B or C: condition A: the precursor does not contain a radically polymerizable group, the compound having a sulfurous ester structure contains a radically polymerizable group, and the photosensitive resin composition further contains a compound containing a radically polymerizable group, other than the precursor and the compound having a sulfurous ester structure; condition B: the precursor contains a radically polymerizable group, the compound having a sulfurous ester structure does not contain a radically polymerizable group, and the photosensitive resin composition further contains a compound containing a radically polymerizable group, other than the precursor and the compound having a sulfurous ester structure; condition C: the precursor contains a radically polymerizable group, the compound having a sulfurous ester structure contains a radically polymerizable group, and the photosensitive resin composition further contains a compound containing a radically polymerizable group, other than the precursor and the compound having a sulfurous ester structure. at least one precursor selected from the group consisting of a polyimide precursor and a polybenzoxazole precursor; a compound having a sulfurous ester structure; and a photoradical polymerization initiator, characterized in that the photosensitive resin composition satisfies one of the following conditions A, B or C: condition A: the precursor does not contain a radically polymerizable group, the compound having a sulfurous ester structure contains a radically polymerizable group, and the photosensitive resin composition further contains a compound containing a radically polymerizable group, other than the precursor and the compound having a sulfurous ester structure; condition B: the precursor contains a radically polymerizable group, the compound having a sulfurous ester structure does not contain a radically polymerizable group, and the photosensitive resin composition further contains a compound containing a radically polymerizable group, other than the precursor and the compound having a sulfurous ester structure; condition C: the precursor contains a radically polymerizable group, the compound having a sulfurous ester structure contains a radically polymerizable group, and the photosensitive resin composition further contains a compound containing a radically polymerizable group, other than the precursor and the compound having a sulfurous ester structure. condition A: the precursor does not contain a radically polymerizable group, the compound having a sulfurous ester structure contains a radically polymerizable group, and the photosensitive resin composition further contains a compound containing a radically polymerizable group, other than the precursor and the compound having a sulfurous ester structure; condition B: the precursor contains a radically polymerizable group, the compound having a sulfurous ester structure does not contain a radically polymerizable group, and the photosensitive resin composition further contains a compound containing a radically polymerizable group, other than the precursor and the compound having a sulfurous ester structure; condition C: the precursor contains a radically polymerizable group, the compound having a sulfurous ester structure contains a radically polymerizable group, and the photosensitive resin composition further contains a compound containing a radically polymerizable group, other than the precursor and the compound having a sulfurous ester structure.