A magnetron sputtering device for the generation of nanoclusters comprising: a) a first chamber arranged for the generation of nanoclusters working under high or ultra-high vacuum conditions and comprising - at least a magnetron, said magnetron comprising • a target which is made from any element that is high or ultra-high vacuum compatible and any combination thereof, wherein the target has a diameter of between 2.54 cm to 30.48 cm; • an arrangement of magnets; and • at least a first gas source, arranged for the delivery of sputtering gas selected from N 2, Ar, He, Ne, Kr, Xe, Ra, O 2 and any combination thereof; - at least a secondary gas source arranged for delivery of a second gas; wherein the first chamber has a first "a" axis and a second "b" axis, the first axis being greater than the second axis; said device characterized in that the magnetron is a full face erosion magnetron; the second gas is selected from O 2, N 2, H 2 O, methanol, air and any combination thereof; and the arrangement of magnets comprising: - a statationary magnetic ring with North or South polarity in the direction of the central axis of the magnetic ring; and - a rotational magnetic disc comprising an off-centre area with inverse magnetic polarity to the polarity of the stationary magnetic ring; wherein the stationary magnetic ring is concentric with respect to the rotational magnetic disc; and wherein the rotational magnetic disc rotates by means of a - said stationary magnetic ring has a diameter of between 2.54 cm to 30.48 cm; - said rotational magnetic disc has a diameter of between 1.27 cm and 27.94 cm. a) a first chamber arranged for the generation of nanoclusters working under high or ultra-high vacuum conditions and comprising - at least a magnetron, said magnetron comprising • a target which is made from any element that is high or ultra-high vacuum compatible and any combination thereof, wherein the target has a diameter of between 2.54 cm to 30.48 cm; • an arrangement of magnets; and • at least a first gas source, arranged for the delivery of sputtering gas selected from N 2, Ar, He, Ne, Kr, Xe, Ra, O 2 and any combination thereof; - at least a secondary gas source arranged for delivery of a second gas; wherein the first chamber has a first "a" axis and a second "b" axis, the first axis being greater than the second axis; said device characterized in that the magnetron is a full face erosion magnetron; the second gas is selected from O 2, N 2, H 2 O, methanol, air and any combination thereof; and the arrangement of magnets comprising: - a statationary magnetic ring with North or South polarity in the direction of the central axis of the magnetic ring; and - a rotational magnetic disc comprising an off-centre area with inverse magnetic polarity to the polarity of the stationary magnetic ring; wherein the stationary magnetic ring is concentric with respect to the rotational magnetic disc; and wherein the rotational magnetic disc rotates by means of a - said stationary magnetic ring has a diameter of between 2.54 cm to 30.48 cm; - said rotational magnetic disc has a diameter of between 1.27 cm and 27.94 cm. - at least a magnetron, said magnetron comprising • a target which is made from any element that is high or ultra-high vacuum compatible and any combination thereof, wherein the target has a diameter of between 2.54 cm to 30.48 cm; • an arrangement of magnets; and • at least a first gas source, arranged for the delivery of sputtering gas selected from N 2, Ar, He, Ne, Kr, Xe, Ra, O 2 and any combination thereof; • a target which is made from any element that is high or ultra-high vacuum compatible and any combination thereof, wherein the target has a diameter of between 2.54 cm to 30.48 cm; • an arrangement of magnets; and • at least a first gas source, arranged for the delivery of sputtering gas selected from N 2, Ar, He, Ne, Kr, Xe, Ra, O 2 and any combination thereof; - at least a secondary gas source arranged for delivery of a second gas; wherein the first chamber has a first "a" axis and a second "b" axis, the first axis being greater than the second axis; said device characterized in that the magnetron is a full face erosion magnetron; the second gas is selected from O 2, N 2, H 2 O, methanol, air and any combination thereof; and the arrangement of magnets comprising: - a statationary magnetic ring with North or South polarity in the direction of the central axis of the magnetic ring; and - a rotational magnetic disc comprising an off-centre area with inverse magnetic polarity to the polarity of the stationary magnetic ring; wherein the stationary magnetic ring is concentric with respect to the rotational magnetic disc; and wherein the rotational magnetic disc rotates by means of a - said stationary magnetic ring has a diameter of between 2.54 cm to 30.48 cm; - a statationary magnetic ring with North or South polarity in the direction of the central axis of the magnetic ring; and - a rotational magnetic disc comprising an off-centre area with inverse magnetic polarity to the polarity of the stationary magnetic ring; wherein the stationary magnetic ring is concentric with respect to the rotational magnetic disc; and wherein the rotational magnetic disc rotates by means of a - said stationary magnetic ring has a diameter of between 2.54 cm to 30.48 cm; - said rotational magnetic disc has a diameter of between 1.27 cm and 27.94 cm.