美光科技
In 2000, Gurtej Singh Sandhu and Trung T. Doan at Micron Technology invented atomic layer deposition High-κ dielectric films, leading to the development of a cost-effective 90 nm CMOS process. Toshiba and Sony developed a 65 nm CMOS process in 2002, and then TSMC initiated the development of 45 nm CMOS logic in 2004. The development of pitch double patterning by Gurtej Singh Sandhu at Micron Technology led to the development of 30nm class CMOS in the 2000s.