A composition for selectively removing titanium nitride from a semiconductor device comprising titanium nitride and a second material with a removal selectivity of titanium nitride vs. the second material > 1:1, the second material being selected from the group consisting of W, low-k dielectric material, and combinations thereof; the composition comprising: 0.5 to 10 wt% of an amine salt buffer selected from the group consisting of ammonium chloride; ammonium bisulfate; ammonium phosphates; ammonium oxalate; ammonium perfluorosulfonates; ammonium tetrafluoroborate; ammonium hexafluorotitanate; ammonium hexafluorosilicate; ammonium salts of organic acid selected from ammonium citrate, ammonium acetate, ammonium lactate; and combinations thereof; wherein the ammonium having a form of N(R 1 R 2 R 3 R 4) +; wherein R 1,R 2, R 3,R 4 is independently selected from the group consisting of H, CH 3, C 2 H 5, and C 3 H 7; 0.2 to 3 wt % of a non-ambient oxidizer selected from the group consisting of sodium persulfate, ammonium persulfate and combinations thereof; < 4000 ppm of an acidic fluoride selected from the group consisting of ammonium bifluoride, hydrofluoric acid and combinations thereof; and liquid carrier wherein the liquid carrier is water or water and at least one non-water liquid carrier selected from the group consisting of dimethyl sulfone and a polar aprotic solvent selected from the group consisting of sulfolanes, sulfoxides, nitriles, formamides and pyrrolidones, and combinations thereof; wherein the composition comprises no hydrogen peroxide; the composition has a pH < 4. comprising titanium nitride and a second material with a removal selectivity of titanium nitride vs. the second material > 1:1, the second material being selected from the group consisting of W, low-k dielectric material, and combinations thereof; the composition comprising: 0.5 to 10 wt% of an amine salt buffer selected from the group consisting of ammonium chloride; ammonium bisulfate; ammonium phosphates; ammonium oxalate; ammonium perfluorosulfonates; ammonium tetrafluoroborate; ammonium hexafluorotitanate; ammonium hexafluorosilicate; ammonium salts of organic acid selected from ammonium citrate, ammonium acetate, ammonium lactate; and combinations thereof; wherein the ammonium having a form of N(R 1 R 2 R 3 R 4) +; wherein R 1,R 2, R 3,R 4 is independently selected from the group consisting of H, CH 3, C 2 H 5, and C 3 H 7; 0.2 to 3 wt % of a non-ambient oxidizer selected from the group consisting of sodium persulfate, ammonium persulfate and combinations thereof; < 4000 ppm of an acidic fluoride selected from the group consisting of ammonium bifluoride, hydrofluoric acid and combinations thereof; and liquid carrier wherein the liquid carrier is water or water and at least one non-water liquid carrier selected from the group consisting of dimethyl sulfone and a polar aprotic solvent selected from the group consisting of sulfolanes, sulfoxides, nitriles, formamides and pyrrolidones, and combinations thereof; wherein the composition comprises no hydrogen peroxide; the composition has a pH < 4. 0.5 to 10 wt% of an amine salt buffer selected from the group consisting of ammonium chloride; ammonium bisulfate; ammonium phosphates; ammonium oxalate; ammonium perfluorosulfonates; ammonium tetrafluoroborate; ammonium hexafluorotitanate; ammonium hexafluorosilicate; ammonium salts of organic acid selected from ammonium citrate, ammonium acetate, ammonium lactate; and combinations thereof; wherein the ammonium having a form of N(R 1 R 2 R 3 R 4) +; wherein R 1,R 2, R 3,R 4 is independently selected from the group consisting of H, CH 3, C 2 H 5, and C 3 H 7; 0.2 to 3 wt % of a non-ambient oxidizer selected from the group consisting of sodium persulfate, ammonium persulfate and combinations thereof; < 4000 ppm of an acidic fluoride selected from the group consisting of ammonium bifluoride, hydrofluoric acid and combinations thereof; and liquid carrier wherein the liquid carrier is water or water and at least one non-water liquid carrier selected from the group consisting of dimethyl sulfone and a polar aprotic solvent selected from the group consisting of sulfolanes, sulfoxides, nitriles, formamides and pyrrolidones, and combinations thereof; wherein the composition comprises no hydrogen peroxide; the composition has a pH < 4. the composition comprises no hydrogen peroxide; the composition has a pH < 4.