A process for the preparation of a functionalized Si/Ge surface, the Si/Ge surface being selected from the group consisting of silicon nitride, silicon carbide, germanium nitride, germanium carbide and silicon germanium surfaces, the silicon and germanium carbides having the formula M x C y, wherein M is Si or Ge and x is in the range of 0.3y to 3y, wherein the Si/Ge surface is subjected to the following steps: (a) etching the Si/Ge surface with an etching agent to form an etched Si/Ge surface; and (b) reacting the etched Si/Ge surface with an ω-functionalized alkene represented by the general formula or with an ω-functionalized alkyne represented by the general formula or with a mixture thereof: wherein P is a linear, branched or cyclic alkenyl group having 2 to 24 carbon atoms, the alkenyl group being a 1-alkenyl group or an internal alkenyl group; Q is a linear, branched or cyclic alkynyl group having 2 to 24 carbon atoms, the alkynyl group being a 1-alkynyl group or an internal alkynyl group; C is a functional group selected from: -CH=CR 2 R 3; -C≡CR 2; -NR 2 -C -N(R 2) 2; -O-[(C(R 4) 2) p O] q -R 1; -C XR 1; -C NR 2 R 3; -S OR 1; -S 2 OR 1; -S NR 2 R 3; -S 2 NR 2 R 3; -P (R 1)(OR 1); -P (OR 1) 2; -CN; -Cl; -Br; -I; -NCX; -XCN; or C is a protected functional group selected from: -XC R 1; -NR 2 C R 1; -XR 5; -XSi(R 1) 3; -OS (OR 1); -OS 2 OR 1; -P (R 1)(OR 1); -OP (OR 1) 2; or a group of the general formula and tautomers thereof: wherein X is independently O or S; R 1 is a linear, branched, or cyclic alkyl group having 1 to 12 carbon atoms; a phenyl group; an alkaryl group having 7 to 12 carbon atoms; or an arylalkyl group having 7 to 12 carbon atoms; wherein the alkyl, phenyl, alkaryl and arylalkyl groups may be substituted with one or more of F or Cl; R 2 and R 3 are independently hydrogen or a group as defined for R 1; R 4 is independently selected from hydrogen or C 1 - C 4 alkyl; R 5 is a monofunctional hydroxy or thiohydroxy protecting group; R 6 represents a protected -OH or -NH 2 group, wherein the protected -OH group is selected from the groups defined for-XR 5 wherein X is O and wherein the protected -NH 2 group is selected from the groups defined for -NR 2 C R 1; and wherein_p is an integer in the range of 2 - 4; q is an integer in the range of 1 to 500; and n is an integer in the range of 1 to 3. (a) etching the Si/Ge surface with an etching agent to form an etched Si/Ge surface; and (b) reacting the etched Si/Ge surface with an ω-functionalized alkene represented by the general formula or with an ω-functionalized alkyne represented by the general formula or with a mixture thereof: wherein P is a linear, branched or cyclic alkenyl group having 2 to 24 carbon atoms, the alkenyl group being a 1-alkenyl group or an internal alkenyl group; Q is a linear, branched or cyclic alkynyl group having 2 to 24 carbon atoms, the alkynyl group being a 1-alkynyl group or an internal alkynyl group; C is a functional group selected from: -CH=CR 2 R 3; -C≡CR 2; -NR 2 -C -N(R 2) 2; -O-[(C(R 4) 2) p O] q -R 1; -C XR 1; -C NR 2 R 3; -S OR 1; -S 2 OR 1; -S NR 2 R 3; -S 2 NR 2 R 3; -P (R 1)(OR 1); -P (OR 1) 2; -CN; -Cl; -Br; -I; -NCX; -XCN; or C is a protected functional group selected from: -XC R 1; -NR 2 C R 1; -XR 5; -XSi(R 1) 3; -OS (OR 1); -OS 2 OR 1; -P (R 1)(OR 1); -OP (OR 1) 2; or a group of the general formula and tautomers thereof: wherein P is a linear, branched or cyclic alkenyl group having 2 to 24 carbon atoms, the alkenyl group being a 1-alkenyl group or an internal alkenyl group; Q is a linear, branched or cyclic alkynyl group having 2 to 24 carbon atoms, the alkynyl group being a 1-alkynyl group or an internal alkynyl group; C is a functional group selected from: -CH=CR 2 R 3; -C≡CR 2; -NR 2 -C -N(R 2) 2; -O-[(C(R 4) 2) p O] q -R 1; -C XR 1; -C NR 2 R 3; -S OR 1; -S 2 OR 1; -S NR 2 R 3; -S 2 NR 2 R 3; -P (R 1)(OR 1); -P (OR 1) 2; -CN; -Cl; -Br; -I; -NCX; -XCN; or -CH=CR 2 R 3; -C≡CR 2; -NR 2 -C -N(R 2) 2; -O-[(C(R 4) 2) p O] q -R 1; -C XR 1; -C NR 2 R 3; -S OR 1; -S 2 OR 1; -S NR 2 R 3; -S 2 NR 2 R 3; -P (R 1)(OR 1); -P (OR 1) 2; -CN; -Cl; -Br; -I; -NCX; -XCN; or C is a protected functional group selected from: -XC R 1; -NR 2 C R 1; -XR 5; -XSi(R 1) 3; -OS (OR 1); -OS 2 OR 1; -P (R 1)(OR 1); -OP (OR 1) 2; or -XC R 1; -NR 2 C R 1; -XR 5; -XSi(R 1) 3; -OS (OR 1); -OS 2 OR 1; -P (R 1)(OR 1); -OP (OR 1) 2; or wherein X is independently O or S; R 1 is a linear, branched, or cyclic alkyl group having 1 to 12 carbon atoms; a phenyl group; an alkaryl group having 7 to 12 carbon atoms; or an arylalkyl group having 7 to 12 carbon atoms; wherein the alkyl, phenyl, alkaryl and arylalkyl groups may be substituted with one or more of F or Cl; R 2 and R 3 are independently hydrogen or a group as defined for R 1; R 4 is independently selected from hydrogen or C 1 - C 4 alkyl; R 5 is a monofunctional hydroxy or thiohydroxy protecting group; R 6 represents a protected -OH or -NH 2 group, wherein the protected -OH group is selected from the groups defined for-XR 5 wherein X is O and wherein the protected -NH 2 group is selected from the groups defined for -NR 2 C R 1; and wherein_p is an integer in the range of 2 - 4; q is an integer in the range of 1 to 500; and n is an integer in the range of 1 to 3.