An actinic ray- or radiation-sensitive resin composition comprising: a compound represented by a general formula below that generates an acid when exposed to actinic rays or radiation, and a resin, wherein X represents a bivalent group containing an oxygen atom, a sulfur atom or a nitrogen atom, which bivalent group is connected to S + to thereby form a cyclic structure; R 1 represents an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, an aryl group or an alkenyl group; each of R 2 and R 3 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group, provided that R 2 and R 3 may be connected to each other to thereby form a ring, and that at least one of R 2 and R 3 is an alkyl group, a cycloalkyl group or an aryl group; provided that R 1 and R 2 may be connected to each other to thereby form a ring; and Z - represents a sulfonate anion represented by a general formula below or a disulfonylimidate anion represented by a general formula below, wherein each Xfs independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom; L represents a single bond or a bivalent connecting group; A represents an organic group with a cyclic structure; and x is an integer of 1 to 20, wherein Xf is as defined above in the general formula, provided that two Xfs may be connected to each other to thereby form a cyclic structure. a compound represented by a general formula below that generates an acid when exposed to actinic rays or radiation, and a resin, wherein X represents a bivalent group containing an oxygen atom, a sulfur atom or a nitrogen atom, which bivalent group is connected to S + to thereby form a cyclic structure; R 1 represents an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, an aryl group or an alkenyl group; each of R 2 and R 3 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group, provided that R 2 and R 3 may be connected to each other to thereby form a ring, and that at least one of R 2 and R 3 is an alkyl group, a cycloalkyl group or an aryl group; provided that R 1 and R 2 may be connected to each other to thereby form a ring; and Z - represents a sulfonate anion represented by a general formula below or a disulfonylimidate anion represented by a general formula below, wherein each Xfs independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom; L represents a single bond or a bivalent connecting group; A represents an organic group with a cyclic structure; and x is an integer of 1 to 20, wherein Xf is as defined above in the general formula, provided that two Xfs may be connected to each other to thereby form a cyclic structure. X represents a bivalent group containing an oxygen atom, a sulfur atom or a nitrogen atom, which bivalent group is connected to S + to thereby form a cyclic structure; R 1 represents an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, an aryl group or an alkenyl group; each of R 2 and R 3 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group, provided that R 2 and R 3 may be connected to each other to thereby form a ring, and that at least one of R 2 and R 3 is an alkyl group, a cycloalkyl group or an aryl group; provided that R 1 and R 2 may be connected to each other to thereby form a ring; and Z - represents a sulfonate anion represented by a general formula below or a disulfonylimidate anion represented by a general formula below, each Xfs independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom; L represents a single bond or a bivalent connecting group; A represents an organic group with a cyclic structure; and x is an integer of 1 to 20,