A charged particle beam device, comprising: • an objective lens element having an optical axis; • an achromatic beam deflector device for deflecting a primary charged particle beam onto said optical axis, the achromatic beam deflector device comprising: a primary charged particle beam inlet, a primary charged particle beam outlet encompassing the optical axis, a magnetic deflection element adapted to generate a magnetic field, and an electrostatic deflection element adapted to generate an electric field overlapping the magnetic field, characterized in that at least one element chosen from the electrostatic deflection element and the magnetic deflection element is positioned to provide the electric field and the magnetic field in at least one arrangement chosen from: - an arrangement in which the electric field is laterally offset with respect to the optical axis towards the direction of the incident primary beam; and - an arrangement wherein the electric field is shifted with respect to the magnetic field in a direction towards the beam outlet, wherein the at least one element is positioned such that a trajectory of the primary charged particle beam is created that allows the primary charged particle beam to experience an equal amount of positive and negative octopole effect about the optical axis. • an objective lens element having an optical axis; • an achromatic beam deflector device for deflecting a primary charged particle beam onto said optical axis, the achromatic beam deflector device comprising: a primary charged particle beam inlet, a primary charged particle beam outlet encompassing the optical axis, a magnetic deflection element adapted to generate a magnetic field, and an electrostatic deflection element adapted to generate an electric field overlapping the magnetic field, characterized in that at least one element chosen from the electrostatic deflection element and the magnetic deflection element is positioned to provide the electric field and the magnetic field in at least one arrangement chosen from: - an arrangement in which the electric field is laterally offset with respect to the optical axis towards the direction of the incident primary beam; and - an arrangement wherein the electric field is shifted with respect to the magnetic field in a direction towards the beam outlet, wherein the at least one element is positioned such that a trajectory of the primary charged particle beam is created that allows the primary charged particle beam to experience an equal amount of positive and negative octopole effect about the optical axis. a primary charged particle beam inlet, a primary charged particle beam outlet encompassing the optical axis, a magnetic deflection element adapted to generate a magnetic field, and an electrostatic deflection element adapted to generate an electric field overlapping the magnetic field, characterized in that at least one element chosen from the electrostatic deflection element and the magnetic deflection element is positioned to provide the electric field and the magnetic field in at least one arrangement chosen from: - an arrangement in which the electric field is laterally offset with respect to the optical axis towards the direction of the incident primary beam; and - an arrangement wherein the electric field is shifted with respect to the magnetic field in a direction towards the beam outlet, - an arrangement in which the electric field is laterally offset with respect to the optical axis towards the direction of the incident primary beam; and - an arrangement wherein the electric field is shifted with respect to the magnetic field in a direction towards the beam outlet, wherein the at least one element is positioned such that a trajectory of the primary charged particle beam is created that allows the primary charged particle beam to experience an equal amount of positive and negative octopole effect about the optical axis.