An exposure apparatus for exposing a substrate with an illumination light via a projection optical system, the apparatus comprising: a base member supported via a first vibration isolating member below the projection optical system; a stage that is arranged on the base member, the stage having a holder configured to support the substrate; a measurement frame arranged via a second vibration isolating member (23A, 23B, 23C) that is different from the first isolating member; a drive system having a motor configured to drive the stage on the base member; a plurality of grating portions (39X 1, 39Y 1) provided on the measurement frame so as to be arranged substantially parallel with a predetermined plane that is orthogonal to an optical axis of the projection optical system above the stage, each of the plurality of grating portions having a reflection-type grating; an encoder system provided on the stage and configured to obtain position information of the stage, the encoder system having a plurality of heads (64, 66) configured to irradiate a beam to each of the plurality of grating portions from below the plurality of grating portions; and a controller configured to control the drive system based on the position information obtained by the encoder system, wherein the plurality of grating portions are arranged such that the reflection-type grating surrounds a lens, the lens being one of a plurality of optical elements of the projection optical system and being arranged closest to an image plane, and the position information of the stage moved below the plurality of grating portions is measured by the encoder system at least in an exposure operation of the substrate. a base member supported via a first vibration isolating member below the projection optical system; a stage that is arranged on the base member, the stage having a holder configured to support the substrate; a measurement frame arranged via a second vibration isolating member (23A, 23B, 23C) that is different from the first isolating member; a drive system having a motor configured to drive the stage on the base member; a plurality of grating portions (39X 1, 39Y 1) provided on the measurement frame so as to be arranged substantially parallel with a predetermined plane that is orthogonal to an optical axis of the projection optical system above the stage, each of the plurality of grating portions having a reflection-type grating; an encoder system provided on the stage and configured to obtain position information of the stage, the encoder system having a plurality of heads (64, 66) configured to irradiate a beam to each of the plurality of grating portions from below the plurality of grating portions; and a controller configured to control the drive system based on the position information obtained by the encoder system, wherein the plurality of grating portions are arranged such that the reflection-type grating surrounds a lens, the lens being one of a plurality of optical elements of the projection optical system and being arranged closest to an image plane, and the position information of the stage moved below the plurality of grating portions is measured by the encoder system at least in an exposure operation of the substrate.