A method for the simultaneous interferometric examination of the form and/or position of at least two optical functional surfaces (13, 14) by use of an interferometric test set-up comprising - an interferometer, - a beam-shaping optical element disposed in the radiation path between the interferometer and the optical functional surfaces (13, 14), and - alignment marks (15, 16, 17, 18) which are located at defined positions in the interferometric test set-up or defined positions in relation to the optical functional surfaces (13, 14), having the steps: - generating a plurality of alignment wavefronts by the beam-shaping optical element, the alignment wavefronts being transmitted or reflected at the alignment marks (15, 16, 17, 18) and at the optical functional surfaces (13, 14) and thus generating measuring wavefronts, - measuring the position of the optical functional surfaces (13, 14) with respect to each other and with respect to the alignment marks (15, 16, 17, 18) by evaluating the measuring wavefronts in the interferometer, - performing alignment movements for aligning the optical functional surfaces (13, 14) to a target position, - generating at least two test wavefronts by the beam-shaping optical element, the test wavefronts being transmitted or reflected at the optical functional surfaces (13, 14) and thus generating further measuring wavefronts, and - determining form and/or position deviations of the optical functional surfaces (13, 14) with respect to their target geometry and/or position by evaluating the further measuring wavefronts in the interferometer, the beam-shaping optical element comprising at least two test holograms (2, 3) for generating the test wavefronts and a plurality of alignment holograms (4, 5, 6, 7) for generating the alignment wavefronts. - an interferometer, - a beam-shaping optical element disposed in the radiation path between the interferometer and the optical functional surfaces (13, 14), and - alignment marks (15, 16, 17, 18) which are located at defined positions in the interferometric test set-up or defined positions in relation to the optical functional surfaces (13, 14), - generating a plurality of alignment wavefronts by the beam-shaping optical element, the alignment wavefronts being transmitted or reflected at the alignment marks (15, 16, 17, 18) and at the optical functional surfaces (13, 14) and thus generating measuring wavefronts, - measuring the position of the optical functional surfaces (13, 14) with respect to each other and with respect to the alignment marks (15, 16, 17, 18) by evaluating the measuring wavefronts in the interferometer, - performing alignment movements for aligning the optical functional surfaces (13, 14) to a target position, - generating at least two test wavefronts by the beam-shaping optical element, the test wavefronts being transmitted or reflected at the optical functional surfaces (13, 14) and thus generating further measuring wavefronts, and - determining form and/or position deviations of the optical functional surfaces (13, 14) with respect to their target geometry and/or position by evaluating the further measuring wavefronts in the interferometer, the beam-shaping optical element comprising at least two test holograms (2, 3) for generating the test wavefronts and a plurality of alignment holograms (4, 5, 6, 7) for generating the alignment wavefronts.