A demulsifying composition comprising (a) an emulsion; and (b) a demulsifying-effective amount of at least one polyorganosiloxane compound, wherein the concentration of said demulsifying effective amount of polyorganosiloxane compound (b) is from 0.1 ppm to 10,000 ppm, said polyorganosiloxane compound having the general formula: M 1 a M 2 b D 1 c D 2 d T 1 e T 2 f Q g wherein: M 1 = R 1 R 2 R 3 SiO 1/2, M 2 = R 4 R 5 R L SiO 1/2, D 1 = R 6 R 7 SiO 2/2, D 2 = R 8 R L SiO 2/2, T 1 = R 9 SiO 3/2, T 2 = R L SiO 3/2, Q = SiO 4/2, where R 1, R 2, R 3, R 4, R 5, R 6, R 7, R 8 and R 9 are each independently chosen from monovalent alkyl, aryl or aralkyl hydrocarbon radicals containing 1 to 60 carbon atoms, optionally containing at least one heteroatom, or at least one monovalent polyether radical having the general formula R P; R P is a monovalent polyether radical independently of the general formula: -(C n H 2n)-O-(C 2 H 4 O) o -(C 3 H 6 O) p -(C 4 H 8 O) q -R 10 where R 10 is hydrogen or a monovalent alkyl radical containing from 1 to 20 carbon atoms or an acyl group; subscripts a, b, c, d, e, f and g are zero or positive integers, subject to the limitations: 2≤ a+b+c+d+e+f+g ≤500, b+d+f ≥1 and a+b=2+e+f+2g; subscript n is 2 to 10; subscript o is 0 to 200; subscript p is 0 to 200; subscript q is 0 to 200; and, subject to the limitation o+p+q≥1; R L is a monovalent radical independently chosen from the general formula: -X-O-(C 2 H 4 O) r -(C 3 H 6 O) s -(C 4 H 8 O) t - -{C C u H 2u O} v -R 11 where R 11 is hydrogen or monovalent alkyl radical containing from 1 to 20 carbon atoms or an acyl group, and where X is a linear, branched or cyclic divalent hydrocarbon or aralkyl radical containing from 2 to 20 carbon atoms, optionally containing at least one heteroatom; subscript r is 0 to 200; subscript s is 0 to 200; subscript t is 0 to 200; subscript u is 1 to 20; subscript v is 1 to 200, and subject to the limitation if r+s+t is equal to zero then the polyorganosiloxane contains at least one R P radical. M 1 = R 1 R 2 R 3 SiO 1/2, M 2 = R 4 R 5 R L SiO 1/2, D 1 = R 6 R 7 SiO 2/2, D 2 = R 8 R L SiO 2/2, T 1 = R 9 SiO 3/2, T 2 = R L SiO 3/2, Q = SiO 4/2, where R 1, R 2, R 3, R 4, R 5, R 6, R 7, R 8 and R 9 are each independently chosen from monovalent alkyl, aryl or aralkyl hydrocarbon radicals containing 1 to 60 carbon atoms, optionally containing at least one heteroatom, or at least one monovalent polyether radical having the general formula R P; R P is a monovalent polyether radical independently of the general formula: -(C n H 2n)-O-(C 2 H 4 O) o -(C 3 H 6 O) p -(C 4 H 8 O) q -R 10 where R 10 is hydrogen or a monovalent alkyl radical containing from 1 to 20 carbon atoms or an acyl group; subscripts a, b, c, d, e, f and g are zero or positive integers, subject to the limitations: 2≤ a+b+c+d+e+f+g ≤500, b+d+f ≥1 and a+b=2+e+f+2g; subscript n is 2 to 10; subscript o is 0 to 200; subscript p is 0 to 200; subscript q is 0 to 200; and, subject to the limitation o+p+q≥1; R L is a monovalent radical independently chosen from the general formula: -X-O-(C 2 H 4 O) r -(C 3 H 6 O) s -(C 4 H 8 O) t - -{C C u H 2u O} v -R 11 where R 11 is hydrogen or monovalent alkyl radical containing from 1 to 20 carbon atoms or an acyl group, and where X is a linear, branched or cyclic divalent hydrocarbon or aralkyl radical containing from 2 to 20 carbon atoms, optionally containing at least one heteroatom; subscript r is 0 to 200; subscript s is 0 to 200; subscript t is 0 to 200; subscript u is 1 to 20; subscript v is 1 to 200, and