An EUV radiation production apparatus, comprising: a driver laser arrangement, comprising: a beam source for producing pulsed laser radiation with at least one laser frequency (f L), being embodied to produce a first pulse and, following the first pulse in time, a second pulse of the pulsed laser radiation, and an amplifier arrangement with at least one optical amplifier (4a-c) for amplifying the pulsed laser radiation, wherein the first pulse has a lower power than the second pulse after the amplification, a beam guiding device for guiding the pulsed laser radiation from the driver laser arrangement toward a target position, and a vacuum chamber in which a target material is arrangeable at the target position, characterized in that the driver laser arrangement comprises at least one frequency shifting device (13a-c, 13') for producing a frequency shift (Δf) of the laser frequency (f L) of the laser radiation relative to a maximum frequency (f M) of a frequency-dependent gain of the at least one optical amplifier (4a-c), and a control device embodied to set the frequency shift (Δf) in such a way that the gain (V RED) of the optical amplifier (4a-c) for the laser radiation is reduced to less than 90%, preferably to less than 70%, particularly preferably to less than 50%, of a maximum gain (V MAX) of the optical amplifier (4a-c), wherein the control device is embodied to reduce the gain (V RED) of the optical amplifier (4a-c) for the first pulse to less than 90%, preferably to less than 70%, particularly preferably to less than 50%, of the maximum gain (V MAX) of the optical amplifier (13a-c) for the first pulse, and wherein the second pulse passes through the at least one optical amplifier (4a-c) only after a back-reflection of the first pulse which is reflected back at the target material, and wherein the second pulse is amplified with the maximum gain (V MAX) in the at least one optical amplifier (4a-c). a beam source for producing pulsed laser radiation with at least one laser frequency (f L), being embodied to produce a first pulse and, following the first pulse in time, a second pulse of the pulsed laser radiation, and an amplifier arrangement with at least one optical amplifier (4a-c) for amplifying the pulsed laser radiation, wherein the first pulse has a lower power than the second pulse after the amplification, a beam guiding device for guiding the pulsed laser radiation from the driver laser arrangement toward a target position, and a vacuum chamber in which a target material is arrangeable at the target position, characterized in that the driver laser arrangement comprises at least one frequency shifting device (13a-c, 13') for producing a frequency shift (Δf) of the laser frequency (f L) of the laser radiation relative to a maximum frequency (f M) of a frequency-dependent gain of the at least one optical amplifier (4a-c), and a control device embodied to set the frequency shift (Δf) in such a way that the gain (V RED) of the optical amplifier (4a-c) for the laser radiation is reduced to less than 90%, preferably to less than 70%, particularly preferably to less than 50%, of a maximum gain (V MAX) of the optical amplifier (4a-c), wherein the control device is embodied to reduce the gain (V RED) of the optical amplifier (4a-c) for the first pulse to less than 90%, preferably to less than 70%, particularly preferably to less than 50%, of the maximum gain (V MAX) of the optical amplifier (13a-c) for the first pulse, and wherein the second pulse passes through the at least one optical amplifier (4a-c) only after a back-reflection of the first pulse which is reflected back at the target material, and wherein the second pulse is amplified with the maximum gain (V MAX) in the at least one optical amplifier (4a-c).