A method for fabricating a micro-optical bench device, comprising: providing a substrate; etching the substrate to form a permanent structure including at least two optical elements (370, 375) and a temporary structure, wherein etching the substrate to form the permanent structure and the temporary structure includes controlling a profile of a first optical element of the at least two optical elements (370, 375) in an out-of-plane direction at different locations on a first surface of the first optical element in the in-plane direction, by selecting the shape of the temporary structure and the gap between the temporary structure and the permanent structure during etching thereof; and wherein controlling a profile of the first optical element further comprises controlling a roughness or an inclination angle of at least one surface of at least one of the at least two optical elements (370, 375) with respect to a plane of the substrate or with respect to an optical axis of the micro-optical bench device; removing the temporary structure by releasing or etching the temporary structure to produce the micro-optical bench device; wherein the at least two optical elements (370, 375) lie within an optical path of the micro-optical bench device. providing a substrate; etching the substrate to form a permanent structure including at least two optical elements (370, 375) and a temporary structure, wherein etching the substrate to form the permanent structure and the temporary structure includes controlling a profile of a first optical element of the at least two optical elements (370, 375) in an out-of-plane direction at different locations on a first surface of the first optical element in the in-plane direction, by selecting the shape of the temporary structure and the gap between the temporary structure and the permanent structure during etching thereof; and wherein controlling a profile of the first optical element further comprises controlling a roughness or an inclination angle of at least one surface of at least one of the at least two optical elements (370, 375) with respect to a plane of the substrate or with respect to an optical axis of the micro-optical bench device; wherein etching the substrate to form the permanent structure and the temporary structure includes controlling a profile of a first optical element of the at least two optical elements (370, 375) in an out-of-plane direction at different locations on a first surface of the first optical element in the in-plane direction, by selecting the shape of the temporary structure and the gap between the temporary structure and the permanent structure during etching thereof; and wherein controlling a profile of the first optical element further comprises controlling a roughness or an inclination angle of at least one surface of at least one of the at least two optical elements (370, 375) with respect to a plane of the substrate or with respect to an optical axis of the micro-optical bench device; removing the temporary structure by releasing or etching the temporary structure to produce the micro-optical bench device; wherein the at least two optical elements (370, 375) lie within an optical path of the micro-optical bench device.