A scanning microelectromechanical reflector system comprising a frame, a reflector (31, 61, 71, 91) and at least one actuation unit, wherein each actuation unit comprises an actuator (35, 65, 75, 95) and a suspender (34, 74, 94); the frame (32, 72, 92), the reflector (31, 61, 71, 91) and the at least one actuation unit of the scanning microelectromechanical reflector system utilize a surface area in a plane; the frame (32, 72, 92) surrounds the reflector (31, 61, 71, 91) and the at least one actuation unit in the surface area in the plane; the suspender (34, 74, 94) comprises a silicon beam, wherein one end of the silicon beam of the suspender is fixed from a first fixing point (311, 611, 711, 911) to the frame (32, 72, 92), and an opposite end of the silicon beam of the suspender is fixed from a second fixing point (312, 612, 712, 912) to the reflector (31, 61, 71, 91); the actuator (35, 65, 75, 95) is a bending piezoelectric actuator which comprises a silicon beam coated with at least one electrode layer and at least one piezoelectric material; the silicon beam of the actuator (35, 65, 75, 95) includes a moving end that is fixed from a third fixing point to the silicon beam of the suspender and a fixed end that is fixed from a fourth fixing point to the frame (32, 72, 92); when the third fixing point (313, 613, 713, 913) is projected onto a line extending through the first fixing point (311, 611, 711, 911) and the second fixing point (312, 612, 712, 912), the projection of the third fixing point (313, 613, 713, 913) lies between the first fixing point (311, 611, 711, 911) and the second fixing point (312, 612, 712, 912) so that when the actuator (35, 65, 75, 95) bends, the fixed end of the silicon beam of the actuator (35, 65, 75, 95) remains in place and the moving end of the silicon beam of the actuator (35, 65, 75, 95) moves the third fixing point on the silicon beam of the suspender (34, 74, 94) upward or downward from the plane thus creating a torque that rotates the silicon beam of the suspender (34, 74, 94) about an axis that lies in the plane, passes through the first fixing point and is perpendicular to the silicon beam of the suspender (34, 74, 94). each actuation unit comprises an actuator (35, 65, 75, 95) and a suspender (34, 74, 94); the frame (32, 72, 92), the reflector (31, 61, 71, 91) and the at least one actuation unit of the scanning microelectromechanical reflector system utilize a surface area in a plane; the frame (32, 72, 92) surrounds the reflector (31, 61, 71, 91) and the at least one actuation unit in the surface area in the plane; the suspender (34, 74, 94) comprises a silicon beam, wherein one end of the silicon beam of the suspender is fixed from a first fixing point (311, 611, 711, 911) to the frame (32, 72, 92), and an opposite end of the silicon beam of the suspender is fixed from a second fixing point (312, 612, 712, 912) to the reflector (31, 61, 71, 91); the actuator (35, 65, 75, 95) is a bending piezoelectric actuator which comprises a silicon beam coated with at least one electrode layer and at least one piezoelectric material; the silicon beam of the actuator (35, 65, 75, 95) includes a moving end that is fixed from a third fixing point to the silicon beam of the suspender and a fixed end that is fixed from a fourth fixing point to the frame (32, 72, 92); when the third fixing point (313, 613, 713, 913) is projected onto a line extending through the first fixing point (311, 611, 711, 911) and the second fixing point (312, 612, 712, 912), the projection of the third fixing point (313, 613, 713, 913) lies between the first fixing point (311, 611, 711, 911) and the second fixing point (312, 612, 712, 912) so that when the actuator (35, 65, 75, 95) bends, the fixed end of the silicon beam of the actuator (35, 65, 75, 95) remains in place and the moving end of the silicon beam of the actuator (35, 65, 75, 95) moves the third fixing point on the silicon beam of the suspender (34, 74, 94) upward or downward from the plane thus creating a torque that rotates the silicon beam of the suspender (34, 74, 94) about an axis that lies in the plane, passes through the first fixing point and is perpendicular to the silicon beam of the suspender (34, 74, 94).