A partial erasing method of a liquid crystal writing film, the liquid crystal writing film comprising: a first conductive layer, a liquid crystal layer and a second conductive layer, which are arranged in sequence; wherein the first conductive layer and the second conductive layer are both divided into two or more conductive regions, the two or more conductive regions in each of the first and second conductive layer being insulated from each other; wherein a spatial overlapping part of the two or more conductive regions of the first conductive layer, the two or more conductive regions of the second conductive layer and the liquid crystal layer in between the first and second conductive layer form an erasable region, each of the two or more conductive regions of the first and of the second conductive layer being electrically connected with a voltage application device through an electrode and a corresponding conducting wire, the voltage application device being arranged for providing voltages to the conducting regions in the first and second conductive layers for erasing erasable regions on the liquid crystal writing film via the corresponding conducting wire and electrode characterized in that during erasing of a partial erasing region to be erased a voltage A is applied to the conductive region of the first conductive layer that covers the partial erasing region to be erased; a voltage B is applied to the conductive region of the second conductive layer that covers the partial erasing region to be erased; and the voltage A and the voltage B form an erasing electric field at the spatial overlapping location of the two conductive regions, so as to achieve the partial erasing of the partial erasing region to be erased wherein two compensation voltages are applied to the conductive regions outside of the respective conductive regions of the two conductive layers that cover the partial erasing regions, wherein a voltage D is applied to the conductive region set outside of the conductive region on the first conductive layer that covers the partial erasing region, and a voltage E is applied to the conductive region set outside of the conductive region on the second conductive layer that covers the partial erasing region; and with the voltage B as a reference value, the voltage A, the voltage B, the voltage D and the voltage E satisfy the following relationship: voltage A − voltage B > voltage D − voltage B voltage A − voltage B > voltage A − voltage E voltage A − voltage B > voltage D − voltage E further, voltage A − voltage B = voltage D − voltage B * 3 voltage E − voltage B = voltage D − voltage B * 2. a first conductive layer, a liquid crystal layer and a second conductive layer, which are arranged in sequence; wherein the first conductive layer and the second conductive layer are both divided into two or more conductive regions, the two or more conductive regions in each of the first and second conductive layer being insulated from each other; wherein a spatial overlapping part of the two or more conductive regions of the first conductive layer, the two or more conductive regions of the second conductive layer and the liquid crystal layer in between the first and second conductive layer form an erasable region, each of the two or more conductive regions of the first and of the second conductive layer being electrically connected with a voltage application device through an electrode and a corresponding conducting wire, the voltage application device being arranged for providing voltages to the conducting regions in the first and second conductive layers for erasing erasable regions on the liquid crystal writing film via the corresponding conducting wire and electrode characterized in that during erasing of a partial erasing region to be erased a voltage A is applied to the conductive region of the first conductive layer that covers the partial erasing region to be erased; a voltage B is applied to the conductive region of the second conductive layer that covers the partial erasing region to be erased; and the voltage A and the voltage B form an erasing electric field at the spatial overlapping location of the two conductive regions, so as to achieve the partial erasing of the partial erasing region to be erased wherein two compensation voltages are applied to the conductive regions outside of the respective conductive regions of the two conductive layers that cover the partial erasing regions, wherein a voltage D is applied to the conductive region set outside of the conductive region on the first conductive layer that covers the partial erasing region, and a voltage E is applied to the conductive region set outside of the conductive region on the second conductive layer that covers the partial erasing region; and with the voltage B as a reference value, the voltage A, the voltage B, the voltage D and the voltage E satisfy the following relationship: voltage A − voltage B > voltage D − voltage B voltage A − voltage B > voltage A − voltage E voltage A − voltage B > voltage D − voltage E further,