Chemistry and Lithography
Uzodinma Okoroanyanwu is a Senior Member of Technical Staff in the Technology Research Directorate of GlobalFoundries, a subsidiary of AMD. Since joining AMD in 1997, his research interests have spanned KrF-, ArF-(dry and immersion), F2-, EUV lithographic process technologies, organic electronics, and electrochemistry. He was a research scientist (on assignment from AMD) at IMEC in Belgium between 2002 and 2004, at Physikalische Chemie Fachberi, Universitat Oldenburg, Germany in 2001, and in Fujistu Laboratories in Mie, Japan in 1998. He has published over 100 scientific and technical papers covering fundamentals of resist materials science and technology, resist process integration in device manufacture, microlithography, polymer chemistry and physics, gas phase kinetics, organic electronics, and electrochemistry. He holds 26 U.S. patents. A two-time recipient of AMD s Corporate Technical Achievement Award, as well as a recipient of the Semiconductor Research Corporation Technical Excellence Award, he is a member of American Chemical Society, American Association for the Advancement of Science, and Society of Photo-Imaging and Instrumentation Engineers. He holds the following degrees from The University of Texas at Austin: Ph.D. in physical chemistry (1997), M.S. in chemical engineering (1995), M.A. in physical chemistry (1994), B.S. in chemistry and chemical engineering (1991).--This text refers to an alternateHardcoveredition.