A method of making an organic resin laminate, comprising: applying a wet coating to an organic resin substrate to form an intermediate layer on the substrate, wherein the wet coating comprises a multi-functional (meth)acrylate, a photopolymerization initiator, and a reactive UV absorber having the general formula: wherein Y 1 and Y 2 are each independently a substituent group of the general formula: wherein * stands for a bonding site, r is 0 or 1, R 1, R 2 and R 3 are each independently selected from the group consisting of hydrogen, hydroxyl, C 1 -C 20 alkyl, C 4 -C 12 cycloalkyl, C 2 -C 20 alkenyl, C 1 -C 20 alkoxy, C 4 -C 12 cycloalkoxy, C 2 -C 20 alkenyloxy, C 7 -C 20 aralkyl, halogen, -C≡N, C 1 -C 5 haloalkyl, -SO 2 R', -SO 3 H, -SO 3 M (M = alkali metal), -COOR', -CONHR', -CONR'R", -OCOOR', -OCOR', -OCONHR', (meth)acrylamino, (meth)acryloxy, optionally substituted C 6 -C 12 aryl and optionally substituted C 3 -C 12 heteroaryl, wherein R' and R" are each independently hydrogen, C 1 -C 20 alkyl, C 4 -C 12 cycloalkyl, optionally substituted C 6 -C 12 aryl or optionally substituted C 3 -C 12 heteroaryl, X is a di-, tri- or tetravalent, linear or branched, saturated hydrocarbon residue which may be separated by at least one element of oxygen, nitrogen, sulfur, and phosphor, T is a urethane group -O-(C=O)-NH-, Q is a di- or trivalent, linear or branched, saturated hydrocarbon residue which may be separated by at least one element of oxygen, nitrogen, sulfur, and phosphor, P is (meth)acryloxy, and m is 1 or 2, and n is an integer of 1 to 3, with the proviso that m and n are not equal to 1 at the same time; UV curing the wet coating to form a cured coating; and depositing a first plasma coating on the cured coating, wherein the first plasma coating is deposited using a first oxygen flow rate of less than 250 seem per plasma source. applying a wet coating to an organic resin substrate to form an intermediate layer on the substrate, wherein the wet coating comprises a multi-functional (meth)acrylate, a photopolymerization initiator, and a reactive UV absorber having the general formula: wherein Y 1 and Y 2 are each independently a substituent group of the general formula: wherein * stands for a bonding site, r is 0 or 1, R 1, R 2 and R 3 are each independently selected from the group consisting of hydrogen, hydroxyl, C 1 -C 20 alkyl, C 4 -C 12 cycloalkyl, C 2 -C 20 alkenyl, C 1 -C 20 alkoxy, C 4 -C 12 cycloalkoxy, C 2 -C 20 alkenyloxy, C 7 -C 20 aralkyl, halogen, -C≡N, C 1 -C 5 haloalkyl, -SO 2 R', -SO 3 H, -SO 3 M (M = alkali metal), -COOR', -CONHR', -CONR'R", -OCOOR', -OCOR', -OCONHR', (meth)acrylamino, (meth)acryloxy, optionally substituted C 6 -C 12 aryl and optionally substituted C 3 -C 12 heteroaryl, wherein R' and R" are each independently hydrogen, C 1 -C 20 alkyl, C 4 -C 12 cycloalkyl, optionally substituted C 6 -C 12 aryl or optionally substituted C 3 -C 12 heteroaryl, X is a di-, tri- or tetravalent, linear or branched, saturated hydrocarbon residue which may be separated by at least one element of oxygen, nitrogen, sulfur, and phosphor, T is a urethane group -O-(C=O)-NH-, Q is a di- or trivalent, linear or branched, saturated hydrocarbon residue which may be separated by at least one element of oxygen, nitrogen, sulfur, and phosphor, P is (meth)acryloxy, and m is 1 or 2, and n is an integer of 1 to 3, with the proviso that m and n are not equal to 1 at the same time; X is a di-, tri- or tetravalent, linear or branched, saturated hydrocarbon residue which may be separated by at least one element of oxygen, nitrogen, sulfur, and phosphor, T is a urethane group -O-(C=O)-NH-, Q is a di- or trivalent, linear or branched, saturated hydrocarbon residue which may be separated by at least one element of oxygen, nitrogen, sulfur, and phosphor, P is (meth)acryloxy, and m is 1 or 2, and n is an integer of 1 to 3, with the proviso that m and n are not equal to 1 at the same time; UV curing the wet coating to form a cured coating; and depositing a first plasma coating on the cured coating, wherein the first plasma coating is deposited using a first oxygen flow rate of less than 250 seem per plasma source.