A surface plasmon resonance fluorescence analysis method for detecting an amount of a substance to be measured by irradiating an analysis chip containing the substance to be measured with incident light and detecting a quantity of fluorescent light (γ) output from the analysis chip, the analysis method comprising: a step of irradiating an incident surface of the analysis chip and another surface adjacent to the incident surface with the incident light while changing a relative position of the incident light with respect to the analysis chip, detecting light reflected from the incident surface of the analysis chip, whereby light reflected from the other surface is not detected and acquiring information on a position of the analysis chip from a relationship between a quantity of the reflected light detected and the relative position, the analysis method further comprising: an abnormality determination step of determining that the analysis chip is abnormal in a case where the quantity of reflected light detected is equal to or lower than a predetermined light quantity, when the analysis chip is located at a position where the total beam area of the incident light is incident on the incident surface and an abnormality elimination determination step of determining whether an abnormality in the analysis chip can be eliminated when it is determined that the analysis chip is abnormal in the abnormality determination step, wherein in the abnormality elimination determination step, it is determined that an abnormality in the analysis chip can be eliminated if a difference between the values of a maximum quantity and a minimum quantity of the reflected light is equal to or lower than a product of a predetermined rate and the maximum value, or it is determined that the abnormality cannot be eliminated if the difference between the values of the maximum quantity and the minimum quantity exceeds the product of the predetermined rate and the maximum value. a step of irradiating an incident surface of the analysis chip and another surface adjacent to the incident surface with the incident light while changing a relative position of the incident light with respect to the analysis chip, detecting light reflected from the incident surface of the analysis chip, whereby light reflected from the other surface is not detected and acquiring information on a position of the analysis chip from a relationship between a quantity of the reflected light detected and the relative position, the analysis method further comprising: an abnormality determination step of determining that the analysis chip is abnormal in a case where the quantity of reflected light detected is equal to or lower than a predetermined light quantity, when the analysis chip is located at a position where the total beam area of the incident light is incident on the incident surface and an abnormality elimination determination step of determining whether an abnormality in the analysis chip can be eliminated when it is determined that the analysis chip is abnormal in the abnormality determination step, wherein in the abnormality elimination determination step, it is determined that an abnormality in the analysis chip can be eliminated if a difference between the values of a maximum quantity and a minimum quantity of the reflected light is equal to or lower than a product of a predetermined rate and the maximum value, or it is determined that the abnormality cannot be eliminated if the difference between the values of the maximum quantity and the minimum quantity exceeds the product of the predetermined rate and the maximum value. an abnormality determination step of determining that the analysis chip is abnormal in a case where the quantity of reflected light detected is equal to or lower than a predetermined light quantity, when the analysis chip is located at a position where the total beam area of the incident light is incident on the incident surface and an abnormality elimination determination step of determining whether an abnormality in the analysis chip can be eliminated when it is determined that the analysis chip is abnormal in the abnormality determination step, wherein in the abnormality elimination determination step, it is determined that an abnormality in the analysis chip can be eliminated if a difference between the values of a maximum quantity and a minimum quantity of the reflected light is equal to or lower than a product of a predetermined rate and the maximum value, or it is determined that the abnormality cannot be eliminated if the difference between the values of the maximum quantity and the minimum quantity exceeds the product of the predetermined rate and the maximum value.