A plasma CVD apparatus, comprising: a vacuum chamber; a pair of deposition rollers that is disposed in the vacuum chamber and around which, in use, a substrate to be deposited is wound, said pair of deposition rollers including a first deposition roller and a second deposition roller that is apart from the first deposition roller with an interval such that an axis center thereof is parallel to that of the first deposition roller; a magnetic field generating section (8, 15) arranged to generate a magnetic field for generating plasma on surfaces of the deposition rollers to form a deposition area (19, 20) where, in use, a coating is deposited on the substrate wound around the deposition rollers, said magnetic field generating section (8, 15) being disposed such that a first deposition area is formed in a space between the first and the second deposition rollers, and such that a second deposition area is formed in a region adjacent to a surface of each deposition roller and other than the space between said first and second deposition rollers, as the deposition area, wherein the magnetic field generating section (8, 15) includes a first magnetic field generating section arranged to generate the plasma in the first deposition area and a second magnetic field generating section arranged to generate the plasma in the second deposition area, and wherein the first magnetic field generating section and the second magnetic field generating section are installed within each deposition roller, or the first magnetic field generating section is installed within each deposition roller, and the second magnetic field generating section is installed outside each of the deposition rollers and at a lower side of each deposition roller. a vacuum chamber; a pair of deposition rollers that is disposed in the vacuum chamber and around which, in use, a substrate to be deposited is wound, said pair of deposition rollers including a first deposition roller and a second deposition roller that is apart from the first deposition roller with an interval such that an axis center thereof is parallel to that of the first deposition roller; a magnetic field generating section (8, 15) arranged to generate a magnetic field for generating plasma on surfaces of the deposition rollers to form a deposition area (19, 20) where, in use, a coating is deposited on the substrate wound around the deposition rollers, said magnetic field generating section (8, 15) being disposed such that a first deposition area is formed in a space between the first and the second deposition rollers, and such that a second deposition area is formed in a region adjacent to a surface of each deposition roller and other than the space between said first and second deposition rollers, as the deposition area, wherein the magnetic field generating section (8, 15) includes a first magnetic field generating section arranged to generate the plasma in the first deposition area and a second magnetic field generating section arranged to generate the plasma in the second deposition area, and wherein the first magnetic field generating section and the second magnetic field generating section are installed within each deposition roller, or the first magnetic field generating section is installed within each deposition roller, and the second magnetic field generating section is installed outside each of the deposition rollers and at a lower side of each deposition roller.