A pattern-forming method comprising, in the following order the steps of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition; exposing the film with an electron beam or an EUV ray; and developing the film with a developer containing an organic solvent, the concentration of the organic solvent in the developer being 90% by mass or more, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises: a resin containing an acid-decomposable repeating unit and being capable of decreasing the solubility in an organic solvent by the action of an acid; a compound generating an acid upon irradiation with an actinic ray or radiation; and a solvent, and wherein the resin is a resin (A-1) containing a repeating unit represented by the following formula and a repeating unit having a group protecting a group selected from a carboxyl group, a fluorinated alcohol group, and a sulfonic acid group with a group capable of decomposing and leaving by the action of an acid, as an acid-decomposable group: wherein A represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, or a cyano group; R represents a halogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkenyl group, an aralkyl group, an alkoxy group, an alkylcarbonyloxy group, an alkylsulfonyloxy group, an alkyloxycarbonyl group or an aryloxycarbonyl group, and when two or more R's are present, each R may be the same as or different from every other R or when two or more R's are present, they may form a ring in combination with each other; a represents an integer of 1 to 3; and b represents an integer of 0 to (3-a); and the content of the repeating unit represented by the formula in the resin is 5 to 20 mol% based on all the repeating units. forming a film with an actinic ray-sensitive or radiation-sensitive resin composition; exposing the film with an electron beam or an EUV ray; and developing the film with a developer containing an organic solvent, the concentration of the organic solvent in the developer being 90% by mass or more, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises: a resin containing an acid-decomposable repeating unit and being capable of decreasing the solubility in an organic solvent by the action of an acid; a compound generating an acid upon irradiation with an actinic ray or radiation; and a solvent, and wherein the resin is a resin (A-1) containing a repeating unit represented by the following formula and a repeating unit having a group protecting a group selected from a carboxyl group, a fluorinated alcohol group, and a sulfonic acid group with a group capable of decomposing and leaving by the action of an acid, as an acid-decomposable group: wherein A represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, or a cyano group; R represents a halogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkenyl group, an aralkyl group, an alkoxy group, an alkylcarbonyloxy group, an alkylsulfonyloxy group, an alkyloxycarbonyl group or an aryloxycarbonyl group, and when two or more R's are present, each R may be the same as or different from every other R or when two or more R's are present, they may form a ring in combination with each other; a represents an integer of 1 to 3; and b represents an integer of 0 to (3-a); and the content of the repeating unit represented by the formula in the resin is 5 to 20 mol% based on all the repeating units. a resin containing an acid-decomposable repeating unit and being capable of decreasing the solubility in an organic solvent by the action of an acid; a compound generating an acid upon irradiation with an actinic ray or radiation; and a solvent, and wherein the resin is a resin (A-1) containing a repeating unit represented by the following formula and a repeating unit having a group protecting a group selected from a carboxyl group, a fluorinated alcohol group, and a sulfonic acid group with a group capable of decomposing and leaving by the action of an acid, as an acid-decomposable group: