A low-e coating applied onto a glass for providing neutrality when viewed from inside and from outside in automotive and architectural glasses, wherein the visible region transmittance value after thermal process is between 60-75% and the solar transmittance value is between 23-35%, and the following is provided outwardly from the glass: - a first dielectric structure comprising at least one of Si x N y, SiAlN x, SiAlO x N y, SiO x N y, ZnSnO x, TiO x, TiN x, ZrN x, NiCr, NiCrO x, TiO x, ZnSnO x, ZnAlO x, ZnO x; - the first functional layer positioned on said first dielectric structure; - a first barrier layer comprising at least one of NiCr, NiCrO x, TiO x, ZnAlO x and positioned on said first functional layer; - the second dielectric structure comprising at least one of Si x N y, SiAlN x, SiAlO x N y, SiO x N y, ZnSnO x, TiO x, TiN x, ZrN x, NiCr, NiCrO x, TiO x, ZnSnO x, ZnAlO x, ZnO x and positioned on said first barrier layer; - the second functional layer positioned on said second dielectric structure; - the second barrier layer comprising at least one of NiCr, NiCrO x, TiO x, ZnAlO x and positioned on said second functional layer; - the third dielectric structure comprising at least one of Si x N y, SiAlN x, SiAlO x N y, SiO x N y, ZnSnO x, TiO x, TiN x, ZrN x, NiCr, NiCrO x, TiO x, ZnSnO x, ZnAlO x, ZnO x and positioned on said second barrier layer; - the third functional layer positioned on said third dielectric structure; - the third barrier layer comprising at least one of NiCr, NiCrO x, TiO x, ZnAlO x and positioned on said third functional layer; - the upper dielectric structure comprising at least one of or a number of layers of Si x N y, SiAlN x, SiAlO x N y, SiO x, SiO x N y, ZnSnO x, ZnAlO x, TiO x, TiN x, ZrN x and positioned on said third barrier layer, - wherein said third functional layer thickness is more than the second functional layer thickness and the first functional layer thickness. - a first dielectric structure comprising at least one of Si x N y, SiAlN x, SiAlO x N y, SiO x N y, ZnSnO x, TiO x, TiN x, ZrN x, NiCr, NiCrO x, TiO x, ZnSnO x, ZnAlO x, ZnO x; - the first functional layer positioned on said first dielectric structure; - a first barrier layer comprising at least one of NiCr, NiCrO x, TiO x, ZnAlO x and positioned on said first functional layer; - the second dielectric structure comprising at least one of Si x N y, SiAlN x, SiAlO x N y, SiO x N y, ZnSnO x, TiO x, TiN x, ZrN x, NiCr, NiCrO x, TiO x, ZnSnO x, ZnAlO x, ZnO x and positioned on said first barrier layer; - the second functional layer positioned on said second dielectric structure; - the second barrier layer comprising at least one of NiCr, NiCrO x, TiO x, ZnAlO x and positioned on said second functional layer; - the third dielectric structure comprising at least one of Si x N y, SiAlN x, SiAlO x N y, SiO x N y, ZnSnO x, TiO x, TiN x, ZrN x, NiCr, NiCrO x, TiO x, ZnSnO x, ZnAlO x, ZnO x and positioned on said second barrier layer; - the third functional layer positioned on said third dielectric structure; - the third barrier layer comprising at least one of NiCr, NiCrO x, TiO x, ZnAlO x and positioned on said third functional layer; - the upper dielectric structure comprising at least one of or a number of layers of Si x N y, SiAlN x, SiAlO x N y, SiO x, SiO x N y, ZnSnO x, ZnAlO x, TiO x, TiN x, ZrN x and positioned on said third barrier layer, - wherein said third functional layer thickness is more than the second functional layer thickness and the first functional layer thickness.