Electronic device comprising an electrical interconnection structure forming at least one electrical conduction path between at least two points of the electronic device and/or at least one electrically conducting plane, and comprising an alternating stack of arrays of conducting lines (108, 112, 116) and dielectric layers (106, 110, 114, 118) in which: - all the conducting lines (108, 112, 116) of a same array extend in a same plane and form an equipotential; - a first pattern of the conducting lines of a first array is such that at least one first of the conducting lines (108.1, 108.2, 108.3) of the first array extends along at least one first direction and several second of the conducting lines (108.4, 108.5, 108.6) of the first array intersect the first of the conducting lines (108.1, 108.2, 108.3) of the first array at several intersections; - a third pattern of the conducting lines of a third array is similar to the first pattern, the first and third patterns being superimposed one on top of the other and such that the intersections of the first pattern are aligned with the intersections of the third pattern along an axis substantially perpendicular to the planes in which the conducting lines (108, 116) of the first and third arrays extend; - a second pattern of conducting lines of a second array arranged between the first and third arrays of conducting lines (108, 116) is such that at least one first of the conducting lines (112.1, 112.2) of the second array extends along the first direction and several second of the conducting lines (112.3, 112.4) of the second array intersect the first of the conducting lines (112.1, 112.2) of the second array at several intersections offset with respect to the intersections (120, 124) of the first and third patterns; - at least one first conducting via extends through at least one part of at least one of the dielectric layers (110, 114) interposed between the first and third arrays of conducting lines (108, 116), is in contact with at least one of the conducting lines (108, 116) of the first array and/or of the third array and is such that a section of the first conducting via projected in a plane in which the conducting lines of the second array pass is not in contact with the conducting lines of the second array. - all the conducting lines (108, 112, 116) of a same array extend in a same plane and form an equipotential; - a first pattern of the conducting lines of a first array is such that at least one first of the conducting lines (108.1, 108.2, 108.3) of the first array extends along at least one first direction and several second of the conducting lines (108.4, 108.5, 108.6) of the first array intersect the first of the conducting lines (108.1, 108.2, 108.3) of the first array at several intersections; - a third pattern of the conducting lines of a third array is similar to the first pattern, the first and third patterns being superimposed one on top of the other and such that the intersections of the first pattern are aligned with the intersections of the third pattern along an axis substantially perpendicular to the planes in which the conducting lines (108, 116) of the first and third arrays extend; - a second pattern of conducting lines of a second array arranged between the first and third arrays of conducting lines (108, 116) is such that at least one first of the conducting lines (112.1, 112.2) of the second array extends along the first direction and several second of the conducting lines (112.3, 112.4) of the second array intersect the first of the conducting lines (112.1, 112.2) of the second array at several intersections offset with respect to the intersections (120, 124) of the first and third patterns; - at least one first conducting via extends through at least one part of at least one of the dielectric layers (110, 114) interposed between the first and third arrays of conducting lines (108, 116), is in contact with at least one of the conducting lines (108, 116) of the first array and/or of the third array and is such that a section of the first conducting via projected in a plane in which the conducting lines of the second array pass is not in contact with the conducting lines of the second array.