A method for treating a surface of a releasing chamber in contact with a test object, the releasing chamber comprising the following components: a chamber; a chamber door, a suction tube, an exhaust tube and a sampling tube connected with the chamber; a stirring fan mounted in the chamber; and an air duct board; the method is used for treating the surface of at least one component of the chamber, the chamber door, the suction tube, the exhaust tube, the sampling tube, the stirring fan and the air duct board in contact with the test object, characterized in that the following steps are comprised: washing the components of the releasing chamber made by processing stainless steel or glass, to remove contaminants; and production of a deactivated layer by processing the surface of the component washed in step, or first production of an intermediate layer by processing the surface of the component washed in step, and then production of the deactivated layer by processing the surface of the intermediate layer, whereby the deactivated layer is obtained by coating, dip-coating or plating the intermediate layer or the surface of the component washed in step with a low-surface-tension organic compound and wherein the low-surface-tension organic compound includes a fluorinated organic compound, a silane compound, hydrogen-containing silicone oil or poly-glycol, and then baking it at a high temperature above 300°C or whereby said deactivated layer is obtained by coating, dip-coating or plating the surface of the component washed in step or the intermediate layer with SiO 2 sol and then baking it at a high temperature above 300 °C and finally removing excess materials with a solvent or whereby said deactivated layer is obtained by coating, dip-coating or plating the surface of the component washed in step or the intermediate layer with polybenzimidazole pyrrolidone, polytetrafluoroethylene, polyfluoroalkyls, orthosilicate or ethyl orthosilicate and then baking it at a high temperature above 300°C, and whereby said intermediate layer is a SiO 2 layer or in the form of a three-dimensional mesh or porous skeleton phase, having a thickness from submicron to micron. washing the components of the releasing chamber made by processing stainless steel or glass, to remove contaminants; and production of a deactivated layer by processing the surface of the component washed in step, or first production of an intermediate layer by processing the surface of the component washed in step, and then production of the deactivated layer by processing the surface of the intermediate layer, whereby the deactivated layer is obtained by coating, dip-coating or plating the intermediate layer or the surface of the component washed in step with a low-surface-tension organic compound and wherein the low-surface-tension organic compound includes a fluorinated organic compound, a silane compound, hydrogen-containing silicone oil or poly-glycol, and then baking it at a high temperature above 300°C or whereby said deactivated layer is obtained by coating, dip-coating or plating the surface of the component washed in step or the intermediate layer with SiO 2 sol and then baking it at a high temperature above 300 °C and finally removing excess materials with a solvent or whereby said deactivated layer is obtained by coating, dip-coating or plating the surface of the component washed in step or the intermediate layer with polybenzimidazole pyrrolidone, polytetrafluoroethylene, polyfluoroalkyls, orthosilicate or ethyl orthosilicate and then baking it at a high temperature above 300°C, and whereby said intermediate layer is a SiO 2 layer or in the form of a three-dimensional mesh or porous skeleton phase, having a thickness from submicron to micron.