An ion beam sample preparation apparatus comprising: a) a tilting ion beam irradiating means disposed in a vacuum chamber and directing an ion beam toward a shield, wherein said tilting ion beam irradiating means projects an ion beam along a central ion beam axis, the direction of said central ion beam axis having a tilt angle with respect to said shield; b) a tilt drive operably coupled to said tilting ion beam irradiating means and configured to move the direction of said central ion beam axis between at least two different tilt angles; wherein the ion beam sample preparation apparatus further comprises c) a shield retention stage disposed in the vacuum chamber; said shield retention stage comprising: i) a first datum surface, and a second datum surface; ii) a shield retention means having at least a shield releasing position and a shield retaining position; d) the shield having at least a rigid planar portion, removably and replaceably held in said shield retention stage, said shield further comprising: i) a proximal sample surface configured to durably adhere the sample to the shield; ii) a first shielding surface disposed in the path of the ion beam and positioned to shield a portion of the ion beam directed at the sample when said shield is held in the shield retaining position of the shield retention means; iii) a third datum surface formed integrally with said shield, wherein said shield retention means in said shield retaining position urges said third datum surface to abut said first datum surface; and, iv) a fourth datum surface formed integrally with said shield, wherein said shield retention means in said shield retaining position urges said fourth datum surface to abut said second datum surface; characterized in that the proximal sample surface has at least one recessed portion configured for the flowing of adhesive between the shield and the sample. a) a tilting ion beam irradiating means disposed in a vacuum chamber and directing an ion beam toward a shield, wherein said tilting ion beam irradiating means projects an ion beam along a central ion beam axis, the direction of said central ion beam axis having a tilt angle with respect to said shield; b) a tilt drive operably coupled to said tilting ion beam irradiating means and configured to move the direction of said central ion beam axis between at least two different tilt angles; wherein the ion beam sample preparation apparatus further comprises c) a shield retention stage disposed in the vacuum chamber; said shield retention stage comprising: i) a first datum surface, and a second datum surface; ii) a shield retention means having at least a shield releasing position and a shield retaining position; i) a first datum surface, and a second datum surface; ii) a shield retention means having at least a shield releasing position and a shield retaining position; d) the shield having at least a rigid planar portion, removably and replaceably held in said shield retention stage, said shield further comprising: i) a proximal sample surface configured to durably adhere the sample to the shield; ii) a first shielding surface disposed in the path of the ion beam and positioned to shield a portion of the ion beam directed at the sample when said shield is held in the shield retaining position of the shield retention means; iii) a third datum surface formed integrally with said shield, wherein said shield retention means in said shield retaining position urges said third datum surface to abut said first datum surface; and, iv) a fourth datum surface formed integrally with said shield, wherein said shield retention means in said shield retaining position urges said fourth datum surface to abut said second datum surface; characterized in that the proximal sample surface has at least one recessed portion configured for the flowing of adhesive between the shield and the sample. i) a proximal sample surface configured to durably adhere the sample to the shield; ii) a first shielding surface disposed in the path of the ion beam and positioned to shield a portion of the ion beam directed at the sample when said shield is held in the shield retaining position of the shield retention means; iii) a third datum surface formed integrally with said shield, wherein said shield retention means in said shield retaining position urges said third datum surface to abut said first datum surface; and, iv) a fourth datum surface formed integrally with said shield, wherein said shield retention means in said shield retaining position urges said fourth datum surface to abut said second datum surface; characterized in that the proximal sample surface has at least one recessed portion configured for the flowing of adhesive between the shield and the sample.