Glazing comprising a transparent substrate provided with a stack of thin layers comprising an alternating arrangement of n infrared radiation reflecting functional layers and n+1 dielectric coatings, with n > 1, such that each functional layer is surrounded by dielectric coatings, characterised in that: (i) the first dielectric coating closest to the substrate comprises a layer made from an oxide, in direct contact with the substrate, (ii) the portion or portions of the coating stack located between two functional layers comprise, in order starting from the substrate: a. a barrier layer in direct contact with an underlying functional layer made from a zinc oxide possibly doped with aluminium in a weight ratio of Zn/Al of at least 90/10, b. a layer of zinc oxide or a zinc oxide-based layer comprising another metal in a weight ratio of Zn/metal of at least 80/20 that has a different composition from layer (ii)a, c. a layer of zinc-tin mixed oxide with a different composition from layer (ii)b, d. a zinc oxide-based nucleation layer directly below and in contact with the overlying functional layer with a different composition from layer (ii)c, and (iii) the last dielectric coating furthest away from the substrate comprises, in order starting from the substrate, a layer made from an oxide other than silicon oxide with a thickness greater than 3 nm and a layer made from a silicon nitride or a silicon oxide with a thickness greater than 10 nm. (i) the first dielectric coating closest to the substrate comprises a layer made from an oxide, in direct contact with the substrate, (ii) the portion or portions of the coating stack located between two functional layers comprise, in order starting from the substrate: a. a barrier layer in direct contact with an underlying functional layer made from a zinc oxide possibly doped with aluminium in a weight ratio of Zn/Al of at least 90/10, b. a layer of zinc oxide or a zinc oxide-based layer comprising another metal in a weight ratio of Zn/metal of at least 80/20 that has a different composition from layer (ii)a, c. a layer of zinc-tin mixed oxide with a different composition from layer (ii)b, d. a zinc oxide-based nucleation layer directly below and in contact with the overlying functional layer with a different composition from layer (ii)c, and a. a barrier layer in direct contact with an underlying functional layer made from a zinc oxide possibly doped with aluminium in a weight ratio of Zn/Al of at least 90/10, b. a layer of zinc oxide or a zinc oxide-based layer comprising another metal in a weight ratio of Zn/metal of at least 80/20 that has a different composition from layer (ii)a, c. a layer of zinc-tin mixed oxide with a different composition from layer (ii)b, d. a zinc oxide-based nucleation layer directly below and in contact with the overlying functional layer with a different composition from layer (ii)c, and (iii) the last dielectric coating furthest away from the substrate comprises, in order starting from the substrate, a layer made from an oxide other than silicon oxide with a thickness greater than 3 nm and a layer made from a silicon nitride or a silicon oxide with a thickness greater than 10 nm.